JPH02167329A - Thermosetting resin composition, printed-circuit board using same resin composition and production thereof - Google Patents
Thermosetting resin composition, printed-circuit board using same resin composition and production thereofInfo
- Publication number
- JPH02167329A JPH02167329A JP1252748A JP25274889A JPH02167329A JP H02167329 A JPH02167329 A JP H02167329A JP 1252748 A JP1252748 A JP 1252748A JP 25274889 A JP25274889 A JP 25274889A JP H02167329 A JPH02167329 A JP H02167329A
- Authority
- JP
- Japan
- Prior art keywords
- group
- resin composition
- formula
- thermosetting resin
- general formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011342 resin composition Substances 0.000 title claims abstract description 34
- 229920001187 thermosetting polymer Polymers 0.000 title claims abstract description 30
- 238000004519 manufacturing process Methods 0.000 title claims description 11
- -1 cyanate compound Chemical class 0.000 claims abstract description 58
- 150000001875 compounds Chemical class 0.000 claims abstract description 25
- XLJMAIOERFSOGZ-UHFFFAOYSA-M cyanate Chemical compound [O-]C#N XLJMAIOERFSOGZ-UHFFFAOYSA-M 0.000 claims abstract description 19
- 125000003118 aryl group Chemical group 0.000 claims abstract description 14
- 239000011888 foil Substances 0.000 claims abstract description 9
- 239000003505 polymerization initiator Substances 0.000 claims abstract description 8
- FUGYGGDSWSUORM-UHFFFAOYSA-N 4-hydroxystyrene Chemical class OC1=CC=C(C=C)C=C1 FUGYGGDSWSUORM-UHFFFAOYSA-N 0.000 claims abstract description 7
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims abstract description 6
- 239000002759 woven fabric Substances 0.000 claims abstract description 6
- 238000010030 laminating Methods 0.000 claims abstract description 5
- 239000000463 material Substances 0.000 claims description 26
- 239000000126 substance Substances 0.000 claims description 15
- 239000012948 isocyanate Substances 0.000 claims description 14
- 238000000034 method Methods 0.000 claims description 11
- 238000010438 heat treatment Methods 0.000 claims description 10
- 239000002904 solvent Substances 0.000 claims description 9
- 239000004020 conductor Substances 0.000 claims description 8
- 229910052751 metal Inorganic materials 0.000 claims description 8
- 239000002184 metal Substances 0.000 claims description 8
- 125000005462 imide group Chemical class 0.000 claims description 7
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 claims description 7
- 238000006116 polymerization reaction Methods 0.000 claims description 7
- 238000013329 compounding Methods 0.000 claims description 5
- 238000001035 drying Methods 0.000 claims description 5
- 239000000835 fiber Substances 0.000 claims description 4
- 150000002513 isocyanates Chemical class 0.000 claims description 4
- 239000004745 nonwoven fabric Substances 0.000 claims description 4
- 239000012784 inorganic fiber Substances 0.000 claims description 2
- 238000003825 pressing Methods 0.000 claims description 2
- 239000000203 mixture Chemical group 0.000 abstract description 9
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 abstract description 4
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Chemical group BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 abstract description 4
- 229910052794 bromium Chemical group 0.000 abstract description 4
- 229910052731 fluorine Inorganic materials 0.000 abstract description 4
- 239000011737 fluorine Substances 0.000 abstract description 4
- 125000001153 fluoro group Chemical group F* 0.000 abstract description 4
- 125000003342 alkenyl group Chemical group 0.000 abstract description 3
- 125000002723 alicyclic group Chemical group 0.000 abstract 1
- 229920005989 resin Polymers 0.000 description 27
- 239000011347 resin Substances 0.000 description 27
- 239000002966 varnish Substances 0.000 description 21
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 18
- 239000003063 flame retardant Substances 0.000 description 18
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 15
- 239000011521 glass Substances 0.000 description 11
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 8
- 229920003192 poly(bis maleimide) Polymers 0.000 description 8
- 239000002585 base Substances 0.000 description 7
- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 description 6
- 239000007787 solid Substances 0.000 description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 5
- 239000005062 Polybutadiene Substances 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- GEMHFKXPOCTAIP-UHFFFAOYSA-N n,n-dimethyl-n'-phenylcarbamimidoyl chloride Chemical class CN(C)C(Cl)=NC1=CC=CC=C1 GEMHFKXPOCTAIP-UHFFFAOYSA-N 0.000 description 5
- 229920002857 polybutadiene Polymers 0.000 description 5
- 229920001228 polyisocyanate Polymers 0.000 description 5
- 239000005056 polyisocyanate Substances 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- 239000003054 catalyst Substances 0.000 description 4
- 239000011889 copper foil Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 4
- 239000004810 polytetrafluoroethylene Substances 0.000 description 4
- 239000001294 propane Substances 0.000 description 4
- 239000007870 radical polymerization initiator Substances 0.000 description 4
- 230000008054 signal transmission Effects 0.000 description 4
- 238000005829 trimerization reaction Methods 0.000 description 4
- BUZMJVBOGDBMGI-UHFFFAOYSA-N 1-phenylpropylbenzene Chemical compound C=1C=CC=CC=1C(CC)C1=CC=CC=C1 BUZMJVBOGDBMGI-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical group [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- QVDAKMPDCVJXFU-UHFFFAOYSA-N O(C#N)C1(CC=C(C=C1)C(C)(C)C1=CCC(C=C1)(OC#N)OC#N)OC#N Chemical compound O(C#N)C1(CC=C(C=C1)C(C)(C)C1=CCC(C=C1)(OC#N)OC#N)OC#N QVDAKMPDCVJXFU-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 3
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 239000000460 chlorine Chemical group 0.000 description 3
- 229910052801 chlorine Chemical group 0.000 description 3
- IMHDGJOMLMDPJN-UHFFFAOYSA-N dihydroxybiphenyl Natural products OC1=CC=CC=C1C1=CC=CC=C1O IMHDGJOMLMDPJN-UHFFFAOYSA-N 0.000 description 3
- 239000003822 epoxy resin Substances 0.000 description 3
- 239000004744 fabric Substances 0.000 description 3
- 238000005470 impregnation Methods 0.000 description 3
- 229920000647 polyepoxide Polymers 0.000 description 3
- 229920001721 polyimide Polymers 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 description 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 2
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 2
- ATHHXGZTWNVVOU-UHFFFAOYSA-N N-methylformamide Chemical compound CNC=O ATHHXGZTWNVVOU-UHFFFAOYSA-N 0.000 description 2
- IIGAAOXXRKTFAM-UHFFFAOYSA-N N=C=O.N=C=O.CC1=C(C)C(C)=C(C)C(C)=C1C Chemical compound N=C=O.N=C=O.CC1=C(C)C(C)=C(C)C(C)=C1C IIGAAOXXRKTFAM-UHFFFAOYSA-N 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 2
- AHZMUXQJTGRNHT-UHFFFAOYSA-N [4-[2-(4-cyanatophenyl)propan-2-yl]phenyl] cyanate Chemical compound C=1C=C(OC#N)C=CC=1C(C)(C)C1=CC=C(OC#N)C=C1 AHZMUXQJTGRNHT-UHFFFAOYSA-N 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 2
- ZSWFCLXCOIISFI-UHFFFAOYSA-N cyclopentadiene Chemical compound C1C=CC=C1 ZSWFCLXCOIISFI-UHFFFAOYSA-N 0.000 description 2
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000002657 fibrous material Substances 0.000 description 2
- SLGWESQGEUXWJQ-UHFFFAOYSA-N formaldehyde;phenol Chemical compound O=C.OC1=CC=CC=C1 SLGWESQGEUXWJQ-UHFFFAOYSA-N 0.000 description 2
- 150000003949 imides Chemical class 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 229920001568 phenolic resin Polymers 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- SCVFZCLFOSHCOH-UHFFFAOYSA-M potassium acetate Chemical class [K+].CC([O-])=O SCVFZCLFOSHCOH-UHFFFAOYSA-M 0.000 description 2
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical group OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- IPJGAEWUPXWFPL-UHFFFAOYSA-N 1-[3-(2,5-dioxopyrrol-1-yl)phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1=CC=CC(N2C(C=CC2=O)=O)=C1 IPJGAEWUPXWFPL-UHFFFAOYSA-N 0.000 description 1
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 1
- XMNIXWIUMCBBBL-UHFFFAOYSA-N 2-(2-phenylpropan-2-ylperoxy)propan-2-ylbenzene Chemical compound C=1C=CC=CC=1C(C)(C)OOC(C)(C)C1=CC=CC=C1 XMNIXWIUMCBBBL-UHFFFAOYSA-N 0.000 description 1
- WFUGQJXVXHBTEM-UHFFFAOYSA-N 2-hydroperoxy-2-(2-hydroperoxybutan-2-ylperoxy)butane Chemical compound CCC(C)(OO)OOC(C)(CC)OO WFUGQJXVXHBTEM-UHFFFAOYSA-N 0.000 description 1
- LLOUATGNPNDKLK-UHFFFAOYSA-N 2-tert-butylperoxy-2-methylpropane dodecanoic acid Chemical compound C(CCCCCCCCCCC)(=O)O.C(CCCCCCCCCCC)(=O)O.C(C)(C)(C)OOC(C)(C)C LLOUATGNPNDKLK-UHFFFAOYSA-N 0.000 description 1
- FLHBCOKNLNJEHU-UHFFFAOYSA-N 3-benzylidenepyrrolidine-2,5-dione Chemical compound O=C1NC(=O)CC1=CC1=CC=CC=C1 FLHBCOKNLNJEHU-UHFFFAOYSA-N 0.000 description 1
