JPH04361088A - Optical record medium - Google Patents
Optical record mediumInfo
- Publication number
- JPH04361088A JPH04361088A JP3137566A JP13756691A JPH04361088A JP H04361088 A JPH04361088 A JP H04361088A JP 3137566 A JP3137566 A JP 3137566A JP 13756691 A JP13756691 A JP 13756691A JP H04361088 A JPH04361088 A JP H04361088A
- Authority
- JP
- Japan
- Prior art keywords
- group
- optical recording
- recording medium
- formula
- azo
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 76
- 239000010410 layer Substances 0.000 claims abstract description 46
- -1 azo compound Chemical class 0.000 claims abstract description 38
- 150000001875 compounds Chemical class 0.000 claims abstract description 34
- 229910052751 metal Inorganic materials 0.000 claims abstract description 33
- 239000002184 metal Substances 0.000 claims abstract description 33
- 239000013522 chelant Substances 0.000 claims abstract description 28
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 26
- 125000000623 heterocyclic group Chemical group 0.000 claims abstract description 17
- 239000011241 protective layer Substances 0.000 claims abstract description 16
- 239000000758 substrate Substances 0.000 claims abstract description 13
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 10
- 125000004433 nitrogen atom Chemical group N* 0.000 claims abstract description 8
- 125000003118 aryl group Chemical group 0.000 claims abstract description 7
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 7
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 6
- 239000001257 hydrogen Substances 0.000 claims abstract description 6
- 239000000126 substance Substances 0.000 claims description 13
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 10
- 125000001424 substituent group Chemical group 0.000 claims description 10
- 125000000547 substituted alkyl group Chemical group 0.000 claims description 6
- 125000005017 substituted alkenyl group Chemical group 0.000 claims description 2
- 125000003107 substituted aryl group Chemical group 0.000 claims description 2
- 125000005346 substituted cycloalkyl group Chemical group 0.000 claims description 2
- 239000010408 film Substances 0.000 description 37
- 238000000576 coating method Methods 0.000 description 33
- 239000011248 coating agent Substances 0.000 description 32
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 16
- 238000010521 absorption reaction Methods 0.000 description 15
- 229920005989 resin Polymers 0.000 description 15
- 239000011347 resin Substances 0.000 description 15
- 230000035945 sensitivity Effects 0.000 description 13
- 238000003860 storage Methods 0.000 description 13
- 238000004519 manufacturing process Methods 0.000 description 12
- 230000006866 deterioration Effects 0.000 description 11
- 239000000975 dye Substances 0.000 description 11
- 238000004544 sputter deposition Methods 0.000 description 11
- 238000000034 method Methods 0.000 description 10
- 239000000243 solution Substances 0.000 description 10
- 238000013112 stability test Methods 0.000 description 10
- 239000010931 gold Substances 0.000 description 7
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical class C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 6
- 238000001035 drying Methods 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- CSUFEOXMCRPQBB-UHFFFAOYSA-N 1,1,2,2-tetrafluoropropan-1-ol Chemical compound CC(F)(F)C(O)(F)F CSUFEOXMCRPQBB-UHFFFAOYSA-N 0.000 description 5
- 239000010949 copper Substances 0.000 description 5
- 125000005843 halogen group Chemical group 0.000 description 5
- 230000001678 irradiating effect Effects 0.000 description 5
- 229920005668 polycarbonate resin Polymers 0.000 description 5
- 239000004431 polycarbonate resin Substances 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- KUGBQWBWWNPMIT-UHFFFAOYSA-N 1,1,2,2,3,3,4,4-octafluoropentan-1-ol Chemical compound CC(F)(F)C(F)(F)C(F)(F)C(O)(F)F KUGBQWBWWNPMIT-UHFFFAOYSA-N 0.000 description 4
- 125000002252 acyl group Chemical group 0.000 description 4
- 125000004442 acylamino group Chemical group 0.000 description 4
- 125000003282 alkyl amino group Chemical group 0.000 description 4
- 125000000217 alkyl group Chemical group 0.000 description 4
- 125000001769 aryl amino group Chemical group 0.000 description 4
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 description 4
- 125000004093 cyano group Chemical group *C#N 0.000 description 4
- 125000004185 ester group Chemical group 0.000 description 4
- 238000002347 injection Methods 0.000 description 4
- 239000007924 injection Substances 0.000 description 4
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- 238000004528 spin coating Methods 0.000 description 4
- 125000000565 sulfonamide group Chemical group 0.000 description 4
- ANRHNWWPFJCPAZ-UHFFFAOYSA-M thionine Chemical compound [Cl-].C1=CC(N)=CC2=[S+]C3=CC(N)=CC=C3N=C21 ANRHNWWPFJCPAZ-UHFFFAOYSA-M 0.000 description 4
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 3
- LPEKGGXMPWTOCB-UHFFFAOYSA-N 8beta-(2,3-epoxy-2-methylbutyryloxy)-14-acetoxytithifolin Natural products COC(=O)C(C)O LPEKGGXMPWTOCB-UHFFFAOYSA-N 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 3
- 229910006069 SO3H Inorganic materials 0.000 description 3
- 125000003545 alkoxy group Chemical group 0.000 description 3
- 150000001450 anions Chemical class 0.000 description 3
- 239000011230 binding agent Substances 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 150000001721 carbon Chemical group 0.000 description 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 3
- ODQWQRRAPPTVAG-GZTJUZNOSA-N doxepin Chemical compound C1OC2=CC=CC=C2C(=C/CCN(C)C)/C2=CC=CC=C21 ODQWQRRAPPTVAG-GZTJUZNOSA-N 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229940057867 methyl lactate Drugs 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- 229920003023 plastic Polymers 0.000 description 3
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 3
- 229920001296 polysiloxane Polymers 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- QPFMBZIOSGYJDE-UHFFFAOYSA-N 1,1,2,2-tetrachloroethane Chemical compound ClC(Cl)C(Cl)Cl QPFMBZIOSGYJDE-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 239000000020 Nitrocellulose Substances 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical group C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 239000005456 alcohol based solvent Substances 0.000 description 2
- 125000005153 alkyl sulfamoyl group Chemical group 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- 125000004397 aminosulfonyl group Chemical group NS(=O)(=O)* 0.000 description 2
- 125000003710 aryl alkyl group Chemical group 0.000 description 2
- 125000004104 aryloxy group Chemical group 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- DIKBFYAXUHHXCS-UHFFFAOYSA-N bromoform Chemical compound BrC(Br)Br DIKBFYAXUHHXCS-UHFFFAOYSA-N 0.000 description 2
- 238000005266 casting Methods 0.000 description 2
- 150000001768 cations Chemical class 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 238000007606 doctor blade method Methods 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- BHIWKHZACMWKOJ-UHFFFAOYSA-N methyl isobutyrate Chemical compound COC(=O)C(C)C BHIWKHZACMWKOJ-UHFFFAOYSA-N 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 229920001220 nitrocellulos Polymers 0.000 description 2
- 239000010948 rhodium Substances 0.000 description 2
- 125000005415 substituted alkoxy group Chemical group 0.000 description 2
- 229920001187 thermosetting polymer Polymers 0.000 description 2
- NAWXUBYGYWOOIX-SFHVURJKSA-N (2s)-2-[[4-[2-(2,4-diaminoquinazolin-6-yl)ethyl]benzoyl]amino]-4-methylidenepentanedioic acid Chemical compound C1=CC2=NC(N)=NC(N)=C2C=C1CCC1=CC=C(C(=O)N[C@@H](CC(=C)C(O)=O)C(O)=O)C=C1 NAWXUBYGYWOOIX-SFHVURJKSA-N 0.000 description 1
- POILWHVDKZOXJZ-ARJAWSKDSA-M (z)-4-oxopent-2-en-2-olate Chemical compound C\C([O-])=C\C(C)=O POILWHVDKZOXJZ-ARJAWSKDSA-M 0.000 description 1
- APQIUTYORBAGEZ-UHFFFAOYSA-N 1,1-dibromoethane Chemical compound CC(Br)Br APQIUTYORBAGEZ-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- NBEGXSQMVJTIAR-UHFFFAOYSA-N 1-hydroxy-3-methylbutan-2-one Chemical compound CC(C)C(=O)CO NBEGXSQMVJTIAR-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- ORIHZIZPTZTNCU-VMPITWQZSA-N 2-[(E)-hydroxyiminomethyl]phenol Chemical compound O\N=C\C1=CC=CC=C1O ORIHZIZPTZTNCU-VMPITWQZSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 229910020518 Co(BF4)2 Inorganic materials 0.000 description 1
- 229910021580 Cobalt(II) chloride Inorganic materials 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- 229910006074 SO2NH2 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical group C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- BBAWTPDTGRXPDG-UHFFFAOYSA-N [1,3]thiazolo[4,5-b]pyridine Chemical group C1=CC=C2SC=NC2=N1 BBAWTPDTGRXPDG-UHFFFAOYSA-N 0.000 description 1
- OTNSELQCFOLCCA-UHFFFAOYSA-N [1,3]thiazolo[4,5-b]quinoline Chemical group C1=CC=C2C=C(SC=N3)C3=NC2=C1 OTNSELQCFOLCCA-UHFFFAOYSA-N 0.000 description 1
- RIUVLOXDBAJYGF-UHFFFAOYSA-N [1,3]thiazolo[5,4-f]quinoline Chemical group N1=CC=CC2=C(SC=N3)C3=CC=C21 RIUVLOXDBAJYGF-UHFFFAOYSA-N 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 150000001540 azides Chemical class 0.000 description 1
- 239000000987 azo dye Substances 0.000 description 1
- BEHLMOQXOSLGHN-UHFFFAOYSA-N benzenamine sulfate Chemical class OS(=O)(=O)NC1=CC=CC=C1 BEHLMOQXOSLGHN-UHFFFAOYSA-N 0.000 description 1
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical group C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 229950005228 bromoform Drugs 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- 150000001767 cationic compounds Chemical class 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910001411 inorganic cation Inorganic materials 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- WDAXFOBOLVPGLV-UHFFFAOYSA-N isobutyric acid ethyl ester Natural products CCOC(=O)C(C)C WDAXFOBOLVPGLV-UHFFFAOYSA-N 0.000 description 1
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 1
- 239000000113 methacrylic resin Substances 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 150000002892 organic cations Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 239000000123 paper Substances 0.000 description 1
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920013716 polyethylene resin Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 1
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 1
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 125000003226 pyrazolyl group Chemical group 0.000 description 1
- UBQKCCHYAOITMY-UHFFFAOYSA-N pyridin-2-ol Chemical group OC1=CC=CC=N1 UBQKCCHYAOITMY-UHFFFAOYSA-N 0.000 description 1
- 125000002943 quinolinyl group Chemical group N1=C(C=CC2=CC=CC=C12)* 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 239000010979 ruby Substances 0.000 description 1
- 229910001750 ruby Inorganic materials 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 239000001003 triarylmethane dye Substances 0.000 description 1
- 125000001814 trioxo-lambda(7)-chloranyloxy group Chemical group *OCl(=O)(=O)=O 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Thermal Transfer Or Thermal Recording In General (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
Abstract
Description
【0001】0001
【産業上の利用分野】本発明は光記録媒体に係り、詳し
くは、記録層にアゾ化合物と金属とのアゾ金属キレート
化合物を含有する、65%以上の反射率を有する高反射
率光記録媒体に関する。[Field of Industrial Application] The present invention relates to an optical recording medium, and more particularly, a high reflectance optical recording medium having a reflectance of 65% or more and containing an azo metal chelate compound of an azo compound and a metal in the recording layer. Regarding.
