JPH02123361A - Photosensitive planographic printing plate - Google Patents
Photosensitive planographic printing plateInfo
- Publication number
- JPH02123361A JPH02123361A JP27710388A JP27710388A JPH02123361A JP H02123361 A JPH02123361 A JP H02123361A JP 27710388 A JP27710388 A JP 27710388A JP 27710388 A JP27710388 A JP 27710388A JP H02123361 A JPH02123361 A JP H02123361A
- Authority
- JP
- Japan
- Prior art keywords
- printing plate
- diazo
- photosensitive
- acid
- resin layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000007639 printing Methods 0.000 title claims abstract description 34
- 239000010410 layer Substances 0.000 claims abstract description 27
- 239000011347 resin Substances 0.000 claims abstract description 20
- 229920005989 resin Polymers 0.000 claims abstract description 20
- 229920000642 polymer Polymers 0.000 claims abstract description 19
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 claims abstract description 18
- 125000005439 maleimidyl group Chemical group C1(C=CC(N1*)=O)=O 0.000 claims abstract description 14
- 230000005660 hydrophilic surface Effects 0.000 claims abstract description 5
- 239000012790 adhesive layer Substances 0.000 claims abstract description 4
- 239000000463 material Substances 0.000 claims description 5
- 238000011282 treatment Methods 0.000 abstract description 11
- 230000035945 sensitivity Effects 0.000 abstract description 9
- 239000007788 liquid Substances 0.000 abstract description 8
- 230000000694 effects Effects 0.000 abstract description 5
- 230000015572 biosynthetic process Effects 0.000 abstract description 4
- 238000005755 formation reaction Methods 0.000 abstract 3
- -1 alkyl methacrylate Chemical compound 0.000 description 12
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 9
- 239000000203 mixture Substances 0.000 description 9
- 239000007864 aqueous solution Substances 0.000 description 8
- 239000000243 solution Substances 0.000 description 8
- 239000002253 acid Substances 0.000 description 7
- 229910052782 aluminium Inorganic materials 0.000 description 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 7
- 229920001577 copolymer Polymers 0.000 description 7
- 239000000758 substrate Substances 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 239000004115 Sodium Silicate Substances 0.000 description 5
- 239000000049 pigment Substances 0.000 description 5
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 5
- 229910052911 sodium silicate Inorganic materials 0.000 description 5
- 238000001035 drying Methods 0.000 description 4
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 3
- WVDDGKGOMKODPV-UHFFFAOYSA-N Benzyl alcohol Chemical compound OCC1=CC=CC=C1 WVDDGKGOMKODPV-UHFFFAOYSA-N 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 229920002554 vinyl polymer Polymers 0.000 description 3
- RSZXXBTXZJGELH-UHFFFAOYSA-N 2,3,4-tri(propan-2-yl)naphthalene-1-sulfonic acid Chemical compound C1=CC=CC2=C(C(C)C)C(C(C)C)=C(C(C)C)C(S(O)(=O)=O)=C21 RSZXXBTXZJGELH-UHFFFAOYSA-N 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- AMIMRNSIRUDHCM-UHFFFAOYSA-N Isopropylaldehyde Chemical compound CC(C)C=O AMIMRNSIRUDHCM-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- NBBJYMSMWIIQGU-UHFFFAOYSA-N Propionic aldehyde Chemical compound CCC=O NBBJYMSMWIIQGU-UHFFFAOYSA-N 0.000 description 2
- IKHGUXGNUITLKF-XPULMUKRSA-N acetaldehyde Chemical compound [14CH]([14CH3])=O IKHGUXGNUITLKF-XPULMUKRSA-N 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 150000001450 anions Chemical class 0.000 description 2
- 238000007743 anodising Methods 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 2
- 229920002301 cellulose acetate Polymers 0.000 description 2
- 238000004040 coloring Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- XCJYREBRNVKWGJ-UHFFFAOYSA-N copper(II) phthalocyanine Chemical compound [Cu+2].C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 XCJYREBRNVKWGJ-UHFFFAOYSA-N 0.000 description 2
- GGSUCNLOZRCGPQ-UHFFFAOYSA-N diethylphenylamine Natural products CCN(CC)C1=CC=CC=C1 GGSUCNLOZRCGPQ-UHFFFAOYSA-N 0.000 description 2
- WJJMNDUMQPNECX-UHFFFAOYSA-N dipicolinic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=N1 WJJMNDUMQPNECX-UHFFFAOYSA-N 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 239000000975 dye Substances 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- RBTKNAXYKSUFRK-UHFFFAOYSA-N heliogen blue Chemical compound [Cu].[N-]1C2=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=NC([N-]1)=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=N2 RBTKNAXYKSUFRK-UHFFFAOYSA-N 0.000 description 2
- 229920002521 macromolecule Polymers 0.000 description 2
- 229910001507 metal halide Inorganic materials 0.000 description 2
- 150000005309 metal halides Chemical class 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 2
- 239000002736 nonionic surfactant Substances 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 239000004014 plasticizer Substances 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 2
- PNGLEYLFMHGIQO-UHFFFAOYSA-M sodium;3-(n-ethyl-3-methoxyanilino)-2-hydroxypropane-1-sulfonate;dihydrate Chemical compound O.O.[Na+].[O-]S(=O)(=O)CC(O)CN(CC)C1=CC=CC(OC)=C1 PNGLEYLFMHGIQO-UHFFFAOYSA-M 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical class C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 1
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- UYEDESPZQLZMCL-UHFFFAOYSA-N 1,2-dimethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=C(C)C(C)=CC=C3SC2=C1 UYEDESPZQLZMCL-UHFFFAOYSA-N 0.000 description 1
- YHMYGUUIMTVXNW-UHFFFAOYSA-N 1,3-dihydrobenzimidazole-2-thione Chemical compound C1=CC=C2NC(S)=NC2=C1 YHMYGUUIMTVXNW-UHFFFAOYSA-N 0.000 description 1
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 1
- QHIGBUQIFLDZPZ-UHFFFAOYSA-N 1-[(4e)-4-diazo-2-methoxycyclohexa-1,5-dien-1-yl]pyrrolidine Chemical compound C1=CC(=[N+]=[N-])CC(OC)=C1N1CCCC1 QHIGBUQIFLDZPZ-UHFFFAOYSA-N 0.000 description 1
