JPH0192071A - Preparing and jetting device for superfine frozen particle - Google Patents
Preparing and jetting device for superfine frozen particleInfo
- Publication number
- JPH0192071A JPH0192071A JP25034187A JP25034187A JPH0192071A JP H0192071 A JPH0192071 A JP H0192071A JP 25034187 A JP25034187 A JP 25034187A JP 25034187 A JP25034187 A JP 25034187A JP H0192071 A JPH0192071 A JP H0192071A
- Authority
- JP
- Japan
- Prior art keywords
- frozen
- particles
- vapor
- pressure
- frozen particles
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002245 particle Substances 0.000 title claims abstract description 55
- 239000007788 liquid Substances 0.000 claims abstract description 18
- 238000007710 freezing Methods 0.000 claims abstract description 10
- 230000008014 freezing Effects 0.000 claims abstract description 10
- 239000003507 refrigerant Substances 0.000 claims description 15
- 238000002347 injection Methods 0.000 claims description 10
- 239000007924 injection Substances 0.000 claims description 10
- 238000010438 heat treatment Methods 0.000 claims description 3
- 238000000034 method Methods 0.000 claims description 2
- 238000001816 cooling Methods 0.000 abstract description 20
- 238000004519 manufacturing process Methods 0.000 abstract description 9
- 239000004065 semiconductor Substances 0.000 abstract description 3
- 230000015271 coagulation Effects 0.000 abstract 1
- 238000005345 coagulation Methods 0.000 abstract 1
- 230000006837 decompression Effects 0.000 abstract 1
- 239000010419 fine particle Substances 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 238000004140 cleaning Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 238000004381 surface treatment Methods 0.000 description 4
- 238000005422 blasting Methods 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 239000007789 gas Substances 0.000 description 2
- 230000003993 interaction Effects 0.000 description 2
- 239000003082 abrasive agent Substances 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Abstract
Description
【発明の詳細な説明】
［産業上の利用分野］
この発明は、超微凍結粒の製造噴射装置に関し、特に半
導体装置製造用マスク等の表面処理に用いられる超微凍
結粒を製造および噴射する装置に関するものである。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to an apparatus for producing and injecting ultra-fine frozen particles, particularly for producing and injecting ultra-fine frozen particles used for surface treatment of masks for manufacturing semiconductor devices, etc. It is related to the device.
［従来の技術］
従来から、ブラスト、クリーニング等の表面処理用の砥
粒、研磨剤として用いられる微細な氷等の凍結粒を製造
するための装置として、種々の構造のものが提案されて
きた。超微細な凍結粒を得るという目的に適用される装
置としては、たとえば、第２図に示すような装置が提案
されている。[Prior Art] Various structures have been proposed as devices for producing frozen particles such as fine ice used as abrasive particles and abrasives for surface treatments such as blasting and cleaning. . For example, an apparatus as shown in FIG. 2 has been proposed as an apparatus used for the purpose of obtaining ultrafine frozen particles.
第２図はこのような超微凍結粒の製造噴射装置の概略構
成図である。FIG. 2 is a schematic diagram of a production injection device for such ultrafine frozen particles.
図において、被凍結液１は密閉容器２内に収容され、そ
の蒸気を発生させるために加熱するヒータ３ａ、３ｂが
設けられている。冷却容器４内には発生した蒸気が導か
れるとともに、その蒸気を凍結させるための液体窒素等
の冷媒が冷媒導入管５によって矢印Ａで示す方向に導入
されている。In the figure, a liquid to be frozen 1 is contained in a closed container 2, and heaters 3a and 3b are provided for heating the liquid to generate steam. The generated vapor is guided into the cooling container 4, and a refrigerant such as liquid nitrogen for freezing the vapor is introduced in the direction shown by arrow A through a refrigerant introduction pipe 5.
冷却容器４内に導入する蒸気量を制御するためにバルブ
６が設けられ、冷却容器４内で発生した超微凍結粒を含
む気体の噴出を制御するためにバルブ７が設けられてい
る。被処理物８はバルブ７の噴出口に設置されている。A valve 6 is provided to control the amount of steam introduced into the cooling container 4, and a valve 7 is provided to control the ejection of gas containing ultrafine frozen particles generated within the cooling container 4. The object to be treated 8 is installed at the spout of the valve 7.
次に動作について説明する。Next, the operation will be explained.
