JPH0136850B2 - - Google Patents
Info
- Publication number
- JPH0136850B2 JPH0136850B2 JP59259269A JP25926984A JPH0136850B2 JP H0136850 B2 JPH0136850 B2 JP H0136850B2 JP 59259269 A JP59259269 A JP 59259269A JP 25926984 A JP25926984 A JP 25926984A JP H0136850 B2 JPH0136850 B2 JP H0136850B2
- Authority
- JP
- Japan
- Prior art keywords
- tetracarboxylic dianhydride
- dianhydride
- reaction
- present
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 claims description 31
- 238000000034 method Methods 0.000 claims description 12
- 229920006015 heat resistant resin Polymers 0.000 claims description 11
- 125000006158 tetracarboxylic acid group Chemical group 0.000 claims description 11
- 150000004984 aromatic diamines Chemical class 0.000 claims description 7
- 125000003118 aryl group Chemical group 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 125000005462 imide group Chemical group 0.000 claims 1
- 238000006243 chemical reaction Methods 0.000 description 18
- 239000002904 solvent Substances 0.000 description 12
- 229920005575 poly(amic acid) Polymers 0.000 description 9
- 229920000642 polymer Polymers 0.000 description 9
- 239000000835 fiber Substances 0.000 description 7
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 239000003795 chemical substances by application Substances 0.000 description 6
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 6
- 239000002994 raw material Substances 0.000 description 6
- 150000001412 amines Chemical class 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 229920001721 polyimide Polymers 0.000 description 5
- 239000009719 polyimide resin Substances 0.000 description 5
- 238000006116 polymerization reaction Methods 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 239000007822 coupling agent Substances 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 150000003949 imides Chemical group 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- -1 2,3,4,7-tetrachloronaphthalene-1,4,5,8-tetracarboxylic Chemical compound 0.000 description 3
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 3
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- JFDZBHWFFUWGJE-UHFFFAOYSA-N benzonitrile Chemical compound N#CC1=CC=CC=C1 JFDZBHWFFUWGJE-UHFFFAOYSA-N 0.000 description 3
- 239000010439 graphite Substances 0.000 description 3
- 229910002804 graphite Inorganic materials 0.000 description 3
- 239000011261 inert gas Substances 0.000 description 3
- 238000005979 thermal decomposition reaction Methods 0.000 description 3
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical group C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Chemical compound O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- UORVGPXVDQYIDP-UHFFFAOYSA-N borane Chemical compound B UORVGPXVDQYIDP-UHFFFAOYSA-N 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000012024 dehydrating agentsâ Substances 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- 239000003063 flame retardant Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 125000000623 heterocyclic group Chemical group 0.000 description 2
- 238000005470 impregnation Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000002798 polar solvent Substances 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- XSCHRSMBECNVNS-UHFFFAOYSA-N quinoxaline Chemical compound N1=CC=NC2=CC=CC=C21 XSCHRSMBECNVNS-UHFFFAOYSA-N 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- HHVIBTZHLRERCL-UHFFFAOYSA-N sulfonyldimethane Chemical compound CS(C)(=O)=O HHVIBTZHLRERCL-UHFFFAOYSA-N 0.000 description 2
- 239000002966 varnish Substances 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- UZGKAASZIMOAMU-UHFFFAOYSA-N 124177-85-1 Chemical compound NP(=O)=O UZGKAASZIMOAMU-UHFFFAOYSA-N 0.000 description 1
- JFOCEBKIPCVSGU-UHFFFAOYSA-N 1h-pyrrolo[2,3-d]imidazol-2-one Chemical compound C1=CNC2=NC(=O)N=C21 JFOCEBKIPCVSGU-UHFFFAOYSA-N 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- NOGFHTGYPKWWRX-UHFFFAOYSA-N 2,2,6,6-tetramethyloxan-4-one Chemical compound CC1(C)CC(=O)CC(C)(C)O1 NOGFHTGYPKWWRX-UHFFFAOYSA-N 0.000 description 1
- KBLZUSCEBGBILB-UHFFFAOYSA-N 2,2-dimethylthiolane 1,1-dioxide Chemical compound CC1(C)CCCS1(=O)=O KBLZUSCEBGBILB-UHFFFAOYSA-N 0.000 description 1
- JZWGLBCZWLGCDT-UHFFFAOYSA-N 2,7-dichloronaphthalene-1,4,5,8-tetracarboxylic acid Chemical compound ClC1=CC(C(O)=O)=C2C(C(=O)O)=CC(Cl)=C(C(O)=O)C2=C1C(O)=O JZWGLBCZWLGCDT-UHFFFAOYSA-N 0.000 description 1
- WPAJQCZZXQFHBB-UHFFFAOYSA-N 2-[2-(2,5-dicarboxyphenyl)propan-2-yl]terephthalic acid Chemical compound C=1C(C(O)=O)=CC=C(C(O)=O)C=1C(C)(C)C1=CC(C(O)=O)=CC=C1C(O)=O WPAJQCZZXQFHBB-UHFFFAOYSA-N 0.000 description 1
