JPH0136850B2 - - Google Patents

Info

Publication number
JPH0136850B2
JPH0136850B2 JP59259269A JP25926984A JPH0136850B2 JP H0136850 B2 JPH0136850 B2 JP H0136850B2 JP 59259269 A JP59259269 A JP 59259269A JP 25926984 A JP25926984 A JP 25926984A JP H0136850 B2 JPH0136850 B2 JP H0136850B2
Authority
JP
Japan
Prior art keywords
tetracarboxylic dianhydride
dianhydride
reaction
present
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP59259269A
Other languages
Japanese (ja)
Other versions
JPS61138629A (en
Inventor
Akira Toko
Toshiro Takeda
Naoji Takeda
Saburo Iida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co Ltd filed Critical Sumitomo Bakelite Co Ltd
Priority to JP25926984A priority Critical patent/JPS61138629A/en
Publication of JPS61138629A publication Critical patent/JPS61138629A/en
Publication of JPH0136850B2 publication Critical patent/JPH0136850B2/ja
Granted legal-status Critical Current

Links

Description

【発明の詳现な説明】 産業䞊の利甚分野 本発明は、―ゞアミノゞプニレンオキ
サむドを䜿甚しお合成した、高分子䞻鎖䞭にヘテ
ロのむミド環及びフラン環を混合しお有する耐熱
性暹脂の補造方法に関するものである。
Detailed Description of the Invention [Industrial Field of Application] The present invention is directed to a polymer compound synthesized using 2,8-diaminodiphenylene oxide, in which a hetero imide ring and a furan ring are mixed in the main chain of a polymer. The present invention relates to a method for producing a heat-resistant resin having a heat-resistant resin.

その目的ずするずころは、閉環凊理によりむミ
ド化した硬化暹脂が優れた可撓性ず耐熱性を有し
おおりたたポリむミド暹脂ずしおの耐摩耗性、耐
薬品性、電気絶瞁性、皮膜圢成性、機械特性など
も優れた電子デバむス甚材料、電気絶瞁材料、被
芆剀、接着剀、塗料、成圢品、積局品、繊維ある
いはフむルム材料などずしお有甚な耐熱性暹脂を
提䟛するこずにある。
The purpose of this is that the cured resin imidized by ring-closing treatment has excellent flexibility and heat resistance, and also has the abrasion resistance, chemical resistance, electrical insulation, and film-forming properties of a polyimide resin. The object of the present invention is to provide a heat-resistant resin that has excellent mechanical properties and is useful as a material for electronic devices, an electrical insulating material, a coating, an adhesive, a paint, a molded product, a laminate, a fiber, or a film material.

埓来技術 埓来、高分子䞻鎖䞭に、ヘテロ環䟋えばむミ
ド、むミダゟヌル、チアゟヌル、オキサゞアゟヌ
ル、トリアゟヌル、キノキサリン、チアゞアゟヌ
ル、オキサゞノン、キナゟリン、むミダゟピロロ
ン、む゜むンドロキナゟロンなどを有する重合䜓
が耐熱性暹脂ずしお優れたものであるこずは既に
知られおいるずころである。
[Prior Art] Conventionally, polymers having a heterocycle such as imide, imidazole, thiazole, oxadiazole, triazole, quinoxaline, thiadiazole, oxazinone, quinazoline, imidazopyrrolone, isoindoquinazolone, etc. in the polymer main chain have been used. It is already known that it is an excellent heat-resistant resin.

しかしながら、これら公知の重合䜓は高分子䞻
鎖が剛盎であり、フむルム、皮膜あるいは繊維な
どずした時に柔軟性、屈曲性、䌞びなどがずがし
く実甚䞊䞍十分であ぀た。
However, these known polymers have rigid polymer main chains, and when made into films, membranes, fibers, etc., have poor flexibility, flexibility, elongation, etc., and are unsatisfactory for practical use.

埓来もこの様な芳点より、皮々怜蚎が行なわれ
耐熱性暹脂の補造原料のアミン成分の぀ずし
お、4′―ゞアミノゞプニル゚ヌテルを䜿甚
するこずにより他のアミン䟋えばプニレンゞア
ミン、ベンチゞン、ゞアミノゞプニルメタン、
ゞアミノゞプニルスルホンなどを䜿甚したもの
に比范しお、柔軟性、屈曲性、䌞びなどのより優
れた改良された重合䜓が埗られるこずも知られお
いる。
From this point of view, various studies have been conducted in the past, and by using 4,4'-diaminodiphenyl ether as one of the amine components of the raw material for producing heat-resistant resins, other amines such as phenylene diamine and benzidine have been used. , diaminodiphenylmethane,
It is also known that improved polymers with better flexibility, flexibility, elongation, etc. can be obtained compared to those using diaminodiphenylsulfone or the like.

