JPH0153294B2 - - Google Patents
Info
- Publication number
- JPH0153294B2 JPH0153294B2 JP56082360A JP8236081A JPH0153294B2 JP H0153294 B2 JPH0153294 B2 JP H0153294B2 JP 56082360 A JP56082360 A JP 56082360A JP 8236081 A JP8236081 A JP 8236081A JP H0153294 B2 JPH0153294 B2 JP H0153294B2
- Authority
- JP
- Japan
- Prior art keywords
- vacuum
- vacuum processing
- roll
- sealing mechanism
- vacuum chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000007246 mechanism Effects 0.000 claims description 22
- 238000007789 sealing Methods 0.000 claims description 19
- 239000000463 material Substances 0.000 claims description 8
- 238000009489 vacuum treatment Methods 0.000 claims description 8
- 230000002093 peripheral effect Effects 0.000 claims description 2
- 238000011282 treatment Methods 0.000 description 7
- 239000007789 gas Substances 0.000 description 6
- 238000009832 plasma treatment Methods 0.000 description 6
- 239000004033 plastic Substances 0.000 description 6
- 229920003023 plastic Polymers 0.000 description 6
- 239000010409 thin film Substances 0.000 description 4
- 238000004381 surface treatment Methods 0.000 description 3
- 238000004804 winding Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000013013 elastic material Substances 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000007733 ion plating Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000002985 plastic film Substances 0.000 description 2
- 229920006255 plastic film Polymers 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 238000007738 vacuum evaporation Methods 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229920006311 Urethane elastomer Polymers 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- UIUXUFNYAYAMOE-UHFFFAOYSA-N methylsilane Chemical compound [SiH3]C UIUXUFNYAYAMOE-UHFFFAOYSA-N 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
Description
【発明の詳細な説明】
本発明は可とう性の被処理物質、例えばプラス
チツク成形品を真空処理槽でプラズマ、イオンプ
レーテイング、スパツタリング、真空蒸着、真空
紫外線処理するための真空連続処理装置に関する
ものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a continuous vacuum processing apparatus for subjecting flexible processing materials, such as plastic molded products, to plasma, ion plating, sputtering, vacuum evaporation, and vacuum ultraviolet treatment in a vacuum processing tank. It is.
従来、各種プラスチツク類の改質を目的とし
て、プラスチツク成形品に真空処理槽中で真空連
続処理を行なうことは知られているが、しかしこ
れは被処理物を処理するための真空処理槽が一個
とされているため、被処理物に２種または２種以
上の処理を行なつたり、あるいは被処理物を２種
の異なる雰囲気下で連続して処理することができ
ないという欠点があつた。 Conventionally, it has been known that plastic molded products are subjected to continuous vacuum treatment in a vacuum treatment tank for the purpose of modifying various plastics. Therefore, it has been disadvantageous that it is not possible to perform two or more types of treatments on an object to be treated, or to treat an object to be treated continuously under two different atmospheres.
本発明はこのような問題点を解決するために複
数個の真空処理槽を設け、しかも被処理物の表面
処理を大気に曝露することなく連続処理するため
の装置に関するもので、これは真空処理槽の前後
に予備真空室を設け、被処理物を大気中から前方
処理室を経て真空処理槽に導入して真空処理した
後、後方予備真空室を経てこれを大気中に送り出
す機構を有する真空連続処理装置において、前記
真空処理槽を複数個として、この真空処理槽相互
間をシール機構で遮断し、前記シール機構は被処
理物をピンチして送り出す弾性体ロールと剛性体
ロールの組合せよりなる上下一対のシールロー
ル、該ロールの外周面の一部にその軸方向に連続
して対接するリツプル部材およびハウジングによ
つて構成されてなることを特徴とするものであ
る。 In order to solve these problems, the present invention relates to an apparatus that is equipped with a plurality of vacuum processing tanks and that continuously processes the surface of a workpiece without exposing it to the atmosphere. A vacuum system with a mechanism in which preliminary vacuum chambers are provided before and after the tank, and the material to be processed is introduced from the atmosphere into the vacuum processing chamber through the front processing chamber, subjected to vacuum treatment, and then sent out into the atmosphere through the rear preliminary vacuum chamber. In the continuous processing apparatus, a plurality of vacuum processing tanks are provided, and the vacuum processing tanks are isolated from each other by a sealing mechanism, and the sealing mechanism is composed of a combination of an elastic roll and a rigid roll that pinch and send out the processed material. It is characterized by being comprised of a pair of upper and lower seal rolls, a ripple member that continuously faces a part of the outer peripheral surface of the rolls in the axial direction, and a housing.
