JPH0196027A - Production of glass - Google Patents

Production of glass

Info

Publication number
JPH0196027A
JPH0196027A JP25413287A JP25413287A JPH0196027A JP H0196027 A JPH0196027 A JP H0196027A JP 25413287 A JP25413287 A JP 25413287A JP 25413287 A JP25413287 A JP 25413287A JP H0196027 A JPH0196027 A JP H0196027A
Authority
JP
Japan
Prior art keywords
wet gel
drying
gel
container
partition plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP25413287A
Other languages
Japanese (ja)
Inventor
Akihiko Yajima
矢島 明彦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP25413287A priority Critical patent/JPH0196027A/en
Publication of JPH0196027A publication Critical patent/JPH0196027A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00Other methods of shaping glass
    • C03B19/12Other methods of shaping glass by liquid-phase reaction processes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Silicon Compounds (AREA)

Abstract

PURPOSE:To improve yield in a transferring process and to drastically rationalize man-hour by drying wet gel on the partition plate of a vertically-type charging vessel and producing glass by a sol-gel method while using metal alkoxide as a raw material. CONSTITUTION:In production of glass by a sol-gel method in which metal alkoxide is used as a starting raw material, wet gel is dried on the partition plate of a vertical-type charging vessel. In this production of glass, wet gel is dried on the partition plate without transferring it and thereby as preparation of drying, wet gel is drawn out from the vertical-type charging vessel at every partition plates and only set in a drying vessel. Further more, since wet gel is always protected with the partition plates, a crack due to carelessness at the time of transferring, can be drastically reduced.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明はガラスの製造方法に関する。[Detailed description of the invention] [Industrial application field] The present invention relates to a method for manufacturing glass.

〔発明の概要〕[Summary of the invention]

本発明は、金属アルコキシドを出発原料とするゾル−ゲ
ル法によるガラスの製造において、第2図に示すような
II (を込み容器に仕込んで作ったウェットゲルを、
第3図に示すような縦仕込み容器の仕切り板上で、第1
図の吠態で乾燥するというガラスの製造方法である。従
来の縦仕込み法における乾燥は、縦仕込み容器にゾルを
(セ込んで作ったウェットゲルを、そのままでは乾燥出
来ないので縦仕込み容器から引き抜き、ポリプロピレン
製やテフロン製の容器に移し替えて乾燥していた。
In the production of glass by the sol-gel method using a metal alkoxide as a starting material, the present invention is directed to a wet gel made by charging II (as shown in FIG. 2) into a container.
On the partition plate of the vertical preparation container as shown in Figure 3,
This is a method of manufacturing glass that involves drying it in the shape shown in the figure. For drying in the conventional vertical feeding method, the wet gel made by pouring the sol into a vertical feeding container cannot be dried as it is, so it is pulled out from the vertical feeding container, transferred to a polypropylene or Teflon container, and dried. was.

しかしこの方法だと、非常にもろいウェットゲルを単体
で乾燥容器に移し替えなければならず、作業に非常に注
意を要した。したがって工数がかかり、また、移し替え
時の歩留りも悪かった。そこで、本発明では、移し替え
ること無しに仕切り板の上で、乾燥することにしたので
ある。これにより、乾燥の準備はウェットゲルを仕切り
板ごと縦仕込み容器から引き抜いて、乾燥容器にセツテ
ィングするだけで良い。また、ウェットゲルは常に仕切
り仮によって保護されているので、移し替え時の不注意
による割れを、格段に減らすことが出来る。
However, with this method, the extremely fragile wet gel had to be transferred to a drying container, requiring great care. Therefore, it took a lot of man-hours, and the yield at the time of transfer was also poor. Therefore, in the present invention, it was decided to dry on the partition plate without transferring. As a result, preparation for drying can be accomplished by simply pulling out the wet gel along with the partition plate from the vertical container and setting it in the drying container. In addition, since the wet gel is always protected by the temporary partition, it is possible to significantly reduce the chance of cracking due to carelessness during transfer.

