JPH02148841U - - Google Patents

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Publication number
JPH02148841U
JPH02148841U JP5790589U JP5790589U JPH02148841U JP H02148841 U JPH02148841 U JP H02148841U JP 5790589 U JP5790589 U JP 5790589U JP 5790589 U JP5790589 U JP 5790589U JP H02148841 U JPH02148841 U JP H02148841U
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JP
Japan
Prior art keywords
chair
pad
guide
sheet
hole
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5790589U
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English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP5790589U priority Critical patent/JPH02148841U/ja
Publication of JPH02148841U publication Critical patent/JPH02148841U/ja
Pending legal-status Critical Current

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JP5790589U 1989-05-19 1989-05-19 Pending JPH02148841U (enrdf_load_stackoverflow)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5790589U JPH02148841U (enrdf_load_stackoverflow) 1989-05-19 1989-05-19

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5790589U JPH02148841U (enrdf_load_stackoverflow) 1989-05-19 1989-05-19

Publications (1)

Publication Number Publication Date
JPH02148841U true JPH02148841U (enrdf_load_stackoverflow) 1990-12-18

Family

ID=31583038

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5790589U Pending JPH02148841U (enrdf_load_stackoverflow) 1989-05-19 1989-05-19

Country Status (1)

Country Link
JP (1) JPH02148841U (enrdf_load_stackoverflow)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05254366A (ja) * 1992-03-12 1993-10-05 Tokai Rika Co Ltd 子供用シート
US6871656B2 (en) 1997-05-27 2005-03-29 Tokyo Electron Limited Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process
US7001468B1 (en) 2002-02-15 2006-02-21 Tokyo Electron Limited Pressure energized pressure vessel opening and closing device and method of providing therefor
US7021635B2 (en) 2003-02-06 2006-04-04 Tokyo Electron Limited Vacuum chuck utilizing sintered material and method of providing thereof
US7077917B2 (en) 2003-02-10 2006-07-18 Tokyo Electric Limited High-pressure processing chamber for a semiconductor wafer
US7225820B2 (en) 2003-02-10 2007-06-05 Tokyo Electron Limited High-pressure processing chamber for a semiconductor wafer
US7270137B2 (en) 2003-04-28 2007-09-18 Tokyo Electron Limited Apparatus and method of securing a workpiece during high-pressure processing
US7380984B2 (en) 2005-03-28 2008-06-03 Tokyo Electron Limited Process flow thermocouple

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6350742B2 (enrdf_load_stackoverflow) * 1980-06-12 1988-10-11 Mitsubishi Electric Corp

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6350742B2 (enrdf_load_stackoverflow) * 1980-06-12 1988-10-11 Mitsubishi Electric Corp

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05254366A (ja) * 1992-03-12 1993-10-05 Tokai Rika Co Ltd 子供用シート
US6871656B2 (en) 1997-05-27 2005-03-29 Tokyo Electron Limited Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process
US7001468B1 (en) 2002-02-15 2006-02-21 Tokyo Electron Limited Pressure energized pressure vessel opening and closing device and method of providing therefor
US7021635B2 (en) 2003-02-06 2006-04-04 Tokyo Electron Limited Vacuum chuck utilizing sintered material and method of providing thereof
US7077917B2 (en) 2003-02-10 2006-07-18 Tokyo Electric Limited High-pressure processing chamber for a semiconductor wafer
US7225820B2 (en) 2003-02-10 2007-06-05 Tokyo Electron Limited High-pressure processing chamber for a semiconductor wafer
US7270137B2 (en) 2003-04-28 2007-09-18 Tokyo Electron Limited Apparatus and method of securing a workpiece during high-pressure processing
US7380984B2 (en) 2005-03-28 2008-06-03 Tokyo Electron Limited Process flow thermocouple

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