- DZLUPKIRNOCKJB-UHFFFAOYSA-N 2-methoxy-n,n-dimethylacetamide Chemical compound COCC(=O)N(C)C DZLUPKIRNOCKJB-UHFFFAOYSA-N 0.000 description 1
- TYKLCAKICHXQNE-UHFFFAOYSA-N 3-[(2,3-dicarboxyphenyl)methyl]phthalic acid Chemical compound OC(=O)C1=CC=CC(CC=2C(=C(C(O)=O)C=CC=2)C(O)=O)=C1C(O)=O TYKLCAKICHXQNE-UHFFFAOYSA-N 0.000 description 1
- UCFMKTNJZCYBBJ-UHFFFAOYSA-N 3-[1-(2,3-dicarboxyphenyl)ethyl]phthalic acid Chemical compound C=1C=CC(C(O)=O)=C(C(O)=O)C=1C(C)C1=CC=CC(C(O)=O)=C1C(O)=O UCFMKTNJZCYBBJ-UHFFFAOYSA-N 0.000 description 1
- QGRZMPCVIHBQOE-UHFFFAOYSA-N 4,8-dimethyl-1,2,3,5,6,7-hexahydronaphthalene-1,2,5,6-tetracarboxylic acid Chemical compound OC(=O)C1C(C(O)=O)CC(C)=C2C(C(O)=O)C(C(O)=O)CC(C)=C21 QGRZMPCVIHBQOE-UHFFFAOYSA-N 0.000 description 1
- AVCOFPOLGHKJQB-UHFFFAOYSA-N 4-(3,4-dicarboxyphenyl)sulfonylphthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1S(=O)(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 AVCOFPOLGHKJQB-UHFFFAOYSA-N 0.000 description 1
- FBXGQDUVJBKEAJ-UHFFFAOYSA-N 4h-oxazin-3-one Chemical compound O=C1CC=CON1 FBXGQDUVJBKEAJ-UHFFFAOYSA-N 0.000 description 1
- VQVIHDPBMFABCQ-UHFFFAOYSA-N 5-(1,3-dioxo-2-benzofuran-5-carbonyl)-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(C(C=2C=C3C(=O)OC(=O)C3=CC=2)=O)=C1 VQVIHDPBMFABCQ-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- 208000005156 Dehydration Diseases 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- SUAKHGWARZSWIH-UHFFFAOYSA-N N,Nâdiethylformamide Chemical compound CCN(CC)C=O SUAKHGWARZSWIH-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical compound C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 238000000862 absorption spectrum Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 125000004018 acid anhydride group Chemical group 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- QBLDFAIABQKINO-UHFFFAOYSA-N barium borate Chemical compound [Ba+2].[O-]B=O.[O-]B=O QBLDFAIABQKINO-UHFFFAOYSA-N 0.000 description 1
- GCAIEATUVJFSMC-UHFFFAOYSA-N benzene-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1C(O)=O GCAIEATUVJFSMC-UHFFFAOYSA-N 0.000 description 1
- HFACYLZERDEVSX-UHFFFAOYSA-N benzidine Chemical compound C1=CC(N)=CC=C1C1=CC=C(N)C=C1 HFACYLZERDEVSX-UHFFFAOYSA-N 0.000 description 1
- 229910000085 borane Inorganic materials 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- 229930188620 butyrolactone Natural products 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 150000001244 carboxylic acid anhydrides Chemical class 0.000 description 1
- 239000013522 chelant Substances 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 229910052570 clay Inorganic materials 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- XCJYREBRNVKWGJ-UHFFFAOYSA-N copper(II) phthalocyanine Chemical compound [Cu+2].C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 XCJYREBRNVKWGJ-UHFFFAOYSA-N 0.000 description 1
- WOSVXXBNNCUXMT-UHFFFAOYSA-N cyclopentane-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1CC(C(O)=O)C(C(O)=O)C1C(O)=O WOSVXXBNNCUXMT-UHFFFAOYSA-N 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 150000004985 diamines Chemical class 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
- 239000002612 dispersion medium Substances 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 239000010433 feldspar Substances 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 239000012778 molding material Substances 0.000 description 1
- CWQXQMHSOZUFJS-UHFFFAOYSA-N molybdenum disulfide Chemical compound S=[Mo]=S CWQXQMHSOZUFJS-UHFFFAOYSA-N 0.000 description 1
- 229910052982 molybdenum disulfide Inorganic materials 0.000 description 1
- AJFDBNQQDYLMJN-UHFFFAOYSA-N n,n-diethylacetamide Chemical compound CCN(CC)C(C)=O AJFDBNQQDYLMJN-UHFFFAOYSA-N 0.000 description 1
- KADGVXXDDWDKBX-UHFFFAOYSA-N naphthalene-1,2,4,5-tetracarboxylic acid Chemical compound OC(=O)C1=CC=CC2=C(C(O)=O)C(C(=O)O)=CC(C(O)=O)=C21 KADGVXXDDWDKBX-UHFFFAOYSA-N 0.000 description 1
- OBKARQMATMRWQZ-UHFFFAOYSA-N naphthalene-1,2,5,6-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C=CC2=C(C(O)=O)C(C(=O)O)=CC=C21 OBKARQMATMRWQZ-UHFFFAOYSA-N 0.000 description 1
- DOBFTMLCEYUAQC-UHFFFAOYSA-N naphthalene-2,3,6,7-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C=C2C=C(C(O)=O)C(C(=O)O)=CC2=C1 DOBFTMLCEYUAQC-UHFFFAOYSA-N 0.000 description 1
