JPH021505A - Stage with interferometer - Google Patents
Stage with interferometerInfo
- Publication number
- JPH021505A JPH021505A JP63135664A JP13566488A JPH021505A JP H021505 A JPH021505 A JP H021505A JP 63135664 A JP63135664 A JP 63135664A JP 13566488 A JP13566488 A JP 13566488A JP H021505 A JPH021505 A JP H021505A
- Authority
- JP
- Japan
- Prior art keywords
- stage
- windshield
- interferometer
- windshields
- mirror
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000001427 coherent effect Effects 0.000 claims abstract description 18
- 238000005259 measurement Methods 0.000 abstract description 5
- 230000003287 optical effect Effects 0.000 abstract description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 241000257465 Echinoidea Species 0.000 description 1
- 241000238413 Octopus Species 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 208000013403 hyperactivity Diseases 0.000 description 1
- 230000001012 protector Effects 0.000 description 1
- 238000009966 trimming Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
Abstract
Description
【発明の詳細な説明】
［Ｍ業上の利用分野Ｊ
この発明は、集積回路製造用露光装置やレーザスクライ
バ、レーザトリミング装置等に用いられる移動距離を測
定する干渉計を備えたステージ、特に加工物を高精度で
位置決めする必要がある場合に適した干渉計付ステージ
に関するものである。[Detailed Description of the Invention] [Field of Application in M Industry J This invention relates to a stage equipped with an interferometer for measuring a moving distance used in an exposure device for manufacturing integrated circuits, a laser scriber, a laser trimming device, etc., especially in processing. This invention relates to an interferometer-equipped stage suitable for cases where it is necessary to position objects with high precision.
［従来の技術］
従来、集積回路製造用露光装置等において、ステージを
所定の位置まで２次元方向に８動させるには、ステージ
のｘ、ｙ両軸方向に干渉計を備え、８動距離を測定する
ことよってステージの不多動を制御している。[Prior Art] Conventionally, in an exposure apparatus for manufacturing integrated circuits, etc., in order to move the stage eight times in two-dimensional directions to a predetermined position, interferometers are provided in both the x and y axes of the stage, and the distance of eight movements is adjusted. Stage hyperactivity is controlled by measuring.
かかる装置においては、ステージの直交する２側面にス
テージとともに８勤する移動鏡をそれぞれ備えるととも
に、Ｘおよびｙ！ＩＩｔｈ用参照鏡を所定の位置に配置
し、光源から出射され、ビームスプリッタでＸ軸方向と
ｙ中１ｂ方向に分割されたコヒーレント光をさらに２つ
に分割して、ｆＪ動鏡および参照鏡にそれぞれ投射し、
移動鏡と参照鏡によって反射された反射光を互いに干渉
させている。そして、この干渉によって生じる干渉縞の
変化を光電検出することによフて、ｘ、ｙ両軸方向のス
テージの移動距離を測定している。In such an apparatus, movable mirrors are provided on two orthogonal sides of the stage and move along with the stage in eight positions, and X and Y! The reference mirror for IIth is placed at a predetermined position, and the coherent light emitted from the light source and split into the X-axis direction and the y-1b direction by the beam splitter is further split into two and transmitted to the fJ moving mirror and the reference mirror. project each,
The reflected lights reflected by the moving mirror and the reference mirror are made to interfere with each other. By photoelectrically detecting changes in interference fringes caused by this interference, the moving distance of the stage in both the x and y axis directions is measured.
［発明が解決しようとする課題］
上記のような従来の装置においては、移動鏡に向けてコ
ヒーレント光を出射する干渉計本体と移動鏡の間の空気
のゆらぎによって、生じる干渉縞が変化し、あたかも移
動鏡と干渉計本体との即問］が変化しているかのように
検出され、ステージの精密な位置計測ができなくなると
いう問題点があった。[Problems to be Solved by the Invention] In the conventional device as described above, interference fringes generated change due to fluctuations in the air between the interferometer body that emits coherent light toward the movable mirror and the movable mirror. There was a problem in that it was detected as if the relationship between the movable mirror and the interferometer body was changing, making it impossible to accurately measure the position of the stage.
