JPH0142354B2 - - Google Patents
Info
- Publication number
- JPH0142354B2 JPH0142354B2 JP6596582A JP6596582A JPH0142354B2 JP H0142354 B2 JPH0142354 B2 JP H0142354B2 JP 6596582 A JP6596582 A JP 6596582A JP 6596582 A JP6596582 A JP 6596582A JP H0142354 B2 JPH0142354 B2 JP H0142354B2
- Authority
- JP
- Japan
- Prior art keywords
- plating
- stainless steel
- silver
- solution
- treatment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000007747 plating Methods 0.000 claims description 64
- 238000000034 method Methods 0.000 claims description 35
- 229910001220 stainless steel Inorganic materials 0.000 claims description 32
- 239000010935 stainless steel Substances 0.000 claims description 32
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 19
- 238000007772 electroless plating Methods 0.000 claims description 9
- 229910052709 silver Inorganic materials 0.000 description 29
- 239000004332 silver Substances 0.000 description 29
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 28
- 238000011282 treatment Methods 0.000 description 18
- 238000010438 heat treatment Methods 0.000 description 16
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 12
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 11
- 229910052737 gold Inorganic materials 0.000 description 11
- 239000010931 gold Substances 0.000 description 11
- 239000001257 hydrogen Substances 0.000 description 11
- 229910052739 hydrogen Inorganic materials 0.000 description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 8
- 239000007789 gas Substances 0.000 description 8
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 238000002203 pretreatment Methods 0.000 description 7
- 150000002739 metals Chemical class 0.000 description 6
- 229910052697 platinum Inorganic materials 0.000 description 6
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 6
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 5
- 235000011114 ammonium hydroxide Nutrition 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- 229910052763 palladium Inorganic materials 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 229910052741 iridium Inorganic materials 0.000 description 3
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 229910001961 silver nitrate Inorganic materials 0.000 description 3
- 235000011121 sodium hydroxide Nutrition 0.000 description 3
- 238000004381 surface treatment Methods 0.000 description 3
- 235000002906 tartaric acid Nutrition 0.000 description 3
- 239000011975 tartaric acid Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- WQZGKKKJIJFFOK-GASJEMHNSA-N Glucose Natural products OC[C@H]1OC(O)[C@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-GASJEMHNSA-N 0.000 description 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 238000005238 degreasing Methods 0.000 description 2
- -1 ferritic Inorganic materials 0.000 description 2
- 239000008103 glucose Substances 0.000 description 2
- 230000003472 neutralizing effect Effects 0.000 description 2
- 229910052762 osmium Inorganic materials 0.000 description 2
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 229910000963 austenitic stainless steel Inorganic materials 0.000 description 1
- WQZGKKKJIJFFOK-VFUOTHLCSA-N beta-D-glucose Chemical compound OC[C@H]1O[C@@H](O)[C@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-VFUOTHLCSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000007730 finishing process Methods 0.000 description 1
- FDWREHZXQUYJFJ-UHFFFAOYSA-M gold monochloride Chemical compound [Cl-].[Au+] FDWREHZXQUYJFJ-UHFFFAOYSA-M 0.000 description 1
- 230000000887 hydrating effect Effects 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 229910000734 martensite Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 description 1
- 238000005554 pickling Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 150000003378 silver Chemical class 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- AGGKEGLBGGJEBZ-UHFFFAOYSA-N tetramethylenedisulfotetramine Chemical compound C1N(S2(=O)=O)CN3S(=O)(=O)N1CN2C3 AGGKEGLBGGJEBZ-UHFFFAOYSA-N 0.000 description 1
- UEUXEKPTXMALOB-UHFFFAOYSA-J tetrasodium;2-[2-[bis(carboxylatomethyl)amino]ethyl-(carboxylatomethyl)amino]acetate Chemical compound [Na+].[Na+].[Na+].[Na+].[O-]C(=O)CN(CC([O-])=O)CCN(CC([O-])=O)CC([O-])=O UEUXEKPTXMALOB-UHFFFAOYSA-J 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/1803—Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces
- C23C18/1813—Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces by radiant energy
- C23C18/1817—Heat
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/42—Coating with noble metals
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemically Coating (AREA)
Description
【発明の詳細な説明】
本発明はステンレス鋼の表面に無電解鍍金方式
により直接銀、金、白金その他の金属の鍍金を施
し、薄く且つ斑の無い鍍金皮膜を形成させること
を目的とするステンレス鋼の鍍金前処理法に関す
るものである。Detailed Description of the Invention The present invention aims to directly plate the surface of stainless steel with silver, gold, platinum, or other metals using an electroless plating method to form a thin and spotless plating film on the stainless steel. This relates to a method for pre-plating steel.
