JPH02138087U - - Google Patents

Info

Publication number
JPH02138087U
JPH02138087U JP1989047102U JP4710289U JPH02138087U JP H02138087 U JPH02138087 U JP H02138087U JP 1989047102 U JP1989047102 U JP 1989047102U JP 4710289 U JP4710289 U JP 4710289U JP H02138087 U JPH02138087 U JP H02138087U
Authority
JP
Japan
Prior art keywords
galvanometer
condensing lens
sealed structure
beam expander
temperature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1989047102U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1989047102U priority Critical patent/JPH02138087U/ja
Publication of JPH02138087U publication Critical patent/JPH02138087U/ja
Pending legal-status Critical Current

Links

JP1989047102U 1989-04-20 1989-04-20 Pending JPH02138087U (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1989047102U JPH02138087U (zh) 1989-04-20 1989-04-20

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1989047102U JPH02138087U (zh) 1989-04-20 1989-04-20

Publications (1)

Publication Number Publication Date
JPH02138087U true JPH02138087U (zh) 1990-11-19

Family

ID=31562743

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1989047102U Pending JPH02138087U (zh) 1989-04-20 1989-04-20

Country Status (1)

Country Link
JP (1) JPH02138087U (zh)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002316277A (ja) * 2001-04-20 2002-10-29 Sunx Ltd レーザマーキング装置
JP2014054671A (ja) * 2007-06-25 2014-03-27 Electro Scientific Industries Inc レーザベースのウェハ加工の間にスループットを高めるようにパラメータを適応化するシステム及び方法
JP2017196639A (ja) * 2016-04-27 2017-11-02 ビアメカニクス株式会社 レーザ加工装置及びレーザ加工方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002316277A (ja) * 2001-04-20 2002-10-29 Sunx Ltd レーザマーキング装置
JP4672173B2 (ja) * 2001-04-20 2011-04-20 パナソニック電工Sunx株式会社 レーザマーキング装置
JP2014054671A (ja) * 2007-06-25 2014-03-27 Electro Scientific Industries Inc レーザベースのウェハ加工の間にスループットを高めるようにパラメータを適応化するシステム及び方法
JP2017196639A (ja) * 2016-04-27 2017-11-02 ビアメカニクス株式会社 レーザ加工装置及びレーザ加工方法

Similar Documents

Publication Publication Date Title
JPH02138087U (zh)
JPH0416620U (zh)
JPS6334589U (zh)
JPH0426684U (zh)
JPS62197015U (zh)
JPS62114310U (zh)
JPH0188916U (zh)
JPS6398516U (zh)
JPS63138534U (zh)
JPS63150906U (zh)
JPH0355505U (zh)
JPH0273612U (zh)
JPH0425364U (zh)
JPS6438062U (zh)
JPS60129779U (ja) 撮像装置
JPS6117657U (ja) 燃焼試験装置
JPS6349540U (zh)
JPH0255767U (zh)
JPS6455474U (zh)
JPH0291363U (zh)
JPS62195115U (zh)
JPS61206827U (zh)
JPS63111064U (zh)
JPS63178855U (zh)
JPS63200184U (zh)