【0002】0002
【従来の技術】レーザーを用いた光学記録は、高密度の
情報記録保存及び再生を可能とするため、近年特にその
開発が進められている。光学記録の一例としては、光デ
ィスクを挙げることができる。一般に光ディスクは、円
形の基体に設けられた薄い記録層に、1μm程度に集束
したレーザー光を照射し、高密度の情報記録を行うもの
である。その記録は、照射されたレーザー光エネルギー
の吸収によって、その個所の記録層に、分解、蒸発、溶
解等の熱的変形が生成することにより行われる。また、
記録された情報の再生は、レーザー光により変形が起き
ている部分と起きていない部分の反射率の差を読み取る
ことにより行われる。従って、記録層はレーザー光のエ
ネルギーを効率良く吸収する必要があり、このため、レ
ーザー吸収色素が用いられている。2. Description of the Related Art Optical recording using lasers has been particularly developed in recent years because it enables high-density information storage and reproduction. An example of optical recording is an optical disc. In general, optical discs record high-density information by irradiating a thin recording layer provided on a circular base with laser light focused to about 1 μm. The recording is performed by thermal deformation such as decomposition, evaporation, melting, etc. occurring in the recording layer at that location due to absorption of the irradiated laser light energy. Also,
Reproduction of recorded information is performed by reading the difference in reflectance between a portion where deformation has occurred and a portion where no deformation has occurred by laser light. Therefore, the recording layer needs to efficiently absorb the energy of laser light, and for this reason, laser-absorbing dyes are used.
【0003】従来、この種の光学的記録媒体としては、
種々のものが知られているが、近年、特に、コンパクト
ディスク(CD)が広く家庭に普及している。CDは、
アルミニウム等の金属の反射層を有するもので、再生専
用タイプの媒体である。これに対して最近になって、記
録できる(追記型)タイプのCD媒体の提案がなされて
いるが、市販のCDプレイヤーとの互換性のためには、
反射率65%以上の高い反射率の記録媒体であることが
要求される。このような高反射率の媒体として、例えば
、特開平2−42652号、特開平2−87339号、
特開平2−87340号等には、シアニン系色素を記録
層として設けたものが開示されている。Conventionally, as this type of optical recording medium,
Although various types of discs are known, compact discs (CDs) have become particularly popular in homes in recent years. The CD is
It has a reflective layer made of metal such as aluminum, and is a read-only type of medium. Recently, proposals have been made for recordable (write-once) type CD media, but in order to be compatible with commercially available CD players,
A recording medium with a high reflectance of 65% or more is required. Examples of such high reflectance media include JP-A-2-42652, JP-A-2-87339,
JP-A No. 2-87340 and others disclose recording layers in which a cyanine dye is provided as a recording layer.
【0004】0004
【発明が解決しようとする課題】しかし、上記従来のシ
アニン系色素を主として用いた媒体は、溶解性が高く、
塗布によるコーティングが可能であるという利点の反面
、耐光性が劣るという問題点を有している。[Problems to be Solved by the Invention] However, the conventional medium mainly using cyanine dyes has high solubility;
Although it has the advantage of being able to be coated by application, it has the problem of poor light resistance.
【0005】本発明は上記従来の問題点を解決し、耐光
性に優れた高反射率光記録媒体を提供することを目的と
する。An object of the present invention is to solve the above-mentioned conventional problems and provide a high reflectance optical recording medium with excellent light resistance.
【0006】[0006]
【課題を解決するための手段】請求項1の光記録媒体は
、基板上に記録層、金属反射層及び保護層を順次積層し
てなる光記録媒体であって、65%以上の反射率を有す
る光記録媒体において、該記録層が、下記一般式[I]
で示されるアゾ系化合物と金属とのアゾ金属キレート化
合物を1種又は2種以上含有することを特徴とする。[Means for Solving the Problems] The optical recording medium of claim 1 is an optical recording medium comprising a recording layer, a metal reflective layer and a protective layer sequentially laminated on a substrate, and has a reflectance of 65% or more. In the optical recording medium having the following general formula [I], the recording layer has the following general formula [I]
It is characterized by containing one or more kinds of azo metal chelate compounds of an azo compound and a metal represented by:
【0007】[0007]
【化4】[C4]
【0008】(式中、Aはそれが結合している炭素原子
及び窒素原子と一緒になって複素環を形成する残基を表
わし、Bはそれが結合している二つの炭素原子と一緒に
なって芳香環又は複素環を形成する残基を表わし、Xは
活性水素を有する基を表わす。)請求項2の光記録媒体
は、請求項1の光記録媒体において、アゾ化合物が下記
一般式[II]で示される化合物であることを特徴とす
る。(In the formula, A represents a residue that forms a heterocycle together with the carbon atom and nitrogen atom to which it is bonded, and B represents a residue that forms a heterocycle together with the two carbon atoms to which it is bonded. (X represents a group having active hydrogen.) The optical recording medium according to claim 2 is the optical recording medium according to claim 1, in which the azo compound has the following general formula It is characterized by being a compound represented by [II].
【0009】[0009]
【化5】[C5]
【0010】(式中、Aはそれが結合している炭素原子
と窒素原子と一緒になって複素環を形成する残基を表わ
し、R1及びR2はそれぞれ独立して水素原子、置換さ
れていても良いアルキル基、置換されていても良いアリ
ール基、置換されていても良いアルケニル基又は置換さ
れていても良いシクロアルキル基を表わし、Xは活性水
素を有する基を表わす。環Dは置換基を有していても良
い。)請求項3の光記録媒体は、請求項2の光記録媒体
において、アゾ化合物が下記一般式[III]で示され
る化合物であることを特徴とする。(In the formula, A represents a residue that forms a heterocycle together with the carbon atom and nitrogen atom to which it is bonded, and R1 and R2 are each independently a hydrogen atom or a substituted represents an optionally substituted alkyl group, an optionally substituted aryl group, an optionally substituted alkenyl group, or an optionally substituted cycloalkyl group, and X represents a group having active hydrogen. Ring D represents a substituent. ) The optical recording medium according to claim 3 is characterized in that, in the optical recording medium according to claim 2, the azo compound is a compound represented by the following general formula [III].
