JPH02110679U - - Google Patents
Info
- Publication number
- JPH02110679U JPH02110679U JP1965089U JP1965089U JPH02110679U JP H02110679 U JPH02110679 U JP H02110679U JP 1965089 U JP1965089 U JP 1965089U JP 1965089 U JP1965089 U JP 1965089U JP H02110679 U JPH02110679 U JP H02110679U
- Authority
- JP
- Japan
- Prior art keywords
- reaction tube
- wafer
- vapor phase
- attached
- growth apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001947 vapour-phase growth Methods 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims 2
- 239000002184 metal Substances 0.000 claims 2
- 238000001816 cooling Methods 0.000 claims 1
- 125000002524 organometallic group Chemical group 0.000 claims 1
- 239000002994 raw material Substances 0.000 claims 1
- 238000007789 sealing Methods 0.000 claims 1
- 230000008021 deposition Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1965089U JPH02110679U (ar) | 1989-02-23 | 1989-02-23 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1965089U JPH02110679U (ar) | 1989-02-23 | 1989-02-23 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH02110679U true JPH02110679U (ar) | 1990-09-04 |
Family
ID=31235347
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1965089U Pending JPH02110679U (ar) | 1989-02-23 | 1989-02-23 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH02110679U (ar) |
-
1989
- 1989-02-23 JP JP1965089U patent/JPH02110679U/ja active Pending
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP0095887A1 (en) | Apparatus for plasma chemical vapour deposition | |
CA2175045A1 (en) | Vapor phase chemical infiltration process of a material into a porous substrate at controlled surface temperature | |
JPH02110679U (ar) | ||
JP2002115064A (ja) | グラファイトナノファイバー薄膜形成用cvd装置のクリーニング方法 | |
JPH04202091A (ja) | 化合物半導体の気相成長装置 | |
JPH0465146B2 (ar) | ||
JPH0521867Y2 (ar) | ||
JPS62148574U (ar) | ||
JPS6268227U (ar) | ||
JPS61156229U (ar) | ||
JPH0296724U (ar) | ||
JPS6144829U (ja) | 3−5族化合物半導体の熱分解による気相エピタキシヤル成長装置 | |
JPH0539625Y2 (ar) | ||
JPH0351833U (ar) | ||
JPH0610675Y2 (ja) | プラズマ処理装置 | |
JPS6140774Y2 (ar) | ||
JPH01125369U (ar) | ||
JPS6262432U (ar) | ||
JPS62201927U (ar) | ||
JPS62126362U (ar) | ||
JPS61142441U (ar) | ||
JPH05211125A (ja) | 気相成長装置 | |
JPH03116029U (ar) | ||
JPS61192443U (ar) | ||
JPH0314165U (ar) |