被凍結液１は密閉容器２においてヒータ３ａにより加熱
され、被凍結液１より発生した蒸気はバルブ６により制
御され、冷却容器４内に導入される。ヒータ３ｂは発生
した蒸気をバルブ６の部分において液化させないために
用いられる。冷却容器４に導かれた蒸気は冷媒導入管５
から導入される液体窒素等の冷媒との間で熱交換が行な
われることにより、冷却され、超微凍結粒が形成される
。The liquid to be frozen 1 is heated by a heater 3a in a closed container 2, and the steam generated from the liquid to be frozen 1 is controlled by a valve 6 and introduced into a cooling container 4. The heater 3b is used to prevent the generated steam from being liquefied at the valve 6. The steam led to the cooling container 4 is passed through the refrigerant introduction pipe 5
By exchanging heat with a refrigerant such as liquid nitrogen introduced from the inside, the particles are cooled and ultrafine frozen particles are formed.
超微凍結粒は冷媒として用いられた気体を媒体として輸
送されるが、これをバルブ７により制御し、被処理物８
に射出させることにより、被処理物８のブラスト、クリ
ーニング等の表面処理を行なう。The ultrafine frozen particles are transported using a gas used as a refrigerant, but this is controlled by a valve 7 and the object to be processed 8 is transported.
Surface treatment such as blasting and cleaning of the object 8 to be treated is performed by injecting the beam to the surface of the object 8.
［発明が解決しようとする問題点］
従来の超微凍結粒の製造噴射装置は以上のように構成さ
れており、冷却容器４の内部温度、蒸気の冷却容器４内
への噴射圧力を制御することによって粒径１〜２μｍの
均一な凍結粒が得られている。しかしながら、たとえば
、半導体装置製造用マスク等のクリーニングを行なう場
合、表面に付着する超微細な異物等を除去するために粒
径１μｍ以下の凍結粒の製造が要請されているが、従来
のこのような装置構成ではこの要求を満足することがで
きないという問題点があった。[Problems to be Solved by the Invention] The conventional ultra-fine frozen particle production injection device is configured as described above, and controls the internal temperature of the cooling container 4 and the injection pressure of steam into the cooling container 4. As a result, uniform frozen particles with a particle size of 1 to 2 μm are obtained. However, when cleaning masks for semiconductor device manufacturing, for example, it is required to produce frozen particles with a particle size of 1 μm or less in order to remove ultrafine foreign matter adhering to the surface. There was a problem that this requirement could not be satisfied with a conventional device configuration.
そこで、この発明は上記のような問題点を解消するため
になされたもので、粒径１μｍ以下の超微凍結粒を得る
ことができる超微凍結粒の製造噴射装置を提供すること
を目的とする。Therefore, this invention was made to solve the above-mentioned problems, and an object of the present invention is to provide an ultra-fine frozen particle production/injection device that can obtain ultra-fine frozen particles with a particle size of 1 μm or less. do.
［問題点を解決するための手段］
この発明に従った超微凍結粒の製造噴射装置は、次のよ
うな手段を備えたものである。[Means for Solving the Problems] The ultrafine frozen particle manufacturing and injection apparatus according to the present invention is equipped with the following means.
（ａ）被凍結液を加熱して蒸気を発生させる手段。(a) Means for heating the liquid to be frozen to generate steam.
（ｂ）蒸気を冷媒中に噴射し、凍結させて凍結粒を得る
手段。(b) Means for injecting steam into a refrigerant and freezing it to obtain frozen particles.
（ｃ）凍結粒を噴射させる手段。(c) Means for injecting frozen particles.
そして、この発明の装置は、蒸気を冷媒中で凍結させる
過程が大気圧より減圧下の状態で行なわれるものである
。In the apparatus of the present invention, the process of freezing vapor in a refrigerant is carried out at a pressure lower than atmospheric pressure.
［作用］
この発明における被凍結液より発生する蒸気は大気圧よ
り減圧下の状態で凍結させられる。このような状態では
、蒸気の粒子間の相互作用による凝結成長が大気圧下よ
りも遅速となる。そのため、蒸気粒子の粒径が大きく成
長する前に凍結が生じることになり、より微小な粒径を
持つ超微凍結粒を得ることができる。[Operation] In the present invention, the vapor generated from the liquid to be frozen is frozen at a pressure lower than atmospheric pressure. Under such conditions, condensation growth due to interactions between vapor particles is slower than under atmospheric pressure. Therefore, freezing occurs before the particle size of the vapor particles grows large, making it possible to obtain ultrafine frozen particles having a smaller particle size.
