JPH02166783A - Homogenizer for excimer laser - Google Patents

Homogenizer for excimer laser

Info

Publication number
JPH02166783A
JPH02166783A JP32282888A JP32282888A JPH02166783A JP H02166783 A JPH02166783 A JP H02166783A JP 32282888 A JP32282888 A JP 32282888A JP 32282888 A JP32282888 A JP 32282888A JP H02166783 A JPH02166783 A JP H02166783A
Authority
JP
Japan
Prior art keywords
incident
reflected
excimer laser
degrees
prism
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP32282888A
Other languages
Japanese (ja)
Inventor
Koichi Kajiyama
康一 梶山
Norio Moro
茂呂 則夫
Kaoru Saito
斉藤 馨
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ADOMON SCI KK
Original Assignee
ADOMON SCI KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ADOMON SCI KK filed Critical ADOMON SCI KK
Priority to JP32282888A priority Critical patent/JPH02166783A/en
Publication of JPH02166783A publication Critical patent/JPH02166783A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0927Systems for changing the beam intensity distribution, e.g. Gaussian to top-hat
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938Using specific optical elements
    • G02B27/095Refractive optical elements
    • G02B27/0972Prisms
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22Gases
    • H01S3/223Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

Abstract

PURPOSE:To make intensity distribution uniform by providing incident beam dividing means, means for so processing the divided first beam that an optical image is reverse at right and left sides and upper and lower sides, and means for superposing part of an output beam on a second beam. CONSTITUTION:A beam splitter 11 is disposed obliquely at 45 degrees with respect to an optical axis on the optical path 12 of an excimer laser. When a laser beam 16 is incident, part 17 is reflected perpendicularly, the remaining beam 18 is passed as it is to be incident into a right angle prism 13, reflected at an input side and deflected at 180 degrees. An emitting beam 18a from the right angle prism 13 is next incident to a roof prism 15 so that the image is reversed to be deflected at 90 degrees at upper and lower sides and at right and left sides, and an emitting beam 18b is incident in a direction perpendicular to the laser beam 16 from the rear face with respect to the beam splitter 11. Part 18c is reflected, and superposed on the reflected beam 17 reflected by the beam splitter 11.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、エキシマレーザ−を用いた露光装置の光源、
アニーリング、光CVD装置等の各種加工装置用の光源
に関するものである。さらに詳しくは、本発明は、この
ような光源がら発生されるビームの強度を均一化するた
めのホモジナイザーに関するものである。
Detailed Description of the Invention (Field of Industrial Application) The present invention relates to a light source for an exposure device using an excimer laser;
The present invention relates to light sources for various processing devices such as annealing and optical CVD devices. More particularly, the invention relates to a homogenizer for homogenizing the intensity of the beam generated by such a light source.

(従来の技術および解決しようとする課題)リソグラフ
ィー等の露光装置や、アニーリングあるいは光CVD等
の加工装置に使用されるエキシマレーザ−においては、
その照射域内での光強度の均一性が必要とされる。この
均一性を得るために、一般にインチグレーターとコンデ
ンサーレンズを組み合わせた構成の照明光学系が広く使
用されている。
(Prior art and problems to be solved) In excimer lasers used in exposure equipment such as lithography and processing equipment such as annealing or optical CVD,
Uniformity of light intensity within the irradiation area is required. In order to obtain this uniformity, illumination optical systems that generally include a combination of an inch grater and a condenser lens are widely used.

第2図には、エキシマレーザ−のビームパ9−ンと、こ
のパターンにおける直交する軸方向の光強度分布を示し
である。図から分かるように、エキシマレーザ−のビー
ム断面1における光強度の分布は均一ではなく、細かな
凹凸や傾斜が見られ、このままでは光源として使用する
ことができない。
FIG. 2 shows the beam pattern of the excimer laser and the light intensity distribution in the orthogonal axial direction in this pattern. As can be seen from the figure, the distribution of light intensity in the beam cross section 1 of the excimer laser is not uniform, and there are fine irregularities and inclinations, and the excimer laser cannot be used as a light source as it is.