- QWQNFXDYOCUEER-UHFFFAOYSA-N 2,3-ditert-butyl-4-methylphenol Chemical compound CC1=CC=C(O)C(C(C)(C)C)=C1C(C)(C)C QWQNFXDYOCUEER-UHFFFAOYSA-N 0.000 description 1
- IRLYGRLEBKCYPY-UHFFFAOYSA-N 2,5-dimethylbenzenesulfonic acid Chemical compound CC1=CC=C(C)C(S(O)(=O)=O)=C1 IRLYGRLEBKCYPY-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- WXHLLJAMBQLULT-UHFFFAOYSA-N 2-[[6-[4-(2-hydroxyethyl)piperazin-1-yl]-2-methylpyrimidin-4-yl]amino]-n-(2-methyl-6-sulfanylphenyl)-1,3-thiazole-5-carboxamide;hydrate Chemical compound O.C=1C(N2CCN(CCO)CC2)=NC(C)=NC=1NC(S1)=NC=C1C(=O)NC1=C(C)C=CC=C1S WXHLLJAMBQLULT-UHFFFAOYSA-N 0.000 description 1
- WBIQQQGBSDOWNP-UHFFFAOYSA-N 2-dodecylbenzenesulfonic acid Chemical compound CCCCCCCCCCCCC1=CC=CC=C1S(O)(=O)=O WBIQQQGBSDOWNP-UHFFFAOYSA-N 0.000 description 1
- XCSZUHHAYFILGO-UHFFFAOYSA-N 2-methyl-4-nitrobenzenesulfonic acid Chemical compound CC1=CC([N+]([O-])=O)=CC=C1S(O)(=O)=O XCSZUHHAYFILGO-UHFFFAOYSA-N 0.000 description 1
- QCDWFXQBSFUVSP-UHFFFAOYSA-N 2-phenoxyethanol Chemical compound OCCOC1=CC=CC=C1 QCDWFXQBSFUVSP-UHFFFAOYSA-N 0.000 description 1
- ZTFYJIXFKGPCHV-UHFFFAOYSA-N 2-propan-2-ylnaphthalene-1-sulfonic acid Chemical compound C1=CC=CC2=C(S(O)(=O)=O)C(C(C)C)=CC=C21 ZTFYJIXFKGPCHV-UHFFFAOYSA-N 0.000 description 1
- KTALPKYXQZGAEG-UHFFFAOYSA-N 2-propan-2-ylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C(C)C)=CC=C3SC2=C1 KTALPKYXQZGAEG-UHFFFAOYSA-N 0.000 description 1
- HXIQYSLFEXIOAV-UHFFFAOYSA-N 2-tert-butyl-4-(5-tert-butyl-4-hydroxy-2-methylphenyl)sulfanyl-5-methylphenol Chemical compound CC1=CC(O)=C(C(C)(C)C)C=C1SC1=CC(C(C)(C)C)=C(O)C=C1C HXIQYSLFEXIOAV-UHFFFAOYSA-N 0.000 description 1
- QDWTXRWOKORYQH-UHFFFAOYSA-N 3-bromobenzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC(Br)=C1 QDWTXRWOKORYQH-UHFFFAOYSA-N 0.000 description 1
- IQOJIHIRSVQTJJ-UHFFFAOYSA-N 3-chlorobenzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC(Cl)=C1 IQOJIHIRSVQTJJ-UHFFFAOYSA-N 0.000 description 1
- JDFDHBSESGTDAL-UHFFFAOYSA-N 3-methoxypropan-1-ol Chemical compound COCCCO JDFDHBSESGTDAL-UHFFFAOYSA-N 0.000 description 1
- CCTFMNIEFHGTDU-UHFFFAOYSA-N 3-methoxypropyl acetate Chemical compound COCCCOC(C)=O CCTFMNIEFHGTDU-UHFFFAOYSA-N 0.000 description 1
- SCETWWDGKCBPMK-UHFFFAOYSA-N 4-[(4e)-4-diazocyclohexa-1,5-dien-1-yl]morpholine Chemical compound C1=CC(=[N+]=[N-])CC=C1N1CCOCC1 SCETWWDGKCBPMK-UHFFFAOYSA-N 0.000 description 1
- WKXBVXXBNGSEPS-UHFFFAOYSA-N 4-[(4z)-3,6-dibutoxy-4-diazocyclohexa-1,5-dien-1-yl]morpholine Chemical compound CCCCOC1=CC(=[N+]=[N-])C(OCCCC)C=C1N1CCOCC1 WKXBVXXBNGSEPS-UHFFFAOYSA-N 0.000 description 1
- MURZLGAHXMSTCA-UHFFFAOYSA-N 4-[(4z)-4-diazo-3,6-dimethoxycyclohexa-1,5-dien-1-yl]morpholine Chemical compound COC1=CC(=[N+]=[N-])C(OC)C=C1N1CCOCC1 MURZLGAHXMSTCA-UHFFFAOYSA-N 0.000 description 1
- LAXPFHMCFLHGKK-UHFFFAOYSA-N 4-diazo-n,n-dimethylcyclohexa-1,5-dien-1-amine Chemical compound CN(C)C1=CCC(=[N+]=[N-])C=C1 LAXPFHMCFLHGKK-UHFFFAOYSA-N 0.000 description 1
- 125000001054 5 membered carbocyclic group Chemical group 0.000 description 1
- CUARLQDWYSRQDF-UHFFFAOYSA-N 5-Nitroacenaphthene Chemical compound C1CC2=CC=CC3=C2C1=CC=C3[N+](=O)[O-] CUARLQDWYSRQDF-UHFFFAOYSA-N 0.000 description 1
- YLKCHWCYYNKADS-UHFFFAOYSA-N 5-hydroxynaphthalene-1-sulfonic acid Chemical compound C1=CC=C2C(O)=CC=CC2=C1S(O)(=O)=O YLKCHWCYYNKADS-UHFFFAOYSA-N 0.000 description 1
- YCPXWRQRBFJBPZ-UHFFFAOYSA-N 5-sulfosalicylic acid Chemical compound OC(=O)C1=CC(S(O)(=O)=O)=CC=C1O YCPXWRQRBFJBPZ-UHFFFAOYSA-N 0.000 description 1
- 125000004008 6 membered carbocyclic group Chemical group 0.000 description 1
- ZRDSGWXWQNSQAN-UHFFFAOYSA-N 6-diazo-n-phenylcyclohexa-2,4-dien-1-amine Chemical compound [N-]=[N+]=C1C=CC=CC1NC1=CC=CC=C1 ZRDSGWXWQNSQAN-UHFFFAOYSA-N 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- HHFJCMINQUHSPB-UHFFFAOYSA-N C(C)C(=O)O.CC1=CC=CC=2SC3=CC=CC=C3C(C12)=O Chemical compound C(C)C(=O)O.CC1=CC=CC=2SC3=CC=CC=C3C(C12)=O HHFJCMINQUHSPB-UHFFFAOYSA-N 0.000 description 1
- 229920001747 Cellulose diacetate Polymers 0.000 description 1
- DQEFEBPAPFSJLV-UHFFFAOYSA-N Cellulose propionate Chemical compound CCC(=O)OCC1OC(OC(=O)CC)C(OC(=O)CC)C(OC(=O)CC)C1OC1C(OC(=O)CC)C(OC(=O)CC)C(OC(=O)CC)C(COC(=O)CC)O1 DQEFEBPAPFSJLV-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 239000000020 Nitrocellulose Substances 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical group [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- ZCQWOFVYLHDMMC-UHFFFAOYSA-N Oxazole Chemical compound C1=COC=N1 ZCQWOFVYLHDMMC-UHFFFAOYSA-N 0.000 description 1
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- 229920002125 Sokalan® Polymers 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
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- FJWGYAHXMCUOOM-QHOUIDNNSA-N [(2s,3r,4s,5r,6r)-2-[(2r,3r,4s,5r,6s)-4,5-dinitrooxy-2-(nitrooxymethyl)-6-[(2r,3r,4s,5r,6s)-4,5,6-trinitrooxy-2-(nitrooxymethyl)oxan-3-yl]oxyoxan-3-yl]oxy-3,5-dinitrooxy-6-(nitrooxymethyl)oxan-4-yl] nitrate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](O[N+]([O-])=O)[C@H]1O[N+]([O-])=O)O[C@H]1[C@@H]([C@@H](O[N+]([O-])=O)[C@H](O[N+]([O-])=O)[C@@H](CO[N+]([O-])=O)O1)O[N+]([O-])=O)CO[N+](=O)[O-])[C@@H]1[C@@H](CO[N+]([O-])=O)O[C@@H](O[N+]([O-])=O)[C@H](O[N+]([O-])=O)[C@H]1O[N+]([O-])=O FJWGYAHXMCUOOM-QHOUIDNNSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
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- 239000000853 adhesive Substances 0.000 description 1
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- 229910052910 alkali metal silicate Inorganic materials 0.000 description 1
- 125000005250 alkyl acrylate group Chemical group 0.000 description 1
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 238000004873 anchoring Methods 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 239000007900 aqueous suspension Substances 0.000 description 1
- 235000019445 benzyl alcohol Nutrition 0.000 description 1
