JPH02111000A - Metallic thin film laminate for electromagnetic shielding - Google Patents
Metallic thin film laminate for electromagnetic shieldingInfo
- Publication number
- JPH02111000A JPH02111000A JP63263437A JP26343788A JPH02111000A JP H02111000 A JPH02111000 A JP H02111000A JP 63263437 A JP63263437 A JP 63263437A JP 26343788 A JP26343788 A JP 26343788A JP H02111000 A JPH02111000 A JP H02111000A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- metallic thin
- metal thin
- layer
- electromagnetic shielding
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010409 thin film Substances 0.000 title claims abstract description 62
- 229910052751 metal Inorganic materials 0.000 claims abstract description 76
- 239000002184 metal Substances 0.000 claims abstract description 76
- -1 polyethylene terephthalate Polymers 0.000 abstract description 31
- 229920000139 polyethylene terephthalate Polymers 0.000 abstract description 10
- 239000005020 polyethylene terephthalate Substances 0.000 abstract description 10
- 229920000515 polycarbonate Polymers 0.000 abstract description 8
- 239000004417 polycarbonate Substances 0.000 abstract description 8
- 238000000034 method Methods 0.000 abstract description 7
- 239000004745 nonwoven fabric Substances 0.000 abstract description 6
- 239000003973 paint Substances 0.000 abstract description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 5
- 229910052782 aluminium Inorganic materials 0.000 abstract description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract description 5
- 229930182556 Polyacetal Natural products 0.000 abstract description 4
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 abstract description 4
- 229910052802 copper Inorganic materials 0.000 abstract description 4
- 239000010949 copper Substances 0.000 abstract description 4
- 229920006255 plastic film Polymers 0.000 abstract description 4
- 239000002985 plastic film Substances 0.000 abstract description 4
- 229920006324 polyoxymethylene Polymers 0.000 abstract description 4
- 238000001771 vacuum deposition Methods 0.000 abstract description 2
- 239000002759 woven fabric Substances 0.000 abstract description 2
- 239000007767 bonding agent Substances 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 51
- 239000011888 foil Substances 0.000 description 15
- 239000000463 material Substances 0.000 description 15
- 230000000694 effects Effects 0.000 description 13
- 239000010408 film Substances 0.000 description 13
- 229920005989 resin Polymers 0.000 description 9
- 239000011347 resin Substances 0.000 description 9
- 239000004952 Polyamide Substances 0.000 description 7
- 239000004698 Polyethylene Substances 0.000 description 7
- 239000004743 Polypropylene Substances 0.000 description 7
- 229920002647 polyamide Polymers 0.000 description 7
- 229920000573 polyethylene Polymers 0.000 description 7
- 229920001155 polypropylene Polymers 0.000 description 7
- 229920000915 polyvinyl chloride Polymers 0.000 description 7
- 239000004800 polyvinyl chloride Substances 0.000 description 7
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- 239000004925 Acrylic resin Substances 0.000 description 5
- 229920000178 Acrylic resin Polymers 0.000 description 5
- 239000000853 adhesive Substances 0.000 description 5
- 230000001070 adhesive effect Effects 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 239000004744 fabric Substances 0.000 description 5
- 239000000123 paper Substances 0.000 description 5
- 238000012546 transfer Methods 0.000 description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 239000004962 Polyamide-imide Substances 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 4
- 239000001913 cellulose Substances 0.000 description 4
- 229920002678 cellulose Polymers 0.000 description 4
- 238000004806 packaging method and process Methods 0.000 description 4
- 229920002312 polyamide-imide Polymers 0.000 description 4
- 229920000728 polyester Polymers 0.000 description 4
- 229920002379 silicone rubber Polymers 0.000 description 4
- 239000004945 silicone rubber Substances 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 230000000007 visual effect Effects 0.000 description 4
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- 239000004640 Melamine resin Substances 0.000 description 3
- 229920000877 Melamine resin Polymers 0.000 description 3
- 239000000020 Nitrocellulose Substances 0.000 description 3
- 239000004642 Polyimide Substances 0.000 description 3
- 239000004721 Polyphenylene oxide Substances 0.000 description 3
- 239000004734 Polyphenylene sulfide Substances 0.000 description 3
- 239000004793 Polystyrene Substances 0.000 description 3
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 125000005907 alkyl ester group Chemical group 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 239000000470 constituent Substances 0.000 description 3
- 239000003822 epoxy resin Substances 0.000 description 3
- 239000005038 ethylene vinyl acetate Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 229920001220 nitrocellulos Polymers 0.000 description 3
- 239000005011 phenolic resin Substances 0.000 description 3
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 3
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 3
- 229920001707 polybutylene terephthalate Polymers 0.000 description 3
- 229920000647 polyepoxide Polymers 0.000 description 3
- 229920001721 polyimide Polymers 0.000 description 3
- 239000004926 polymethyl methacrylate Substances 0.000 description 3
- 229920006380 polyphenylene oxide Polymers 0.000 description 3
- 229920000069 polyphenylene sulfide Polymers 0.000 description 3
- 229920002223 polystyrene Polymers 0.000 description 3
- 229920002689 polyvinyl acetate Polymers 0.000 description 3
- 239000011118 polyvinyl acetate Substances 0.000 description 3
- 239000005033 polyvinylidene chloride Substances 0.000 description 3
- 229920003048 styrene butadiene rubber Polymers 0.000 description 3
- 229920003051 synthetic elastomer Polymers 0.000 description 3
