JPH0189732U - - Google Patents
Info
- Publication number
- JPH0189732U JPH0189732U JP18614487U JP18614487U JPH0189732U JP H0189732 U JPH0189732 U JP H0189732U JP 18614487 U JP18614487 U JP 18614487U JP 18614487 U JP18614487 U JP 18614487U JP H0189732 U JPH0189732 U JP H0189732U
- Authority
- JP
- Japan
- Prior art keywords
- opening
- gas
- tube
- wafer
- inflow
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000037431 insertion Effects 0.000 claims description 6
- 238000003780 insertion Methods 0.000 claims description 6
- 238000005192 partition Methods 0.000 claims description 2
Description
第1図は、本考案に係るウエハ挿入管の縦断面
図である。第2図は、第1図の平面図である。第
3図は、従来例を表わすウエハ挿入管の縦断面図
である。第4図は、第3図の平面図である。
符号の説明、1……ウエハ挿入管、2……ウエ
ハ支持装置(ボート)、3……支柱、4……ウエ
ハ、5……ガス流入用の開口(ガス流入口)、6
……ガス流出用の開口(ガス流出口)、7……チ
ユーブ(外管)、8……内管、9……ガス導入口
、10……ガス導出口、11……ガス流通路、1
1a……ガス導入路、11b……ガス導出路、1
2……仕切部材、A,A′……ガス流の流れ方向
。
FIG. 1 is a longitudinal sectional view of a wafer insertion tube according to the present invention. FIG. 2 is a plan view of FIG. 1. FIG. 3 is a longitudinal sectional view of a wafer insertion tube representing a conventional example. FIG. 4 is a plan view of FIG. 3. Explanation of symbols, 1...Wafer insertion tube, 2...Wafer support device (boat), 3...Strut, 4...Wafer, 5...Opening for gas inflow (gas inlet), 6
...Opening for gas outflow (gas outlet), 7...Tube (outer tube), 8...Inner tube, 9...Gas inlet, 10...Gas outlet, 11...Gas flow path, 1
1a... Gas introduction path, 11b... Gas outlet path, 1
2...Partition member, A, A'...Flow direction of gas flow.
Claims (1)
の開口部を、他方にガス流出用の開口部を有し、
ウエハを略水平に保持するウエハ支持装置を囲繞
するウエハ挿入管において、該ウエハ挿入管を外
管と内管とからなる二重管構成とし、外管の上部
もしくは下部のいずれか一方に前記ガス流入用の
開口部を、他方にガス流出用の開口部を設け、か
つ、内管の対向壁面所定箇所にガス導入用の開口
とガス導出用の開口をそれぞれ設けると共に、前
記外管と内管との間に限定される空間を前記ガス
流入用の開口部を有するガス導入路と、前記ガス
流出用の開口部を有するガス導出路とに遮断する
仕切部材を設けてなることを特徴とするウエハ挿
入管。 It has an opening for gas inflow on either the top or bottom and an opening for gas outflow on the other side,
In a wafer insertion tube that surrounds a wafer support device that holds a wafer approximately horizontally, the wafer insertion tube has a double tube structure consisting of an outer tube and an inner tube, and the gas is supplied to either the upper or lower portion of the outer tube. An opening for inflow is provided on the other side, an opening for gas outflow is provided on the other side, and an opening for gas introduction and an opening for gas outflow are provided at predetermined locations on the opposing wall surfaces of the inner tube, and the outer tube and the inner tube are A partition member is provided that blocks the space defined between the gas inlet passageway having the gas inflow opening and the gas outlet passageway having the gas outflow opening. Wafer insertion tube.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18614487U JPH0189732U (en) | 1987-12-07 | 1987-12-07 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18614487U JPH0189732U (en) | 1987-12-07 | 1987-12-07 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0189732U true JPH0189732U (en) | 1989-06-13 |
Family
ID=31477389
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP18614487U Pending JPH0189732U (en) | 1987-12-07 | 1987-12-07 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0189732U (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012212819A (en) * | 2011-03-31 | 2012-11-01 | Tokyo Electron Ltd | Vertical batch-type film deposition apparatus |
JP2014518193A (en) * | 2011-07-06 | 2014-07-28 | ダウ グローバル テクノロジーズ エルエルシー | Method for producing porous acicular mullite body |
-
1987
- 1987-12-07 JP JP18614487U patent/JPH0189732U/ja active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012212819A (en) * | 2011-03-31 | 2012-11-01 | Tokyo Electron Ltd | Vertical batch-type film deposition apparatus |
JP2014518193A (en) * | 2011-07-06 | 2014-07-28 | ダウ グローバル テクノロジーズ エルエルシー | Method for producing porous acicular mullite body |