- YTVNOVQHSGMMOV-UHFFFAOYSA-N naphthalenetetracarboxylic dianhydride Chemical compound C1=CC(C(=O)OC2=O)=C3C2=CC=C2C(=O)OC(=O)C1=C32 YTVNOVQHSGMMOV-UHFFFAOYSA-N 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- WCPAKWJPBJAGKN-UHFFFAOYSA-N oxadiazole Chemical compound C1=CON=N1 WCPAKWJPBJAGKN-UHFFFAOYSA-N 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- RVRYJZTZEUPARA-UHFFFAOYSA-N phenanthrene-1,2,9,10-tetracarboxylic acid Chemical compound C1=CC=C2C(C(O)=O)=C(C(O)=O)C3=C(C(O)=O)C(C(=O)O)=CC=C3C2=C1 RVRYJZTZEUPARA-UHFFFAOYSA-N 0.000 description 1
- 150000004986 phenylenediamines Chemical class 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- CLYVDMAATCIVBF-UHFFFAOYSA-N pigment red 224 Chemical compound C=12C3=CC=C(C(OC4=O)=O)C2=C4C=CC=1C1=CC=C2C(=O)OC(=O)C4=CC=C3C1=C42 CLYVDMAATCIVBF-UHFFFAOYSA-N 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920001021 polysulfide Polymers 0.000 description 1
- 239000005077 polysulfide Substances 0.000 description 1
- 150000008117 polysulfides Polymers 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- WYVAMUWZEOHJOQ-UHFFFAOYSA-N propionic anhydride Chemical compound CCC(=O)OC(=O)CC WYVAMUWZEOHJOQ-UHFFFAOYSA-N 0.000 description 1
- 239000011253 protective coating Substances 0.000 description 1
- RTHVZRHBNXZKKB-UHFFFAOYSA-N pyrazine-2,3,5,6-tetracarboxylic acid Chemical compound OC(=O)C1=NC(C(O)=O)=C(C(O)=O)N=C1C(O)=O RTHVZRHBNXZKKB-UHFFFAOYSA-N 0.000 description 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 1
- YKWDNEXDHDSTCU-UHFFFAOYSA-N pyrrolidine-2,3,4,5-tetracarboxylic acid Chemical compound OC(=O)C1NC(C(O)=O)C(C(O)=O)C1C(O)=O YKWDNEXDHDSTCU-UHFFFAOYSA-N 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- JWVCLYRUEFBMGU-UHFFFAOYSA-N quinazoline Chemical compound N1=CN=CC2=CC=CC=C21 JWVCLYRUEFBMGU-UHFFFAOYSA-N 0.000 description 1
- 239000002901 radioactive waste Substances 0.000 description 1
- 238000007363 ring formation reaction Methods 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- VLLMWSRANPNYQX-UHFFFAOYSA-N thiadiazole Chemical compound C1=CSN=N1.C1=CSN=N1 VLLMWSRANPNYQX-UHFFFAOYSA-N 0.000 description 1
- LUEGQDUCMILDOJ-UHFFFAOYSA-N thiophene-2,3,4,5-tetracarboxylic acid Chemical compound OC(=O)C=1SC(C(O)=O)=C(C(O)=O)C=1C(O)=O LUEGQDUCMILDOJ-UHFFFAOYSA-N 0.000 description 1
- 150000003852 triazoles Chemical class 0.000 description 1
- STCOOQWBFONSKY-UHFFFAOYSA-N tributyl phosphate Chemical compound CCCCOP(=O)(OCCCC)OCCCC STCOOQWBFONSKY-UHFFFAOYSA-N 0.000 description 1
- 239000004034 viscosity adjusting agent Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Description
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æ§æš¹èã®è£œé æ¹æ³ã«é¢ãããã®ã§ãããDetailed Description of the Invention [Industrial Field of Application] The present invention is directed to a polymer compound synthesized using 2,8-diaminodiphenylene oxide, in which a hetero imide ring and a furan ring are mixed in the main chain of a polymer. The present invention relates to a method for producing a heat-resistant resin having a heat-resistant resin.
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æäŸããããšã«ããã The purpose of this is that the cured resin imidized by ring-closing treatment has excellent flexibility and heat resistance, and also has the abrasion resistance, chemical resistance, electrical insulation, and film-forming properties of a polyimide resin. The object of the present invention is to provide a heat-resistant resin that has excellent mechanical properties and is useful as a material for electronic devices, an electrical insulating material, a coating, an adhesive, a paint, a molded product, a laminate, a fiber, or a film material.
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ç¥ãããŠãããšããã§ããã[Prior Art] Conventionally, polymers having a heterocycle such as imide, imidazole, thiazole, oxadiazole, triazole, quinoxaline, thiadiazole, oxazinone, quinazoline, imidazopyrrolone, isoindoquinazolone, etc. in the polymer main chain have been used. It is already known that it is an excellent heat-resistant resin.
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ãå®çšäžäžååã§ãã€ãã However, these known polymers have rigid polymer main chains, and when made into films, membranes, fibers, etc., have poor flexibility, flexibility, elongation, etc., and are unsatisfactory for practical use.
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ããã From this point of view, various studies have been conducted in the past, and by using 4,4'-diaminodiphenyl ether as one of the amine components of the raw material for producing heat-resistant resins, other amines such as phenylene diamine and benzidine have been used. , diaminodiphenylmethane,
It is also known that improved polymers with better flexibility, flexibility, elongation, etc. can be obtained compared to those using diaminodiphenylsulfone or the like.