- 229920003002 synthetic resin Polymers 0.000 description 3
- 239000000057 synthetic resin Substances 0.000 description 3
- 239000005061 synthetic rubber Substances 0.000 description 3
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 3
- 229920006305 unsaturated polyester Polymers 0.000 description 3
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 239000012790 adhesive layer Substances 0.000 description 2
- 238000005452 bending Methods 0.000 description 2
- 238000009820 dry lamination Methods 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 229920001568 phenolic resin Polymers 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229920005862 polyol Polymers 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- DTCCVIYSGXONHU-CJHDCQNGSA-N (z)-2-(2-phenylethenyl)but-2-enedioic acid Chemical compound OC(=O)\C=C(C(O)=O)\C=CC1=CC=CC=C1 DTCCVIYSGXONHU-CJHDCQNGSA-N 0.000 description 1
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 229920000297 Rayon Polymers 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229920002433 Vinyl chloride-vinyl acetate copolymer Polymers 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000004760 aramid Substances 0.000 description 1
- 229920003235 aromatic polyamide Polymers 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 1
- 239000004566 building material Substances 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 125000005442 diisocyanate group Chemical group 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000007731 hot pressing Methods 0.000 description 1
- 239000012943 hotmelt Substances 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000002655 kraft paper Substances 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- 125000000325 methylidene group Chemical group [H]C([H])=* 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000002964 rayon Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000004753 textile Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000011179 visual inspection Methods 0.000 description 1
- 230000037303 wrinkles Effects 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Landscapes
- Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
Abstract
Description
【発明の詳細な説明】
[技術分野]
本発明は、電磁波シールド用金属薄膜積層体に関するも
のである。さらに詳しくは、エレクトロニクス機器のハ
ウジング、絶縁電線、電カケープルの被覆、建材(床、
壁、天井、カーテンなど)などに使用したり、電子機器
および磁気記録体などを包装する電磁波シールド用金属
薄膜積層体に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Technical Field] The present invention relates to a metal thin film laminate for electromagnetic shielding. For more details, please refer to electronic equipment housings, insulated wires, power cable coverings, building materials (floors,
The present invention relates to metal thin film laminates for shielding electromagnetic waves, used for walls, ceilings, curtains, etc., and for packaging electronic devices, magnetic recording media, etc.
[従来の技術]
従来から、エレクトロニクス機器の発達普及に伴い、C
れらの機器および磁気記録体などを、静電気および電磁
波の悪影響から保護することが必要になり、この保護材
料として電磁波シールド用シート材料ないしは包装用シ
ート材料の需要が拡大している。[Conventional technology] With the development and spread of electronic devices, C
It has become necessary to protect these devices, magnetic recording bodies, and the like from the adverse effects of static electricity and electromagnetic waves, and there is an increasing demand for sheet materials for shielding electromagnetic waves or sheet materials for packaging as protective materials.
従来、エレクトロニクス機器、絶縁電線、電カケープル
、磁気記録体などを電磁波や静電気の影響から保護する
ために、カーボンブラック、カーボン繊維、金属短繊維
、金属燐片または金属粉末を含有する導電性材料を含む
導電性シートが知られている。Conventionally, in order to protect electronic equipment, insulated wires, power cables, magnetic recording media, etc. from the effects of electromagnetic waves and static electricity, conductive materials containing carbon black, carbon fiber, short metal fibers, metal phosphorus flakes, or metal powder have been used. Conductive sheets containing
[発明が解決しようとする問題点]
しかしながら、上記従来の導電性シートは次のごとき欠
点を有する。[Problems to be Solved by the Invention] However, the conventional conductive sheet described above has the following drawbacks.
つまり、このような従来の導電性シートは、エレクトロ
ニクス機器、絶縁電線、電カケープル、磁気記録体など
を電磁波の影響から保護する目的には充分に効果がある
とはいえないものであり、かつ、その可撓性が不充分で
、保護すべき機器の形状にフィツトしにくいものであっ
た。In other words, such conventional conductive sheets cannot be said to be sufficiently effective for protecting electronic equipment, insulated wires, power cables, magnetic recording bodies, etc. from the effects of electromagnetic waves, and Its flexibility was insufficient and it was difficult to fit it into the shape of the equipment to be protected.
また電磁波シールド性を有する金属ホイルそのもの、電
磁波シールド性を有する金属ホイルに合成樹脂フィルム
を貼着した積層シートも開発されたが、金属ホイルおよ
び金属ホイル積層シートは硬く可撓性が不充分で、この
積層シートをエレクトロニクス機器、絶縁電線、電カケ
ープル、磁気記録体などの被覆包装用に用いても、これ
らの機器にフィツトせず、しかも屈曲、折り曲げにより
金属ホイルが容易に折損したり、折れ目が残ったり、金
属ホイル積層シートでは構成層が互いに他の構成層から
剥離したりするという問題点があった。In addition, metal foil itself with electromagnetic shielding properties and laminated sheets made by pasting synthetic resin films on metal foils with electromagnetic shielding properties have also been developed, but metal foils and metal foil laminated sheets are hard and insufficiently flexible. Even if this laminated sheet is used to cover and package electronic equipment, insulated wires, power cables, magnetic recording media, etc., it will not fit into these equipment, and the metal foil will easily break or break due to bending or folding. There have been problems in that metal foil laminated sheets have problems in that the constituent layers may peel off from each other.
さらにまた、合成樹脂フィルムの片面に金属薄膜層を蒸
着形成した積層シートも知られていて、この積層シート
は可撓性に優れエレクトロニクス機器、絶縁電線、電カ
ケープル、磁気記録体などの被覆包装用に用いるのに適
しているが、電磁波シールド特性が不充分であるという
問題点があった。Furthermore, a laminated sheet is also known in which a metal thin film layer is deposited on one side of a synthetic resin film, and this laminated sheet has excellent flexibility and is used for covering packaging of electronic equipment, insulated wires, power cables, magnetic recording media, etc. However, it has the problem of insufficient electromagnetic shielding properties.