この発明は、かかる点に鑑みてなされたものであり、ス
テージ周辺の空気のゆらぎの影響を防ぎ、高精度の位置
決めが可能な干渉計付ステージを提供することを目的と
している。The present invention has been made in view of the above points, and an object of the present invention is to provide a stage with an interferometer that prevents the influence of air fluctuations around the stage and enables highly accurate positioning.
［課題を解決するための手段］
本発明においては、２次元方向に移動するステージ側に
移動鏡の反射面に沿った細長い断面形状を有する中空の
第１風防を固定し、干渉計本体側に移動鏡に向けてコヒ
ーレント光を通すとともに、前記第１風防内側に非接触
に嵌入される筒状の第２風防を固設し、この第１風防お
よび第２風防によって前記移動鏡と干渉計本体との間の
コヒーレント光の通路を覆うことによって、上記の課題
を達成している。[Means for Solving the Problems] In the present invention, a hollow first windshield having an elongated cross-sectional shape along the reflecting surface of a movable mirror is fixed on the side of a stage that moves in two-dimensional directions, and a first windshield is fixed on the side of the interferometer main body. A cylindrical second windshield is fixedly installed to pass coherent light toward the movable mirror and to be fitted into the inside of the first windshield without contacting the movable mirror and the interferometer body. The above task is achieved by covering the path of coherent light between.
［作用］
本発明においては、ステージ側には移動鏡の断面に沿っ
て細長い断面形状を有する中空の第１風防が固定され、
干渉計本体側には前記第１風防内側に接触しないように
嵌入される筒状の第２風防が固定されているので、ステ
ージの移動にともなって第１風防の中を第２風防止が非
接触のまま相対的に移動することになる。従って、移動
部と固定部が機械的に分離された状態で、移動鏡と干渉
計本体との間のコヒーレント光の通路が風防によって常
に覆われることになる。このため、ステージの移動に伴
う機械的撮動を干渉計本体に伝達することなく、コヒー
レント光の通路の空気のゆらぎをほとんど防止すること
ができ、高精度の位置決めが可能となる。[Function] In the present invention, a hollow first windshield having an elongated cross-sectional shape along the cross-section of the movable mirror is fixed to the stage side,
A cylindrical second windshield is fixed to the interferometer main body side, and is fitted into the first windshield so as not to come in contact with the inside of the first windshield.As the stage moves, the second windshield moves inside the first windshield. They will move relatively while remaining in contact. Therefore, in a state where the movable part and the fixed part are mechanically separated, the path of coherent light between the movable mirror and the interferometer body is always covered by the windshield. Therefore, the mechanical movement accompanying the movement of the stage is not transmitted to the interferometer main body, and air fluctuations in the path of coherent light can be almost prevented, allowing highly accurate positioning.
［実施例］ 第１図は、本発明実施例を示す斜視図である。[Example] FIG. 1 is a perspective view showing an embodiment of the present invention.
この実施例においては、Ｘステージ６の上にＸステージ
５かに載置されており、Ｘステージ６はＸステージ５を
載置したままモータ８によってＸ４’＋ｂ方向に移動可
能となっている。また、Ｘステージ５はＸステージ６上
をモータ７によってｙ軸方向に移動可能となっており、
これにより、Ｘステージ５上に固定されるウニ八等の加
工物がＸ −ｙ両方向に移動可能となっている。In this embodiment, the X stage 5 is placed on the X stage 6, and the X stage 6 can be moved in the X4'+b direction by the motor 8 while the X stage 5 is placed thereon. Furthermore, the X stage 5 can be moved in the y-axis direction on the X stage 6 by a motor 7.
Thereby, the workpiece, such as sea urchin octopus, fixed on the X stage 5 can be moved in both the X and Y directions.
そして、Ｘステージ上にはＸ方向用移動鏡４ａおよびｙ
方向用移動鏡４ｂが、それぞれ反射面がＸ軸およびｙＩ
Ｉｉｌｌｌと垂直となるように配置されている。この移
動鏡４ａ、４ｂには、反射面に沿って細長い断面形状を
なす中空の第１風防２ａ、２ｂがそれぞれ備えられてい
る。ここで、移動鏡４ａ、４ｂの反射面は極めて平滑に
加工される必要があるので、第１Ｆｆｉ防２ａ、２ｂを
設置するにあたっては反射面にゆがみが生じないように
考慮することが必要である。即ち、第１図においては、
簡単のため第１風防２ａ、２ｂが移動鏡４ａ、４ｂにそ
れぞれ直接取付けであるが、好ましくは、第１風防をｙ
ステージ自体に固設し、移動鏡の反射面との間に補備か
な間隙を設けるか、または、第２図に示されるように移
動鏡４ａ自体も第ｉ＠１１、ｆｊ ２ ａで覆い、支持
部！ｌでＸステージ５に固設すると良い。On the X stage, there is a movable mirror 4a for the X direction and a y
The direction movable mirror 4b has reflective surfaces aligned with the X axis and yI, respectively.
