JPH0210486B2 - - Google Patents
Info
- Publication number
- JPH0210486B2 JPH0210486B2 JP16523579A JP16523579A JPH0210486B2 JP H0210486 B2 JPH0210486 B2 JP H0210486B2 JP 16523579 A JP16523579 A JP 16523579A JP 16523579 A JP16523579 A JP 16523579A JP H0210486 B2 JPH0210486 B2 JP H0210486B2
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- polishing
- magnetic disk
- film
- coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000005498 polishing Methods 0.000 claims description 26
- 239000000758 substrate Substances 0.000 claims description 15
- 238000000034 method Methods 0.000 claims description 12
- 238000000576 coating method Methods 0.000 claims description 11
- 239000003973 paint Substances 0.000 claims description 11
- 230000001050 lubricating effect Effects 0.000 claims description 10
- 239000011253 protective coating Substances 0.000 claims description 10
- 239000011248 coating agent Substances 0.000 claims description 9
- 229910052782 aluminium Inorganic materials 0.000 claims description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 6
- 238000009499 grossing Methods 0.000 claims description 5
- 238000004544 sputter deposition Methods 0.000 claims description 5
- 238000007740 vapor deposition Methods 0.000 claims description 3
- 239000002245 particle Substances 0.000 description 10
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 230000006866 deterioration Effects 0.000 description 3
- 239000010419 fine particle Substances 0.000 description 3
- 230000003746 surface roughness Effects 0.000 description 3
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000314 lubricant Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229920006267 polyester film Polymers 0.000 description 2
- -1 polyethylene Polymers 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 239000006249 magnetic particle Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000005204 segregation Methods 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
Description
【発明の詳細な説明】
本発明は磁気デイスク基板の表面平滑化方法の
改良に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an improvement in a method for smoothing the surface of a magnetic disk substrate.
磁気デイスク基板は一般にアルミニウム円板上
に磁気塗料を塗布し高温焼付して、又は磁性金属
又は酸化物をスパツタもしくは蒸着により円板上
に成膜して形成される。磁気塗料を塗布、焼付し
て形成した磁気デイスクの表面は従来バフ研摩、
テープポリツシユ等により仕上げられ、研摩仕上
後の磁気デイスク表面には高さ0.1μｍ以上の微小
突起が多数残在している。これは塗膜強度を高め
るために磁性塗料中に混入させているアルミナ等
の硬い非磁性微粒子に起因しているが、その存在
により磁気ヘツドが摩耗劣化したりヘツド浮上性
が悪くなる等の悪影響があつた。またスパツタ、
蒸着により形成された磁気デイスク表面にも塵埃
やアルミニウム円板の偏析物（アルミニウム円板
はMg、Fe等の添加物を含有するため、Alマトリ
ツクスからの析出物が表面に生じる。）に基づく
微小突起が存在し、やはりヘツドに悪影響を及ぼ
している。 Magnetic disk substrates are generally formed by applying a magnetic paint onto an aluminum disk and baking it at a high temperature, or by depositing a magnetic metal or oxide on the disk by sputtering or vapor deposition. The surface of the magnetic disk, which is formed by applying magnetic paint and baking it, is conventionally buffed and polished.
The magnetic disk is finished by tape polishing, etc., and after polishing, many microscopic protrusions with a height of 0.1 μm or more remain on the surface of the magnetic disk. This is due to hard non-magnetic particles such as alumina that are mixed into the magnetic paint to increase the strength of the coating, but their presence can have negative effects such as abrasion and deterioration of the magnetic head and poor head flying ability. It was hot. Also spatuta,
The surface of the magnetic disk formed by vapor deposition also has minute particles due to dust and segregation from the aluminum disk (because the aluminum disk contains additives such as Mg and Fe, precipitates from the Al matrix form on the surface). There are protrusions, which again have a negative impact on the head.
本発明は上述の問題を解決するためのもので、
磁気デイスク基板、すなわち磁性被膜を形成後の
基板の表面の微小突起を選択的に除去しヘツド摩
耗劣化の防止、浮上性の向上をはかることのでき
る磁気デイスク基板の表面平滑化方法を提供する
ことを目的としている。 The present invention is intended to solve the above-mentioned problems,
To provide a method for smoothing the surface of a magnetic disk substrate, which can selectively remove minute protrusions on the surface of a magnetic disk substrate, that is, a substrate after a magnetic coating has been formed, thereby preventing head wear and deterioration and improving flying performance. It is an object.
次に図面に関連して本発明の実施例を説明す
る。 Embodiments of the invention will now be described with reference to the drawings.