【0011】[0011]
【化6】[C6]
【0012】(式中、Aはそれが結合している炭素原子
と窒素原子と一緒になって複素環を形成する残基を表わ
し、R1及びR2はそれぞれ独立して水素原子、置換さ
れていても良いアルキル基、置換されていても良いアリ
ール基、置換されていても良いアルケニル基又は置換さ
れていても良いシクロアルキル基を表わす。環Dは置換
基を有していても良い。)以下に本発明を詳細に説明す
る。一般式[I]で示されるアゾ系化合物において、A
はそれが結合している炭素原子及び窒素原子と一緒に複
素環を形成する残基を表わし、好ましくは、少なくとも
1個の5〜7員の複素環を形成するのに必要な複数個の
原子を表わす。Aにより形成される複素環上の水素原子
は1つ以上の置換基で置換されていても良い。この場合
、置換基としては、アルキル基、アルコキシ基、アリー
ルオキシ基、アラルキル基、アリール基、ハロゲン原子
、シアノ基、ニトロ基、エステル基、カルバモイル基、
アシル基、アシルアミノ基、スルファモイル基、スルホ
ンアミド基、アミノ基、アルキルアミノ基、アリールア
ミノ基、ヒドロキシル基、フェニルアゾ基、ピリジノア
ゾ基等が挙げられ、置換基のうち好ましいものとしては
、炭素数1〜25の置換されていても良いアルキル基、
炭素数8〜25の置換されていても良いアルコキシ基、
ハロゲン原子、シアノ基、ニトロ基、炭素数1〜25の
置換されていても良いアルキルスルファモイル基、炭素
数6〜30の置換されていても良いフェニルスルファモ
イル基、フェニルアゾ基、ピリジノシゾ基、炭素数1〜
25のエステル基、炭素数1〜25のカルバモイル基、
炭素数1〜25のアシル基、炭素数1〜25のアシルア
ミノ基、炭素数1〜25のスルホンアミド基、下記一般
式[IV]で示されるアルキルアミノ基、アリールアミ
ノ基、水素基等が挙げられる。(In the formula, A represents a residue that forms a heterocycle together with the carbon atom and nitrogen atom to which it is bonded, and R1 and R2 are each independently a hydrogen atom or a substituted represents an alkyl group that may be substituted, an aryl group that may be substituted, an alkenyl group that may be substituted, or a cycloalkyl group that may be substituted. Ring D may have a substituent.) Below: The present invention will be explained in detail below. In the azo compound represented by the general formula [I], A
represents a residue that forms a heterocycle together with the carbon and nitrogen atoms to which it is attached, preferably a plurality of atoms necessary to form at least one 5- to 7-membered heterocycle represents. The hydrogen atom on the heterocycle formed by A may be substituted with one or more substituents. In this case, the substituent includes an alkyl group, an alkoxy group, an aryloxy group, an aralkyl group, an aryl group, a halogen atom, a cyano group, a nitro group, an ester group, a carbamoyl group,
Examples include an acyl group, an acylamino group, a sulfamoyl group, a sulfonamide group, an amino group, an alkylamino group, an arylamino group, a hydroxyl group, a phenylazo group, a pyridinoazo group, and among the substituents, preferred are those having 1 to 1 carbon atoms. 25 optionally substituted alkyl groups,
an optionally substituted alkoxy group having 8 to 25 carbon atoms,
Halogen atom, cyano group, nitro group, optionally substituted alkylsulfamoyl group having 1 to 25 carbon atoms, optionally substituted phenylsulfamoyl group having 6 to 30 carbon atoms, phenylazo group, pyridinoschizo group , carbon number 1~
25 ester group, carbamoyl group having 1 to 25 carbon atoms,
Examples include an acyl group having 1 to 25 carbon atoms, an acylamino group having 1 to 25 carbon atoms, a sulfonamide group having 1 to 25 carbon atoms, an alkylamino group represented by the following general formula [IV], an arylamino group, a hydrogen group, etc. It will be done.
【0013】[0013]
【化7】[C7]
【0014】(式中、R3及びR4は水素原子、炭素数
1〜25の置換されていても良いアルキル基又はフェニ
ル基を表わす。R3及びR4は一緒になって5又は6員
環を形成しても良い。)Aにより形成される複素環の中
で好ましいものとしては、チアゾール環、ベンゾチアゾ
ール環、ピリドベンゾチアゾール環、ベンゾピリドチア
ゾール環、ピリドチアゾール環、ピリジン環、キノリン
環等が挙げられる。(In the formula, R3 and R4 represent a hydrogen atom, an optionally substituted alkyl group having 1 to 25 carbon atoms, or a phenyl group. R3 and R4 together form a 5- or 6-membered ring. ) Preferred examples of the heterocycle formed by A include a thiazole ring, a benzothiazole ring, a pyridobenzothiazole ring, a benzopyridothiazole ring, a pyridothiazole ring, a pyridine ring, and a quinoline ring. can be mentioned.
【0015】また、一般式[I]で示されるアゾ系化合
物において、Bはそれが結合している二つの炭素原子と
一緒になって芳香環又は複素環を形成する残基を表わし
、好ましくは、少なくとも1個の5〜7員の芳香環又は
複素環を形成するのに必要な複数個の原子を表わす。
Bにより形成される環上の水素原子は1つ以上の置換基
で置換されていても良い。この場合、置換基としては、
アルキル基、アルコキシ基、アリールオキシ基、アラル
キル基、アリール基、ハロゲン原子、シアノ基、ニトロ
基、エステル基、カルバモイル基、アシル基、アシルア
ミノ基、スルファモイル基、スルホンアミド基、アミノ
基、アルキルアミノ基、アリールアミノ基、ヒドロキシ
ル基等が挙げられ、置換基のうち好ましいものとしては
炭素数1〜25の置換されていても良いアルキル基、炭
素数8〜25の置換されていても良いアルコキシ基、ハ
ロゲン原子、シアノ基、ニトロ基、炭素数1〜25の置
換されていても良いアルキルスルファモイル基、炭素数
6〜30の置換されていても良いフェニルスルファモイ
ル基、フェニルアゾ基、ピリジノアゾ基、炭素数1〜2
5のエステル基、炭素数1〜25のカルバモイル基、炭
素数1〜25のアシル基、炭素数1〜25のアシルアミ
ノ基、炭素数1〜25のスルホンアミド基、前記一般式
[IV]で示されるアルキルアミノ基、アリールアミノ
基、水素基等が挙げられる。[0015] In the azo compound represented by the general formula [I], B represents a residue that forms an aromatic ring or a heterocycle together with the two carbon atoms to which it is bonded, and preferably , represents a plurality of atoms necessary to form at least one 5- to 7-membered aromatic ring or heterocycle. The hydrogen atom on the ring formed by B may be substituted with one or more substituents. In this case, the substituent is
Alkyl group, alkoxy group, aryloxy group, aralkyl group, aryl group, halogen atom, cyano group, nitro group, ester group, carbamoyl group, acyl group, acylamino group, sulfamoyl group, sulfonamide group, amino group, alkylamino group , an arylamino group, a hydroxyl group, etc., and preferred among the substituents are an optionally substituted alkyl group having 1 to 25 carbon atoms, an optionally substituted alkoxy group having 8 to 25 carbon atoms, Halogen atom, cyano group, nitro group, optionally substituted alkylsulfamoyl group having 1 to 25 carbon atoms, optionally substituted phenylsulfamoyl group having 6 to 30 carbon atoms, phenylazo group, pyridinoazo group , carbon number 1-2
5 ester group, a carbamoyl group having 1 to 25 carbon atoms, an acyl group having 1 to 25 carbon atoms, an acylamino group having 1 to 25 carbon atoms, a sulfonamide group having 1 to 25 carbon atoms, represented by the above general formula [IV] Examples include an alkylamino group, an arylamino group, a hydrogen group, etc.
【0016】Bにより形成される環の中で好ましいもの
としては、ベンゼン環、ナフタレン環、ピリジン環、ピ
リドン環又はピラゾール環等が挙げられる。Among the rings formed by B, preferred are a benzene ring, a naphthalene ring, a pyridine ring, a pyridone ring, and a pyrazole ring.
【0017】更に、一般式[I]で示されるアゾ系化合
物において、Xとしては活性水素を有する基であれば良
く、特に制限されないが、好ましいものとしては、−O
H、−COOH、−SO3H、−B(OH)2、−HN
SO2R5(R5は水素原子、炭素数1〜25の置換さ
れていても良いアルキル基又はフェニル基を表わす。)
、−CONH2、−SO2NH2、−NH2等が挙げら
れ、特に好ましいものとしては、−OH、−COOH、
−SO3H、−HNSO2R5(R5は前記定義に同じ
。)が挙げられる。なお、Xが−COOH、−OH、−
SO3Hなどのように陰イオンを解離し得る基である場
合には、アゾ金属キレート化合物の形成に際してはこの
ままの形で用いても良く、また、陽イオンとの塩の形で
用いても良い。陽イオンとしては、Na+、Li+、K
+等の無機系の陽イオン又はP+(Ph)、N+(C2
H4)4、N+(C4H9(n))4、Ph−N+(C
H3)3等の有機系の陽イオンが挙げられる(なお、上
記においてPhはベンゼン核を示す。)。Furthermore, in the azo compound represented by the general formula [I], X may be any group having active hydrogen and is not particularly limited, but is preferably -O
H, -COOH, -SO3H, -B(OH)2, -HN
SO2R5 (R5 represents a hydrogen atom, an optionally substituted alkyl group having 1 to 25 carbon atoms, or a phenyl group)
, -CONH2, -SO2NH2, -NH2, etc., and particularly preferred ones include -OH, -COOH,
-SO3H, -HNSO2R5 (R5 is the same as defined above). In addition, X is -COOH, -OH, -
When the group is capable of dissociating an anion, such as SO3H, it may be used as is when forming an azo metal chelate compound, or it may be used in the form of a salt with a cation. Cations include Na+, Li+, K
Inorganic cations such as + or P+ (Ph), N+ (C2
H4)4, N+(C4H9(n))4, Ph-N+(C
Examples include organic cations such as H3)3 (in the above, Ph indicates a benzene nucleus).
【0018】一般式[I]で示されるアゾ系化合物の中
で好ましいものとしては、前記一般式[II]で示され
るアゾ系化合物が、また、特に好ましいアゾ系化合物と
しては、前記一般式[III]で示されるアゾ系化合物
が挙げられる。なお、環Dの置換基としては、アルキル
基、アルコキシ基、ハロゲン原子が好ましい。Among the azo compounds represented by the general formula [I], preferred are the azo compounds represented by the general formula [II], and particularly preferred are the azo compounds represented by the general formula [II]. III]. In addition, as a substituent of ring D, an alkyl group, an alkoxy group, and a halogen atom are preferable.