It is arranged perpendicular to Iill. The movable mirrors 4a, 4b are respectively provided with hollow first windshields 2a, 2b each having an elongated cross-sectional shape along the reflecting surface. Here, since the reflective surfaces of the movable mirrors 4a and 4b need to be processed to be extremely smooth, consideration must be given to avoid distortion of the reflective surfaces when installing the first Ffi protectors 2a and 2b. . That is, in Figure 1,
For simplicity, the first windshields 2a and 2b are attached directly to the movable mirrors 4a and 4b, respectively, but preferably, the first windshields are
Either the movable mirror 4a is fixed to the stage itself and a supplementary gap is provided between it and the reflecting surface of the movable mirror, or the movable mirror 4a itself is covered with the i@11, fj 2 a as shown in FIG. Support part! It is best to fix it on the X stage 5 with l.
第１図の説明に戻ると、Ｘおよびｙ軸両方向には、ビー
ムスプリッタ、参照鏡および光電検出器等（図示せず）
を含む干渉計本体１ａ、１ｂがそれぞれ所定の位置に配
置されている。この干渉計本体１ａ、ｌｂには、それぞ
れＸおよびｙ軸に沿って細長い筒状の第２風防３ａ、３
ｂが備えられており、前記第１風防２ａ、２ｂの内側に
接しないように第１風防内にそれぞれ嵌入されている。Returning to the explanation of FIG. 1, in both the X and Y axes, there are a beam splitter, a reference mirror, a photodetector, etc.
Interferometer bodies 1a and 1b including the interferometer bodies 1a and 1b are respectively arranged at predetermined positions. The interferometer bodies 1a and lb have second windshields 3a and 3 which are elongated and cylindrical along the X and y axes, respectively.
b, which are respectively fitted into the first windshields so as not to contact the insides of the first windshields 2a and 2b.
第１および第２風助の寸法は、ステージが干渉計本体か
ら最も遠ざかった場合でも外側の第１風防と内側の第２
風防が重なりあっており、かつステージの移動によって
２つの風防が接触しないように設計されている。また、
第１および第２風防はステージの周囲に起こる風によっ
て歪の生じない程度の強度のある材質によって構成され
°ている。The dimensions of the first and second windshields are such that even when the stage is farthest from the interferometer body, the outer first windshield and the inner second windshield are
The windshields overlap and are designed so that the two windshields do not come into contact with each other due to the movement of the stage. Also,
The first and second windshields are made of a material strong enough not to be distorted by the wind around the stage.
かかる装置において、光源１０から出射され、ビームス
プリッタ９によってｘ、ｙ２φ（ｂ方向に分Ｍ’Ｊされ
、ｘ （’＋ｈ方向の干渉計本体１ａに入射したコヒー
レント光は、干渉計本体１ａの中のビームスプリッタに
よって固定鏡に向う光と移動鏡４ａに向う光に分りらね
る。そして、移動鏡４ａに向うコヒーレント光は前述し
た第１風助２ａおよび第２風防３ａの中を通って、ステ
ージ５に備えられた移動鏡４ａに入射する。ここで反射
されたコヒーレント光は再び第１および第２風防２ａ、
３ａの中を通って、干渉計本体ｌａ内のビームスフリツ
タに戻り、参照鏡で反射されたコヒーレント光と重ね合
わされて光電センサの受光部に導かれる。そして、参照
鏡からの反射光と移動鏡からの反射光を干渉させること
により生じる干渉縞の変化を検出することによってステ
ージのＸ軸方向の穆動距顛を測定する。なお、Ｘ軸方向
の穆動距刻１の測定もＸ軸方向と同様にして行われる。In this device, the coherent light emitted from the light source 10, divided by the beam splitter 9 in the x, y2φ(b direction, and incident on the interferometer main body 1a in the x(′+h direction) is The beam splitter separates the light directed toward the fixed mirror and the light directed toward the movable mirror 4a.Then, the coherent light directed toward the movable mirror 4a passes through the first windshield 2a and the second windshield 3a described above, and is directed to the stage. 5.The coherent light reflected here is again transmitted to the first and second windshields 2a,
3a, returns to the beam splitter in the interferometer main body la, is superimposed on the coherent light reflected by the reference mirror, and is guided to the light receiving section of the photoelectric sensor. Then, the moving distance of the stage in the X-axis direction is measured by detecting changes in interference fringes caused by interference between the reflected light from the reference mirror and the reflected light from the movable mirror. Note that the measurement of the moving distance 1 in the X-axis direction is also performed in the same manner as in the X-axis direction.