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ãé倧ãªæ¬ ç¹ãæããŠããã However, those using this 4,4'-diaminodiphenyl ether had a serious drawback of reduced heat resistance.
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çºæãå®æããã«å°ã€ããã®ã§ããã[Object of the Invention] As a result of studies to overcome these drawbacks, the present invention uses 2,8-diaminodiphenylene oxide as the amine component to provide excellent heat resistance and improved physical properties. Also flexible,
The present invention was completed after discovering that a heat-resistant resin with excellent flexibility, elongation, etc. and well-balanced practicality can be obtained.
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ãšããèç±æ§æš¹èã®è£œé æ¹æ³ã§ããã[Structure of the Invention] The present invention involves using 2,8-diaminodiphenylene oxide as the aromatic diamine in forming an imide ring by reacting an aromatic tetracarboxylic dianhydride with an aromatic diamine. This is a unique method for producing heat-resistant resin.
åå¿åŒã§ç€ºããšã次ã®æ§ã«ãªãã The reaction formula is as follows.
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ãæããæ§é ãšãªãè³éŠæãžã¢ãã³ã§ããã 2, as the aromatic diamine used in the present invention
8-diaminodiphenylene oxide has a positional relationship in which the axes of the amine positions at both ends intersect with each other, so the main chain of the final cured product (polyimide resin) has a helical shape, which makes it flexible. It is an aromatic diamine having a structure.
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žãžç¡æ°Žç©ãªã©ã§ããã The aromatic tetracarboxylic dianhydride used in the present invention is pyromellitic dianhydride, benzophenone tetracarboxylic dianhydride, 2,3,6,7-
naphthalenetetracarboxylic dianhydride, 3,3',
4,4â²-diphenyltetracarboxylic dianhydride,
1,2,5,6-naphthalenetetracarboxylic dianhydride, 2,2',3,3'-diphenyltetracarboxylic dianhydride, 2,2-bis(3,4-dicarboxydiphenyl) Propane dianhydride, 3,4,
9,10-perylenetetracarboxylic dianhydride, bis(3,4-dicarboxydiphenyl)ether dianhydride, naphthalene-1,2,4,5-tetracarboxylic dianhydride, naphthalene-1,4, 5,
8-Tetracarboxylic dianhydride, 4,8-dimethyl-1,2,3,5,6,7-hexahydronaphthalene-1,2,5,6-tetracarboxylic dianhydride, 2,6- Dichloronaphthalene-1,4,
5,,8-tetracarboxylic dianhydride, 2,7-
Dichloronaphthalene-1,4,5,8-tetracarboxylic dianhydride, 2,3,4,7-tetrachloronaphthalene-1,4,5,8-tetracarboxylic dianhydride, phenanthrene-1,2 ,9,10-
Tetracarboxylic dianhydride, cyclopentane
1,2,3,4-tetracarboxylic dianhydride, pyrrolidine-2,3,4,5-tetracarboxylic dianhydride, pyrazine 2,3,5,6-tetracarboxylic dianhydride, 2, 2-bis(2,5-dicarboxyphenyl)propane dianhydride, 1,1-bis(2,3-dicarboxyphenyl)ethane dianhydride, 1,1-bis(3,4-dicarboxyphenyl) ) Ethane dianhydride, bis(2,3-dicarboxyphenyl)methane dianhydride, bis(3,4-dicarboxyphenyl)sulfone dianhydride, benzene-1,2,3,4-tetracarboxylic dianhydride and thiophene-2,3,4,5-tetracarboxylic dianhydride.
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æ¹ã®ïŒäŸãåå¿åŒã§ç€ºããšæ¬¡ã®æ§ã«ãªãã Further, an example of how to make 2,8-diaminodiphenylene oxide, which is an aromatic diamine used in the present invention, is shown in the following reaction formula.
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泚æãèŠããã [Reference: University of Fukui Faculty of Engineering Research Report 16(2)238
('68)] In the present invention, the reaction between aromatic tetracarboxylic dianhydride and 2,8-diaminodiphenylene oxide is preferably carried out in equimolar amounts as much as possible, and the degree of polymerization is also increased. If the amount of either raw material increases by 5% or more, the degree of polymerization will drop significantly and a low molecular weight product with poor film-forming properties will be obtained, so care must be taken.
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ãã Usually, using 1 to 3% more of one raw material means that
This is often done to improve workability and processability.
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ãŒã¡ã³ããæããææ©æ¥µæ§æº¶åªã§ããã The solvent of the reaction system in the present invention is an organic polar solvent whose functional group has a dipole moment that does not react with tetracarboxylic dianhydride or 2,8-diaminodiphenylene oxide.
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åªã§ãªããã°ãªããªãã In addition to being inert to the system and solvent to the product, the organic polar solvent must be solvent to at least one, preferably both, of the reaction components.
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çšãããã Typical solvents of this type are N, N-
Dimethylformamide, N,N-dimethylacetamide, N,N-diethylformamide, N,N
-Diethyl acetamide, N,N-dimethylmethoxyacetamide, dimethyl sulfoxide, hexamethyl phosphoamide, N-methyl-2-pyrrolidone, pyridine, dimethyl sulfone, tetramethylene sulfone, dimethyltetramethylene sulfone, etc.These solvents can be used alone or used in combination.
