JPH02167271A - Naphthoquinone derivative and optical recording medium using the derivative - Google Patents
Naphthoquinone derivative and optical recording medium using the derivativeInfo
- Publication number
- JPH02167271A JPH02167271A JP63058993A JP5899388A JPH02167271A JP H02167271 A JPH02167271 A JP H02167271A JP 63058993 A JP63058993 A JP 63058993A JP 5899388 A JP5899388 A JP 5899388A JP H02167271 A JPH02167271 A JP H02167271A
- Authority
- JP
- Japan
- Prior art keywords
- group
- substituted
- formula
- recording medium
- optical recording
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229930192627 Naphthoquinone Natural products 0.000 title claims abstract description 18
- 150000002791 naphthoquinones Chemical class 0.000 title claims abstract description 17
- 230000003287 optical effect Effects 0.000 title claims abstract description 17
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 15
- 125000003545 alkoxy group Chemical group 0.000 claims abstract description 9
- 125000003118 aryl group Chemical group 0.000 claims abstract description 9
- 125000003342 alkenyl group Chemical group 0.000 claims abstract description 7
- 125000004442 acylamino group Chemical group 0.000 claims abstract description 6
- 125000000753 cycloalkyl group Chemical group 0.000 claims abstract description 6
- 229910052717 sulfur Inorganic materials 0.000 claims abstract description 4
- 229910052711 selenium Inorganic materials 0.000 claims abstract 2
- 239000000758 substrate Substances 0.000 claims description 14
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 11
- 125000005843 halogen group Chemical group 0.000 claims description 10
- 239000000126 substance Substances 0.000 claims description 2
- 230000001678 irradiating effect Effects 0.000 claims 1
- 229910052727 yttrium Inorganic materials 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 abstract description 16
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 abstract description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 abstract description 5
- 239000000463 material Substances 0.000 abstract description 4
- 239000003960 organic solvent Substances 0.000 abstract description 4
- 238000006243 chemical reaction Methods 0.000 abstract description 3
- 229910052736 halogen Inorganic materials 0.000 abstract 2
- 150000002367 halogens Chemical class 0.000 abstract 2
- LMBFAGIMSUYTBN-MPZNNTNKSA-N teixobactin Chemical compound C([C@H](C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H](CCC(N)=O)C(=O)N[C@H]([C@@H](C)CC)C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H]1C(N[C@@H](C)C(=O)N[C@@H](C[C@@H]2NC(=N)NC2)C(=O)N[C@H](C(=O)O[C@H]1C)[C@@H](C)CC)=O)NC)C1=CC=CC=C1 LMBFAGIMSUYTBN-MPZNNTNKSA-N 0.000 abstract 2
- VRVRGVPWCUEOGV-UHFFFAOYSA-N 2-aminothiophenol Chemical compound NC1=CC=CC=C1S VRVRGVPWCUEOGV-UHFFFAOYSA-N 0.000 abstract 1
- 238000002360 preparation method Methods 0.000 abstract 1
- 230000008929 regeneration Effects 0.000 abstract 1
- 238000011069 regeneration method Methods 0.000 abstract 1
- 239000010408 film Substances 0.000 description 17
- 238000000576 coating method Methods 0.000 description 15
- 238000000034 method Methods 0.000 description 15
- 239000011248 coating agent Substances 0.000 description 13
- 239000000975 dye Substances 0.000 description 11
- 239000010410 layer Substances 0.000 description 11
- 238000010521 absorption reaction Methods 0.000 description 9
- 239000004065 semiconductor Substances 0.000 description 9
- 239000000243 solution Substances 0.000 description 9
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 8
- 239000010409 thin film Substances 0.000 description 8
- 230000015572 biosynthetic process Effects 0.000 description 7
- 239000011347 resin Substances 0.000 description 7
- 229920005989 resin Polymers 0.000 description 7
- 238000001228 spectrum Methods 0.000 description 6
- 238000003786 synthesis reaction Methods 0.000 description 5
- QPFMBZIOSGYJDE-UHFFFAOYSA-N 1,1,2,2-tetrachloroethane Chemical compound ClC(Cl)C(Cl)Cl QPFMBZIOSGYJDE-UHFFFAOYSA-N 0.000 description 4
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 4
- 239000011230 binding agent Substances 0.000 description 4
- -1 naphthoquinone compound Chemical class 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 238000002835 absorbance Methods 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 229920003023 plastic Polymers 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 239000000020 Nitrocellulose Substances 0.000 description 2
- 238000000862 absorption spectrum Methods 0.000 description 2
- 125000002252 acyl group Chemical group 0.000 description 2
- 125000005083 alkoxyalkoxy group Chemical group 0.000 description 2
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 2
- 125000005336 allyloxy group Chemical group 0.000 description 2
- 125000004104 aryloxy group Chemical group 0.000 description 2
- DIKBFYAXUHHXCS-UHFFFAOYSA-N bromoform Chemical compound BrC(Br)Br DIKBFYAXUHHXCS-UHFFFAOYSA-N 0.000 description 2
- 238000005266 casting Methods 0.000 description 2