［実施例］
以下、この発明の一実施例を図について説明する。第１
図はこの発明に従った超微凍結粒の製造噴射装置を示す
概略構成図である。[Example] Hereinafter, an example of the present invention will be described with reference to the drawings. 1st
The figure is a schematic configuration diagram showing an apparatus for producing and injecting ultrafine frozen particles according to the present invention.
図において、被凍結液１は密閉容器２内に収容され、ヒ
ータ３ａ、３ｂが被凍結液１を加熱し、蒸気を発生させ
るために設けられている。発生した蒸気は冷却容器４内
に導入されるとともに、その蒸気を凍結させるために液
体窒素等の冷媒が冷媒導入管５によって矢印Ａで示す方
向に冷却容器４内に導入されている。密閉容器２内で発
生した蒸気の冷却容器４中への噴射量はバルブ６によっ
て制御され、バルブ７は冷却容器４中で発生した超微凍
結粒を含む冷媒の被処理物８への噴射を制御している。In the figure, a liquid to be frozen 1 is housed in a closed container 2, and heaters 3a and 3b are provided to heat the liquid to be frozen 1 and generate steam. The generated vapor is introduced into the cooling container 4, and a refrigerant such as liquid nitrogen is introduced into the cooling container 4 in the direction shown by arrow A through the refrigerant introduction pipe 5 in order to freeze the vapor. The amount of vapor generated in the closed container 2 to be injected into the cooling container 4 is controlled by a valve 6, and the valve 7 controls the injection of the refrigerant containing ultrafine frozen particles generated in the cooling container 4 to the object to be processed 8. It's in control.
被処理物８はクリーニング、ブラスト等の表面処理が施
されるために処理室１０内に設置されている。′真空ポ
ンプ９ａは冷却容器４内を大気圧より減圧にするために
設けられ、真空ポンプ９ｂは被処理物８が配置されてい
る処理室１０内を減圧にするために設けられている。The object to be processed 8 is placed in a processing chamber 10 to be subjected to surface treatments such as cleaning and blasting. 'The vacuum pump 9a is provided to reduce the pressure in the cooling container 4 from atmospheric pressure, and the vacuum pump 9b is provided to reduce the pressure in the processing chamber 10 in which the object to be processed 8 is placed.
従来例と同様に、被凍結液１は密閉容器２内でヒータ３
ａによって加熱され、被凍結液１より発生した蒸気はバ
ルブ６を通じて冷却容器４内に導入される。冷却容器４
は真空ポンプ９ａで排気されていることにより、大気圧
より低い圧力状態になっている。このような状態では導
入された蒸気の粒子が互いに衝突を生じる開度が大気圧
の状態よりも低く、蒸気粒子が相互作用により凝結し成
長するまでに長い時間が必要である。そのため、蒸気粒
子が凝結し、粒径が大きくなる前に凍結が生じ、より微
小な粒径を持つ超微凍結粒を得ることができる。このよ
うにして得られた超微凍結粒はバルブ７を介して被処理
物８上に噴出される。Similar to the conventional example, the liquid to be frozen 1 is stored in a sealed container 2 and heated to a heater 3.
Steam generated from the liquid to be frozen 1 is introduced into the cooling container 4 through the valve 6. Cooling container 4
is evacuated by the vacuum pump 9a, so that the pressure is lower than atmospheric pressure. In such a state, the degree of opening at which the introduced vapor particles collide with each other is lower than in the atmospheric pressure state, and it takes a long time for the vapor particles to condense and grow due to interaction. Therefore, freezing occurs before the vapor particles condense and increase in particle size, making it possible to obtain ultrafine frozen particles with even smaller particle sizes. The ultrafine frozen particles thus obtained are ejected onto the object to be processed 8 via the valve 7.
好ましくは、超微凍結粒をより高速に噴射させるために
は、被処理物８上の圧力が冷却容器４内の圧力よりも低
ければよい。この目的を達成するために、被処理物８が
配置されている処理室１０を密閉し、真空ポンプ９ｂで
排気することにより、処理室１０内を冷却容器４内より
も低い圧力とする。このようにして冷却容器４内と処理
室１０内との間の圧力差を利用することにより、超微凍
結粒を含む媒体をより高速に噴出させ得る。Preferably, in order to jet the ultra-fine frozen particles at a higher speed, the pressure on the object to be processed 8 should be lower than the pressure inside the cooling container 4. To achieve this purpose, the processing chamber 10 in which the object to be processed 8 is placed is sealed and evacuated by the vacuum pump 9b, thereby making the inside of the processing chamber 10 a lower pressure than the inside of the cooling container 4. In this way, by utilizing the pressure difference between the inside of the cooling container 4 and the inside of the processing chamber 10, the medium containing the ultrafine frozen particles can be ejected at a higher speed.
