JPH02146185A - Semiconductor memory - Google Patents
Semiconductor memoryInfo
- Publication number
- JPH02146185A JPH02146185A JP63299971A JP29997188A JPH02146185A JP H02146185 A JPH02146185 A JP H02146185A JP 63299971 A JP63299971 A JP 63299971A JP 29997188 A JP29997188 A JP 29997188A JP H02146185 A JPH02146185 A JP H02146185A
- Authority
- JP
- Japan
- Prior art keywords
- digit line
- digit
- defective
- memory cell
- redundant
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title claims description 9
- 230000002950 deficient Effects 0.000 claims abstract description 22
- 230000003068 static effect Effects 0.000 abstract description 3
- 239000000126 substance Substances 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は半導体メモリ装置に間し、特にディジ[従来の
技術]
従来、半導体メモリ装置は特に開発初期の歩留りの低さ
の対策として、冗長回路が設けられている。冗長回路の
1つに不良のディジット線を冗長ディジット線にヒユー
ズを切断することにより置換する方法がある。この時、
不良のディジット線は他の正常なディジット線と同様に
半導体メモリ装置の非動作時には電源電位が与えられ動
作時にも動作に合わせて、所定の電位が与えられていた
。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to semiconductor memory devices, particularly digital devices [Prior Art] Conventionally, semiconductor memory devices have been manufactured with redundancy as a measure against low yields, especially in the early stages of development. A circuit is provided. One method of redundancy circuitry is to replace a defective digit line with a redundant digit line by cutting a fuse. At this time,
Like other normal digit lines, the defective digit line is supplied with a power supply potential when the semiconductor memory device is not in operation, and is supplied with a predetermined potential in accordance with the operation when the semiconductor memory device is in operation.
[発明が解決しようとする問題点コ
上述した従来のディジット線救済用の冗長回路は、不良
のディジット線を検知してヒユーズをレーザービームて
切断する等の方法で冗長ディジット線と置換後もこの不
良ディジット線は他の正常ディジット線と同様に半導体
メモリ装置が非動作時には常に電源電位が与えられ、ま
た動作時にもデータの読出および書込動作に合わせて所
定の電位が与えられている。このために不良ディジット
線がGND電位とショート、例えばメモリセルにGND
レベルを供給するアルミ配線とのショートが起きていた
場合には、ディジット線から電流が流れ込んでしまうの
で冗長ディジットとの置換に成功しても電流規格を満た
せずにメモリ装置が不良となる欠点がある。[Problems to be Solved by the Invention] The conventional redundant circuit for repairing digit lines described above does not prevent defective digit lines even after they are replaced with redundant digit lines by detecting a defective digit line and cutting the fuse with a laser beam. Like other normal digit lines, the defective digit line is always supplied with a power supply potential when the semiconductor memory device is not in operation, and is also supplied with a predetermined potential in accordance with data read and write operations during operation. For this reason, the defective digit line is shorted to the GND potential, for example, the memory cell is connected to the GND potential.
If there is a short circuit with the aluminum wiring that supplies the level, current will flow from the digit line, so even if the replacement with redundant digits is successful, the current standard cannot be met and the memory device will be defective. be.
[発明の従来技術に対する相違点]
上述した従来のディジット線救済用の冗長回路に対し、
本発明は不良のディジット線を冗長ディジット線と置換
した後、不良ディジット線に半導体メモリ装置が動作時
、非動作時にかかわらず、電源電位を与えないという相
違点を有する。[Differences between the invention and the prior art] In contrast to the conventional redundant circuit for digit line relief described above,
The present invention has a difference in that after a defective digit line is replaced with a redundant digit line, a power supply potential is not applied to the defective digit line regardless of whether the semiconductor memory device is operating or not.
[問題点を解決するための手段]
本発明は要旨は複数のメモリセル列と、該メモリセル列
にそれぞれ接続される複数のディジット線と、冗長メモ
リセル列と、該冗長メモリセル列に接続された冗長ディ
ジット線と、上記複数のディジット線および冗長ディジ
ット線に接続された電源とを有する半導体メモリ装置に
おいて、上記電源と上記ディジット線および冗長ディジ
ット線との間に遮断体をそれぞれ設け、不良メモリセル
列に接続されたディジット線と電源との間を遮断可能に
したことである。[Means for Solving the Problems] The gist of the present invention is to provide a plurality of memory cell columns, a plurality of digit lines respectively connected to the memory cell columns, a redundant memory cell column, and a plurality of digit lines connected to the redundant memory cell columns. In a semiconductor memory device having a redundant digit line and a power supply connected to the plurality of digit lines and the redundant digit line, a circuit breaker is provided between the power supply and the digit line and the redundant digit line, respectively. It is possible to disconnect between the digit line connected to the memory cell column and the power supply.
[実施例コ 次に本発明の実施例について図面を参照して説明する。[Example code] Next, embodiments of the present invention will be described with reference to the drawings.