しかしながらこの4′―ゞアミノゞプニル
゚ヌテルを䜿甚するものは耐熱性が䜎䞋するずい
う重倧な欠点を有しおいた。
However, those using this 4,4'-diaminodiphenyl ether had a serious drawback of reduced heat resistance.

発明の目的 本発明は、これたでのかかる欠点を克服すべく
怜蚎した結果、アミン成分ずしお―ゞアミ
ノゞプニレンオキサむドを䜿甚するこずによ
り、耐熱性が優れお、しかも物性的にも柔軟性、
屈曲性、䌞びなどが優れた実甚䞊のバランスが良
くずれた耐熱性暹脂が埗られるこずを芋い出し本
発明を完成するに到぀たものである。
[Object of the Invention] As a result of studies to overcome these drawbacks, the present invention uses 2,8-diaminodiphenylene oxide as the amine component to provide excellent heat resistance and improved physical properties. Also flexible,
The present invention was completed after discovering that a heat-resistant resin with excellent flexibility, elongation, etc. and well-balanced practicality can be obtained.

発明の構成 本発明は芳銙族テトラカルボン酞ゞ無氎物ず芳
銙族ゞアミンずを反応させ、むミド環を圢成させ
るに際し芳銙族ゞアミンずしお、―ゞアミ
ノゞプニレンオキサむドを䜿甚するこずを特城
ずする耐熱性暹脂の補造方法である。
[Structure of the Invention] The present invention involves using 2,8-diaminodiphenylene oxide as the aromatic diamine in forming an imide ring by reacting an aromatic tetracarboxylic dianhydride with an aromatic diamine. This is a unique method for producing heat-resistant resin.

反応匏で瀺すず、次の様になる。 The reaction formula is as follows.

本発明で䜿甚する芳銙族ゞアミンずしおの
―ゞアミノゞプニレンオキサむドは䞡末端の
アミンの䜍眮の軞線が互いに亀叉するような䜍眮
関係にあり、このため最終硬化物ポリむミド暹
脂の䞻鎖がラセン状ずなり、このために可撓性
を有する構造ずなる芳銙族ゞアミンである。
2, as the aromatic diamine used in the present invention
8-diaminodiphenylene oxide has a positional relationship in which the axes of the amine positions at both ends intersect with each other, so the main chain of the final cured product (polyimide resin) has a helical shape, which makes it flexible. It is an aromatic diamine having a structure.

