JP4774269B2 - Displacement sensor - Google Patents

Description

  The present invention relates to a displacement sensor that detects a displacement position of a contact portion constituting a measuring element.

Conventionally, a measuring device that scans the surface of the object to be measured and measures the surface property or three-dimensional shape of the object to be measured is known, such as a roughness measuring machine, a contour shape measuring machine, a roundness measuring machine, and a three-dimensional measurement. The machine is known.
In such a measuring apparatus, a contact probe is used as a displacement sensor that detects the surface of the object to be measured based on the minute displacement of the contact part when the contact part contacts the surface of the object to be measured (see, for example, Patent Document 1). ).

FIG. 7 shows the configuration of the shape measuring apparatus 10 using a contact probe.
The shape measuring apparatus 10 includes a contact probe 11 and a drive mechanism 12 that moves the contact probe 11 three-dimensionally along the object to be measured. As shown in FIG. 8, the contact probe 11 includes a stylus 13 having a contact portion 14 at the tip, and a sensor main body portion 15 that supports the stylus 13. The sensor body 15 supports the stylus 13 so as to be displaceable within a certain range in the xp, yp, and zp directions, and detects the displacement direction and displacement amount (displacement position) of the contact portion 14.

Further, for example, the following configuration is known as a technique for detecting the displacement position of the contact portion 14 in the sensor body 15 (see, for example, Patent Document 2).
The sensor main body 15 includes a first moving mechanism that is movable in the Z-axis direction, and a first moving mechanism when the mutually orthogonal axis directions are the X-axis direction, the Y-axis direction, and the Z-axis direction. A second moving mechanism that is connected and movable in the Y-axis direction; and a third moving mechanism that is connected to the second moving mechanism and is movable in the X-axis direction. Then, the third moving mechanism supports and fixes the stylus 13. Each moving mechanism is provided with a measuring mechanism. Each measurement mechanism is composed of a so-called LVDT (Linear Variable-Diffential Transformer) mechanism, which detects the displacement position of each moving mechanism in the X-axis direction, Y-axis direction, and Z-axis direction, thereby determining the displacement position of the contact portion. To detect.

JP 2000-39302 A JP-A-8-43066

However, since the technique described in Patent Document 2 has a structure in which the stylus is moved by three moving mechanisms, the structure of the movable part (three moving mechanisms) for moving the stylus is complicated and the mass of the movable part is increased. Resulting in. For this reason, when the probe is moved at high speed along the object to be measured, it is difficult to displace the probe at high speed along the shape of the object to be measured, and the shape of the object to be measured is measured quickly. It is difficult.
In addition, since the displacement positions of the three moving mechanisms are detected by the three measuring mechanisms, the detection accuracy of the displacement position of the contact portion is greatly influenced by the manufacturing accuracy of the three moving mechanisms, and the displacement position of the contact portion is determined. It is difficult to detect with high accuracy.

  An object of the present invention is to provide a displacement sensor capable of simplifying and reducing the weight of the structure of the movable portion and detecting the displacement position of the contact portion with high accuracy.

The displacement sensor of the present invention includes a measuring element having a contact portion that comes into contact with an object to be measured, and a sensor main body portion that supports the measuring element in a displaceable manner and detects a displacement position of the contact portion. The unit is fixed at a predetermined position, a support means for displacing the measuring element, a reference reflecting means attached to the measuring element and having a reference reflecting surface capable of reflecting at least a part of the incident light beam. A reference reflecting means having a reference reflecting surface capable of reflecting at least a part of the incident light flux, a light flux emitting means for emitting a light flux toward the reference reflecting surface and the reference reflecting surface, the reference reflecting surface and the reference reflecting surface. An imaging unit that captures an optical image that is reflected by the reference reflecting surface and superimposed on the imaging surface, and the reference reflecting surface and the reference based on the optical image captured by the imaging unit The intensity distribution information related to the intensity distribution of the interference fringes generated by the reflected light is superimposed from elevation plane confirmed, X-axis direction of the contact portion based on the intensity distribution information, Y-axis, and the Z-axis direction And an arithmetic processing means for calculating the displacement position.

  According to the present invention, since the measuring element is supported by the supporting means so as to be displaceable, the movable part (supporting means) is provided in comparison with a configuration in which the measuring element is supported by the three moving mechanisms so as to be displaceable. A single unit can be configured, the structure of the movable part can be simplified, and the weight can be reduced. For this reason, even when the probe is moved at high speed along the object to be measured, the probe can be displaced at high speed along the shape of the object to be measured, and the shape of the object to be measured can be quickly changed. It can be measured.