本発明は前記の種々の問題点を完全に解消した電磁波シ
ールド用金属薄膜積層体を提供することにある。The object of the present invention is to provide a metal thin film laminate for electromagnetic shielding that completely eliminates the various problems mentioned above.
[問題点を解決するための手段]
本発明の電磁波シールド用金属薄膜積層体は、ポリエチ
レンテレフタレートポリフェニレンオキサイド、ポリイ
ミド、ポリフェニレンサルファイドポリブチレンテレフ
タレート、ポリプロピレン、ポリアミド、ポリエチレン
、ポリカーボネート、ポリスチレン、ポリ塩化ビニル、
ポリ塩化ビニリデン、ポリ酢酸ビニル、ポリメチルメタ
クリレート、エチレン−酢酸ビニル共重合体、ABS樹
脂、ポリアセタールなどのプラスチックフィルムや、紙
、織物、編物、不織布なとの可撓性に富んだ非導電性基
材の片面にまたは両面に、従来の金属ホイルにかえて、
少なくとも二層の金属薄膜層を包含し少なくとも二層の
金属薄膜層の間には非導電性層が介在する金属薄膜積層
体を設けたことを特徴としている。[Means for Solving the Problems] The electromagnetic wave shielding metal thin film laminate of the present invention is made of polyethylene terephthalate, polyphenylene oxide, polyimide, polyphenylene sulfide, polybutylene terephthalate, polypropylene, polyamide, polyethylene, polycarbonate, polystyrene, polyvinyl chloride,
Highly flexible non-conductive group for plastic films such as polyvinylidene chloride, polyvinyl acetate, polymethyl methacrylate, ethylene-vinyl acetate copolymer, ABS resin, polyacetal, paper, woven fabric, knitted fabric, non-woven fabric, etc. Instead of traditional metal foil on one or both sides of the material,
It is characterized by providing a metal thin film laminate including at least two metal thin film layers, with a non-conductive layer interposed between the at least two metal thin film layers.
[作 用]
本発明の電磁波シールド用金属薄M積層体においては、
従来の金属ホイルにかえて、少なくとも二層の金属薄膜
層を包含し、この少なくとも二層の金属薄膜層の間には
非導電性層が介在する金属薄膜積層体を採用し、しかも
その金属薄膜層をポリエチレンテレフタレート、ポリフ
ェニレンオキサイド、ポリイミド、ポリフェニレンサル
ファイド、ポリブチレンテレフタレート、ポリアミド、
ポリプロピレン、ポリエチレン、ポリスチレン、ポリ塩
化ビニル、ポリ塩化ビニリデン、ポリ酢酸ビニル、ポリ
メチルメタクリレート、エチレン−酢酸ビニル共重合体
、ABS樹脂、ポリアセタール、ポリカーボネートなど
のプラスチックフィルムや、紙、織物、編物、不織布な
との可撓性に富んだ非導電性基材の片面にまたは両面に
設けるようにしたので、従来の電磁波シールド性を有す
る金属ホイルに1合成樹脂フィルムを貼着した金属ホイ
ル積層シートが硬く可撓性が不充分で、この積層シート
をエレクトロニクス機器、絶縁電線。[Function] In the metal thin M laminate for electromagnetic shielding of the present invention,
Instead of the conventional metal foil, a metal thin film laminate is adopted which includes at least two metal thin film layers and a non-conductive layer is interposed between the at least two metal thin film layers. The layers are polyethylene terephthalate, polyphenylene oxide, polyimide, polyphenylene sulfide, polybutylene terephthalate, polyamide,
Plastic films such as polypropylene, polyethylene, polystyrene, polyvinyl chloride, polyvinylidene chloride, polyvinyl acetate, polymethyl methacrylate, ethylene-vinyl acetate copolymer, ABS resin, polyacetal, polycarbonate, paper, textiles, knitted fabrics, non-woven fabrics, etc. The metal foil laminated sheet, which is made by attaching a synthetic resin film to a metal foil with electromagnetic shielding properties, is now hard and flexible. Due to insufficient flexibility, this laminated sheet is used for electronic equipment and insulated wires.
電カケープル、磁気記録体などの被覆包装用に用いても
、これらの機器にフィツトせず、しかも屈曲、折り曲げ
により金属ホイルが容易に折損したり、折れ目が残った
り、端層構成層が互いに他の構成層から剥離したりする
という問題点があったのをことごとく解消できたのであ
る。Even when used for covering and packaging electrical cables, magnetic recording materials, etc., it does not fit into these devices, and the metal foil easily breaks or leaves creases due to bending or folding, or the end layer constituent layers do not touch each other. This completely eliminates the problem of peeling off from other constituent layers.
本発明の電磁波シールド用金属薄膜積層体において用い
る非導電性基材(10)としては特に制限はないが、た
とえばポリエチレンテレフタレート、ポリフェニレンオ
キサイド、ポリイミド、ポリフェニレンサルファイド、
ポリブチレンテレフタレート、ポリアミド、ポリプロピ
レン、ポリエチレン、ポリスチレン、ポリ塩化ビニル、
ポリ塩化ビニリデン、ポリ酢酸ビニル、ポリメチルメタ
クリレート、エチレン−酢酸ビニル共重合体、ABS樹
脂、ポリアセタール、ポリカーボネートなどのプラスチ
ックフィルムや、ポリエステル、ポリアミド、ポリアミ
ドイミド、ポリエチレン、ポリプロピレン、セルロース
アセチイト、ボリカーボネ−ト、ポリ塩化ビニル、アク
リル、レーヨンなどのamからなる織物1編物、不織布
や、和紙、洋紙1合成紙などが適宜用いられる。The non-conductive base material (10) used in the metal thin film laminate for electromagnetic shielding of the present invention is not particularly limited, but includes, for example, polyethylene terephthalate, polyphenylene oxide, polyimide, polyphenylene sulfide,
Polybutylene terephthalate, polyamide, polypropylene, polyethylene, polystyrene, polyvinyl chloride,
Plastic films such as polyvinylidene chloride, polyvinyl acetate, polymethyl methacrylate, ethylene-vinyl acetate copolymer, ABS resin, polyacetal, polycarbonate, polyester, polyamide, polyamideimide, polyethylene, polypropylene, cellulose acetite, polycarbonate Fabrics, knitted fabrics, nonwoven fabrics, Japanese paper, Western paper, synthetic paper, etc. made of AM such as polyvinyl chloride, acrylic, and rayon are used as appropriate.