すなわち、本発明の真空連続処理装置は、複数
個設けられた真空処理槽間をシール機構で遮断す
ることによつて、被処理物に各々の真空処理槽で
異種の処理を行なうことができるようにしたこと
を特徴とするものである。 In other words, the continuous vacuum processing apparatus of the present invention is capable of performing different types of processing on objects to be processed in each vacuum processing tank by isolating a plurality of vacuum processing tanks with a sealing mechanism. It is characterized by the following.
つぎに本発明の一実施例を図面により説明す
る。 Next, one embodiment of the present invention will be described with reference to the drawings.
第１図はプラスチツク成形品などの可とう性の
被処理物Ｆに真空状態で連続式にプラズマ処理な
どを行なう真空処理槽１０１，１０２と、その前
後に設けられた前方予備真空室２、後方予備真空
室３および真空処理槽１０１と１０２とを遮断す
るシール機構４とからなる真空連続処理装置が示
されている。この真空処理槽１０１，１０２には
目的とする処理に必要な処理装置、例えばプラズ
マ処理用の陽極、陰極、ガス導入口などが内蔵さ
れており、これは図示されていない真空ポンプに
より所定の真空度に保持されるように排気管６を
介して真空排気される。そして、この真空処理槽
にはその前方側に被処理物の搬送方向に上下一対
のシールロールを複数個配置することによつて形
成された前方予備真空室２が、また、その後方側
には被処理物の搬送方向に上下一対のシールロー
ルを複数個配置することによつて形成された後方
予備真空室３が設けられており、これらは図示さ
れていない真空ポンプによつて排気管７を介して
真空排気される。 Figure 1 shows vacuum processing tanks 101 and 102 that continuously perform plasma processing on flexible workpieces F such as plastic molded products in a vacuum state, the front preliminary vacuum chamber 2 provided before and after the tanks, and the rear A continuous vacuum processing apparatus is shown that includes a preliminary vacuum chamber 3 and a sealing mechanism 4 that isolates vacuum processing vessels 101 and 102 from each other. The vacuum processing tanks 101 and 102 have built-in processing equipment necessary for the target processing, such as an anode, a cathode, a gas inlet, etc. for plasma processing, and are heated to a predetermined vacuum by a vacuum pump (not shown). It is evacuated through the exhaust pipe 6 so that it is maintained at a constant temperature. This vacuum processing tank has a front preliminary vacuum chamber 2 formed by arranging a plurality of upper and lower pairs of seal rolls in the transport direction of the processed material on the front side thereof, and a front preliminary vacuum chamber 2 on the rear side thereof. A rear preliminary vacuum chamber 3 is provided, which is formed by arranging a plurality of pairs of upper and lower seal rolls in the direction of conveyance of the workpiece, and these are connected to an exhaust pipe 7 by a vacuum pump (not shown). It is evacuated through.