- 239000013522 chelant Substances 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 125000004093 cyano group Chemical group *C#N 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 238000007606 doctor blade method Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 239000000113 methacrylic resin Substances 0.000 description 2
- 239000012046 mixed solvent Substances 0.000 description 2
- 229920001220 nitrocellulos Polymers 0.000 description 2
- TZMFJUDUGYTVRY-UHFFFAOYSA-N pentane-2,3-dione Chemical group CCC(=O)C(C)=O TZMFJUDUGYTVRY-UHFFFAOYSA-N 0.000 description 2
- 239000001007 phthalocyanine dye Substances 0.000 description 2
- 239000000049 pigment Substances 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- 125000003718 tetrahydrofuranyl group Chemical group 0.000 description 2
- POILWHVDKZOXJZ-ARJAWSKDSA-M (z)-4-oxopent-2-en-2-olate Chemical compound C\C([O-])=C\C(C)=O POILWHVDKZOXJZ-ARJAWSKDSA-M 0.000 description 1
- APQIUTYORBAGEZ-UHFFFAOYSA-N 1,1-dibromoethane Chemical compound CC(Br)Br APQIUTYORBAGEZ-UHFFFAOYSA-N 0.000 description 1
- ORIHZIZPTZTNCU-VMPITWQZSA-N 2-[(E)-hydroxyiminomethyl]phenol Chemical compound O\N=C\C1=CC=CC=C1O ORIHZIZPTZTNCU-VMPITWQZSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- VMHLLURERBWHNL-UHFFFAOYSA-M Sodium acetate Chemical compound [Na+].CC([O-])=O VMHLLURERBWHNL-UHFFFAOYSA-M 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- 239000000987 azo dye Substances 0.000 description 1
- 230000008033 biological extinction Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 229950005228 bromoform Drugs 0.000 description 1
- 125000004369 butenyl group Chemical group C(=CCC)* 0.000 description 1
- 125000004063 butyryl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- ZMXDDKWLCZADIW-UHFFFAOYSA-N dimethylformamide Substances CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 125000002485 formyl group Chemical group [H]C(*)=O 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 238000001819 mass spectrum Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 239000000123 paper Substances 0.000 description 1
- XDJOIMJURHQYDW-UHFFFAOYSA-N phenalene Chemical compound C1=CC(CC=C2)=C3C2=CC=CC3=C1 XDJOIMJURHQYDW-UHFFFAOYSA-N 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920013716 polyethylene resin Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 125000004368 propenyl group Chemical group C(=CC)* 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 239000012264 purified product Substances 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 238000010898 silica gel chromatography Methods 0.000 description 1
- 239000001632 sodium acetate Substances 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- ANRHNWWPFJCPAZ-UHFFFAOYSA-M thionine Chemical compound [Cl-].C1=CC(N)=CC2=[S+]C3=CC(N)=CC=C3N=C21 ANRHNWWPFJCPAZ-UHFFFAOYSA-M 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 239000001003 triarylmethane dye Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
- B41M5/382—Contact thermal transfer or sublimation processes
- B41M5/385—Contact thermal transfer or sublimation processes characterised by the transferable dyes or pigments
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
- B41M5/382—Contact thermal transfer or sublimation processes
- B41M5/385—Contact thermal transfer or sublimation processes characterised by the transferable dyes or pigments
- B41M5/3852—Anthraquinone or naphthoquinone dyes
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Thermal Transfer Or Thermal Recording In General (AREA)
- Nitrogen- Or Sulfur-Containing Heterocyclic Ring Compounds With Rings Of Six Or More Members (AREA)
- Plural Heterocyclic Compounds (AREA)
- Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、新規なナフトキノン系誘導体及び該誘導体を
使用する光学記録媒体に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a novel naphthoquinone derivative and an optical recording medium using the derivative.
半導体レーザーの発振波長の光エネルギーによシ物質状
態の変化を利用して記録を行なう光学記録媒体としては
、従来より種々の構成のものが知られている。2. Description of the Related Art Various configurations are conventionally known as optical recording media in which recording is performed by utilizing changes in the state of materials caused by light energy at the oscillation wavelength of a semiconductor laser.
例えば、特開昭!;!;−970JJ号公報には、gJ
J’lダ号公報にはフェナレン系色素を、特開昭1g−
2217793号公報にはナフトキノン系色素を記録層
に設けたものが開示されている。For example, Tokukai Akira! ;! ;-970JJ publication, gJ
In J'lda publication, phenalene dyes were used in JP-A No. 1g-
Japanese Patent No. 2217793 discloses a recording layer in which a naphthoquinone dye is provided.
上記従来の光学記録媒体のうち、特開昭SS−? 70
J、3号に開示されるフタロシアニン系色素を用いたも
のでは、フタロシアニン系色素は感度が低い、分解点が
高く蒸着しにくい等の問題点を有し、更に有機溶媒に対
する溶解性が著し゛く低く、塗布によるコーティングに
使用するととが難かしいという問題点も有している。Among the conventional optical recording media mentioned above, JP-A-Sho SS-? 70
In the method using the phthalocyanine dye disclosed in J. No. 3, the phthalocyanine dye has problems such as low sensitivity, high decomposition point, and difficulty in vapor deposition, and furthermore, it has extremely high solubility in organic solvents. It also has the problem that it is difficult to apply when used for coating by application.