第１図は本発明に係る磁気デイスクの表面平滑
化方法の実施例を示す正面断面図である。 FIG. 1 is a front sectional view showing an embodiment of the method for smoothing the surface of a magnetic disk according to the present invention.
図中、１はアルミニウム基板、２は磁性塗料被
膜である。磁性塗料被膜２はアルミニウム基板１
上に磁気塗料を塗布し高温焼付して形成される。
この磁性塗料被膜２中には前述のようにアルミナ
等の硬い非磁性微粒子３が混入されており、従来
研摩仕上後の表面には高さ0.1μｍ以上の微小突起
が多数残存するという問題があつた。又、磁性被
膜をスパツタ等により基板上に形成する場合にも
同様な問題があつた。 In the figure, 1 is an aluminum substrate, and 2 is a magnetic paint film. Magnetic paint film 2 is aluminum substrate 1
It is formed by applying magnetic paint on top and baking it at high temperature.
As mentioned above, hard non-magnetic fine particles 3 such as alumina are mixed into this magnetic paint film 2, and conventionally there is a problem in that many microscopic protrusions with a height of 0.1 μm or more remain on the surface after polishing. Ta. Similar problems also occur when a magnetic film is formed on a substrate by sputtering or the like.
本発明では、この問題を解決するため、従来通
り磁性塗料被膜２の表面を研摩仕上した後又は磁
性被膜をスパツタ等で形成した後に基板の表面に
ポリエチレン、ポリプロピレン、テフロン（米国
デユポン製）等の潤滑性保護被膜４を形成し、そ
の後磁気デイスク表面を潤滑性保護被膜４が除去
されない範囲で再度研摩する。このとき磁性塗料
被膜を形成した磁気デイスクの場合は２度目の研
摩となる。この場合、潤滑性保護被膜４の厚さは
記録特性を考慮して100〜3000Å程度（500〜1000
Åが望ましい）とし、また再研摩は例えば粒度
0.3〜9μｍ程度（１〜3μｍが望ましい）のラツピ
ングフイルムによるテープポリツシユで軽く表面
を研摩する。 In the present invention, in order to solve this problem, after polishing the surface of the magnetic paint film 2 or forming the magnetic film by sputtering or the like, as before, the surface of the substrate is coated with polyethylene, polypropylene, Teflon (manufactured by DuPont, USA), etc. After forming the lubricating protective coating 4, the magnetic disk surface is polished again to the extent that the lubricating protective coating 4 is not removed. At this time, in the case of a magnetic disk on which a magnetic paint film has been formed, polishing is performed for the second time. In this case, the thickness of the lubricating protective coating 4 is approximately 100 to 3000 Å (500 to 1000 Å) considering recording characteristics.
Å), and re-polishing should be done, e.g.
Lightly polish the surface with tape polishing using a wrapping film of about 0.3 to 9 μm (preferably 1 to 3 μm).
ここにラツピングフイルムは例えば住友スリー
エム社より「インペリアル印ラツピングフイム」
として市販されてる研摩用フイルムを使用するこ
とができる。このラツピングフイルムはポリエス
テルフイルム上に微細な研磨粒子を接着剤により
コーテングしたものであり、研摩粒子としてはア
ルミナ、シリコンカーバイド、酸化クローム等が
使われる。フイルムの厚さは１〜３ミル程度であ
る。第２図にこのラツピングフイルムの断面を模
式的に示す。図において２１は研摩粒子、２２は
接着剤、２３はポリエステルフイルムを示す。 The wrapping film here is, for example, "Imperial Wrapping Film" from Sumitomo 3M.
A commercially available abrasive film can be used. This wrapping film is a polyester film coated with fine abrasive particles using an adhesive, and alumina, silicon carbide, chromium oxide, etc. are used as the abrasive particles. The thickness of the film is on the order of 1-3 mils. FIG. 2 schematically shows a cross section of this wrapping film. In the figure, 21 represents abrasive particles, 22 represents an adhesive, and 23 represents a polyester film.
また、テープポリツシユとはテープ状に加工し
た上記ラツピングフイルムを用いて行なうポリツ
シユ方法である。 Further, tape polishing is a polishing method using the wrapping film processed into a tape shape.
第３図はこのテープポリツシユの方法を磁気デ
イスクに適用した場合を示す模式図である。図に
おいて３１は上にラツピングフイルムをテープ状
に加工したラツピングテープ、３２は磁気デイス
ク、３３は抑え棒である。図に示すように、ラツ
ピングテープ３１の研摩粒子の接着された面を抑
え棒３３により磁気デイスク３２の表面に当接
し、磁気デイスク３２を回転してその表面をポリ
ツシユするものである。 FIG. 3 is a schematic diagram showing the case where this tape polishing method is applied to a magnetic disk. In the figure, 31 is a wrapping tape on which a wrapping film is processed into a tape shape, 32 is a magnetic disk, and 33 is a holding rod. As shown in the figure, the surface of the wrapping tape 31 to which the abrasive particles are adhered is brought into contact with the surface of the magnetic disk 32 by a holding rod 33, and the magnetic disk 32 is rotated to polish the surface.
