JPH02163912A - High magnetic flux density soft magnetic alloy thin film and manufacture thereof - Google Patents
High magnetic flux density soft magnetic alloy thin film and manufacture thereofInfo
- Publication number
- JPH02163912A JPH02163912A JP31908888A JP31908888A JPH02163912A JP H02163912 A JPH02163912 A JP H02163912A JP 31908888 A JP31908888 A JP 31908888A JP 31908888 A JP31908888 A JP 31908888A JP H02163912 A JPH02163912 A JP H02163912A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- alloy
- soft magnetic
- flux density
- gamma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010409 thin film Substances 0.000 title claims abstract description 18
- 230000004907 flux Effects 0.000 title claims abstract description 8
- 229910001004 magnetic alloy Inorganic materials 0.000 title claims abstract description 6
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 238000004070 electrodeposition Methods 0.000 claims abstract description 22
- 238000000034 method Methods 0.000 claims abstract description 19
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims abstract description 15
- 239000010408 film Substances 0.000 claims abstract description 14
- 229910020630 Co Ni Inorganic materials 0.000 claims abstract description 8
- 229910002440 Co–Ni Inorganic materials 0.000 claims abstract description 8
- 238000009713 electroplating Methods 0.000 claims abstract description 4
- 229910002059 quaternary alloy Inorganic materials 0.000 claims description 9
- MEFBJEMVZONFCJ-UHFFFAOYSA-N molybdate Chemical compound [O-][Mo]([O-])(=O)=O MEFBJEMVZONFCJ-UHFFFAOYSA-N 0.000 claims description 6
- 229910002058 ternary alloy Inorganic materials 0.000 claims description 4
- 239000000203 mixture Substances 0.000 abstract description 10
- 229910045601 alloy Inorganic materials 0.000 abstract description 9
- 239000000956 alloy Substances 0.000 abstract description 9
- 229910003296 Ni-Mo Inorganic materials 0.000 abstract description 3
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 abstract 1
- 229910004616 Na2MoO4.2H2 O Inorganic materials 0.000 abstract 1
- 239000002253 acid Substances 0.000 abstract 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 abstract 1
- SURQXAFEQWPFPV-UHFFFAOYSA-L iron(2+) sulfate heptahydrate Chemical compound O.O.O.O.O.O.O.[Fe+2].[O-]S([O-])(=O)=O SURQXAFEQWPFPV-UHFFFAOYSA-L 0.000 abstract 1
- 229910052708 sodium Inorganic materials 0.000 abstract 1
- 239000011734 sodium Substances 0.000 abstract 1
- FDEIWTXVNPKYDL-UHFFFAOYSA-N sodium molybdate dihydrate Chemical compound O.O.[Na+].[Na+].[O-][Mo]([O-])(=O)=O FDEIWTXVNPKYDL-UHFFFAOYSA-N 0.000 abstract 1
- 229910001325 element alloy Inorganic materials 0.000 description 6
- 229910000889 permalloy Inorganic materials 0.000 description 4
- 238000005275 alloying Methods 0.000 description 3
- 239000000696 magnetic material Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000035699 permeability Effects 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 229910002441 CoNi Inorganic materials 0.000 description 1
- 229910017061 Fe Co Inorganic materials 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
Landscapes
- Thin Magnetic Films (AREA)
- Magnetic Heads (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は高密度磁気記録再生用磁気ヘッドに用いる高磁
束密度軟磁性合金薄膜及び製造方法に関するものである
。DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a high magnetic flux density soft magnetic alloy thin film used in a magnetic head for high density magnetic recording/reproduction and a manufacturing method.