一方、特開昭sg−ざJJQダ号、同sg−点を有して
いる。反射率が低いとレーザー光によシ記録された部分
と未記録部分との反射率に関係するコントラストが低く
なシ、記録された情報の再生が困難となる。また、一般
に有機系色素は保存安記性が劣るという問題点を有して
いる。On the other hand, JP-A Showa SG-ZA JJQ-da issue has the same SG-point. If the reflectance is low, the contrast related to the reflectance between the portion recorded by the laser beam and the unrecorded portion will be low, making it difficult to reproduce the recorded information. Additionally, organic dyes generally have a problem of poor storage stability.
本発明は、蒸着が容易で、有機溶媒に対する溶解性が高
く、塗布によるコーティングも可能で、しかも、反射率
が高く、コントラストが良好で保存安定性に優れている
、新規なナフトキノン系誘導体及びそれを用いた光学記
録媒体を提供することを目的とするものであって、下記
(式中、R’、R”は水素原子、置換もしくは非置換の
アルキル基、置換もしくは非置換のシクロアルキル基、
置換もしくは非置換のアリール基又は置換もしくは非置
換のアルケニル基を示しR3は水素原子、ハロゲン原子
、アルキル基、アシルアミノ基又はアルコキシ基を示し
、Kは水素原子、ハロゲン原子を示し、XはSまたはS
eを示し、YはCHまたはNを示す。)で表わされるナ
フトキノン系誘導体、及び上記誘導体を含む記録層を設
けたことを特徴とする光学記録媒体、を要旨とするもの
である。The present invention provides novel naphthoquinone derivatives that are easy to vapor deposit, have high solubility in organic solvents, can be coated by coating, and have high reflectance, good contrast, and excellent storage stability. The purpose of the present invention is to provide an optical recording medium using
It represents a substituted or unsubstituted aryl group or a substituted or unsubstituted alkenyl group, R3 represents a hydrogen atom, a halogen atom, an alkyl group, an acylamino group, or an alkoxy group, K represents a hydrogen atom, a halogen atom, and X represents S or S
e, and Y represents CH or N. ), and an optical recording medium characterized by being provided with a recording layer containing the above derivative.
以下、本発明の詳細な説明する。The present invention will be explained in detail below.
二)、本発明の一般式〔I〕で示されるナフトキノン索
′誘導体としては、好1しくは下記−数式〔■〕、Cm
)又は[IV]で示される化合物が挙げられる。2) The naphthoquinone derivative represented by the general formula [I] of the present invention is preferably the following formula [■], Cm
) or [IV].
(式中、R’、R2は水素原子、置換もしくは非置換の
アルキル基、シクロアルキル基、アリール基又はアリル
基を示し、R3は水素原子、ハロゲン原子、アルキル基
、アシルアミノ基又はアルコキシ基を示す。)
(式中、R’ 、 R2は水素原子、置換もしくは非置
換もしくは非置換のアルキル基、シクロアルキル基、ア
リール基又はアリル基を示し、Rsは水素原子、ハロゲ
ン原子、アルキル基、アシルアミノ基又はアルコキシ基
を示す。)
(式中、R1,R2は水素原子、置換もしぐは非置換の
アルキル基、シクロアルキル基、アリール基又はアリル
基を示し、R3は水素原子、ハロゲン原子、アルキル基
、アシルアミノ基又はアルコキシ基を示す。)
R1、R2で表わされるアルキル基としてはメチル基、
エチル基等の炭素数/−Aのアルキル基が一ル基として
はフェニル基、ナフチル基が挙げられ、アルケニル基と
してはビニル基、アリル基、プロペニル基、ブテニル基
等の炭素数/〜6のアルケニル基が挙げられる。(In the formula, R' and R2 represent a hydrogen atom, a substituted or unsubstituted alkyl group, a cycloalkyl group, an aryl group, or an allyl group, and R3 represents a hydrogen atom, a halogen atom, an alkyl group, an acylamino group, or an alkoxy group. (In the formula, R' and R2 represent a hydrogen atom, a substituted or unsubstituted or unsubstituted alkyl group, cycloalkyl group, aryl group, or allyl group, and Rs represents a hydrogen atom, a halogen atom, an alkyl group, or an acylamino group. (In the formula, R1 and R2 represent a hydrogen atom, a substituted or unsubstituted alkyl group, a cycloalkyl group, an aryl group, or an allyl group, and R3 represents a hydrogen atom, a halogen atom, or an alkyl group.) , represents an acylamino group or an alkoxy group.) Examples of the alkyl group represented by R1 and R2 include a methyl group,
Examples of alkenyl groups include phenyl and naphthyl groups, and examples of alkenyl groups include vinyl groups, allyl groups, propenyl groups, butenyl groups, etc. Examples include alkenyl groups.
R3で表わされるハロゲン原子としてはCI、F、1、
Br等が挙げられ、アルキル基としては炭素数/〜乙の
アルキル基が挙げられ、アジルア□ノ基としては、アシ
ル基がホルミル、アセチルプロピオニル、ブチリル等の
炭素数/−Aのアシル基が挙げられ、アルコキシ基とし
ては炭素数/−4のアルコキシ基が挙げられる。The halogen atom represented by R3 is CI, F, 1,
Examples of the alkyl group include an alkyl group having a carbon number of /-A, and examples of the azila group include acyl groups having an acyl group of a carbon number of /-A, such as formyl, acetylpropionyl, and butyryl. Examples of the alkoxy group include an alkoxy group having a carbon number of -4.