上記の再研摩を行なう際のラツピングフイルム
の粒度については、研摩剤粒子として、平均0.3μ
ｍ未満の微細なものをコーテイングしたラツピン
グフイルムが存在しないことから下限を上記値と
し、また、9μｍを超える粒子を使用した場合に
は研摩剤粒子が大きすぎるため、スクラツチが表
面についたり、あるいはポリツシユ速度が速すぎ
時間の制御が困難なため、上限を上記値とした。 Regarding the particle size of the wrapping film when performing the above re-polishing, the average particle size of the wrapping film is 0.3μ as the abrasive particles.
The lower limit is set above as there is no wrapping film coated with fine particles of less than 9 μm in size, and if particles larger than 9 μm are used, the abrasive particles are too large and may cause scratches on the surface or Since the polishing speed was too fast and it was difficult to control the time, the upper limit was set to the above value.
この再研摩時に、潤滑性保護被膜４の存在によ
り、磁気デイスク基板表面の微小突起５以外の部
分は保護され、微小突起５だけが選択的に除去さ
れるため、微小突起は数、高さともに著しく減小
し、最大表面粗さを0.10μｍRmax以下にするこ
とができる。スパツタ等による磁性被膜をこのよ
うな平滑な面に形成するならば、その被膜表面は
一層平滑となる。 During this re-polishing, the presence of the lubricating protective coating 4 protects the surface of the magnetic disk substrate other than the microprotrusions 5, and only the microprotrusions 5 are selectively removed. The maximum surface roughness can be reduced to 0.10μmRmax or less. If a magnetic coating is formed by sputtering or the like on such a smooth surface, the coating surface will be even smoother.
第４図ａ，ｂ，ｃは磁気デイスク塗膜にそれぞ
れ従来のバフポリツシユ、従来のテープポリツシ
ユおよび本発明による方法で表面の研摩を行なつ
た後の表面の粗さの測定結果を示す粗さ曲線図で
ある。ａ，ｂ，ｃの各図は、同一のスケールで示
されている。 Figures 4a, b, and c show the measurement results of the surface roughness of magnetic disk coatings after surface polishing using conventional buff polishing, conventional tape polishing, and the method according to the present invention, respectively. It is a curve diagram. Figures a, b, and c are shown to the same scale.
第４図ａ，ｂ，ｃから容易に判明するように、
ｂに示す従来のテープポリツシユのものはａに示
す従来のバフポリツシユのものよりも表面の平滑
さは優つているが、ｃに示す本発明によるもの
は、ａ，ｂに示す従来の何れの方法によるものよ
りも優れている。 As can be easily seen from Figure 4 a, b, and c,
The surface smoothness of the conventional tape polish shown in b is superior to that of the conventional buff polish shown in a, but the surface smoothness of the conventional tape polish shown in c is superior to that of the conventional tape polish shown in a and b. better than that by
また、本発明の方法において、再研摩の際磁気
デイスク表面の潤滑性保護被膜が完全に除去され
る程度に研摩を行なうと第４図ｂに示す公知のテ
ープポリツシユによるものと同じ状態になること
がわかつている。このことから考えて、潤滑性保
護被膜が存在することで表面に存在するアルミナ
という硬い材料を選択的に除去できていると判断
できる。 Furthermore, in the method of the present invention, if polishing is performed to such an extent that the lubricating protective film on the surface of the magnetic disk is completely removed during re-polishing, the state will be the same as that obtained by known tape polishing as shown in FIG. 4b. I know that. Considering this, it can be concluded that the presence of the lubricating protective film allows the hard material called alumina present on the surface to be selectively removed.
また、ポリツシユ後のラツピングフイルムの表
面の色を見ることでもそれを判断できる。つま
り、通常の磁気デイスク塗膜をポリツシユする
と、塗膜の構成材料である磁性酸化鉄の茶色がテ
ープ表面についてくるが、本発明のポリツシユ法
ではその色がテープ表面につかないという事実が
ある。 It can also be determined by looking at the surface color of the wrapping film after polishing. In other words, when a conventional magnetic disk coating is polished, the brown color of magnetic iron oxide, which is a constituent material of the coating, comes to the tape surface, but in the polishing method of the present invention, that color does not stick to the tape surface.