〔従来の技術〕[Conventional technology]

従来の縦仕込ろ法における乾燥は、縦仕込み容器にゾル
を仕込んで作ったウェットゲルを、そのままでは乾燥出
来ないので縦仕込み容器から引き抜き、ウェットゲルを
単体でポリプロピレン製やテフロン製の容器に移し替え
て乾燥していた。しかしこの方法だと、非常にもろいウ
ェットゲルを単体で乾燥容器に移し替えなければならず
、作業に非常に注意を要した。したがって、工数がかか
り、また、移し替え時の歩留りも悪かった。
For drying in the conventional vertical filtration method, the wet gel made by filling the sol in a vertical filtration container cannot be dried as it is, so it is pulled out from the vertical filtration container and the wet gel is transferred alone to a container made of polypropylene or Teflon. It was changed and dried. However, with this method, the extremely fragile wet gel had to be transferred to a drying container, requiring great care. Therefore, it took a lot of man-hours, and the yield at the time of transfer was also poor.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

しかし、前述の従来技術では、非常にもろいウェットゲ
ルを単体で乾燥容器に移し替えなければならず、作業は
非常に注意を要した。したがって工数がかかり、また、
移し替えの歩留りも悪かったという問題点を有する。そ
こで、本発明では、移し替えることに無しに仕切り板の
上で乾燥するという方法を用いることにより、乾燥の準
備はウェットゲルを仕切り仮ごと縦仕込み容器から引き
抜いて、乾燥容器にセツティングするだけで良くなって
いる。またウェットゲルは常に仕切り板によって保護さ
れているので、移し替え時の不注意による割れを格段に
減らすことが出来る。したがって、その目的とするとこ
ろは移し替え工程での歩留りの向上と工数の大幅な合理
化をもたらすところにある。
However, in the above-mentioned prior art, the very fragile wet gel had to be transferred to a drying container, which required great care. Therefore, it takes a lot of man-hours, and
There is also a problem in that the transfer yield is poor. Therefore, in the present invention, by using a method of drying on a partition plate without transferring the gel, preparation for drying is as simple as pulling out the wet gel with the partition from the vertical container and setting it in the drying container. It's getting better. In addition, since the wet gel is always protected by the partition plate, it is possible to significantly reduce the chance of cracking due to carelessness during transfer. Therefore, the purpose is to improve the yield and significantly streamline the man-hours in the transfer process.

〔問題点を解決するための手段〕[Means for solving problems]

本発明のガラスの製造方法は、金属アルコキシドを出発
原料とするゾル−ゲル法によるガラスの製造において、
縦型住込み容器に仕込んで作ったウェットゲルを、縦型
仕込み容器の仕切り板上で乾燥することを特徴とする。
The method for producing glass of the present invention includes producing glass by a sol-gel method using a metal alkoxide as a starting material.
It is characterized by drying the wet gel prepared by charging it into a vertical storage container on the partition plate of the vertical storage container.

〔作用〕[Effect]

本発明の上記の構成によれば、移し替え工程での歩留り
の向上と、工数の大幅な合理化をもたらすことができる
According to the above-mentioned configuration of the present invention, it is possible to improve the yield in the transfer process and to significantly rationalize the number of man-hours.

〔実施例〕〔Example〕

実施例1 テトラエトキシシラン17.91及びO,Of規定塩酸
水溶液23.51及びシリカ微粒子(アエロジル0X−
50、西独、デグサ社製)10kgを混合して、1時間
激しく撹拌して加水分解液を得た。得られたゾルに超音
波(26kHz、1200W)を4時間照射して粗粒を
粉砕し、分散した。超音波照射により得られたゾルを今
度は遠心分Kmに積り、1500Gで15分間、遠心力
を印加し、残留している粗粒及び、異物を除去した。次
に得られたゾル′を10μms 7μm% 3μm% 
 1μmの順でプレフィルタ−を通した後、メンプラン
5μmのフィルターを通した。
Example 1 Tetraethoxysilane 17.91 and O,Of normal hydrochloric acid aqueous solution 23.51 and silica fine particles (Aerosil 0X-
50 (manufactured by Degussa, West Germany) were mixed and vigorously stirred for 1 hour to obtain a hydrolyzed solution. The obtained sol was irradiated with ultrasonic waves (26 kHz, 1200 W) for 4 hours to crush and disperse coarse particles. The sol obtained by ultrasonic irradiation was then loaded onto a centrifuge Km, and centrifugal force was applied at 1500 G for 15 minutes to remove remaining coarse particles and foreign matter. Next, the obtained sol' is 10μms 7μm% 3μm%
After passing through a 1 μm pre-filter, it was passed through a Membrane 5 μm filter.