By the way, it is known that an interference fringe corresponding to the optical path difference is generated in an optical image obtained by superimposing the reflected lights from the reflecting surfaces arranged so as to have a predetermined optical path difference. The interference fringes depend on the optical path difference, and changing the optical path difference causes the interference fringes to move in a predetermined direction, change the number of fringes, or change the interference fringes. . For this reason, it is possible to detect the change in the optical path difference, that is, the relative position of each reflecting surface by recognizing the change in the interference fringes.
The sensor main body is composed of a support means, a standard reflection means, a reference reflection means, a light beam emission means, an imaging means, and an arithmetic processing means. Therefore, as shown below, the X-axis direction of the contact portion , Y The displacement position in the axial direction and the Z-axis direction (hereinafter, the displacement position of the contact portion) can be detected.
That is, a light beam is emitted from the light beam emitting means, and the standard reflection surface and the reference reflection surface are irradiated with the light beam.
Further, the imaging means picks up an optical image that is reflected by the standard reflecting surface and the reference reflecting surface and superimposed on the imaging surface.
Then, the arithmetic processing means recognizes intensity distribution information regarding the intensity distribution of the interference fringes generated by superimposing the reflected lights from the standard reflecting surface and the reference reflecting surface based on the optical image picked up by the image pickup means. . In addition, the arithmetic processing unit calculates a change in the relative position of the reference reflection surface and the reference reflection surface by detecting, for example, a change in the recognized intensity distribution information based on the recognized intensity distribution information. Here, the reference reflecting means is attached to the probe and is displaced according to the displacement of the probe. For this reason, the arithmetic processing means calculates the displacement position of the reference reflection surface, that is, the displacement position of the contact portion by calculating the change in the relative position of the reference reflection surface and the reference reflection surface.

  As described above, since the displacement position (displacement position of the contact portion) of the reference reflecting surface is directly detected optically, it is compared with the conventional configuration in which the measurement mechanism detects the displacement position of the moving mechanism. The displacement position of the part can be detected with high accuracy. In addition, the structure can be simplified and the sensor body can be reduced in weight compared to the conventional configuration in which the LVDT mechanism is adopted for each measurement mechanism.

In the present invention, the arithmetic processing unit extracts phase information related to the phase of the interference fringes based on the intensity distribution information, and compares the preset phase information related to the phase of the interference fringes with the phase information. It is preferable to generate change amount information regarding the change amount of the phase and calculate the displacement position of the contact portion in the X-axis direction, the Y-axis direction, and the Z-axis direction based on the change amount information.
Here, the extraction method of the phase information by the arithmetic processing means is not particularly limited, and for example, any method such as a phase shift method and a Fourier transform method may be adopted.
According to the present invention, since the arithmetic processing means calculates the displacement position of the contact portion based on the amount of change in the phase of the interference fringes, the displacement position of the contact portion can be calculated with high accuracy and speed with a simple arithmetic processing.

In the present invention, the reference reflecting means is constituted by a member that reflects a part of the incident light beam and transmits another light beam, and the reference beam is reflected on the optical path of the light beam emitted from the light beam emitting device and reaching the reference reflecting device. It is preferable that the reflector is disposed on the upstream side of the optical path.
By the way, regardless of the position of the reference reflecting means, interference fringes are generated in an optical image obtained by superimposing the reflected lights from the standard reflecting means and the reference reflecting means. For example, the reference reflecting means may be disposed on the optical path of the light beam emitted from the light beam emitting means and reaching the reference reflecting means, or the light beam emitted from the light beam emitting means and reached the reference reflecting means. You may arrange | position on the optical path different from an optical path. However, when the configuration in which the reference reflecting means is disposed on an optical path different from the optical path of the light beam emitted from the light beam detecting means and reaching the reference reflecting means, the optical path of the light beam emitted from the light beam emitting means is 2 It is necessary to form the sensor body, which may hinder downsizing of the sensor main body.
According to the present invention, the reference reflecting means is disposed on the optical path of the light beam emitted from the light beam emitting means and reaching the reference reflecting means. Therefore, if only one optical path of the light beam emitted from the light beam emitting means is formed. Well, the sensor body can be downsized.

In the present invention, the imaging unit extends in a direction orthogonal to each other from a predetermined position in a plane orthogonal to the incident direction of the light flux respectively reflected on the reference reflecting surface and the reference reflecting surface to the imaging unit. It is preferable that the line sensor is arranged in a cross shape.
By the way, when calculating the displacement position of the reference reflection surface (displacement position of the contact portion) based on the interference fringe intensity distribution information, unlike the calculation method of the shape of the reference reflection surface, the interference fringe in the optical image is calculated. It is possible to calculate the displacement position of the contact portion based on the intensity distribution information only in two orthogonal directions among the intensity distribution information.
As shown in one embodiment of the present invention, if the imaging means is constituted by a line sensor arranged in a cross shape, intensity distribution information only in two orthogonal directions among the intensity distribution information of interference fringes in the optical image. Can be output from the imaging means to the arithmetic processing means. For this reason, since only the minimum intensity distribution information is used in the arithmetic processing means, the amount of information can be reduced, the information processing time can be shortened, and the displacement position of the contact portion can be calculated quickly.