第3図には、このビームの均一化のために使用されてい
る光学系の例を示しである。上述したように、この光学
系は、インチグレーター2を備え、このインチグレータ
ー2には、適当かビーム形状に整形されたビームが入射
される。このインチグレーター2を通って分割された分
割ビームはそれぞれの像点をつきり、そこからの発散光
が、コンデンサーレンズ3によって集められて、その焦
点位置4において、ビームの均−域が形成される。
FIG. 3 shows an example of an optical system used to homogenize this beam. As described above, this optical system includes an inch grater 2, into which a beam shaped into an appropriate beam shape is incident. The divided beams that have passed through this inch grater 2 hit respective image points, and the diverging light from there is collected by a condenser lens 3, and a uniform beam area is formed at the focal point position 4. Ru.

(発明が解決しようとする課題) しかしながら、上述したようなビームの均一化手段にお
いては、入射ビーム内にもともと一定方向の光強度文分
布が存在しているときには、コンデンサーレンズを透過
して得られたビーム中にもその不均一がそのまま残って
しまう。また、このようなインチグレーターおよびコン
デンサーレンズを使用した光学系を使用した場合には、
強度損失が比較的大きいという欠点があると共に、強度
均一位置がコンデンサーレンズの焦点位置に限定され、
この均一位置以外の部分では光束が全体として拡がって
しまい、取り扱い上不便である。
(Problem to be Solved by the Invention) However, in the beam homogenizing means as described above, when the incident beam originally has a light intensity distribution in a certain direction, the light intensity distribution obtained by passing through the condenser lens is The non-uniformity remains in the beam as well. In addition, when using an optical system that uses such inch grater and condenser lenses,
It has the disadvantage that the intensity loss is relatively large, and the intensity uniformity position is limited to the focal position of the condenser lens.
In areas other than this uniform position, the light beam is spread out as a whole, which is inconvenient in handling.

一方、エキシマレーザはビーム面内に多数の横モードが
有るが、共振器の構造、共振器内の波長選択素子による
狭帯域化の度合に応じて横モード数が変化し、可干渉性
の度合が変化する。特に、露光用光源として使用する場
合には、スペックルノイズをなくすために、この可干渉
性を極力抑えることが必要である。スペックルノイズは
、光源に可干渉性がある場合には、露光時ショット数を
増やすことにより、あるいはビームステアリング機構に
より多数の光源を形成することにより、あるいはまた、
インチグレーターを回転させることにより、取り除くこ
とができる。しかし、露光ショットの増減は、使用する
レジストの感度特性との相関があり、実用性に乏しく、
ビームステアリング機構やインチグレーターの回転機構
は、露光装置の照明光学系の大型化や複雑化を来すので
好ましくない。
On the other hand, excimer lasers have many transverse modes in the beam plane, but the number of transverse modes changes depending on the structure of the resonator and the degree of band narrowing by the wavelength selection element inside the resonator, and the degree of coherence changes. changes. In particular, when used as an exposure light source, it is necessary to suppress this coherence as much as possible in order to eliminate speckle noise. Speckle noise can be reduced by increasing the number of exposure shots when the light sources are coherent, or by forming multiple light sources using a beam steering mechanism, or alternatively.
It can be removed by rotating the inch grater. However, increasing or decreasing the number of exposure shots has a correlation with the sensitivity characteristics of the resist used, making it impractical.
A beam steering mechanism or an inch grater rotation mechanism is undesirable because it increases the size and complexity of the illumination optical system of the exposure apparatus.

本発明の目的は、上記の問題点に鑑みて、インチグレー
ターとコンデンサーレンズを使用して強度分布を均一に
する方法では取り除くことのできないビームに存在する
一定方向の強度分布の不均一性を除去でき、かつ可干渉
性の低いエキシマレーザ−の光源装置を実現することに
ある。
In view of the above problems, it is an object of the present invention to eliminate the non-uniformity of the intensity distribution in a certain direction that exists in a beam, which cannot be removed by the method of making the intensity distribution uniform using an inch grater and a condenser lens. The object of the present invention is to realize an excimer laser light source device that can be used as an excimer laser and has low coherence.