得られた均一なゾルを、0.01規定のアンモニア水を
用いて、pH値を2.2から4.0に引き上げた。更に
得られたゾルを再び遠心分離機にとり、1500Gを1
5分間印加した後、再びメンプラン5μmのフィルター
を通して、第2図に示す縦住込み容器に仕込んだ。この
縦住込み容器は25cmX25cmX1.80の大きさ
のウェットゲルが12枚得るれるように作られている。
The pH value of the obtained homogeneous sol was raised from 2.2 to 4.0 using 0.01N aqueous ammonia. Furthermore, the obtained sol was taken into the centrifuge again and 1500G was
After applying the voltage for 5 minutes, the mixture was passed through a Membrane 5 μm filter again and charged into the vertical container shown in FIG. This vertical container is made to be able to obtain 12 sheets of wet gel measuring 25 cm x 25 cm x 1.80 cm.

1昼夜密閉して放置したところ、ゾルはゲル化し、ウェ
ットゲルが得られた。得られたウェットゲルを第1図に
示すような形で、乾燥容器にセットした。移し替え時に
ウェットゲル12枚に割れはなかった。また12枚移し
替えるのに要した時間は4分だった。
When the container was left sealed for one day and night, the sol gelatinized and a wet gel was obtained. The obtained wet gel was placed in a drying container in the form shown in FIG. There were no cracks in the 12 wet gels during transfer. Also, the time required to transfer 12 sheets was 4 minutes.

開口率0.3%の穴の問いた蓋にかえ、乾燥機にいれて
、60℃で1週間乾燥して、乾燥ゲルを得た。この時の
乾燥歩留りは、12枚中割れはなく、100%であった
It was replaced with a lid with holes having an open area ratio of 0.3%, placed in a dryer, and dried at 60° C. for one week to obtain a dry gel. The drying yield at this time was 100% with no cracks among the 12 sheets.

得られた乾燥ゲルを200℃で更に乾燥して残留してい
る水分を完全に除去した。これを、大気炉に入れ、Dr
y−Air雰囲気で1000°Cで焼結した。次に、真
空炉に入れて、真空にて1400℃にて焼結したところ
、石英ガラスが得られた。
The obtained dry gel was further dried at 200° C. to completely remove remaining water. Put this in an atmospheric furnace and Dr.
Sintering was performed at 1000°C in a y-Air atmosphere. Next, it was placed in a vacuum furnace and sintered at 1400° C. in a vacuum to obtain quartz glass.

比較例1 実施例1と同様にして仕込みをして得られた12枚のウ
ェットゲルを乾燥容器に第4図の状態に移し替えた。1
2枚中3枚が割れ、このときの移し替えの歩留りは、7
5%であった。また、移し替えに要した時間は11分で
あった。開口率0゜3%の穴の開いた蓋にかえ、乾燥機
にいれて、60℃で1週間乾燥して、乾燥ゲルを得た。
Comparative Example 1 Twelve sheets of wet gel prepared in the same manner as in Example 1 were transferred to a dry container in the state shown in FIG. 4. 1
Three out of two sheets were broken, and the transfer yield at this time was 7.
It was 5%. Further, the time required for transfer was 11 minutes. It was replaced with a lid with holes with an opening ratio of 0.3%, placed in a dryer, and dried at 60°C for one week to obtain a dry gel.

得られた乾燥ゲルを、実施例1と同様の条件にて焼結し
て、石英ガラスを得た。
The obtained dried gel was sintered under the same conditions as in Example 1 to obtain quartz glass.

実施例2 エタ/−ルア、200mb  水2,000m11アン
モニア水240m1を撹拌して均一系にしたところへテ
トラエトキシシラ74,980m1を撹拌しながら添加
した。3時間ゆっくり撹拌して放置したところ、シリカ
微粒子が生成した。
Example 2 Eta/-Lua, 200 mb 2,000 ml of water and 240 ml of aqueous ammonia were stirred to form a homogeneous system, and 74,980 ml of tetraethoxysila was added with stirring. When the mixture was slowly stirred and left for 3 hours, fine silica particles were generated.

得られた、シリカ分散液をロータリーエバポレーターを
使って31にまで濃縮した。これをA液とする。この操
作を5回行ない、151のA液を得た。
The resulting silica dispersion was concentrated to a concentration of 31 using a rotary evaporator. This is called liquid A. This operation was repeated 5 times to obtain 151 liquid A.

