JPH02132950U

JPH02132950U -

Info

Publication number: JPH02132950U
Application number: JP4224789U
Authority: JP
Priority date: 1989-04-10
Filing date: 1989-04-10
Publication date: 1990-11-05
Anticipated expiration: 2004-04-10
Also published as: JPH0719149Y2

Description

[Brief explanation of the drawing]

第１図は本考案のフオーク搬送装置の先端部の
みの斜視図。第２図は同じものの底面図。第３図
は本考案のフオーク搬送装置においてウエハ交換
を行なう動作を示す断面図。ａは下ウエハ載置部
にサセプタを通した状態を示す。ｂは下ウエハ載
置部に処理済みウエハＮを置いた状態を示す。ｃ
はサセプタを上ウエハ載置部の未処理ウエハＭの
直下に位置させた状態を示す。ｄはサセプタ上に
未処理ウエハＭを載せ、フオーク搬送装置を後退
させている状態を示す。第４図は縦型気相成長装
置の概略構成図。第５図は従来例に係る１枚フオ
ークの搬送装置の先端部斜視図。第６図は第５図
の受け板にウエハを載せた状態を示す断面図。第
７図は特開昭６０−１８６０３３の、ウエハをサ
セプタから受け台へ移す動作を示す断面図。第８
図は特開昭６０−１８６０３３のウエハを受け台
からサセプタへ移す動作を示す断面図。１……成長室、２……ゲートバルブ、３……ロ
ードロツク室、４……サセプタ、５……フオーク
搬送装置、６……ウエハ、７……試料交換室、８
……高周波コイル、９……原料ガス導入口、１０
……ガス排出口、１１……支持棒、１２……受け
台、１３……サセプタ通し穴、１４……結合板、
１５……抜け止め、１６……ウエハ段部、１７…
…開口部、Ａ……上受け台、Ｂ……下受け台、Ｘ
……ウエハ載置部、Ｙ……ウエハ載置部。 FIG. 1 is a perspective view of only the tip of the fork conveying device of the present invention. Figure 2 is a bottom view of the same thing. FIG. 3 is a sectional view showing the operation of exchanging wafers in the fork transfer device of the present invention. A shows the state in which the susceptor is passed through the lower wafer placement part. b shows a state in which a processed wafer N is placed on the lower wafer placement section. c.
1 shows a state in which the susceptor is positioned directly below the unprocessed wafer M on the upper wafer placement section. d shows a state in which an unprocessed wafer M is placed on the susceptor and the fork transport device is retreated. FIG. 4 is a schematic diagram of a vertical vapor phase growth apparatus. FIG. 5 is a perspective view of the tip of a conventional single fork conveying device. FIG. 6 is a sectional view showing a state in which a wafer is placed on the receiving plate of FIG. FIG. 7 is a sectional view showing the operation of transferring a wafer from a susceptor to a pedestal according to Japanese Patent Application Laid-Open No. 60-186033. 8th
The figure is a sectional view showing the operation of transferring a wafer from a holder to a susceptor according to Japanese Patent Application Laid-Open No. 60-186033. DESCRIPTION OF SYMBOLS 1... Growth chamber, 2... Gate valve, 3... Load lock chamber, 4... Susceptor, 5... Fork transfer device, 6... Wafer, 7... Sample exchange room, 8
... High frequency coil, 9 ... Raw material gas inlet, 10
... Gas discharge port, 11 ... Support rod, 12 ... cradle, 13 ... Susceptor through hole, 14 ... Connection plate,
15... Retainer, 16... Wafer stepped portion, 17...
...opening, A...upper cradle, B...lower cradle, X
...Wafer placement section, Y...Wafer placement section.

Claims

[Scope of utility model registration request]

A wafer 6 is placed on a susceptor 4 fixed on a rotary shaft 20 that can be raised and lowered, and the wafer 6 is processed in the reaction chamber, and the susceptor 4 is lowered into a sample exchange chamber to exchange the wafer. This is a fork transport device for transporting wafers in the apparatus, and includes a support rod 11 that can reciprocate between the sample exchange chamber 7 and the load lock chamber 3 connected via the gate valve 2, and a support rod 11 that can be moved up and down at the tip of the support rod 11. It consists of an upper holder A and a lower holder B, which are provided in the susceptor and have wafer writing parts X and Y, and the wafer mounting parts X and Y have a susceptor through hole 13 and a susceptor hole 13 formed on the periphery of the susceptor, and a wafer into which the wafer is to be inserted. Step portion 16 and susceptor rotating shaft 20
The upper and lower wafer placement parts X and Y do not overlap in the vertical direction, and the wafer placement part A double fork horizontal conveyor device characterized by being located at a position farther from the support rod 11 than the storage section Y.