従来の技術
高密度の磁気記録に要求される大きな抗磁力（Ｈａ）の
記録媒体に対して磁気ヘッド用材料には高い飽和磁束密
度（Ｂ８）が必要とされているが、従来の高ＢＩ！値を
有する薄膜磁気ヘッド用軟磁性材料として低温プロセス
において、パターニング精度良く作成できる電着法によ
る製法が可能なものは、Ｂｓ−約９０００Ｇａｕｓｇ
Ｎｔ−Ｆｅ２元素合金膜（パーマロイ膜）に限られてい
た。しかし、磁気ヘッドのより十分な磁気記録再生効率
の向上をはかるためには、さらに大きなりｓ値をもち、
軟磁気特性にも優れた薄膜をパーマロイ膜作製と同様な
利点をもった電着法によって得ることが望まれている。Conventional technology A high saturation magnetic flux density (B8) is required for magnetic head materials for recording media with large coercive force (Ha) required for high-density magnetic recording, but conventional high BI! A soft magnetic material for a thin film magnetic head with a value of Bs-approximately 9000 Gausg that can be manufactured using an electrodeposition method that allows for high patterning accuracy in a low-temperature process.
It was limited to Nt-Fe two-element alloy films (permalloy films). However, in order to further improve the magnetic recording and reproducing efficiency of the magnetic head, it is necessary to have an even larger s value.
It is desired to obtain thin films with excellent soft magnetic properties by electrodeposition, which has the same advantages as permalloy film production.
発明が解決しようとする課題
ところで、Ｆｓ−Ｃｏ−Ｎｉ３元素合金簿膜は、Ｂｓ＝
１００００Ｇａｕｓｇ 〜２１０００Ｇａｕｓｓのきわ
めて高いＢｓ値をもち、良好な軟磁気特性（高初透磁率
（μｉ）及び低抗磁力）を有するうえに、広い組成範囲
において、３元合金電着も可能であることが明らかにな
った（特願昭６３−１９４０９６号）。Problems to be Solved by the Invention By the way, the Fs-Co-Ni three-element alloy film has Bs=
It has an extremely high Bs value of 10,000 Gauss to 21,000 Gauss, has good soft magnetic properties (high initial permeability (μi) and low coercive force), and is also capable of ternary alloy electrodeposition in a wide composition range. It has become clear (Japanese Patent Application No. 194096/1983).
しかし、高Ｂｓ値をもつ組成では磁歪（λａ）が正のや
や高い値をもち、磁気ヘッドデバイス中への実用素子に
対する応用には、第４元素の添加により、さらにλＢ値
を小さくする必要があった。However, compositions with a high Bs value have a slightly high positive magnetostriction (λa), and for application to practical elements in magnetic head devices, it is necessary to further reduce the λB value by adding a fourth element. there were.
また同時に薄膜ヘッド等へ応用される電着膜として上記
のような低λＢ値をもったＦｅ −Ｃｏ−Ｎｉ系に第４
元素を含めた４元合金薄膜が、パーマロイ合金（Ｎｉ−
Ｆｅ系）や、Ｆｅ −Ｃｏ−Ｎｉ系合金のように合金メ
ツキ法で得られることが、必要であるが、電解メツキ法
による４元合金メツキ法についてはこれまで知られてい
なく、その製造方法としての課題であった。At the same time, as an electrodeposited film applied to thin-film heads, etc., the fourth
A quaternary alloy thin film containing elements is permalloy alloy (Ni-
Although it is necessary to obtain alloy plating methods such as Fe-based alloys and Fe-Co-Ni-based alloys, quaternary alloy plating methods using electrolytic plating methods have not been known so far, and the manufacturing method thereof is unknown. This was an issue.
課題を解決するための手段
本発明は上述の問題点にかんがみ発明されたものでろっ
て、請求項１の発明は一般式
％式％
で示される４元合金であって（数字は百分率）、α＝１
５，β＝１４，γ＝１０で且つＯ（ｘ ＜、 ６である
ことを特徴とする請求項２の発明の製造方法は軟磁性薄
膜を電解メツキ法を用いた４元合金電着法として得るこ
とを特徴とする請求項３の発明の製造方法は４元合金電
着法として、クエン酸及びモリブデン酸塩を添加したＦ
ｅ−Ｃｏ−Ｎｉ３元合金電着浴から成膜させることを特
徴とする。Means for Solving the Problems The present invention was invented in view of the above-mentioned problems, and the invention of claim 1 is a quaternary alloy represented by the general formula % (the number is a percentage), α=1
5, β = 14, γ = 10, and O(x <, 6), the manufacturing method of the invention of claim 2 is characterized in that the soft magnetic thin film is formed by a quaternary alloy electrodeposition method using an electrolytic plating method. The manufacturing method of the invention according to claim 3 is characterized in that F to which citric acid and molybdate are added is used as a quaternary alloy electrodeposition method.