- 238000006664 bond formation reaction Methods 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- ZTQSAGDEMFDKMZ-UHFFFAOYSA-N butyric aldehyde Natural products CCCC=O ZTQSAGDEMFDKMZ-UHFFFAOYSA-N 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 229920006217 cellulose acetate butyrate Polymers 0.000 description 1
- 229920006218 cellulose propionate Polymers 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 235000015165 citric acid Nutrition 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000011243 crosslinked material Substances 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- 238000006352 cycloaddition reaction Methods 0.000 description 1
- BJZIJOLEWHWTJO-UHFFFAOYSA-H dipotassium;hexafluorozirconium(2-) Chemical compound [F-].[F-].[F-].[F-].[F-].[F-].[K+].[K+].[Zr+4] BJZIJOLEWHWTJO-UHFFFAOYSA-H 0.000 description 1
- 229940060296 dodecylbenzenesulfonic acid Drugs 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 239000001630 malic acid Substances 0.000 description 1
- 235000011090 malic acid Nutrition 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 1
- 239000007793 ph indicator Substances 0.000 description 1
- 229960005323 phenoxyethanol Drugs 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 239000003504 photosensitizing agent Substances 0.000 description 1
- XQZYPMVTSDWCCE-UHFFFAOYSA-N phthalonitrile Chemical compound N#CC1=CC=CC=C1C#N XQZYPMVTSDWCCE-UHFFFAOYSA-N 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 239000008262 pumice Substances 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 235000010265 sodium sulphite Nutrition 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- CXVGEDCSTKKODG-UHFFFAOYSA-N sulisobenzone Chemical compound C1=C(S(O)(=O)=O)C(OC)=CC(O)=C1C(=O)C1=CC=CC=C1 CXVGEDCSTKKODG-UHFFFAOYSA-N 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- ISIJQEHRDSCQIU-UHFFFAOYSA-N tert-butyl 2,7-diazaspiro[4.5]decane-7-carboxylate Chemical compound C1N(C(=O)OC(C)(C)C)CCCC11CNCC1 ISIJQEHRDSCQIU-UHFFFAOYSA-N 0.000 description 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 1
- ILJSQTXMGCGYMG-UHFFFAOYSA-N triacetic acid Chemical compound CC(=O)CC(=O)CC(O)=O ILJSQTXMGCGYMG-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は感光性平版印刷版に関するものである。[Detailed description of the invention] [Industrial application field] The present invention relates to a photosensitive lithographic printing plate.
更に詳しくは、親水性表面を有する支持体との接着性を
改良した、光網状化可能な重合体からなる感光層を設け
た感光性平版印刷版に関するものである。More specifically, the present invention relates to a photosensitive lithographic printing plate provided with a photosensitive layer made of a photoreticulable polymer that has improved adhesion to a support having a hydrophilic surface.
環付加反応によって架橋する光架橋性材料はよく知られ
ており、これらは、感光性平版印刷版等の製造に用いる
感光性組成物の主要成分として数多く用いられている。Photocrosslinkable materials that crosslink through cycloaddition reactions are well known, and many of these are used as main components of photosensitive compositions used in the production of photosensitive lithographic printing plates and the like.
これらの架橋材料のうちマレイミド基を側鎖に有する光
架橋性ポリマーは高感度でありホトレジストとして有用
であるにもかかわらず、支持体や他の層との接着性が良
好でないという問題があるために実用化されていない。Among these crosslinked materials, photocrosslinkable polymers with maleimide groups in their side chains are highly sensitive and useful as photoresists, but they have the problem of poor adhesion to supports and other layers. It has not been put into practical use.
接着性が悪いと、現像中ブラシなどにより画像が剥離し
たり、傷を生じたりして、十分な耐刷力を得ることが出
来ない。又、低露光時では、この傾向が顕著な為、結果
的に感度が低くなる。If the adhesion is poor, the image may peel off or be damaged by brushes during development, making it impossible to obtain sufficient printing durability. Furthermore, at low exposure times, this tendency is noticeable, resulting in lower sensitivity.
接着性を改良しようという試みは、特開昭62−785
44号に開示されているように、感光層中へネガ作用ジ
アゾ樹脂を加える試みや、特開昭62−85255号に
記載されているように、アルミニウム支持体上に設けた
、陽極酸化皮膜のボアを拡げ、物理的なアンカー効果に
よって接着力を得る試みが知られている。An attempt to improve adhesiveness was made in JP-A-62-785.
44, an attempt was made to add a negative-acting diazo resin to the photosensitive layer, and as described in JP-A-62-85255, an anodized film formed on an aluminum support was used. Attempts are known to widen the bore and obtain adhesive strength through a physical anchor effect.
しかしながら、ジアゾ樹脂の感光層中への添加は、感度
を低下させる他、塗布液の状態での顔料(着色材)の安
定性を損う等の問題がある。又、支持体表面のアンカー
効果を高める方法は、印刷時に、非画像部がインキを受
けつけ易くなり、印刷汚れを起こし畠いという欠点を有
している。However, addition of the diazo resin to the photosensitive layer has problems such as lowering the sensitivity and impairing the stability of the pigment (coloring material) in the state of a coating solution. Furthermore, the method of enhancing the anchoring effect on the surface of the support has the disadvantage that non-image areas tend to receive ink during printing, resulting in printing stains and smudges.
従って、本発明はマレイミド基を側鎖に有する光網状化
可能な重合体のすぐれた感度を保持しつつ、印刷性能に
すぐれた平版印刷版を与える感光性平版印刷版を提供す
ることを目的とする。Therefore, it is an object of the present invention to provide a photosensitive lithographic printing plate that maintains the excellent sensitivity of a photoreticulable polymer having a maleimide group in its side chain and provides a lithographic printing plate with excellent printing performance. do.
本発明は、親水化処理された支持体とマレイミド基を側
鎖に有する光網状化可能な重合体を有する感光層の中間
に、ネガ作用ジアゾ樹脂層を設ける事により上記目的が
解決出来るとの知見に基づいてなされたものである。The present invention proposes that the above object can be achieved by providing a negative working diazo resin layer between a hydrophilic support and a photosensitive layer comprising a photoreticulable polymer having a maleimide group in its side chain. This was done based on knowledge.
すなわち、本発明は、親水性表面を有する支持体上に、
中間接着性層としてのネガ作用ジアゾ樹脂層と、マレイ
ミド基を側鎖に有する光網状化可能な重合体を有する感
光層を設けた事を特徴とする感光性平版印刷版である。That is, the present invention provides, on a support having a hydrophilic surface,
This is a photosensitive lithographic printing plate characterized by being provided with a negative working diazo resin layer as an intermediate adhesive layer and a photosensitive layer containing a photoreticulable polymer having a maleimide group in its side chain.