つぎにこの作用をプラスチツクフイルムのプラ
ズマによる表面処理について説明すると、例えば
塩化ビニル樹脂から作つたプラスチツクフイルム
（被処理物Ｆ）は捲出装置８から前方予備真空室
２を経て真空処理槽１０１に送られ、ここで圧力
10-2〜10-1トールの範囲でのアルゴンガス雰囲気
中で数ＫHz〜数百ＭHzの高周波電力印加により発
生するプラズマに曝されたのち、シール機構４を
経て真空処理槽１０２に送られ、ここでアミン、
ピリジン、アクリル系モノマー、メチルシランな
どの有機ガス存在下で再度プラズマ処理されてか
ら後方予備真空室３を経て巻取装置９に巻取られ
る。 Next, to explain this effect regarding the surface treatment of plastic film using plasma, a plastic film made of vinyl chloride resin (workpiece F) is sent from the unwinding device 8 to the vacuum processing tank 101 via the front preliminary vacuum chamber 2. pressure here
After being exposed to plasma generated by applying high frequency power of several KHz to several hundred MHz in an argon gas atmosphere in the range of 10 -2 to 10 -1 Torr, it is sent to the vacuum processing tank 102 via the sealing mechanism 4, Here amine,
After being subjected to plasma treatment again in the presence of an organic gas such as pyridine, acrylic monomer, or methylsilane, it is passed through the rear preliminary vacuum chamber 3 and wound up by the winding device 9.
この場合、真空処理槽１０１と１０２の間の遮
断は被処理物をピンチして送り出す弾性体ロール
と剛性体ロールの組合せよりなる上下一対のシー
ルロール、該ロールの外周面の一部にその軸方向
に連続して対接するリツプル部材およびハウジン
グによつて構成されてなるシール機構で行なわれ
るが、このシール機構はこのように構成されてい
るので、真空シール効果が大きくなり、コンダク
タンスが小さくなるという有利性をもつものであ
る。これは第２図に示すように被処理物の搬送方
向に該シール機構を複数個設けて真空室１０を形
成させ、この真空室を図示していない真空ポンプ
でその排気管５から真空排気させればよりよい効
果を得ることができる。 In this case, the isolation between the vacuum processing tanks 101 and 102 is achieved by a pair of upper and lower seal rolls, which are made of a combination of an elastic roll and a rigid roll, which pinch and send out the workpiece, and a part of the outer circumferential surface of the roll is attached to its axis. This is done using a sealing mechanism consisting of a ripple member and a housing that are in continuous contact with each other in the direction. Because this sealing mechanism is constructed in this way, the vacuum sealing effect is large and the conductance is small. It has advantages. As shown in FIG. 2, a vacuum chamber 10 is formed by providing a plurality of sealing mechanisms in the transport direction of the workpiece, and this vacuum chamber is evacuated from its exhaust pipe 5 using a vacuum pump (not shown). You can get better results if you do.
また、第３図は他の実施例を示すもので、これ
は真空処理槽１０１で処理された被処理物Ｆを大
気に曝露する前に熱処理するための装置であり、
真空処理槽１０１で例えばプラズマ処理された被
処理物Ｆはシール機構４を経て例えば並列に配置
された赤外線ランプを内蔵する真空処理槽１０３
に導入され、こゝで加熱処理されたのち後方予備
真空室３を経て捲取装置９に捲きとられる。 Further, FIG. 3 shows another embodiment, which is an apparatus for heat-treating the workpiece F processed in the vacuum processing tank 101 before exposing it to the atmosphere,
The workpiece F that has been subjected to, for example, plasma treatment in the vacuum processing tank 101 passes through the sealing mechanism 4 and is transferred to the vacuum processing tank 103, which includes, for example, infrared lamps arranged in parallel.
After being heated there, it is passed through the rear preliminary vacuum chamber 3 and wound up into the winding device 9.