It is characterized by forming a film from an e-Co-Ni ternary alloy electrodeposition bath.
作 用
Ｆｅ −Ｃｏ−４’Ｊｉ３元素について、軟磁気特性に
優れた低い抗磁力、高い透磁率を示す。Ｆｅ４５＋１５
ＣＯ２０カ、４ ３６よ、。の組成範囲の磁歪λＢはＮ
ｉ
いずれも正の値を示し、λｇ）ＩＸｌｏ の大きさ
をもっている（例えばＦ ｅ ４ｓ ＣＯ２０Ｎ ｉ
３ｓ組成ではλＢ＝１．８Ｘ１０〜５ ＞ ｏをもつ）
。磁気へ、ノドコアとして実用的なものとするためには
、少なくとも１λ９１＜６Ｘ１０−６は必要と考えられ
る。Function Fe-Co-4'Ji3 elements exhibit low coercive force and high magnetic permeability with excellent soft magnetic properties. Fe45+15
CO20, 4 36. The magnetostriction λB in the composition range is N
i all show positive values and have a magnitude of λg) IXlo (for example, F e 4s CO20N i
3s composition has λB = 1.8X10~5 > o)
. In order to make it practical as a magnetic throat core, it is considered that at least 1λ91<6X10-6 is necessary.
このために有効な第４元素については十分に知られてい
なかったが、少量添加のＭｏ元素を含んだＦｅ −Ｃｏ
−Ｎｉ −Ｍｏ ４元素はλＳの絶対値を小さくするこ
とに有効で、且つ、従来と同様に合金電着法によって、
成膜できることがわかった（４元合金電着）。このとき
の電着浴は、Ｍｏ元素をモリブデン酸塩で供給するだけ
でなく、クエン酸を共存させることではじめて、Ｍｏ
も薄膜中へ合金化して成膜できる。その池の例えば、電
着条件（ＰＨ値、浴温度、電着電流密度（１）、添加剤
等）については、Ｆｅ−Ｃｏ−Ｎｔ３元素合金電着法と
同様にとることで十分である。Ｆｅ−Ｃｏ−Ｎｉ系に対
してＭＯを含めた４元合金化は上記の方法で、少なくと
も１０ａｔ％未満程度は可能であるが、多量のＭｏＬ７
）添加はλＳ値の絶対値を下げることができたとしても
、同時にＦｅ−Ｃｏ−Ｎｉ−Ｍｏ４元合金薄膜の飽和磁
束密度（Ｂｇ）値も下げることにつながるので、Ｆｅ−
Ｃｏ−Ｎｉ系の特長であるところの高Ｂｓ値の特性が、
そこなわれることになる。For this purpose, the effective fourth element was not sufficiently known, but Fe-Co containing a small amount of Mo element was added.
The four elements -Ni-Mo are effective in reducing the absolute value of λS, and as in the past, by alloy electrodeposition method,
It was found that it was possible to form a film (quaternary alloy electrodeposition). At this time, the electrodeposition bath not only supplies Mo element with molybdate, but also coexists with citric acid.
It is also possible to form a thin film by alloying it. For example, it is sufficient to set the electrodeposition conditions (PH value, bath temperature, electrodeposition current density (1), additives, etc.) in the same manner as in the Fe-Co-Nt three-element alloy electrodeposition method. Quaternary alloying including MO for the Fe-Co-Ni system is possible using the above method, at least to an extent of less than 10 at%, but a large amount of MoL7
) addition can lower the absolute value of λS value, but it also leads to lowering the saturation magnetic flux density (Bg) value of the Fe-Co-Ni-Mo quaternary alloy thin film.
The characteristic of high Bs value, which is a feature of Co-Ni system, is
It will be damaged.
実施例
本発明の実施例として作製したＦｅ −Ｃｏ −ｉ’Ｊ
ｉ −Ｍ。Example Fe-Co-i'J produced as an example of the present invention
i-M.