本発明で䜿甚する芳銙族テトラカルボン酞ゞ無
氎物ずはピロメリツト酞ゞ無氎物、ベンゟプノ
ンテトラカルボン酞ゞ無氎物、―
ナフタレンテトラカルボン酞ゞ無氎物、3′
4′―ゞプニルテトラカルボン酞ゞ無氎物、
―ナフタレンテトラカルボン酞ゞ
無氎物、2′3′―ゞプニルテトラカル
ボン酞ゞ無氎物、―ビス―ゞカル
ボキシゞプニルプロパンゞ無氎物、
10―ペリレンテトラカルボン酞ゞ無氎物、ビ
ス―ゞカルボキシゞプニル゚ヌテル
ゞ無氎物、ナフタレン――テトラ
カルボン酞ゞ無氎物、ナフタレン―
―テトラカルボン酞ゞ無氎物、―ゞメチ
ル――ヘキサヒドロナフ
タレン――テトラカルボン酞ゞ無
氎物、―ゞクロロナフタレン―
―テトラカルボン酞ゞ無氎物、―
ゞクロロナフタレン――テトラカ
ルボン酞ゞ無氎物、―テトラクロ
ロナフタレン――テトラカルボン
酞ゞ無氎物、プナンスレン―10―
テトラカルボン酞ゞ無氎物、シクロペンタン―
―テトラカルボン酞ゞ無氎物、ピ
ロリゞン――テトラカルボン酞ゞ
無氎物、ピラゞン―テトラカルボ
ン酞ゞ無氎物、―ビス―ゞカルボ
キシプニルプロパンゞ無氎物、―ビス
―ゞカルボキシプニル゚タンゞ無氎
物、―ビス―ゞカルボキシプニ
ル゚タンゞ無氎物、ビス―ゞカルボキ
シプニルメタンゞ無氎物、ビス―ゞ
カルボキシプニルスルホンゞ無氎物、ベンれ
ン――テトラカルボン酞ゞ無氎
物、チオプン――テトラカルボ
ン酞ゞ無氎物などである。
The aromatic tetracarboxylic dianhydride used in the present invention is pyromellitic dianhydride, benzophenone tetracarboxylic dianhydride, 2,3,6,7-
naphthalenetetracarboxylic dianhydride, 3,3',
4,4′-diphenyltetracarboxylic dianhydride,
1,2,5,6-naphthalenetetracarboxylic dianhydride, 2,2',3,3'-diphenyltetracarboxylic dianhydride, 2,2-bis(3,4-dicarboxydiphenyl) Propane dianhydride, 3,4,
9,10-perylenetetracarboxylic dianhydride, bis(3,4-dicarboxydiphenyl)ether dianhydride, naphthalene-1,2,4,5-tetracarboxylic dianhydride, naphthalene-1,4, 5,
8-Tetracarboxylic dianhydride, 4,8-dimethyl-1,2,3,5,6,7-hexahydronaphthalene-1,2,5,6-tetracarboxylic dianhydride, 2,6- Dichloronaphthalene-1,4,
5,,8-tetracarboxylic dianhydride, 2,7-
Dichloronaphthalene-1,4,5,8-tetracarboxylic dianhydride, 2,3,4,7-tetrachloronaphthalene-1,4,5,8-tetracarboxylic dianhydride, phenanthrene-1,2 ,9,10-
Tetracarboxylic dianhydride, cyclopentane
1,2,3,4-tetracarboxylic dianhydride, pyrrolidine-2,3,4,5-tetracarboxylic dianhydride, pyrazine 2,3,5,6-tetracarboxylic dianhydride, 2, 2-bis(2,5-dicarboxyphenyl)propane dianhydride, 1,1-bis(2,3-dicarboxyphenyl)ethane dianhydride, 1,1-bis(3,4-dicarboxyphenyl) ) Ethane dianhydride, bis(2,3-dicarboxyphenyl)methane dianhydride, bis(3,4-dicarboxyphenyl)sulfone dianhydride, benzene-1,2,3,4-tetracarboxylic dianhydride and thiophene-2,3,4,5-tetracarboxylic dianhydride.

又、本発明で䜿甚する芳銙族ゞアミンである
―ゞアミノゞプニレンオキサむドの䜜り
方の䟋を反応匏で瀺すず次の様になる。
Further, an example of how to make 2,8-diaminodiphenylene oxide, which is an aromatic diamine used in the present invention, is shown in the following reaction formula.

参考文献犏井倧孊工孊郚研究報告16(2)238
’68 本発明における芳銙族テトラカルボン酞ゞ無氎
物ず―ゞアミノゞプニレンオキサむドず
の反応は出来るかぎり等モルで行う方が奜たし
く、重合床も倧きくなる。いずれか䞀方の原料が
以䞊倚くなるず重合床が著しく䜎䞋し、皮膜
圢成性の悪い䜎分子量物が埗られる様になるので
泚意を芁する。
[Reference: University of Fukui Faculty of Engineering Research Report 16(2)238
('68)] In the present invention, the reaction between aromatic tetracarboxylic dianhydride and 2,8-diaminodiphenylene oxide is preferably carried out in equimolar amounts as much as possible, and the degree of polymerization is also increased. If the amount of either raw material increases by 5% or more, the degree of polymerization will drop significantly and a low molecular weight product with poor film-forming properties will be obtained, so care must be taken.

通垞䞀方の原料を〜倚く甚いるこずが、
䜜業性・加工性をよくする䞊で、よく行なわれ
る。
Usually, using 1 to 3% more of one raw material means that
This is often done to improve workability and processability.

本発明における反応系の溶媒はその官胜基がテ
トラカルボン酞ゞ無氎物又は―ゞアミノゞ
プニレンオキサむドず反応しないダむポヌルモ
ヌメントを有する有機極性溶媒である。
The solvent of the reaction system in the present invention is an organic polar solvent whose functional group has a dipole moment that does not react with tetracarboxylic dianhydride or 2,8-diaminodiphenylene oxide.

系に察し䞍掻性であり、か぀生成物に察しお溶
媒であるこず以倖に、この有機極性溶媒は反応成
分の少なくずも䞀方、奜たしくは䞡者に察しお溶
媒でなければならない。
In addition to being inert to the system and solvent to the product, the organic polar solvent must be solvent to at least one, preferably both, of the reaction components.