非導電性基材(10)の厚さとしては特に制限はないが
、たとえば通常2μs〜5■腫程度、好ましくは厚さが
6μs〜50〇−程度の厚さのものが用いられる。厚さ
が2μs未満では柔らか過ぎてしわが発生したり、加工
むらを生じやすく、製品ロスも増加するため実用性がな
く、一方厚さが5ssを超えると柔軟性に乏しく硬い電
磁波シールド用金属薄膜積層体となるため特殊な用途以
外には不向きで実用性に乏しい。The thickness of the non-conductive base material (10) is not particularly limited, but for example, one having a thickness of usually about 2 μs to 5 μm, preferably about 6 μs to 500 μm, is used. If the thickness is less than 2μs, it is too soft and tends to wrinkle, cause uneven processing, and increase product loss, making it impractical.On the other hand, if the thickness exceeds 5ss, the metal thin film for electromagnetic shielding is inflexible and hard. Because it is a laminate, it is unsuitable for anything other than special uses and has little practicality.
非導電性基材(10)が金属薄膜積層体(20)との密
着性に劣るものである場合にはあらかじめ下塗層(30
)を設けておくのが好ましい。If the non-conductive base material (10) has poor adhesion to the metal thin film laminate (20), an undercoat layer (30
) is preferably provided.
下塗層(30)の厚さとしては特に制限はないが通常o
、i〜2Q程度である。There is no particular limit to the thickness of the undercoat layer (30), but it is usually o.
, i~2Q.
下塗層(30)を形成する塗料としては、たとえばポリ
エステル、ポリアミド、ポリアミドイミド、ポリエチレ
ン、ポリプロピレン、セルロースアセチイト、ニトロセ
ルロース、ポリカーボネート、ポリ塩化ビニル、アクリ
ル樹脂、アクリル酸低級アルキルエステル樹脂、ウレタ
ン樹脂、尿素−メラミン樹脂、エポキシ樹脂、アミノア
ルキッド樹脂、不飽和ポリエステル、フェノール樹脂な
どの樹脂やSBR,NBR,NR、シリコンゴムなどの
合成ゴムの一種もしくは二種以上の混合物が用いられる
。Examples of paints forming the undercoat layer (30) include polyester, polyamide, polyamideimide, polyethylene, polypropylene, cellulose acetite, nitrocellulose, polycarbonate, polyvinyl chloride, acrylic resin, acrylic acid lower alkyl ester resin, and urethane resin. , urea-melamine resin, epoxy resin, aminoalkyd resin, unsaturated polyester, phenol resin, and synthetic rubbers such as SBR, NBR, NR, and silicone rubber, or a mixture of two or more thereof can be used.
本発明の電磁波シールド用金属薄膜積層体において、従
来の金属ホイルにかえて用いる金属薄膜積層体(20)
としては、少なくとも二層の金属薄膜層(21)を包含
し少なくとも二層の金属薄膜層(21)の間には非導電
性層(22)が介在する金属薄膜積層体(20)であれ
ば特に制限はない。Metal thin film laminate (20) used in place of conventional metal foil in the metal thin film laminate for electromagnetic shielding of the present invention
If the metal thin film laminate (20) includes at least two metal thin film layers (21) and has a non-conductive layer (22) interposed between the at least two metal thin film layers (21), There are no particular restrictions.
金属薄膜層(21)としては、通常アルミニウム、銅、
ニッケル、亜鉛、錫、銀、金、インジウム、クロム、白
金、鉄、コバルト、モリブデン、チタン、ベリリウム、
パラジウム、タンタル、鉛、ニオブなどの金属、それら
の金属を含む合金などの導電性を有するものが真空蒸着
法、スパッタリング法、イオンブレーティング法などの
通常の方法によって前記非導電性基材(10)の片面に
または両面上に前記下塗層(30)を介しあるいは介さ
ずして蒸着形成され、その厚さが通常1n■〜5001
票程度のものが好ましい。厚さが通常1nm未満では充
分なシールド効果が得られず、 500n+wを超えて
もシールド効果に差が生じないことおよび得られる電磁
波シールド用金属薄膜積層体が可撓性に欠けるので好ま
しくない。The metal thin film layer (21) is usually made of aluminum, copper,
Nickel, zinc, tin, silver, gold, indium, chromium, platinum, iron, cobalt, molybdenum, titanium, beryllium,
The non-conductive base material (10 ) is formed by vapor deposition on one side or both sides of the undercoat layer (30) with or without the undercoat layer (30), and the thickness thereof is usually 1n~5001
Something as small as a vote is preferable. If the thickness is usually less than 1 nm, sufficient shielding effect cannot be obtained, and if it exceeds 500 n+w, no difference will occur in the shielding effect, and the resulting metal thin film laminate for electromagnetic shielding will lack flexibility, which is not preferable.
