JPH02113217A - Measuring endoscope device - Google Patents

Measuring endoscope device

Info

Publication number
JPH02113217A
JPH02113217A JP63266193A JP26619388A JPH02113217A JP H02113217 A JPH02113217 A JP H02113217A JP 63266193 A JP63266193 A JP 63266193A JP 26619388 A JP26619388 A JP 26619388A JP H02113217 A JPH02113217 A JP H02113217A
Authority
JP
Japan
Prior art keywords
light
linear pattern
pattern
optical path
pattern light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP63266193A
Other languages
Japanese (ja)
Inventor
Satoshi Saito
智 斎藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP63266193A priority Critical patent/JPH02113217A/en
Publication of JPH02113217A publication Critical patent/JPH02113217A/en
Pending legal-status Critical Current

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  • Endoscopes (AREA)
  • Instruments For Viewing The Inside Of Hollow Bodies (AREA)

Abstract

PURPOSE:To represent the line of a linear pattern on an object uniformly and sharply and to increase the quantity of pattern light for projecting a linear pattern by inserting and arranging a slit which controls the width of an optical path perpendicular to a component of the linear pattern light. CONSTITUTION:An observation window 2 is formed in the flank of a scope tip part 1 and an image of the object which is lighted is picked up by a solid image pickup element 3 through the observation window 2; and this endoscope 4 of this sideward view structure is equipped with a pattern projection part 5. The pattern projection part 5 is constituted by inserting and arranging the slit 9 which controls the width of the optical path perpendicular to the line component of the linear pattern light on the optical path between a converging lens 7 which converges coherent laser light projected from an optical fiber 6 and a diffraction grating 8 which diffracts the converged light from the converging lens 7 to obtain the linear pattern light. Consequently, the linear pattern light on the object is represented uniformly and clearly and the quantity of the linear pattern light in the line direction is sufficiently secured.

Description

【発明の詳細な説明】 [発明の目的] (産業上の利用分野) 本発明は、パターン投影法により立体計測を行なえる計
測内視鏡装置に関し、特に内視鏡スコープの先端部に設
けるパターン投影部の構造の改良に関する。
[Detailed Description of the Invention] [Object of the Invention] (Industrial Application Field) The present invention relates to a measurement endoscope device that can perform three-dimensional measurement using a pattern projection method, and in particular, to a measurement endoscope device that can perform three-dimensional measurement using a pattern projection method. This invention relates to improvements in the structure of a projection section.

(従来の技術) 従来、この種の計測内視鏡装置として、焦束レンズによ
り焦束されたレーザ光を回折格子により回折して被写体
へ回折パターン光を投影し、回折パターンの投影像を固
体搬像素子により撮像して得られる映像信号を基に、画
像処理手段において所定の同値以上の信号強度を有する
画素を抽出するとともにこの抽出点毎に輝度の大小に応
じて回折の次数を認識することによりパターン抽出座標
を生成し、このパターン抽出座標により被写体の凹凸等
の表面形状を計測可能とした計測内視鏡装置が提案され
、実用に供されている。
(Prior art) Conventionally, in this type of measurement endoscope device, a laser beam focused by a focusing lens is diffracted by a diffraction grating, a diffraction pattern light is projected onto a subject, and a projected image of the diffraction pattern is transferred to a solid state. Based on the video signal obtained by imaging with the image carrier, an image processing means extracts pixels having a signal intensity equal to or higher than a predetermined value, and recognizes the order of diffraction at each extraction point according to the magnitude of brightness. A measurement endoscope apparatus has been proposed and put into practical use, which is capable of generating pattern extraction coordinates and measuring the surface shape of a subject, such as unevenness, using the pattern extraction coordinates.

このような計測内視鏡装置において、通常、回折パター
ンとしてライン状パターンが被写体に投影されるが、ラ
イン状パターンのラインが均−且つ鮮明に被写体に表わ
れていないと、固体m像素子によるパターンの受光状況
が不均一となる。この場合、固体撮像素子よりの映像信
号を基に画像処理手段にて正しく画像解析を行なうこと
ができず、所望の立体S1測を行なえないことになる。
In such measurement endoscope devices, a linear pattern is usually projected onto the subject as a diffraction pattern, but if the lines of the linear pattern are not uniformly and clearly displayed on the subject, the solid-state m-image element may The light reception situation of the pattern becomes uneven. In this case, the image processing means cannot correctly perform image analysis based on the video signal from the solid-state image pickup device, and the desired three-dimensional S1 measurement cannot be performed.