- GTYRFVGHYNRSKT-UHFFFAOYSA-N 3-benzylpyrrole-2,5-dione Chemical compound O=C1NC(=O)C(CC=2C=CC=CC=2)=C1 GTYRFVGHYNRSKT-UHFFFAOYSA-N 0.000 description 1
- UPMLOUAZCHDJJD-UHFFFAOYSA-N 4,4'-Diphenylmethane Diisocyanate Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=C(N=C=O)C=C1 UPMLOUAZCHDJJD-UHFFFAOYSA-N 0.000 description 1
- NZGQHKSLKRFZFL-UHFFFAOYSA-N 4-(4-hydroxyphenoxy)phenol Chemical group C1=CC(O)=CC=C1OC1=CC=C(O)C=C1 NZGQHKSLKRFZFL-UHFFFAOYSA-N 0.000 description 1
- 229920003319 Araldite® Polymers 0.000 description 1
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- 235000000177 Indigofera tinctoria Nutrition 0.000 description 1
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 1
- OWIKHYCFFJSOEH-UHFFFAOYSA-N Isocyanic acid Chemical class N=C=O OWIKHYCFFJSOEH-UHFFFAOYSA-N 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004962 Polyamide-imide Substances 0.000 description 1
- VMHLLURERBWHNL-UHFFFAOYSA-M Sodium acetate Chemical class [Na+].CC([O-])=O VMHLLURERBWHNL-UHFFFAOYSA-M 0.000 description 1
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 1
- NBICYCZLCAMSBG-UHFFFAOYSA-L [Co+2].CCCCCC=CC([O-])=O.CCCCCC=CC([O-])=O Chemical class [Co+2].CCCCCC=CC([O-])=O.CCCCCC=CC([O-])=O NBICYCZLCAMSBG-UHFFFAOYSA-L 0.000 description 1
- AVAYCNNAMOJZHO-UHFFFAOYSA-N [Na+].[Na+].[O-]B[O-] Chemical compound [Na+].[Na+].[O-]B[O-] AVAYCNNAMOJZHO-UHFFFAOYSA-N 0.000 description 1
- HPRSWAFSMNDEGT-UHFFFAOYSA-N [cyanato(diphenyl)methyl] cyanate Chemical compound C=1C=CC=CC=1C(OC#N)(OC#N)C1=CC=CC=C1 HPRSWAFSMNDEGT-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- XLJMAIOERFSOGZ-UHFFFAOYSA-N anhydrous cyanic acid Chemical class OC#N XLJMAIOERFSOGZ-UHFFFAOYSA-N 0.000 description 1
- 229920006231 aramid fiber Polymers 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- KQNZLOUWXSAZGD-UHFFFAOYSA-N benzylperoxymethylbenzene Chemical compound C=1C=CC=CC=1COOCC1=CC=CC=C1 KQNZLOUWXSAZGD-UHFFFAOYSA-N 0.000 description 1
- VCCBEIPGXKNHFW-UHFFFAOYSA-N biphenyl-4,4'-diol Chemical group C1=CC(O)=CC=C1C1=CC=C(O)C=C1 VCCBEIPGXKNHFW-UHFFFAOYSA-N 0.000 description 1
- 229940106691 bisphenol a Drugs 0.000 description 1
- KXZJHVJKXJLBKO-UHFFFAOYSA-N chembl1408157 Chemical class N=1C2=CC=CC=C2C(C(=O)O)=CC=1C1=CC=C(O)C=C1 KXZJHVJKXJLBKO-UHFFFAOYSA-N 0.000 description 1
- 239000007809 chemical reaction catalyst Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000007859 condensation product Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 150000001913 cyanates Chemical class 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000011152 fibreglass Substances 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000012943 hotmelt Substances 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 229940097275 indigo Drugs 0.000 description 1
- COHYTHOBJLSHDF-UHFFFAOYSA-N indigo powder Natural products N1C2=CC=CC=C2C(=O)C1=C1C(=O)C2=CC=CC=C2N1 COHYTHOBJLSHDF-UHFFFAOYSA-N 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 239000012766 organic filler Substances 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 239000011120 plywood Substances 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 235000011056 potassium acetate Nutrition 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910000108 silver(I,III) oxide Inorganic materials 0.000 description 1
- 239000001632 sodium acetate Chemical class 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- ZVCDLGYNFYZZOK-UHFFFAOYSA-M sodium cyanate Chemical class [Na]OC#N ZVCDLGYNFYZZOK-UHFFFAOYSA-M 0.000 description 1
- DVQHRBFGRZHMSR-UHFFFAOYSA-N sodium methyl 2,2-dimethyl-4,6-dioxo-5-(N-prop-2-enoxy-C-propylcarbonimidoyl)cyclohexane-1-carboxylate Chemical compound [Na+].C=CCON=C(CCC)[C-]1C(=O)CC(C)(C)C(C(=O)OC)C1=O DVQHRBFGRZHMSR-UHFFFAOYSA-N 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- UBOXGVDOUJQMTN-UHFFFAOYSA-N trichloroethylene Natural products ClCC(Cl)Cl UBOXGVDOUJQMTN-UHFFFAOYSA-N 0.000 description 1
- FQFKTKUFHWNTBN-UHFFFAOYSA-N trifluoro-$l^{3}-bromane Chemical compound FBr(F)F FQFKTKUFHWNTBN-UHFFFAOYSA-N 0.000 description 1
- 230000004580 weight loss Effects 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- RVXKJRWBHPHVOV-UHFFFAOYSA-L zinc;oct-2-enoate Chemical class [Zn+2].CCCCCC=CC([O-])=O.CCCCCC=CC([O-])=O RVXKJRWBHPHVOV-UHFFFAOYSA-L 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Polyurethanes Or Polyureas (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は、熱硬化性樹脂組成物およびその用途に係わり
、特に難燃性に優れたプリント回路基板用の熱硬化性樹
脂組成物および該組成物を用いたプリント回路板に関す
る。Detailed Description of the Invention [Field of Industrial Application] The present invention relates to a thermosetting resin composition and its uses, and particularly to a thermosetting resin composition for printed circuit boards with excellent flame retardancy and its use. The present invention relates to a printed circuit board using the composition.
[従来の技術]
従来、電子計算機等に使用される多周プリント回路板用
の樹脂材料としては、フェノール樹脂、エポキシ樹脂、
ポリイミド樹脂等が用いられてきた。しかし、最近の大
型電子計算機は、高速演算性が要求され、用いられる多
層プリント回路板にも厳しい特性が要求されるため、新
しい多層回路板材料の開発が進められている。[Prior Art] Conventionally, resin materials for multicircuit printed circuit boards used in electronic computers, etc., include phenol resin, epoxy resin,
Polyimide resins and the like have been used. However, recent large-scale electronic computers require high-speed calculation performance, and the multilayer printed circuit boards used are also required to have strict characteristics, so new multilayer printed circuit board materials are being developed.
一般に、電子計算機の演算速度は、これに用いられてい
る多層プリント同銘板の回路の信号伝送速度に大きく影
響を受ける。In general, the calculation speed of an electronic computer is greatly affected by the signal transmission speed of the multilayer printed nameplate circuit used therein.
こうした、回路の信号伝送進度は、絶縁層の誘電率に左
右され、低誘電率のものほど信号伝送進度が速い。従っ
て、低誘電率材料でプリント回路基板を形成することに
よって、計算機の演算速度を改善することができる。The progress of signal transmission in such a circuit depends on the dielectric constant of the insulating layer, and the lower the dielectric constant, the faster the signal transmission progress. Therefore, by forming the printed circuit board with a low dielectric constant material, the calculation speed of the computer can be improved.
低誘電率材料としては、ポリテトラフルオロエチレン(
PTFE)、ポリブタジェン等が知れている。Polytetrafluoroethylene (
PTFE), polybutadiene, etc.
また、上記のほかに低誘電率材料としては、主鎖に芳香
族や環式脂肪族、またはこれらを組み合わせた分極の小
さい描造を持つシアネート化合物(米国特許第4,55
9,399S’;)や、イソシアホー1〜化合物(米国
時評第4,353,769号)がある。In addition to the above, low dielectric constant materials include cyanate compounds with aromatic, cycloaliphatic, or a combination of these in the main chain (U.S. Patent No. 4,555).
9,399S';) and isothiaphor 1-compound (US Times No. 4,353,769).
[発明が解決しようとする課題]
しかし、PTFEは熱可梨性樹脂であるために、多層プ
リント回路板に用いた場合、寸法安定性、スルホール信
頼性が劣ると云う問題があった。また、適当な溶剤がな
いので、積層接着には加熱溶融圧着法に頼らざるを得な
かった。しかも、溶融温度が高い(250〜350℃)
ために1作業性が悪く、従来のエポキシ樹脂筒に比べて
扱いにくいなど問題が多かった。[Problems to be Solved by the Invention] However, since PTFE is a thermopolymer resin, when used in a multilayer printed circuit board, there is a problem that PTFE has poor dimensional stability and through-hole reliability. In addition, since there is no suitable solvent, the lamination bonding has had to rely on a hot-melt pressure bonding method. Moreover, the melting temperature is high (250-350℃)
Therefore, there were many problems such as poor workability and difficulty in handling compared to conventional epoxy resin cylinders.
また、ポリブタジェンは、側鎖に二重結合を有する 1
.2−ポリブタジェンと二官能性モノマの架橋型難燃剤
とを組み合わせた樹脂材料が開発されている(時開11
1”755−1264751弓・)。In addition, polybutadiene has a double bond in its side chain 1
.. A resin material that combines 2-polybutadiene and a crosslinked flame retardant made of a difunctional monomer has been developed (Jikai 11).
1”755-1264751 Bow・).
しかし、繊維質基材への含浸性を考慮し低分子量ポリマ
を用いると、得られたプリプレグの粘着性が高いために
プリプレグの裁断加工や保管がしにく)、積層接若時の
作業性にも影響を与える。However, if a low-molecular-weight polymer is used in consideration of its impregnability into fibrous base materials, the resulting prepreg has high adhesiveness, making it difficult to cut and store the prepreg), and workability during lamination and attachment. It also affects.
一方、プリプレグとした場合の粘着性が低い(タックフ
リー性)高分子是ポリマを用いたものは、ワニスの粘度
が高いために繊R質ノ、(材への含浸性が悪く、プリプ
レグの作成が容易でない。そのため、品質のよいプリン
ト回路基板を9;)ることかできない。更に、硬化反応
がラジカル重合による架橋反応であるために1反応速度
が速く制御が容易でない。On the other hand, when made into prepreg, products using polymers that have low tackiness (tack-free properties) have a high viscosity of varnish, resulting in fiber quality (poor impregnation into the material, which makes it difficult to prepare prepregs). Therefore, it is difficult to produce high-quality printed circuit boards9;). Furthermore, since the curing reaction is a crosslinking reaction by radical polymerization, the reaction rate is fast and cannot be easily controlled.
また、ポリブタジェンは、硬化による収縮が大きいため
に成形時にクラックが発生し易く、機械強度、耐熱性が
低く、回路を形成している銅箔との接着力も低い専の問
題がある。Further, polybutadiene has the following problems: it is prone to cracking during molding due to its large shrinkage upon curing, has low mechanical strength and heat resistance, and has low adhesion to the copper foil forming the circuit.