本発明1こ用いるマレイミド基を側鎖に有する光網状化
可能な重合体としては、特開昭52−988号(対応米
国特許4.079,041号)明細書や、独国特許2,
626.769号明細書、ヨーロッパ特許21.019
号明細書、ヨーロッパ特許3.552号明細書やデイ−
・アンゲバンドウテ・マクロモレクラーレφケミ−(D
ie Angewandte Makromoleku
lareChemie) 115 (1983)の16
3〜181ページに記載されている下記一般式(I)(
式中R及びR1はそれぞれ独立して、最高4個の炭素原
子を有するアルキル基を表わすか、又はRとR3が一緒
になって5員又は6員の炭素環を形成してもよい、)
で表わされるマレイミド基を側鎖に有する重合体や、特
開昭49−128991号、同49−128992号、
同49−128993号、同50−5376号、同50
−5377号、同50−5379号、同50−5378
号、同5〇−5380号、同53−5298号、同5′
3−5299号、同53−5300号、同50−501
07号、同51−47940号、同52−13907号
、同50−45076号、同52−121700号、同
50−10884号、同50−45087号、強国特許
第2,349.948号、同第2.616,276号各
帰洛細書に記載されている下記一般式(II)
(式中R2は芳香族基を表わし、R8は水素原子、ハロ
ゲン原子、アルキル基又はシアノ基を表わす)
で表わされるマレイミド基を側鎖に有する重合体等をあ
げることが出来る。これらの重合体の平均分子量は10
00以上、好ましくは3〜4万である。またこれらの重
合体は1分子当り平均2個以上のマレイミド基を側鎖に
有する。これらのマレイミド基を側鎖に有する重合体中
でも特に酸基を有する重合体が、現像時アルカリ水を用
いることが出来、公害防止の観点から有利である。酸基
を有するマレイミド基重合体の酸価は20〜250の範
囲が好ましく、更に好ましくは50〜150の範囲であ
る。特にこれらの酸価を有する重合体の中でもデイ−・
アンゲバンドウテ・マクロモレクラーレ・ケミ−(Di
e Angev+andte !、Iakromole
kulareChemie) 128 (1984
)の71〜91ページに記載されている様なN−(2−
(メタクリロイルオキシ)エチル)−2,3−ジメチル
マレイミドとメタクリル酸あるいはアクリル酸の共重合
体が有用である。更にこの共重合体の合成に際して第3
成分のビニルモノマーを共重合することによって目的に
応じた多元共重合体を容易に合成することができる。た
とえば第3成分のビニルモノマーとして、そのホモポリ
マーのガラス転移点が室温以下のアルキルメタアクリレ
ートやアルキルアクリレートを用いることによって共重
合体に柔軟性を与えることが出来る。The photoreticulable polymer having a maleimide group in the side chain used in the present invention 1 is described in Japanese Patent Application Laid-Open No. 52-988 (corresponding U.S. Pat. No. 4,079,041), German Patent No. 2,
No. 626.769, European Patent No. 21.019
No. 3.552 specification, European Patent No. 3.552 specification and D.
・Angebandute Macromolecule φ Chemie (D
ie Angewandte Makromoleku
16 of lareChemie) 115 (1983)
The following general formula (I) described on pages 3 to 181 (
where R and R1 each independently represent an alkyl group having up to 4 carbon atoms, or R and R3 may together form a 5- or 6-membered carbocycle) Polymers having a maleimide group in the side chain represented by
No. 49-128993, No. 50-5376, No. 50
-5377, 50-5379, 50-5378
No. 50-5380, No. 53-5298, No. 5'
No. 3-5299, No. 53-5300, No. 50-501
No. 07, No. 51-47940, No. 52-13907, No. 50-45076, No. 52-121700, No. 50-10884, No. 50-45087, No. 2,349.948, No. 2.616,276, represented by the following general formula (II) (wherein R2 represents an aromatic group and R8 represents a hydrogen atom, a halogen atom, an alkyl group, or a cyano group) Examples include polymers having a maleimide group in a side chain. The average molecular weight of these polymers is 10
00 or more, preferably 30,000 to 40,000. Furthermore, these polymers have an average of two or more maleimide groups per molecule in their side chains. Among these polymers having a maleimide group in a side chain, a polymer having an acid group in particular is advantageous from the viewpoint of preventing pollution since alkaline water can be used during development. The acid value of the maleimide group polymer having an acid group is preferably in the range of 20 to 250, more preferably in the range of 50 to 150. In particular, among the polymers with these acid values, D-
Angebandute Macromolecule Chemie (Di
e Angev+andte! , Iakromole
kulareChemie) 128 (1984
) as described on pages 71 to 91 of N-(2-
Copolymers of (methacryloyloxy)ethyl)-2,3-dimethylmaleimide and methacrylic acid or acrylic acid are useful. Furthermore, during the synthesis of this copolymer, a third
By copolymerizing the component vinyl monomers, it is possible to easily synthesize a multi-component copolymer depending on the purpose. For example, flexibility can be imparted to the copolymer by using, as the third component vinyl monomer, an alkyl methacrylate or alkyl acrylate whose homopolymer has a glass transition point below room temperature.
本発明において必要に応じて用いられる光増感剤は30
0nm以上の範囲で実際に充分な光吸収を可能にする極
大吸収を有する三重項増感剤が好ましい。この様な増感
剤としてはチオキサン、チオキサントン誘導体、たとえ
ば2−クロルチオキサトン、2−イソプルピルチオキサ
ントン、ジメチルチオキサントン、メチルチオキサント
ン−1−エチルカルボキシレート等や5−ニトロアセナ
フテン等をあげることが出来る。この他特開昭59−2
06425号公報に記載されている1、2−ジシアノベ
ンゼン、クロラニノペ2.3−ジクロロ−5,6−ジシ
アノベンゼンノン等の電子受容化合物も有効である。こ
れらの増感剤の添加量は全組成物の1〜20重量%、よ
り好ましくは3〜10重量%である。The photosensitizer used as necessary in the present invention is 30
Preference is given to triplet sensitizers having an absorption maximum that allows practically sufficient light absorption in the range of 0 nm or more. Examples of such sensitizers include thioxane, thioxanthone derivatives, such as 2-chlorothioxatone, 2-isopropylthioxanthone, dimethylthioxanthone, methylthioxanthone-1-ethylcarboxylate, and 5-nitroacenaphthene. I can do it. In addition, JP-A-59-2
Electron-accepting compounds such as 1,2-dicyanobenzene and chloraninope-2,3-dichloro-5,6-dicyanobenzenone described in Japanese Patent No. 06425 are also effective. The amount of these sensitizers added is 1 to 20% by weight, more preferably 3 to 10% by weight of the total composition.
以上の他に感光層には更に酸化防止剤を加えておくこと
が好ましく、例えばジ−t−ブチル−p−クレゾール、
ベンゾキノン、4.4’−チオビス(3−メチル−6−
t−ブチルフェノール)、2−メルカプトベンゾイミダ
ゾール等が有用であり、また場合によっては感光層の着
色を目的として染料もしくは顔料や焼出剤として光酸発
生剤(例えばトリアジン系、オキサゾール系のトリノ\
ロメチル化合物)とpH指示薬、アジド化合物とロイコ
染料やスピロピラン化合物等を添加することが出来る。In addition to the above, it is preferable to further add an antioxidant to the photosensitive layer, such as di-t-butyl-p-cresol,
Benzoquinone, 4,4'-thiobis(3-methyl-6-
t-butylphenol), 2-mercaptobenzimidazole, etc. are useful, and in some cases, dyes or pigments are used for the purpose of coloring the photosensitive layer, and photoacid generators (e.g., triazine-based, oxazole-based Torino) are useful as printing agents.
romethyl compound), a pH indicator, an azide compound, a leuco dye, a spiropyran compound, etc.
上述のごとき、感光性組成物を、例えば、2−メトキシ
エタノール、2−メトキシエチルアセテート、プロピレ
ングリコールモノメチルエーテル、3−メトキシプロパ
ツール、3−メトキシプロピルアセテート、メチルエチ
ルケトン、エチレンジクロライドなどの適当な溶剤の単
独またはこれらを適当に組合せた混合溶媒に溶解して支
持体上に塗設する。その被覆量は乾燥後の重量で約0.
