JPH02117015A - Manufacture of transparent electrode - Google Patents

Manufacture of transparent electrode

Info

Publication number
JPH02117015A
JPH02117015A JP63270403A JP27040388A JPH02117015A JP H02117015 A JPH02117015 A JP H02117015A JP 63270403 A JP63270403 A JP 63270403A JP 27040388 A JP27040388 A JP 27040388A JP H02117015 A JPH02117015 A JP H02117015A
Authority
JP
Japan
Prior art keywords
conductive filler
resin
transparent electrode
membrane
transparent electrodes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP63270403A
Other languages
Japanese (ja)
Inventor
Kane Watanabe
渡邊 苞
Junichi Aoyama
淳一 青山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Miura Printing Corp
Original Assignee
Miura Printing Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Miura Printing Corp filed Critical Miura Printing Corp
Priority to JP63270403A priority Critical patent/JPH02117015A/en
Publication of JPH02117015A publication Critical patent/JPH02117015A/en
Pending legal-status Critical Current

Links

Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy

Landscapes

  • Photovoltaic Devices (AREA)
  • Non-Insulated Conductors (AREA)

Abstract

PURPOSE:To make it possible to mass-produce patterned transparent electrodes in a short time by coating the base with paste consisting of a resin in which conductive filler with a mean particle diameter less than 0.4mum is dispersed by printing, and drying the coating membrane. CONSTITUTION:A paste made by dispersing 100 wt.pt. or more of conductive filler with the mean diameter less than 0.4mum, to 100 wt.pt. of resin in a resin is spread on a base in the printing method, and dried to form a transparent electrode. That is, by making the particle diameter of the conductive filler less than the wavelength of the visible light, transparency is given to the membrane. And by making the weight ratio of conductive filler to resin unity or more, particles of conductive filler after drying are completely or almost brought into contact with each other, and a membrane with a very high conductivity is formed. Consequently, patterned transparent electrodes can be mass-produced in a short time.

Description

【発明の詳細な説明】 〈産業上の利用分野〉 本発明は、液晶表示装置、太陽電池、透明タブレット、
液晶調光ガラス、防曇ガラス等に使用される透明電極の
製造方法に関するものである。
[Detailed Description of the Invention] <Industrial Application Field> The present invention is applicable to liquid crystal display devices, solar cells, transparent tablets,
The present invention relates to a method for producing transparent electrodes used in liquid crystal light control glass, anti-fog glass, etc.

〈従来の技術〉 従来、透明電極の製造方法としては酸化錫等の薄膜を加
水分解を利用するスプレー法や塗布法、熱分解反応を利
用する化学的気相蒸着法(以下FCVD法」と略称する
。)等の化学的成膜法、または、酸化インジウム、酸化
錫などの半導体薄膜や金5 銀、銅、パラジウム、ロジ
ウム、アルミニウム等の金属薄膜を物理的気相体積法(
以下rPVD法Jと略称する。 )で形成していた。
<Conventional technology> Conventionally, methods for manufacturing transparent electrodes include spraying and coating methods that utilize hydrolysis of thin films such as tin oxide, and chemical vapor deposition (hereinafter abbreviated as FCVD method) that utilizes thermal decomposition reactions. ), or physical vapor deposition method (
Hereinafter, it will be abbreviated as rPVD method J. ) was formed.

〈発明が解決しようとする問題点〉 スプレー法や塗布法は一般的に処理温度が高く、基板温
度が400 ’C〜600 ’Cになることが多かった
。このため、染料及び有機顔料を発色材料としているカ
ラーフィルタを有するガラス基板に透明電極を設ける場
合は該染料及び有機顔料が退色してしまうという欠点が
あった。
<Problems to be Solved by the Invention> Spraying methods and coating methods generally require high processing temperatures, and the substrate temperature often ranges from 400'C to 600'C. For this reason, when a transparent electrode is provided on a glass substrate having a color filter using dyes and organic pigments as coloring materials, there is a drawback that the dyes and organic pigments discolor.

CvO法は酸化錫で数多く試みられているが、原料とし
ては気化しやすい液体や固体しか用いることが出来ない
ので、原料の選択範囲が限られてしまうという欠点があ
った。
Many attempts have been made to use tin oxide in the CvO method, but it has the disadvantage that only liquids and solids that are easily vaporized can be used as raw materials, which limits the range of raw materials that can be selected.

PVD法には真空蒸着法、イオンブレーティング法、ス
パッタ蒸着法、分子線結晶成長法などが含まれるが、い
ずれも真空状態での成膜処理であるためにバッチ処理に
ならざるを慢ず、生産時間を長くする原因の一つになっ
ていた。また、成膜処理温度が非常に高いために、基板
温度が2゜0℃以上に上昇することが多く、耐熱性の弱
い基板には利用できないという欠点があった。さらに、
透明電極を基板上に選択的に形成する場合には、PVD
法で全面成膜した後でパターンエツチング等の処理が必
要であった。
PVD methods include vacuum evaporation method, ion blating method, sputter evaporation method, molecular beam crystal growth method, etc., but all of them require batch processing because they are film forming processes in a vacuum state. This was one of the causes of longer production times. Furthermore, since the film-forming process temperature is very high, the substrate temperature often rises to 2.0° C. or more, which has the disadvantage that it cannot be used for substrates with weak heat resistance. moreover,
When selectively forming transparent electrodes on a substrate, PVD
After forming a film on the entire surface using a method, processing such as pattern etching was required.