前記−数式(I)におけるR1 、R2で表わされる3
たとえばアルコキシ基、アルコキシアルコキシ基、アル
コキシアルコキシアルコキシ基、アリルオキシ基、了り
−ル基、アリールオキシ基、シアノ基、アルコキシカル
ボニル基、ヒドロキシ基、テトラヒドロフリル基、ハロ
ゲン原子等があげられる。3 represented by R1 and R2 in the above-mentioned formula (I)
Examples include an alkoxy group, an alkoxyalkoxy group, an alkoxyalkoxyalkoxy group, an allyloxy group, an aryl group, an aryloxy group, a cyano group, an alkoxycarbonyl group, a hydroxy group, a tetrahydrofuryl group, and a halogen atom.
シクロアルキル基、アリール基又はアルケニル基の置換
基もしくは置換原子としては、たとえばアルキル基、ア
ルコキシ基、アルコキシアルコキシ基、アルコキシアル
コキシアルコキン基、アリルオキシ基、アリール基、ア
リールオキシ基、シアノ基、アルコキシカルボニル基、
ヒドロキシ基、テトラヒドロフリル基、ハロゲン原子等
があげられる。Examples of substituents or substituent atoms of cycloalkyl groups, aryl groups, or alkenyl groups include alkyl groups, alkoxy groups, alkoxyalkoxy groups, alkoxyalkoxyalcokyne groups, allyloxy groups, aryl groups, aryloxy groups, cyano groups, and alkoxycarbonyl groups. base,
Examples include a hydroxy group, a tetrahydrofuryl group, and a halogen atom.
前記−数式(I)で示されるナフトキノン系色有し、し
かも分子吸収係数が10’〜105C!n″″1である
。It has a naphthoquinone color represented by formula (I) above and has a molecular absorption coefficient of 10' to 105C! n″″1.
次に、このような本発明の新規ナフトキノン系化合物を
用いた、本発明の光学記録媒体について説明する。Next, an optical recording medium of the present invention using such a novel naphthoquinone compound of the present invention will be explained.
本発明の光学記録媒体は、基本的には基板と記録層とか
ら構成されるものであるが、更に必要に応じて基板上に
下引き層を、あるいは、記録層上に保護層を設けること
ができる。The optical recording medium of the present invention basically consists of a substrate and a recording layer, but if necessary, an undercoat layer may be provided on the substrate or a protective layer may be provided on the recording layer. Can be done.
本発明で用いる基板は、使用するレーザー光に対して透
明又は不透明のいずれでも良い。基板材料の材質として
は、ガラス、プラスチック、紙、板状又は箔状の金属等
の、−数的な記録材料の支持体が挙げられるが、これら
のうち、プラスチックが種々の点から好適である。プラ
スチックとしては、アクリル樹脂、メタアクリル樹脂、
酢酸ビニル樹脂、塩化ビニル樹脂、ニトロセルロース、
ポリエチレン樹脂、ポリプロビレ/樹脂、ポリカーボネ
ート樹脂、ポリイミド樹脂、ポリサルホン樹脂等が挙げ
られる。The substrate used in the present invention may be transparent or opaque to the laser beam used. Examples of the substrate material include supports for numerical recording materials such as glass, plastic, paper, plate-shaped or foil-shaped metals, and among these, plastics are preferred from various points of view. . Plastics include acrylic resin, methacrylic resin,
Vinyl acetate resin, vinyl chloride resin, nitrocellulose,
Examples include polyethylene resin, polypropylene/resin, polycarbonate resin, polyimide resin, polysulfone resin, and the like.
本発明の光学記録媒体における記録層として前記−数式
CI)の化合物を使用する際、膜厚は100に=!rA
m、好ましくば1000″A〜3μmとするのが好適で
ある。When using the compound of formula CI) as the recording layer in the optical recording medium of the present invention, the film thickness is 100=! rA
m, preferably 1000″A to 3 μm.
成膜法としては、真空蒸着法、スパッタリング法、ドク
ターブレード法、キャスト法、スピナー法、浸漬法など
一般に行なわれている薄膜形成法を採用することができ
る。As a film forming method, commonly used thin film forming methods such as a vacuum evaporation method, a sputtering method, a doctor blade method, a casting method, a spinner method, and a dipping method can be employed.
成膜に際しては、必要に応じてバインダーを使用するこ
ともできる。バインダーとしてはPVAVPVP、ニト
ロセルロース、酢酸セルロース、ポリビニルブチラール
、ポリカーボネートなど既知のものが用いられ、これら
のバインダー樹脂に対する前記ア般式〔■〕の化合物の
量は重量比で0.0/以上であることが望ましい。When forming a film, a binder can also be used as necessary. As the binder, known binders such as PVAVPVP, nitrocellulose, cellulose acetate, polyvinyl butyral, and polycarbonate are used, and the amount of the compound of the general formula [■] to these binder resins is 0.0/or more in weight ratio. This is desirable.