1g/11’〜約10g/m2の範囲が適当であり、よ
り好ましくは0.5〜5g/m2である。The photosensitive composition as described above is prepared in a suitable solvent such as, for example, 2-methoxyethanol, 2-methoxyethyl acetate, propylene glycol monomethyl ether, 3-methoxypropanol, 3-methoxypropyl acetate, methyl ethyl ketone, ethylene dichloride, etc. They are dissolved in a mixed solvent alone or in an appropriate combination and coated on a support. The amount of coverage is approximately 0.0% by weight after drying.
A range of 1 g/11' to about 10 g/m2 is suitable, more preferably 0.5 to 5 g/m2.
本発明に用いる親水性を有する表面を有する支持体は、
寸度的に安定な板状物である事が望ましい。かかる寸度
的に安定な板状物としては、従来印刷物の支持体として
使用されたものが含まれ、それらは本発明に好適に使用
することができる。The support having a hydrophilic surface used in the present invention is
It is desirable that it be a dimensionally stable plate-like object. Such dimensionally stable plate-like materials include those conventionally used as supports for printed matter, and they can be suitably used in the present invention.
かかる支持体としては、紙、プラスチックス(例えばポ
リエチレン、ポリプロピレン、ポリスチレンなど)がラ
ミネートされた紙、アルミニウム(アルミニウム合金も
含む。)、亜鉛、銅などのような金属の板、二酢酸セル
ロース、三酢酸セルロース、プロピオン酸セルロース、
酢酸セルロース、酢酸酪酸セルロース、硝酸セルロース
、ポリエチレンテレフタレート、ポリエチレン、ポリス
チレン、ポリプロピレン、ポリカーボネート、ポリビニ
ルアセタールなどのようなプラスチックのフィルム、上
記の如き金属がラミネートもしくは蒸着された紙もしく
はプラスチックフィルムなどが含まれる。これらの支持
体のうち、アルミニウム板は寸度的に著しく安定であり
、しかも安価であるうえ、本発明の組成物との接着性が
特に良好なので好ましい。更に、特公昭48−1832
7号公報に記載されているようなポリエチレンテレフタ
レートフィルム上にアルミニウムシートが結合された複
合体シートも好ましい。Such supports include paper, paper laminated with plastics (eg, polyethylene, polypropylene, polystyrene, etc.), plates of metals such as aluminum (including aluminum alloys), zinc, copper, etc., cellulose diacetate, triacetate, etc. cellulose acetate, cellulose propionate,
Films of plastics such as cellulose acetate, cellulose acetate butyrate, cellulose nitrate, polyethylene terephthalate, polyethylene, polystyrene, polypropylene, polycarbonate, polyvinyl acetal, etc., and paper or plastic films laminated or vapor-deposited with the above metals are included. Among these supports, aluminum plates are preferred because they are extremely dimensionally stable, inexpensive, and have particularly good adhesion to the composition of the present invention. In addition, the special public official 1832-1832
Also preferred is a composite sheet in which an aluminum sheet is bonded onto a polyethylene terephthalate film as described in Japanese Patent No. 7.
また、金属、特にアルミニウムの支持体の場合には、砂
目立て処理、陽極酸化処理などの表面処理がなされてい
る事が好ましい。Further, in the case of a support made of metal, particularly aluminum, it is preferable that the support be subjected to surface treatment such as graining treatment or anodizing treatment.
さらに、表面の親水性を高める為に、珪酸ソーダ、弗化
ジルコニウム酸カリウム、燐酸塩等の水溶液への浸漬処
理が、行なわれる事が好ましい。Furthermore, in order to increase the hydrophilicity of the surface, it is preferable to perform an immersion treatment in an aqueous solution of sodium silicate, potassium fluorozirconate, phosphate, or the like.
米国特許第2,714,066号明細書に記載されてい
る如く、砂目立てしたのち珪酸ナトリウム水溶液に浸漬
処理されたアルミニウム板、特公昭47−5125号公
報に記載されているようにアルミニウム板を陽極酸化処
理したのちに、アルカリ金属珪酸塩の水溶液に浸漬処理
したものも好適に使用される。As described in U.S. Patent No. 2,714,066, an aluminum plate is grained and then immersed in an aqueous sodium silicate solution; as described in Japanese Patent Publication No. 47-5125; A material obtained by anodizing and then immersing in an aqueous solution of an alkali metal silicate is also suitably used.
また、米国特許第3.658,662号明細書に記載さ
れているようなシリケート電着も有効である。Also effective is silicate electrodeposition as described in U.S. Pat. No. 3,658,662.
更には特公昭46−27481号公報、特開昭52−5
8602号公報、特開昭52−30503号公報に開示
されているような電解グレインを施した支持体と、上記
陽極酸化処理及び珪酸ソーダ処理を組合せた表面処理も
有用である。Furthermore, Japanese Patent Publication No. 46-27481, Japanese Patent Publication No. 52-5
Also useful is a surface treatment that combines a support coated with electrolytic grains with the above-mentioned anodic oxidation treatment and sodium silicate treatment as disclosed in JP-A-8602 and JP-A-52-30503.
更には、特開昭56−28893号公報に開示されてい
るような、ブラシグレイン、電解グレイン、陽極酸化処
理さらに珪酸ソーダ処理を順に行ったものも好適である
。更にこれらの処理を行った後に、水溶性の樹脂、たと
えばポリビニルフォスホン酸、スルホン酸基を側鎖に有
する重合体および共重合体、ポリアクリル酸等を下塗り
したものも好適である。Furthermore, it is also preferable to use brush grain, electrolytic grain, anodic oxidation treatment, and sodium silicate treatment as disclosed in JP-A-56-28893. Furthermore, after these treatments, it is also suitable to apply an undercoat with a water-soluble resin such as polyvinylphosphonic acid, a polymer or copolymer having a sulfonic acid group in the side chain, polyacrylic acid, or the like.
これらの親水化処理は、支持体の表面を親水性とするた
めに施される以外に、その上に設けられる感光性組成物
との有害な反応を防ぐため、更には感光層との密着性の
向上等のために施される。These hydrophilic treatments are performed not only to make the surface of the support hydrophilic, but also to prevent harmful reactions with the photosensitive composition provided thereon, and to improve the adhesion with the photosensitive layer. This is done for the purpose of improving.
ものである。It is something.
