JPH0176033U - - Google Patents
Info
- Publication number
- JPH0176033U JPH0176033U JP1987171303U JP17130387U JPH0176033U JP H0176033 U JPH0176033 U JP H0176033U JP 1987171303 U JP1987171303 U JP 1987171303U JP 17130387 U JP17130387 U JP 17130387U JP H0176033 U JPH0176033 U JP H0176033U
- Authority
- JP
- Japan
- Prior art keywords
- cathode
- plasma
- magnetic field
- respect
- etching apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001020 plasma etching Methods 0.000 claims description 3
- 238000005530 etching Methods 0.000 claims 1
Landscapes
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987171303U JPH0176033U (pt) | 1987-11-11 | 1987-11-11 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987171303U JPH0176033U (pt) | 1987-11-11 | 1987-11-11 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0176033U true JPH0176033U (pt) | 1989-05-23 |
Family
ID=31463015
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1987171303U Pending JPH0176033U (pt) | 1987-11-11 | 1987-11-11 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0176033U (pt) |
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1987
- 1987-11-11 JP JP1987171303U patent/JPH0176033U/ja active Pending