以上のような干渉計付ステージにおいては、コヒーレン
ト光の通路が第１および第２風防に覆われているので、
例えば図中ＡおよびＣの方向からの風による測定への影
響をほぼ完全に防ぐことができる。In the stage with an interferometer as described above, the coherent light path is covered by the first and second windshields, so
For example, the influence of wind from directions A and C in the figure on the measurement can be almost completely prevented.
また、図中Ｂの方向からの風についても、第１風防の間
口部を第２風防と接触しない限りにおいてできるだり狭
くすることによって、その影πを小さくすることができ
る。第１風防の開口部を小さくするためには、コヒーレ
ント光の通過に支１（帝のない限り、第２風防の径が細
い方が好ましいことは言うまでも２．−い。さらに、例
えば図中Ａの方向から一定の風を送ることにより、図中
８方向からの風を起さないようにしたり、かかる干渉計
付ステージ全体を覆うような風防を設置すれはより高精
度の測定が可能となる。Furthermore, regarding the wind from the direction B in the figure, the influence π can be reduced by widening or narrowing the frontage of the first windshield as long as it does not come into contact with the second windshield. In order to make the opening of the first windshield smaller, it is necessary to make the diameter of the second windshield smaller than the diameter of the second windshield. By sending a constant wind from the direction of A in the middle, you can prevent wind from coming from the 8 directions in the figure, or by installing a windshield that covers the entire stage with the interferometer, it is possible to perform more accurate measurements. becomes.
なお、本実施例においては、第１風防および第２風防に
よって干渉計本体と移動鏡の間のコヒーレント光の通路
を完全に覆っているが、放熱性等に問題がある場合には
、空気のゆらぎの起こりにくい風防の下面部を細かいメ
ツシュ状にし°ても良い。In this example, the first windshield and the second windshield completely cover the coherent light path between the interferometer body and the movable mirror, but if there is a problem with heat dissipation, etc., the air The lower surface of the windshield, where fluctuations are less likely to occur, may be made into a fine mesh shape.
［発明の効果］
この発明においては、２次元方向に移動するステージと
、干渉計本体にそれぞれ風防を設け、かつステージ側に
取付けた風防内に干渉計本体側に取付けた風防を接触し
ないように嵌入して、■多動鏡と干渉計本体の間のコヒ
ーレント光の光路を）百ってことにより、ステージの移
動ｆ２［ｍ測定に対する空気のゆらぎの影ｔ’ｆｆをほ
とんど防ぐことかできる。また、ステージと干渉計本体
か機械的に分離されているので、ステージの移動による
振動が干渉計本体に伝達されることがない。[Effects of the Invention] In this invention, a stage that moves in two-dimensional directions and a windshield are provided on the interferometer body, and the windshield attached to the interferometer body side is prevented from coming into contact with the windshield attached to the stage side. By inserting (1) the optical path of the coherent light between the polygon mirror and the interferometer body, it is possible to almost prevent the influence of air fluctuations t'ff on the stage movement f2[m measurement. Furthermore, since the stage and the interferometer body are mechanically separated, vibrations caused by the movement of the stage are not transmitted to the interferometer body.
かかる装置を用いれば、ステージの移動即問【を非常に
正確に検出することができるので、ステージの高精度の
位置決めが可能となり、集積回路製造用縮小投影露光装
置や加工物８勅方式の各種の精密加工装置等において極
めて有益である。If such a device is used, it is possible to detect the movement of the stage very accurately, making it possible to position the stage with high precision. This is extremely useful in precision processing equipment, etc.