この皮の溶媒ずしお代衚的なものは、―
ゞメチルホルムアミド、―ゞメチルアセト
アミド、―ゞ゚チルホルムアミド、
―ゞ゚チルアセトアミド、―ゞメチルメト
キシアセトアミド、ゞメチルスルホキシド、ヘキ
サメチルフオスホアミド、―メチル――ピロ
リドン、ピリゞン、ゞメチルスルホン、テトラメ
チレンスルホン、ゞメチルテトラメチレンスルホ
ンなどがありこれらの溶媒は単独又は組合せお䜿
甚される。
Typical solvents of this type are N, N-
Dimethylformamide, N,N-dimethylacetamide, N,N-diethylformamide, N,N
-Diethyl acetamide, N,N-dimethylmethoxyacetamide, dimethyl sulfoxide, hexamethyl phosphoamide, N-methyl-2-pyrrolidone, pyridine, dimethyl sulfone, tetramethylene sulfone, dimethyltetramethylene sulfone, etc.These solvents can be used alone or used in combination.

この他にも溶媒ずしお組合せお甚いられるもの
ずしおベンれン、ベンゟニトリル、ゞオキサン、
ブチロラクトン、キシレン、トル゚ン、シクロヘ
キサンなどの非溶媒が、原料の分散媒、反応調節
剀、あるいは生成物からの溶媒の揮散調節剀、皮
膜平滑剀などずしお䜿甚される。
Other solvents that can be used in combination include benzene, benzonitrile, dioxane,
Nonsolvents such as butyrolactone, xylene, toluene, and cyclohexane are used as dispersion media for raw materials, reaction regulators, volatilization regulators for solvents from products, film leveling agents, and the like.

本発明は䞀般に無氎の条件䞋で行うこずが奜た
しい。これはテトラカルボン酞ゞ無氎物が氎によ
り開環し䞍掻性化し反応を停止させる恐れがある
ためである。
It is generally preferred that the present invention be carried out under anhydrous conditions. This is because the tetracarboxylic dianhydride is ring-opened by water, becomes inactivated, and there is a risk of stopping the reaction.

このため仕蟌原料䞭の氎分も溶媒䞭の氎分も陀
去する必芁がある。
Therefore, it is necessary to remove both the moisture in the raw materials and the moisture in the solvent.

しかし䞀方反応の進行を調節し、暹脂重合床を
コントロヌルするためにあえお氎を添加するこず
も行なわれる。
However, water is sometimes intentionally added to adjust the progress of the reaction and control the degree of resin polymerization.

たた本発明は䞍掻性ガス雰囲気䞭で行なわれる
こずが奜たしい。
Further, the present invention is preferably carried out in an inert gas atmosphere.

これはゞアミン類の酞化を防止するためであ
る。
This is to prevent oxidation of diamines.

䞍掻性ガスずしおは䞀般に也燥窒玠ガスが䜿甚
される。
Dry nitrogen gas is generally used as the inert gas.

本発明における反応の方法は、次の様な皮々の
方法で行なわれる。
The reaction in the present invention can be carried out in the following various ways.

(1) ―ゞアミノゞプニレンオキサむドず
テトラカルボン酞ゞ無氎物を予め混合し、その
混合物を少量づ぀有機溶媒䞭に撹拌しながら添
加する。この方法は、ポリむミド暹脂の様な発
熱反応においおは比范的有利である。
(1) 2,8-diaminodiphenylene oxide and tetracarboxylic dianhydride are mixed in advance, and the mixture is added little by little to an organic solvent while stirring. This method is relatively advantageous in exothermic reactions such as those for polyimide resins.

(2) これずは逆に、―ゞアミノゞプニレ
ンオキサむドずテトラカルボン酞ゞ無氎物の混
合物に、撹拌しながら溶剀を添加する方法もあ
る。
(2) Conversely, there is also a method of adding a solvent to a mixture of 2,8-diaminodiphenylene oxide and tetracarboxylic dianhydride while stirring.

(3) 䞀般によく行なわれる方法は―ゞアミ
ノゞプニレンオキサむドだけを溶剀にずかし
おおき、これに反応速床をコントロヌルできる
割合でテトラカルボン酞ゞ無氎物を加える方法
である。
(3) A commonly used method is to dissolve only 2,8-diaminodiphenylene oxide in a solvent, and then add tetracarboxylic dianhydride to this in a proportion that allows the reaction rate to be controlled.

(4) たた―ゞアミノプニレンオキサむド
ずテトラカルボン酞ゞ無氎物を別々に溶剀にず
かしおおき、ゆ぀くりず反応噚䞭で二぀の溶液
を加えるこずもできる。
(4) It is also possible to dissolve 2,8-diaminophenylene oxide and tetracarboxylic dianhydride separately in a solvent and then slowly add the two solutions in a reactor.