なお、金属薄膜層(21)は−旦仮の担持体上に形成し
た金属薄膜層を接着剤を介し又は介さずして前記非導電
性基材(10)上に転写形成するようにしてもよい。Note that the metal thin film layer (21) may be formed by transferring a metal thin film layer formed on a temporary carrier onto the non-conductive base material (10) with or without an adhesive. good.
金属薄膜層(21)は一般に物理的、化学的損傷を受は
易いので上塗層が設けられることもある。Since the metal thin film layer (21) is generally susceptible to physical and chemical damage, an overcoat layer may be provided thereon.
上塗層(40)を形成する塗料としては、たとえばポリ
エステル、ポリアミド、ポリアミドイミド、ポリエチレ
ン、ポリプロピレン、セルロースアセチイト、ニトロセ
ルロース、ポリカーボネート、ポリ塩化ビニル、アクリ
ル樹脂、アクリル酸低級アルキルエステル樹脂、ウレタ
ン樹脂、尿素−メラミン樹脂、エポキシ樹脂、アミノア
ルキッド樹脂、不飽和ポリエステル、フェノール樹脂な
どの樹脂やSBR,NBR,NR,シリコンゴムなどの
合成ゴムの一種もしくは二種以上の混合物が用いられる
。Examples of the paint forming the top coat layer (40) include polyester, polyamide, polyamideimide, polyethylene, polypropylene, cellulose acetite, nitrocellulose, polycarbonate, polyvinyl chloride, acrylic resin, acrylic acid lower alkyl ester resin, and urethane resin. , urea-melamine resin, epoxy resin, aminoalkyd resin, unsaturated polyester, phenolic resin, and synthetic rubbers such as SBR, NBR, NR, and silicone rubber, or a mixture of two or more thereof can be used.
上塗層(40)の厚さは通常0.1−〜21程度である
。The thickness of the top coat layer (40) is usually about 0.1-21.
非導電性層(22)としては、通常その厚さには特に制
限はないが通常0.1〜2μs程度である。The thickness of the non-conductive layer (22) is usually not particularly limited, but is usually about 0.1 to 2 μs.
非導電性層(22)を形成する塗料または接着剤として
は、例えばポリエステル、ポリアミド、ポリアミドイミ
ド、ポリエチレン、ポリプロピレン。Examples of the paint or adhesive forming the non-conductive layer (22) include polyester, polyamide, polyamideimide, polyethylene, and polypropylene.
セルロースアセチイト、ニトロセルロース、ポリカーボ
ネート、ポリ塩化ビニル、アクリル樹脂、アクリル酸低
級アルキルエステル樹脂、ウレタン樹脂、尿素−メラミ
ン樹脂、エポキシ樹脂、アミノアルキッド樹脂、不飽和
ポリエステル、フェノール樹脂などの樹脂やSBR,N
BR,NR、シリコンゴムなどの合成ゴムの一種もしく
は二種以上の混合物が用いられる。Resins such as cellulose acetite, nitrocellulose, polycarbonate, polyvinyl chloride, acrylic resin, acrylic acid lower alkyl ester resin, urethane resin, urea-melamine resin, epoxy resin, aminoalkyd resin, unsaturated polyester, phenolic resin, SBR, N
One or a mixture of two or more synthetic rubbers such as BR, NR, and silicone rubber can be used.
非導電性層(22)を形成する塗料を用いる場合には通
常は金属薄膜層(21)の面上に塗料が塗布され非導電
性層(22)が形成され、さらにその非導電性層(22
)面上に他の金属薄膜層(21)が通常の方法によって
形成される。When using a paint that forms a non-conductive layer (22), the paint is usually applied on the surface of the metal thin film layer (21) to form the non-conductive layer (22), and then the non-conductive layer ( 22
) A further metal thin film layer (21) is formed on the surface by a conventional method.
非導電性層(22)を形成する接着剤を用いる場合には
通常は金属薄膜層(21)面上に接着剤が塗布され非導
電性層(22)が形成され、さらにその非導電性層(2
2)面上に他の金属薄膜層(21)が形成された非導電
性基材(10)が貼着される。When using an adhesive to form the non-conductive layer (22), the adhesive is usually applied on the surface of the metal thin film layer (21) to form the non-conductive layer (22), and then the non-conductive layer is (2
2) A non-conductive substrate (10) on which another metal thin film layer (21) is formed is attached.
本発明のこの劣うにして得られた電磁波シールド用金属
薄膜積層体はそのまま用いてもよく、またこれらを細幅
に裁断したものをそのまま糸として、あるいは他の普通
糸と引き揃えたり、撚糸したり、絡ませたりした糸を用
いて電磁波シールド用の織物、m物、不織布として用い
ることもできる。The electromagnetic shielding metal thin film laminate of the present invention obtained in this manner may be used as it is, or it may be cut into thin pieces and used as a thread as it is, or it may be aligned with other ordinary threads or twisted into threads. It is also possible to use yarns that have been twisted or entwined as fabrics, materials, and non-woven fabrics for shielding electromagnetic waves.
[実施例] 次に実施例をあげて本発明を説明する。[Example] Next, the present invention will be explained with reference to Examples.