中間接着性層として存在するネガ作用ジアゾ附脂として
は、各種公知の物が使用出来る。このようなジアゾ樹脂
としては4−ジアゾ−ジフェニルアミン、1−ジアゾ−
4−N、N−ジメチルアミノベンゼン、1 ”ア7’
4 N、 N−ジエチルアミノベンゼン、1−ジ
アゾ−4−N−エチル−N−ヒドロキシエチルアミノベ
ンゼン、l−ジアゾ−4−N−メチル−N−ヒドロキシ
エチルアミンベンゼン、1−ジアゾ−2,5−ジェトキ
シ−4−ベンゾイルアミノベンゼン、l−ジアゾ−4−
N−ベンジルアミノベンゼン、1 ”’アゾ−4−N
、 N−ジメチルアミノベンゼン、1−ジアゾ−4−モ
ルフォリノベンゼン、1−ジアゾ−2゜5−ジメトキシ
−4−p−トリルメルカプトベンゼン、1−ジアゾ−2
−エトキシ−4−N、N−ジメチルアミノベンゼン、p
−ジアゾ−ジメチルアニリン、1−ジアゾ−2,5−ジ
ブトキシ−4−モルフォリノベンゼン、l ”’アゾ
ー2.5−ジェトキシー4−モルフォリノベンゼン、1
−ジアゾ−2,5−ジメトキシ−4−モルフォリノベン
ゼン、1−ジアゾ−2,5−ジェトキシ−4−モルフォ
リノベンゼン、■−ジアゾー2. 5−ジェトキシ−4
−p−トリルメルカプトベンゼン、1−ジアゾ−3−二
トキシ−4−N−メチル−N−ベンジルアミノベンゼン
、1−ジアゾ−3−クロロ 4−N、N−ジエチルアミ
ノベンゼン、l−ジアゾ−3−メチル−4−ピロリジノ
ベンゼン、1−ジアゾ−2−クロロ−4−N、N−ジメ
チルアミノ−5−メトキシベンゼン、1−ジアゾ−3−
メトキシ−4−ピロリジノベンゼン、3−メトキシ−4
−ジアゾジフェニルアミン、3−エトキシ−4−ジアゾ
ジフェニルアミン、3− (n−プロポキシ)−4−ジ
アゾジフェニルアミン、3−インプロポキシ−4−ジア
ゾジフェニルアミンのようなジアゾモノマーと、ホルム
アルデヒド、アセトアルデヒド、プロピオンアルデヒド
、ブチルアセトアルデヒド、イソブチルアルデヒド、ま
たはベンズアルデヒドのような縮合剤をモル比で各々1
:1〜1:0.5、好ましくはl:o、8〜1:0.6
とし、これを通常の方法で縮合して得られた縮合物と陰
イオンとの反応生成物があげられる。Various known negative-acting diazo resins can be used as the intermediate adhesive layer. Such diazo resins include 4-diazo-diphenylamine and 1-diazo-diphenylamine.
4-N,N-dimethylaminobenzene, 1"A7'
4 N, N-diethylaminobenzene, 1-diazo-4-N-ethyl-N-hydroxyethylaminobenzene, l-diazo-4-N-methyl-N-hydroxyethylaminebenzene, 1-diazo-2,5-jethoxy -4-Benzoylaminobenzene, l-diazo-4-
N-benzylaminobenzene, 1''azo-4-N
, N-dimethylaminobenzene, 1-diazo-4-morpholinobenzene, 1-diazo-2゜5-dimethoxy-4-p-tolylmercaptobenzene, 1-diazo-2
-ethoxy-4-N,N-dimethylaminobenzene, p
-Diazo-dimethylaniline, 1-diazo-2,5-dibutoxy-4-morpholinobenzene, l'''Azo2,5-jetoxy-4-morpholinobenzene, 1
-Diazo-2,5-dimethoxy-4-morpholinobenzene, 1-diazo-2,5-jethoxy-4-morpholinobenzene, ■-Diazo2. 5-jetoxy-4
-p-tolylmercaptobenzene, 1-diazo-3-nitoxy-4-N-methyl-N-benzylaminobenzene, 1-diazo-3-chloro 4-N,N-diethylaminobenzene, l-diazo-3- Methyl-4-pyrrolidinobenzene, 1-diazo-2-chloro-4-N, N-dimethylamino-5-methoxybenzene, 1-diazo-3-
Methoxy-4-pyrrolidinobenzene, 3-methoxy-4
- diazo monomers such as diazodiphenylamine, 3-ethoxy-4-diazodiphenylamine, 3-(n-propoxy)-4-diazodiphenylamine, 3-impropoxy-4-diazodiphenylamine, formaldehyde, acetaldehyde, propionaldehyde, butyl A condensing agent such as acetaldehyde, isobutyraldehyde, or benzaldehyde in a molar ratio of 1
:1-1:0.5, preferably l:o, 8-1:0.6
An example is a reaction product of a condensate obtained by condensing this by a conventional method and an anion.
陰イオンとしては、四フッ化ホウ酸、六フッ化燐酸、ト
リイソプロピルナフタレンスルホン酸、5−ニトロオル
ト−トルエンスルホン酸、5−スルホサリチル酸、2,
5−ジメチルベンゼンスルホンM、2.4.6−)ジメ
チルベンゼンスルホシトロ−二トロベンゼンスルホン!
、3−クロロベンゼンスルホン酸、3−ブロモベンゼン
スルホン酸、2−フルオロカプリルナフタレンスルホン
酸、ドデシルベンゼンスルホン酸、1−ナフトール−5
−スルホン酸、2−メトキシ−4−ヒドロキシ−5−ベ
ンゾイル−ベンゼンスルホン酸、及びパラトルエンスル
ホン酸Y22nCβ2、等をあげることができる。これ
らの中でも特に六フッ化燐酸、トリイソプロピルナフタ
レンスルホン酸や2.5−ジメチルベンゼンスルホン酸
のごときアルキル芳香族スルホン酸が好適である。Examples of anions include tetrafluoroboric acid, hexafluorophosphoric acid, triisopropylnaphthalenesulfonic acid, 5-nitroortho-toluenesulfonic acid, 5-sulfosalicylic acid, 2,
5-dimethylbenzenesulfone M, 2.4.6-)dimethylbenzenesulfocitro-nitrobenzenesulfone!
, 3-chlorobenzenesulfonic acid, 3-bromobenzenesulfonic acid, 2-fluorocaprylnaphthalenesulfonic acid, dodecylbenzenesulfonic acid, 1-naphthol-5
-sulfonic acid, 2-methoxy-4-hydroxy-5-benzoyl-benzenesulfonic acid, and para-toluenesulfonic acid Y22nCβ2. Among these, alkyl aromatic sulfonic acids such as hexafluorophosphoric acid, triisopropylnaphthalenesulfonic acid and 2,5-dimethylbenzenesulfonic acid are particularly suitable.
このジアゾ樹脂層の厚みは広範囲に変更可能であるが、
露光した時に、上層の感光層と均一な結合形成反応を行
い得る厚みでなければならない。The thickness of this diazo resin layer can be varied over a wide range;
It must be thick enough to undergo a uniform bond-forming reaction with the upper photosensitive layer when exposed to light.
通常乾燥固体で1〜50mg/m2の塗布割合が良く、
5〜20mg/m’が特に良好である。Usually, a dry solid coating rate of 1 to 50 mg/m2 is good.
5 to 20 mg/m' is particularly good.
更に、ジアゾ樹脂層及び感光層中にジアゾ樹脂の安定化
剤としで、りん酸、亜りん酸、酒石酸、クエン酸、りん
ご酸、ジピコリン酸、多核芳香族スルホン酸およびその
塩、スルホサリチル酸等を必要に応じて添加することが
できる。Furthermore, phosphoric acid, phosphorous acid, tartaric acid, citric acid, malic acid, dipicolinic acid, polynuclear aromatic sulfonic acid and its salts, sulfosalicylic acid, etc. are added as stabilizers for the diazo resin in the diazo resin layer and photosensitive layer. It can be added as needed.
本発明の感光性平版印刷版をメタルハライドランプ、高
圧水銀灯などのような紫外線に富んだ光源を用いて画像
露光し、現像液で処理して感光層の未露光部を除去し、
最後にガム液を塗布することにより平版印刷版とする。The photosensitive lithographic printing plate of the present invention is imagewise exposed using a light source rich in ultraviolet rays such as a metal halide lamp or a high-pressure mercury lamp, and treated with a developer to remove unexposed areas of the photosensitive layer.
Finally, a lithographic printing plate is prepared by applying a gum liquid.
更に耐剛力を上げる為に現像後、後露光してもよい。上
記現像液として好ましいものは、ベンジルアルコール、
2−フェノキシエタノール、2−ブトキシェタノールの
ような有機溶媒を少量含むアルカリ水溶液であり、例え
ば米国特許第3,475.17着1号および同第3.6
15,480号に記載されているものを挙げることがで
きる。更に、特開昭50−26601号、特公昭56−
39464号、同56−42860号の各公報に記載さ
れている現像液も本発明の感光性平版印刷版の現像液と
して優れている。In order to further increase stiffness resistance, post-exposure may be performed after development. Preferred as the developer are benzyl alcohol,
It is an alkaline aqueous solution containing a small amount of an organic solvent such as 2-phenoxyethanol or 2-butoxyshetanol, for example, U.S. Patent Nos. 3,475.17-1 and 3.6.