前記、シアネート化合物やイソシアネート化合物は、触
媒の存在下で3量化して、架橋密度の高い硬化物を得る
ことができる。また、該硬化物は誘電率が低く、寸法安
定性、耐熱性にも優れているが、プリント回路基板とし
ての重要な特性である難燃性が得られない(易燃性)と
云う欠点がある。The cyanate compound and isocyanate compound described above can be trimerized in the presence of a catalyst to obtain a cured product with a high crosslink density. In addition, although the cured product has a low dielectric constant and is excellent in dimensional stability and heat resistance, it has the disadvantage that it does not have flame retardancy (flammability), which is an important property for printed circuit boards. be.
本発明の1的は、低誘電率で難燃性の硬化物を与える熱
硬化性樹脂組成物およびそれを用いたプリント回路板、
並びにその製法を提供することにある。One aspect of the present invention is a thermosetting resin composition that provides a flame-retardant cured product with a low dielectric constant, and a printed circuit board using the same.
and its manufacturing method.
[課題を解決するための手段]
前記課題を解決する本発明の要旨は下記のとおりである
。[Means for Solving the Problems] The gist of the present invention for solving the above problems is as follows.
(I)一般式(I)
%式%(I)
(式中、R□は芳香族、環式脂肪族およびその混成体か
らなる群から選ばれたものであり、Aはシアネート基あ
るいはインシアネート基を示す。)で示されるシアネー
ト化合物あるいはイソシアネート化合物と。(I) General formula (I) % Formula % (I) (wherein R□ is selected from the group consisting of aromatic, cycloaliphatic and hybrids thereof, and A is a cyanate group or incyanate group) A cyanate compound or an isocyanate compound represented by (indicates a group).
一般式(■)
(式中、Xはフッ素、臭素、塩素を示し、R2は炭素数
2〜4のアルケニル基または不飽和カルボキシル基であ
り、また、Bは重合開始剤残基。General formula (■) (wherein, X represents fluorine, bromine, or chlorine, R2 represents an alkenyl group having 2 to 4 carbon atoms or an unsaturated carboxyl group, and B represents a polymerization initiator residue.
重合停止削代J!、)I、。、、Q:4M7:”−のい
ずれがであり、互いに同じでも異なってもよい。mは1
〜4.nは5以上)で示されるポリ(p−ヒドロキシス
チレン)誘ノ4体とを含む熱硬化性樹脂組成物。Polymerization stop cutting allowance J! ,)I,. , , Q:4M7:”-, which may be the same or different from each other. m is 1
~4. 1. A thermosetting resin composition comprising a poly(p-hydroxystyrene) diquintetramer represented by the formula (n is 5 or more).
(2)前記一般式(I)と一般式(II)で示される化
合物の配合比が重量比で20 : 80〜8o:20で
あることを特徴とする前項(I)記載の熱硬化性樹脂組
成物。(2) The thermosetting resin according to the above item (I), wherein the compounding ratio of the compounds represented by the general formula (I) and the general formula (II) is 20:80 to 8o:20 by weight. Composition.
(3)有機繊維、無機繊維の織布あるいは不織布に前項
(I)または(2)記載の熱硬化性樹脂組成物を40〜
70重足%含浸させてなることを特徴とする硬化性材料
。(3) Adding the thermosetting resin composition described in the preceding paragraph (I) or (2) to a woven fabric or nonwoven fabric of organic fibers or inorganic fibers.
A curable material characterized by being impregnated with 70% by weight.
(4)金属箔から成る導体と、繊維質基材に熱硬化性樹
脂組成物を含浸硬化して成る絶縁屑を有するプリント回
路板において、
前記熱硬化性樹脂組成物が一般式(I)%式%(I)
(式中、R□は芳香族、環式脂肪族およびその混成体か
らなる群から選ばれたものであり、Aはシアネート基あ
るいはインシアネート基を示す。)で示されるシアネー
ト化合物あるいはイソシアネート化合物と、
一般式(II)
(式中、Xはフッ素、臭素、#i素を示し、R2は炭素
数2〜4のアルケニル」kまたは不飽和カルあり、互い
に同じでも異なってもよい。mは1〜4.nは5以上)
で示されるポリ(p−ヒドロキシスチレン)誘導体と、
l個以上のN[d換不飽和イミド基を有する化合物を含
む熱硬化性樹脂組成物であることを特徴とするプリント
回路板。(4) A printed circuit board having a conductor made of metal foil and an insulating scrap made by impregnating and curing a thermosetting resin composition into a fibrous base material, wherein the thermosetting resin composition has the general formula (I)%. Cyanate represented by the formula %(I) (wherein R□ is selected from the group consisting of aromatic, cycloaliphatic and hybrids thereof, and A represents a cyanate group or incyanate group) compound or isocyanate compound, and the general formula (II) (wherein, Good. m is 1 to 4. n is 5 or more)
A poly(p-hydroxystyrene) derivative represented by
A printed circuit board characterized in that it is a thermosetting resin composition containing a compound having l or more N[d-substituted unsaturated imide groups.
(5)金属箔から戊る導体と、繊維質1゜(材に熱硬化
性樹脂組成物を含浸硬化して成る絶縁/flを有するプ
リント回路板において、
前記熱硬化性樹脂組成物が一般式(I)%式%(I)
(式中、R4は芳香族、環式脂肪族およびその混成体か
らなる群から選ばれたものであり、Aはシアネー1へ基
あるいはインシアネート基を示す。)で示されるシアネ
ート化合物あるいはインシアネート化合物と、
一般式(II)
(式中、Xはフッ素、臭素、塩素を示し、R3は炭素数
2〜4のアルケニル基または不飽和カルボキシル基であ
り、また、Bは重合開始剤残基。(5) In a printed circuit board having a conductor cut from metal foil and an insulation/fl made by impregnating and curing a fibrous material with a thermosetting resin composition, the thermosetting resin composition has the general formula (I) % Formula % (I) (wherein R4 is selected from the group consisting of aromatic, cycloaliphatic and hybrids thereof, and A represents a cyanate group or an incyanate group. ) and a cyanate compound or incyanate compound represented by general formula (II) (wherein, X represents fluorine, bromine, or chlorine, R3 is an alkenyl group having 2 to 4 carbon atoms or an unsaturated carboxyl group, , B is a polymerization initiator residue.
重合停止剤残基、1■、。、、D2讐ZH−のいずれか
であり、互いに同じでも異なってもよい、mは1〜4、
nは5以上)で示されるポリ(p−ヒドロキシスチレン
)誘導体と、1個以上のNfi換不飽和イミド基を有す
る化合物を含む熱硬化性樹脂組成物であることを特徴と
するプリント回路板。Polymerization terminator residue, 1■. , , D2enZH-, which may be the same or different from each other, m is 1 to 4,
A printed circuit board characterized in that it is a thermosetting resin composition containing a poly(p-hydroxystyrene) derivative represented by n=5 or more) and a compound having one or more Nfi-converted unsaturated imide groups.
(6)−数式(I)
%式%()
(式中、R1は芳香族、環式脂肪族およびその混成体か
らなる群から選ばれたものであり、Aはシアネート基あ
るいはイソシアネート基を示す、)で示されるシアネー
ト化合物あるいはイソシアネ−1・化合物と、
一般式(II)
(式中、Xはフッ素、臭素、塩素を示し、R2は炭素数
2〜4のアルケニル基または不飽和カルあり、互いに同
じでも異なってもよい。mは1〜4.nは5以上)で示
されるポリ(p−ヒドロキシスチレン)誘導体とを含む
熱硬化性樹脂組成物を加熱してプレポリマを作成する工
程、前記プレポリマを溶剤に溶解し繊維質基材に含浸、
乾燥してプリプレグを作成する工程、前記プリプレグを
複数枚積層し、導体用金属箔と加圧、加熱する工程、
を含むプリント回路板の製法。(6) - Formula (I) % Formula % () (wherein R1 is selected from the group consisting of aromatic, cycloaliphatic and hybrids thereof, and A represents a cyanate group or an isocyanate group , ) and a cyanate compound or isocyanate-1 compound represented by the general formula (II) (wherein, X represents fluorine, bromine, or chlorine; and a poly(p-hydroxystyrene) derivative represented by m is 1 to 4 and n is 5 or more) which may be the same or different from each other. Dissolve the prepolymer in a solvent and impregnate it into the fibrous base material.
A method for manufacturing a printed circuit board, comprising the steps of drying to create a prepreg, laminating a plurality of the prepregs, pressurizing them with a conductor metal foil, and heating them.
(7)−数式(I)
%式%
(式中、R4は芳香族、環式脂肪族およびその混成体か
らなる群から選ばれたものであり、Aはシアネート基あ
るいはイソシアネート基を示す。)で示されるシアネー
ト化合物あるいはイソシアネート化合物と、
一般式(■)
(式中、Xはフッ素、臭素、塩素を示し、R2は炭素数
2〜4のアルケニル基または不飽和カルあり、互いに同
じでも異なってもよい1mは1〜4.nは5以上)で示
されるポリ(p−ヒドロキシスチレン)誘導体と、1個
以上のN置換不飽和イミド基を有する化合物を含む熱硬
化性樹脂組成物を加熱してプレポリマを作成する工程、
前記プレポリマを溶剤に溶解し#at質基材に含浸、乾
燥してプリプレグを作成する工程、前記プリプレグを複
数枚積層し、更に導体用金Xi! ?nと加圧、加熱し
て接着する工程、を含むプリント回路板の製法。(7) - Formula (I) %Formula% (wherein R4 is selected from the group consisting of aromatic, cycloaliphatic and hybrids thereof, and A represents a cyanate group or an isocyanate group.) A cyanate compound or an isocyanate compound represented by the general formula (■) (wherein, A thermosetting resin composition containing a poly(p-hydroxystyrene) derivative represented by the formula 1m is 1 to 4 and n is 5 or more and a compound having one or more N-substituted unsaturated imide groups is heated. A step of dissolving the prepolymer in a solvent, impregnating it into an #at base material, and drying it to create a prepreg. A step of laminating a plurality of sheets of the prepreg, and further forming a conductor gold Xi! ? A method for manufacturing a printed circuit board, which includes the steps of bonding by applying pressure and heating.