(5) 曎には予め―ゞアミノプニレンオキ
サむド過剰のポリアミツク酞生成物ずテトラカ
ルボン酞ゞ無氎物過剰のポリアミツク酞生成物
を䜜぀おおき、これを反応噚䞭で曎に反応させ
るこずもできる。
(5) Furthermore, it is also possible to prepare in advance a polyamic acid product containing an excess of 2,8-diaminophenylene oxide and a polyamic acid product containing an excess of tetracarboxylic dianhydride, and then further react them in a reactor. .

反応枩床は〜100℃が奜たしい。℃以䞋だ
ず反応の速床がおそく、100℃以䞊であるず生成
したポリアミツク酞が埐々に閉環反応を開始する
ためである。
The reaction temperature is preferably 0 to 100°C. This is because if the temperature is below 0°C, the reaction rate is slow, and if it is above 100°C, the produced polyamic acid gradually starts the ring-closing reaction.

通垞、反応は20℃前埌で行なわれる。ポリアミ
ツク酞の重合床は蚈画的にコントロヌルできる。
Usually, the reaction is carried out at around 20°C. The degree of polymerization of polyamic acid can be controlled in a planned manner.

重合床をコントロヌルするために、フタル酞無
氎物やアニリンで末端封鎖したり、氎を添加しお
酞無氎物基の䞀方を開環し䞍掻性化するこずもで
きる。
In order to control the degree of polymerization, it is also possible to end-block with phthalic anhydride or aniline, or add water to ring-open one of the acid anhydride groups to inactivate it.

本発明の方法により補造されたポリアミツク酞
生成物は、䜿甚するにあた぀お各皮のシランカツ
プリング剀、ボランカツプリング剀、チタネヌト
系カツプリング剀、アルミニりム系カツプリング
剀その他キレヌト系の接着性・密着性向䞊剀や各
皮溶剀、フロヌ゚ヌゞ゚ントも加えおもよく、又
これらに加えお通垞の酞硬化剀、アミン硬化剀、
ポリアミド硬化剀及びむミダゟヌル、玚アミン
などの硬化促進剀の少量を加えおもよく、又ゎム
やポリサルフアむド、ポリ゚ステル、䜎分子゚ポ
キシなどの可撓性賊䞎剀及び粘床調敎剀、タル
ク、クレヌ、マむカ、長石粉末、石英粉末、酞化
マグネシりムなどの充填剀、カヌボンブラツク、
フタロシアニンブルヌ等の着色剀、テトラブロモ
プニルメタン、トリブチルフオスプヌトなど
の難燃剀、䞉酞化アンチモン、メタ硌酞バリりム
などの難燃助剀の少量を加えおもよく、これらを
添加するこずにより倚くの甚途が開かれる。
When used, the polyamic acid product produced by the method of the present invention has the adhesion and adhesion properties of various silane coupling agents, borane coupling agents, titanate coupling agents, aluminum coupling agents, and other chelate coupling agents. Improvers, various solvents, and flow agents may also be added, and in addition to these, ordinary acid curing agents, amine curing agents,
Small amounts of polyamide curing agents and curing accelerators such as imidazole and tertiary amines may be added, as well as flexibility agents and viscosity modifiers such as rubbers, polysulfides, polyesters, low molecular weight epoxies, talc, clay, mica, Fillers such as feldspar powder, quartz powder, magnesium oxide, carbon black,
Small amounts of colorants such as phthalocyanine blue, flame retardants such as tetrabromophenylmethane and tributyl phosphate, and flame retardant aids such as antimony trioxide and barium metaborate may be added; This opens up many uses.

本発明の方法によ぀お補造されたポリアミツク
酞生成物は、加熱あるいは脱氎剀によりむミド化
し硬化する。
The polyamic acid product produced by the method of the present invention is imidized and cured by heating or by using a dehydrating agent.

前者の加熱脱氎凊理の加熱枩床は、通垞50℃以
䞊、特に150℃以䞊200〜400℃の範囲が奜たしい。
The heating temperature for the former heating and dehydration treatment is usually 50°C or higher, particularly preferably in the range of 150°C or higher and 200 to 400°C.

たたこの堎合の雰囲気は空気䞭でもさし぀かえ
ない堎合もあるが、枛圧ないしは䞍掻性ガスずい
぀た非酞化性状態䞋の方が奜たしい堎合が倚い。
Although air may be used as the atmosphere in this case, it is often preferable to use non-oxidizing conditions such as reduced pressure or inert gas.

