JPH0184427U - - Google Patents

Info

Publication number
JPH0184427U
JPH0184427U JP1987180246U JP18024687U JPH0184427U JP H0184427 U JPH0184427 U JP H0184427U JP 1987180246 U JP1987180246 U JP 1987180246U JP 18024687 U JP18024687 U JP 18024687U JP H0184427 U JPH0184427 U JP H0184427U
Authority
JP
Japan
Prior art keywords
substrate
chamber
photoresist
supply port
wavelength
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1987180246U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1987180246U priority Critical patent/JPH0184427U/ja
Publication of JPH0184427U publication Critical patent/JPH0184427U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
JP1987180246U 1987-11-26 1987-11-26 Pending JPH0184427U (enExample)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1987180246U JPH0184427U (enExample) 1987-11-26 1987-11-26

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1987180246U JPH0184427U (enExample) 1987-11-26 1987-11-26

Publications (1)

Publication Number Publication Date
JPH0184427U true JPH0184427U (enExample) 1989-06-05

Family

ID=31471767

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1987180246U Pending JPH0184427U (enExample) 1987-11-26 1987-11-26

Country Status (1)

Country Link
JP (1) JPH0184427U (enExample)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6298729A (ja) * 1985-10-25 1987-05-08 Mitsubishi Electric Corp 紫外線とオゾンを用いた表面処理装置
JPS62154629A (ja) * 1985-12-27 1987-07-09 Chlorine Eng Corp Ltd 有機物被膜の除去方法
JPS63260132A (ja) * 1987-04-17 1988-10-27 Hitachi Ltd 表面改質装置
JPS6464323A (en) * 1987-09-04 1989-03-10 Hitachi Ltd Optical gas ashing device

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6298729A (ja) * 1985-10-25 1987-05-08 Mitsubishi Electric Corp 紫外線とオゾンを用いた表面処理装置
JPS62154629A (ja) * 1985-12-27 1987-07-09 Chlorine Eng Corp Ltd 有機物被膜の除去方法
JPS63260132A (ja) * 1987-04-17 1988-10-27 Hitachi Ltd 表面改質装置
JPS6464323A (en) * 1987-09-04 1989-03-10 Hitachi Ltd Optical gas ashing device

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