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èå¹³æ»å€ãªã©ãšããŠäœ¿çšãããã Other solvents that can be used in combination include benzene, benzonitrile, dioxane,
Nonsolvents such as butyrolactone, xylene, toluene, and cyclohexane are used as dispersion media for raw materials, reaction regulators, volatilization regulators for solvents from products, film leveling agents, and the like.
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ããã§ããã It is generally preferred that the present invention be carried out under anhydrous conditions. This is because the tetracarboxylic dianhydride is ring-opened by water, becomes inactivated, and there is a risk of stopping the reaction.
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èŠãããã Therefore, it is necessary to remove both the moisture in the raw materials and the moisture in the solvent.
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ãè¡ãªãããã However, water is sometimes intentionally added to adjust the progress of the reaction and control the degree of resin polymerization.
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ããšã奜ãŸããã Further, the present invention is preferably carried out in an inert gas atmosphere.
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ãã This is to prevent oxidation of diamines.
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ãããã Dry nitrogen gas is generally used as the inert gas.
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æ¹æ³ã§è¡ãªãããã The reaction in the present invention can be carried out in the following various ways.
(1) ïŒïŒïŒâãžã¢ãããžããšãã¬ã³ãªããµã€ããš
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ç±åå¿ã«ãããŠã¯æ¯èŒçæå©ã§ããã(1) 2,8-diaminodiphenylene oxide and tetracarboxylic dianhydride are mixed in advance, and the mixture is added little by little to an organic solvent while stirring. This method is relatively advantageous in exothermic reactions such as those for polyimide resins.
(2) ãããšã¯éã«ãïŒïŒïŒâãžã¢ãããžããšãã¬
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ãã(2) Conversely, there is also a method of adding a solvent to a mixture of 2,8-diaminodiphenylene oxide and tetracarboxylic dianhydride while stirring.
(3) äžè¬ã«ããè¡ãªãããæ¹æ³ã¯ïŒïŒïŒâãžã¢ã
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ã§ããã(3) A commonly used method is to dissolve only 2,8-diaminodiphenylene oxide in a solvent, and then add tetracarboxylic dianhydride to this in a proportion that allows the reaction rate to be controlled.
(4) ãŸãïŒïŒïŒâãžã¢ããããšãã¬ã³ãªããµã€ã
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ãå ããããšãã§ããã(4) It is also possible to dissolve 2,8-diaminophenylene oxide and tetracarboxylic dianhydride separately in a solvent and then slowly add the two solutions in a reactor.
(5) æŽã«ã¯äºãïŒïŒïŒâãžã¢ããããšãã¬ã³ãªã
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ãããšãã§ããã(5) Furthermore, it is also possible to prepare in advance a polyamic acid product containing an excess of 2,8-diaminophenylene oxide and a polyamic acid product containing an excess of tetracarboxylic dianhydride, and then further react them in a reactor. .
åå¿æž©åºŠã¯ïŒã100âã奜ãŸãããïŒâ以äžã
ãšåå¿ã®é床ããããã100â以äžã§ãããšçæ
ããããªã¢ããã¯é
žãåŸã
ã«éç°åå¿ãéå§ãã
ããã§ããã The reaction temperature is preferably 0 to 100°C. This is because if the temperature is below 0°C, the reaction rate is slow, and if it is above 100°C, the produced polyamic acid gradually starts the ring-closing reaction.
éåžžãåå¿ã¯20âååŸã§è¡ãªããããããªã¢ã
ãã¯é
žã®éå床ã¯èšç»çã«ã³ã³ãããŒã«ã§ããã Usually, the reaction is carried out at around 20°C. The degree of polymerization of polyamic acid can be controlled in a planned manner.
éå床ãã³ã³ãããŒã«ããããã«ããã¿ã«é
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ããã In order to control the degree of polymerization, it is also possible to end-block with phthalic anhydride or aniline, or add water to ring-open one of the acid anhydride groups to inactivate it.
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žåã¢ã³ãã¢ã³ãã¡ã¿ç¡Œé
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ãªã©ã®é£çå©å€ã®å°éãå ããŠãããããããã
æ·»å ããããšã«ããå€ãã®çšéãéãããã When used, the polyamic acid product produced by the method of the present invention has the adhesion and adhesion properties of various silane coupling agents, borane coupling agents, titanate coupling agents, aluminum coupling agents, and other chelate coupling agents. Improvers, various solvents, and flow agents may also be added, and in addition to these, ordinary acid curing agents, amine curing agents,
Small amounts of polyamide curing agents and curing accelerators such as imidazole and tertiary amines may be added, as well as flexibility agents and viscosity modifiers such as rubbers, polysulfides, polyesters, low molecular weight epoxies, talc, clay, mica, Fillers such as feldspar powder, quartz powder, magnesium oxide, carbon black,
Small amounts of colorants such as phthalocyanine blue, flame retardants such as tetrabromophenylmethane and tributyl phosphate, and flame retardant aids such as antimony trioxide and barium metaborate may be added; This opens up many uses.
æ¬çºæã®æ¹æ³ã«ãã€ãŠè£œé ãããããªã¢ããã¯
é
žçæç©ã¯ãå ç±ãããã¯è±æ°Žå€ã«ããã€ããå
ã硬åããã The polyamic acid product produced by the method of the present invention is imidized and cured by heating or by using a dehydrating agent.