In this invention, it is preferable that the said support means supports the said measuring element so that a displacement is possible in the gravity center position of the said reference | standard reflection means and the said measuring element.
According to the present invention, since the supporting means supports the measuring element so as to be displaceable at the center of gravity of the measuring element including the reference reflecting means, the posture of the measuring element is not changed by its own weight. For this reason, for example, even when the displacement sensor is used in various postures, the displacement of the contact portion is not affected by the posture change due to the weight of the measuring element, and only the displacement due to the contact with the object to be measured. The displacement position of the contact portion can be detected with high accuracy.

Hereinafter, an embodiment of the present invention will be described with reference to the drawings.
FIG. 1 is a cross-sectional view showing an overall configuration of a contact probe 100 as a displacement sensor.
In FIG. 1, for convenience of explanation, the vertical direction on the paper surface is the Z axis, and the two axes orthogonal to the Z axis are the X axis (left and right direction on the paper surface) and the Y axis (vertical direction on the paper surface).
The contact probe 100 can be used, for example, as the contact probe 11 of the shape measuring apparatus 10 shown in FIG. 7. The contact 200 is displaced by contact pressure when it comes into contact with the surface of the object to be measured. A sensor main body 300 that supports the sensor 200 in a displaceable manner and detects the displacement position of the measuring element 200 is provided.

The measuring element 200 includes a stylus 210 and a contact portion 211 provided at the tip of the stylus 210. In the initial state where the probe 200 is not displaced, the axis of the stylus 210 is set so as to be substantially parallel to the Z axis.
Hereinafter, an extension line of the axis of the stylus 210 in the initial state is referred to as a center line A.

The sensor main body 300 includes a cylindrical housing 310 having a lower end opened and a storage space 311 therein, a support plate (support means) 320 that supports the measuring element 200 on the lower end side of the housing 310, and a measuring element. Displacement position detecting means 400 for detecting 200 displacement positions is provided.
The housing part 310 accommodates and arranges the support plate 320 and the displacement position detecting means 400 in the internal storage space 311.

The support plate 320 is a circular metal plate made of an elastic body, and a peripheral end portion is fixed to the housing portion 310. The support plate 320 supports and fixes the measuring element 200 at the center position so that the cylindrical axis of the housing portion 310 and the center line A substantially coincide with each other.
FIG. 2 is a plan view showing an example of the structure of the support plate 320.
As the support plate 320, for example, a thin plate spring or the like that is an elastic body as shown in FIG. Specifically, the support plate 320 has three cut lines 321, and the three cut lines 321 are provided symmetrically with the center C 1 of the support plate 320 as the center of point symmetry. Each incision line 321 has a circular arc part 322 and a straight line part 323, and is bent in a substantially square shape. Three cutting lines 321 are arranged around the center C <b> 1 of the support plate 320, and the straight line part 323 of the other cutting line 321 is positioned inside the arc part 322 of the one cutting line 321. The support plate 320 can be displaced in the Z-axis direction at the cut line 321, and the probe 200 is attached to the hole 324 formed at the center of the support plate 320 so that the probe 200 can be displaced in three dimensions. Supported.
Further, in the present embodiment, the support plate 320 supports the measuring element 200 so that it can be displaced at the center of gravity position of the measuring element 200 including the later-described reflecting mirror 410 constituting the displacement position detecting means 400.

  The displacement position detection means 400 includes a reflection mirror (standard reflection means) 410 that is displaced according to the displacement of the measuring element 200, a reference reflection plate (reference reflection means) 420 that is fixed inside the housing portion 310, the reflection mirror 410, and The illumination optical system 430 that irradiates a light beam toward the reference reflector 420, the imaging optical system 440 that captures an optical image in which the reflected lights from the reflection mirror 410 and the reference reflector 420 are superimposed, and the imaging optical system 440 And an arithmetic processing unit 450 that calculates the displacement position of the contact portion 211 based on the captured image.

  The reflection mirror 410 is formed of a flat plate member having a reference reflection surface 411 that reflects an incident light beam, and is attached to the base end of the stylus 210 so that the reference reflection surface 411 is substantially orthogonal to the axis of the stylus 210. That is, in the reflection mirror 410, the angle of the reference reflection surface 411 changes according to the displacement of the measuring element 200. In the initial state, the reference reflecting surface 411 is substantially parallel to the XY plane.