ステンレス鋼は耐食性、耐酸性等に秀れ、一般
にはその表面に鍍金等の特別な保護処理を施すこ
とは稀であるが、太陽熱集熱器の反射板や医療用
機材、食器類、装飾金具或はエレクトロニクス関
連の工業用途や触媒、バイオリアクター等に於い
ては、ステンレス鋼の表面に、銀、金、白金やパ
ラジウム、イリジウム、オスミウム等の各種の金
属の鍍金を施す必要のある場合が屡ある。 Stainless steel has excellent corrosion resistance and acid resistance, and in general, special protective treatments such as plating are rarely applied to its surface. In industrial applications related to electronics, catalysts, bioreactors, etc., it is often necessary to plate the surface of stainless steel with various metals such as silver, gold, platinum, palladium, iridium, and osmium. be.
しかし、現在の鍍金技術に於いては、一般にス
テンレス鋼の外表面へ直接銀鍍金や金鍍金等を行
なうことは困難とされている。即ち、ステンレス
鋼の外表面に機械的又は化学的な前処理を施して
も、無電解鍍金方式により直接鍍金を行なつて、
薄く且つ斑の全く無い良質な鍍金皮膜を得ること
は実際上成功していない。 However, with current plating technology, it is generally difficult to directly apply silver plating, gold plating, etc. to the outer surface of stainless steel. In other words, even if the outer surface of stainless steel is subjected to mechanical or chemical pretreatment, it can be directly plated using an electroless plating method.
In practice, it has not been possible to obtain a high-quality plating film that is thin and completely free of spots.
そこで、従来はステンレス鋼に無電解鍍金を行
う際には、通常先ずステンレス鋼の外表面にニツ
ケル等のステンレス鋼に対し比較的容易に鍍金可
能な金属の皮膜を下地として形成し、その上に更
に銀鍍金等を行なう2層鍍金方式が行われている
が、鍍金工程が複雑になるため鍍金コストが上昇
する他、用途によつては鍍金皮膜が厚くなり過ぎ
て好ましくない場合もあつて問題が残されてい
た。 Conventionally, when performing electroless plating on stainless steel, a film of a metal such as nickel, which can be plated relatively easily on stainless steel, is first formed on the outer surface of the stainless steel as a base layer, and then a film is formed on the outer surface of the stainless steel. Furthermore, a two-layer plating method that includes silver plating, etc. is being used, but the plating process becomes complicated, which increases the plating cost, and depending on the application, the plating film becomes too thick, which is undesirable. was left behind.
本発明者等は従前の機械的又は化学的表面処理
法に於いても、不完全ではあつてもステンレス鋼
の表面に部分的に銀等の皮膜が形成されることに
着目し、無電解鍍金方式により直接良好な鍍金皮
膜の形成が可能な前処理方法につき鋭意研究を進
め、本発明の前処理法に到達した。 The present inventors focused on the fact that even with conventional mechanical or chemical surface treatment methods, a film of silver, etc. is partially formed on the surface of stainless steel, even if it is incomplete, and electroless plating. We have conducted extensive research into a pretreatment method that can directly form a good plating film, and have arrived at the pretreatment method of the present invention.
本発明の方法について具体的に説明すると、表
面処理方法、処理条件を異にする多数のテストピ
ースについて各種の鍍金実験を行つた結果、一定
の温度条件下に於いてステンレス鋼の外表面に水
素ガス含有雰囲気中で加熱処理を施したテストピ
ースについては、無電解方式により極めて良質な
鍍金が可能であるとの知見を得るに至つた。 To specifically explain the method of the present invention, as a result of various plating experiments conducted on a large number of test pieces with different surface treatment methods and treatment conditions, it was found that hydrogen was formed on the outer surface of stainless steel under certain temperature conditions. We have found that test pieces heat-treated in a gas-containing atmosphere can be plated with extremely high quality using an electroless method.