つぎにテトラエトキシシラン11,280m1と0.0
2規定塩酸水3,200m1を混合し1時間激しく撹拌
しテトラエトキシシランの加水分解液を得た。これをB
液とする。
Next, 11,280ml of tetraethoxysilane and 0.0
3,200 ml of 2N hydrochloric acid was mixed and stirred vigorously for 1 hour to obtain a hydrolyzed solution of tetraethoxysilane. This is B
Make it into a liquid.

AfiQPH値を2規定の塩酸を用いて4.5に調整し
、B液と混合してよく撹拌した。得られたゾルを40μ
m15μmの順でフィルターを通して、第2図に示す縦
仕込み容器に仕込んだ。この縦仕込み容器は30cmX
30CIX 1.6cmの大きさのウェットゲルが12
枚得るれるように作られている。
The AfiQPH value was adjusted to 4.5 using 2N hydrochloric acid, mixed with Solution B, and thoroughly stirred. 40μ of the obtained sol
The mixture was passed through a filter with a diameter of 15 μm and charged into a vertical container shown in FIG. This vertical preparation container is 30cmX
30CIX 12 wet gels of 1.6cm size
It is designed so that you can get one.

1昼夜密閉して放置したところ、ゾルはゲル化し、ウェ
ットゲルが得られた。得られたウェットゲルを第1図に
示すような形で、乾燥容器にセットした。移し替え時に
ウェットゲル12枚に割れはなかった。また12枚移し
替えのに要した時間は5分だった。
When the container was left sealed for one day and night, the sol gelatinized and a wet gel was obtained. The obtained wet gel was placed in a drying container in the form shown in FIG. There were no cracks in the 12 wet gels during transfer. Also, the time required to transfer 12 sheets was 5 minutes.

開口率0.3%の穴の開いた蓋にかえ、乾燥機にいれて
、60°Cで1週間乾燥して、乾燥ゲルを得た。この時
の、乾燥歩留りは12枚中割れはなく、100%であっ
た。
It was replaced with a lid with holes with an opening ratio of 0.3%, placed in a dryer, and dried at 60°C for one week to obtain a dry gel. At this time, the drying yield was 100% with no cracks among the 12 sheets.

得られた乾燥ゲルを200°Cで更に乾燥して残留して
いる水分を完全に除去した。これを、さらに400℃で
乾燥して残留している塩化アンモニアを除去した。つぎ
に、大気炉に入れ、D r y −Air雰囲気で80
0℃で焼結した。次に、真空炉に入れて、真空にて18
00℃にて焼結したところ、石英ガラスが得られた。
The resulting dry gel was further dried at 200°C to completely remove remaining water. This was further dried at 400°C to remove remaining ammonia chloride. Next, it was placed in an atmospheric furnace and heated for 80 minutes in a Dry-Air atmosphere.
Sintered at 0°C. Next, put it in a vacuum furnace and vacuum it for 18 hours.
When sintered at 00°C, quartz glass was obtained.

比較例2 実施例2と同様にして仕込みをして得られた12枚のウ
ェットゲルを乾燥容器に第4図の状態に移し替えた。1
2枚中5枚が割れ、このときの移し替えの歩留りは、4
1.7%であった。また、移し替えに要した時間は18
分であった。開口率0.3%の、穴の開いた蓋にかえ、
乾燥機にいれて、60℃で1週間乾燥して、乾燥ゲルを
得た。
Comparative Example 2 Twelve sheets of wet gel prepared in the same manner as in Example 2 were transferred to a dry container in the state shown in FIG. 4. 1
5 out of 2 sheets were broken, and the transfer yield at this time was 4.
It was 1.7%. Also, the time required for transfer was 18
It was a minute. Instead of a lid with holes with an opening ratio of 0.3%,
The gel was placed in a dryer and dried at 60° C. for one week to obtain a dry gel.

得られた乾燥ゲルを、実施例2と同様の条件にて焼結し
て、石英ガラスを得た。
The obtained dried gel was sintered under the same conditions as in Example 2 to obtain quartz glass.

