JPH0214359U - - Google Patents
Info
- Publication number
- JPH0214359U JPH0214359U JP9086588U JP9086588U JPH0214359U JP H0214359 U JPH0214359 U JP H0214359U JP 9086588 U JP9086588 U JP 9086588U JP 9086588 U JP9086588 U JP 9086588U JP H0214359 U JPH0214359 U JP H0214359U
- Authority
- JP
- Japan
- Prior art keywords
- target
- sputtering apparatus
- sputtering
- substrate
- gas introduction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004544 sputter deposition Methods 0.000 claims description 5
- 239000000758 substrate Substances 0.000 claims description 3
- 238000010586 diagram Methods 0.000 description 2
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9086588U JPH0214359U (de) | 1988-07-08 | 1988-07-08 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9086588U JPH0214359U (de) | 1988-07-08 | 1988-07-08 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0214359U true JPH0214359U (de) | 1990-01-29 |
Family
ID=31315374
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9086588U Pending JPH0214359U (de) | 1988-07-08 | 1988-07-08 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0214359U (de) |
-
1988
- 1988-07-08 JP JP9086588U patent/JPH0214359U/ja active Pending