本願発明は、無電解鍍金方式により薄く且つ斑
のない銀、金、白金、その他の金属の鍍金皮膜を
ステンレス鋼へ直接に、しかも高い鍍金効率で容
易に形成し得る鍍金前処理法を提供するものであ
り、ステンレス鋼の表面に無電解鍍金方式により
直接銀、金、白金その他の金属の鍍金を施す場合
に、ステンレス鋼表面の鍍金部を水素ガス含有雰
囲気中で200℃以上の温度に加熱してその表面を
加熱処理するものである。 The present invention provides a plating pretreatment method that can easily form a thin and spotless plating film of silver, gold, platinum, or other metals directly on stainless steel with high plating efficiency using an electroless plating method. When plating silver, gold, platinum, or other metals directly onto the surface of stainless steel using an electroless plating method, the plated portion of the stainless steel surface is heated to a temperature of 200°C or higher in an atmosphere containing hydrogen gas. Then, the surface is heat-treated.
この様な構成とすることにより、これ迄技術的
に殆ど実現され得なかつたステンレス鋼への薄く
てしかも斑の無い一様な厚さの秀れた鍍金皮膜を
直接形成することが出来、鍍金コストの大幅な低
減を図り得る。 With this configuration, it is possible to directly form an excellent plating film on stainless steel with a thin, even and uniform thickness, which was almost impossible to achieve technologically until now. It is possible to significantly reduce costs.
以下、図面に示す本発明の一実施例に基づいて
その詳細を説明する。 EMBODIMENT OF THE INVENTION Hereinafter, the details will be explained based on one embodiment of the present invention shown in the drawings.
第1図は本発明に係る鍍金前処理法の説明図で
あり、切削加工やプレス加工等によつて形成させ
たステンレス鋼製の被鍍金処理体Pは、先ず脱脂
等の予備処理を施した後、水素を充填した加熱炉
1内で約20〜60分間温度200℃〜700℃に加熱処理
を施す。 FIG. 1 is an explanatory diagram of the plating pretreatment method according to the present invention, in which a stainless steel plated body P formed by cutting, press working, etc. is first subjected to preliminary treatment such as degreasing. Thereafter, heat treatment is performed at a temperature of 200° C. to 700° C. for about 20 to 60 minutes in a heating furnace 1 filled with hydrogen.
即ち、炉1内へ被鍍金処理体Pを収納した後、
ヒータ2に通電して炉内温度を上昇させると共
に、真空ポンプ3を用いて炉内の空気を排気し、
炉内温度200℃〜400℃、真空度10-1〜10-2torrに
した後、バルブ4を閉鎖、真空ポンプ3を停止
し、バルブ5を開放してボンベ6内に貯溜した水
素5%とアルゴン等の不活性ガス95%より成る水
素含有ガス7を炉内に導入し、水素含有ガス7の
雰囲気に置換する。炉内を水素含有ガス雰囲気と
した後、炉内温度を200℃〜700℃に上げ、約20〜
60分間被処理体Pを還元ガス雰囲気中で加熱処理
する。当該操作により、ステンレス鋼の表面はお
そらく所謂水素還元処理を受け、酸化皮膜等が略
完全に除去される結果、被処理体Pの外表面は酸
洗いや研磨等の従来の化学的又は機械的表面処理
では得られない極めて高グレードの清浄面となる
のではないかと推定される。 That is, after storing the object P to be plated in the furnace 1,
The heater 2 is energized to raise the temperature inside the furnace, and the vacuum pump 3 is used to exhaust the air inside the furnace.
After setting the furnace temperature to 200°C to 400°C and the vacuum level to 10 -1 to 10 -2 torr, valve 4 was closed, vacuum pump 3 was stopped, valve 5 was opened, and 5% hydrogen stored in cylinder 6 was released. A hydrogen-containing gas 7 consisting of 95% of an inert gas such as argon and the like is introduced into the furnace to replace the atmosphere with the hydrogen-containing gas 7. After creating a hydrogen-containing gas atmosphere inside the furnace, the temperature inside the furnace was raised to 200℃~700℃, and the temperature was increased to about 20℃~700℃.
The object to be processed P is heat-treated in a reducing gas atmosphere for 60 minutes. As a result of this operation, the surface of the stainless steel is probably subjected to so-called hydrogen reduction treatment, and the oxide film etc. are almost completely removed.As a result, the outer surface of the object to be treated P is subjected to conventional chemical or mechanical treatments such as pickling and polishing. It is presumed that this results in an extremely high-grade clean surface that cannot be obtained through surface treatment.
