JPH02142525U - - Google Patents
Info
- Publication number
- JPH02142525U JPH02142525U JP4819790U JP4819790U JPH02142525U JP H02142525 U JPH02142525 U JP H02142525U JP 4819790 U JP4819790 U JP 4819790U JP 4819790 U JP4819790 U JP 4819790U JP H02142525 U JPH02142525 U JP H02142525U
- Authority
- JP
- Japan
- Prior art keywords
- sample
- gas
- reaction
- gas outlet
- reaction gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000012495 reaction gas Substances 0.000 claims 6
- 239000007789 gas Substances 0.000 claims 5
- 238000005229 chemical vapour deposition Methods 0.000 claims 2
- 239000011148 porous material Substances 0.000 claims 2
- 239000007795 chemical reaction product Substances 0.000 claims 1
- 238000007664 blowing Methods 0.000 description 3
Landscapes
- Electrodes Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4819790U JPH02142525U (US08063081-20111122-C00044.png) | 1990-05-10 | 1990-05-10 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4819790U JPH02142525U (US08063081-20111122-C00044.png) | 1990-05-10 | 1990-05-10 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH02142525U true JPH02142525U (US08063081-20111122-C00044.png) | 1990-12-04 |
Family
ID=31564793
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4819790U Pending JPH02142525U (US08063081-20111122-C00044.png) | 1990-05-10 | 1990-05-10 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH02142525U (US08063081-20111122-C00044.png) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0645266A (ja) * | 1991-12-30 | 1994-02-18 | Texas Instr Inc <Ti> | 単一ウエーハ半導体処理装置用プログラム可能な多ゾーンガス注入器 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5678497A (en) * | 1979-11-27 | 1981-06-27 | Fujitsu Ltd | Vapor growth apparatus |
JPS56137639A (en) * | 1980-03-31 | 1981-10-27 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Decompression vapor growth device |
-
1990
- 1990-05-10 JP JP4819790U patent/JPH02142525U/ja active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5678497A (en) * | 1979-11-27 | 1981-06-27 | Fujitsu Ltd | Vapor growth apparatus |
JPS56137639A (en) * | 1980-03-31 | 1981-10-27 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Decompression vapor growth device |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0645266A (ja) * | 1991-12-30 | 1994-02-18 | Texas Instr Inc <Ti> | 単一ウエーハ半導体処理装置用プログラム可能な多ゾーンガス注入器 |