(課題を解決するための手段) 上記の目的を達成するために、本発明のエキシマレーザ
−のホモジナイザーは、入射ビームを第1および第2の
ビームに分割する分割手段と、この分割手段によって分
割された第1のビームを、その光像が左右および上下が
逆となるように処理する手段と、この手段からの出力ビ
ームの少なくとも一部を前記分割手段によって分割され
た第2のビームに重ね合わせる重ね合わせ手段とを備え
たことを特徴としている。
(Means for Solving the Problems) In order to achieve the above object, the excimer laser homogenizer of the present invention includes a dividing means for dividing an incident beam into a first beam and a second beam, and a dividing means for dividing an incident beam into a first beam and a second beam. means for processing the first beam so that its optical image is reversed horizontally and vertically; and at least a portion of the output beam from the means is superimposed on the second beam split by the splitting means. The invention is characterized in that it is equipped with a superimposing means for combining.

本発明の好適な実施形態においては、エキシマレーザ−
の光路上に、ビームスプリッタ−と組み合わせプリズム
とを配置することによって、上記の各手段を構成し、こ
れによって、必要な特性を有するエキシマレーザ−のビ
ームを得るようにしている。第1図を参照してさらに詳
しく説明すると、ビームスプリッタ−11を、エキシマ
レーザ−の光路12上において、その光軸に対して45
度傾けた状態に配置する。このビームスプリッタ−11
の後方側には、直角プリズム13を配置しである。この
直角プリズム13は、その直交する反射面のうちの入射
側の面13aが、上記のビームスプリッタ−11に対し
て、光路12に直交する線分14に対して線対称となる
ように配置しである。一方、直角プリズムI3の他方の
射出側の面13bに対向する位置には、ルーフプリズム
15を配置しである。このルーフプリズム15の反射面
15aは、上記の線分14に対して、直角プリズム13
の反射面13bと線対称の関係に配列すると共に、直角
プリズム13の中心線13cに対して、ビームスプリッ
タ−11と線対称の関係となるように配列しである。
In a preferred embodiment of the invention, an excimer laser
Each of the above means is constructed by arranging a beam splitter and a combination prism on the optical path of the laser, thereby obtaining an excimer laser beam having the required characteristics. To explain in more detail with reference to FIG.
Place it at an angle. This beam splitter 11
A right angle prism 13 is arranged on the rear side. This right-angle prism 13 is arranged so that the incident side surface 13a of the orthogonal reflecting surfaces is line-symmetrical with respect to the beam splitter 11 with respect to a line segment 14 orthogonal to the optical path 12. It is. On the other hand, a roof prism 15 is arranged at a position facing the other exit side surface 13b of the right angle prism I3. The reflective surface 15a of this roof prism 15 is located at the right angle prism 13 with respect to the above-mentioned line segment 14.
They are arranged in a line-symmetrical relationship with the reflecting surface 13b of the rectangular prism 13, and are arranged in a line-symmetrical relationship with the beam splitter 11 with respect to the center line 13c of the right-angle prism 13.

(作 用) 本発明の動作を、第1図に示す好適な実施形態を例にし
て説明する。まず、レーザービーム16は、ビームスプ
リッタ−11に入射すると、その一部17が直角に反射
され、残りのビーム18がそのまま透過する。透過ビー
ム18は、直角プリズム13内に入射して、その入力側
に反射面13aおよび射出側の反射面13bによって反
射されて、180偏向する。直角プリズム13からの射
出ビーム18aは、次にルーフプリズム15に入射して
、その像が上下に転倒されると共に左右に逆転された状
態に90度偏向される。このようにして偏向されら射出
光18bは、ビームスプリッタ−11に対して、その後
側の面から上記のレーザービーム16に対して直交する
方向に入射する。
(Operation) The operation of the present invention will be explained using the preferred embodiment shown in FIG. 1 as an example. First, when the laser beam 16 is incident on the beam splitter 11, a portion 17 thereof is reflected at right angles, and the remaining beam 18 is transmitted as is. The transmitted beam 18 enters the rectangular prism 13, is reflected by the reflection surface 13a on the input side and the reflection surface 13b on the exit side, and is deflected by 180 degrees. The emitted beam 18a from the right-angle prism 13 then enters the roof prism 15, and is deflected by 90 degrees so that its image is turned upside down and reversed left and right. The emitted light 18b thus deflected enters the beam splitter 11 from the rear surface in a direction perpendicular to the laser beam 16.