【0019】このようなアゾ系化合物とともにアゾ金属
キレート化合物を形成する金属としては、一般に該アゾ
化合物とキレート化合物を形成する能力のある金属であ
れば良く、特に制限はないが、ニッケル(Ni)、コバ
ルト(Co)、鉄(Fe)、ルテニウム(Ru)、ロジ
ウム(Rh)、パラジウム(Pd)、銅(Cu)、オス
ミウム(Os)、イリジウム(Ir)、白金(Pt)等
の遷移元素が好ましく、特にNi、Coである場合が好
ましい。これらは製造時Ni(CH3COO)2、Ni
Cl2、CoCl2、Co(BF4)2、Co(CH3
COO)2等の塩の形で用いられ、Ni2+、Co2+
、Co3+等が配位したキレート化合物として得られる
。[0019] The metal that forms an azo metal chelate compound with such an azo compound is generally any metal that has the ability to form a chelate compound with the azo compound, and there is no particular restriction, but nickel (Ni) may be used. , cobalt (Co), iron (Fe), ruthenium (Ru), rhodium (Rh), palladium (Pd), copper (Cu), osmium (Os), iridium (Ir), platinum (Pt), etc. Preferably, Ni and Co are particularly preferable. These are Ni(CH3COO)2, Ni
Cl2, CoCl2, Co(BF4)2, Co(CH3
COO)2 and other salts, Ni2+, Co2+
It is obtained as a chelate compound coordinated with , Co3+, etc.
【0020】本発明において用いられるアゾ金属キレー
ト化合物の合成は、例えば、「古川;Analytic
a Chimica Acta 140(198
2)281−289」の記載に準じて行なうことができ
る。具体的には、前記一般式[II]で示されるアゾ系
化合物の金属キレート化合物は、まず、下記一般式[V
]で示されるアミノ化合物を、常法に従って、ジアゾ化
し、下記一般式[VI]で示される置換アニリンスルホ
ン酸誘導体とカップリングして前記一般式[II]で示
されるアゾ化合物を得、次いで得られたアゾ化合物と金
属塩とを水及び/又はジオキサン、テトラヒドロフラン
、アセトン、エタノール等の有機溶媒中で反応させるこ
とによって製造することができる。[0020] The synthesis of the azo metal chelate compound used in the present invention is described, for example, in "Furukawa; Analytic
a Chimica Acta 140 (198
2) 281-289". Specifically, the metal chelate compound of the azo compound represented by the general formula [II] is first prepared by the following general formula [V
] is diazotized according to a conventional method, and coupled with a substituted aniline sulfonic acid derivative represented by the following general formula [VI] to obtain an azo compound represented by the general formula [II], and then It can be produced by reacting the obtained azo compound with a metal salt in water and/or an organic solvent such as dioxane, tetrahydrofuran, acetone, or ethanol.
【0021】[0021]
【化8】[Chemical formula 8]
【0022】(式中、A、並びに、環D、R1、R2及
びXは前記定義に同じ。)上記アゾ金属キレート化合物
の製造に用いるNi2+、Co2+等の金属塩の陰イオ
ンとしては、好ましくはSCN−,SbF6−、Cl−
、Br−、F−,ClO4−、BF4−、PF6−、C
H3COO−、TiF62−、SiF62−、ZrF6
2−、Ph−SO3−、CH3−Ph−SO3−、B−
(Ph)4等の一価または二価の陰イオンが好ましく、
特にBF4−、PF6−、CH3COO−が好ましく用
いられる(なお、Phはベンゼン核を示す。)。(In the formula, A, and rings D, R1, R2 and X are the same as defined above.) The anion of the metal salt such as Ni2+ or Co2+ used in the production of the above azo metal chelate compound is preferably SCN-, SbF6-, Cl-
, Br-, F-, ClO4-, BF4-, PF6-, C
H3COO-, TiF62-, SiF62-, ZrF6
2-, Ph-SO3-, CH3-Ph-SO3-, B-
Monovalent or divalent anions such as (Ph)4 are preferred;
In particular, BF4-, PF6-, and CH3COO- are preferably used (Ph represents a benzene nucleus).
【0023】次に本発明の光記録媒体の構成について説
明する。Next, the structure of the optical recording medium of the present invention will be explained.
【0024】本発明の高反射率光記録媒体は、基本的に
は基板上に、少なくとも1種以上の前記アゾ金属キレー
ト化合物を含む記録層、金属反射層及び保護層を順次積
層した層構成をとる。The high reflectance optical recording medium of the present invention basically has a layer structure in which a recording layer containing at least one kind of the azo metal chelate compound, a metal reflective layer, and a protective layer are sequentially laminated on a substrate. Take.
【0025】本発明における基板としては、使用するレ
ーザー光に対して透明又は不透明のいずれでも良い。基
板の材質としては、ガラス、プラスチック、紙、板状又
は箔状の金属等の一般の記録材料の支持体が挙げられる
が、プラスチックが種々の点から好適に使用できる。プ
ラスチックとしては、アクリル樹脂、メタクリル樹脂、
酢酸ビニル樹脂、塩化ビニル樹脂、ニトロセルロース、
ポリエチレン樹脂、ポリプロピレン樹脂、ポリカーボネ
ート樹脂、ポリイミド樹脂、エポキシ樹脂、ポリサルホ
ン樹脂等が挙げられるが、生産性、コスト、耐吸湿性の
点から射出成形型のポリカーボネート樹脂基板が特に好
ましく用いられる。The substrate in the present invention may be either transparent or opaque to the laser beam used. Examples of the material for the substrate include supports for general recording materials such as glass, plastic, paper, plate-like or foil-like metals, and plastics are preferably used from various points of view. Plastics include acrylic resin, methacrylic resin,
Vinyl acetate resin, vinyl chloride resin, nitrocellulose,
Examples include polyethylene resin, polypropylene resin, polycarbonate resin, polyimide resin, epoxy resin, polysulfone resin, etc., but injection molded polycarbonate resin substrates are particularly preferably used from the viewpoint of productivity, cost, and moisture absorption resistance.
【0026】本発明の光学的記録媒体における、前記ア
ゾ金属キレート化合物を含有する記録層は、膜厚100
Å〜5μmであることが好ましく、更に好ましくは10
00Å〜3μmである。[0026] In the optical recording medium of the present invention, the recording layer containing the azo metal chelate compound has a thickness of 100 mm.
It is preferably Å to 5 μm, more preferably 10 μm.
00 Å to 3 μm.
【0027】成膜法としては、真空蒸着法、スパッタリ
ング法、ドクターブレード法、キャスト法、スピナー法
、浸漬法など一般に行われている薄膜形成法で成膜する
ことができるが、量産性、コスト面等からスピナー法が
好ましい。スピナー法による成膜の場合、回転数は50
0〜5000r.p.m.が好ましく、スピンコートの
後、必要に応じて加熱或いは溶媒蒸気にあてる等の処理
を行うことができる。なお、成膜に際しては、必要に応
じてバインダーを使用することもできる。バインダーと
しては、ポリビニルアルコール、ポリビニルピロリドン
、ケトン樹脂、ニトロセルロース、酢酸セルロース、ポ
リビニルブチラール、ポリカーボネート等の既知のもの
が用いられる。また、記録層は、その安定性や耐光性向
上のために、一重項酸素クエンチャーとして遷移金属キ
レート化合物(例えば、アセチルアセトナートキレート
、ビスフェニルジチオール、サリチルアルデヒドオキシ
ム、ビスジチオ−α−ジケトン等)を含有しても良く、
更に同系統の色素或いはトリアリールメタン系色素、ア
ゾ染料、シアニン系色素、スクワリリウム系色素、ニッ
ケル−インドアニリン系色素等の他系統の色素を併用す
ることもできる。ドクターブレード法、キャスト法、ス
ピナー法、浸漬法、特にスピナー法等の塗布方法により
記録層を形成する場合の塗布溶媒としては、テトラフル
オロプロパノール、オクタフルオロペンタノール、テト
ラクロロエタン、ブロモホルム、ジブロモエタン、ジア
セトンアルコール、エチルセロソルブ、キシレン、3−
ヒドロキシ−3−メチル−2−ブタノン、クロロベンゼ
ン、シクロヘキサノン、乳酸メチル等の沸点120〜1
60℃のものが好適に使用される。The film can be formed by commonly used thin film forming methods such as vacuum evaporation method, sputtering method, doctor blade method, casting method, spinner method, and dipping method. The spinner method is preferable from the viewpoint of surface, etc. In the case of film formation by spinner method, the rotation speed is 50
0~5000r. p. m. is preferable, and after spin coating, treatment such as heating or exposure to solvent vapor can be performed as necessary. Note that during film formation, a binder can also be used if necessary. As the binder, known binders such as polyvinyl alcohol, polyvinylpyrrolidone, ketone resin, nitrocellulose, cellulose acetate, polyvinyl butyral, and polycarbonate can be used. In order to improve the stability and light resistance of the recording layer, transition metal chelate compounds (e.g., acetylacetonate chelate, bisphenyldithiol, salicylaldehyde oxime, bisdithio-α-diketone, etc.) are used as singlet oxygen quenchers. May contain
Furthermore, dyes of the same type or other types of dyes such as triarylmethane dyes, azo dyes, cyanine dyes, squarylium dyes, and nickel-indoaniline dyes can also be used in combination. When forming a recording layer by a coating method such as a doctor blade method, a casting method, a spinner method, or a dipping method, especially a spinner method, examples of coating solvents include tetrafluoropropanol, octafluoropentanol, tetrachloroethane, bromoform, dibromoethane, Diacetone alcohol, ethyl cellosolve, xylene, 3-
Boiling points of hydroxy-3-methyl-2-butanone, chlorobenzene, cyclohexanone, methyl lactate, etc. 120-1
A temperature of 60° C. is preferably used.