åè
ã®å ç±è±æ°ŽåŠçã®å ç±æž©åºŠã¯ãéåžž50â以
äžãç¹ã«150â以äž200ã400âã®ç¯å²ã奜ãŸããã The heating temperature for the former heating and dehydration treatment is usually 50°C or higher, particularly preferably in the range of 150°C or higher and 200 to 400°C.
ãŸããã®å Žåã®é°å²æ°ã¯ç©ºæ°äžã§ãããã€ãã
ãªãå Žåãããããæžå§ãªããã¯äžæŽ»æ§ã¬ã¹ãšã
ã€ãéé
žåæ§ç¶æ
äžã®æ¹ã奜ãŸããå Žåãå€ãã Although air may be used as the atmosphere in this case, it is often preferable to use non-oxidizing conditions such as reduced pressure or inert gas.
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žãç¡æ°Žããããª
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žãè¯ã
çšãããããããããã¯ç¹ã«ããªãžã³ããããªã³
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ããã As the latter dehydrating agent, carboxylic anhydrides such as acetic anhydride, propionic anhydride, and benzoic anhydride are often used, and these are particularly effective when used in the coexistence of basic substances such as pyridine and quinoline.
çºæã®å¹æ
æ¬çºæã®æ¹æ³ã«åŸããïŒïŒïŒâãžã¢ãããžããš
ãã¬ã³ãªããµã€ãã䜿çšããéåäœã¯åŸæ¥åŸãã
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ããã[Effects of the Invention] Compared to conventionally obtained heat-resistant resins, the polymer made using 2,8-diaminodiphenylene oxide according to the method of the present invention has a good balance of heat resistance and flexibility. It is a heat-resistant resin with excellent properties.
å³ã¡ãæ¬çºæã®æ¹æ³ã«ããåæããéåäœã¯å
åæ§é äžã«è³éŠç°ãè€çŽ ç°ãå€æ°æããŠãããã
ã®ããã«èç±æ§ãåªããŠããã That is, the polymer synthesized by the method of the present invention has a large number of aromatic rings and heterocycles in its molecular structure, and therefore has excellent heat resistance.
ãŸãååã®äž»éãã©ã»ã³ç¶ããªããŠããããã®
ããã«ã¹ããªã³ã°çå¹æã§ãã€ãŠæè»æ§ãåªããŠ
ãããã®ãšèããããã In addition, the main chain of the molecule has a helical shape, which is thought to give it excellent flexibility due to its spring-like effect.
æ¬çºæãçšããããçšéãå
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å
ãåçš®é»åæ©æã®è¡šé¢ãä¿è·ããã³ãŒãçšå¡è
ãšããŠãåãã®äžã«å€å±€é
ç·ãè¡ãèç±çµ¶çžèãš
ããŠçšããããã Specifically, the uses of the present invention are as follows:
First, it is used as a coating film to protect the surfaces of various electronic equipment, and as a heat-resistant insulating film for multilayer wiring on top of it.
äŸãã°åå°äœããã©ã³ãžã¹ã¿ãŒããªãã¢ãŒICã
ãã€ããªããICãçºå
ãã€ãªãŒããLSIãè¶
LSI
ãªã©ã®é»ååè·¯çšé
ç·æ§é äœã§ããã For example, semiconductors, transistors, linear ICs,
Hybrid IC, light emitting diode, LSI, super LSI
It is a wiring structure for electronic circuits such as.
æŽã«ãã®ä»ã®çšéãšããŠåçš®ææã®èç±æ§ã®ä»
äžããããã¯ãã€ã¯ãæ³¢ã®é²æ¢ãæŸå°ç·ã®é²æ¢çš
ãšããŠãçšããããã Furthermore, it is also used to impart heat resistance to various materials, to prevent microwaves, and to prevent radiation.
äŸãã°ã³ã³ããŠã¿ãŒçã®å°æ³¢ç®¡ãååæ©åšãã¬
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æçã§ããã Examples include waveguides for computers, atomic equipment, and interior materials for X-ray equipment.
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ã䜿çšãããã Next, it is used as a coating varnish for high temperatures, such as electric wire coating, magnet wire, dip coating for various electrical parts, and protective coating for metal parts.It is also used as an impregnation varnish for glass cloth, fused silica cloth, graphite fiber, boron, etc. Used for fiber impregnation, radar domes, printed circuit boards, radioactive waste containers, turbine blades, spacecraft requiring high temperature performance and excellent electrical properties,
It is used in other structural parts, and as an interior material for waveguides in computers, atomic equipment, and X-ray equipment to prevent microwaves and radiation.
ãŸãæ圢ææãšããŠãã°ã©ãã¢ã€ãç²æ«ãã°ã©
ãã¢ã€ãç¹ç¶ãäºç¡«åã¢ãªããã³ãããªåããå
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çšãããã¹ãã³ãªã³ã°ãåŒåº§ããã¢ãªã³ã°ãã·ãŒ
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ã€ãç¹ç¶ãããã³ç¹ç¶ãæ·»å ããŠããžãšãããšã³
ãžã³éšåãé«åŒ·åºŠã®æ§é çšæ圢éšåãªã©ãäœãã
ãã It is also used as a molding material to produce self-lubricating driving surfaces by adding graphite powder, graphite fiber, molybdenum disulfide, and polytetrafluoroethylene, and is used for piston rings, valve seats, bearings, seals, etc. It is also used to make jet engine parts, high-strength structural molded parts, etc. by adding glass fiber, graphite fiber, or boron fiber.
