JPH0214360U - - Google Patents

Info

Publication number
JPH0214360U
JPH0214360U JP9240788U JP9240788U JPH0214360U JP H0214360 U JPH0214360 U JP H0214360U JP 9240788 U JP9240788 U JP 9240788U JP 9240788 U JP9240788 U JP 9240788U JP H0214360 U JPH0214360 U JP H0214360U
Authority
JP
Japan
Prior art keywords
fine powder
target
inert gas
exhaust port
gas inlet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9240788U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP9240788U priority Critical patent/JPH0214360U/ja
Publication of JPH0214360U publication Critical patent/JPH0214360U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
  • Powder Metallurgy (AREA)
  • Physical Vapour Deposition (AREA)

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案の全体を示す正面図、第2図は
回転羽根の一実施例を示す斜視図である。 1……真空チヤンバー、2……パツキンプレー
ト、3……ターゲツト、4……冷却水入口、5…
…冷却水出口、6……粉末試料容器、7……回転
羽根、8……モーター、9……粉末、10……ヒ
ーター、11……真空排気口、12……不活性ガ
ス導入口。
FIG. 1 is a front view showing the entirety of the present invention, and FIG. 2 is a perspective view showing one embodiment of the rotating blade. 1... Vacuum chamber, 2... Packing plate, 3... Target, 4... Cooling water inlet, 5...
... Cooling water outlet, 6 ... Powder sample container, 7 ... Rotating vane, 8 ... Motor, 9 ... Powder, 10 ... Heater, 11 ... Vacuum exhaust port, 12 ... Inert gas inlet.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 真空排気口11および不活性ガス導入口12を
備えた真空チヤンバー1内部に、上側にターゲツ
ト3を配置し、下側に脱着可能なモーター8によ
り駆動される回転羽根7と微細粉末を入れる試料
容器6を備え、微細粉末を回転し、流動させなが
らスパツタリング被覆させることを特徴とするス
パツタリング被覆装置。
Inside a vacuum chamber 1 equipped with a vacuum exhaust port 11 and an inert gas inlet 12, a target 3 is arranged on the upper side, and a rotating blade 7 driven by a detachable motor 8 and a sample container containing fine powder are placed on the lower side. 6, a sputtering coating device is characterized in that the fine powder is sputtered and coated while being rotated and fluidized.
JP9240788U 1988-07-14 1988-07-14 Pending JPH0214360U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9240788U JPH0214360U (en) 1988-07-14 1988-07-14

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9240788U JPH0214360U (en) 1988-07-14 1988-07-14

Publications (1)

Publication Number Publication Date
JPH0214360U true JPH0214360U (en) 1990-01-29

Family

ID=31316843

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9240788U Pending JPH0214360U (en) 1988-07-14 1988-07-14

Country Status (1)

Country Link
JP (1) JPH0214360U (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5054674U (en) * 1973-09-14 1975-05-24
JPS50109937U (en) * 1974-02-15 1975-09-08
JPS5125176U (en) * 1974-08-14 1976-02-24
WO2004059031A1 (en) * 2002-12-25 2004-07-15 Youtec Co.,Ltd. Polygonal barrel spattering device, polygonal barrel spattering method, coated particle formed by the device and method, microcapsule, and method of manufacturing the microcapsule
JP2005264297A (en) * 2004-03-22 2005-09-29 Takayuki Abe Fine particle
KR101272844B1 (en) * 2011-01-31 2013-06-11 한국기초과학지원연구원 Device and mothod for SiC coating on graphite pebble

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5054674U (en) * 1973-09-14 1975-05-24
JPS50109937U (en) * 1974-02-15 1975-09-08
JPS5125176U (en) * 1974-08-14 1976-02-24
WO2004059031A1 (en) * 2002-12-25 2004-07-15 Youtec Co.,Ltd. Polygonal barrel spattering device, polygonal barrel spattering method, coated particle formed by the device and method, microcapsule, and method of manufacturing the microcapsule
JP2005264297A (en) * 2004-03-22 2005-09-29 Takayuki Abe Fine particle
WO2005090630A1 (en) * 2004-03-22 2005-09-29 Youtec Co., Ltd Fine particle
KR101272844B1 (en) * 2011-01-31 2013-06-11 한국기초과학지원연구원 Device and mothod for SiC coating on graphite pebble

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