そこで、先に、焦束レンズの直径を小さくしたり、焦束
レンズと回折格子との間の光路上にピンホールを挿入配
置することにより、ライン状パターンを被写体に投影し
、ライン状パターンのラインを均−且つ鮮明に被写体上
に表わすことが提案された。
Therefore, by first reducing the diameter of the focusing lens or inserting a pinhole on the optical path between the focusing lens and the diffraction grating, a linear pattern is projected onto the subject. It has been proposed to represent lines evenly and clearly on a subject.

(発明が解決しようとする課題) しかしながら、上述した如く小径としだ焦束レンズを用
いたり、又はピンホールを用いたりすると、ライン状パ
ターンを均−且つ鮮明に被写体ヒに表わすことができる
反面、パターン光が極めて暗くなり、固体搬像素子の受
光感度を下まわるパターンの受光状況となることが多く
、やはり画像処理手段にて正しく画像解析を行なうこと
ができない。
(Problem to be Solved by the Invention) However, as described above, when using a small-diameter focusing lens or using a pinhole, a linear pattern can be uniformly and clearly displayed on the subject, but on the other hand, The pattern light often becomes extremely dark, resulting in a pattern light reception situation that is lower than the light reception sensitivity of the solid-state image carrier, and the image processing means cannot correctly perform image analysis.

本発明は、係る事情に鑑みてなされたもので、その目的
とするところは、ライン状パターンのラインを均−且つ
鮮明に被写体上に表わすとともに、そのライン状パター
ンを投影するためのパターン光の光量を飛躍的に増大す
ることができる計測内視鏡装置を提供することにある。
The present invention has been made in view of the above circumstances, and its purpose is to uniformly and clearly represent the lines of a linear pattern on a subject, and to use pattern light to project the linear pattern. An object of the present invention is to provide a measuring endoscope device that can dramatically increase the amount of light.

[発明の構成] (課題を解決するための手段) 本発明は、上記の目的を達成するため、パターン投影法
により立体計測が行なえる計測内視鏡装置において、内
視鏡スコープのスコープ先端部に、レーザ光を焦束光を
回・折してライン状パターン光を得る回折格子との間の
光路上で、前記ライン状パターン光の成分に対して直角
方向の光路幅を規制するスリットが挿入配置されてなる
パターン投影部を、具備することを要旨としている。
[Structure of the Invention] (Means for Solving the Problems) In order to achieve the above object, the present invention provides a measurement endoscope device capable of performing three-dimensional measurement using a pattern projection method. A slit is provided on the optical path between the laser beam and the diffraction grating that diffracts and refracts the focused light to obtain the linear pattern light, for regulating the optical path width in the direction perpendicular to the component of the linear pattern light. The gist of the present invention is to include a pattern projection section which is inserted and arranged.

(作用) 本発明による計測内視鏡装置であれば、回折格子から被
写体へライン状パターン光が投影された際、ライン状パ
ターン光のライン成分に対して直角方向の光路幅規制が
スリットによりなされる。
(Function) With the measurement endoscope device according to the present invention, when the line pattern light is projected from the diffraction grating onto the subject, the optical path width is regulated by the slit in the direction perpendicular to the line component of the line pattern light. Ru.

そのため、被写体上のライン状パターンのラインは、均
−且つ鮮明に表わされ、しかもそのライン状パターンの
ライン方向の光量が充分に確保される。その結果、被写
体上の投影パターン像を固体撮像素子で撮像して得られ
た映像信号を基に正しく画像解析を行なえることになる
Therefore, the lines of the linear pattern on the subject are displayed evenly and clearly, and a sufficient amount of light in the line direction of the linear pattern is ensured. As a result, image analysis can be performed correctly based on the video signal obtained by capturing the projected pattern image on the subject using the solid-state image sensor.

(実施例〉 第1図は、本発明が適用された一実施例の計測内視鏡装
置の要部をなす内視鏡スコープのスコープ先端部の概略
を示す構成図である。
(Embodiment) FIG. 1 is a configuration diagram schematically showing a scope distal end portion of an endoscope that constitutes a main part of a measuring endoscope apparatus according to an embodiment of the present invention.