【0028】この中でも、生産性、コスト、耐吸湿性に
優れる射出成形ポリカーボネート樹脂基板に対して、該
基板をおかすことなく好適に使用できる溶媒として、特
にジアセトンアルコール、3−ヒドロキシ−3−メチル
−2−ブタノン等のケトンアルコール系溶媒;メチルセ
ロソルブ、エチルセロソルブ等のセロソルブ系溶媒;テ
トラフルオロプロパノール、オクタフルオロペンタノー
ル等のパーフルオロアルキルアルコール系溶媒;乳酸メ
チル、イソ酪酸メチル等のヒドロキシエステル系溶媒が
挙げられる。Among these, diacetone alcohol and 3-hydroxy-3-methyl are particularly suitable as solvents that can be suitably used for injection molded polycarbonate resin substrates, which are excellent in productivity, cost, and moisture absorption resistance, without damaging the substrates. Ketone alcohol solvents such as -2-butanone; Cellosolve solvents such as methyl cellosolve and ethyl cellosolve; Perfluoroalkyl alcohol solvents such as tetrafluoropropanol and octafluoropentanol; Hydroxyester solvents such as methyl lactate and methyl isobutyrate Examples include solvents.
【0029】金属反射層としては、金(Au)、銀(A
g)、銅(Cu)、アルミニウム(Al)等の金属或い
はこれらの合金が挙げられる。As the metal reflective layer, gold (Au), silver (A
g), metals such as copper (Cu), aluminum (Al), or alloys thereof.
【0030】保護層としてはJIS K5400規定
による鉛筆硬度試験でH以上の硬度を有する化合物がキ
ズ防止の観点から有効で、この条件を満たす限り任意の
化合物が使用できるが、製造工程の簡便さから、スピン
コート法で塗布できるものが好ましい。スピンコート法
、その他通常の塗布法で成膜できる保護層材料としては
、シリコーン系、アクリル系、メラミン系、エポキシ系
などの熱硬化型樹脂、アルキルトリアルコキシシラン、
テトラアルコキシシラン等の部分共加水分解物や、それ
らにコロイダルシリカを配合したシリコーン系ハードコ
ーティング剤、及びアクリレート系等の光重合系フォト
ポリマー、光架橋性フォトポリマー、アジド系フォトポ
リマー等が挙げられる。保護層の膜厚は、1〜200μ
m、特に2〜100μm程度であることが好ましい。For the protective layer, a compound having a hardness of H or higher in the pencil hardness test according to JIS K5400 is effective from the viewpoint of preventing scratches, and any compound can be used as long as it satisfies this condition, but from the viewpoint of simplicity of the manufacturing process, , those that can be applied by spin coating are preferred. Protective layer materials that can be formed by spin coating or other conventional coating methods include thermosetting resins such as silicone, acrylic, melamine, and epoxy, alkyltrialkoxysilane,
Examples include partial cohydrolysates such as tetraalkoxysilane, silicone hard coating agents blended with colloidal silica, photopolymerizable photopolymers such as acrylates, photocrosslinkable photopolymers, azide photopolymers, etc. . The thickness of the protective layer is 1 to 200μ
m, particularly preferably about 2 to 100 μm.
【0031】本発明の光記録媒体への記録は、記録層に
1μm程度に集束したレーザー光、好ましくは半導体レ
ーザーの光を基板を通して照射することにより行う。レ
ーザー光の照射された部分には、レーザーエネルギーの
吸収による、分解、蒸発、溶融等の記録層の熱的変形が
生じる。従って、レーザー光により熱的変形が起きてい
る部分と起きていない部分の反射率の差を読み取ること
により、記録された情報の再生を行うことができる。Recording on the optical recording medium of the present invention is carried out by irradiating the recording layer with laser light, preferably semiconductor laser light, focused to about 1 μm through the substrate. In the portion irradiated with the laser beam, thermal deformation of the recording layer such as decomposition, evaporation, and melting occurs due to absorption of laser energy. Therefore, recorded information can be reproduced by reading the difference in reflectance between a portion where thermal deformation has occurred due to laser light and a portion where no thermal deformation has occurred.
【0032】なお、本発明の光学的記録媒体の記録、再
生に使用されるレーザー光としては、N2、He−Cd
、Ar、He−Ne、ルビー、半導体、色素レーザー等
が挙げられるが、特に軽量性、取扱いの容易さ、コンパ
クト性などの点から半導体レーザーが好適に使用される
。[0032] The laser beam used for recording and reproducing the optical recording medium of the present invention includes N2, He-Cd
, Ar, He-Ne, ruby, semiconductor, and dye lasers, among which semiconductor lasers are particularly preferably used because of their light weight, ease of handling, and compactness.
【0033】[0033]
【作用】前記一般式[I]、特に前記一般式[II]、
とりわけ前記一般式[III]で示されるアゾ化合物と
金属とのアゾ金属キレート化合物は、塗布によるコーテ
ィングが可能で、しかも耐光性に優れ、耐久性に優れた
高反射率光記録媒体を低コストに提供することができる
。[Action] The general formula [I], especially the general formula [II],
In particular, the azo metal chelate compound of the azo compound represented by the general formula [III] and a metal can be coated by coating, has excellent light resistance, and can be used to produce a highly durable and highly reflective optical recording medium at a low cost. can be provided.
【0034】[0034]
【実施例】以下に実施例を挙げて本発明をより具体的に
説明するが、本発明はその要旨を超えない限り、以下の
実施例に限定されるものではない。[Examples] The present invention will be explained in more detail with reference to Examples below, but the present invention is not limited to the following Examples unless it exceeds the gist thereof.
【0035】実施例1 (a)光記録媒体の製造Example 1 (a) Manufacture of optical recording media
【0036】[0036]
【化9】[Chemical formula 9]
【0037】上記構造式(1)で示されるアゾ化合物の
Niキレート化合物0.15gをオクタフルオロペンタ
ノール7.5gに溶解し、0.22μmのフィルターで
濾過して溶解液を得た。この溶液5mlを深さ700Å
、幅0.7μmの溝(グルーブ)付き、射出成形ポリカ
ーボネート樹脂基板(5インチ)上に滴下し、スピナー
法により500rpmの回転数で塗布した。塗布後、6
0℃で10分間乾燥した。塗布膜の最大吸収波長は64
5及び712nmであった。次に、この塗布膜の上に、
スパッタリング法により、膜厚2000ÅのAu膜を成
膜し、反射層を形成した。更に、この反射層の上に紫外
線硬化性樹脂をスピンコートし、これに紫外線を照射し
て硬化させ、厚み10μmの保護膜を形成した。0.15 g of the Ni chelate compound of the azo compound represented by the above structural formula (1) was dissolved in 7.5 g of octafluoropentanol and filtered through a 0.22 μm filter to obtain a solution. Spread 5 ml of this solution to a depth of 700 Å.
, onto an injection molded polycarbonate resin substrate (5 inches) with a groove having a width of 0.7 μm, and was applied by a spinner method at a rotation speed of 500 rpm. After application, 6
It was dried at 0°C for 10 minutes. The maximum absorption wavelength of the coating film is 64
5 and 712 nm. Next, on this coating film,
A reflective layer was formed by depositing an Au film with a thickness of 2000 Å by sputtering. Further, an ultraviolet curable resin was spin-coated on this reflective layer and cured by irradiating ultraviolet rays to form a protective film with a thickness of 10 μm.
【0038】(b)光記録
上記で得られた光記録媒体を1.2m/sで回転させな
がら、中心波長780nmの半導体レーザー光で、記録
パワー7.0mWで照射し、EFM信号を記録した。次
に、この記録部を中心波長780nmの半導体レーザー
を有するCDプレーヤーで再生したところ、良好な再生
信号を得た。本光記録媒体は、耐光性(キセノンフェー
ドメーター加速テスト;60時間)及び保存安定性(7
0℃、85%RH;500時間)試験を行なった結果、
初期と比べて感度及び再生信号の劣化はみられず、光学
記録媒体として極めて優れたものであった。(b) Optical recording While rotating the optical recording medium obtained above at 1.2 m/s, it was irradiated with a semiconductor laser beam with a center wavelength of 780 nm at a recording power of 7.0 mW to record an EFM signal. . Next, when this recorded portion was reproduced by a CD player having a semiconductor laser with a center wavelength of 780 nm, a good reproduced signal was obtained. This optical recording medium has light resistance (xenon fade meter accelerated test; 60 hours) and storage stability (70 hours).
0°C, 85% RH; 500 hours) As a result of the test,
Compared to the initial stage, no deterioration in sensitivity or reproduced signals was observed, making it an extremely excellent optical recording medium.
【0039】実施例2Example 2
【0040】[0040]
【化10】[Chemical formula 10]
【0041】(a)光記録媒体の製造
錯体として、上記構造式(2)で示されるアゾ化合物の
Niキレート化合物を用いたこと以外は、実施例1の(
a)と同様にして、塗布、乾燥を行った。塗布膜の最大
吸収波長は644及び714nmであった。次に、この
塗布膜の上に、スパッタリング法により、膜厚2000
ÅのAg膜を成膜し、反射層を形成した。更に、この反
射層の上に紫外線硬化性樹脂をスピンコートした後、紫
外線を照射して硬化させ、厚み10μmの保護層を形成
した。(a) Production of optical recording medium Example 1 (
Coating and drying were performed in the same manner as in a). The maximum absorption wavelengths of the coating films were 644 and 714 nm. Next, on top of this coating film, a film thickness of 2000 mm was applied by sputtering.