筐た、記録媒体の安定性や耐光性向上のために一重項酸
素クエンチャーとして遷移金属キレート化合物(例えば
、アセチルアセトナートキレート、ビスフエニルジチオ
ール、サリチルアルデヒドオキシム、ビスジチオ−α−
ジケトン等)を含有させても良い。筐た、本発明におい
て使用される前記一般式〔I〕で示される色素は単独で
用いてもよいし、置換基の異なる2種小上を混合して使
用してもよい。更に、必要に応じて他の色素を併用する
こともできる。他の色素としては、別の種類の同系統の
化合物でも良いし、トリアリールメタン系色素、アゾ染
料、シアニン系色素、スクワリリウム系色素など他系統
の色素でも良い・
ドクターブレード法、キャスト法、スピナー法、浸漬法
、特に、スピナー法等の塗布方法によシ記録層を形成す
る場合の塗布溶媒としては、ブロモホルム、ジブロモエ
タン、テトラクロロエタン、エチルセロソルブ、キシレ
ン、クロロベンゼン、シクロヘキサノン等の沸点/20
〜/rO℃のものが好適に使用される。In addition, transition metal chelate compounds (e.g., acetylacetonate chelate, bisphenyldithiol, salicylaldehyde oxime, bisdithio-α-
diketone, etc.) may be included. Furthermore, the dye represented by the general formula [I] used in the present invention may be used alone, or two types having different substituents may be used in combination. Furthermore, other dyes can be used in combination if necessary. Other pigments may be other types of compounds of the same type, or pigments from other systems such as triarylmethane dyes, azo dyes, cyanine dyes, squalirium dyes, etc. Doctor blade method, casting method, spinner When forming a recording layer by a coating method such as coating method, dipping method, especially spinner method, coating solvents include bromoform, dibromoethane, tetrachloroethane, ethyl cellosolve, xylene, chlorobenzene, cyclohexanone, etc. with boiling point/20
~/rO°C is preferably used.
なお、スピナー法による成膜の場合、回転数ばsoo〜
!r 000 rpmが好ましく、スピンコードの後、
場合によっては、加熱あるいは溶媒蒸気にあてる等の処
理を行なっても良い。In addition, in the case of film formation by the spinner method, the rotation speed is so~
! r 000 rpm is preferred and after the spin code,
Depending on the case, treatment such as heating or exposure to solvent vapor may be performed.
本発明の光学記録媒体の記録層は基板の両面に設けても
良いし、片面だけに設けても良い。The recording layer of the optical recording medium of the present invention may be provided on both sides of the substrate or only on one side.
]上記の様にして得られた記録媒体への記録は、′4常
、基体の両面又は片面に設けた記録層に、lμ爪程度に
集束したレーザー光、好1しくは、半導体レーザー0光
をあてる事によシ行なう。] Recording on the recording medium obtained as described above is usually carried out using a laser beam, preferably a semiconductor laser beam, focused to about 1μ nail length on the recording layer provided on both sides or one side of the substrate. I'll do it by guessing.
レーザー光の照射された部分には、レーザーエネルギー
の吸収による、分解、蒸発、溶融等の記録層の熱的変形
が起こる。In the portion irradiated with the laser beam, thermal deformation of the recording layer such as decomposition, evaporation, and melting occurs due to absorption of laser energy.
記録された情報の再生は、レーザー光によシ、熱的変形
が起きている部分と起きていない部分の反射率の差を読
み取る事によう行なう。The recorded information is reproduced by using a laser beam and reading the difference in reflectance between the areas where thermal deformation has occurred and the areas where no thermal deformation has occurred.
本発明の光学記録媒体への記録又は再生に使用されるレ
ーザー光は軽量性、取扱いの容易さ、コンパクト性など
の点から半導体レーザーが好適である。As the laser beam used for recording on or reproducing from the optical recording medium of the present invention, a semiconductor laser is preferable from the viewpoints of light weight, ease of handling, compactness, and the like.
以下、実施例を挙げて本発明をよシ具体的に説明するが
、本発明はその要旨を越えない限す以下の実施例に限定
されるものではない。Hereinafter, the present invention will be explained in more detail with reference to examples, but the present invention is not limited to the following examples as long as they do not exceed the gist thereof.
実施例/
合 成
下記構造式
で表わされる化合物、2.729及びコーアミノベンゼ
ンチオール/、2 j t fエタノール100atと
ly%Hcl水溶液aomlの混合溶媒の中で72時間
室臨で攪拌しながら反応させた。Example/Synthesis A compound represented by the following structural formula, 2.729, and co-aminobenzenethiol/, 2 j t f were reacted in a mixed solvent of 100 at of ethanol and aoml of aqueous ly% HCl for 72 hours under stirring under room conditions. I let it happen.
io%N a OH水溶液で中和し、下記構造式@で表
わされるナンドキノン系誘導体を得た。It was neutralized with an io% NaOH aqueous solution to obtain a nandoquinone derivative represented by the following structural formula @.
シリカゲルカラム(ベンゼン:酢酸エチル=ダニl)で
3回精製し、精製品を得た。Purification was performed three times using a silica gel column (benzene: ethyl acetate = danyl) to obtain a purified product.
水晶のりbロホルム溶液中のλmaxlti第1図に示
すように7Aコnmであった。As shown in FIG. 1, the λmaxlti of the crystal glue b in the roform solution was 7A nm.