被鍍金処理体Pを構成するステンレス鋼は一般
にステンレス鋼として知られるものであれば如何
なる種類のものでもあつてもよく、フエライト
系、マルテンサイト系、オーステナイト系等のあ
らゆる種類のステンレス鋼に対して本発明の方法
を適用することが出来る。 The stainless steel constituting the body P to be plated may be of any type as long as it is generally known as stainless steel, and may be any type of stainless steel such as ferritic, martensitic, austenitic, etc. The method of the invention can be applied.
尚、本実施例では予備処理として洗浄処理を行
つているが、ステンレス鋼の表面条条件によつて
は、予備処理は省いても差支えない。 In this embodiment, cleaning treatment is performed as a pretreatment, but the pretreatment may be omitted depending on the surface condition of the stainless steel.
又、本実施例にあつては、傍熱形ヒータ2によ
り被処理体Pの加熱を行なつたが、加熱方法は
高・低周波誘導加熱、抵抗加熱、赤外線加熱等の
如何なる方式であつてもよく、水素雰囲気中に置
く為の装置もあらゆる種類のものを使用して差支
えない。 Further, in this embodiment, the object to be processed P was heated by the indirect heater 2, but the heating method may be any method such as high/low frequency induction heating, resistance heating, infrared heating, etc. Any type of equipment for placing the hydrogen atmosphere may be used.
実施例では水素含有ガス置換の前に装置内を一
旦真空にしてから水素含有ガスを導入している
が、真空にすることなく、水素導入とガスパージ
を数回繰返すことによつて水素含有雰囲気にして
も差支えない。 In the example, before replacing the hydrogen-containing gas, the inside of the device was once evacuated and then the hydrogen-containing gas was introduced. There is no problem.
本実施例では、被鍍金処理体Pの水素雰囲気下
の加熱処理を所謂バツチ方式で行なつているが、
連続式の熱処理方式にすることも可能である。 In this example, the heat treatment of the object P to be plated in a hydrogen atmosphere is carried out in a so-called batch method.
It is also possible to use a continuous heat treatment method.
前記水素ガス含有雰囲気中での加熱処理の操作
において、炉内温度を200℃以下にすると、鍍金
皮膜の厚さが不均一になつて斑を生じ易く、良質
な鍍金皮膜の形成を期待し得ない。この現象は、
温度が200℃以下になると酸化物の還元が十分に
行なわれないからではないかと推定される。 In the heat treatment operation in the hydrogen gas-containing atmosphere, if the temperature inside the furnace is lower than 200°C, the thickness of the plating film becomes uneven and spots are likely to occur, and formation of a high-quality plating film cannot be expected. do not have. This phenomenon is
It is presumed that this is because oxides are not sufficiently reduced when the temperature is below 200°C.
尚、オーステナイト系のステンレス鋼等で熱処
理時に所謂粒界腐食が特に問題となる様場合には
熱処理温度を400℃以下とするのが望ましい。 In addition, when so-called intergranular corrosion becomes a particular problem during heat treatment of austenitic stainless steel, etc., it is desirable to set the heat treatment temperature to 400° C. or lower.
第2図は、本発明に係る鍍金用前処理法を採用
した銀鍍金工程の一例を示すものであり、適宜の
形態に成形されたステンレス鋼製の被鍍金処理体
Pは、洗浄処理工程Aで脱脂等の予備処理を行つ
た後水素ガス含有雰囲気中での加熱処理工程Bへ
送り、加熱炉1内で前述の如き鍍金用の前熱処理
を施す。 FIG. 2 shows an example of a silver plating process employing the pretreatment method for plating according to the present invention, in which a stainless steel object P to be plated formed into an appropriate shape is subjected to a cleaning process A. After performing preliminary treatment such as degreasing, the material is sent to heat treatment step B in a hydrogen gas-containing atmosphere, and is subjected to preheat treatment for plating in the heating furnace 1 as described above.