æŽã«é«æž©çšæ¥çå€ãšããŠããé»æ°åè·¯éšåã®æ¥
çãå®å®è¹ã®æ§é éšåã®æ¥ççšã«çšããããã It is also used as a high-temperature adhesive for bonding electrical circuit parts and structural parts of spacecraft.
ãã®ä»æ¬çºæã«ãªãèç±æ§æš¹èã¯ãå€ãã®çšé
ã«äœ¿çšãããã The heat-resistant resin according to the present invention can be used in many other applications.
å®æœäŸïŒœ 以äžå®æœäŸã«ããæ¬çºæã説æããã[Example] The present invention will be explained below with reference to Examples.
å®æœäŸ ïŒ
枩床èšãæ¹ææ©åã³ä¹Ÿç¥çªçŽ ã¬ã¹å¹èŸŒå£ãåã
ãåãå£ãã©ã¹ã³ã«ã粟補ããç¡æ°Žã®ïŒïŒïŒâãž
ã¢ãããžããšãã¬ã³ãªããµã€ãïŒèç¹213ã214
âïŒïŒã¢ã«ããšããããã«ç¡æ°Žã®ïŒ®âã¡ãã«âïŒ
âãããªãã³95ïŒ
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å
šä»èŸŒåæäžã®åºåœ¢åå²åã15ïŒ
ã«ãªãã ãã®é
ãå ããŠæº¶è§£ãããExample 1 Purified anhydrous 2,8-diaminodiphenylene oxide (melting point 213-214
â) Take 1 mol of anhydrous N-methyl-2
- A mixed solvent of 95% pyrrolidone and 5% toluene,
An amount sufficient to make the solid content of all raw materials 15% was added and dissolved.
也ç¥çªçŽ ã¬ã¹ã¯åå¿ã®å§ãããçµããŸã§å
šå·¥çš
æµããŠããã Dry nitrogen gas is allowed to flow throughout the entire process from the beginning to the end of the reaction.
次ãã§ç²Ÿè£œããç¡æ°Žã®ããã¡ãªããé
žãžç¡æ°Žç©
é¡ïŒã¢ã«ããæ¹æããªããå°éãã€æ·»å ãããã
çºç±ããããå€éšæ°Žæ§œã«çŽ15âã®å·æ°Žã埪ç°ãã
ãŠãããå·åŽãããæ·»å åŸç¶ããŠå
éšæž©åºŠã20â
ã«èšå®ã10æéæ¹æãç¶ããŠåå¿ãçµäºããã Next, 1 mol of purified anhydrous pyromellitic dianhydride is added little by little while stirring.
Because it generated heat, cold water at approximately 15°C was circulated in an external water tank to cool it. After addition, the internal temperature was then increased to 20°C.
The reaction was completed by stirring continuously for 10 hours.
åŸãããçæç©ã¯é»è²éæã®æ¥µããŠç²çš ãªããª
ã¢ããã¯é
žã§ãããNMP0.5ïŒ
ã®åºæç²åºŠã¯0.81
ïŒ30âïŒã§ãã€ãã The obtained product is a yellow transparent extremely viscous polyamic acid, and the intrinsic viscosity of NMP 0.5% is 0.81.
(30â).
次ã«ãã®ããªã¢ããã¯é
žãã¬ã©ã¹æ¿äžã«æ»Žäž
ããã¹ãã³ããŒã§200rpmïŒminã§10secç¶ããŠ
1500rpmïŒminã§30secå転ãããŠãã€ã«ã ãšã
ãããããæžå§äžã§80âã次ãã§150âã250âã
350âã§å30åéãã€é 次ã«å ç±ãè±æ°Žéç°ããã
20ÎŒmã®é»è€è²éæã§åŒ·éãªããªã€ããæš¹èãã€
ã«ã ãåŸãã Next, drop this polyamic acid onto a glass plate and use a spinner at 200 rpm/min for 10 seconds.
It was rotated for 30 seconds at 1500 rpm/min to form a film. This was heated to 80â under reduced pressure, then 150â, 250â,
Heat at 350â for 30 minutes each to dehydrate and close the ring.
A 20 ÎŒm yellow-brown transparent and tough polyimide resin film was obtained.
ãã®ãã€ã«ã®èµ€å€ç·åžåã¹ãã¯ãã«ããšããš
1780cm-1ããã³730cm-1ã«ã€ããç°ã«åºãã匷ã
åžåãš1200cm-1ã«ãã©ã³ç°ã«åºãã匷ãåžåãã¿
ãããã Taking the infrared absorption spectrum of this film,
Strong absorption based on the imide ring was observed at 1780 cm -1 and 730 cm -1 and strong absorption based on the furan ring was observed at 1200 cm -1 .
ãã®ãã€ã«ã ã¯å¯ææ§ã倧ã§æ¥µããŠèç±æ§ãåª
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é床ïŒâïŒminã§ã®ãã€ã«ã ã®ç±å解éå§æž©åºŠã¯
500âã§ãã€ãã This film has great flexibility and excellent heat resistance, and the temperature at which the film starts to decompose when heated in air at a heating rate of 5°C/min using a differential thermal balance analyzer is
It was 500â.