本発明は、前記−数式(りで示されるシアネート、イソ
シアネートの少なくとも1挿を含む化合物に、−数式(
Tl)で示される架橋型難燃剤を配合することによって
、誘電率を損なうことなく難燃性の優れた樹脂組成物を
得ることができることを見出し本発明に至ったのである
。The present invention provides a compound containing at least one cyanate or isocyanate represented by the formula -
The inventors have discovered that by blending a crosslinked flame retardant represented by Tl), a resin composition with excellent flame retardancy can be obtained without impairing the dielectric constant, leading to the present invention.
本発明において、−数式(I)で示される化合物として
は、ビスフェノール−A−ジシアネート(4,4’−ジ
シアネートジフェニルプロパン)、ビスフェノール−A
−ジイソシアネート(4,4’−ジイソシアネートジフ
ヱニルプロパン)、テトラメチルキシレンジシアネート
、テトラメチルキシレンジイソシアネート、ジフェニル
メタンジシアネート、ジフェニルメタンジイソシアネー
ト、R1が4,4′−ジヒドロキシジフェニルオキシド
、レゾルシノール、4゜4′−チオジフェノール3.3
’、5.5’テトラブロモビスフェノール−A−2,2
’6.6′−テl−ラブロモビスフェノールーA、3−
フェニルビスフェノール−A、4.4′ジヒドロキシビ
フエニル、2,2′−ジヒドロキシビフェニル、2.2
’、4.4’−テトラヒドロキシビフェニルメタン、2
.2’、6゜6′−テトラメチル−3,3’、5.5’
−テ1−ラブロモビスフェノールーA、5,5′−ジメ
トキシビスフェノール−A、ジシクロペンタジェンのビ
スフェノール−A、トリシクロペンタジェンのビスフェ
ノールのシアネート及びイソシアネート、フェノールホ
ルムアルデヒド縮合物のポリイソシアネート、フェノー
ルジシクロペンタジェンの縮合物のポリシアネート及び
ポリイソシアネート、2.2’、4.4’−テトラヒド
ロキシジフェニルメタンのポリシアネート及びポリイソ
シアネー1− ’5で示されるものがあり、これらは−
m以上使用できる。In the present invention, the compound represented by formula (I) includes bisphenol-A-dicyanate (4,4'-dicyanate diphenylpropane), bisphenol-A-dicyanate (4,4'-dicyanate diphenylpropane),
-diisocyanate (4,4'-diisocyanate diphenylpropane), tetramethylxylene diisocyanate, tetramethylxylene diisocyanate, diphenylmethane dicyanate, diphenylmethane diisocyanate, R1 is 4,4'-dihydroxydiphenyl oxide, resorcinol, 4°4' -thiodiphenol 3.3
',5.5'tetrabromobisphenol-A-2,2
'6.6'-tel-labromobisphenol-A, 3-
Phenylbisphenol-A, 4.4'dihydroxybiphenyl, 2,2'-dihydroxybiphenyl, 2.2
', 4.4'-tetrahydroxybiphenylmethane, 2
.. 2',6゜6'-tetramethyl-3,3',5.5'
-Te1-Labromobisphenol-A, 5,5'-dimethoxybisphenol-A, bisphenol-A of dicyclopentadiene, cyanate and isocyanate of bisphenol of tricyclopentadiene, polyisocyanate of phenol-formaldehyde condensation product, polyisocyanate of phenol-formaldehyde condensate, There are polycyanates and polyisocyanates of condensates of cyclopentadiene, polycyanates and polyisocyanates of 2.2', 4.4'-tetrahydroxydiphenylmethane, and polyisocyanates 1-'5, which are -
Can be used for more than m.
また、一般式(n)で表せる化合物としては、ポリ(p
−ビニルブロモフェニルアリルエーテル)、ポリ(p−
ビニルブロモフェニルイソプロペニルエーテル)、ポリ
(p−ビニルブロモフェニル1、l′−ジメチルブテニ
ルエーテル)、ポリ(p−ビニルブロモフェニルアリル
エステル)等がある。In addition, as a compound represented by the general formula (n), poly(p
-vinyl bromophenyl allyl ether), poly(p-
(vinyl bromophenyl isopropenyl ether), poly(p-vinyl bromophenyl 1, l'-dimethylbutenyl ether), poly(p-vinyl bromophenyl allyl ester), and the like.
ここで、化合物(II )のnは5以上でこの値は併用
した化合物(I)のtR類、分子量および(I)と(I
T)の組成比によってきまるが、5〜100の間が奸ま
しい。Here, n of compound (II) is 5 or more, and this value is determined by the tRs, molecular weight, and (I) and (I) of compound (I) used together.
Although it depends on the composition ratio of T), it is preferably between 5 and 100.
nが大き過ぎる場合は樹脂の粘度が高く基材への含浸性
が悪くなり、積屑接着時のボイド発生の原因となる。反
対に、5未満の場合は化合物としての保イf安定性が恋
いこと)、樹脂の流:FJJ性がよすぎて、積荊、接着
時に樹脂が流失する。If n is too large, the viscosity of the resin will be high and impregnation into the base material will be poor, leading to the generation of voids during adhesion of debris. On the other hand, if it is less than 5, the retention stability as a compound is poor).Resin flow: FJJ properties are too good, and the resin flows away during piling and adhesion.
上記の化合物(I)、(II)の配合比は、重量比で2
0 : 80ないし80 : 20の範囲であればよい
。前者の配合比が大きいと難燃性が不十分となり、後昔
の配合比が大きいと低誘電率材料としての特徴が十分に
現れない。The compounding ratio of the above compounds (I) and (II) is 2 by weight.
The range may be from 0:80 to 80:20. If the former compounding ratio is large, the flame retardance will be insufficient, and if the latter compounding ratio is large, the characteristics as a low dielectric constant material will not be fully exhibited.
次に、本発明における積層板の製法について説明する。Next, a method for manufacturing a laminate according to the present invention will be explained.
まず、前記一般式(I)および(II)の化合物の所定
の配合比で混合したものを有機溶剤に溶解してワニスを
調製する。このとき溶解促進のため加熱してもよい。First, a varnish is prepared by dissolving a mixture of the compounds of general formulas (I) and (II) in a predetermined blending ratio in an organic solvent. At this time, heating may be applied to promote dissolution.
上記の化合物(I)と(II)よりなる樹脂組成物に、
架橋助剤として、1個以上のN置換不飽和イミド4品を
イfする化合物を配合することができる。A resin composition consisting of the above compounds (I) and (II),
As a crosslinking aid, a compound containing one or more N-substituted unsaturated imides can be blended.
上記N訛換不飽和イミド基をイアする化合物とは、例え
ば0−1m −11)−のフェニルマレイミド、フェニ
ルシトラコンイミド、フェニルイタコンイミド、フェニ
ルナジックイミド、フェニルメチルエンドメチレンテト
ラヒドロフタルイミド、N。The above-mentioned compounds having an N-converted unsaturated imide group include, for example, 0-1m-11)-phenylmaleimide, phenylcitraconimide, phenylitaconimide, phenylnasic imide, phenylmethylendomethylenetetrahydrophthalimide, N.
N’−P−フェニレンビスマレイミド、N、N’−P−
フェニレンビスメチルエンドメチレンテトラヒドロフタ
ルイミド、N、N’−P−フェニレンビスシトラコンイ
ミド、N、N’−P−フェニレンビスイタコンイミド、
N、N′−m−キシレンビスマレイミド、N、N’−m
−フェニレンビスマレイミド、N、N’−(メチレンジ
ーP−フェニレン)ビスマレイミド、N、N’−4,4
′−ジフェニルチオエーテルビスマレイミト、N。N'-P-phenylene bismaleimide, N, N'-P-
Phenylenebismethylendomethylenetetrahydrophthalimide, N,N'-P-phenylenebiscitraconimide, N,N'-P-phenylenebisitaconimide,
N, N'-m-xylene bismaleimide, N, N'-m
-Phenylene bismaleimide, N,N'-(methylene di-P-phenylene)bismaleimide, N,N'-4,4
'-Diphenylthioether bismaleimito, N.
N’−4,4′−ジジフェニルエーテルビスマレイミド
、N、N’−メチレンビス(3−クロロ−フェニレン)
マレイミド、N、N’−(スルホニルジー■)−フェニ
レン)ビスマレイミド、N。N'-4,4'-didiphenyl ether bismaleimide, N,N'-methylenebis(3-chloro-phenylene)
maleimide, N, N'-(sulfonyldi)-phenylene)bismaleimide, N.
N′−4,4’−ジフェニルシクロヘキサンビスマレイ
ミド、2,2−ビス(4−(/1−マレイミドフェノキ
シ)フェニル〕プロパン、2,2−ビス(4−(4−マ
レイミドフェノキシ)フェニル〕−1,1,1,3,3
,3−へキサフルオロプロパン、2,2−ビス(4−(
4−マレイミド−2−トリフルオロメチルフェノキシ)
フェニル〕−1,1,l、3,3.3−ヘキサフルオロ
プロパン算のビスマレイミドが、また、アニリンとアル
デヒドの縮合物と無水マレイン酸とを反応させて得られ
る次式(I[I)で示される多価マレイミドな(ここで
pは1〜10の整数)
有機溶剤としては、例えばトルエン、キシレン、メチル
エチルケトン、メチルイソブチルケトン。N'-4,4'-diphenylcyclohexane bismaleimide, 2,2-bis(4-(/1-maleimidophenoxy)phenyl)propane, 2,2-bis(4-(4-maleimidophenoxy)phenyl)-1 ,1,1,3,3
, 3-hexafluoropropane, 2,2-bis(4-(
4-maleimido-2-trifluoromethylphenoxy)
phenyl]-1,1,1,3,3.3-hexafluoropropane bismaleimide is also obtained by the following formula (I[I) obtained by reacting a condensate of aniline and aldehyde with maleic anhydride. Examples of the polyvalent maleimide organic solvent (where p is an integer of 1 to 10) include toluene, xylene, methyl ethyl ketone, and methyl isobutyl ketone.
メタノール、エタノール、3−メトキシプロパツール、
N、N−ジメチルホルムアミド、N−メチルピロリドン
、ジメチルスルホキシド、トリクロロエチレン等がある
が、前記化合物を均一に混合溶解するものであればよい
。methanol, ethanol, 3-methoxypropertool,
Examples include N,N-dimethylformamide, N-methylpyrrolidone, dimethylsulfoxide, and trichloroethylene, but any material that can uniformly mix and dissolve the above compounds may be used.
調製したワニスにシアネート基およびイソシアネート共
の3量化反応触媒およびラジカル重合開始剤を適量添加
し、含浸用ワニスとする。Appropriate amounts of a cyanate group and isocyanate trimerization reaction catalyst and a radical polymerization initiator are added to the prepared varnish to obtain a varnish for impregnation.