第４図、第５図は前記した予備真空室２，３お
よび複数個の真空処理槽相互間を遮断するために
設置される真空室を構成する上記した弾性体ロー
ルと剛性体ロールの組合せよりなる上下一対のシ
ールロール、リツプル部材およびハウジングから
なるシール機構を説明するための要部拡大図で、
第４図はその側断面図、第５図はそのＶ―Ｖ線矢
視図を示したものであり、これはその両側面がサ
イドピース１１に回転自在に軸支され、表面にゴ
ムなどの弾性体が被着されている上ロール１３
と、同じくその両側側が、サイドピース１１に回
転自在に軸支され、表面にクロムニツケル層が施
こされ、上ロール１３と対設されている下ロール
１４、およびこれらを覆う上ケース１５、下ケー
ス１６とから構成されており、これにはまた上ケ
ース１５、下ケース１６の外周部の一部と軸方向
に沿つて連続的に対接する、ウレタンゴムのよう
な弾性体で作られたリツプル部材１７または１８
が付設されており、これによつて系内の真空を保
ちながら、被処理物を前方に搬入するようになつ
ている。 Figures 4 and 5 show a combination of the above-mentioned elastic rolls and rigid rolls constituting the vacuum chamber installed to isolate the preliminary vacuum chambers 2 and 3 and a plurality of vacuum processing tanks. This is an enlarged view of the main parts for explaining the seal mechanism consisting of a pair of upper and lower seal rolls, a ripple member, and a housing.
Fig. 4 is a side sectional view of the same, and Fig. 5 is a view taken along the line V-V.This is because both sides of the piece are rotatably supported by the side piece 11, and the surface is coated with rubber or the like. Upper roll 13 covered with elastic material
, a lower roll 14 which is rotatably supported on both sides by a side piece 11, has a chrome nickel layer on its surface, and is placed opposite the upper roll 13, an upper case 15 covering these, and a lower roll 14. The case 16 also includes a ripple made of an elastic material such as urethane rubber, which is in continuous contact with a part of the outer periphery of the upper case 15 and the lower case 16 along the axial direction. member 17 or 18
This allows the workpiece to be carried forward while maintaining a vacuum inside the system.
本発明の真空連続処理装置は上述したように複
数個の真空処理槽を有し、しかもこれらの真空処
理槽はシール機構によつて相互に遮断され、さら
にこの真空処理槽群の前後に予備真空室を設けた
ものであるから、これによれば従来装置ではその
処理が困難であつた各種の真空処理を容易に行な
うことができる。 As described above, the continuous vacuum processing apparatus of the present invention has a plurality of vacuum processing tanks, and these vacuum processing tanks are mutually isolated by a sealing mechanism, and furthermore, a preliminary vacuum is installed before and after this group of vacuum processing tanks. Since the vacuum chamber is provided with a chamber, it is possible to easily carry out various vacuum processes that have been difficult to perform with conventional apparatuses.
例えば、この真空処理槽を使用するプラスチツ
ク物質のプラズマによる表面処理については、プ
ラズマ処理後の物品を大気中に曝露するとプラズ
マ処理で生じた表活性点が空気酸化などによつて
劣化する現象があるが、これを防止するためにプ
ラズマ処理後、これを大気に曝露する前に塩素、
水素などの活性ガスで反応処理したり、あるいは
熱処理によつてこの活性点を不活性とする処理が
必要とされるのであるが、本発明の装置では複数
の真空処理槽がシール機構で遮断されており、
個々の真空処理槽の雰囲気変更なども容易に行え
るので、これによればかゝるプラズマ処理を効率
よく行なうことができる。また、このプラズマ処
理品については、この活性点を利用してこれに重
合性有機ガスを反応させ、表面にグラフト重合層
を形成させることもできるし、あるいは異種のガ
スを利用して連続的にプラズマ重合を行なつて、
被処理物の表面に多層の重合層を形成させること
も可能となる。 For example, regarding the surface treatment of plastic materials using plasma using this vacuum treatment tank, there is a phenomenon in which the surface active points generated in the plasma treatment deteriorate due to air oxidation, etc. when the article after plasma treatment is exposed to the atmosphere. However, to prevent this, after plasma treatment, before exposing it to the atmosphere, chlorine,
A reaction treatment with an active gas such as hydrogen or a treatment to inactivate the active sites by heat treatment is required, but in the apparatus of the present invention, multiple vacuum treatment vessels are shut off by a sealing mechanism. and
Since the atmosphere of each vacuum processing tank can be easily changed, such plasma processing can be performed efficiently. In addition, regarding this plasma-treated product, it is possible to react with a polymerizable organic gas using the active points to form a graft polymerized layer on the surface, or to continuously form a graft polymerized layer using a different type of gas. By performing plasma polymerization,
It is also possible to form multiple polymer layers on the surface of the object to be treated.