く問題を解決するための手段〉 重量比で樹脂]、00部に対して平均粒径が0゜4μm
以下の導電性フィラー1. O0部以上を該樹脂に分散
させたペーストを印刷方式により基板に塗布し、乾燥さ
せて透明電極を形成する。
Means for solving the problem〉 Resin by weight ratio], average particle size is 0°4 μm per 00 parts
The following conductive fillers 1. A paste in which 0 parts or more is dispersed in the resin is applied to a substrate by a printing method and dried to form a transparent electrode.

〈発明の作用〉 本発明は、導電性フィラーの粒径を可視光の波長以下に
することにより被膜に透明性を持たせるものである。ま
た、導電性フィラーの含有量を重量比で樹脂100部に
対して導電性フィラー100部以上にすることにより、
乾燥後の被膜中で導電性フィラーが互いに接触するか、
あるいは近接した位置に存在することになり、極めて高
い導電性を持つ被膜を形成する。この時、導電性フィラ
ーが互いに接触せずに近接した位置に存在する場合の導
電性は、熱電子放出やトンネル効果によるものと考えら
れる。
<Action of the Invention> The present invention provides transparency to the film by making the particle size of the conductive filler smaller than the wavelength of visible light. In addition, by setting the content of the conductive filler to 100 parts or more of the conductive filler to 100 parts of the resin by weight,
Do the conductive fillers touch each other in the film after drying?
Alternatively, they may exist in close proximity, forming a coating with extremely high conductivity. At this time, conductivity when the conductive fillers are located close to each other without contacting each other is considered to be due to thermionic emission or tunnel effect.

〈実施例〉 重量比で、アクリル系樹脂(商品名アルマテックスD1
51 溶剤分30% 三井東圧化学(株)製造)100
部に対して、ITO微粉末(粒径0.02〜0.08μ
m)200部の割合で混ぜ合わせ、ペースト状の導電性
インキを作成した。
<Example> In terms of weight ratio, acrylic resin (trade name Almatex D1
51 Solvent content 30% Manufactured by Mitsui Toatsu Chemical Co., Ltd.) 100
part, ITO fine powder (particle size 0.02~0.08μ
m) 200 parts were mixed to prepare a paste-like conductive ink.

このインキを用いてガラス基板上にオフセット印刷法で
ストライプ状パターンを印刷した。その後、150℃の
オーブン中で30分間乾燥させた。このようにして出来
たストライプパターン状の透明電極は表面抵抗値が40
00Ω/口、光透過率が85%であった。
Using this ink, a striped pattern was printed on a glass substrate by an offset printing method. Thereafter, it was dried for 30 minutes in an oven at 150°C. The striped pattern transparent electrode made in this way has a surface resistance value of 40.
00Ω/mouth, and the light transmittance was 85%.

〈発明の効果〉 本発明によれば、スクリーン印刷法、フレキソ印刷法等
全ての印刷方式が利用できるために簡単な工程でパター
ンニングされた透明電極を短時間で量産することが出来
る。また、処理温度が低いために耐熱性の弱い基板にも
透明電極を形成することが出来る。さらに、原料の導電
性フィラーの選択範囲も広いために用途に応じた原料を
用0ることか出来る。
<Effects of the Invention> According to the present invention, patterned transparent electrodes can be mass-produced in a short time with simple steps because all printing methods such as screen printing and flexographic printing can be used. Furthermore, since the processing temperature is low, transparent electrodes can be formed even on substrates with weak heat resistance. Furthermore, since there is a wide selection range of conductive fillers as raw materials, raw materials can be used depending on the purpose.

特許出願人  三浦印刷株式会社Patent applicant: Miura Printing Co., Ltd.

Claims (2)

【特許請求の範囲】[Claims] (1)平均粒径が0.4μm以下の導電性フィラーを樹
脂に分散させたペーストを印刷方式により基板に塗布す
る工程と、該塗布膜を乾燥させる工程とを含むことを特
徴とする透明電極の製造方法。
(1) A transparent electrode characterized by comprising the steps of applying a paste in which a conductive filler with an average particle size of 0.4 μm or less is dispersed in a resin to a substrate by a printing method, and drying the applied film. manufacturing method.
(2)特許請求の範囲第1項記載の透明電極の製造方法
において、ペーストの導電性フィラーの含有量を、重量
比で樹脂100部に対して導電性フィラー100部以上
にすることを特徴とする透明電極の製造方法。
(2) The method for manufacturing a transparent electrode according to claim 1, characterized in that the content of the conductive filler in the paste is at least 100 parts by weight per 100 parts of the resin. A method for manufacturing a transparent electrode.
JP63270403A 1988-10-26 1988-10-26 Manufacture of transparent electrode Pending JPH02117015A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63270403A JPH02117015A (en) 1988-10-26 1988-10-26 Manufacture of transparent electrode

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63270403A JPH02117015A (en) 1988-10-26 1988-10-26 Manufacture of transparent electrode

Publications (1)

Publication Number Publication Date
JPH02117015A true JPH02117015A (en) 1990-05-01

Family

ID=17485775

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63270403A Pending JPH02117015A (en) 1988-10-26 1988-10-26 Manufacture of transparent electrode

Country Status (1)

Country Link
JP (1) JPH02117015A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000002891A (en) * 1998-04-17 2000-01-07 Seiko Instruments Inc Reflection type liquid crystal display device and its production
JP2009509353A (en) * 2005-09-27 2009-03-05 エルジー・ケム・リミテッド Method of forming buried contact electrode of pn junction semiconductor element and optoelectronic semiconductor element using the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000002891A (en) * 1998-04-17 2000-01-07 Seiko Instruments Inc Reflection type liquid crystal display device and its production
JP2009509353A (en) * 2005-09-27 2009-03-05 エルジー・ケム・リミテッド Method of forming buried contact electrode of pn junction semiconductor element and optoelectronic semiconductor element using the same

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