水素ガス含有雰囲気中での加熱処理を終えた被
鍍金処理体Pは、引き続きリンス処理工程Cへ送
り、ここで錫並びに適宜の水和剤より成るリンス
処理液例えばアメリカ合衆国、ロンドン・ラボラ
トリー社製のRBL処理液(商品名)RNA処理液
(商品名)により所謂リンス処理を施す。当該リ
ンス処理を行なうことにより、ステンレス鋼表面
が親水性になると共に、その表面に固着した錫を
核として銀が固着し、銀鍍金皮膜の形成が容易に
なる。尚、前記RBL及びRNA処理液で処理した
あと、最後に純水により軽くリンスする。このリ
ンス処理工程Cは省略してもよい。 After the heat treatment in the hydrogen gas-containing atmosphere, the plated object P is subsequently sent to the rinsing process C, where a rinsing liquid consisting of tin and a suitable hydrating agent is applied, for example, manufactured by London Laboratory Co., Ltd. in the United States. Perform a so-called rinsing treatment using RBL treatment solution (trade name) and RNA treatment solution (trade name). By performing the rinsing treatment, the surface of the stainless steel becomes hydrophilic, and silver adheres to the surface using tin as a core, making it easier to form a silver plating film. Furthermore, after the treatment with the RBL and RNA treatment solution, the membrane is finally rinsed lightly with pure water. This rinsing treatment step C may be omitted.
リンス処理を終えた被鍍金処理体Pは、鍍金処
理工程Dへ送り、ここで無電解鍍金方式により銀
鍍金を行なう。メツキ液として銀液と還元液とを
容量比1:1で混合した所謂公知の二液式のメツ
キ液を使用し、前記銀液及び還元液の成分は下記
のとおりにした。 After the rinsing process, the object P to be plated is sent to a plating process D, where it is plated with silver using an electroless plating method. A so-called two-component plating solution in which a silver solution and a reducing solution were mixed at a volume ratio of 1:1 was used as the plating solution, and the components of the silver solution and the reducing solution were as follows.
銀 液
硝酸銀 3.5g
アンモニア水 沈澱を再溶解するに要する量
水 60ml
水酸化ナトリウム 2.5g
還元液
ブドウ糖 45g
酒石酸 4g
アルコール 100ml
水 1000ml
前記銀液の調整は、硝酸銀3.5gにアンモニヤ
水を加え、いつたん生じた沈澱物が再溶解するま
でアンモニア水を加える。次に、この銀液60mlに
水酸化ナトリウム2.5gと水60mlを加え、黒色と
なつた溶液が清澄になるまで再度アンモニヤ水を
加えて調整する。又、前記還元液の調整は、水
1000mlにブドウ糖、酒石酸を順次溶解させた後、
10分間程度煮沸し、常温まで冷却したあとアルコ
ールを加えることにより行う。温度を15〜30℃と
した前記メツキ液内へ、被鍍金処理体Pを1〜2
分間浸漬することにより、被処理体Pの表面には
極めて薄く且つ厚さの均一な銀鍍金皮膜が形成さ
れた。Silver solution Silver nitrate 3.5 g Ammonia water Amount required to redissolve the precipitate Water 60 ml Sodium hydroxide 2.5 g Reducing solution Glucose 45 g Tartaric acid 4 g Alcohol 100 ml Water 1000 ml To prepare the above silver solution, add ammonia water to 3.5 g of silver nitrate, and add ammonia water to 3.5 g of silver nitrate. Add aqueous ammonia until the formed precipitate is redissolved. Next, add 2.5 g of sodium hydroxide and 60 ml of water to 60 ml of this silver solution, and adjust by adding ammonia water again until the black solution becomes clear. In addition, the adjustment of the reducing solution is performed using water.
After sequentially dissolving glucose and tartaric acid in 1000ml,
This is done by boiling for about 10 minutes, cooling to room temperature, and then adding alcohol. 1 to 2 objects P to be plated are placed in the plating solution at a temperature of 15 to 30°C.
By dipping for a minute, an extremely thin and uniformly thick silver plating film was formed on the surface of the object P to be processed.
尚、メツキ液は、前述のものに限定されるもの
ではなく、二液式の銀鏡反応を利用するメツキ液
であれば、どの様な成分のものでもよく、例えば
前記アメリカ合衆国ロンドン・ラボラトリー社製
の二液式メツキ液(商品名ATS、商品名ATA)
などは、最も好適である。 The plating solution is not limited to those described above, and may be of any composition as long as it utilizes a two-component silver mirror reaction.For example, the plating solution manufactured by London Laboratory, Inc. Two-component plating liquid (product name: ATS, product name: ATA)
etc. are most preferred.