埌者の脱氎剀ずしおは無氎酢酞、無氎プロピオ
ン酞、無氎安息銙酞などの無氎カルボン酞が良く
甚いられるが、これらは特にピリゞン、キノリン
などの塩基性物質の共存䞋に䜿甚するず効果が倧
きい。
As the latter dehydrating agent, carboxylic anhydrides such as acetic anhydride, propionic anhydride, and benzoic anhydride are often used, and these are particularly effective when used in the coexistence of basic substances such as pyridine and quinoline.

発明の効果 本発明の方法に埓い、―ゞアミノゞプ
ニレンオキサむドを䜿甚した重合䜓は埓来埗られ
おいる耐熱性暹脂ず比范すれば、耐熱性ず柔軟性
をバランスよく備えた非垞に優れた耐熱性暹脂で
ある。
[Effects of the Invention] Compared to conventionally obtained heat-resistant resins, the polymer made using 2,8-diaminodiphenylene oxide according to the method of the present invention has a good balance of heat resistance and flexibility. It is a heat-resistant resin with excellent properties.

即ち、本発明の方法により合成した重合䜓は分
子構造䞭に芳銙環、耇玠環を倚数有しおおり、こ
のために耐熱性が優れおいる。
That is, the polymer synthesized by the method of the present invention has a large number of aromatic rings and heterocycles in its molecular structure, and therefore has excellent heat resistance.

たた分子の䞻鎖がラセン状をなしおおり、この
ためにスプリング的効果でも぀お柔軟性が優れお
いるものず考えられる。
In addition, the main chain of the molecule has a helical shape, which is thought to give it excellent flexibility due to its spring-like effect.

本発明が甚いられる甚途を具䜓的にあげるず、
先ず各皮電子機材の衚面を保護するコヌト甚塗膜
ずしお、又その䞊に倚局配線を行う耐熱絶瞁膜ず
しお甚いられる。
Specifically, the uses of the present invention are as follows:
First, it is used as a coating film to protect the surfaces of various electronic equipment, and as a heat-resistant insulating film for multilayer wiring on top of it.

䟋えば半導䜓、トランゞスタヌ、リニアヌIC、
ハむブリツトIC、発光ダむオヌド、LSI、超LSI
などの電子回路甚配線構造䜓である。
For example, semiconductors, transistors, linear ICs,
Hybrid IC, light emitting diode, LSI, super LSI
It is a wiring structure for electronic circuits such as.

曎にその他の甚途ずしお各皮材料の耐熱性の付
䞎やあるいはマむクロ波の防止、攟射線の防止甚
ずしおも甚いられる。
Furthermore, it is also used to impart heat resistance to various materials, to prevent microwaves, and to prevent radiation.

䟋えばコンピナタヌ等の導波管、原子機噚、レ
ントゲン機噚の内装材等である。
Examples include waveguides for computers, atomic equipment, and interior materials for X-ray equipment.

次に高枩甚のコヌテむングワニスずしお、電線
被芆、マグネツトワむダ、各皮電気郚品の浞挬コ
ヌテむング、金属郚品の保護コヌテむングなどず
しお甚いられるず共に含浞ワニスずしおも、ガラ
スクロス、溶融石英クロス、グラフアむト繊維や
ボロン繊維の含浞に䜿甚し、レヌダヌドヌム、プ
リント基板、攟射性廃棄物収玍容噚、タヌビン
翌、高枩性胜ず優れた電気特性を芁する宇宙船、
その他の構造郚品に䜿われ、たたマむクロ波の防
止甚攟射線の防止甚ずしおコンピナタヌなどの導
波管、原子機噚、レントゲン機噚の内装材ずしお
も䜿甚される。
Next, it is used as a coating varnish for high temperatures, such as electric wire coating, magnet wire, dip coating for various electrical parts, and protective coating for metal parts.It is also used as an impregnation varnish for glass cloth, fused silica cloth, graphite fiber, boron, etc. Used for fiber impregnation, radar domes, printed circuit boards, radioactive waste containers, turbine blades, spacecraft requiring high temperature performance and excellent electrical properties,
It is used in other structural parts, and as an interior material for waveguides in computers, atomic equipment, and X-ray equipment to prevent microwaves and radiation.