この一実施例の計測内?JAma置は、スコープ先端部
1の側面に観察窓2を設け、この観察窓2を通して固体
撮像素子3により被写体を照明下で撮像する側方視構造
とした内視鏡スコープ4(第2図参照)に、パターン投
影部5を備えている。
Within the measurement of this one example? The JAma device has an observation window 2 on the side of the scope tip 1, and an endoscope 4 (see Fig. 2) that has a side view structure through which an object is imaged under illumination by a solid-state image sensor 3. ) is equipped with a pattern projection section 5.

パターン撮像部5は、光ファイバ6より出射されるコヒ
ーンレントなレーザ光を焦束する焦束レンズ7と、この
焦束レンズ7よりの焦束光を回折してライン状パターン
光を得る回折格子8との間の光路上で、上記ライン状パ
ターン光のライン成分に対して直角方向の光路幅を規制
するスリット9が挿入配置されてなる。
The pattern imaging unit 5 includes a focusing lens 7 that focuses coherent laser light emitted from the optical fiber 6, and a diffraction grating 8 that diffracts the focused light from the focusing lens 7 to obtain line-shaped pattern light. A slit 9 is inserted on the optical path between the two to regulate the optical path width in the direction perpendicular to the line component of the line pattern light.

また、このパターン投影部5の焦束レンズ7として、第
3図に示す如く、メニスクス、非球面、あるいはこれら
を組み合わせてなる平凸レンズ7aや、第4図に示す如
くシリンドリカルレンズ7bを用いることができる。
Further, as the focusing lens 7 of the pattern projection section 5, a plano-convex lens 7a formed of a meniscus lens, an aspherical surface, or a combination thereof as shown in FIG. 3, or a cylindrical lens 7b as shown in FIG. 4 may be used. can.

このようなパターン投影部5が内視鏡スコープ4に実装
されてあれば、回折格子8からミラー8a及び放射窓8
bを介して被写体へライン状パターン光が投影される状
態下でライン状パターン光のライン成分に対して直角方
向の光路幅規制がスリット9によりなされている。
If such a pattern projection unit 5 is mounted on the endoscope 4, the pattern projection unit 5 from the diffraction grating 8 to the mirror 8a and the emission window 8
The slit 9 regulates the optical path width in the direction perpendicular to the line component of the line pattern light under the condition in which the line pattern light is projected onto the subject through the line pattern light.

そのため、例えば第5図に示す如く被写体上にライン状
パターンが表わされる状態にあって、ライン状パターン
のライン直角方向(図示のY方向)はシャープに光量規
制がなされることにより、そのライン状パターンのライ
ンは均−且つ鮮明に表わされることになる。
Therefore, for example, when a line pattern is displayed on the subject as shown in Fig. 5, the amount of light is sharply regulated in the direction perpendicular to the line of the line pattern (Y direction in the figure). The lines of the pattern will be expressed evenly and clearly.

またライン状パターンのライン方向く図示のX方向)は
光量規制が無いため、明るさが充分に確保される。
Further, since there is no light quantity regulation in the line direction of the line pattern (X direction in the figure), sufficient brightness is ensured.

従って、観察窓2に入射されるライン状バターンの投影
像は、固体撮像素子3において高精度にライン状パター
ンを示す情報が与えられた電気信号となり、第6図に示
す如く装置本体10のビデオプロセッサ11へ送出され
る。このビデオプロセッサ11において固体撮像素子3
の電気信号がNTSC信号に変換されてTVモニタ12
へ送出される一方、NTSC信号の輝度成分が座標検出
部13へ送出される。ぞして、この座標検出部13にお
いて公知の解析処理により被写体表面の座標情報が高精
度に得られる。この座標情報を基にビデオプロセッサ1
1において病変部の大きさ、深さ等の立体計測が所望通
りに行なわれ、この立体計測内容をTVモニタ12上で
被写体画像とともに表示することができる。。
Therefore, the projected image of the linear pattern incident on the observation window 2 becomes an electrical signal provided with information indicating the linear pattern with high precision in the solid-state image sensor 3, and as shown in FIG. It is sent to the processor 11. In this video processor 11, the solid-state image sensor 3
The electrical signal is converted to an NTSC signal and sent to the TV monitor 12.
Meanwhile, the luminance component of the NTSC signal is sent to the coordinate detection section 13. Therefore, the coordinate information on the surface of the subject can be obtained with high precision by the known analysis process in the coordinate detecting section 13. Based on this coordinate information, video processor 1
1, stereoscopic measurements such as the size and depth of the lesion are performed as desired, and the contents of this stereoscopic measurement can be displayed on the TV monitor 12 together with the subject image. .