  The reference reflecting plate 420 is configured by a flat plate member that reflects a part of the incident light beam and transmits the other, and in the optical path of the light beam that is emitted from the illumination optical system 430 and reaches the reflection mirror 410, the reference optical plate 430 and the reflection mirror 410 Arranged between. That is, a part of the light beam emitted from the illumination optical system 430 is reflected by the reference reflection surface 421 of the reference reflection plate 420, and the light beam transmitted through the reference reflection plate 420 reaches the reflection mirror 410. The reference reflection plate 420 is fixed to the housing portion 310 with the reference reflection surface 421 that reflects a part of the incident light beam substantially parallel to the XY plane.

  The illumination optical system 430 includes a light source (light beam emitting means) 431 that emits a light beam, a beam splitter 432 that reflects the light beam from the light source 431 toward the reference reflector 420 and the reflection mirror 410, and a light beam from the beam splitter 432. A collimating lens 433 that irradiates the light substantially parallel to the Z axis.

The light source 431 is fixed inside the housing portion 310 and emits a light beam in a direction perpendicular to the center line A at a position off the center line A. The light source 431 is not particularly limited, and any light source may be used as long as the coherence distance is longer than the optical path length difference between the reflected light from the reference reflecting surface 411 and the reference reflecting surface 421. Conversely, by adopting an optical arrangement that shortens the optical path length difference, various self-luminous elements such as light emitting diodes, organic EL (Electro Luminescence) elements, silicon light emitting elements, laser light, etc. Many light sources such as a laser light source that emits light can be employed.
The beam splitter 432 is disposed on the center line A, reflects the light beam from the light source 431 toward the reference reflection plate 420 and the reflection mirror 410, and transmits each reflected light from the reference reflection plate 420 and the reflection mirror 410. Let
The collimator lens 433 is disposed between the beam splitter 432 and the reference reflector 420 on the center line A.

The imaging optical system 440 is an imaging lens that forms an optical image on the imaging surface 441A of the imaging device 441 by superimposing the reflected light from the imaging device (imaging means) 441 and the reference reflector 420 and the reflection mirror 410. 442.
FIG. 3 is a diagram illustrating an example of the optical image F formed on the imaging surface 441A.
By superimposing the reflected lights respectively reflected by the reference reflecting plate 420 and the reflecting mirror 410 arranged at a predetermined interval, an optical image is obtained according to the optical path difference between the reference reflecting plate 420 and the reflecting mirror 410. In F, an interference fringe IF occurs.
The imaging element 441 is centered on the center line A within a plane (XY plane, imaging plane 441A) orthogonal to the incident direction of the reflected light respectively reflected by the reference reflector 420 and the reflection mirror 410 to the imaging element 441. It is composed of line sensors arranged in a cross shape extending in a direction orthogonal to each other from the coincident position O. The extending directions of the cross shape of the image sensor 441 coincide with the X-axis direction and the Y-axis direction described above. The imaging element 441 captures an optical image on the imaging surface 441A and outputs an electrical signal to the arithmetic processing unit 450.

The arithmetic processing means 450 includes an arithmetic processing circuit that executes predetermined processing in accordance with a predetermined program stored in a memory (not shown).
By the way, when the contact portion 211 comes into contact with the object to be measured and the attitude of the measuring element 200 changes, the relative position of the reference reflecting surface 411 with respect to the reference reflecting surface 421 is displaced according to the displacement of the measuring element 200 (the reference reflecting surface 421 and the reference object). The optical path difference between the reflecting surfaces 411 changes), and the interference fringe IF changes, such as the movement of the interference fringe IF and the change in the number of fringes of the interference fringe IF described above. Then, the arithmetic processing unit 450 recognizes the change in the interference fringe IF based on the electrical signal from the image sensor 441 and calculates the displacement position of the reference reflecting surface 411, that is, the displacement position of the contact portion 211. More specifically, the arithmetic processing unit 450 extracts phase information related to the phase of the interference fringe IF based on the electrical signal from the imaging element 441, and the displacement position of the reference reflecting surface 411 based on the change in the phase information. That is, the displacement position of the contact portion 211 is calculated.
In the present embodiment, the arithmetic processing unit 450 extracts the phase information by a method based on the electronic phase shift moire method.