上記3量化触媒としては、ナフテン酸コバルト、オクテ
ン酸コバルト、オクテン酸亜鉛、酢酸カリウム、酢酸ナ
トリウム、シアン化ナトリウム、シアン酸ナトリウム、
イソシアン酸、はう素化ナトリウム等の金属塩、ナトリ
ウムメトキシドニ水酸化ナトリウム、ピリジン等の塩、
トリエチルアミン等の第三級アミン類、塩化アルミニウ
ム、三フッ化臭素、塩化第二鉄、塩化チタニウム、塩化
亜鉛等のルイス酸などがある。The trimerization catalysts include cobalt naphthenate, cobalt octenoate, zinc octenoate, potassium acetate, sodium acetate, sodium cyanide, sodium cyanate,
Isocyanic acid, metal salts such as sodium boronate, salts such as sodium methoxide, sodium hydroxide, pyridine, etc.
Examples include tertiary amines such as triethylamine, Lewis acids such as aluminum chloride, bromine trifluoride, ferric chloride, titanium chloride, and zinc chloride.
また、ラジカル重合開始剤としては、ベンゾイルパーオ
キシド、ジクミルパーオキシド、メチルエチルケトンパ
ーオキシド、t−ブチルパーオキシドジラウレート、ジ
ーし一ブチルパーオキシフタレート、ジベンジルパーオ
キシド、2,5−ジメチル−2,5−ジ(t−ブチルパ
ーオキシ)ヘキシン−3等があり、これらは樹脂組成物
100重量部に対し0.1〜10重足部用いる。In addition, as a radical polymerization initiator, benzoyl peroxide, dicumyl peroxide, methyl ethyl ketone peroxide, t-butyl peroxide dilaurate, di-butyl peroxy phthalate, dibenzyl peroxide, 2,5-dimethyl-2, There are 5-di(t-butylperoxy)hexyne-3 and the like, and these are used in an amount of 0.1 to 10 parts by weight per 100 parts by weight of the resin composition.
次に、上記で得られた含浸用ワニスを繊維質基材に含浸
または塗布し、室温〜170℃で乾燥し、粘着性のない
プリプレグを得る。この時の乾燥温度は、使用した溶剤
およびラジカル重合開始剤によって決まる。Next, a fibrous base material is impregnated or coated with the impregnating varnish obtained above and dried at room temperature to 170°C to obtain a non-tacky prepreg. The drying temperature at this time is determined by the solvent and radical polymerization initiator used.
次いで、得られたプリプレグを所定枚数重ねて、100
〜250℃、好ましくは、120〜250℃で工〜10
0kgf/cm2の加圧下テ加熱硬化させ積層板を得る
。Next, a predetermined number of sheets of the obtained prepreg were stacked to form 100 sheets.
~250℃, preferably 120~250℃~10
A laminate is obtained by heating and curing under a pressure of 0 kgf/cm2.
上記繊維質基材としては、一般に積治材料として使用さ
れているものが使用できる。As the above-mentioned fibrous base material, those that are generally used as adhesive materials can be used.
無機質の繊維質」、(材としては、5in2、Ag2O
,等を主成分とするCガラス、Cガラス、Aガラス、S
ガラス、Dガラス、YM−31−Aガラス、および石英
を使用したQガラス算のガラス繊維の織布あるいは不織
布がある。また、有機質繊維としては、芳香族ポリアミ
ドイミド骨格を有する高分子化合物を主成分とするアラ
ミド繊維の織布あるいは不織布がある。"Inorganic fibrous material" (Material: 5in2, Ag2O
, etc., C glass, C glass, A glass, S
Glass, D glass, YM-31-A glass, and Q glass fiberglass woven or nonwoven fabrics using quartz are available. Further, as the organic fiber, there is a woven fabric or non-woven fabric of aramid fiber whose main component is a polymer compound having an aromatic polyamide-imide skeleton.
また、本発明の組成物には、目的と用途に応じて、シリ
カなどに代表される無機質フィラ、あるいはパープルオ
ロエチレン粉末、ポリアミド粉末などの有機質フィラを
添加することができる。特に、上記フィラは、誘電率が
3.3以下のものを選ぶことが、本発明の目的を達成す
る上で重要である。Furthermore, depending on the purpose and use, an inorganic filler such as silica or an organic filler such as purple oleoethylene powder or polyamide powder may be added to the composition of the present invention. In particular, it is important to select the filler having a dielectric constant of 3.3 or less in order to achieve the object of the present invention.
[作用]
本発明の熱硬化性樹脂組成物が低誘電率、かつ、難燃性
であるのは、前記一般式(I)で示すシアネート、イソ
シアネート化合物が低誘電率であることはもちろんであ
るが、前記一般式(II)で示される高分子架橋型難燃
剤が予想外に低誘電率の材料であり、また、それが、前
記シアネート、イソシアネート化合物と共重合しても難
燃性51(i、びに電気特性が損なわれないことにある
。[Function] The reason why the thermosetting resin composition of the present invention has a low dielectric constant and is flame retardant is that the cyanate and isocyanate compound represented by the general formula (I) have a low dielectric constant. However, the polymeric cross-linked flame retardant represented by the general formula (II) is a material with an unexpectedly low dielectric constant, and even when copolymerized with the cyanate or isocyanate compound, it has a flame retardant property of 51 ( i, and the electrical properties are not impaired.
[実施例] 次に、本発明を実施例により説明する。[Example] Next, the present invention will be explained by examples.
〔実施例 1〕
一般式(I)で示されるシアネート化合物として、XU
−71787(ダウケミカル社製)と、難燃剤として、
一般式(II)で示されるポリ(p−ビニルブロモフェ
ニルメタクリレート)(平均分子量: 6600.式(
II)においてmが約1゜5、nが約20)を、重量比
で1:lに混合し、溶剤としてN、N−ジメチルホルム
アミドを用いて、60℃、30分加熱溶解し、固形分5
0重量%のワニスをyA製した。[Example 1] As a cyanate compound represented by general formula (I), XU
-71787 (manufactured by Dow Chemical Company) and as a flame retardant,
Poly(p-vinylbromophenyl methacrylate) represented by general formula (II) (average molecular weight: 6600.Formula (
In II), m is about 1°5 and n is about 20) are mixed at a weight ratio of 1:l, and heated and dissolved at 60°C for 30 minutes using N,N-dimethylformamide as a solvent to reduce the solid content. 5
A 0% by weight varnish was manufactured by yA.
該ワニスを冷却後ラジカル重合開始剤として。After cooling the varnish, use it as a radical polymerization initiator.
2.5−ジ(t−ブチルパーオキシ)ヘキシン−3(口
本抽脂製)をワニス固形分100重量部に対して0.5
重量部、更に、シアネートの3量化触媒としてナフテン
酸コバルトを前記XU−71787の100重量部に対
し1重量部添加した。2.5-di(t-butylperoxy)hexyne-3 (manufactured by Kuchimoto Bokusai Co., Ltd.) at 0.5 parts by weight per 100 parts by weight of varnish solid content.
Furthermore, 1 part by weight of cobalt naphthenate was added as a cyanate trimerization catalyst per 100 parts by weight of the XU-71787.
このワニスをガラスクロス(日東助層Eガラス。Apply this varnish to glass cloth (Nitto Suke layer E glass).
厚さ50μm)に含浸塗布し、大気中で150℃。50 μm thick) and coated at 150°C in the atmosphere.
10分間乾燥させプリプレグを得た。該プリプレグを2
0枚fR層し、30kgf/cm”、130℃で40分
、170℃で1時間、200℃で1時間加熱、硬化して
積層板を得た。It was dried for 10 minutes to obtain a prepreg. 2 of the prepreg
A laminate was obtained by heating and curing 0 fR layers at 30 kgf/cm'' at 130°C for 40 minutes, at 170°C for 1 hour, and at 200°C for 1 hour.
また、前記ワニスをポリエチレンテレフタレートフィル
ム上に薄く塗布し150℃、10分乾燥する。こうして
得られた粉末状の樹脂組成物を150mmX100mm
X2mmtにプレス成形し、前記プリプレグと同様な条
件で硬化して樹脂板を得た。Further, the varnish is thinly applied onto a polyethylene terephthalate film and dried at 150° C. for 10 minutes. The powdered resin composition thus obtained was placed in a 150 mm x 100 mm
It was press-molded to a size of x2 mmt and cured under the same conditions as the prepreg to obtain a resin plate.
〔実施例 2〕
シアネート化合物として2,2−ビス(4,4’−ジシ
アナトフェニル)プロパンを用いた他は、実施例1と同
様にして、積層板および樹脂板を作成した。[Example 2] A laminate and a resin board were produced in the same manner as in Example 1, except that 2,2-bis(4,4'-dicyanatophenyl)propane was used as the cyanate compound.
〔実施例 3〕
シアネート化合物としてジトリフルオロビス(4,4’
−ジシアナトフェニル)メタンを用いた他は、実施例1
と同様にして積Jet板および樹脂板を作成した。[Example 3] Ditrifluorobis(4,4'
Example 1 except that -dicyanatophenyl)methane was used.
A jet board and a resin board were prepared in the same manner as above.
〔実施例 4〕
シアネート化合物として2,2−ビス(4,4’−ジシ
アナトフェニル)プロパン、難燃剤としてポリ(p−ビ
ニルブロモフェニルアクリレート)を用いた他は、実施
例工と同様にして積層板および樹脂板を作成した。[Example 4] The same procedure as in Example was carried out except that 2,2-bis(4,4'-dicyanatophenyl)propane was used as the cyanate compound and poly(p-vinyl bromophenyl acrylate) was used as the flame retardant. Laminated plates and resin plates were created.
〔実施例 5〕
シアネート化合物として2,2−ビス(4,4’−ジシ
アナトフェニル)プロパン、難燃剤としてポリ(p−ビ
ニルブロモフェニルアクリレート)(平均分子量: 6
600.mが約2.nが約20)、および芳香族ビスマ
レイミドである2、2− (4−(4−マレイミドフェ
ノキシ)フェニル〕プロパンを重量比でそれぞれ4:4
:2に配合したものを、N、N−ジメチルホルムアミド
に溶解し、その他は、実施例1と同様にして積層板およ
び樹脂板を作成した。[Example 5] 2,2-bis(4,4'-dicyanatophenyl)propane as a cyanate compound, poly(p-vinyl bromophenyl acrylate) as a flame retardant (average molecular weight: 6)
600. m is about 2. n is about 20), and aromatic bismaleimide 2,2-(4-(4-maleimidophenoxy)phenyl)propane in a weight ratio of 4:4, respectively.