４元素電着膜の磁気特性及びその膜組成と電Ｍ膜の作製
条件を表にまとめる。The magnetic properties of the four-element electrodeposited film, its film composition, and the conditions for producing the electromagnetic film are summarized in a table.
いずれも４元合金化できたもの、全てについてパーマロ
イを上まわる高いＢｓ （飽和磁束密度）値を示した
。また、その中のいくつかは良好な軟磁気特性を示し・
Ｆ０４６±１５ Ｃ０２０±１４”３５±１０の組成領
域で、３元素に比べ（Ｆｅ４６＋１５ ”２０＋１４Ｎ
ｉ３５＋１０） １−ｘＭＯｘ で○〈ｘく６の範囲
テヨり小さなλＳを示した。All of the materials were quaternary alloyed, and all exhibited high Bs (saturation magnetic flux density) values that exceeded that of permalloy. In addition, some of them exhibit good soft magnetic properties.
In the composition range of F046±15 C020±14”35±10, compared to the three elements (Fe46+15”20+14N
i35+10) 1-xMOx showed a smaller λS in the range of ○<x6.
Ｆｅ４５＋１５ ２０＋１４ ３５±１０の組成範囲の
Ｃｏ Ｎ ｉ
３元素に対し６ａｔ％までのＭｏｉ加が、λＢ値の低下
に有効なことが確かめられたが、このＭＯを含む４元素
合金電着膜の製法として、同じ表に示したように、クエ
ン酸を含む電Ｍ浴に限って、モリブデン酸塩（Ｎａ２Ｍ
ｏＯ４−２Ｈ２０添加）の電着浴への添加が効果的であ
ることがわかった。クエン酸を含まない浴中へのモリブ
デン酸塩の添加では、表のｆ３の実施例のように、薄膜
が４元合金化しないことがわかる。また１表の蔦１に示
したＦｓ−Ｃｏ−Ｎｉ３元素合金電着基本浴に対して、
Ｎａ２ＭｏＯ４−２Ｈ２０のモリブデン酸塩の添加量を
かえることで１図面に示すように、得られる電着膜のＦ
ｅ 、 Ｃｏ 、 Ｎｉ 、Ｍｏ各元素の組成比率を制
御することも可能である。電層電流密度（１）はＦｅ−
Ｃ。It has been confirmed that adding up to 6 at% Moi to the three elements of CoNi in the composition range of Fe45+15 20+14 35±10 is effective in reducing the λB value, but the method for producing a four-element alloy electrodeposited film containing this MO is As shown in the same table, molybdate (Na2M
The addition of oO4-2H20) to the electrodeposition bath was found to be effective. It can be seen that the addition of molybdate to a bath without citric acid does not result in a quaternary alloying of the thin film, as in example f3 in the table. In addition, for the Fs-Co-Ni three-element alloy electrodeposition basic bath shown in Table 1,
By changing the amount of molybdate added in Na2MoO4-2H20, the F of the resulting electrodeposited film can be changed as shown in Figure 1.
It is also possible to control the composition ratio of the elements e, Co, Ni, and Mo. Layer current density (1) is Fe-
C.
Ｎｉ糸の３元の合金電着と同様Ｔく６０ｍ Ａ／ｄの範
囲が適当であった。As with the ternary alloy electrodeposition of Ni thread, a range of T of 60 mA/d was suitable.
発明の効果
本発明によれば、極めて高いＢｓ値を有し、同時に磁歪
（λＳ）の小さな軟磁性薄膜が、Ｆａ−ＣＯＮｉ−Ｍｏ
の４元素合金電着法として得ることが可能となる。した
がってより十分な磁気記録再生効率を有する薄膜磁気ヘ
ッド用軟磁性材料として適用される。Effects of the Invention According to the present invention, a soft magnetic thin film having an extremely high Bs value and a small magnetostriction (λS) is made of Fa-CONi-Mo.
It becomes possible to obtain the four-element alloy electrodeposition method. Therefore, it can be applied as a soft magnetic material for thin-film magnetic heads having more sufficient magnetic recording and reproducing efficiency.