［発明の効果］
以上のように、この発明によれば大気圧より減圧下で蒸
気を凍結させるように構成したので、より微細な凍結粒
が得られるという効果がある。[Effects of the Invention] As described above, according to the present invention, since the vapor is frozen under a pressure lower than atmospheric pressure, there is an effect that finer frozen particles can be obtained.
第１図はこの発明の一実施例による超微凍結粒の製造噴
射装置の概略構成図、第２図は従来の超微凍結粒や製造
噴射装置の概略構成図である。
図において、１は被凍結液、２は密閉容器、３ａ、３ｂ
はヒータ、４は冷却容器、５は冷媒導入管、６，７はバ
ルブ、８は被処理物、９ａ、 ９ｂは真空ポンプ、１
０は処理室である。
なお、各図中、同一符号は同一または相当部分を示す。FIG. 1 is a schematic diagram of a production injection device for ultra-fine frozen particles according to an embodiment of the present invention, and FIG. 2 is a schematic diagram of a conventional ultra-fine frozen particle production and injection device. In the figure, 1 is the liquid to be frozen, 2 is a sealed container, 3a, 3b
is a heater, 4 is a cooling container, 5 is a refrigerant introduction pipe, 6 and 7 are valves, 8 is a workpiece, 9a and 9b are vacuum pumps, 1
0 is a processing chamber. In each figure, the same reference numerals indicate the same or corresponding parts.
Claims (2)
記蒸気を冷媒中に噴射し、凍結させて凍結粒を得る手段
と、前記凍結粒を噴射させる手段とを備えた超微凍結粒
の製造噴射装置であって、前記蒸気を冷媒中で凍結させ
る過程が、大気圧より減圧下の状態で行なわれる、超微
凍結粒の製造噴射装置。(1) Ultrafine freezing comprising means for heating the liquid to be frozen to generate steam, means for injecting the steam into a refrigerant and freezing it to obtain frozen particles, and means for injecting the frozen particles. 1. An injection device for producing ultra-fine frozen particles, wherein the process of freezing the vapor in a refrigerant is performed at a pressure lower than atmospheric pressure.
中で凍結させる圧力状態よりも低い圧力状態下の空間に
、前記冷媒を媒体として前記凍結粒を噴射させることを
特徴とする、特許請求の範囲第１項に記載の超微凍結粒
の製造噴射装置。(2) The means for injecting the frozen particles is characterized in that the means for injecting the frozen particles injects the frozen particles using the refrigerant as a medium into a space under a pressure state lower than the pressure state in which the vapor is frozen in the refrigerant. An injection device for producing ultrafine frozen particles according to claim 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25034187A JPH0192071A (en) | 1987-10-02 | 1987-10-02 | Preparing and jetting device for superfine frozen particle |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25034187A JPH0192071A (en) | 1987-10-02 | 1987-10-02 | Preparing and jetting device for superfine frozen particle |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0192071A true JPH0192071A (en) | 1989-04-11 |
Family
ID=17206477
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP25034187A Pending JPH0192071A (en) | 1987-10-02 | 1987-10-02 | Preparing and jetting device for superfine frozen particle |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0192071A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1998057365A1 (en) * | 1997-06-11 | 1998-12-17 | Fsi International, Inc. | Treating substrates by producing and controlling a cryogenic aerosol |
| CN103302598A (en) * | 2012-03-09 | 2013-09-18 | 海纳微加工股份有限公司 | Vacuum pressure-differential micromachining apparatus and method |
-
1987
- 1987-10-02 JP JP25034187A patent/JPH0192071A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1998057365A1 (en) * | 1997-06-11 | 1998-12-17 | Fsi International, Inc. | Treating substrates by producing and controlling a cryogenic aerosol |
| US5961732A (en) * | 1997-06-11 | 1999-10-05 | Fsi International, Inc | Treating substrates by producing and controlling a cryogenic aerosol |
| CN103302598A (en) * | 2012-03-09 | 2013-09-18 | 海纳微加工股份有限公司 | Vacuum pressure-differential micromachining apparatus and method |
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