なお、このプラスチツクのプラズマによる表面
処理については、第１段の真空処理槽で酸素プラ
ズマによるクリーニングを行なつたり、あるいは
熱処理による被処理物の成形歪み除去を行なつた
のち、次段以降の真空処理槽で上記処理を行なつ
てもよく、これによればより良好な成形品を得る
ことができる。 Regarding the surface treatment of plastics using plasma, cleaning with oxygen plasma is performed in the first stage vacuum treatment tank, or after removing molding distortion of the object by heat treatment, The above-mentioned treatment may be carried out in a treatment tank, whereby a better molded product can be obtained.
また、本発明の真空連続処理装置によれば、イ
オンプレーライング、スパツタリング、真空蒸着
などによる被処理物への薄膜形成に当つて、シー
ル機構で遮断された各真空処理槽で異種の材料を
使用すれば被処理物の表面に多層の薄膜を形成す
ることができ、さらにはそれらの処理に先立つて
シール機構で遮断された前段の真空処理槽で被処
理物の表面をプラズマ処理、真空紫外線処理すれ
ば、これによつて被処理物表面と前記薄膜の密着
性を高めることができる。 Further, according to the continuous vacuum processing apparatus of the present invention, when forming a thin film on a workpiece by ion plating, sputtering, vacuum evaporation, etc., different materials are mixed in each vacuum processing tank that is isolated by a sealing mechanism. When used, multi-layered thin films can be formed on the surface of the object to be treated.Furthermore, prior to these treatments, the surface of the object to be treated can be subjected to plasma treatment and vacuum ultraviolet rays in the vacuum treatment tank at the front stage, which is shut off by a sealing mechanism. If treated, it is possible to improve the adhesion between the surface of the object to be treated and the thin film.
以上に記述したように、本発明が提案するシー
ル機構で遮断した複数個の真空処理槽よりなる真
空連続処理装置は、被処理品表面への異種の多層
膜の形成、被処理物と薄膜層の密着性、改質層の
安定性の向上、グラフト重合膜の形成、外観の改
善などに有効な工業的に有利な手段を提供するも
のである。 As described above, the continuous vacuum processing equipment proposed by the present invention, which consists of a plurality of vacuum processing tanks separated by a sealing mechanism, is capable of forming different types of multilayer films on the surface of the workpiece, and forming layers between the workpiece and the thin film. This provides an industrially advantageous means effective for improving the adhesion of the modified layer, improving the stability of the modified layer, forming a graft polymerized film, improving the appearance, etc.
第１図、第２図および第３図は本発明による真
空連続処理装置の例を示す正面図、第４図および
第５図は本発明の真空連続処理装置における予備
真空室および真空処理槽相互間に設置される真空
室を構成するシール機構を説明するための部分拡
大図で、第４図は側断面図、第５図はそのＶ―Ｖ
線矢視図を示したものである。
１０１，１０２，１０３…真空処理槽、２，３
…予備真空室、４…シール機構、８…捲出装置、
９…捲取装置、１１…サイドピース、１３…上ロ
ール、１４…下ロール、１７，１８…リツプル部
材、Ｆ…被処理物。
1, 2, and 3 are front views showing an example of the vacuum continuous processing apparatus according to the present invention, and FIGS. 4 and 5 show the connection between the preliminary vacuum chamber and the vacuum processing tank in the vacuum continuous processing apparatus according to the present invention. These are partially enlarged views for explaining the sealing mechanism that constitutes the vacuum chamber installed between the two. Fig. 4 is a side sectional view, and Fig. 5 is its V-V.
It shows a line arrow view. 101, 102, 103...Vacuum processing tank, 2, 3
...preliminary vacuum chamber, 4...sealing mechanism, 8...extrusion device,
9... Winding device, 11... Side piece, 13... Upper roll, 14... Lower roll, 17, 18... Ripple member, F... Processing object.
