JPH0213488U - - Google Patents
Info
- Publication number
- JPH0213488U JPH0213488U JP9261588U JP9261588U JPH0213488U JP H0213488 U JPH0213488 U JP H0213488U JP 9261588 U JP9261588 U JP 9261588U JP 9261588 U JP9261588 U JP 9261588U JP H0213488 U JPH0213488 U JP H0213488U
- Authority
- JP
- Japan
- Prior art keywords
- toilet seat
- edge
- toilet
- tip
- attached
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000002093 peripheral effect Effects 0.000 claims description 6
Landscapes
- Toilet Supplies (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9261588U JPH056880Y2 (ru) | 1988-07-12 | 1988-07-12 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9261588U JPH056880Y2 (ru) | 1988-07-12 | 1988-07-12 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0213488U true JPH0213488U (ru) | 1990-01-26 |
JPH056880Y2 JPH056880Y2 (ru) | 1993-02-22 |
Family
ID=31317049
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9261588U Expired - Lifetime JPH056880Y2 (ru) | 1988-07-12 | 1988-07-12 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH056880Y2 (ru) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11447861B2 (en) | 2016-12-15 | 2022-09-20 | Asm Ip Holding B.V. | Sequential infiltration synthesis apparatus and a method of forming a patterned structure |
US10770286B2 (en) | 2017-05-08 | 2020-09-08 | Asm Ip Holdings B.V. | Methods for selectively forming a silicon nitride film on a substrate and related semiconductor device structures |
US12040200B2 (en) | 2017-06-20 | 2024-07-16 | Asm Ip Holding B.V. | Semiconductor processing apparatus and methods for calibrating a semiconductor processing apparatus |
US10923344B2 (en) | 2017-10-30 | 2021-02-16 | Asm Ip Holding B.V. | Methods for forming a semiconductor structure and related semiconductor structures |
US11031242B2 (en) | 2018-11-07 | 2021-06-08 | Asm Ip Holding B.V. | Methods for depositing a boron doped silicon germanium film |
US12040199B2 (en) | 2018-11-28 | 2024-07-16 | Asm Ip Holding B.V. | Substrate processing apparatus for processing substrates |
USD975665S1 (en) | 2019-05-17 | 2023-01-17 | Asm Ip Holding B.V. | Susceptor shaft |
CN112309843A (zh) | 2019-07-29 | 2021-02-02 | Asm Ip私人控股有限公司 | 实现高掺杂剂掺入的选择性沉积方法 |
KR20210024423A (ko) | 2019-08-22 | 2021-03-05 | 에이에스엠 아이피 홀딩 비.브이. | 홀을 구비한 구조체를 형성하기 위한 방법 |
USD979506S1 (en) | 2019-08-22 | 2023-02-28 | Asm Ip Holding B.V. | Insulator |
KR20210054983A (ko) | 2019-11-05 | 2021-05-14 | 에이에스엠 아이피 홀딩 비.브이. | 도핑된 반도체 층을 갖는 구조체 및 이를 형성하기 위한 방법 및 시스템 |
US12040177B2 (en) | 2020-08-18 | 2024-07-16 | Asm Ip Holding B.V. | Methods for forming a laminate film by cyclical plasma-enhanced deposition processes |
-
1988
- 1988-07-12 JP JP9261588U patent/JPH056880Y2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH056880Y2 (ru) | 1993-02-22 |