A reflective layer was formed by depositing an Ag film with a thickness of .ANG. Further, an ultraviolet curable resin was spin-coated on this reflective layer, and then cured by irradiation with ultraviolet rays to form a protective layer with a thickness of 10 μm.
【0042】(b)光記録
上記で得られた光記録媒体について、実施例1の(b)
と同様にして記録、再生を行ったところ、良好な再生信
号を得た。また、同様の耐光性及び保存安定性試験を行
った結果、初期と比べて感度及び再生信号の劣化はみら
れず、光学記録媒体として極めて優れたものであった。(b) Optical recording Regarding the optical recording medium obtained above, (b) of Example 1
Recording and reproduction were performed in the same manner as above, and a good reproduction signal was obtained. Further, as a result of similar light resistance and storage stability tests, no deterioration in sensitivity or reproduced signal was observed compared to the initial stage, and it was found to be extremely excellent as an optical recording medium.
【0043】実施例3 (a)光記録媒体の製造Example 3 (a) Manufacture of optical recording media
【0044】[0044]
【化11】[Chemical formula 11]
【0045】上記構造式(3)で示されるアゾ化合物の
Niキレート化合物0.10g及び上記構造式(4)で
示されるアゾ化合物のNiキレート化合物0.05gの
配合組成物をテトラフルオロプロパノール7.5gに溶
解し、0.22μmのフィルターで濾過して溶解液を得
、実施例1の(a)と同様にして塗布、乾燥を行った。
塗布膜の最大吸収波長は644及び712nmであった
。次に、この塗布膜の上に、スパッタリング法により、
膜厚2000ÅのCu膜を成膜し、反射層を形成した。
更に、この反射層の上に紫外線硬化性樹脂をスピンコー
トした後、紫外線を照射して硬化させ、厚み10μmの
保護層を形成した。A blended composition of 0.10 g of the Ni chelate compound of the azo compound represented by the above structural formula (3) and 0.05 g of the Ni chelate compound of the azo compound shown by the above structural formula (4) was mixed with 7.5 g of tetrafluoropropanol. 5 g and filtered through a 0.22 μm filter to obtain a solution, which was coated and dried in the same manner as in Example 1 (a). The maximum absorption wavelengths of the coating films were 644 and 712 nm. Next, on this coating film, by sputtering method,
A Cu film with a thickness of 2000 Å was formed to form a reflective layer. Further, an ultraviolet curable resin was spin-coated on this reflective layer, and then cured by irradiation with ultraviolet rays to form a protective layer with a thickness of 10 μm.
【0046】(b)光記録
上記で得られた光記録媒体について、実施例1の(b)
と同様にして記録、再生を行ったところ、良好な再生信
号を得た。また、同様の耐光性及び保存安定性試験を行
った結果、初期と比べて感度及び再生信号の劣化はみら
れず、光学記録媒体として極めて優れたものであった。(b) Optical recording Regarding the optical recording medium obtained above, (b) of Example 1
Recording and reproduction were performed in the same manner as above, and a good reproduction signal was obtained. Further, as a result of similar light resistance and storage stability tests, no deterioration in sensitivity or reproduced signal was observed compared to the initial stage, and it was found to be extremely excellent as an optical recording medium.
【0047】実施例4 (a)光記録媒体の製造Example 4 (a) Manufacture of optical recording media
【0048】[0048]
【化12】[Chemical formula 12]
【0049】上記構造式(5)で示されるアゾ化合物の
Niキレート化合物0.15gを乳酸メチル7.5gに
溶解し、0.22μmのフィルターで濾過して溶解液を
得、実施例1の(a)と同様にして塗布、乾燥を行った
。塗布膜の最大吸収波長は646及び717nmであっ
た。次に、この塗布膜の上に、スパッタリング法により
、膜厚2000ÅのAu膜を成膜し、反射層を形成した
。更に、この反射層の上にシリコン系ハードコート剤を
スピンコートして、厚み10μmの保護層を形成した。0.15 g of the Ni chelate compound of the azo compound represented by the above structural formula (5) was dissolved in 7.5 g of methyl lactate and filtered through a 0.22 μm filter to obtain a solution. Coating and drying were performed in the same manner as in a). The maximum absorption wavelengths of the coating films were 646 and 717 nm. Next, an Au film with a thickness of 2000 Å was formed on this coating film by sputtering to form a reflective layer. Furthermore, a silicone-based hard coat agent was spin-coated on this reflective layer to form a protective layer with a thickness of 10 μm.
【0050】(b)光記録
上記で得られた光記録媒体について、実施例1の(b)
と同様にして記録、再生を行ったところ、良好な再生信
号を得た。また、同様の耐光性及び保存安定性試験を行
った結果、初期と比べて感度及び再生信号の劣化はみら
れず、光学記録媒体として極めて優れたものであった。(b) Optical recording Regarding the optical recording medium obtained above, (b) of Example 1
Recording and reproduction were performed in the same manner as above, and a good reproduction signal was obtained. Further, as a result of similar light resistance and storage stability tests, no deterioration in sensitivity or reproduced signal was observed compared to the initial stage, and it was found to be extremely excellent as an optical recording medium.
【0051】実施例5 (a)光記録媒体の製造Example 5 (a) Manufacture of optical recording media
【0052】[0052]
【化13】[Chemical formula 13]
【0053】錯体として、上記構造式(6)で示される
アゾ化合物のNiキレート化合物を用いたこと以外は実
施例1の(a)と同様にして塗布、乾燥を行った。塗布
膜の最大吸収波長は652及び723nmであった。次
に、この塗布膜の上に、スパッタリング法により、膜厚
2000ÅのAl膜を成膜し、反射層を形成した。更に
、この反射層の上に紫外線硬化性樹脂をスピンコートし
た後、紫外線を照射して硬化させ、厚み10μmの保護
層を形成した。Coating and drying were carried out in the same manner as in Example 1 (a) except that the Ni chelate compound of the azo compound represented by the above structural formula (6) was used as the complex. The maximum absorption wavelengths of the coating films were 652 and 723 nm. Next, an Al film with a thickness of 2000 Å was formed on this coating film by sputtering to form a reflective layer. Further, an ultraviolet curable resin was spin-coated on this reflective layer, and then cured by irradiation with ultraviolet rays to form a protective layer with a thickness of 10 μm.
【0054】(b)光記録
上記で得られた光記録媒体について、実施例1の(b)
と同様にして記録、再生を行ったところ、良好な再生信
号を得た。また、同様の耐光性及び保存安定性試験を行
った結果、初期と比べて感度及び再生信号の劣化はみら
れず、光学記録媒体として極めて優れたものであった。(b) Optical recording Regarding the optical recording medium obtained above, (b) of Example 1
Recording and reproduction were performed in the same manner as above, and a good reproduction signal was obtained. Further, as a result of similar light resistance and storage stability tests, no deterioration in sensitivity or reproduced signal was observed compared to the initial stage, and it was found to be extremely excellent as an optical recording medium.
【0055】実施例6 (a)光記録媒体の製造Example 6 (a) Manufacture of optical recording media
【0056】[0056]
【化14】[Chemical formula 14]
【0057】錯体として、上記構造式(7)で示される
アゾ化合物のNiキレート化合物を用いたこと以外は実
施例1の(a)と同様にして塗布、乾燥を行った。塗布
膜の最大吸収波長は642及び711nmであった。次
に、この塗布膜の上に、スパッタリング法により、膜厚
2000ÅのAg膜を成膜し、反射層を形成した。更に
、この反射層の上に紫外線硬化性樹脂をスピンコートし
た後、紫外線を照射して硬化させ、厚み10μmの保護
層を形成した。Coating and drying were carried out in the same manner as in Example 1 (a) except that the Ni chelate compound of the azo compound represented by the above structural formula (7) was used as the complex. The maximum absorption wavelengths of the coating films were 642 and 711 nm. Next, a 2000 Å thick Ag film was formed on this coating film by sputtering to form a reflective layer. Further, an ultraviolet curable resin was spin-coated on this reflective layer, and then cured by irradiation with ultraviolet rays to form a protective layer with a thickness of 10 μm.
【0058】(b)光記録
上記で得られた光記録媒体について、実施例1の(b)
と同様にして記録、再生を行ったところ、良好な再生信
号を得た。また、同様の耐光性及び保存安定性試験を行
った結果、初期と比べて感度及び再生信号の劣化はみら
れず、光学記録媒体として極めて優れたものであった。(b) Optical recording Regarding the optical recording medium obtained above, (b) of Example 1
Recording and reproduction were performed in the same manner as above, and a good reproduction signal was obtained. Further, as a result of similar light resistance and storage stability tests, no deterioration in sensitivity or reproduced signal was observed compared to the initial stage, and it was found to be extremely excellent as an optical recording medium.