〔発明の効果〕〔Effect of the invention〕

以上述べてきたように、本発明ではia型住込みにおい
て、縦型仕込み容器の仕切り板上で乾燥することにより
、移し替え歩留りの格段の向上と、移し替え工数の合理
化をもたらしたものである。
As described above, the present invention significantly improves the transfer yield and rationalizes the transfer man-hours by drying on the partition plate of the vertical preparation container in the IA type live-in.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は仕切り板上での乾燥状態を示した図である。 120・・・通気孔 121・・・ウェットゲル 122・・・ポリプロピレン製乾燥容器123・・・蓋 124・・・仕切り板 第2図は縦型仕込み容器の概要を示した図である。 11・・・縦型仕込み容器 12・・・仕切り板 13・・・ウェットゲル 第3図は仕切り板の概要を示した図である。 101・・・引き抜き穴 102・・・仕切り板 103・・・スペーサー 第4図は通常の乾燥状態を示す図である。 130・・・通気孔 131・・・蓋 133・・・ウェットゲル 134・・・ポリプロピレン製乾燥容器以  上 出願人 セイコーエプソン株式会社 FIG. 1 is a diagram showing the drying state on the partition plate. 120...Vent hole 121...Wet gel 122... Polypropylene drying container 123... Lid 124...Partition plate FIG. 2 is a diagram showing an outline of a vertical preparation container. 11... Vertical preparation container 12...Partition plate 13...Wet gel FIG. 3 is a diagram showing an outline of the partition plate. 101... Pull-out hole 102...Partition plate 103...Spacer FIG. 4 is a diagram showing a normal dry state. 130...Vent hole 131...lid 133...Wet gel 134...Polypropylene drying container and above Applicant: Seiko Epson Corporation

Claims (1)

【特許請求の範囲】[Claims] 金属アルコキシドを出発原料とするゾル−ゲル法による
ガラスの製造において、縦型仕込み容器を仕込んで作っ
たウェットゲルを、縦型仕込み容器の仕切り板上で乾燥
することを特徴とするガラスの製造方法。
A method for producing glass, which comprises drying a wet gel produced by filling a vertical charging container on a partition plate of the vertical charging container, in the manufacturing of glass by the sol-gel method using metal alkoxide as a starting material. .
JP25413287A 1987-10-08 1987-10-08 Production of glass Pending JPH0196027A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25413287A JPH0196027A (en) 1987-10-08 1987-10-08 Production of glass

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25413287A JPH0196027A (en) 1987-10-08 1987-10-08 Production of glass

Publications (1)

Publication Number Publication Date
JPH0196027A true JPH0196027A (en) 1989-04-14

Family

ID=17260661

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25413287A Pending JPH0196027A (en) 1987-10-08 1987-10-08 Production of glass

Country Status (1)

Country Link
JP (1) JPH0196027A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000008221A1 (en) * 1998-08-05 2000-02-17 Nippon Steel Corporation Rolled steel product excellent in weatherability and fatigue resisting characteristic and method of production thereof

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000008221A1 (en) * 1998-08-05 2000-02-17 Nippon Steel Corporation Rolled steel product excellent in weatherability and fatigue resisting characteristic and method of production thereof
EP1026276A1 (en) * 1998-08-05 2000-08-09 Nippon Steel Corporation Rolled steel product excellent in weatherability and fatigue resisting characteristic and method of production thereof
EP1026276A4 (en) * 1998-08-05 2005-03-09 Nippon Steel Corp Rolled steel product excellent in weatherability and fatigue resisting characteristic and method of production thereof

Similar Documents

Publication Publication Date Title
JPH0196027A (en) Production of glass
JP3203694B2 (en) Manufacturing method of quartz glass
JPH0196023A (en) Production of glass
JPH01119532A (en) Production of glass
JPS62119124A (en) Production of glass
JPH0196028A (en) Production of glass
JPH0196029A (en) Production of glass
JPS61163131A (en) Preparation of glass body
JPS63291823A (en) Production of glass
JPS61232233A (en) Production of quartz glass
JPS61232230A (en) Production of quartz glass
JPS63277524A (en) Production of glass
JPS60239329A (en) Manufacture of quartz glass
JPS6197136A (en) Production of quartz glass
JPH02302332A (en) Production of platy silica glass
JPS62230636A (en) Production of porous glass article
JPS61168541A (en) Production of quartz glass
JPH02145442A (en) Production of glass
JPS62167231A (en) Production of quartz glass
JPS6330330A (en) Production of glass
JPH01119529A (en) Production of glass
JPS60264335A (en) Preparation of plate glass
JPS61168537A (en) Production of quartz glass
JPS63307125A (en) Production of glass
JPS63134525A (en) Production of glass