又、前記実施例に於いては二液式の無電解鍍金
を採用したが、公知の三液式のメツキ液を用いて
もよいことは勿論である。例えば、前記アメリカ
合衆国ロンドン・ラボラトリー社製の銀液(商品
名MS−1L)と還元液(商品名MA−260L)を
1:1の割合で混合し、これに中和液(商品名
KDR)を小量加えて形成した三液式のメツキ液
を用い、温度50℃〜70℃とした当該メツキ液の中
へ内槽外表面を1〜2分間侵漬することにより、
銀皮膜を形成するようにしてもよい。尚、銀液
(MS−1L)と還元液(MA−260L)と中和液
(KDR)の具体的な調合は、先ず水200c.c.の中へ
(MS−1L)20c.c.と(MA−260L)20c.c.を混合し、
次に別の水200c.c.の中へ(KDR)10c.c.を混合し
て、最後に両者を混合撹拌することによつて行な
つた。当該メツキ液は60℃に保ち、その中へ被処
理体Pを2〜3分間浸漬することにより銀鍍金を
行なつた。 Further, in the above embodiment, a two-component electroless plating solution was used, but it goes without saying that a known three-component plating solution may be used. For example, a silver solution (product name: MS-1L) and a reducing solution (product name: MA-260L) manufactured by London Laboratory, Inc. are mixed in a 1:1 ratio, and this is mixed with a neutralizing solution (product name:
By using a three-component plating solution made by adding a small amount of KDR), the outer surface of the inner tank is immersed in the plating solution at a temperature of 50℃ to 70℃ for 1 to 2 minutes.
A silver film may also be formed. The specific preparation of silver solution (MS-1L), reducing solution (MA-260L), and neutralizing solution (KDR) is as follows: First, add 20 c.c. (MS-1 L) to 200 c.c. of water. (MA−260L) Mix 20c.c.
Next, 10 c.c. of (KDR) was mixed into another 200 c.c. of water, and finally the two were mixed and stirred. The plating solution was maintained at 60° C., and the object P was immersed therein for 2 to 3 minutes to carry out silver plating.
鍍金処理が終れば、当該処理体Pを仕上げ工程
Eへ送り、銀鍍金皮膜の外表面を前記RNA処理
液並びに純水を用いてリンスする。 When the plating treatment is completed, the treated body P is sent to a finishing step E, and the outer surface of the silver plating film is rinsed using the RNA treatment solution and pure water.
前記鍍金の実施例においては、無電解方式によ
る銀鍍金について説明したが、本願方法発明は、
金、白金、パラジウム、オスシウム、イリジウム
等の鍍金の如く一般にステンレス鋼へは容易に直
接鍍金し難いとされている金属の鍍金にも適用す
ることが出来る。この場合、鍍金工程は銀鍍金の
場合と全く同様であり、ただ鍍金工程Dに於ける
メツキ液が異なるだけである。 In the above embodiments of plating, silver plating using an electroless method was explained, but the method invention of the present application
It can also be applied to plating metals that are generally considered difficult to directly plate on stainless steel, such as gold, platinum, palladium, ossium, iridium, etc. In this case, the plating process is exactly the same as that for silver plating, except that the plating solution used in the plating process D is different.
例えば、金鍍金を行なう場合には、塩化金10g
と塩化ナトリウム5gと水800mlを混合して成る
金液30mlと、酒石酸22.5gと苛性ソーダ300gと
アルコール380mlと水600mlを混合して形成した還
元液70mlを混合してメツキ液を調合し、当該メツ
キ液内へ被処理体Pを2〜3分浸漬すればよい。
パラジウムを鍍金する場合には、テトラミンパラ
ジウムクロライド5.4g/とEDTAナトリウム
塩33.6g/、アンモニヤ350g/、ヒドラジ
ン0.3g/の混合物をメツキ液とすればよい。 For example, when performing gold plating, 10g of gold chloride
30 ml of a gold liquid made by mixing 5 g of sodium chloride and 800 ml of water, and 70 ml of a reducing liquid formed by mixing 22.5 g of tartaric acid, 300 g of caustic soda, 380 ml of alcohol, and 600 ml of water to prepare a plating solution. The object P to be processed may be immersed in the liquid for 2 to 3 minutes.
When plating with palladium, the plating solution may be a mixture of 5.4 g of tetramine palladium chloride, 33.6 g of sodium EDTA, 350 g of ammonia, and 0.3 g of hydrazine.