【0059】実施例7 (a)光記録媒体の製造Example 7 (a) Manufacture of optical recording media
【0060】[0060]
【化15】[Chemical formula 15]
【0061】上記構造式(8)で示されるアゾ化合物の
Niキレート化合物0.12g及び上記構造式(9)で
示されるシアニン系色素0.03gの混合色素をオクタ
フルオロペンタノール7.5gに溶解し、0.22μm
のフィルターで濾過して溶解液を得、実施例1の(a)
と同様にして塗布、乾燥を行った。塗布膜の最大吸収波
長は634、702及び716nmであった。次に、こ
の塗布膜の上に、スパッタリング法により、膜厚200
0ÅのAg膜を成膜し、反射層を形成した。更に、この
反射層の上に紫外線硬化性樹脂をスピンコートした後、
紫外線を照射して硬化させ、厚み10μmの保護層を形
成した。A mixed dye consisting of 0.12 g of the Ni chelate compound of the azo compound shown by the above structural formula (8) and 0.03 g of the cyanine dye shown by the above structural formula (9) was dissolved in 7.5 g of octafluoropentanol. and 0.22μm
A solution was obtained by filtration with a filter of Example 1 (a).
Coating and drying were carried out in the same manner as above. The maximum absorption wavelengths of the coating films were 634, 702 and 716 nm. Next, on top of this coating film, a film with a thickness of 200 mm was applied by sputtering.
A 0 Å thick Ag film was deposited to form a reflective layer. Furthermore, after spin-coating an ultraviolet curable resin on this reflective layer,
It was cured by irradiation with ultraviolet rays to form a protective layer with a thickness of 10 μm.
【0062】(b)光記録
上記で得られた光記録媒体について、実施例1の(b)
と同様にして記録、再生を行ったところ、良好な再生信
号を得た。また、同様の耐光性及び保存安定性試験を行
った結果、初期と比べて感度及び再生信号の劣化はみら
れず、光学記録媒体として極めて優れたものであった。(b) Optical recording Regarding the optical recording medium obtained above, (b) of Example 1
Recording and reproduction were performed in the same manner as above, and a good reproduction signal was obtained. Further, as a result of similar light resistance and storage stability tests, no deterioration in sensitivity or reproduced signal was observed compared to the initial stage, and it was found to be extremely excellent as an optical recording medium.
【0063】実施例8 (a)光記録媒体の製造Example 8 (a) Manufacture of optical recording media
【0064】[0064]
【化16】[Chemical formula 16]
【0065】上記構造式(10)で示されるアゾ化合物
のNiキレート化合物0.15gをテトラフルオロプロ
パノール5gに溶解し、0.22μmのフィルターで濾
過して溶解液を得、実施例1の(a)と同様にして塗布
、乾燥を行った。塗布膜の最大吸収波長は637及び6
97nmであった。次に、この塗布膜の上に、スパッタ
リング法により、膜厚2000ÅのAu膜を成膜し、反
射層を形成した。更に、この反射層の上に紫外線硬化性
樹脂をスピンコートし、これに紫外線を照射して、硬化
させ、厚み10μmの保護層を形成した。0.15 g of the Ni chelate compound of the azo compound represented by the above structural formula (10) was dissolved in 5 g of tetrafluoropropanol and filtered through a 0.22 μm filter to obtain a solution. ) Coating and drying were performed in the same manner. The maximum absorption wavelength of the coating film is 637 and 6
It was 97 nm. Next, an Au film with a thickness of 2000 Å was formed on this coating film by sputtering to form a reflective layer. Further, an ultraviolet curable resin was spin-coated on this reflective layer, and was cured by irradiating ultraviolet rays to form a protective layer with a thickness of 10 μm.
【0066】(b)光記録
上記で得られた光記録媒体について、実施例1の(b)
と同様にして記録、再生を行ったところ、良好な再生信
号を得た。また、同様の耐光性及び保存安定性試験を行
った結果、初期と比べて感度及び再生信号の劣化はみら
れず、光学記録媒体として極めて優れたものであった。(b) Optical recording Regarding the optical recording medium obtained above, (b) of Example 1
Recording and reproduction were performed in the same manner as above, and a good reproduction signal was obtained. Further, as a result of similar light resistance and storage stability tests, no deterioration in sensitivity or reproduced signal was observed compared to the initial stage, and it was found to be extremely excellent as an optical recording medium.
【0067】実施例9 (a)光記録媒体の製造Example 9 (a) Manufacture of optical recording media
【0068】[0068]
【化17】[Chemical formula 17]
【0069】上記構造式(11)で示されるアゾ化合物
のNiキレート化合物0.14g及び上記構造式(12
)で示されるNiインドアニリン系色素0.01gの混
合色素をジアセトンアルコール5gに溶解し、0.22
μmのフィルターで濾過して溶解液を得た。この溶液5
mlを実施例1の(a)で用いたと同様の射出成形ポリ
カーボネート樹脂基板上に滴下し、スピナー法により7
00rpmの回転数で塗布した。塗布後、60℃で10
分間乾燥した。塗布膜の最大吸収波長は642、711
及び805nmであった。次に、この塗布膜の上に、ス
パッタリング法により、膜厚2000ÅのAu膜を成膜
し、反射層を形成した。更に、この反射層の上に紫外線
硬化性樹脂をスピンコートし、これに紫外線を照射して
、硬化させ、厚み10μmの保護層を形成した。0.14 g of the Ni chelate compound of the azo compound represented by the above structural formula (11) and the above structural formula (12)
) was dissolved in 5 g of diacetone alcohol, and 0.22
A solution was obtained by filtration through a μm filter. This solution 5
ml was dropped onto an injection molded polycarbonate resin substrate similar to that used in Example 1 (a), and 7 ml was added using a spinner method.
Coating was performed at a rotation speed of 00 rpm. After coating, 10 at 60℃
Dry for a minute. The maximum absorption wavelength of the coating film is 642, 711
and 805 nm. Next, an Au film with a thickness of 2000 Å was formed on this coating film by sputtering to form a reflective layer. Further, an ultraviolet curable resin was spin-coated on this reflective layer, and was cured by irradiating ultraviolet rays to form a protective layer with a thickness of 10 μm.
【0070】(b)光記録
上記で得られた光記録媒体について、実施例1の(b)
と同様にして記録、再生を行ったところ、良好な再生信
号を得た。また、同様の耐光性及び保存安定性試験を行
った結果、初期と比べて感度及び再生信号の劣化はみら
れず、光学記録媒体として極めて優れたものであった。(b) Optical recording Regarding the optical recording medium obtained above, (b) of Example 1
Recording and reproduction were performed in the same manner as above, and a good reproduction signal was obtained. Further, as a result of similar light resistance and storage stability tests, no deterioration in sensitivity or reproduced signal was observed compared to the initial stage, and it was found to be extremely excellent as an optical recording medium.
【0071】実施例10 (a)光記録媒体の製造Example 10 (a) Manufacture of optical recording media
【0072】[0072]
【化18】[Chemical formula 18]
【0073】上記構造式(13)で示されるアゾ化合物
のNiキレート化合物0.15gをテトラフルオロプロ
パノール5gに溶解し、0.22μmのフィルターで濾
過して溶解液を得、実施例1の(a)と同様にして塗布
、乾燥した。塗布膜の最大吸収波長は643nm及び7
14nmであった。次に、この塗布膜の上に、スパッタ
リング法により、膜厚2000ÅのAu膜を成膜し、反
射層を形成した。更に、この反射層の上にエポキシ系熱
硬化性樹脂をスピンコートし、これを熱で硬化させ、厚
み10μmの保護層を形成した。0.15 g of the Ni chelate compound of the azo compound represented by the above structural formula (13) was dissolved in 5 g of tetrafluoropropanol and filtered through a 0.22 μm filter to obtain a solution. ) and dried in the same manner. The maximum absorption wavelength of the coating film is 643 nm and 7
It was 14 nm. Next, an Au film with a thickness of 2000 Å was formed on this coating film by sputtering to form a reflective layer. Furthermore, an epoxy thermosetting resin was spin-coated on this reflective layer and cured with heat to form a protective layer with a thickness of 10 μm.
【0074】(b)光記録
上記で得られた光記録媒体について、実施例1の(b)
と同様にして記録、再生を行ったところ、良好な再生信
号を得た。また、同様の耐光性及び保存安定性試験を行
った結果、初期と比べて感度及び再生信号の劣化はみら
れず、光学記録媒体として極めて優れたものであった。(b) Optical recording Regarding the optical recording medium obtained above, (b) of Example 1
Recording and reproduction were performed in the same manner as above, and a good reproduction signal was obtained. Further, as a result of similar light resistance and storage stability tests, no deterioration in sensitivity or reproduced signal was observed compared to the initial stage, and it was found to be extremely excellent as an optical recording medium.
【0075】実施例11
実施例1〜10において用いた化合物の代わりに、表1
〜13に示したアゾ化合物と金属とのアゾ金属キレート
化合物の単体或いは混合系を使用して得た溶液を基板上
に塗布して、その他は同様にして光学記録媒体を得た。
なお、塗布膜の最大吸収波長は表1〜13に示す通りで
あった。得られた光記録媒体について、実施例1の(b
)と同様にして記録、再生を行ったところ、いずれも感
度が良好で、良好な再生信号を得た。また、同様の耐光
性及び保存安定性試験を行った結果、初期と比べて感度
及び再生信号の劣化はみられず、光学記録媒体として極
めて優れたものであった。Example 11 Instead of the compounds used in Examples 1 to 10, Table 1
An optical recording medium was obtained in the same manner except that a solution obtained by using the azo metal chelate compound of an azo compound and a metal shown in 1 to 13 alone or in a mixed system was applied onto a substrate. In addition, the maximum absorption wavelength of the coating film was as shown in Tables 1 to 13. Regarding the obtained optical recording medium, (b
) Recording and reproduction were performed in the same manner as in the previous example, and the sensitivity was good in both cases, and good reproduced signals were obtained. Further, as a result of similar light resistance and storage stability tests, no deterioration in sensitivity or reproduced signal was observed compared to the initial stage, and it was found to be extremely excellent as an optical recording medium.