第１図は本発明実施例を示す斜視図、第２図は風防の取
付例を示す斜視図である。
［主要部分の符号の説明］
＋ａ、ｌｂ・・・干渉語本体
２ａ、２ｂ・・・第１風防
３ ａ 、 ３ ｂ ・・・”１； ２
ノ１１ｆｌ／ｊ４ａ、４ｂ＝−Ｊ’ｌ 動 ３Ｑ
’
５・・・ｙステージ
６・・・ＸステージFIG. 1 is a perspective view showing an embodiment of the present invention, and FIG. 2 is a perspective view showing an example of installing a windshield. [Explanation of symbols of main parts] +a, lb...Interference word body 2a, 2b...First windshield 3a, 3b..."1; 2
ノ11fl/j4a, 4b=-J'l Dynamic 3Q
' 5...y stage 6...X stage
Claims (1)
、光源から出射されたコヒーレント光を所定の位置に配
置された参照鏡と、ステージと共に移動する移動鏡に分
割して投射し、該参照鏡および移動鏡でそれぞれ反射さ
れたコヒーレント光を互いに干渉させ、該干渉によって
生じる干渉縞の変化を光電検出して前記ステージの移動
距離を測定する干渉計を備えた干渉計付ステージにおい
て、ステージ側に固定され、前記移動鏡の反射面に沿っ
た細長い断面形状を有する中空の第１風防と、前記干渉
計本体側に固設され、前記移動鏡に向けてコヒーレント
光を通すとともに、前記第１風防内側に非接触に嵌入さ
れる筒状の第２風防とを有し、該第１風防および第２風
防によって前記移動鏡と干渉計本体との間のコヒーレン
ト光の通路を覆うことを特徴とした干渉計付ステージ。A stage movable at a predetermined speed in two-dimensional directions, which divides and projects coherent light emitted from a light source onto a reference mirror placed at a predetermined position and a movable mirror that moves together with the stage. In a stage equipped with an interferometer that makes coherent lights reflected by a mirror and a movable mirror interfere with each other, and measures a moving distance of the stage by photoelectrically detecting changes in interference fringes caused by the interference, the stage side a hollow first windshield fixed to the movable mirror and having an elongated cross-sectional shape along the reflective surface of the movable mirror; It has a cylindrical second windshield that is fitted into the inside of the windshield in a non-contact manner, and the first windshield and the second windshield cover the path of coherent light between the movable mirror and the interferometer main body. A stage with an interferometer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63135664A JPH021505A (en) | 1988-06-03 | 1988-06-03 | Stage with interferometer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63135664A JPH021505A (en) | 1988-06-03 | 1988-06-03 | Stage with interferometer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH021505A true JPH021505A (en) | 1990-01-05 |
Family
ID=15157054
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63135664A Pending JPH021505A (en) | 1988-06-03 | 1988-06-03 | Stage with interferometer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH021505A (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5875031A (en) * | 1994-09-13 | 1999-02-23 | Nikon Corporation | Distance measuring device based on laser interference with a baffle structure member |
| JP2005197698A (en) * | 2003-12-30 | 2005-07-21 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
| WO2005083758A1 (en) * | 2004-03-02 | 2005-09-09 | Nikon Corporation | Stage apparatus and projection exposure apparatus |
| JP2008072100A (en) * | 2006-08-25 | 2008-03-27 | Asml Netherlands Bv | Lithography equipment and device manufacturing method |
| JP2010161116A (en) * | 2009-01-06 | 2010-07-22 | Canon Inc | Positioning apparatus, aligner using the same, and process of fabricating device |
| WO2016023667A1 (en) * | 2014-08-15 | 2016-02-18 | Asml Netherlands B.V. | Lithographic apparatus and method |
| CN106931878A (en) * | 2015-12-31 | 2017-07-07 | 上海微电子装备有限公司 | A kind of interfering meter measuring device and its control method |
-
1988
- 1988-06-03 JP JP63135664A patent/JPH021505A/en active Pending
Cited By (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5875031A (en) * | 1994-09-13 | 1999-02-23 | Nikon Corporation | Distance measuring device based on laser interference with a baffle structure member |
| JP2005197698A (en) * | 2003-12-30 | 2005-07-21 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