第1図は本発明の第1実施例の回路図である。FIG. 1 is a circuit diagram of a first embodiment of the present invention.
Tri、Tr2はトランスファゲートトランジスタTr
3.Tr4とドライバートランジスタTr5、Tr6と
高抵抗負荷R1,R2とて構成されるスタティック型メ
モリセルに接続されたディジット線り、 Hに電源電位
VCCを与えるトランジスタであり、Wはワード線、P
はトランジスタTrl、Tr2を制御するゲート入力信
号である。Tri and Tr2 are transfer gate transistors Tr
3. Tr4, driver transistors Tr5, Tr6, and high-resistance loads R1, R2 are connected to the static memory cell.
is a gate input signal that controls transistors Trl and Tr2.
ヒユーズは電源電位vCCとトランジスタTri。The fuse is the power supply potential vCC and the transistor Tri.
Tr2のソースとの間に配設されている。ウェハー状態
でのブロービングによる試験で不良となるディジットが
検知され、それを冗長ディジットと置換すれば良品とな
ると判断されたとき、レーザービームによるヒユーズの
切断により、ディジットを置換すると共に不良のディジ
ット線のトランジスタTri、Tr2とvCC電源線と
を結ぶヒユーズを同じくレーザービームで切断する。そ
して他のディジット同様にディジット線にVCC電源電
位を供給するための制御信号PがトランジスタTrl、
Tr2のゲートに印加されても電源電位がヒユーズが切
断されているために供給されなくなり、不良ディジット
による電流不良を防止する。It is arranged between the source of Tr2. When a defective digit is detected in the wafer test by blowing and it is determined that replacing it with a redundant digit will result in a non-defective product, the fuse is cut by a laser beam to replace the digit and remove the defective digit line. The fuses connecting the transistors Tri and Tr2 and the vCC power line are also cut with a laser beam. Similarly to other digits, the control signal P for supplying the VCC power supply potential to the digit line is supplied to the transistor Trl.
Even if the power supply potential is applied to the gate of Tr2, the power supply potential is not supplied because the fuse is cut, thereby preventing a current failure due to a defective digit.
第2図は本発明の第2実施例の回路図である。FIG. 2 is a circuit diagram of a second embodiment of the present invention.
この実施例では不良ディジット線にvCC電源電位を与
えなくするためにNチャンネル型トランジスタTri、
Tr2のゲート入力信号をヒユーズをレーザービームで
切断することにより制御している。不良ではないディジ
ットに関してはヒユーズを通して■CC電源と節点1が
つながっているのて、節点1は高レベルとなり、インバ
ータにより節点2は低レベルとなる。これによりノアゲ
ー) (NOR)を通してのトランジスタTri、Tr
2へのゲート人力信号は制御信号Fにより制御され、■
に低レベルが入力されたときだけ、トランジスタTri
、Tr2のゲートには高レベルが印加され、トランジス
タTri、Tr2はオンしてディジット線に高レベルが
供給される。In this embodiment, an N-channel transistor Tri,
The gate input signal of Tr2 is controlled by cutting the fuse with a laser beam. For digits that are not defective, node 1 is connected to the CC power supply through the fuse, so node 1 becomes high level, and node 2 becomes low level due to the inverter. This allows transistors Tri and Tr to pass through (NOR)
The gate manual signal to 2 is controlled by control signal F, and ■
Only when a low level is input to the transistor Tri
, Tr2 are applied with a high level, transistors Tri and Tr2 are turned on, and a high level is supplied to the digit line.
不良ディジット線の場合は冗長ディジットと置換した後
、不良ディジット線のヒユーズをレーザービームて切断
することにより、節点1のレベルは低下し、それにつれ
て節点20レベルが上昇してNチャンネル型トランジス
タTr7がオンすることにより節点1は低レベルに節点
2は高レベルとなる。節点2が高レベルとなることによ
り、Fにいかなる信号が入力されてもノアゲートの出力
、つまりトランジスタTri、Tr2のゲート入力信号
は常に低レベルとなり、Tri、Tr2は常にオフし、
これによりディジット線には高レベルが供給されなくな
る。In the case of a defective digit line, after replacing it with a redundant digit, the fuse of the defective digit line is cut with a laser beam, so that the level of node 1 decreases, and the level of node 20 increases accordingly, causing the N-channel transistor Tr7 to By turning on, node 1 becomes low level and node 2 becomes high level. Since node 2 is at a high level, no matter what signal is input to F, the output of the NOR gate, that is, the gate input signal of transistors Tri and Tr2, is always at a low level, and Tri and Tr2 are always turned off.
This prevents the digit line from being supplied with a high level.
[発明の効果コ
以上説明したように本発明は不良ディジット線への電源
電位の供給を所定の回路を電気的に切断することで禁止
し、不良ディジット線で規格以上の電流が流れて不良と
なることを防止する効果がある。[Effects of the Invention] As explained above, the present invention prohibits the supply of power supply potential to a defective digit line by electrically disconnecting a predetermined circuit. It has the effect of preventing this from happening.
