JPH0214359U - - Google Patents

Info

Publication number
JPH0214359U
JPH0214359U JP9086588U JP9086588U JPH0214359U JP H0214359 U JPH0214359 U JP H0214359U JP 9086588 U JP9086588 U JP 9086588U JP 9086588 U JP9086588 U JP 9086588U JP H0214359 U JPH0214359 U JP H0214359U
Authority
JP
Japan
Prior art keywords
target
sputtering apparatus
sputtering
substrate
gas introduction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9086588U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP9086588U priority Critical patent/JPH0214359U/ja
Publication of JPH0214359U publication Critical patent/JPH0214359U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
JP9086588U 1988-07-08 1988-07-08 Pending JPH0214359U (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9086588U JPH0214359U (de) 1988-07-08 1988-07-08

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9086588U JPH0214359U (de) 1988-07-08 1988-07-08

Publications (1)

Publication Number Publication Date
JPH0214359U true JPH0214359U (de) 1990-01-29

Family

ID=31315374

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9086588U Pending JPH0214359U (de) 1988-07-08 1988-07-08

Country Status (1)

Country Link
JP (1) JPH0214359U (de)

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