Next, the operation of the arithmetic processing unit 450 will be described.
FIG. 4 is a flowchart showing the processing operation for calculating the displacement position of the contact portion 211 by the arithmetic processing means 450.
FIG. 5 is a diagram for explaining a change in the posture of the reference reflecting surface 411 and a change in the position of the contact portion 211. Specifically, FIG. 5A is a diagram schematically showing the reference reflector 420, the reflection mirror 410, and the measuring element 200. FIG. 5B is an enlarged view of the tip portion of the probe 200 in FIG. In FIG. 5, a broken line indicates an initial state of the measuring element 200 and the reflecting mirror 410, and a solid line indicates a state where the measuring element 200 and the reflecting mirror 410 are displaced.
First, the arithmetic processing unit 450 recognizes the intensity distribution of the interference fringes IF in the X-axis direction and the Y-axis direction based on the electrical signal from the image sensor 441 (step S1).
Specifically, the intensity distribution I (x) (intensity distribution information) of the interference fringe IF in the X-axis direction is expressed by the following equation (1).

I (x) = A (x) + B (x) cos [2π / λ {( _αθy + _κθy ) x + h (x) + s + t}] (1)

  Similarly, the intensity distribution I (y) (intensity distribution information) of the interference fringe IF in the Y-axis direction is expressed by the following equation (2).

I (y) = A (y) + B (y) cos [2π / λ {(α _θx + κ _θx ) y + h (y) + s + t}] (2)

In equations (1) and (2), A (x) and A (y) are the X-axis direction and Y-axis depending on the illuminance unevenness of the light source 431, the reflectance distribution of the reference reflecting surface 421 and the standard reflecting surface 411, and the like. The bias intensity component in the direction. B (x) and B (y) are amplitude intensity components of interference fringes in the X-axis direction and the Y-axis direction that occur for the same reason as described above. λ is the wavelength of light emitted from the light source 431. α _θx is an angle change around the X axis from the initial state of the reference reflecting surface 411 caused by the displacement of the measuring element 200, and α _θy is an initial change of the reference reflecting surface 411 caused by the displacement of the measuring element 200. It is an angle change around the Y axis from the state. κ _θx is an inclination angle around the X axis relative to the reference reflecting surface 421 of the standard reflecting surface 411 in the initial state, and κ _θy is the reference reflecting surface 421 of the standard reflecting surface 411 in the initial state. The relative tilt angle around the Y axis. h (x) and h (y) are shapes in the X-axis direction and the Y-axis direction relative to the reference reflection surface 421 of the standard reflection surface 411. s is the position of the reference reflecting surface 411 in the Z-axis direction in the initial state, that is, the position of the contact portion 211 in the Z-axis direction in the initial state. t is the amount of displacement of the reference reflecting surface 411 in the Z-axis direction from the initial state, that is, the amount of displacement of the contact portion 211 in the Z-axis direction from the initial state.

Then, in the following processing, the arithmetic processing means 450 calculates and calculates the values of α _θx , α _θy , and t in the expressions (1) and (2) indicating the displacement of the reference reflecting surface 411.
First, the processing operation for calculating the values of α _θy and t will be described based on the equation (1).
Here, in order to simplify Equation (1), Equation (1) is replaced with Equation (3) below, assuming that ω = (α _θy + κ _θy ) / λ and g (x) = h (x) + s + t. .

  I (x) = A (x) + B (x) cos [2π {ωx + g (x)}] (3)

After step S1, the arithmetic processing unit 450 uses the reference signal (reference information) I _{ref i} shown in the following equation (4) for the intensity distribution information in the X-axis direction of the interference fringe IF shown in the equation (3). (x) is multiplied to generate the intensity distribution (intensity distribution information) I (x) I _{ref i} (x) in the X-axis direction of the moire fringes shown in the following equation (5) (step S2).

I _{ref i} (x) = Ccos [2πω _ref x + φ _i ] (4)

I (x) I _{ref i} (x) = A (x) C cos [2πω _ref x + φ _i ]
+ B (x) cos [2π {ωx + g (x)}] cos [2πω _ref x + φ _i ]
= A (x) Ccos [2πω _ref x + φ _i ]
+ (B (x) C / 2) .cos [2π {(ω + ω _ref ) x + g (x)} + φ _i ]
+ (B (x) C / 2) .cos [2π {(ω−ω _ref ) x + g (x)} − φ _i ] (5)

After step S <b> 2, the arithmetic processing unit 450 determines the high frequency components (first and second terms of the formula (5)) that are equal to or higher than a predetermined frequency for the intensity distribution information in the X-axis direction of the moire fringes of the formula (5). ) Is removed to generate an intensity distribution (intensity distribution information) I _i ^′ (x) in the X-axis direction of moire fringes shown in the following equation (6) (step S3).