:2 was dissolved in N,N-dimethylformamide, and a laminate and a resin board were produced in the same manner as in Example 1 except for the following.
〔実施例 6〕
イソシアネート化合物として2,2−ビス(4゜4′−
ジイソシアナトフェニル)プロパンを用いた他は、実施
例1と同様にして、vL荊板および樹脂板を作成した。[Example 6] 2,2-bis(4゜4'-
A vL plywood board and a resin board were prepared in the same manner as in Example 1, except that diisocyanatophenyl)propane was used.
〔実施例 7〕
難燃剤としてポリ(p−ビニルブロモフェニルアクリレ
ート)(平均分子量: 3300.mが約2、nが約1
0)を用いた他は、実施例1と同様にして、積層板およ
び樹脂板を作成した。[Example 7] Poly(p-vinyl bromophenyl acrylate) as a flame retardant (average molecular weight: 3300.m is about 2, n is about 1)
A laminate plate and a resin plate were produced in the same manner as in Example 1, except that Example 1 was used.
〔実施例 8〕
難燃剤としてポリ(p−ビニルブロモフェニルアリルエ
ーテル)(平均分子量:8800.mが約1.8.nが
約30)を用いた他は、実施例1と同様にして、積Jf
l板および樹脂板を作成した。[Example 8] The same procedure as in Example 1 was carried out, except that poly(p-vinyl bromophenyl allyl ether) (average molecular weight: 8800.m was about 1.8.n was about 30) as the flame retardant. Product Jf
A l plate and a resin plate were created.
〔実施例 9〕
イソシアネート化合物として2.2−ビス(4゜4′−
ジイソシアナトフェニル)プロパン、難燃剤としてポリ
(p−ビニルブロモフェニルアクリレート)(平均分子
量:6600.mが約2.nが約20)を用いた他は、
実施例1と同様にして、積層板および樹脂板を作成した
。[Example 9] 2,2-bis(4゜4'-
diisocyanatophenyl) propane and poly(p-vinyl bromophenyl acrylate) (average molecular weight: 6600.m is approximately 2.n is approximately 20) as a flame retardant.
A laminate board and a resin board were created in the same manner as in Example 1.
〔実施例 10〕
シアネート化合物として、ジシクロペンタンジシアネー
トを用いた他は、実施例1と同様にして、積層板および
樹脂板を作成した。[Example 10] A laminate and a resin board were produced in the same manner as in Example 1, except that dicyclopentanedicyanate was used as the cyanate compound.
〔実施例 11〕
シアネート化合物として、トリシクロペンタンジシアネ
ートを用いた他は、実施例りと同様にして、積層板およ
び樹脂板を作成した。[Example 11] A laminate and a resin board were produced in the same manner as in Example 1, except that tricyclopentanedicyanate was used as the cyanate compound.
〔実施例 12〕
シアネート化合物として、xu−71787を、難燃剤
としてポリ(p−ビニルブロモフェニルメタフリレート
)(平均分子量: 27000.mが約4.nが約90
)を重量比で7:3に混合したものを用いた他は、実施
例1と同様にして、積層板および樹脂板を作成した。[Example 12] Xu-71787 was used as a cyanate compound, and poly(p-vinyl bromophenyl methafrylate) was used as a flame retardant (average molecular weight: 27000.m was about 4.n was about 90
) was used in a weight ratio of 7:3, but in the same manner as in Example 1 to produce a laminate and a resin board.
〔比較例 1〕
シアネート化合物XU−71787(73100重量部
に対し、ナフテン酸コバルト1重量部を加えN、N−メ
チルホルムアミドに溶解しワニスとする。該ワニスを用
い実施例1と同様にして、積層板および樹脂板を作成し
た。[Comparative Example 1] To cyanate compound XU-71787 (73,100 parts by weight, 1 part by weight of cobalt naphthenate was added and dissolved in N,N-methylformamide to prepare a varnish. Using the varnish, the same procedure as in Example 1 was carried out. Laminated plates and resin plates were created.
〔比較例 2〕
ポリイミド材MCL−I67(日立化成工業MB)を用
い実施例1と同様にして、積層板を得た。[Comparative Example 2] A laminate was obtained in the same manner as in Example 1 using polyimide material MCL-I67 (Hitachi Chemical MB).
〔比較例 、3〕
エポキシ変性ポリブタジェンEP−50(日本曹達製)
と難燃性架橋剤ポリ(p−ビニルブロモフェニルメタク
リレート)〔平均分子i: 6600゜式(n)におい
てmが約1.5.nが約20)を、重量比で20 :
80で混合し、溶剤としてN、N−ジメチルホルムアミ
ドを用いて60℃、30分間加熱溶解して、固形分50
重量%のワニスを1i製した。[Comparative example, 3] Epoxy modified polybutadiene EP-50 (manufactured by Nippon Soda)
and flame retardant crosslinking agent poly(p-vinyl bromophenyl methacrylate) [average molecular i: 6600° m in formula (n) is about 1.5. n is approximately 20), and the weight ratio is 20:
Mix at 80°C and heat dissolve at 60°C for 30 minutes using N,N-dimethylformamide as a solvent to reduce the solid content to 50°C.
% by weight of varnish was prepared.
該ワニスに、2,5−ジ(t−ブチルパーオキシ)ヘキ
シン−3(日本抽脂M)をワニス固形分100重量部に
対し2重量部、エポキシ硬化剤としてジシアンジアミド
(和光純薬製)を2重量部加えた。こうして得たワニス
を用いて、実施例1と同じ方法で樹脂板および積層板を
得た。To the varnish, 2 parts by weight of 2,5-di(t-butylperoxy)hexyne-3 (Nippon Juzo M) was added to 100 parts by weight of the solid content of the varnish, and dicyandiamide (manufactured by Wako Pure Chemical Industries, Ltd.) was added as an epoxy curing agent. 2 parts by weight were added. Using the varnish thus obtained, a resin plate and a laminate were obtained in the same manner as in Example 1.
〔比較例 4〕
シアネート化合物としてXU−71787、難燃性架橋
剤としてブロム化エポキシ樹脂アラルダイト8011(
チバ・ガイギ製)を重量比1:1で混合し、50重量%
のメチルイソブチルケトン溶液を作成した。該溶液にナ
フテン酸コバルトおよびジシアンジアミドをワニス固形
分に対し、それぞれ1重量部加えた後、実施例1と同じ
方法で樹脂板および積層板を得た。[Comparative Example 4] XU-71787 was used as the cyanate compound, and brominated epoxy resin Araldite 8011 (
(manufactured by Ciba Geigi) at a weight ratio of 1:1, 50% by weight.
A methyl isobutyl ketone solution was prepared. After adding 1 part by weight of cobalt naphthenate and dicyandiamide to the solution based on the solid content of the varnish, a resin plate and a laminate were obtained in the same manner as in Example 1.
〔樹脂板および積層板の特性の測定方法〕■ 比iW電
電
率 I 5−C−6481に従いLPインピーダンスア
ナライザ4192A(ヒユーレットパラカード製)を用
いてI M )I zにおける比誘電率を測定した。[Method for measuring properties of resin plates and laminates] ■ Specific dielectric constant I 5-C-6481 The relative dielectric constant at I z was measured using LP Impedance Analyzer 4192A (manufactured by Hewlett Paracard). .
■ 曲げ強度
オートグラフDDS−5000(島津製作所製)を用い
1幅50 m m X長さ45mmX厚さ2 m mの
試料を、室温および180℃で支点間距離30m m
、たわみ速度2mm/分で測定した。■ Using bending strength autograph DDS-5000 (manufactured by Shimadzu Corporation), a sample of width 50 mm x length 45 mm x thickness 2 mm was measured at room temperature and 180°C with a distance between fulcrums of 30 mm.
, was measured at a deflection rate of 2 mm/min.
■ 熱分解開始温度
粉末状の試料Longを高速示差熱天秤TGD−700
0I−IR(日本真空理工型)を用いて、大気中で10
℃/分で昇温しで熱減量を測定し、その減量開始温度よ
り求めた。■ Thermal decomposition start temperature The powder sample Long is measured using a high-speed differential thermal balance TGD-700.
10 in the atmosphere using 0I-IR (Japan Vacuum Riko type)
Thermal loss was measured by increasing the temperature at a rate of °C/min, and was determined from the temperature at which the weight loss started.
■ 吸湿率
JIS−C−6481に従い、65℃、95%RHで吸
湿させ、その飽和吸湿量から吸湿率(%)を求めた。(2) Moisture absorption rate According to JIS-C-6481, moisture was absorbed at 65° C. and 95% RH, and the moisture absorption rate (%) was determined from the saturated moisture absorption amount.
■ 熱膨張率
6mmX6mmの試料を用いて、熱物理試験装v1TM
A−150o (日本具全理工製)により、2℃/分で
昇温し、50〜220℃の範囲の熱膨張曲線より求めた
。■ Using a sample with a thermal expansion coefficient of 6 mm x 6 mm, the thermal physical test equipment v1TM
A-150o (manufactured by Nippon Guzenriko Co., Ltd.) was used to raise the temperature at a rate of 2°C/min, and the temperature was determined from a thermal expansion curve in the range of 50 to 220°C.
■ 難燃性 UL−94規格に従い丞直法により評価した。■ Flame retardant Evaluation was made by the direct method according to the UL-94 standard.
■ ビール強度
銅張積層板より所定サイズの試料を切り出し、JIS−
C−6481に従い41り定した。■ Cut out a sample of a specified size from a beer-strength copper-clad laminate and pass the JIS-
41 was determined according to C-6481.
前記実施例1〜12および比較例1〜4により作成した
積層板の特性を第1表に示す。また、同じく樹脂板の特
性を第2表に示す。Table 1 shows the properties of the laminates produced in Examples 1 to 12 and Comparative Examples 1 to 4. Similarly, the properties of the resin plate are shown in Table 2.