Examples include those described in No. 15,480. Furthermore, JP-A No. 50-26601, JP-A No. 56-
The developers described in Patent Publications No. 39464 and No. 56-42860 are also excellent as developers for the photosensitive lithographic printing plate of the present invention.
本発明の感光性平版印刷版は高感度であり、かつ、耐刷
性にすぐれた平版印刷版を与える。The photosensitive lithographic printing plate of the present invention has high sensitivity and provides a lithographic printing plate with excellent printing durability.
以下、実施例に基づいて更に詳細に説明する。 Hereinafter, it will be explained in more detail based on examples.
実施例1
厚さ0.30 +++mのアルミニウム板をナイロンブ
ラシと400メツシユのパミストンの水懸濁液を用いそ
の表面を砂目立てした後、よく水で洗浄した。Example 1 The surface of an aluminum plate having a thickness of 0.30 +++ m was grained using a nylon brush and a water suspension of 400 mesh pumice stone, and then thoroughly washed with water.
10%水酸化ナトリウムに70℃で60秒間浸漬してエ
ツチングした後、流水で水洗後20%HNO。After etching by immersing in 10% sodium hydroxide at 70°C for 60 seconds, washing with running water and 20% HNO.
で中和洗浄、水洗した。これをVA = 12.7 v
の条件下で正弦波の交番波形電流を用いて1%硝酸水溶
液中で160ク一ロン/dm”の陽極特電気量で電解粗
面化処理を行った。その表面粗さを測定したところ、0
.6μ(Ra表示)であった。ひきつづいて30%のH
2SO,水溶液中に浸漬し55℃で2分間デスマット処
理した後、20%)I2SO,水溶液中、電流密度2
A/dm”において厚さが2.7 g/m2となるよう
に2分間陽極酸化処理した。その後70℃のケイ酸ソー
ダ2.5%水溶液に1分間浸漬し、水洗し、乾燥させた
。Neutralized and washed with water. This is VA = 12.7 v
Electrolytic surface roughening treatment was carried out in a 1% nitric acid aqueous solution using a sinusoidal alternating waveform current under the conditions of 160 corons/dm" of anode special electricity. When the surface roughness was measured, 0
.. It was 6 μ (expressed as Ra). Continuing to 30% H
After immersing in 2SO, aqueous solution and desmutting for 2 minutes at 55°C, 20%) I2SO, in aqueous solution, current density 2
A/dm" and anodized for 2 minutes to a thickness of 2.7 g/m2. Thereafter, it was immersed in a 2.5% aqueous solution of sodium silicate at 70° C. for 1 minute, washed with water, and dried.
次に下記のジアゾ樹脂液を調製した。Next, the following diazo resin liquid was prepared.
この液を回転塗布機を用いて、先の基板上に乾燥後の重
量にしてI Ofl1g/[11” となるように塗布
した。This liquid was applied onto the previous substrate using a spin coater so that the weight after drying would be IOfl1g/[11''.
次いで、80℃で1分間乾燥した。Then, it was dried at 80° C. for 1 minute.
次に、下記感光性組成物■を調製した。Next, the following photosensitive composition (2) was prepared.
感光性組成物■
メチルメタクリレート/N(2−(メククリロイルオキ
シ)エチルE−2.3−ジメチルマレイミド/メタクリ
ル酸=15/65/20(重量比)共重合体
5g・下記構造式で表わされる増感剤
・プロピレングリコールモノメチルエーテル0g
・メチルエチルケトン 50g・メガ
ファックF−177(大日本インキ側製、フッ素系ノニ
オン系界面活性剤) 0.03g・銅フタロシアニン
顔料(CI Pigment Blue 15)の可塑
剤10%分散液 1.0gこの感光性組成
物を先のジアゾ樹脂を設けた基板の上に回転塗布機を用
いて、乾燥後の重量にして、1.5g/m2となるよう
に塗布した。Photosensitive composition ■ Methyl methacrylate/N(2-(meccryloyloxy)ethyl E-2.3-dimethylmaleimide/methacrylic acid = 15/65/20 (weight ratio) copolymer
5g・Sensitizer represented by the following structural formula・Propylene glycol monomethyl ether 0g・Methyl ethyl ketone 50g・Megafac F-177 (manufactured by Dainippon Ink, fluorine-based nonionic surfactant) 0.03g・Copper phthalocyanine pigment (CI) Pigment Blue 15) 10% plasticizer dispersion 1.0 g of this photosensitive composition was applied onto the substrate provided with the diazo resin using a spin coater, and the weight after drying was 1.5 g/m2. It was applied so that
次いで、80℃で2分間乾燥した。Then, it was dried at 80° C. for 2 minutes.
こうして得られた印刷版をAとする。The printing plate thus obtained is referred to as A.
(比較例)
実施例1と同じ基板上に、ジアゾ樹脂層を設けず、この
感光液を乾燥重量で1.5 g/m2となるように塗布
、乾燥して印刷版Bを得た。(Comparative Example) On the same substrate as in Example 1, without providing a diazo resin layer, this photosensitive liquid was applied to a dry weight of 1.5 g/m 2 and dried to obtain printing plate B.
これらの感光板にステップウェッジ(濃度段差0.15
、濃度段数15段)を密着させ、米国ヌアーク社製プリ
ンター(2K”vVメタルハライドランプ)で10カウ
ント露光した。露光後下記の現像液で25℃、1分間現
像し印刷版を得た。A step wedge (density step of 0.15
, 15 density steps) and exposed for 10 counts using a printer (2K''vV metal halide lamp) manufactured by Nuark, USA. After exposure, development was performed at 25° C. for 1 minute with the following developer to obtain a printing plate.
現像液
ベンジルアルコール 4.5gイソプ
ロピルナフタレンスルホン酸
のす) IJウム塩の38%水溶液 4,5gトリ
エタノールアミン 1.5gモノエタ
ノールアミン 0.1g亜硫酸ナトリ
ウム 0.3g純 水
100g(結果)
本発明の印刷版Aは、画像もしっかりしており感度も高
いが、Bは基板との密着が悪い為、感度が低いばかりで
なく、画像部に、現像時にわずかにこすった時のキズが
無数についていた。Developer solution Benzyl alcohol 4.5g Isopropylnaphthalene sulfonic acid 38% aqueous solution of IJium salt 4.5g Triethanolamine 1.5g Monoethanolamine 0.1g Sodium sulfite 0.3g Pure water
100g (Results) Printing plate A of the present invention has a solid image and high sensitivity, but printing plate B has poor adhesion to the substrate, so not only is the sensitivity low, but the image area was slightly rubbed during development. It had countless scratches from time.
これら印刷版を、ハイデルSOR印刷機に取り付は印刷
した所、Aは5万枚の印刷物、を得る事が出きたが、B
の印刷枚数は1.000枚で、細部の網がとび、調子再
現性の悪いサンプルしか得られず、又、10,000枚
で画像全体に摩擦が生じた。When these printing plates were attached to a Heidel SOR printing machine and printed, A was able to obtain 50,000 prints, but B
The number of copies printed was 1,000, and only samples with poor tone reproducibility were obtained because the details were missing, and friction occurred on the entire image after 10,000 copies were printed.