I _i ^′ (x) = u (x) cos [2π {(ω−ω _ref ) x + g (x)} − φ _i ] (6)

In Equation (6), u (x) = B (x) C / 2.
After step S3, the arithmetic processing unit 450 extracts phase information Φ (x) regarding the phase of the interference fringe IF in the X-axis direction based on the equation (6) (step S4).
Specifically, the arithmetic processing unit 450 sets the phase φ _i of the reference information as 0, π / 2, π, 3π / 2 in the equation (6), and the X-axis direction of four moire fringes whose phases are shifted by 90 degrees. Intensity distribution information I ₁ ^′ , I ₂ ^′ , I ₃ ^′ , I ₄ ^′ is generated.

Then, the arithmetic processing means 450 performs an unwrap process shown in the following formula (7) based on the generated intensity distribution information I ₁ ^′ , I ₂ ^′ , I ₃ ^′ , I ₄ ^′, and the X axis of the interference fringe IF Extract phase information Φ (x) regarding the phase of the direction.

Φ (x) = tan ⁻¹ [(I ₂ ^′ −I ₄ ^′ ) / (I ₁ ^′ −I ₃ ^′ )]
= 2π {(ω−ω _ref ) x + g (x)} (7)

After step S4, the arithmetic processing unit 450 changes the amount of change in the phase information Φ (x) with respect to the initial phase information (set phase information) Φ _ori (x) regarding the phase in the X-axis direction of the interference fringe IF in the initial state. Quantity information ΔΦ (x) is generated (step S5).
Here, the phase information Φ (x) is expressed by the following equation (8) when ω and g (x) replaced as described above are restored.

Φ (x) = 2π {((α _θy + κ _θy ) / λ−ω _ref ) x + h (x) + s + t} (8)

Further, initial phase information (set phase information) Φ _ori (x) regarding the phase in the X-axis direction of the interference fringe IF in the initial state is expressed by α _θy , t indicating the displacement of the reference reflecting surface 411 in Expression (8). And is expressed by the following formula (9).

Φ _ori (x) = 2π {(κ _θy / λ−ω _ref ) x + h (x) + s} (9)

  And the arithmetic processing means 450 produces | generates variation | change_quantity information (DELTA) (PHI) (x) as shown to the following formula | equation (10) based on Formula (8) and (9).

ΔΦ (x) = Φ (x) −Φ _ori (x)
= 2π {(α _θy / λ) x + t} (10)

After step S5, the arithmetic processing unit 450 calculates the displacement position of the contact portion 211 based on the generated change amount information ΔΦ (x) (step S6).
Specifically, the arithmetic processing unit 450 performs an approximation process such as a least square method on the numerical data of the change amount information ΔΦ (x) corresponding to the position in the X-axis direction generated in step S5, thereby performing the following process. The linear function shown in Equation (11) is calculated.

  ΔΦ (x) = ax + b (11)

Then, the arithmetic processing unit 450 compares the expressions (10) and (11), and as shown in the following expressions (12) and (13), the calculation processing unit 450 rotates around the Y axis from the initial state of the reference reflecting surface 411. An angle change amount α _θy and a displacement amount t in the Z-axis direction from the initial state of the reference reflecting surface 411 are calculated.

α _θy = (λ / (2π)) a (12)

  t = b / (2π) (13)

Similarly, the arithmetic processing unit 450 also applies to the intensity distribution I (y) of the interference fringe IF in the Y-axis direction shown in the equation (2) as in the above equations (3) to (11). The angle change amount α _θy around the X axis from the initial state of the reference reflecting surface 411 is calculated by the procedure described above.

Here, when the length dimension of the measuring element 200 in the direction of the center line A is L, α _θx , α _θy , t are used, and the contact portion 211 is expressed by the following equations (14) to (16). X-axis direction from the initial state, Y-axis, and the Z-axis direction of each displacement m _x, m _y, can represent m _z. In the following formulas (14) and (15), α _θx and α _θy are _{assumed to} be sufficiently small values.

m _x = Lsin (α _θy ) = Lα _θy (14)

_{m y = Lsin (α θx)} = Lα θx ······ (15)

m _z = t (16)

Then, the arithmetic processing unit 450, the calculated alpha _{[theta] x,} alpha _{[theta] y,} t a By substituting the equation (14) to (16), displacement of m _x of the contact portion 211 from the initial state, m _y, m _z That is, the displacement position of the contact portion 211 is calculated.

The embodiment described above has the following effects.
(1) Since the support plate 320 is made of an elastic body and supports the measuring element 200 in a three-dimensionally displaceable manner, it is compared with a conventional structure in which the measuring element is supported in a three-dimensionally displaceable manner by three moving mechanisms. Thus, the support plate 320 which is a movable part can be configured as a single unit, the structure of the support plate 320 can be simplified, and the weight can be reduced. For this reason, even when the probe 200 is moved at high speed along the object to be measured, the probe 200 can be displaced at high speed along the shape of the object to be measured, and the shape of the object to be measured can be changed. It can be measured quickly.