Claims (3)
＿βＮｉ＿３＿５＿±＿γ）＿１＿−＿ｘＭｏ＿ｘ、で
示される４元合金であって（数字は百分率）、α＝１５
，β＝１４，γ＝１０で且つ０＜ｘ≦６であることを特
徴とする高磁束密度軟磁性合金薄膜。(1) General formula (Fe_4_5_±_αCo_2_0_±
_βNi_3_5_±_γ)_1_-_xMo_x, (numbers are percentages), α=15
, β=14, γ=10, and 0<x≦6.
法により形成する高磁束密度軟 磁性合金薄膜の製造方法。(2) A method for producing a high magnetic flux density soft magnetic alloy thin film, in which the soft magnetic thin film is formed by a quaternary alloy electrodeposition method using an electrolytic plating method.
酸塩を添加したＦｅ−Ｃｏ−Ｎｉ３元合金電着浴から成
膜させる請求項２記載の高磁束密度軟磁性合金薄膜の製
造方法。(3) The method for producing a high magnetic flux density soft magnetic alloy thin film according to claim 2, wherein the film is formed from an Fe-Co-Ni ternary alloy electrodeposition bath to which citric acid and molybdate are added as the quaternary alloy electrodeposition method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP31908888A JPH02163912A (en) | 1988-12-16 | 1988-12-16 | High magnetic flux density soft magnetic alloy thin film and manufacture thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP31908888A JPH02163912A (en) | 1988-12-16 | 1988-12-16 | High magnetic flux density soft magnetic alloy thin film and manufacture thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02163912A true JPH02163912A (en) | 1990-06-25 |
Family
ID=18106356
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP31908888A Pending JPH02163912A (en) | 1988-12-16 | 1988-12-16 | High magnetic flux density soft magnetic alloy thin film and manufacture thereof |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02163912A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003034891A (en) * | 2001-05-18 | 2003-02-07 | Headway Technologies Inc | Method for manufacturing cobalt iron alloy and plated magnetic thin-film of cobalt iron alloy, and method for manufacturing quaternary alloy and plated magnetic thin-film of cobalt iron molybdenum alloy |
| US6661606B2 (en) | 1995-02-03 | 2003-12-09 | Hitachi, Ltd. | Magnetic disk apparatus with magnetic head having upper and lower magnetic cores of an electroplated thin film |
| EP1850334A1 (en) * | 2006-04-27 | 2007-10-31 | Heraeus, Inc. | Soft magnetic underlayer in magnetic media and soft magnetic alloy based sputter target |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4917325A (en) * | 1972-06-10 | 1974-02-15 | ||
| JPS6235605A (en) * | 1985-08-09 | 1987-02-16 | Konishiroku Photo Ind Co Ltd | Magnetically soft thin film |
| JPS6237914A (en) * | 1985-08-13 | 1987-02-18 | Sumitomo Special Metals Co Ltd | Magnetically soft thin film having stabilized magnetic characteristic for change of thin film forming ambience |
-
1988
- 1988-12-16 JP JP31908888A patent/JPH02163912A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4917325A (en) * | 1972-06-10 | 1974-02-15 | ||
| JPS6235605A (en) * | 1985-08-09 | 1987-02-16 | Konishiroku Photo Ind Co Ltd | Magnetically soft thin film |
| JPS6237914A (en) * | 1985-08-13 | 1987-02-18 | Sumitomo Special Metals Co Ltd | Magnetically soft thin film having stabilized magnetic characteristic for change of thin film forming ambience |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6661606B2 (en) | 1995-02-03 | 2003-12-09 | Hitachi, Ltd. | Magnetic disk apparatus with magnetic head having upper and lower magnetic cores of an electroplated thin film |
| JP2003034891A (en) * | 2001-05-18 | 2003-02-07 | Headway Technologies Inc | Method for manufacturing cobalt iron alloy and plated magnetic thin-film of cobalt iron alloy, and method for manufacturing quaternary alloy and plated magnetic thin-film of cobalt iron molybdenum alloy |
| EP1850334A1 (en) * | 2006-04-27 | 2007-10-31 | Heraeus, Inc. | Soft magnetic underlayer in magnetic media and soft magnetic alloy based sputter target |
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