| JP4602757B2 (en) * | 2003-12-30 | 2010-12-22 | エーエスエムエル ネザーランズ ビー．ブイ． | Lithographic apparatus and device manufacturing method |
| WO2005083758A1 (en) * | 2004-03-02 | 2005-09-09 | Nikon Corporation | Stage apparatus and projection exposure apparatus |
| JPWO2005083758A1 (en) * | 2004-03-02 | 2007-11-29 | 株式会社ニコン | Stage apparatus and projection exposure apparatus |
| JP2008072100A (en) * | 2006-08-25 | 2008-03-27 | Asml Netherlands Bv | Lithography equipment and device manufacturing method |
| JP4668248B2 (en) * | 2006-08-25 | 2011-04-13 | エーエスエムエル ネザーランズ ビー．ブイ． | Lithographic apparatus and device manufacturing method |
| JP2010161116A (en) * | 2009-01-06 | 2010-07-22 | Canon Inc | Positioning apparatus, aligner using the same, and process of fabricating device |
| WO2016023667A1 (en) * | 2014-08-15 | 2016-02-18 | Asml Netherlands B.V. | Lithographic apparatus and method |
| KR20170041909A (en) * | 2014-08-15 | 2017-04-17 | 에이에스엠엘 네델란즈 비.브이. | Lithographic apparatus and method |
| CN106575087A (en) * | 2014-08-15 | 2017-04-19 | Asml荷兰有限公司 | Lithographic apparatus and method |
| JP2017530382A (en) * | 2014-08-15 | 2017-10-12 | エーエスエムエル ネザーランズ ビー．ブイ． | Lithographic apparatus and method |
| US9977348B2 (en) | 2014-08-15 | 2018-05-22 | Asml Netherlands B.V. | Lithographic apparatus and method |
| KR20190049915A (en) * | 2014-08-15 | 2019-05-09 | 에이에스엠엘 네델란즈 비.브이. | Lithographic apparatus and method |
| US10345717B2 (en) | 2014-08-15 | 2019-07-09 | Asml Netherlands B.V. | Lithographic apparatus and method |
| CN106931878A (en) * | 2015-12-31 | 2017-07-07 | 上海微电子装备有限公司 | A kind of interfering meter measuring device and its control method |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US8194251B2 (en) | Method for operating a dual beam chromatic point sensor system for simultaneously measuring two surface regions | |
| US8411280B2 (en) | Surface shape measurement apparatus | |
| KR830001843B1 (en) | Electro-optic centerline measuring device | |
| US20110080592A1 (en) | Surface shape measurement apparatus | |
| US20070177156A1 (en) | Surface profiling method and apparatus | |
| KR930004754A (en) | Interferometric Ball Bearing Inspection Apparatus and Method | |
| JP4774269B2 (en) | Displacement sensor | |
| JPH021505A (en) | Stage with interferometer | |
| US10739125B2 (en) | Precision measurement system using interferometer and image | |
| US7898671B2 (en) | Interferometer having a mirror system for measuring a measured object | |
| US6535290B1 (en) | Optical position measuring device with a beam splitter | |
| US7483149B2 (en) | Optical measuring device for measuring curved surfaces | |
| JP7361166B2 (en) | Multi-axis laser interferometer and displacement detection method | |
| US4115008A (en) | Displacement measuring apparatus | |
| US20110222170A1 (en) | Laser reflector | |
| JP2920533B1 (en) | High sensitivity measurement method by white interference | |
| CN112284299A (en) | Five-degree-of-freedom simultaneous measurement interference device | |
| JPH03276044A (en) | Method and instrument for measuring radius of curvature of curved surface | |
| JP2003035508A (en) | Image measurement head and image measuring device | |
| JPH10281720A (en) | Stage device and wave front aberration measuring device using the same | |
| SU1315799A1 (en) | Device for measuring linear displacements | |
| JPH058412U (en) | Laser interferometer | |
| JP2023034275A (en) | optical device | |
| CN116878393A (en) | Laser displacement measuring device and method based on optical lever angle compensation | |
| JP2004325120A (en) | Probe scanning type shape-measuring apparatus provided with straightness correction function |