JPH0173928U - - Google Patents

Info

Publication number
JPH0173928U
JPH0173928U JP1987167930U JP16793087U JPH0173928U JP H0173928 U JPH0173928 U JP H0173928U JP 1987167930 U JP1987167930 U JP 1987167930U JP 16793087 U JP16793087 U JP 16793087U JP H0173928 U JPH0173928 U JP H0173928U
Authority
JP
Japan
Prior art keywords
plasma emission
decrease
emission intensity
end point
etching end
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1987167930U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1987167930U priority Critical patent/JPH0173928U/ja
Publication of JPH0173928U publication Critical patent/JPH0173928U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
JP1987167930U 1987-11-04 1987-11-04 Pending JPH0173928U (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1987167930U JPH0173928U (zh) 1987-11-04 1987-11-04

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1987167930U JPH0173928U (zh) 1987-11-04 1987-11-04

Publications (1)

Publication Number Publication Date
JPH0173928U true JPH0173928U (zh) 1989-05-18

Family

ID=31456664

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1987167930U Pending JPH0173928U (zh) 1987-11-04 1987-11-04

Country Status (1)

Country Link
JP (1) JPH0173928U (zh)

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