Claims (1)
理物を大気中から前方予備真空室を経て真空処理
槽に導入して真空処理をした後、後方予備真空室
を経てこれを大気中に連続的に送り出す機構を有
する真空連続処理装置において、前記真空処理槽
を複数個として、この真空処理槽相互間をシール
機構で遮断し、前記シール機構は被処理物をピン
チして送り出す弾性体ロールと剛性体ロールの組
合せよりなる上下一対のシールロール、該ロール
の外周面の一部にその軸方向に連続して対接する
リツプル部材およびハウジングによつて構成され
ていることを特徴とする真空連続処理装置。 ２ 前記各真空処理槽の間を、被処理物の搬送方
向に前記シール機構を複数個配置することによつ
て形成する真空室で遮断し、該真空室を必要に応
じ真空排気することを特徴とする特許請求の範囲
第１項記載の真空連続処理装置。[Scope of Claims] 1 Preparatory vacuum chambers are provided before and after the vacuum processing tank, and after the object to be processed is introduced from the atmosphere into the vacuum processing tank via the front preparatory vacuum chamber and subjected to vacuum treatment, the rear preparatory vacuum chamber is opened. In a vacuum continuous processing apparatus having a mechanism for continuously sending out the processed material into the atmosphere, the vacuum processing tank is provided with a plurality of vacuum processing tanks, the vacuum processing tanks are isolated from each other by a sealing mechanism, and the sealing mechanism pinches the processed material. A pair of upper and lower seal rolls made up of a combination of an elastic roll and a rigid roll, which are fed out by a seal roll, a ripple member and a housing that continuously contact a part of the outer peripheral surface of the roll in the axial direction. Vacuum continuous processing equipment featuring: 2. A vacuum chamber formed by arranging a plurality of the seal mechanisms in the transport direction of the object to be processed isolates the space between each of the vacuum processing tanks, and the vacuum chamber is evacuated as necessary. A vacuum continuous processing apparatus according to claim 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8236081A JPS57195754A (en) | 1981-05-29 | 1981-05-29 | Continuous vacuum treatment apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8236081A JPS57195754A (en) | 1981-05-29 | 1981-05-29 | Continuous vacuum treatment apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57195754A JPS57195754A (en) | 1982-12-01 |
| JPH0153294B2 true JPH0153294B2 (en) | 1989-11-13 |
Family
ID=13772406
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8236081A Granted JPS57195754A (en) | 1981-05-29 | 1981-05-29 | Continuous vacuum treatment apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57195754A (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60224780A (en) * | 1984-04-20 | 1985-11-09 | Kuraray Co Ltd | Sealing device in continuous vacuum treating device for sheet-shaped material |
| JPS6112867A (en) * | 1984-06-27 | 1986-01-21 | Hitachi Ltd | Roll type sealing device |
| US4763601A (en) * | 1987-09-02 | 1988-08-16 | Nippon Steel Corporation | Continuous composite coating apparatus for coating strip |
| KR100880352B1 (en) | 2007-06-01 | 2009-01-23 | (주) 에이알티 | Flexible film sputter system having film pass port for inflow prevention of gas |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS50161475A (en) * | 1974-06-20 | 1975-12-27 | ||
| JPS5730733A (en) * | 1980-07-30 | 1982-02-19 | Shin Etsu Chem Co Ltd | Device for continuous plasma treatment |
| JPS5773025A (en) * | 1980-10-27 | 1982-05-07 | Shin Etsu Chem Co Ltd | Apparatus for continuous vacuum treatment |
-
1981
- 1981-05-29 JP JP8236081A patent/JPS57195754A/en active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS50161475A (en) * | 1974-06-20 | 1975-12-27 | ||
| JPS5730733A (en) * | 1980-07-30 | 1982-02-19 | Shin Etsu Chem Co Ltd | Device for continuous plasma treatment |
| JPS5773025A (en) * | 1980-10-27 | 1982-05-07 | Shin Etsu Chem Co Ltd | Apparatus for continuous vacuum treatment |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57195754A (en) | 1982-12-01 |
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