この入射ビーム18bの一部18cは反射されて、上記
のビーム18と同様な光路を経ることになる。しかるに
、このビームスプリッタ−11を透過した残りのビーム
18dは、このビームスプリッタ−11によって反射さ
れた反射ビーム17と重ね合わさることになる。このよ
うにして、ビームスプリッタ−11の反射ビームは、そ
こに入射された直ちに反射された反射ビーム17と、こ
こを透過した後に直角プリズムおよびルーフプリズムを
経たビーム18bとが重なり合ったものとなる。この結
果、ビーム内に存在する一方向の強度分布の不均一が解
消されると共に、可干渉性が抑制される。
A portion 18c of this incident beam 18b is reflected and follows an optical path similar to beam 18 described above. However, the remaining beam 18d that has passed through this beam splitter 11 is superimposed on the reflected beam 17 that has been reflected by this beam splitter 11. In this way, the reflected beam of the beam splitter 11 is a superposition of the immediately reflected reflected beam 17 incident thereon and the beam 18b transmitted therethrough and then passed through the right angle prism and the roof prism. As a result, non-uniformity in the intensity distribution in one direction that exists within the beam is eliminated and coherence is suppressed.

(実施例) 第1図に示す構成において、ビームスプリッタ−11を
45度入射で、反射率30%に設定し、直角プリズム1
3の入射面に反射防止膜コーティングを施し、またその
射出面とルーフプリズム15の入射面をオプチカルコン
タクトで接着した。
(Example) In the configuration shown in FIG. 1, the beam splitter 11 is set at 45 degrees of incidence and the reflectance is 30%,
An anti-reflection coating was applied to the entrance surface of the roof prism 15, and the exit surface of the roof prism 15 was bonded to the entrance surface of the roof prism 15 by optical contact.

さらに、このルーフプリズム15の射出面に反射防止膜
コーティングを施した。この構成の光学系を使用したと
ころ、得られたビームは、その中の光強度分布の均一度
が改善され、可干渉性が低下していることが確認された
Furthermore, the exit surface of this roof prism 15 was coated with an antireflection film. When the optical system with this configuration was used, it was confirmed that the uniformity of the light intensity distribution in the obtained beam was improved and the coherence was reduced.

(発明の効果) 以上説明したように、エキシマレーザ−のビームの一部
を、左右および上下に像が反転した状態となし、このよ
うに処理したビームを元のビームに重ね合わせて、ビー
ムを形成するようにしている。従って、本発明によれば
、得られたビーム内の光強度分布を均一にでき、また可
干渉性も抑制することができる。
(Effects of the Invention) As explained above, a part of the excimer laser beam is made into a state in which the image is inverted horizontally and vertically, and the beam processed in this way is superimposed on the original beam to form the beam. I'm trying to form it. Therefore, according to the present invention, the light intensity distribution within the obtained beam can be made uniform, and coherence can also be suppressed.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一実施例の装置を示す構成図、第2図
(A)〜(C)は典型的なエキシマレーザ−のビーム断
面における各軸線方向の光強度分布を説明するためのビ
ーム断面図、および光強度分布を示すグラフ、第3図は
従来の照明光学系を示す構成図である。 第1図 符号の説明 11・・・・ビームスプリッタ− 13・・・・直角プリズム 15・・・・ルーフプリズム
Fig. 1 is a configuration diagram showing an apparatus according to an embodiment of the present invention, and Figs. 2 (A) to (C) are diagrams for explaining the light intensity distribution in each axial direction in the beam cross section of a typical excimer laser. A beam cross-sectional view and a graph showing a light intensity distribution, and FIG. 3 are a configuration diagram showing a conventional illumination optical system. Explanation of symbols in Figure 1 11...Beam splitter 13...Right angle prism 15...Roof prism