〔実施例2〕
実施例1で用いたのと同じ基板に、下記のジアゾ樹脂液
を塗布乾燥した。乾燥重量は10mg/m2となるよう
調整した。[Example 2] The following diazo resin liquid was applied to the same substrate as used in Example 1 and dried. The dry weight was adjusted to 10 mg/m2.
次に下記感光液■を調製した。Next, the following photosensitive solution (2) was prepared.
感光液■
ON−[:2−(メタクリロイルオキシエチル]−2,
3−ジメチルマレイミド/メタクリル酸=85/15
(重量比)共重合体 5g○ 下記増感剤
○
○
○
メガファックF−177(大日本インキ側製、フッ素系
ノニオン界面活性剤) 0.03g銅フタロシアニ
ン顔料(CI PigmentBlue 15)の可塑
剤10%分散液 1.0gメチルエチルケトン
50g○ プロピレングリコールモノメチル
エーテル0g
この感光性組成物を先のジアゾ樹脂を塗布した基板に回
転塗布機を用いて、乾燥後の重量にして、1、5 g/
m2となるように塗布した。この印刷版をCとした。Photosensitive liquid■ ON-[:2-(methacryloyloxyethyl]-2,
3-dimethylmaleimide/methacrylic acid = 85/15
(Weight ratio) Copolymer 5g ○ The following sensitizer ○ ○ Megafac F-177 (manufactured by Dainippon Ink, fluorine-based nonionic surfactant) 0.03g Copper phthalocyanine pigment (CI Pigment Blue 15) plasticizer 10 % dispersion 1.0g methyl ethyl ketone
50g○ Propylene glycol monomethyl ether 0g This photosensitive composition was applied to the substrate coated with the diazo resin using a spin coating machine, and the weight after drying was 1.5 g/
It was applied so that it became m2. This printing plate was designated as C.
(比較例2)
感光液Hの中へP−ジアゾジフェニルアミンとホルムア
ルデヒドとの綜合物のPFs塩を0.2g添加した、感
光液■を作成した。(Comparative Example 2) A photosensitive solution (2) was prepared by adding 0.2 g of PFs salt, which is a composite of P-diazodiphenylamine and formaldehyde, to the photosensitive solution (H).
実施例1で用いた基板に、ジアゾ(封脂層を設けずに、
感光液■を塗布・乾燥した。乾燥重量は1.5g/m”
であった。この印刷版をDとした。The substrate used in Example 1 was coated with diazo (without a sealing layer).
A photosensitive solution (■) was applied and dried. Dry weight is 1.5g/m”
Met. This printing plate was designated as D.
又、この感光液■を室内で一晩放冒した所、底に顔料の
沈でんが生じた。Furthermore, when this photosensitive solution (2) was left indoors overnight, pigment sedimentation was observed at the bottom.
(結果) 実施例1と同様に、露光・現像した結果を示す。(result) Similarly to Example 1, the results of exposure and development are shown.
又、印刷時に得られた耐刷枚数を示す。It also shows the number of printed sheets obtained during printing.
本発明の印刷版Cの方が、 高感度であり、 高耐 剛性を示した。The printing plate C of the present invention is more High sensitivity, High durability It showed stiffness.
又、 塗布液の安定性にもすぐれて いた。or, Excellent stability of coating liquid there was.
手
続
補
正
書
1、事件の表示
昭和63年特許願第277
103号
4、代
理
人
5、補正命令の日付
自
発
6、補正の対象
明細書の発明の詳細な説明の欄
7、補正の内容
明細書第7頁第19行の“とじてはチオキサン”を「と
じてはチオキサントン」と訂正する。Procedural amendment 1, indication of the case 1988 Patent Application No. 277-103 4, agent 5, date of amendment order 6, column 7 for detailed explanation of the invention in the specification to be amended, description of the contents of the amendment On page 7, line 19, "tojite thioxane" is corrected to "tojite thioxanthone."
Claims (1)
ネガ作用ジアゾ樹脂層と、マレイミド基を側鎖に有する
光網状化可能な重合体を有する感光層を設けた事を特徴
とする感光性平版印刷版。A photosensitive material comprising a support having a hydrophilic surface, a negative working diazo resin layer as an intermediate adhesive layer, and a photosensitive layer having a photoreticulable polymer having a maleimide group in its side chain. Lithographic printing plate.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63277103A JP2852520B2 (en) | 1988-11-01 | 1988-11-01 | Photosensitive lithographic printing plate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63277103A JP2852520B2 (en) | 1988-11-01 | 1988-11-01 | Photosensitive lithographic printing plate |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH02123361A true JPH02123361A (en) | 1990-05-10 |
JP2852520B2 JP2852520B2 (en) | 1999-02-03 |
Family
ID=17578821
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63277103A Expired - Lifetime JP2852520B2 (en) | 1988-11-01 | 1988-11-01 | Photosensitive lithographic printing plate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2852520B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04219759A (en) * | 1990-12-20 | 1992-08-10 | Fuji Photo Film Co Ltd | Manufacture of plate for planography |
JPH04274429A (en) * | 1991-03-01 | 1992-09-30 | Fuji Photo Film Co Ltd | Photosensitive planographic printing plate |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS507481A (en) * | 1973-05-18 | 1975-01-25 | ||
JPS53145706A (en) * | 1977-05-19 | 1978-12-19 | Polychrome Corp | Lithographic printing plate capable of developing with water with double photosensitive layer |
JPS55160010A (en) * | 1979-05-18 | 1980-12-12 | Ciba Geigy Ag | Photocurable copolymer* polymer image forming photosensitive recording material and method of forming colored photograph polymer image |
JPS5953836A (en) * | 1982-09-21 | 1984-03-28 | Fuji Photo Film Co Ltd | Photosensitive lithographic plate |
JPS59208552A (en) * | 1983-05-12 | 1984-11-26 | Fuji Yakuhin Kogyo Kk | Photosensitive lithographic printing plate |
JPS6285255A (en) * | 1985-10-09 | 1987-04-18 | Fuji Photo Film Co Ltd | Photosensitive lithographic printing plate |
JPS62294238A (en) * | 1986-06-13 | 1987-12-21 | Fuji Photo Film Co Ltd | Photosensitive composition |
-
1988
- 1988-11-01 JP JP63277103A patent/JP2852520B2/en not_active Expired - Lifetime
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS507481A (en) * | 1973-05-18 | 1975-01-25 | ||
JPS53145706A (en) * | 1977-05-19 | 1978-12-19 | Polychrome Corp | Lithographic printing plate capable of developing with water with double photosensitive layer |
JPS55160010A (en) * | 1979-05-18 | 1980-12-12 | Ciba Geigy Ag | Photocurable copolymer* polymer image forming photosensitive recording material and method of forming colored photograph polymer image |
JPS5953836A (en) * | 1982-09-21 | 1984-03-28 | Fuji Photo Film Co Ltd | Photosensitive lithographic plate |
JPS59208552A (en) * | 1983-05-12 | 1984-11-26 | Fuji Yakuhin Kogyo Kk | Photosensitive lithographic printing plate |
JPS6285255A (en) * | 1985-10-09 | 1987-04-18 | Fuji Photo Film Co Ltd | Photosensitive lithographic printing plate |
JPS62294238A (en) * | 1986-06-13 | 1987-12-21 | Fuji Photo Film Co Ltd | Photosensitive composition |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04219759A (en) * | 1990-12-20 | 1992-08-10 | Fuji Photo Film Co Ltd | Manufacture of plate for planography |
JPH04274429A (en) * | 1991-03-01 | 1992-09-30 | Fuji Photo Film Co Ltd | Photosensitive planographic printing plate |
Also Published As
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JP2852520B2 (en) | 1999-02-03 |
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