JPH0160528U - - Google Patents
Info
- Publication number
- JPH0160528U JPH0160528U JP15599387U JP15599387U JPH0160528U JP H0160528 U JPH0160528 U JP H0160528U JP 15599387 U JP15599387 U JP 15599387U JP 15599387 U JP15599387 U JP 15599387U JP H0160528 U JPH0160528 U JP H0160528U
- Authority
- JP
- Japan
- Prior art keywords
- reaction tank
- electrode
- substrate
- electrodes
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims description 4
- 239000010408 film Substances 0.000 claims 1
- 239000010409 thin film Substances 0.000 claims 1
Landscapes
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15599387U JPH0160528U (ru) | 1987-10-12 | 1987-10-12 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15599387U JPH0160528U (ru) | 1987-10-12 | 1987-10-12 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0160528U true JPH0160528U (ru) | 1989-04-17 |
Family
ID=31434123
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15599387U Pending JPH0160528U (ru) | 1987-10-12 | 1987-10-12 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0160528U (ru) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2009063629A1 (ja) * | 2007-11-14 | 2009-05-22 | Emd Corporation | プラズマ処理装置 |
-
1987
- 1987-10-12 JP JP15599387U patent/JPH0160528U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2009063629A1 (ja) * | 2007-11-14 | 2009-05-22 | Emd Corporation | プラズマ処理装置 |