(2) The reflection mirror 410 is attached to the stylus 210, and the displacement position of the reference reflection surface 411 (the displacement position of the contact portion 211 is determined by the reflection mirror 410, the reference reflection plate 420, the light source 431, the image sensor 441, and the arithmetic processing unit 450. ) Is directly detected optically, the displacement position of the contact portion 211 can be detected with higher accuracy than in the conventional configuration in which the measurement mechanism detects the displacement position of the moving mechanism. Further, the structure can be simplified and the sensor main body 300 can be reduced in weight as compared with the conventional configuration in which the LVDT mechanism is adopted for each measurement mechanism.

(3) Since the arithmetic processing unit 450 calculates the displacement position of the contact portion 211 based on the amount of change (change amount information) of the phase of the interference fringe IF, the displacement of the contact portion 211 can be quickly and accurately performed with simple arithmetic processing. The position can be calculated.

(4) Since the reference reflector 420 is disposed on the optical path of the light beam from the light source 431 to the reflection mirror 410 (on the center line A), for example, the reference reflector 420 is emitted from the light source 431 and applied to the reflection mirror 410. Compared with a configuration in which the light beam is emitted from the light source 431, only one light path of the light beam emitted from the light source 431 may be formed, and the sensor main body 300 can be reduced in size as compared with a configuration in which the light beam is emitted from the light source 431.

(5) When the image sensor 441 is configured by a line sensor arranged in a cross shape, intensity distribution information I (2) only in two orthogonal directions among the intensity distribution information of the interference fringe IF in the optical image F. Information including x) and I (y) can be output from the image sensor 441 to the arithmetic processing means 450. For this reason, only the minimum intensity distribution information I (x), I (y) can be used in the arithmetic processing means 450, the amount of information can be reduced, the processing time of information can be shortened, and the contact portion 211 can be quickly processed. The displacement position can be calculated.

(6) Since the support plate 320 supports the measuring element 200 so as to be displaceable at the center of gravity of the measuring element 200 including the reflecting mirror 410, the posture of the measuring element 200 is not changed by its own weight. For this reason, for example, even when the contact probe 100 is used in various postures, the displacement of the contact portion 211 is not affected by the posture change due to the weight of the measuring element 200 and the displacement due to the contact with the object to be measured. Thus, the displacement position of the contact portion 211 can be detected with high accuracy.

It should be noted that the present invention is not limited to the above-described embodiments, and modifications, improvements, and the like within the scope that can achieve the object of the present invention are included in the present invention.
In the embodiment, the arithmetic processing unit 450 calculates the displacement position of the contact portion 211 by a method based on the electronic phase shift moire method (steps S2 to S6). However, the intensity distribution information I regarding the intensity distribution of the interference fringe IF is used. Any other method may be employed as long as the displacement position of the contact portion 211 is calculated based on (x) and I (y).
For example, the arithmetic processing unit 450 extracts the phase information by a method based on the electronic phase shift moire method, but is not limited thereto, and is configured to extract the phase information by another method such as a phase shift method or a Fourier transform method. It may be adopted.
Further, for example, in the intensity distribution information I (x), I (y), the amplitude intensity components B (x), B of the interference fringes in the X-axis direction and the Y-axis direction in the initial state and when the measuring element 200 is displaced. A method of detecting a change in (y) and calculating a displacement position of the contact portion 211 based on the change may be employed.

In the embodiment, the arrangement positions of the reference reflector 420, the illumination optical system 430, and the imaging optical system 440 inside the housing portion 310 are not limited to the arrangement positions described in the embodiment, and other arrangement positions are adopted. Also good.
For example, a configuration in which the arrangement position of the light source 431 and the arrangement position of the imaging optical system 440 are opposite to the arrangement position described in the above embodiment may be employed.
Further, for example, a configuration may be adopted in which the arrangement position of the reference reflector 420 is set to the arrangement position facing the arrangement position of the light source 431 across the beam splitter 432 with respect to the arrangement position described in the above embodiment. .

FIG. 6 is a diagram showing a modification of the embodiment.
In the above-described embodiment, the image pickup device 441 is configured by a line sensor arranged in a cross shape on the image pickup surface 441A. However, the image pickup device 441 is not limited to this. ) A sensor or the like may be employed, and as shown in FIG. 6, a configuration may be employed in which a substantially rectangular region RA on the imaging surface 441A or the entire region F of interference fringes is imaged.