なお、ビデオプロセッサ11を制御中枢としてレーザ光
源装置14が駆動制御され、このレーザ光源装置から出
射されたレーザ光が光ファイバ6によりスコープ先端部
1まで伝播される。
The laser light source device 14 is driven and controlled using the video processor 11 as a control center, and the laser light emitted from the laser light source device is propagated to the scope tip 1 through the optical fiber 6.

[発明の効果] 以上説明したように、本発明が適用された計測内視M装
置は、焦束レンズよりの焦束光に対してスリットにより
ライン直角方向のみの光路幅を規制してその焦束光を回
折格子へ導くから、回折格子により被写体上に投影され
たライン状パターンは、ラインが均−且つ鮮明に表わさ
れ、ライン方向の明るさが充分に確保されるものである
。その結果、本発明によれば、被写体の立体計測を高精
度に行なうことが可能となる。
[Effects of the Invention] As explained above, the measurement endoscope M device to which the present invention is applied regulates the optical path width only in the direction perpendicular to the line using a slit for the focused light from the focusing lens, and focuses the focused light. Since the bundle of light is guided to the diffraction grating, the line pattern projected onto the subject by the diffraction grating is uniform and clearly represented, and sufficient brightness in the line direction is ensured. As a result, according to the present invention, it is possible to perform stereoscopic measurement of a subject with high precision.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明が適用された一実施例の計測内視鏡装置
の要部概略を示す構成図、第2図は内視鏡スコープの外
観概略を示す斜視図、第3図及び第4図は本発明の他実
施例のそれぞれ要部構成の概略を示す斜視図、第5図は
ライン状パターンの一例を示す模式図、第6図は本発明
の格実流例に適用された電気回路構成を示すブロック図
である。
FIG. 1 is a configuration diagram showing an outline of the main parts of a measuring endoscope device according to an embodiment of the present invention, FIG. 2 is a perspective view showing an outline of the external appearance of an endoscope, and FIGS. 5 is a schematic diagram showing an example of a line-shaped pattern, and FIG. 6 is a perspective view showing an outline of the configuration of main parts of other embodiments of the present invention. FIG. FIG. 2 is a block diagram showing a circuit configuration.

Claims (1)

【特許請求の範囲】[Claims] (1)パターン投影法により立体計測が行なえる計測内
視鏡装置において、内視鏡スコープのスコープ先端部に
、レーザ光を焦束する焦束レンズと、この焦束レンズよ
りの焦束光を回折してライン状パターン光を得る回折格
子との間の光路上で、前記ライン状パターン光の成分に
対して直角方向の光路幅を規制するスリットが挿入配置
されてなるパターン投影部を、具備することを特徴とす
る計測内視鏡装置。
(1) In a measurement endoscope device that can perform three-dimensional measurement using a pattern projection method, a focusing lens that focuses a laser beam is attached to the tip of the scope of an endoscope, and the focused light from this focusing lens is A pattern projection section is provided, in which a slit for regulating the optical path width in a direction perpendicular to the component of the linear pattern light is inserted on the optical path between the diffraction grating and the diffraction grating for diffracting the linear pattern light. A measurement endoscope device characterized by:
JP63266193A 1988-10-24 1988-10-24 Measuring endoscope device Pending JPH02113217A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63266193A JPH02113217A (en) 1988-10-24 1988-10-24 Measuring endoscope device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63266193A JPH02113217A (en) 1988-10-24 1988-10-24 Measuring endoscope device

Publications (1)

Publication Number Publication Date
JPH02113217A true JPH02113217A (en) 1990-04-25

Family

ID=17427548

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63266193A Pending JPH02113217A (en) 1988-10-24 1988-10-24 Measuring endoscope device

Country Status (1)

Country Link
JP (1) JPH02113217A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102011053129B4 (en) 2011-01-27 2019-04-25 National Taiwan University Of Science And Technology Pattern projection apparatus and method for dimension calculation

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102011053129B4 (en) 2011-01-27 2019-04-25 National Taiwan University Of Science And Technology Pattern projection apparatus and method for dimension calculation

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