分子吸光係数(ε): 2.J X 10’クロロホル
ム溶液中のλmax : りb 2 nmマススペク
トル : 、? ? ? (M+)成膜法
上記のようにして得られたナフトキノン系色素/?をテ
トラクロロエタンj09に溶解し、0.22μのフィル
ターで濾過して溶液とした。この溶液Jmlを、深さ7
00 A 、巾0.7μの紫外線硬化樹脂による溝(グ
ループ)つきのメチルメタクリレート樹脂基板(/ 、
20朋〆)上に滴下し、スピナー法によpso。Molecular extinction coefficient (ε): 2. J X 10' λmax in chloroform solution: 2 nm mass spectrum: ? ? (M+) Film formation method Naphthoquinone dye obtained as above/? was dissolved in tetrachloroethane j09 and filtered through a 0.22μ filter to obtain a solution. Add Jml of this solution to a depth of 7
00A, methyl methacrylate resin substrate with grooves (groups) made of ultraviolet curing resin with a width of 0.7μ (/,
20 ㎋〆) and drop it on top of the pso using a spinner method.
rpmの回転数で塗布し、40℃で10分間乾燥した。The coating was applied at a rotation speed of rpm and dried at 40° C. for 10 minutes.
同一条件でガラス板に塗布し、タリステップにより塗布
膜厚を測定したところ、700矢であった。第2図に示
すように塗布膜の最大吸収波長は790 nmでラシ、
反射率は29%(g30nm)で、スペクトルの形状は
巾広であった。It was applied to a glass plate under the same conditions and the coating film thickness was measured by Talystep, and it was found to be 700 mm. As shown in Figure 2, the maximum absorption wavelength of the coating film is 790 nm.
The reflectance was 29% (g30 nm), and the shape of the spectrum was broad.
光記録法
この塗布膜に、中心波長790 nmの半導体レーザー
光をビーム径1μmで照射した所、巾約1μm、ピット
長約λμ扉の輪郭の極めて明瞭なピットが形成された。Optical Recording Method When this coating film was irradiated with a semiconductor laser beam having a center wavelength of 790 nm and a beam diameter of 1 μm, extremely clear pits with a width of about 1 μm and a pit length of about λμ were formed.
動特性評価でC/N比は!r2dB (gmW)で高く
、保存安定性(60℃、tro%RH)も良好であった
。C/N ratio in dynamic characteristic evaluation! It had high r2dB (gmW) and good storage stability (60°C, tro%RH).
実施例コ
実施例1において、前記構造式■で表わされる化合物の
代わシに、下記第1表に示す化合物を使用したこと以外
は同様にして、成膜を行なったところ、第1表に示す最
大吸収波長をもつ薄膜基板が得られた。Example 1 A film was formed in the same manner as in Example 1, except that the compound shown in Table 1 below was used in place of the compound represented by the structural formula (1). A thin film substrate with maximum absorption wavelength was obtained.
このようにして得られた薄膜に、光源として半導体レー
ザーを用いて書き込みを行なったところ、均一かつ明瞭
な形状のピットが得られ、そのC/N比も良好であう、
保存安定性も良好であった。When writing was performed on the thin film thus obtained using a semiconductor laser as a light source, pits with a uniform and clear shape were obtained, and the C/N ratio was also good.
Storage stability was also good.
実施例J
下記構造式のす7トキノン系色素f2×10””Tor
rの真空下で、約g o −/ j O℃に加熱し、板
厚/コ關のメタアクリル樹脂(以下、PMMAと記す)
基板上に真空蒸着した。蒸着膜厚は水晶振動式膜厚計に
よる真空蒸着膜厚測定の結果、1g00Aであった。分
光光度計による最大吸収波長は790 nmであシ、ス
ペクトルの形状は、巾広かった。Example J Toquinone dye f2×10”Tor with the following structural formula
Under a vacuum of r, heat to about g o − / j O ℃, and methacrylic resin (hereinafter referred to as PMMA) of the plate thickness/column is heated.
Vacuum deposited onto the substrate. The thickness of the deposited film was 1g00A as a result of measuring the thickness of the vacuum deposited film using a crystal vibration type film thickness meter. The maximum absorption wavelength measured by the spectrophotometer was 790 nm, and the shape of the spectrum was broad.
ナフトキノン系色素:
また、この記録媒体は、室内光中、温度90℃、湿度デ
0多の条件下で良好な保存安定性を示した。Naphthoquinone dye: This recording medium also exhibited good storage stability under room light, temperature of 90° C., and humidity of 0.
実施例ダ
実施例Jにおいて用いたナフトキノン系色素の代わシに
下記第1表に示した化合物を使用して基板に蒸着したと
ころ、下記第2表に示す最大吸収波長をもつ薄膜基板を
得た。このようにして得られた薄膜に光源として半導体
レーザーを用いて書き込みを行なったところ均一かつ明
瞭な形状のビットが得られた。C/N比も良好であシ、
保存安定性も良好であった。Example D When the compounds shown in Table 1 below were used in place of the naphthoquinone dye used in Example J and deposited on a substrate, a thin film substrate having the maximum absorption wavelength shown in Table 2 below was obtained. . When writing was performed on the thin film thus obtained using a semiconductor laser as a light source, bits with a uniform and clear shape were obtained. The C/N ratio is also good.
Storage stability was also good.