  In the above-described embodiment, the reflection mirror 410 as the reference reflection means is attached to the base end of the stylus 210 so that the reference reflection surface 411 is substantially orthogonal to the axis of the stylus 210. As long as it is integrally provided on the measuring element 200 so as to be displaceable according to the displacement, it may be attached at any position.

Although the best configuration for carrying out the present invention has been disclosed in the above description, the present invention is not limited to this. That is, the invention has been illustrated and described primarily with respect to particular embodiments, but it is not intended to depart from the technical concept and scope of the invention. Various modifications can be made by those skilled in the art in terms of materials, quantity, and other detailed configurations.
Therefore, the description limited to the shape, material, etc. disclosed above is an example for easy understanding of the present invention, and does not limit the present invention. The description by the name of the member which remove | excluded the limitation of one part or all of such restrictions is included in this invention.

  In the present invention, the structure of the movable part can be simplified and reduced in weight, and the displacement position of the contact part can be detected with high accuracy, so that the surface to be measured is continuously connected with a displacement sensor, for example, a probe such as a coordinate measuring machine. It can be used as a scanning probe for measuring automatically.

Sectional drawing which shows the whole structure of the contact probe as a displacement sensor which concerns on embodiment of this invention. The top view which shows an example of the structure of the support plate in the said embodiment. The figure which shows an example of the optical image imaged on the imaging surface in the said embodiment. The flowchart which shows the processing operation which calculates the displacement position of the contact part by the arithmetic processing means in the said embodiment. The figure for demonstrating the change of the attitude | position of the reference | standard reflective surface in the said embodiment, and the change of the position of a contact part. The figure which shows the modification of the said embodiment. The figure which shows the structure of the shape measuring apparatus using the conventional contact probe. The figure which shows the structure of the shape measuring apparatus using the conventional contact probe.

Explanation of symbols

100 ... Contact probe (displacement sensor)
DESCRIPTION OF SYMBOLS 200 ... Measuring element 211 ... Contact part 300 ... Sensor main-body part 320 ... Support plate (support means)
410: Reflection mirror (reference reflection means)
411: Standard reflecting surface 420: Reference reflecting plate (reference reflecting means)
421: Reference reflecting surface 431: Light source (light beam emitting means)
441 ... Imaging element (imaging means)
441A ... Imaging surface 450 ... Arithmetic processing means F ... Optical image IF ... Interference fringe.

Claims (5)

A measuring element having a contact portion that comes into contact with an object to be measured; and a sensor main body that supports the measuring element in a displaceable manner and detects a displacement position of the contact portion.
The sensor body is
Support means for supporting the measuring element in a displaceable manner;
Reference reflecting means attached to the measuring element and having a reference reflecting surface capable of reflecting at least a part of the incident light beam;
A reference reflecting means having a reference reflecting surface fixed at a predetermined position and capable of reflecting at least a part of an incident light beam;
A light beam emitting means for emitting a light beam toward the reference reflecting surface and the reference reflecting surface;
An imaging unit that captures an optical image that is reflected by the reference reflection surface and the reference reflection surface and superimposed on the imaging surface;
Recognizing intensity distribution information regarding intensity distribution of interference fringes generated by superimposing each reflected light from the standard reflecting surface and the reference reflecting surface based on an optical image picked up by the image pickup means, A displacement sensor comprising: an arithmetic processing unit that calculates displacement positions of the contact portion in the X-axis direction, the Y-axis direction, and the Z-axis direction based on the information. The displacement sensor according to claim 1,
The arithmetic processing means extracts phase information relating to the phase of the interference fringes based on the intensity distribution information, and compares the preset phase information relating to the phase of the interference fringes with the phase information to change the phase. A displacement sensor that generates change amount information related to an amount , and calculates a displacement position of the contact portion in the X-axis direction, the Y-axis direction, and the Z-axis direction based on the change amount information. The displacement sensor according to claim 1 or 2,
The reference reflecting means is composed of a member that reflects a part of the incident light beam and transmits another light beam, and is on the optical path of the light beam emitted from the light beam emitting means and reaching the reference reflecting means. Displacement sensor characterized by being arranged on the front side. The displacement sensor according to any one of claims 1 to 3,
The imaging unit is arranged in a cross shape extending in a direction orthogonal to each other from a predetermined position in a plane orthogonal to the incident direction of the light flux respectively reflected on the reference reflecting surface and the reference reflecting surface to the imaging unit. A displacement sensor comprising a line sensor provided. The displacement sensor according to any one of claims 1 to 4,
The displacement sensor is characterized in that the support means supports the measurement element to be displaceable at the center of gravity of the reference reflecting means and the measurement element.

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