JPS61136536U - - Google Patents
Info
- Publication number
- JPS61136536U JPS61136536U JP1875185U JP1875185U JPS61136536U JP S61136536 U JPS61136536 U JP S61136536U JP 1875185 U JP1875185 U JP 1875185U JP 1875185 U JP1875185 U JP 1875185U JP S61136536 U JPS61136536 U JP S61136536U
- Authority
- JP
- Japan
- Prior art keywords
- cover
- gas
- substrate
- gas outlet
- rotating substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims description 4
- 239000007788 liquid Substances 0.000 claims description 2
- 239000011248 coating agent Substances 0.000 claims 1
- 239000000470 constituent Substances 0.000 description 1
Landscapes
- Coating Apparatus (AREA)
Description
第１図は本考案の一実施例になるスピンナ装置
の要部を示す側面図、第２図は本考案の他の実施
例になるスピンナ装置の要部を示す側面図、第３
図は従来構成になるスピンナ装置の要部を示す斜
視図イとその側断面図ロ、である。
図中において、１はウエーハ（基板）、２，１
１はウエーハ搭載用ヘツド、３は回転軸、４はレ
ジスト液飛散防止用側枠、１２はカバー、１３は
側枠、１４は空気流通路、１５は空気流通路構成
部材、１６は蓋体、１７は空気排出管、１８，２
２は空気排出用貫通穴、１９は空気流入用貫通穴
、２０は空気流、２１は枠体、を示す。
FIG. 1 is a side view showing the main parts of a spinner device according to an embodiment of the present invention, FIG. 2 is a side view showing the main parts of a spinner device according to another embodiment of the invention, and FIG.
The figures are a perspective view (A) and a side sectional view (B) showing the main parts of a conventional spinner device. In the figure, 1 is a wafer (substrate), 2, 1
1 is a head for mounting a wafer, 3 is a rotating shaft, 4 is a side frame for preventing scattering of resist liquid, 12 is a cover, 13 is a side frame, 14 is an air flow passage, 15 is an air flow passage constituent member, 16 is a lid body, 17 is an air exhaust pipe, 18, 2
2 is a through hole for air discharge, 19 is a through hole for air inflow, 20 is an air flow, and 21 is a frame body.
Claims (1)
記上面に膜形成するに際し、前記基板を覆うカバ
ーを具え、前記カバーのほぼ中心部に気体流入口
を設け、前記カバーの周側壁に複数個の気体流出
口を設け、前記気体流出口からカバー内気体を強
制排気する手段を具えてなることを特徴とするス
ピンナ装置。 When forming a film on the upper surface of a rotating substrate with a liquid coating agent dropped on the upper surface of the rotating substrate, a cover is provided to cover the substrate, a gas inlet is provided approximately in the center of the cover, and a plurality of gas inlets are provided on the circumferential side wall of the cover. A spinner device comprising a gas outlet and means for forcibly exhausting gas within the cover from the gas outlet.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1875185U JPS61136536U (en) | 1985-02-13 | 1985-02-13 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1875185U JPS61136536U (en) | 1985-02-13 | 1985-02-13 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS61136536U true JPS61136536U (en) | 1986-08-25 |
Family
ID=30507678
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1875185U Pending JPS61136536U (en) | 1985-02-13 | 1985-02-13 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61136536U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009158767A (en) * | 2007-12-27 | 2009-07-16 | Tokyo Electron Ltd | Rotary coating device |
-
1985
- 1985-02-13 JP JP1875185U patent/JPS61136536U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009158767A (en) * | 2007-12-27 | 2009-07-16 | Tokyo Electron Ltd | Rotary coating device |
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