実施例1
厚さ12μsのポリエチレンテレフタレートフィルムの
片面に銅をスパッタリング法で厚さ200nmに形成し
光ものと、厚さ9μsのポリエチレンテレフタレートフ
ィルムの片面にアルミニウムをイオンブレーティング法
で形成したものとをそれぞれ一枚のフィルムを、一方は
金属薄膜層が存在する側を、他の一方は金属薄膜層が存
在しない側とを互いに向きあうように、アクリルポリオ
ール100部(重量部、以下同様)、ヘキサメチレン・
ジ・イソシアネート5部、酢酸エチル100部からなる
接着剤をロールコータ−で厚さ10趨に塗布した接着剤
層を介して貼合わせ、本発明の電磁波シールド用金属薄
膜積層体を得た。Example 1 One was made by forming copper to a thickness of 200 nm on one side of a 12-μs-thick polyethylene terephthalate film by sputtering, and the other was made by forming aluminum on one side of a 9-μs-thick polyethylene terephthalate film by ion-blating. 100 parts of acrylic polyol (parts by weight, the same applies hereafter), hexane, and acrylic polyol were placed on each film, one side with the metal thin film layer facing each other, and the other side with the metal thin film layer facing each other. methylene・
A thin metal film laminate for electromagnetic shielding of the present invention was obtained by bonding through an adhesive layer coated with an adhesive consisting of 5 parts of diisocyanate and 100 parts of ethyl acetate to a thickness of 10 parts using a roll coater.
得られた本発明の電磁波シールド用金属薄膜積層体は、
エレクトロニクス機器、絶縁電線、電カケープル、磁気
記録体などを電磁波の影響から保護する目的には充分な
効果があり、その上可撓性も充分で保護すべき機器の形
状に良くフィツトして、10日間経過後も目視によるテ
ストてはその金属表面に変化は認められなかった。The obtained metal thin film laminate for electromagnetic shielding of the present invention is as follows:
It is sufficiently effective for protecting electronic equipment, insulated wires, power cables, magnetic recording media, etc. from the effects of electromagnetic waves, and is also flexible enough to fit well into the shape of the equipment to be protected. Visual tests showed no change in the metal surface even after several days had passed.
実施例2
目付は量か40g/a+”のメタ系アラミド樹脂を主成
分とする不織布の片面にニッケルをイオンブレーティン
グ法で厚さ1oon層に形成し、さらに同面上にホット
メルト型ポリアミド樹脂を20g/履2の塗布量にスプ
レィコートしたもの同志を、コート面側と不織布面側と
が向きあうように四枚重ねにし、さらにコートしていな
いものを一枚重ねて計五枚重ねにしたものを、温度15
0”C,時間15秒、圧力4kg/cm2(ゲージ圧)
の条件でホットプレスし、本発明の電磁波シールド用金
属薄膜積層体を得た。Example 2 A 1-ounce layer of nickel was formed on one side of a non-woven fabric mainly composed of meta-aramid resin with a basis weight of 40 g/a+" by ion-blating method, and hot-melt polyamide resin was further applied on the same side. Spray coated with 20 g/shoe 2 of the same material, layered in four layers with the coated side and non-woven side facing each other, and then layered one uncoated layer for a total of five layers. temperature 15
0”C, time 15 seconds, pressure 4kg/cm2 (gauge pressure)
Hot pressing was carried out under the following conditions to obtain the metal thin film laminate for electromagnetic shielding of the present invention.
得られた本発明の電磁波シールド用金属薄膜積層体は、
エレクトロニクス機器、絶縁電線、電カケープル、磁気
記録体などを電磁波の影響から保護する目的には充分な
効果があり、その上可撓性も充分で保護すべき機器の形
状に良くフィツトするものであった。The obtained metal thin film laminate for electromagnetic shielding of the present invention is as follows:
It is sufficiently effective for protecting electronic equipment, insulated wires, power cables, magnetic recording media, etc. from the effects of electromagnetic waves, and is also flexible enough to fit well into the shape of the equipment to be protected. Ta.
実施例3
厚さ12μsのポリエチレンテレフタレートフィルムの
片面に紫外線硬化型アクリル樹脂塗料部をロールコータ
−で塗布し、紫外線ランプで照射・硬化させた厚さ1−
のgi型剤層を介して銅をスパッタリング法で厚さ20
0n厘に形成し、さらに塩化ビニル−酢酸ビニル共重合
体lo部、アクリル樹脂10部およびスチレンマレイン
酸樹脂5部を、メチルエチルケトン40部、トルエン4
0部および酢酸エチル20部からなる混合溶剤に溶解し
た塗料をロールコータ−で厚さIOQに塗布形成し接着
剤層とした転写箔を作成した。Example 3 An ultraviolet curable acrylic resin coating was applied to one side of a 12 μs thick polyethylene terephthalate film using a roll coater, and was irradiated and cured using an ultraviolet lamp.
Copper was sputtered through a gi-type agent layer to a thickness of 20 mm.
Furthermore, lo parts of vinyl chloride-vinyl acetate copolymer, 10 parts of acrylic resin and 5 parts of styrene maleic acid resin were added to 40 parts of methyl ethyl ketone and 4 parts of toluene.
A transfer foil with an adhesive layer was prepared by coating a coating material dissolved in a mixed solvent consisting of 0 parts and 20 parts of ethyl acetate to a thickness of IOQ using a roll coater.
坪量45g/m”のクラフト紙に上記の転写箔を温度1
50℃のシリコンゴムロールで熱転写し、ベースフィル
ムを剥離した後、さらに四回同様に転写作業を繰返し、
本発明の電磁波シールド用金属薄膜積層体を得た。Transfer the above transfer foil onto kraft paper with a basis weight of 45 g/m at a temperature of 1.
After thermal transfer using a silicone rubber roll at 50°C and peeling off the base film, repeat the transfer process four more times.
A metal thin film laminate for electromagnetic shielding of the present invention was obtained.