以上述べたように、本発明によれば、潤滑性保
護被膜の存在により微小突起以外の部分が保護さ
れ微小突起だけが選択的に除去されて磁気デイス
ク表面が平滑化されるため、ヘツド摩耗、劣化を
防止しかつ浮上性の向上をはかることができると
いう優れた効果を奏するものである。 As described above, according to the present invention, the presence of the lubricating protective coating protects parts other than the microprotrusions, and only the microprotrusions are selectively removed to smooth the magnetic disk surface. This has the excellent effect of preventing deterioration and improving the flying ability.
また、潤滑性保護被膜の厚さを前記実施例に記
載のように薄くすれは、潤滑性保護被膜の残存厚
さはヘツド浮上量に較べて小さくなり、記録特性
に影響を与えることはない。 Further, when the thickness of the lubricant protective coating is reduced as described in the above embodiment, the remaining thickness of the lubricant protective coating becomes smaller than the flying height of the head, and the recording characteristics are not affected.
第１図は本発明に係る磁気デイスクの表面平滑
化方法の実施例を示す正面断面図、第２図は本発
明に使用するラツピングフイルムの断面模式図、
第３図はテープポリツシユの方法を示す模式図、
第４図ａ，ｂ，ｃは磁気デイスク塗膜をそれぞれ
従来のバフポリツシユ、従来のテープポリツシユ
および本発明による方法で表面の研摩を行つた後
の表面の粗さの測定結果を示す粗さ曲線図であ
る。
図中、１は基板、２は磁性塗料被膜、３は非磁
性微粒子、４は潤滑性保護被膜、５は微小突起で
ある。
FIG. 1 is a front cross-sectional view showing an embodiment of the method for smoothing the surface of a magnetic disk according to the present invention, FIG. 2 is a schematic cross-sectional view of a wrapping film used in the present invention,
Figure 3 is a schematic diagram showing the tape polishing method;
Figures 4a, b, and c are roughness curves showing the measurement results of the surface roughness of magnetic disk coatings after surface polishing by conventional buff polishing, conventional tape polishing, and the method according to the present invention, respectively. It is a diagram. In the figure, 1 is a substrate, 2 is a magnetic paint coating, 3 is a non-magnetic fine particle, 4 is a lubricating protective coating, and 5 is a microprotrusion.
Claims (1)
けにより形成、もしくは磁性被膜をスパツタ、蒸
着により形成した磁気デイスク基板表面に潤滑性
保護被膜を形成し、その後該磁気デイスク基板表
面に存在する微小突起物を前記潤滑性保護被膜が
除去されない範囲でラツピングフイルムによる研
摩によつて取り除くことを特徴とする磁気デイス
ク基板の表面平滑化方法。1. A lubricating protective coating is formed on the surface of a magnetic disk substrate by coating and baking a magnetic paint on an aluminum substrate, or by sputtering or vapor deposition of a magnetic coating, and then removing minute protrusions present on the surface of the magnetic disk substrate. A method for smoothing the surface of a magnetic disk substrate, characterized in that the lubricating protective coating is removed by polishing with a wrapping film to the extent that it is not removed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16523579A JPS5690428A (en) | 1979-12-19 | 1979-12-19 | Surface smoothing method of magnetic disc substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16523579A JPS5690428A (en) | 1979-12-19 | 1979-12-19 | Surface smoothing method of magnetic disc substrate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5690428A JPS5690428A (en) | 1981-07-22 |
| JPH0210486B2 true JPH0210486B2 (en) | 1990-03-08 |
Family
ID=15808418
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16523579A Granted JPS5690428A (en) | 1979-12-19 | 1979-12-19 | Surface smoothing method of magnetic disc substrate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5690428A (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6069829A (en) * | 1983-09-22 | 1985-04-20 | Sony Corp | Production of thin film magnetic recording medium |
| JPH01292625A (en) * | 1988-05-19 | 1989-11-24 | Hitachi Ltd | Magnetic recording medium |
| JPH03116416A (en) * | 1990-04-27 | 1991-05-17 | Hitachi Ltd | Production of magnetic disk medium |
| US7276262B2 (en) | 2003-09-30 | 2007-10-02 | Hitachi Global Storage Technologies Netherlands B.V. | Control of process timing during manufacturing of magnetic thin film disks |
| JP2007087457A (en) | 2005-09-20 | 2007-04-05 | Fujitsu Ltd | Manufacturing method and apparatus for magnetic recording medium |
-
1979
- 1979-12-19 JP JP16523579A patent/JPS5690428A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5690428A (en) | 1981-07-22 |
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| JPH0273516A (en) | Magnetic disk |