たた成圢材料ずしおもグラフアむト粉末、グラ
フアむト繊維、二硫化モリブデンやポリ四フツ化
゚チレンを添加しお自己最滑性の習動面の補䜜に
甚い、ピストンリング、匁座、ベアリング、シヌ
ル甚などに甚いられたた、ガラス繊維、グラフア
むト繊維やボロン繊維を添加しお、ゞ゚ツト゚ン
ゞン郚品、高匷床の構造甚成圢郚品などが䜜られ
る。
It is also used as a molding material to produce self-lubricating driving surfaces by adding graphite powder, graphite fiber, molybdenum disulfide, and polytetrafluoroethylene, and is used for piston rings, valve seats, bearings, seals, etc. It is also used to make jet engine parts, high-strength structural molded parts, etc. by adding glass fiber, graphite fiber, or boron fiber.

曎に高枩甚接着剀ずしおも、電気回路郚品の接
着や宇宙船の構造郚品の接着甚に甚いられる。
It is also used as a high-temperature adhesive for bonding electrical circuit parts and structural parts of spacecraft.

その他本発明になる耐熱性暹脂は、倚くの甚途
に䜿甚される。
The heat-resistant resin according to the present invention can be used in many other applications.

実斜䟋 以䞋実斜䟋により本発明を説明する。[Example] The present invention will be explained below with reference to Examples.

実斜䟋  枩床蚈、撹拌機及び也燥窒玠ガス吹蟌口を備え
た四ツ口フラスコに、粟補した無氎の―ゞ
アミノゞプニレンオキサむド融点213〜214
℃モルをずり、これに無氎の―メチル―
―ピロリドン95、トル゚ンの混合溶剀を、
党仕蟌原料䞭の固圢分割合が15になるだけの量
を加えお溶解した。
Example 1 Purified anhydrous 2,8-diaminodiphenylene oxide (melting point 213-214
℃) Take 1 mol of anhydrous N-methyl-2
- A mixed solvent of 95% pyrrolidone and 5% toluene,
An amount sufficient to make the solid content of all raw materials 15% was added and dissolved.

也燥窒玠ガスは反応の始めより終りたで党工皋
流しおおく。
Dry nitrogen gas is allowed to flow throughout the entire process from the beginning to the end of the reaction.

次いで粟補した無氎のピロメリツト酞ゞ無氎物
類モルを、撹拌しながら少量ず぀添加するが、
発熱するため倖郚氎槜に玄15℃の冷氎を埪環させ
おこれを冷华した。添加埌続いお内郚枩床を20℃
に蚭定し10時間撹拌を続けお反応を終了した。
Next, 1 mol of purified anhydrous pyromellitic dianhydride is added little by little while stirring.
Because it generated heat, cold water at approximately 15°C was circulated in an external water tank to cool it. After addition, the internal temperature was then increased to 20°C.
The reaction was completed by stirring continuously for 10 hours.

埗られた生成物は黄色透明の極めお粘皠なポリ
アミツク酞であり、NMP0.5の固有粘床は0.81
30℃であ぀た。
The obtained product is a yellow transparent extremely viscous polyamic acid, and the intrinsic viscosity of NMP 0.5% is 0.81.
(30℃).

次にこのポリアミツク酞をガラス板䞊に滎䞋
し、スピンナヌで200rpmminで10sec続いお
1500rpmminで30sec回転させおフむルムずし
た。これを枛圧䞋で80℃、次いで150℃、250℃、
350℃で各30分間ず぀順次に加熱し脱氎閉環させ、
20ÎŒmの黄耐色透明で匷靭なポリむミド暹脂フむ
ルムを埗た。
Next, drop this polyamic acid onto a glass plate and use a spinner at 200 rpm/min for 10 seconds.
It was rotated for 30 seconds at 1500 rpm/min to form a film. This was heated to 80℃ under reduced pressure, then 150℃, 250℃,
Heat at 350℃ for 30 minutes each to dehydrate and close the ring.
A 20 ÎŒm yellow-brown transparent and tough polyimide resin film was obtained.

このフむルの赀倖線吞収スペクトルをずるず
1780cm-1および730cm-1にむミド環に基ずく匷い
吞収ず1200cm-1にフラン環に基ずく匷い吞収がみ
られた。
Taking the infrared absorption spectrum of this film,
Strong absorption based on the imide ring was observed at 1780 cm -1 and 730 cm -1 and strong absorption based on the furan ring was observed at 1200 cm -1 .

このフむルムは可撓性が倧で極めお耐熱性が優
秀であり瀺差熱倩秀分析装眮を甚い空気䞭で昇枩
速床℃minでのフむルムの熱分解開始枩床は
500℃であ぀た。
This film has great flexibility and excellent heat resistance, and the temperature at which the film starts to decompose when heated in air at a heating rate of 5°C/min using a differential thermal balance analyzer is
It was 500℃.