【0076】[0076]
【表1】[Table 1]
【0077】[0077]
【表2】[Table 2]
【0078】[0078]
【表3】[Table 3]
【0079】[0079]
【表4】[Table 4]
【0080】[0080]
【表5】[Table 5]
【0081】[0081]
【表6】[Table 6]
【0082】[0082]
【表7】[Table 7]
【0083】[0083]
【表8】[Table 8]
【0084】[0084]
【表9】[Table 9]
【0085】[0085]
【表11】[Table 11]
【0086】[0086]
【表11】[Table 11]
【0087】[0087]
【表12】[Table 12]
【0088】[0088]
【表13】[Table 13]
【0089】[0089]
【発明の効果】以上詳述した通り、本発明の光記録媒体
によれば、高感度で耐光性、保存安定性に優れ、特に耐
光性に著しく優れ、例えば、記録可能なCD媒体として
有用な高反射率光記録媒体が提供される。Effects of the Invention As described in detail above, the optical recording medium of the present invention has high sensitivity, excellent light resistance, and storage stability, particularly excellent light resistance, and is useful as, for example, a recordable CD medium. A high reflectance optical recording medium is provided.
Claims (2)
層を順次積層してなる光記録媒体であって、65%以上
の反射率を有する光記録媒体において、該記録層が、下
記一般式[I]で示されるアゾ系化合物と金属とのアゾ
金属キレート化合物の1種又は2種以上を含有すること
を特徴とする光記録媒体。 【化1】 (式中、Aはそれが結合している炭素原子及び窒素原子
と一緒になって複素環を形成する残基を表わし、Bはそ
れが結合している二つの炭素原子と一緒になって芳香環
又は複素環を形成する残基を表わし、Xは活性水素を有
する基を表わす。)Claim 1. An optical recording medium comprising a recording layer, a metal reflective layer, and a protective layer sequentially laminated on a substrate, the optical recording medium having a reflectance of 65% or more, in which the recording layer has the following general An optical recording medium containing one or more azo metal chelate compounds of an azo compound represented by formula [I] and a metal. [Formula 1] (wherein A represents a residue that forms a heterocycle together with the carbon atom and nitrogen atom to which it is bonded, and B represents a residue that forms a heterocycle together with the two carbon atoms to which it is bonded. represents a residue that forms an aromatic ring or a heterocycle, and X represents a group having active hydrogen.)
される化合物であることを特徴とする請求項1に記載の
光記録媒体。 【化2】 (式中、Aはそれが結合している炭素原子と窒素原子と
一緒になって複素環を形成する残基を表わし、R1及び
R2はそれぞれ独立して水素原子、置換されていても良
いアルキル基、置換されていても良いアリール基、置換
されていても良いアルケニル基又は置換されていても良
いシクロアルキル基を表わし、Xは活性水素を有する基
を表わす。環Dは置換基を有していても良い。)【請求
項3】 アゾ化合物が下記一般式[III]で示され
る化合物であることを特徴とする請求項2に記載の光記
録媒体。 【化3】 (式中、Aはそれが結合している炭素原子と窒素原子と
一緒になって複素環を形成する残基を表わし、R1及び
R2はそれぞれ独立して水素原子、置換されていても良
いアルキル基、置換されていても良いアリール基、置換
されていても良いアルケニル基又は置換されていても良
いシクロアルキル基を表わす。環Dは置換基を有してい
ても良い。)2. The optical recording medium according to claim 1, wherein the azo compound is a compound represented by the following general formula [II]. [Chemical formula 2] (In the formula, A represents a residue that forms a heterocycle together with the carbon atom and nitrogen atom to which it is bonded, and R1 and R2 are each independently a hydrogen atom or a substituted represents an optionally substituted alkyl group, an optionally substituted aryl group, an optionally substituted alkenyl group, or an optionally substituted cycloalkyl group, and X represents a group having active hydrogen. Ring D represents a substituted 3. The optical recording medium according to claim 2, wherein the azo compound is a compound represented by the following general formula [III]. [Chemical formula 3] (In the formula, A represents a residue that forms a heterocycle together with the carbon atom and nitrogen atom to which it is bonded, and R1 and R2 are each independently a hydrogen atom or a substituted (Ring D may have a substituent.)
Priority Applications (1)
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JP3137566A JP3019469B2 (en) | 1991-06-10 | 1991-06-10 | Optical recording medium |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3137566A JP3019469B2 (en) | 1991-06-10 | 1991-06-10 | Optical recording medium |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH04361088A true JPH04361088A (en) | 1992-12-14 |
JP3019469B2 JP3019469B2 (en) | 2000-03-13 |
Family
ID=15201716
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JP3137566A Expired - Lifetime JP3019469B2 (en) | 1991-06-10 | 1991-06-10 | Optical recording medium |
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JP (1) | JP3019469B2 (en) |
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0717403A1 (en) * | 1994-12-15 | 1996-06-19 | Eastman Kodak Company | Heterocyclylazoaniline dyes, heterocyclylazoaniline dye metal complexes and their use in optical elements |
EP0755052A2 (en) | 1995-07-20 | 1997-01-22 | Mitsui Toatsu Chemicals, Incorporated | Optical recording medium |
EP0844243A1 (en) * | 1996-11-20 | 1998-05-27 | Mitsubishi Chemical Corporation | Sulfonamide compound and method for its production, metal chelate compound employing the sulfonamide compound, and optical recording medium employing the metal chelate compound |
WO1998029257A1 (en) * | 1996-12-27 | 1998-07-09 | Tdk Corporation | Optical recording medium |
US5786124A (en) * | 1997-06-25 | 1998-07-28 | Eastman Kodak Company | Optical recording elements containing metallized carbamoylazo dyes |
WO1999003686A1 (en) * | 1997-07-14 | 1999-01-28 | Matsushita Electric Industrial Co., Ltd. | Optical recording medium and method of producing the same |
US6214519B1 (en) * | 1995-08-22 | 2001-04-10 | Mitsubishi Chemical Corporation | Optical recording medium |
US6232036B1 (en) * | 1996-12-18 | 2001-05-15 | Mitsubishi Chemical Corporation | Optical recording disk |
WO2001078993A1 (en) * | 2000-04-17 | 2001-10-25 | Mitsubishi Chemical Corporation | Optical recording medium |
US6737143B2 (en) | 2001-06-14 | 2004-05-18 | Ricoh Company Ltd. | Optical recording medium, optical recording method and optical recording device |
US6936323B2 (en) | 2003-04-30 | 2005-08-30 | Ricoh Company, Ltd. | Optical recording medium, and method and device using the same |
EP1844161A2 (en) * | 2005-02-04 | 2007-10-17 | Berry & Associates , Inc. | Dark quenchers, probes and other conjugates incorporating the same, their use |
-
1991
- 1991-06-10 JP JP3137566A patent/JP3019469B2/en not_active Expired - Lifetime
Cited By (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0717403A1 (en) * | 1994-12-15 | 1996-06-19 | Eastman Kodak Company | Heterocyclylazoaniline dyes, heterocyclylazoaniline dye metal complexes and their use in optical elements |
EP0755052A2 (en) | 1995-07-20 | 1997-01-22 | Mitsui Toatsu Chemicals, Incorporated | Optical recording medium |
US6214519B1 (en) * | 1995-08-22 | 2001-04-10 | Mitsubishi Chemical Corporation | Optical recording medium |
EP0844243A1 (en) * | 1996-11-20 | 1998-05-27 | Mitsubishi Chemical Corporation | Sulfonamide compound and method for its production, metal chelate compound employing the sulfonamide compound, and optical recording medium employing the metal chelate compound |
US6232036B1 (en) * | 1996-12-18 | 2001-05-15 | Mitsubishi Chemical Corporation | Optical recording disk |
WO1998029257A1 (en) * | 1996-12-27 | 1998-07-09 | Tdk Corporation | Optical recording medium |
US5786124A (en) * | 1997-06-25 | 1998-07-28 | Eastman Kodak Company | Optical recording elements containing metallized carbamoylazo dyes |
WO1999003686A1 (en) * | 1997-07-14 | 1999-01-28 | Matsushita Electric Industrial Co., Ltd. | Optical recording medium and method of producing the same |
WO2001078993A1 (en) * | 2000-04-17 | 2001-10-25 | Mitsubishi Chemical Corporation | Optical recording medium |
US6794114B2 (en) | 2000-04-17 | 2004-09-21 | Mitsubishi Chemical Corporation | Optical recording medium |
US6737143B2 (en) | 2001-06-14 | 2004-05-18 | Ricoh Company Ltd. | Optical recording medium, optical recording method and optical recording device |
US6936323B2 (en) | 2003-04-30 | 2005-08-30 | Ricoh Company, Ltd. | Optical recording medium, and method and device using the same |
EP1844161A2 (en) * | 2005-02-04 | 2007-10-17 | Berry & Associates , Inc. | Dark quenchers, probes and other conjugates incorporating the same, their use |
EP1844161A4 (en) * | 2005-02-04 | 2010-10-27 | Berry & Associates Inc | Dark quenchers, probes and other conjugates incorporating the same, their use |
US7879986B2 (en) * | 2005-02-04 | 2011-02-01 | Berry & Associates, Inc. | Dark quenchers, probes and other conjugates incorporating the same, and their use |
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