JPH0178021U - - Google Patents
Info
- Publication number
- JPH0178021U JPH0178021U JP1987173850U JP17385087U JPH0178021U JP H0178021 U JPH0178021 U JP H0178021U JP 1987173850 U JP1987173850 U JP 1987173850U JP 17385087 U JP17385087 U JP 17385087U JP H0178021 U JPH0178021 U JP H0178021U
- Authority
- JP
- Japan
- Prior art keywords
- vacuum chamber
- chamber
- evacuated
- cut valve
- vacuum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987173850U JPH0178021U (en, 2012) | 1987-11-16 | 1987-11-16 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987173850U JPH0178021U (en, 2012) | 1987-11-16 | 1987-11-16 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0178021U true JPH0178021U (en, 2012) | 1989-05-25 |
Family
ID=31465739
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1987173850U Pending JPH0178021U (en, 2012) | 1987-11-16 | 1987-11-16 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0178021U (en, 2012) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0286824A (ja) * | 1988-06-21 | 1990-03-27 | Anelva Corp | 真空蒸着装置 |
| WO2008111184A1 (ja) * | 2007-03-14 | 2008-09-18 | Fujitsu Microelectronics Limited | 半導体製造装置とそのクリーニング方法、及びクリーニング用ウエハ |
| JP2020053494A (ja) * | 2018-09-26 | 2020-04-02 | 芝浦メカトロニクス株式会社 | 基板処理装置及び基板処理方法 |
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1987
- 1987-11-16 JP JP1987173850U patent/JPH0178021U/ja active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0286824A (ja) * | 1988-06-21 | 1990-03-27 | Anelva Corp | 真空蒸着装置 |
| WO2008111184A1 (ja) * | 2007-03-14 | 2008-09-18 | Fujitsu Microelectronics Limited | 半導体製造装置とそのクリーニング方法、及びクリーニング用ウエハ |
| JP2020053494A (ja) * | 2018-09-26 | 2020-04-02 | 芝浦メカトロニクス株式会社 | 基板処理装置及び基板処理方法 |