第1表
第2表
〔実施例 13〕
一般式(I)で示されるシアネート化合物として、XU
−71787(ダウケミカル製)と、難燃剤として、−
数式(■)で示されるポリ(p −ビニルブロモフェニ
ルメタクリレ−1〜)〔平均分子量:6600.式(■
)においてmが約1.5゜nが約20〕を、重斌比で1
=1に混合し、溶剤としてN、N−ジメチルホルムアミ
ドを用いて、60℃、30分加熱7容解し、固形分50
重量%のワニスを!15I製した。Table 1 Table 2 [Example 13] As a cyanate compound represented by general formula (I), XU
-71787 (manufactured by Dow Chemical) and as a flame retardant, -
Poly(p-vinyl bromophenyl methacrylate-1~) represented by formula (■) [average molecular weight: 6600. Expression (■
), m is approximately 1.5°, n is approximately 20], and the weight ratio is 1
= 1, heated to 60°C for 30 minutes using N,N-dimethylformamide as a solvent, and dissolved to a solid content of 50.
% varnish by weight! 15I was manufactured.
該ワニスを冷却後ラジカル重合開始剤として、2.5−
ジ(L−ブチルパーオキシ)ヘキシン−3(日本油脂f
M)をワニス同形9100重量部に対して0.5重量部
、更に、シアネートの3量化触媒としてナフテン酸コバ
ルトを前記XU−71787の10000重量対し1重
量部添加した。After cooling the varnish, 2.5-
Di(L-butylperoxy)hexyne-3 (NOF f
M) was added in an amount of 0.5 part by weight per 9,100 parts by weight of the varnish, and 1 part by weight of cobalt naphthenate as a cyanate trimerization catalyst was added per 10,000 parts by weight of the XU-71787.
該ワニスをガラスクロス(日東助層Eガラス:厚さ50
μm)に含浸し、大気中150℃、10分間乾燥させて
、プリプレグシートを作成した。Apply the varnish to glass cloth (Nitto Sukelayer E glass: thickness 50
μm) and dried in the air at 150° C. for 10 minutes to prepare a prepreg sheet.
次いで、該プリプレグシートの両面に50μm厚の銅箔
(TSTO銅箔、古河サーキット製)を重ね、プレス中
で前記実施例と同じ条件で加熱。Next, 50 μm thick copper foil (TSTO copper foil, manufactured by Furukawa Circuit Co., Ltd.) was placed on both sides of the prepreg sheet, and heated in a press under the same conditions as in the previous example.
加圧して両面銅張積層板を得た。Pressure was applied to obtain a double-sided copper-clad laminate.
第1図にその製造工程を示す。Figure 1 shows the manufacturing process.
この銅張積層板の上下にエツチングレジスト焼付、エツ
チング、孔あけ算を行ない内周回路を形成した。An inner circuit was formed by baking etching resist, etching, and drilling holes on the top and bottom of this copper-clad laminate.
第2図に、この内周回路」、藍板の内装F11路形成1
)?i後の断面の模式図を示す。Figure 2 shows this inner circuit, the interior F11 path formation 1 of the indigo board.
)? A schematic diagram of a cross section after i is shown.
次に、これら回路を形成した基板11枚と、その間に前
記プリプレグシー1・を介在させて、プレス中で加圧、
加熱を行ない多周回路ノヨ板を<:+た。Next, the 11 boards on which these circuits were formed and the prepreg sheet 1 were interposed between them, and pressurized in a press.
Heating was performed and the multicircuit circuit plate was <:+>.
得られた多層回路J、(板上の最外R’Jに回路形成、
並びにスルホールの形成℃:を行ない、多J?’lプリ
ント回路板を得た。The obtained multilayer circuit J, (circuit formed on the outermost R'J on the board,
In addition, the formation of throughholes is carried out. 'l got a printed circuit board.
第3図に、この多R4回路プリント板の製造工程図と、
得られた多層回路プリント板の断面斜視図を示す。Figure 3 shows the manufacturing process diagram of this multi-R4 circuit printed board,
A cross-sectional perspective view of the obtained multilayer circuit printed board is shown.
[発明の効果]
本発明の熱硬化性樹脂組成物は比誘電率3.5以下と小
さく、かつ、難燃性であると云う優れた効果があるので
、電子機器用絶縁材料として優れている。[Effects of the Invention] The thermosetting resin composition of the present invention has a small relative dielectric constant of 3.5 or less and is flame retardant, making it excellent as an insulating material for electronic devices. .
また、本発明の熱硬化性樹脂組成物を用いて形成したプ
リント回路板は、比誘電率3.5以下で、従来の難燃性
樹脂材料であるポリイミドを用いて形成したプリント回
路板の4.7に比べて、格段に小さい。従って、信号伝
送速度を大幅に向上し得る効果があり、電子計算機等の
プリント回路板用としても優れている。Furthermore, the printed circuit board formed using the thermosetting resin composition of the present invention has a relative dielectric constant of 3.5 or less, and has a dielectric constant of 3.5 or less, which is higher than that of the printed circuit board formed using polyimide, which is a conventional flame-retardant resin material. It is much smaller than .7. Therefore, it has the effect of significantly increasing signal transmission speed, and is also excellent for use in printed circuit boards of electronic computers and the like.
第1図は両面銅張積層板の製造工程図、第2図は多Jf
1回路プリント板の各内周基板の内装回路形成前後の断
面模式図、第3図は多層回路プリント板の製造工程図と
得られた多層回路プリント板の断面斜視図である。
1・・・未硬化樹脂、2・・・ガラスクロス、3・・・
プリプレグ、4・・・銅箔、5・・・熱板、6・・・銅
張積層板、7・・・硬化樹脂、8・・・内層回路基板、
9・・・多層プリント回路板、10・・・プリント回路
、11・・・内層回路、
12・・・スルーホール。
第
■
秦
?
ロ
ア・・XJ更fヒよ針脂
10 ゛ブリット回回訓
42・スルーホールFigure 1 is a manufacturing process diagram for double-sided copper-clad laminates, Figure 2 is a multi-Jf
FIG. 3 is a schematic cross-sectional view of each inner circuit board of the one-circuit printed board before and after the internal circuit is formed, and FIG. 3 is a manufacturing process diagram of the multilayer circuit printed board and a cross-sectional perspective view of the obtained multilayer circuit printed board. 1... Uncured resin, 2... Glass cloth, 3...
Prepreg, 4... Copper foil, 5... Hot plate, 6... Copper clad laminate, 7... Cured resin, 8... Inner layer circuit board,
9...Multilayer printed circuit board, 10...Printed circuit, 11...Inner layer circuit, 12...Through hole. Chapter ■ Qin? Lower...
Claims (7)
からなる群から選ばれたものであり、Aはシアネート基
あるいはイソシアネート基を示す。)で示されるシアネ
ート化合物あるいはイソシアネート化合物と、 一般式(II) ▲数式、化学式、表等があります▼ (式中、Xはフッ素,臭素,塩素を示し、R_2は炭素
数2〜4のアルケニル基または不飽和カルボキシル基で
あり、また、Bは重合開始剤残基,▲数式、化学式、表
等があります▼ 重合停止剤残基,H,▲数式、化学式、表等があります
▼のいずれかで あり、互いに同じでも異なってもよい。mは1〜4,n
は5以上)で示されるポリ(p−ヒドロキシスチレン)
誘導体とを含む熱硬化性樹脂組成物。1. General formula (I) A-R_1-A(I) (wherein R_1 is selected from the group consisting of aromatic, cycloaliphatic and hybrids thereof, and A represents a cyanate group or an isocyanate group. cyanate compound or isocyanate compound represented by general formula (II) ▲Mathematical formula, chemical formula, table, etc.▼ (In the formula, group or unsaturated carboxyl group, and B is either a polymerization initiator residue, ▲ there are mathematical formulas, chemical formulas, tables, etc. ▼ polymerization terminator residues, H, ▲ there are mathematical formulas, chemical formulas, tables, etc. ▼ and may be the same or different from each other. m is 1 to 4, n
is 5 or more) poly(p-hydroxystyrene)
A thermosetting resin composition comprising a derivative.
物の配合比が重量比で20:80〜80:20であるこ
とを特徴とする請求項第1項記載の熱硬化性樹脂組成物
。2. The thermosetting resin composition according to claim 1, wherein the compounding ratio of the compound represented by the general formula (I) and the general formula (II) is 20:80 to 80:20 by weight. .
第1項または第2項記載の熱硬化性樹脂組成物を40〜
70重量%含浸させてなることを特徴とする硬化性材料
。3. 40 to 40% of the thermosetting resin composition according to claim 1 or 2 is applied to a woven fabric or nonwoven fabric of organic fibers or inorganic fibers.
A curable material characterized by being impregnated with 70% by weight.
組成物を含浸硬化して成る絶縁層を有するプリント回路
板において、 前記熱硬化性樹脂組成物が一般式(I) A−R_1−A(I) (式中、R_1は芳香族、環式脂肪族およびその混成体
からなる群から選ばれたものであり、Aはシアネート基
あるいはイソシアネート基を示す。)で示されるシアネ
ート化合物あるいはイソシアネート化合物と、 一般式(II) ▲数式、化学式、表等があります▼ (式中、Xはフッ素,臭素,塩素を示し、R_2は炭素
数2〜4のアルケニル基または不飽和カルボキシル基で
あり、また、Bは重合開剤残基,重合停止剤残基,H,
▲数式、化学式、表等があります▼のいずれかで あり、互いに同じでも異なってもよい。mは1〜4,n
は5以上)で示されるポリ(p−ヒドロキシスチレン)
誘導体と、1個以上のN置換不飽和イミド基を有する化
合物を含む熱硬化性樹脂組成物であることを特徴とする
プリント回路板。4. A printed circuit board having a conductor made of metal foil and an insulating layer made by impregnating and curing a thermosetting resin composition into a fibrous base material, wherein the thermosetting resin composition has the general formula (I) A-R_1- A cyanate compound or isocyanate represented by A(I) (wherein R_1 is selected from the group consisting of aromatic, cycloaliphatic and hybrids thereof, and A represents a cyanate group or an isocyanate group) Compounds and general formula (II) ▲Mathematical formulas, chemical formulas, tables, etc.▼ (In the formula, In addition, B is a polymerization initiator residue, a polymerization terminator residue, H,
▲There are mathematical formulas, chemical formulas, tables, etc.▼, and they can be the same or different. m is 1 to 4, n
is 5 or more) poly(p-hydroxystyrene)
A printed circuit board characterized in that it is a thermosetting resin composition containing a derivative and a compound having one or more N-substituted unsaturated imide groups.