又、前記各鍍金の実施例に於いては、無電解方
式による銀、金等の鍍金について述べているが、
本願方法発明は銀、金等の電気鍍金へも適用し得
ることは勿論である。 In addition, in the examples of each of the above-mentioned plating, plating with silver, gold, etc. by an electroless method is described,
Of course, the method invention of the present application can also be applied to electroplating of silver, gold, etc.
本発明は上述の通り、ステンレス鋼を水素ガス
含有雰囲気中で一定の温度条件下に加熱処理する
ことにより、これ迄技術的に困難視されていたス
テンレス鋼への無電解方式による直接鍍金が可能
となり、ステンレス鋼の表面に均一な厚さで斑の
全く無い極めて薄い銀、白金、金、イリジウム、
パラジウム、オスミウムその他の金属の鍍金皮膜
を形成することが出来、従前の二層式鍍金に比較
して鍍金コストの大幅な低減を図り得る。 As mentioned above, the present invention heat-treats stainless steel under constant temperature conditions in an atmosphere containing hydrogen gas, thereby making it possible to directly plate stainless steel by an electroless method, which had been considered technically difficult until now. This means that the surface of stainless steel is coated with extremely thin silver, platinum, gold, iridium, etc. with a uniform thickness and no spots.
It is possible to form a plating film of metals such as palladium, osmium, etc., and the plating cost can be significantly reduced compared to conventional two-layer plating.
更に、鍍金皮膜表面の鏡面 光反射率も、従前
の二層式鍍金の場合と比較して略同等の値とな
り、皮膜の物理的若しくは化学的特性が低下する
ということは全く無い。 Furthermore, the specular light reflectance on the surface of the plating film is approximately the same value as in the case of conventional two-layer plating, and there is no deterioration in the physical or chemical properties of the film.
本発明は上述の通り、秀れた実用的効用を有す
るものである。 As mentioned above, the present invention has excellent practical utility.
第1図は、本発明に係る鍍金用前処理方法の説
明図である。第2図は、本発明に係る鍍金用前処
理方法を用いたステンレス鋼に対する銀鍍金工程
図である。
1……水素ガス含有雰囲気中加熱炉、2……ヒ
ータ、4,5……バルブ、3……真空ポンプ、6
……ボンベ、P……被鍍金処理体、7……還元ガ
ス、A……洗浄工程、B……水素ガス含有雰囲気
中加熱処理工程、C……リンス処理工程、D……
鍍金処理工程、E……仕上げ工程。
FIG. 1 is an explanatory diagram of a pretreatment method for plating according to the present invention. FIG. 2 is a process diagram of silver plating stainless steel using the pretreatment method for plating according to the present invention. 1... Heating furnace in an atmosphere containing hydrogen gas, 2... Heater, 4, 5... Valve, 3... Vacuum pump, 6
...Cylinder, P...Object to be plated, 7...Reducing gas, A...Cleaning process, B...Heat treatment process in an atmosphere containing hydrogen gas, C...Rinse treatment process, D...
Plating process, E...finishing process.
Claims (1)
に、ステンレス鋼表面の鍍金部を水素ガス含有雰
囲気中で200℃以上の温度に加熱処理することを
特徴とするステンレス鋼の鍍金前処理法。1. A pre-plating method for stainless steel, which, when performing electroless plating on the surface of stainless steel, heat-treats the plated portion of the stainless steel surface to a temperature of 200°C or higher in an atmosphere containing hydrogen gas.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6596582A JPS58181857A (en) | 1982-04-19 | 1982-04-19 | Plating pretreatment of stainless steel |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6596582A JPS58181857A (en) | 1982-04-19 | 1982-04-19 | Plating pretreatment of stainless steel |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS58181857A JPS58181857A (en) | 1983-10-24 |
JPH0142354B2 true JPH0142354B2 (en) | 1989-09-12 |
Family
ID=13302210
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6596582A Granted JPS58181857A (en) | 1982-04-19 | 1982-04-19 | Plating pretreatment of stainless steel |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58181857A (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0235967A (en) * | 1988-07-26 | 1990-02-06 | Kawasaki Steel Corp | Pretreatment of stainless steel |
-
1982
- 1982-04-19 JP JP6596582A patent/JPS58181857A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS58181857A (en) | 1983-10-24 |
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