得られた本発明の電磁波シールド用金属薄膜積層体は、
エレクトロニクス機器、絶縁電線、電カケープル、磁気
記録体などを電磁波の影響から保護する目的には充分な
効果(実施例1のものと同程度)があり、その上可撓性
も充分で保護すべき機器の形状に良くフィツトして、1
0日間経過後も目視によるテストではその金属表面に変
化は認められなかった。The obtained metal thin film laminate for electromagnetic shielding of the present invention is as follows:
It is sufficiently effective (same level as that of Example 1) for the purpose of protecting electronic equipment, insulated wires, power cables, magnetic recording bodies, etc. from the effects of electromagnetic waves, and is also sufficiently flexible to be protected. Fits well to the shape of the device, 1
Even after 0 days had passed, no change was observed on the metal surface in a visual test.
比較例1
厚さ9μsのポリエチレンテレフタレートフィルムの片
面にアルミニウム薄膜層を抵抗加熱真空蒸着法で厚さ2
00n■に形成し、電磁波シールド用金属薄膜積層体を
得た。Comparative Example 1 A thin aluminum film layer was deposited on one side of a polyethylene terephthalate film with a thickness of 2 μs using a resistance heating vacuum evaporation method.
00n■ to obtain a metal thin film laminate for electromagnetic shielding.
得られた本発明の電磁波シールド用金属薄膜積層体は、
エレクトロニクス機器、絶縁電線、電カケープル、磁気
記録体などを電磁波の影響から保護する目的にはその効
果は充分でなく不満があったか、可撓性は充分で保護す
べき機器の形状に良くフィツトし、10日間経過後も目
視によるテストてはその金属表面に変化は認められなか
った。The obtained metal thin film laminate for electromagnetic shielding of the present invention is as follows:
For the purpose of protecting electronic equipment, insulated wires, power cables, magnetic recording media, etc. from the effects of electromagnetic waves, there were dissatisfaction with the effectiveness of the product, or it was flexible enough to fit well into the shape of the equipment to be protected. Even after 10 days, no change was observed on the metal surface by visual inspection.
比較例2
厚さ 6μsのポリエチレンテレフタレートフィルムの
片面に厚さ7μsのアルミニウムホイルをドライラミネ
ート法により貼り合わせて、電磁波シールド用金属薄膜
積層体を得た。Comparative Example 2 An aluminum foil having a thickness of 7 μs was bonded to one side of a polyethylene terephthalate film having a thickness of 6 μs by a dry lamination method to obtain a metal thin film laminate for electromagnetic shielding.
得られた本発明の電磁波シールド用金属薄膜積層体は、
エレクトロニクス機器、絶縁電線、電カケープル、磁気
記録体などを電磁波の影響から保護する目的には充分な
効果があり、その上10日間経過後も目視によるテスト
ではその金属表面に変化は認められなかったが、可撓性
に欠は保護すべき機器の形状にフィツトせず、使用しづ
らいものであった。The obtained metal thin film laminate for electromagnetic shielding of the present invention is as follows:
It is sufficiently effective for protecting electronic equipment, insulated wires, power cables, magnetic recording materials, etc. from the effects of electromagnetic waves, and even after 10 days, visual tests showed no change in the metal surface. However, it lacked flexibility and did not fit the shape of the equipment to be protected, making it difficult to use.
比較例3
厚さ12−のポリエチレンテレフタレートフィルムの片
面に厚さ9μsの銅ホイルをドライラミネート法により
貼り合わせて、電磁波シールド用金属薄膜積層体を得た
。Comparative Example 3 A copper foil having a thickness of 9 μs was bonded to one side of a polyethylene terephthalate film having a thickness of 12 μs by a dry lamination method to obtain a metal thin film laminate for electromagnetic shielding.
得られた本発明の電磁波シールド用金属薄膜積層体は、
エレクトロニクス機器、絶縁電線、電カケープル、磁気
記録体などを電磁波の影響から保護する目的には充分な
効果があったが、10日間経過後には目視によるテスト
てその金属表面に変化が認められ耐食性に欠け、その上
、可撓性にも欠は保護すべき機器の形状にフィツトせず
、使用しづらいものであった。The obtained metal thin film laminate for electromagnetic shielding of the present invention is as follows:
Although it was sufficiently effective for the purpose of protecting electronic equipment, insulated wires, power cables, magnetic recording media, etc. from the effects of electromagnetic waves, visual tests after 10 days showed changes in the metal surface, indicating that the corrosion resistance had deteriorated. Moreover, it lacked flexibility and did not fit the shape of the equipment to be protected, making it difficult to use.
実施例1〜3で得られた本発明の電磁波シールド用金属
薄膜積層体と、比較例1〜3のものとの電磁波シールド
特性を表−1に示した。Table 1 shows the electromagnetic shielding properties of the metal thin film laminates for electromagnetic shielding of the present invention obtained in Examples 1 to 3 and those of Comparative Examples 1 to 3.
電磁波シールド特性は、社団法人関西電子振興センター
、KEC法(電界モード)にて1〜100100Oの範
囲で測定した。The electromagnetic shielding characteristics were measured in the range of 1 to 100,100 O by the Kansai Electronics Promotion Center, KEC method (electric field mode).
表−1
[発明の効果]
実施例1〜3および比較例1〜3から明らかな通り、本
発明の電磁波シールド用金属薄膜積層体は、エレクトロ
ニクス機器、絶縁電線、電カケープル、磁気記録体など
を電磁波の影響から保護する目的には充分な効果があり
、その上可撓性も充分で、保護すべき機器の形状にフィ
ツトしやすいものてあった。Table 1 [Effects of the Invention] As is clear from Examples 1 to 3 and Comparative Examples 1 to 3, the electromagnetic wave shielding metal thin film laminate of the present invention can be used for electronic equipment, insulated wires, power cables, magnetic recording bodies, etc. It was sufficiently effective for the purpose of protecting against the effects of electromagnetic waves, and was also flexible enough to easily fit into the shape of the equipment to be protected.