第1図は本発明の第1実施例の回路図、第2図は第2実
施例の回路図、第3図は従来の方式の回路図である。
セルのドライバートラ
ンジスタ、
R1,R2・・・・・φ・スタティック型メモリセルの
高抵抗負荷、
Trl、Tr2.Trl・・・トランジスタ、P、P″
・・・・・・・・・・ディジット線レベル制御用信号。FIG. 1 is a circuit diagram of a first embodiment of the present invention, FIG. 2 is a circuit diagram of a second embodiment, and FIG. 3 is a circuit diagram of a conventional system. Driver transistor of cell, R1, R2...φ High resistance load of static type memory cell, Trl, Tr2. Trl...transistor, P, P''
・・・・・・・・・Digital line level control signal.
Claims (1)
される複数のディジット線と、冗長メモリセル列と、該
冗長メモリセル列に接続された冗長ディジット線と、上
記複数のディジット線および冗長ディジット線に接続さ
れた電源とを有する半導体メモリ装置において、 上記電源と上記ディジット線および冗長ディジット線と
の間に遮断体をそれぞれ設け、不良メモリセル列に接続
されたディジット線と電源との間を遮断可能にしたこと
、を特徴とする半導体メモリ装置。[Scope of Claims] A plurality of memory cell columns, a plurality of digit lines respectively connected to the memory cell columns, a redundant memory cell column, a redundant digit line connected to the redundant memory cell columns, and the plurality of digit line and a power supply connected to the redundant digit line, a circuit breaker is provided between the power supply and the digit line and the redundant digit line, respectively, and the digit line connected to the defective memory cell column is What is claimed is: 1. A semiconductor memory device characterized in that it is possible to cut off a connection between a power source and a power source.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63299971A JPH02146185A (en) | 1988-11-28 | 1988-11-28 | Semiconductor memory |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63299971A JPH02146185A (en) | 1988-11-28 | 1988-11-28 | Semiconductor memory |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH02146185A true JPH02146185A (en) | 1990-06-05 |
Family
ID=17879186
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63299971A Pending JPH02146185A (en) | 1988-11-28 | 1988-11-28 | Semiconductor memory |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH02146185A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04342000A (en) * | 1991-05-17 | 1992-11-27 | Nec Corp | Semiconductor memory device |
JPH05307899A (en) * | 1992-04-24 | 1993-11-19 | Samsung Electron Co Ltd | Semiconductor memory storage |
JP2001273776A (en) * | 1991-12-19 | 2001-10-05 | Toshiba Corp | Cache memory system, semiconductor memory, non-volatile semiconductor memory, semiconductor memory system, and memory verify-circuit |
JP2004095168A (en) * | 1991-12-19 | 2004-03-25 | Toshiba Corp | Nonvolatile semiconductor storage device, cache memory system, semiconductor storage device and semiconductor storage system |
US7139201B2 (en) | 1991-12-19 | 2006-11-21 | Kabushiki Kaisha Toshiba | Non-volatile semiconductor memory device and memory system using the same |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58208998A (en) * | 1982-05-28 | 1983-12-05 | Toshiba Corp | Semiconductor memory device |
JPS59188898A (en) * | 1983-04-11 | 1984-10-26 | Hitachi Ltd | Static ram |
JPS59201298A (en) * | 1983-04-27 | 1984-11-14 | Mitsubishi Electric Corp | Semiconductor storage device |
-
1988
- 1988-11-28 JP JP63299971A patent/JPH02146185A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58208998A (en) * | 1982-05-28 | 1983-12-05 | Toshiba Corp | Semiconductor memory device |
JPS59188898A (en) * | 1983-04-11 | 1984-10-26 | Hitachi Ltd | Static ram |
JPS59201298A (en) * | 1983-04-27 | 1984-11-14 | Mitsubishi Electric Corp | Semiconductor storage device |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04342000A (en) * | 1991-05-17 | 1992-11-27 | Nec Corp | Semiconductor memory device |
JP2001273776A (en) * | 1991-12-19 | 2001-10-05 | Toshiba Corp | Cache memory system, semiconductor memory, non-volatile semiconductor memory, semiconductor memory system, and memory verify-circuit |
JP2004095168A (en) * | 1991-12-19 | 2004-03-25 | Toshiba Corp | Nonvolatile semiconductor storage device, cache memory system, semiconductor storage device and semiconductor storage system |
US7139201B2 (en) | 1991-12-19 | 2006-11-21 | Kabushiki Kaisha Toshiba | Non-volatile semiconductor memory device and memory system using the same |
JPH05307899A (en) * | 1992-04-24 | 1993-11-19 | Samsung Electron Co Ltd | Semiconductor memory storage |
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