å®æœäŸ ïŒ
å®æœäŸïŒãšåæ§ãªè£
眮åã³æ¹æ³ã§ïŒïŒïŒâãžã¢
ãããžããšãã¬ã³ãªããµã€ãïŒã¢ã«ãšïŒïŒ3â²ïŒ
ïŒïŒ4â²âãã³ãŸããšãã³ããã©ã«ã«ãã³é
žãžç¡æ°Ž
ç©ïŒã¢ã«ãåå¿ããããExample 2 Using the same apparatus and method as in Example 1, 1 mol of 2,8-diaminodiphenylene oxide and 3,3',
One mole of 4,4'-benzophenonetetracarboxylic dianhydride was reacted.
åŸãããçæç©ã¯ç¡è²éæã®æ¥µããŠç²çš ãªããª
ã¢ããã¯é
žã§ãããåºæç²åºŠã¯0.52ã§ãã€ãã The obtained product was a colorless and transparent extremely viscous polyamic acid with an intrinsic viscosity of 0.52.
ãŸãåŸããããã€ã«ã ã¯é»è²éæã®å¯ææ§ã極
ããŠå€§ããããªã€ãæš¹èãã€ã«ã ã§ãèç±æ§ãåª
ç§ã§ãããç±å解éå§æž©åºŠã¯440âã§ãã€ãã The obtained film was a transparent yellow polyimide resin film with extremely high flexibility and excellent heat resistance, with a thermal decomposition onset temperature of 440°C.
æ¯èŒäŸ ïŒ
å®æœäŸïŒãšåæ§ãªè£
眮åã³æ¹æ³ã§ïŒïŒïŒâãžã¢
ãããžããšãã¬ã³ãªããµã€ãã®ä»£ãã«ïŒïŒ4â²âãž
ã¢ãããžããšãã«ãšãŒãã«ãçšãåå¿ããããComparative Example 1 A reaction was carried out using the same apparatus and method as in Example 1, using 4,4'-diaminodiphenyl ether instead of 2,8-diaminodiphenylene oxide.
åŸããããã€ã«ã ã¯å¯ææ§ã極ããŠå€§ãããã®
ã§ãã€ããç±å解éå§æž©åºŠã¯360âãããªãã€ãã The obtained film had extremely high flexibility, but the thermal decomposition onset temperature was only 360°C.
æ¯èŒäŸ ïŒ
å®æœäŸïŒãšåæ§ãªè£
眮åã³æ¹æ³ã§ïŒïŒïŒâãžã¢
ãããžããšãã¬ã³ãªããµã€ãã®ä»£ãã«ïœâããšã
ã¬ã³ãžã¢ãã³ãçšãåå¿ããããComparative Example 2 A reaction was carried out using the same apparatus and method as in Example 1, using p-phenylene diamine instead of 2,8-diaminodiphenylene oxide.
åŸããã硬åç©ã®ç±å解éå§æž©åºŠã¯550âãšæ¥µ
ããŠé«ãã€ããåçŽã§ãã€ã«ã ã«ããããšã¯åºæ¥
ãªãã€ãã The resulting cured product had an extremely high thermal decomposition temperature of 550°C, but was too rigid to be made into a film.
Claims (1)
ã¢ãã³ãšãåå¿ããã€ããç°ã圢æãããã«éã
è³éŠæãžã¢ãã³æåãšããŠïŒïŒïŒâãžã¢ãããžã
ãšãã¬ã³ãªããµã€ãã䜿çšããããšãç¹åŸŽãšãã
èç±æ§æš¹èã®è£œé æ¹æ³ã1. Production of a heat-resistant resin characterized by using 2,8-diaminodiphenylene oxide as an aromatic diamine component when reacting an aromatic tetracarboxylic dianhydride and an aromatic diamine to form an imide ring Method.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP25926984A JPS61138629A (en) | 1984-12-10 | 1984-12-10 | Production of heat-resistant resin |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP25926984A JPS61138629A (en) | 1984-12-10 | 1984-12-10 | Production of heat-resistant resin |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS61138629A JPS61138629A (en) | 1986-06-26 |
JPH0136850B2 true JPH0136850B2 (en) | 1989-08-02 |
Family
ID=17331749
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP25926984A Granted JPS61138629A (en) | 1984-12-10 | 1984-12-10 | Production of heat-resistant resin |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61138629A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61176630A (en) * | 1985-02-01 | 1986-08-08 | Sumitomo Bakelite Co Ltd | Production of heat-resistant resin |
JPS61181831A (en) * | 1985-02-06 | 1986-08-14 | Sumitomo Bakelite Co Ltd | Production of heat-resistant resin |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0737528B2 (en) * | 1990-12-14 | 1995-04-26 | ãããœæ ªåŒäŒç€Ÿ | Method for producing polyisoimide |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59157319A (en) * | 1983-02-22 | 1984-09-06 | Agency Of Ind Science & Technol | Manufacture of wholely aromatic polyimide formed article having high elastic modulus |
-
1984
- 1984-12-10 JP JP25926984A patent/JPS61138629A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59157319A (en) * | 1983-02-22 | 1984-09-06 | Agency Of Ind Science & Technol | Manufacture of wholely aromatic polyimide formed article having high elastic modulus |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61176630A (en) * | 1985-02-01 | 1986-08-08 | Sumitomo Bakelite Co Ltd | Production of heat-resistant resin |
JPS61181831A (en) * | 1985-02-06 | 1986-08-14 | Sumitomo Bakelite Co Ltd | Production of heat-resistant resin |
Also Published As
Publication number | Publication date |
---|---|
JPS61138629A (en) | 1986-06-26 |
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