実斜䟋  実斜䟋ず同様な装眮及び方法で―ゞア
ミノゞプニレンオキサむドモルず3′
4′―ベンゟプノンテトラカルボン酞ゞ無氎
物モルを反応させた。
Example 2 Using the same apparatus and method as in Example 1, 1 mol of 2,8-diaminodiphenylene oxide and 3,3',
One mole of 4,4'-benzophenonetetracarboxylic dianhydride was reacted.

埗られた生成物は無色透明の極めお粘皠なポリ
アミツク酞であり、固有粘床は0.52であ぀た。
The obtained product was a colorless and transparent extremely viscous polyamic acid with an intrinsic viscosity of 0.52.

たた埗られたフむルムは黄色透明の可撓性が極
めお倧きいポリむミ暹脂フむルムで、耐熱性も優
秀であり、熱分解開始枩床は440℃であ぀た。
The obtained film was a transparent yellow polyimide resin film with extremely high flexibility and excellent heat resistance, with a thermal decomposition onset temperature of 440°C.

比范䟋  実斜䟋ず同様な装眮及び方法で―ゞア
ミノゞプニレンオキサむドの代りに4′―ゞ
アミノゞプニル゚ヌテルを甚い反応させた。
Comparative Example 1 A reaction was carried out using the same apparatus and method as in Example 1, using 4,4'-diaminodiphenyl ether instead of 2,8-diaminodiphenylene oxide.

埗られたフむルムは可撓性が極めお倧きいもの
であ぀たが熱分解開始枩床は360℃しかなか぀た。
The obtained film had extremely high flexibility, but the thermal decomposition onset temperature was only 360°C.

比范䟋  実斜䟋ず同様な装眮及び方法で―ゞア
ミノゞプニレンオキサむドの代りに―プニ
レンゞアミンを甚い反応させた。
Comparative Example 2 A reaction was carried out using the same apparatus and method as in Example 1, using p-phenylene diamine instead of 2,8-diaminodiphenylene oxide.

埗られた硬化物の熱分解開始枩床は550℃ず極
めお高か぀たが剛盎でフむルムにするこずは出来
なか぀た。
The resulting cured product had an extremely high thermal decomposition temperature of 550°C, but was too rigid to be made into a film.

Claims (1)

【特蚱請求の範囲】[Claims]  芳銙族テトラカルボン酞ゞ無氎物ず芳銙族ゞ
アミンずを反応させむミド環を圢成させるに際し
芳銙族ゞアミン成分ずしお―ゞアミノゞフ
゚ニレンオキサむドを䜿甚するこずを特城ずする
耐熱性暹脂の補造方法。
1. Production of a heat-resistant resin characterized by using 2,8-diaminodiphenylene oxide as an aromatic diamine component when reacting an aromatic tetracarboxylic dianhydride and an aromatic diamine to form an imide ring Method.
JP25926984A 1984-12-10 1984-12-10 Production of heat-resistant resin Granted JPS61138629A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25926984A JPS61138629A (en) 1984-12-10 1984-12-10 Production of heat-resistant resin

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25926984A JPS61138629A (en) 1984-12-10 1984-12-10 Production of heat-resistant resin

Publications (2)

Publication Number Publication Date
JPS61138629A JPS61138629A (en) 1986-06-26
JPH0136850B2 true JPH0136850B2 (en) 1989-08-02

Family

ID=17331749

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25926984A Granted JPS61138629A (en) 1984-12-10 1984-12-10 Production of heat-resistant resin

Country Status (1)

Country Link
JP (1) JPS61138629A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61176630A (en) * 1985-02-01 1986-08-08 Sumitomo Bakelite Co Ltd Production of heat-resistant resin
JPS61181831A (en) * 1985-02-06 1986-08-14 Sumitomo Bakelite Co Ltd Production of heat-resistant resin

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0737528B2 (en) * 1990-12-14 1995-04-26 チッ゜株匏䌚瀟 Method for producing polyisoimide

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59157319A (en) * 1983-02-22 1984-09-06 Agency Of Ind Science & Technol Manufacture of wholely aromatic polyimide formed article having high elastic modulus

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59157319A (en) * 1983-02-22 1984-09-06 Agency Of Ind Science & Technol Manufacture of wholely aromatic polyimide formed article having high elastic modulus

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61176630A (en) * 1985-02-01 1986-08-08 Sumitomo Bakelite Co Ltd Production of heat-resistant resin
JPS61181831A (en) * 1985-02-06 1986-08-14 Sumitomo Bakelite Co Ltd Production of heat-resistant resin

Also Published As

Publication number Publication date
JPS61138629A (en) 1986-06-26

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