JPH02148406U - - Google Patents
Info
- Publication number
- JPH02148406U JPH02148406U JP5936789U JP5936789U JPH02148406U JP H02148406 U JPH02148406 U JP H02148406U JP 5936789 U JP5936789 U JP 5936789U JP 5936789 U JP5936789 U JP 5936789U JP H02148406 U JPH02148406 U JP H02148406U
- Authority
- JP
- Japan
- Prior art keywords
- photodetector
- intensity
- light
- laser interference
- laser
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims description 2
- 239000010409 thin film Substances 0.000 claims description 2
- 230000003287 optical effect Effects 0.000 claims 2
- 230000008021 deposition Effects 0.000 claims 1
- 239000010408 film Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
Landscapes
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Drying Of Semiconductors (AREA)
- Length Measuring Devices By Optical Means (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5936789U JPH0714804Y2 (ja) | 1989-05-22 | 1989-05-22 | レーザ干渉式デポレートモニタ |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5936789U JPH0714804Y2 (ja) | 1989-05-22 | 1989-05-22 | レーザ干渉式デポレートモニタ |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02148406U true JPH02148406U (ko) | 1990-12-17 |
| JPH0714804Y2 JPH0714804Y2 (ja) | 1995-04-10 |
Family
ID=31585800
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5936789U Expired - Lifetime JPH0714804Y2 (ja) | 1989-05-22 | 1989-05-22 | レーザ干渉式デポレートモニタ |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0714804Y2 (ko) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002277218A (ja) * | 2001-03-22 | 2002-09-25 | Sharp Corp | 膜厚測定装置およびその方法 |
| WO2012141090A1 (ja) * | 2011-04-11 | 2012-10-18 | 東京エレクトロン株式会社 | 基板処理装置に用いられるプロセスモニター装置、プロセスモニター方法、および基板処理装置 |
-
1989
- 1989-05-22 JP JP5936789U patent/JPH0714804Y2/ja not_active Expired - Lifetime
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002277218A (ja) * | 2001-03-22 | 2002-09-25 | Sharp Corp | 膜厚測定装置およびその方法 |
| WO2012141090A1 (ja) * | 2011-04-11 | 2012-10-18 | 東京エレクトロン株式会社 | 基板処理装置に用いられるプロセスモニター装置、プロセスモニター方法、および基板処理装置 |
| JP2012220359A (ja) * | 2011-04-11 | 2012-11-12 | Tokyo Electron Ltd | 基板処理装置に用いられるプロセスモニター装置、プロセスモニター方法、および基板処理装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0714804Y2 (ja) | 1995-04-10 |