Claims (1)

【特許請求の範囲】[Claims] エキシマレーザーの光路上に配置され、入射ビームを第
1および第2のビームに分割する分割手段と、この分割
手段によって分割された第1のビームを、その光像が左
右および上下が逆転するように偏向する手段と、この手
段からの出力ビームの少なくとも一部を前記分割手段に
よって分割された第2のビームに重ね合わせる重ね合わ
せ手段とを有することを特徴とするエキシマレーザーの
ホモジナイザー。
A splitting means is arranged on the optical path of the excimer laser and splits the incident beam into first and second beams, and the first beam split by the splitting means is arranged so that its optical image is reversed horizontally and vertically. 1. An excimer laser homogenizer comprising: means for deflecting the beam, and superposing means for superimposing at least a part of the output beam from the means on a second beam split by the splitting means.
JP32282888A 1988-12-21 1988-12-21 Homogenizer for excimer laser Pending JPH02166783A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP32282888A JPH02166783A (en) 1988-12-21 1988-12-21 Homogenizer for excimer laser

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP32282888A JPH02166783A (en) 1988-12-21 1988-12-21 Homogenizer for excimer laser

Publications (1)

Publication Number Publication Date
JPH02166783A true JPH02166783A (en) 1990-06-27

Family

ID=18148058

Family Applications (1)

Application Number Title Priority Date Filing Date
JP32282888A Pending JPH02166783A (en) 1988-12-21 1988-12-21 Homogenizer for excimer laser

Country Status (1)

Country Link
JP (1) JPH02166783A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007071413A1 (en) * 2005-12-23 2007-06-28 Carl Zeiss Laser Optics Gmbh Optical system and method for shaping a profile of a laser beam
EP2036168A2 (en) * 2006-06-05 2009-03-18 Cymer, Inc. Device and method to stabilize beam shape and symmetry for high energy pulsed laser applications
JP2012230349A (en) * 2011-04-13 2012-11-22 Ricoh Opt Ind Co Ltd Reflection optical element and reflection optical system
KR20190121893A (en) * 2018-04-18 2019-10-29 삼성디스플레이 주식회사 Array substrate, display panel having the same and method of manufacturing the same

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007071413A1 (en) * 2005-12-23 2007-06-28 Carl Zeiss Laser Optics Gmbh Optical system and method for shaping a profile of a laser beam
JP2009520999A (en) * 2005-12-23 2009-05-28 カール ツァイス レーザー オプティクス ゲーエムベーハー Optical system and method for forming a profile of a laser beam
US7944615B2 (en) 2005-12-23 2011-05-17 Carl Zeiss Laser Optics Gmbh Optical system and method for shaping a profile of a laser beam
KR101353657B1 (en) * 2005-12-23 2014-01-20 칼 짜이스 레이저 옵틱스 게엠베하 Optical system and method for shaping a profile of a laser beam
EP2036168A2 (en) * 2006-06-05 2009-03-18 Cymer, Inc. Device and method to stabilize beam shape and symmetry for high energy pulsed laser applications
JP2009540567A (en) * 2006-06-05 2009-11-19 サイマー インコーポレイテッド Apparatus and method for stabilizing beam shape and symmetry for high energy pulsed laser applications
EP2036168A4 (en) * 2006-06-05 2011-07-13 Cymer Inc Device and method to stabilize beam shape and symmetry for high energy pulsed laser applications
KR101389722B1 (en) * 2006-06-05 2014-04-29 사이머 엘엘씨 Device and method to stabilize beam shape and symmetry for high energy pulsed laser applications
JP2012230349A (en) * 2011-04-13 2012-11-22 Ricoh Opt Ind Co Ltd Reflection optical element and reflection optical system
KR20190121893A (en) * 2018-04-18 2019-10-29 삼성디스플레이 주식회사 Array substrate, display panel having the same and method of manufacturing the same

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