第1図は本発明の電磁波シールド用金属薄膜積層体の基
本構成を示す概略斜視図であり、第2図は本発明の電磁
波シールド用金属薄膜積層体の他の実施態様を示す概略
斜視図であり、第3図は本発明の電磁波シールド用金属
薄膜積層体の基本構成を示す概略部分拡大断面図てあり
、第4図は本発明の電磁波シールド用金属薄膜積層体の
他の実施態様を示す概略部分拡大断面図である。
(図面の符号)
(10) :非導電性基材
(20) :金属薄膜積層体
(21) :金属薄膜層
(22) :非導電性層
(30) :下塗層
(40) :上塗層FIG. 1 is a schematic perspective view showing the basic structure of the metal thin film laminate for electromagnetic shielding of the present invention, and FIG. 2 is a schematic perspective view showing another embodiment of the metal thin film laminate for electromagnetic shielding of the present invention. 3 is a schematic partially enlarged sectional view showing the basic structure of the metal thin film laminate for electromagnetic shielding of the present invention, and FIG. 4 shows another embodiment of the metal thin film laminate for electromagnetic shielding of the present invention. FIG. 3 is a schematic partially enlarged sectional view. (Numbers in drawings) (10): Non-conductive base material (20): Metal thin film laminate (21): Metal thin film layer (22): Non-conductive layer (30): Undercoat layer (40): Top coat layer
Claims (1)
ルド用金属薄膜積層体において、少なくとも二層の金属
薄膜層の間には非導電性層が介在することを特徴とする
電磁波シールド用金属薄膜積層体。1. A metal thin film laminate for electromagnetic wave shielding comprising at least two metal thin film layers, characterized in that a non-conductive layer is interposed between the at least two metal thin film layers. .
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63263437A JPH02111000A (en) | 1988-10-19 | 1988-10-19 | Metallic thin film laminate for electromagnetic shielding |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63263437A JPH02111000A (en) | 1988-10-19 | 1988-10-19 | Metallic thin film laminate for electromagnetic shielding |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH02111000A true JPH02111000A (en) | 1990-04-24 |
Family
ID=17389493
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63263437A Pending JPH02111000A (en) | 1988-10-19 | 1988-10-19 | Metallic thin film laminate for electromagnetic shielding |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH02111000A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04134813U (en) * | 1991-06-07 | 1992-12-15 | 多摩川精機株式会社 | Resolver |
WO2001084899A1 (en) * | 2000-05-01 | 2001-11-08 | Hantech Co., Ltd. | Electro-magnetic interference shielding structure with thin film comprising buffer layer and preparing process therefor |
KR100376960B1 (en) * | 2001-03-27 | 2003-03-29 | 임조섭 | Method for forming of the EMI protecting layer on a plastic substrate and an EMI protecting layer thereof |
JP2011018930A (en) * | 2002-08-17 | 2011-01-27 | Three M Innovative Properties Co | Flexible, formable conductive film |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5816599A (en) * | 1981-07-22 | 1983-01-31 | 凸版印刷株式会社 | Method of electromagnetically shielding |
JPS59219998A (en) * | 1983-05-27 | 1984-12-11 | 凸版印刷株式会社 | Electromagnetic shielding material |
JPS6020195U (en) * | 1983-07-19 | 1985-02-12 | 朝日化学工業株式会社 | Electromagnetic wave shielding material |
JPS6147626U (en) * | 1984-08-30 | 1986-03-31 | 大日本印刷株式会社 | multilayer sheet |
JPS625699A (en) * | 1985-07-02 | 1987-01-12 | 株式会社 麗光 | Electromagnetic wave shielding cu thin film |
JPS62172200U (en) * | 1986-04-22 | 1987-10-31 | ||
JPS63107088A (en) * | 1986-06-30 | 1988-05-12 | 東洋メタライジング株式会社 | Manufacture of copper-plated film |
-
1988
- 1988-10-19 JP JP63263437A patent/JPH02111000A/en active Pending
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5816599A (en) * | 1981-07-22 | 1983-01-31 | 凸版印刷株式会社 | Method of electromagnetically shielding |
JPS59219998A (en) * | 1983-05-27 | 1984-12-11 | 凸版印刷株式会社 | Electromagnetic shielding material |
JPS6020195U (en) * | 1983-07-19 | 1985-02-12 | 朝日化学工業株式会社 | Electromagnetic wave shielding material |
JPS6147626U (en) * | 1984-08-30 | 1986-03-31 | 大日本印刷株式会社 | multilayer sheet |
JPS625699A (en) * | 1985-07-02 | 1987-01-12 | 株式会社 麗光 | Electromagnetic wave shielding cu thin film |
JPS62172200U (en) * | 1986-04-22 | 1987-10-31 | ||
JPS63107088A (en) * | 1986-06-30 | 1988-05-12 | 東洋メタライジング株式会社 | Manufacture of copper-plated film |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04134813U (en) * | 1991-06-07 | 1992-12-15 | 多摩川精機株式会社 | Resolver |
WO2001084899A1 (en) * | 2000-05-01 | 2001-11-08 | Hantech Co., Ltd. | Electro-magnetic interference shielding structure with thin film comprising buffer layer and preparing process therefor |
KR100376960B1 (en) * | 2001-03-27 | 2003-03-29 | 임조섭 | Method for forming of the EMI protecting layer on a plastic substrate and an EMI protecting layer thereof |
JP2011018930A (en) * | 2002-08-17 | 2011-01-27 | Three M Innovative Properties Co | Flexible, formable conductive film |
JP2011018931A (en) * | 2002-08-17 | 2011-01-27 | Three M Innovative Properties Co | Flexible, formable conductive film |
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