JPH02131245U - - Google Patents
Info
- Publication number
- JPH02131245U JPH02131245U JP4083789U JP4083789U JPH02131245U JP H02131245 U JPH02131245 U JP H02131245U JP 4083789 U JP4083789 U JP 4083789U JP 4083789 U JP4083789 U JP 4083789U JP H02131245 U JPH02131245 U JP H02131245U
- Authority
- JP
- Japan
- Prior art keywords
- gas introduction
- oven
- gas
- pdp
- exhaust device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010438 heat treatment Methods 0.000 claims 2
- 238000010586 diagram Methods 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
Landscapes
- Gas-Filled Discharge Tubes (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4083789U JPH02131245U (ko) | 1989-04-06 | 1989-04-06 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4083789U JPH02131245U (ko) | 1989-04-06 | 1989-04-06 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02131245U true JPH02131245U (ko) | 1990-10-31 |
Family
ID=31550974
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4083789U Pending JPH02131245U (ko) | 1989-04-06 | 1989-04-06 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02131245U (ko) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003031117A (ja) * | 2001-07-10 | 2003-01-31 | Nec Corp | 誘電体層の製造方法及び製造装置 |
-
1989
- 1989-04-06 JP JP4083789U patent/JPH02131245U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003031117A (ja) * | 2001-07-10 | 2003-01-31 | Nec Corp | 誘電体層の製造方法及び製造装置 |