このようにして得られた薄膜に、光源として半導体レー
ザーを用いビーム径1μm 波長7ざOnmで書き込み
を行なったところ、均一かつ明瞭な形状のビット(孔)
が得られた。キャリヤーレベル/ノイズレベル(C/N
)比も高く良好であった。When writing was performed on the thin film obtained in this way using a semiconductor laser as a light source with a beam diameter of 1 μm and a wavelength of 7 nm, uniform and clearly shaped bits (holes) were formed.
was gotten. Carrier level/noise level (C/N
) ratio was also high and good.
実施例S
合 成
下記構造式
%式%:)
で精製単離し、下記構造式で表わされるナフトキノン系
誘導体を得た。(収率グ9係)(iso)H7QNH0
で表わされる化合物グl■(O,/5mm01)と下記
構造式
SOoり即(0,2r mmol )を脱気したN、N
−ジメチルホルムア□ド、7 mlに溶解し、アルゴン
雰囲気下、常温で6〜72時間攪拌した。Example S Synthesis Purification and isolation were carried out using the following structural formula (% formula %:) to obtain a naphthoquinone derivative represented by the following structural formula. (Yield 9) (iso)H7QNH0 Compound group (O,/5mm01) and the following structural formula SOo (0.2r mmol) were degassed with N,N
The solution was dissolved in 7 ml of -dimethylformamide and stirred at room temperature for 6 to 72 hours under an argon atmosphere.
反応終了後、ioomtの水に反応溶液をそそぎ、析出
物をe過、採取した。After the reaction was completed, the reaction solution was poured into ioomt water, and the precipitate was collected by e-filtration.
次に、このものをエタノールbomlと6N塩酸の混合
溶媒に溶かし、6〜12時間攪拌した。酢酸ナトリウム
水溶液で中和ののち、クロロホルムで抽出し、減圧下溶
媒を溶去、反応混合物をシリカゲルカラムクロマトグラ
フC387(iso)
本化合物の融点は/63〜/ A Q ’(:、であり
、λmax (CHCl、 ) 7 !; 2 nmで
εは/、乙×704であった。Next, this product was dissolved in a mixed solvent of ethanol boml and 6N hydrochloric acid, and stirred for 6 to 12 hours. After neutralization with an aqueous sodium acetate solution, extraction with chloroform was performed, the solvent was eluted under reduced pressure, and the reaction mixture was subjected to silica gel column chromatography C387 (ISO). λmax (CHCl, ) 7!; At 2 nm, ε was /, O×704.
実施例6
実施例Sと同様に合成したところ、第3表に示すλ1n
aX % ε、融点をもつナフトキノン誘導体が得ら
れた。Example 6 When synthesized in the same manner as Example S, λ1n shown in Table 3 was obtained.
A naphthoquinone derivative with a melting point of aX % ε was obtained.
実施例り
合 成
実施例/にkいてコーアミノベンゼンチオール/、2J
?の代シに、下記構造式
で表わされる化合物/、j’j−5’を用いたu外は実
施例/と同様に行ない、下記構造式で表わされるナフト
キノン系誘導体を得た。Example Synthesis Synthesis Example/Co-aminobenzenethiol/, 2J
? Instead, a naphthoquinone derivative represented by the following structural formula was obtained in the same manner as in Example/, except that u used a compound represented by the following structural formula /, and j'j-5'.
本化合物の融点は/’Ig〜iso℃であり、λma
x (Cl−lCl! )は第3図に示すように773
nrnでt=2./X10’であった。The melting point of this compound is /'Ig~iso℃, and λma
x (Cl-lCl!) is 773 as shown in Figure 3.
nrn and t=2. /X10'.
成膜法
前記合成例で得たナフトキノン系誘導体を実施列lに記
載の方法に従ってメチノ(・メタクリレート樹脂基板上
にスピナー法による塗布を行なった。Film Forming Method The naphthoquinone derivative obtained in the above synthesis example was applied onto a methino(methacrylate) resin substrate by a spinner method according to the method described in Example 1.
塗布膜の最大吸収波長は7 g ? nmでアう、スペ
クトルの形状は巾広かった。The maximum absorption wavelength of the coating film is 7 g? The shape of the spectrum was wide in nm.
光記録法
上記の塗布膜に、中心波長7 g Onmの半導体レー
ザー光で照射したところ、輪郭の明瞭なビットを形成し
た。Optical Recording Method When the above coating film was irradiated with a semiconductor laser beam having a center wavelength of 7 g Onm, a bit with a clear outline was formed.
この塗布膜の保存安定性(bo℃、go%RH)は比較
的良好であった〇
実施例ざ
実施例りに釦いて用いた化合物の代わシに第9表に示し
た化合物を使用して塗布したところ、第9表に示す最大
吸収波長をもつ薄膜基板を得た。このようにして得られ
た薄膜に光源として半導体レーザーを用いて書き込みを
行なったところ、均一かつ明瞭な形状のビットが得られ
た。The storage stability (bo℃, go%RH) of this coating film was relatively good.Examples: Compounds shown in Table 9 were used instead of the compounds used in the examples. Upon coating, a thin film substrate having the maximum absorption wavelength shown in Table 9 was obtained. When writing was performed on the thin film thus obtained using a semiconductor laser as a light source, bits with a uniform and clear shape were obtained.