組成物を含浸硬化して成る絶縁層を有するプリント回路
版において、 前記熱硬化性樹脂組成物が一般式(I) A−R_1−A(I) (式中、R_1は芳香族、環式胆肪族およびその混成体
からなる群から選ばれたものであり、Aはシアネート基
あるいはイソシアネート基を示す。)で示されるシアネ
ート化合物あるいはイソシアネート化合物と、 一般式(II) ▲数式、化学式、表等があります▼ (式中、Xはフッ素,臭素,塩素を示し、R_2は炭素
数2〜4のアルケニル基または不飽和カルボキシル基で
あり、また、Bは重合開始剤残基,重合停止剤残基,H
,▲数式、化学式、表等があります▼のいずれかであり
、互いに同じでも異なってもよい。mは1〜4,nは5
以上)で示されるポリ(p−ヒドロキシスチレン)誘導
体と、1個以上のN置換不飽和イミド基を有する化合物
を含む熱硬化性樹脂組成物であることを特徴とするプリ
ント回路板。5. A printed circuit board having a conductor made of metal foil and an insulating layer made by impregnating and curing a thermosetting resin composition into a fibrous base material, wherein the thermosetting resin composition has the general formula (I) A-R_1- A cyanate compound represented by A(I) (wherein R_1 is selected from the group consisting of aromatic, cycloaliphatic and hybrids thereof, and A represents a cyanate group or an isocyanate group) or Isocyanate compounds and general formula (II) ▲Mathematical formulas, chemical formulas, tables, etc.▼ (In the formula, , B is a polymerization initiator residue, a polymerization terminator residue, H
, ▲Mathematical formulas, chemical formulas, tables, etc.▼, and may be the same or different from each other. m is 1-4, n is 5
A printed circuit board characterized in that it is a thermosetting resin composition containing a poly(p-hydroxystyrene) derivative represented by the above) and a compound having one or more N-substituted unsaturated imide groups.
からなる群から選ばれたものであり、Aはシアネート基
あるいはイソシアネート基を示す。)で示されるシアネ
ート化合物あるいはイソシアネート化合物と、 一般式(II) ▲数式、化学式、表等があります▼ (式中、Xはフッ素,臭素,塩素を示し、R_2は炭素
数2〜4のアルケニル基または不飽和カルボキシル基で
あり、また、Bは重合開始剤残基,重合停止剤残基,H
,▲数式、化学式、表等があります▼のいずれかで あり、互いに同じでも異なってもよい。mは1〜4,n
は5以上)で示されるポリ(p−ヒドロキシスチレン)
誘導体とを含む熱硬化性樹脂組成物を加熱してプレポリ
マを作成する工程、前記プレポリマを溶剤に溶解し繊維
質基材に含浸,乾燥してプリプレグを作成する工程、前
記プリプレグを複数枚積層し、導体用金属箔と加圧、加
熱する工程、 を含むプリント回路板の製法。6. General formula (I) A-R_1-A(I) (wherein R_1 is selected from the group consisting of aromatic, cycloaliphatic and hybrids thereof, and A represents a cyanate group or an isocyanate group. cyanate compound or isocyanate compound represented by general formula (II) ▲Mathematical formula, chemical formula, table, etc.▼ (In the formula, group or unsaturated carboxyl group, and B is a polymerization initiator residue, a polymerization terminator residue, H
, ▲Mathematical formulas, chemical formulas, tables, etc.▼, and may be the same or different from each other. m is 1 to 4, n
is 5 or more) poly(p-hydroxystyrene)
A step of heating a thermosetting resin composition containing a derivative to create a prepolymer, a step of dissolving the prepolymer in a solvent, impregnating it into a fibrous base material, and drying it to create a prepreg, laminating a plurality of sheets of the prepreg. , a method for manufacturing a printed circuit board, including a process of applying a pressure and heating to a metal foil for a conductor.
からなる群から選ばれたものであり、Aはシアネート基
あるいはイソシアネート基を示す。)で示されるシアネ
ート化合物あるいはイソシアネート化合物と、 一般式(II) ▲数式、化学式、表等があります▼ (式中、Xはフッ素,臭素,塩素を示し、R_2は炭素
数2〜4のアルケニル基または不飽和カルボキシル基で
あり、また、Bは重合開始剤残基,重合停止剤残基,H
,▲数式、化学式、表等があります▼のいずれかで あり、互いに同じでも異なってもよい。mは1〜4,n
は5以上)で示されるポリ(p−ヒドロキシスチレン)
誘導体と、1個以上のN置換不飽和イミド基を有する化
合物を含む熱硬化性樹脂組成物を加熱してプレポリマを
作成する工程、 前記プレポリマを溶剤に溶解し繊維質基材に含浸,乾燥
してプリプレグを作成する工程、前記プリプレグを複数
枚積層し、更に導体用金属箔と加圧、加熱して接着する
工程、 を含むプリント回路板の製法。7. General formula (I) A-R_1-A(I) (wherein R_1 is selected from the group consisting of aromatic, cycloaliphatic and hybrids thereof, and A represents a cyanate group or an isocyanate group. cyanate compound or isocyanate compound represented by general formula (II) ▲Mathematical formula, chemical formula, table, etc.▼ (In the formula, group or unsaturated carboxyl group, and B is a polymerization initiator residue, a polymerization terminator residue, H
, ▲Mathematical formulas, chemical formulas, tables, etc.▼, and may be the same or different from each other. m is 1 to 4, n
is 5 or more) poly(p-hydroxystyrene)
A step of heating a thermosetting resin composition containing a derivative and a compound having one or more N-substituted unsaturated imide groups to create a prepolymer, dissolving the prepolymer in a solvent, impregnating it into a fibrous base material, and drying it. A method for producing a printed circuit board, comprising the steps of: creating a prepreg by using the prepreg; laminating a plurality of sheets of the prepreg, and bonding the prepreg to a metal foil for a conductor by applying pressure and heating.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1252748A JPH0826116B2 (en) | 1988-09-30 | 1989-09-28 | Thermosetting resin composition and printed circuit board using the same |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63-246978 | 1988-09-30 | ||
JP24697888 | 1988-09-30 | ||
JP1252748A JPH0826116B2 (en) | 1988-09-30 | 1989-09-28 | Thermosetting resin composition and printed circuit board using the same |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH02167329A true JPH02167329A (en) | 1990-06-27 |
JPH0826116B2 JPH0826116B2 (en) | 1996-03-13 |
Family
ID=26538004
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1252748A Expired - Lifetime JPH0826116B2 (en) | 1988-09-30 | 1989-09-28 | Thermosetting resin composition and printed circuit board using the same |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0826116B2 (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPWO2006001305A1 (en) * | 2004-06-23 | 2008-04-17 | 日立化成工業株式会社 | Prepreg for printed wiring board, metal foil-clad laminate, printed wiring board, and method for producing multilayer printed wiring board |
US8492898B2 (en) | 2007-02-19 | 2013-07-23 | Semblant Global Limited | Printed circuit boards |
US8995146B2 (en) | 2010-02-23 | 2015-03-31 | Semblant Limited | Electrical assembly and method |
US11786930B2 (en) | 2016-12-13 | 2023-10-17 | Hzo, Inc. | Protective coating |
-
1989
- 1989-09-28 JP JP1252748A patent/JPH0826116B2/en not_active Expired - Lifetime
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPWO2006001305A1 (en) * | 2004-06-23 | 2008-04-17 | 日立化成工業株式会社 | Prepreg for printed wiring board, metal foil-clad laminate, printed wiring board, and method for producing multilayer printed wiring board |
US8492898B2 (en) | 2007-02-19 | 2013-07-23 | Semblant Global Limited | Printed circuit boards |
US9648720B2 (en) | 2007-02-19 | 2017-05-09 | Semblant Global Limited | Method for manufacturing printed circuit boards |
US8995146B2 (en) | 2010-02-23 | 2015-03-31 | Semblant Limited | Electrical assembly and method |
US11786930B2 (en) | 2016-12-13 | 2023-10-17 | Hzo, Inc. | Protective coating |
Also Published As
Publication number | Publication date |
---|---|
JPH0826116B2 (en) | 1996-03-13 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP3184485B2 (en) | Resin composition for copper clad laminate, copper foil with resin, multilayer copper clad laminate and multilayer printed wiring board | |
JP6443657B2 (en) | Thermosetting insulating resin composition, and insulating film with support, prepreg, laminate and multilayer printed wiring board using the same | |
KR102337574B1 (en) | Thermoplastic resin composition for high frequency, prepreg, laminate sheet and printed circuit board using the same | |
US10994516B2 (en) | Resin composition, and pre-preg, metal-clad laminate and printed circuit board prepared using the same | |
CN109988288B (en) | Resin composition, and prepreg, metal foil laminate and printed wiring board produced using the same | |
KR0155542B1 (en) | Thermosetting resin composition printed circuit board using the resin composition nd process for producing printed circuit board | |
JPH01121356A (en) | Thermosetting resin composition and prepreg and laminated board produced by using same | |
US5352762A (en) | Multilayer printed circuit board and production thereof | |
JPH08193139A (en) | Prepreg for printed wiring board and metal-clad laminate using the same | |
KR101708146B1 (en) | Thermoplastic resin composition for high frequency having low permittivity, prepreg and copper clad laminate using the same | |
JP2003073543A (en) | Resin composition, prepreg and printed circuit board using the same | |
JPH0579686B2 (en) | ||
JPH08231847A (en) | Polyphenylene oxide resin composition and prepreg and laminate prepared by using the same | |
JPH02167329A (en) | Thermosetting resin composition, printed-circuit board using same resin composition and production thereof | |
JP2007273616A (en) | Manufacturing method for multilayer printed circuit board | |
JP3261061B2 (en) | Resin composition for laminate, prepreg and laminate using the composition | |
JPS6356548A (en) | Thermosetting resin composition, laminated sheet produced by using same and production thereof | |
JP2866661B2 (en) | Thermosetting resin composition, prepreg and laminate using the same | |
JPS63117053A (en) | Thermosetting resin composition and laminated sheet | |
JPH0634453B2 (en) | Multilayer printed circuit board and manufacturing method thereof | |
JP3111389B2 (en) | Low dielectric resin sheet and copper-clad laminate using the same | |
JPH02185517A (en) | Thermosetting resin composition and prepreg and laminate prepared therefrom | |
JPH0790172A (en) | Polyphenylene oxide resin composition, prepreg and laminate | |
JPH0578446A (en) | Cured material using fluorine-containing cyanate and laminate using the same cured material | |
JPH01215852A (en) | Flame-retarding polyphenylene oxide resin composition and metal-clad laminate thereof |