C/ N比も良好であう、保存安定性も良好であった0
〔発明の効果〕
地上詳述した通シ、本発明のナフトキノン系誘導体は、
蒸着が容易で、有機溶媒に対する溶解性が高く、塗布に
よるコーティングも可能でしかも、反射率が高ぐ、コン
トラストが良好で保存安定性に優れている。The C/N ratio was also good, and the storage stability was also good.0 [Effects of the Invention] As detailed above, the naphthoquinone derivative of the present invention has
It is easy to vapor deposit, has high solubility in organic solvents, can be coated by coating, and has high reflectance, good contrast, and excellent storage stability.
従って、このような誘導体を含む記録層を設けた本発明
の光学記録媒体は、容易かつ効率的に製造することがで
き、その記録、再生等の緒特性にも優れしかも安定性が
高いため、工業的に極めて有用である。Therefore, the optical recording medium of the present invention provided with a recording layer containing such a derivative can be manufactured easily and efficiently, has excellent recording and reproduction characteristics, and is highly stable. It is extremely useful industrially.
第1図は実施例/で得られた化合物のクロロホルム溶液
中での吸収スペクトル図である。
図中、縦軸は吸光度、横軸は波長(nm)を表わすO
第2図は実施例/で得られた塗布膜の吸収及び反射スペ
クトル図である。
図中、実線は吸収スペクトル、破線は反射スペクトルを
表わす。
左側の縦軸は吸光度を表わし、右側は反射率(り)を表
わす。横軸は波長(nrn)を表わす。
第3図は実施例7で得られた化合物のクロロホルム溶液
中でのスペクトル図である。
図中、縦軸は吸光度、横軸は波長(nm、l’を表わす
。
出 願 人 三菱化成工業株式会社
代 理 人 長谷用 −
(ほか7名)
第
図
皮表(/7,77)
昂
壇
一所 1
2人 T(
(nrn)FIG. 1 is an absorption spectrum diagram of the compound obtained in Example/in a chloroform solution. In the figure, the vertical axis represents absorbance, and the horizontal axis represents wavelength (nm). FIG. 2 is an absorption and reflection spectrum chart of the coating film obtained in Example. In the figure, the solid line represents the absorption spectrum, and the broken line represents the reflection spectrum. The left vertical axis represents absorbance, and the right side represents reflectance (ri). The horizontal axis represents wavelength (nrn). FIG. 3 is a spectrum diagram of the compound obtained in Example 7 in a chloroform solution. In the figure, the vertical axis represents absorbance, and the horizontal axis represents wavelength (nm, l'). Applicant: Mitsubishi Chemical Industries, Ltd. Agent: Yo Hase - (and 7 others) Dan Issho 1 2 people T( (nrn)
Claims (2)
I 〕 (式中、R^1、R^2は水素原子、置換もしくは非置
換のアルキル基、置換もしくは非置換のシクロアルキル
基、置換もしくは非置換のアリール基又は置換もしくは
非置換のアルケニル基を示し、R^3は水素原子、ハロ
ゲン原子、アルキル基、アシルアミノ基又はアルコキシ
基を示し、R^4は水素原子、ハロゲン原子を示し、X
はSまたはSeを示し、YはCHまたはNを示す。)で
表わされるナフトキノン系誘導体。(1) The following general formula [I] ▲There are mathematical formulas, chemical formulas, tables, etc.▼・・・・・・・・・
I] (In the formula, R^1 and R^2 represent a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted cycloalkyl group, a substituted or unsubstituted aryl group, or a substituted or unsubstituted alkenyl group) , R^3 represents a hydrogen atom, a halogen atom, an alkyl group, an acylamino group, or an alkoxy group, R^4 represents a hydrogen atom, a halogen atom, and X
represents S or Se, and Y represents CH or N. ) naphthoquinone derivatives.
素に熱的変化を与える集束レーザー光を照射して、前記
記録層に部分的な変化を生ぜしめて記録を行ない、次い
で該変化部分の選択によって再生を行なう記録媒体にお
いて、該色素として、前記一般式〔 I 〕で表わされる
ナフトキノン系誘導体を使用したことを特徴とする光学
記録媒体。(2) Recording is performed by irradiating a recording layer containing a dye supported on a substrate with a focused laser beam that causes a thermal change in the dye to cause a partial change in the recording layer, and then performing the recording. An optical recording medium in which reproduction is performed by selecting a portion, characterized in that a naphthoquinone derivative represented by the general formula [I] is used as the dye.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63058993A JPH02167271A (en) | 1987-06-03 | 1988-03-12 | Naphthoquinone derivative and optical recording medium using the derivative |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62-139344 | 1987-06-03 | ||
JP13934487 | 1987-06-03 | ||
JP63058993A JPH02167271A (en) | 1987-06-03 | 1988-03-12 | Naphthoquinone derivative and optical recording medium using the derivative |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH02167271A true JPH02167271A (en) | 1990-06-27 |
Family
ID=26400014
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63058993A Pending JPH02167271A (en) | 1987-06-03 | 1988-03-12 | Naphthoquinone derivative and optical recording medium using the derivative |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH02167271A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007277126A (en) * | 2006-04-04 | 2007-10-25 | Fujifilm Corp | Azine-based compound |
-
1988
- 1988-03-12 JP JP63058993A patent/JPH02167271A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007277126A (en) * | 2006-04-04 | 2007-10-25 | Fujifilm Corp | Azine-based compound |
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