JPH0132795B2 - - Google Patents
Info
- Publication number
- JPH0132795B2 JPH0132795B2 JP55098248A JP9824880A JPH0132795B2 JP H0132795 B2 JPH0132795 B2 JP H0132795B2 JP 55098248 A JP55098248 A JP 55098248A JP 9824880 A JP9824880 A JP 9824880A JP H0132795 B2 JPH0132795 B2 JP H0132795B2
- Authority
- JP
- Japan
- Prior art keywords
- plate
- phenols
- aluminum
- aluminum plate
- printing plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000007639 printing Methods 0.000 claims description 29
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 26
- 229910052782 aluminium Inorganic materials 0.000 claims description 26
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 20
- 150000002989 phenols Chemical class 0.000 claims description 16
- 238000000034 method Methods 0.000 claims description 11
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 claims description 10
- 239000008151 electrolyte solution Substances 0.000 claims description 9
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 claims description 8
- 229910000838 Al alloy Inorganic materials 0.000 claims description 6
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 claims description 6
- 238000005530 etching Methods 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 229940079877 pyrogallol Drugs 0.000 claims description 5
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 2
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- 238000000866 electrolytic etching Methods 0.000 description 8
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
- 239000007864 aqueous solution Substances 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 239000000463 material Substances 0.000 description 4
- 238000005498 polishing Methods 0.000 description 4
- 239000003513 alkali Substances 0.000 description 3
- 238000005238 degreasing Methods 0.000 description 3
- 238000005868 electrolysis reaction Methods 0.000 description 3
- 239000003792 electrolyte Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 235000011121 sodium hydroxide Nutrition 0.000 description 3
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- GGNQRNBDZQJCCN-UHFFFAOYSA-N benzene-1,2,4-triol Chemical compound OC1=CC=C(O)C(O)=C1 GGNQRNBDZQJCCN-UHFFFAOYSA-N 0.000 description 2
- 238000003486 chemical etching Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000011437 continuous method Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229920001477 hydrophilic polymer Polymers 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- -1 quinone diazide compound Chemical class 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- ZFCNOKDRWHSHNR-UHFFFAOYSA-N 3-[2-(2-carboxyethenyl)phenyl]prop-2-enoic acid Chemical compound OC(=O)C=CC1=CC=CC=C1C=CC(O)=O ZFCNOKDRWHSHNR-UHFFFAOYSA-N 0.000 description 1
- ZRDSGWXWQNSQAN-UHFFFAOYSA-N 6-diazo-n-phenylcyclohexa-2,4-dien-1-amine Chemical compound [N-]=[N+]=C1C=CC=CC1NC1=CC=CC=C1 ZRDSGWXWQNSQAN-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 241000723347 Cinnamomum Species 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- 241000221561 Ustilaginales Species 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 235000017803 cinnamon Nutrition 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 150000008049 diazo compounds Chemical class 0.000 description 1
- 239000012954 diazonium Substances 0.000 description 1
- 150000001989 diazonium salts Chemical class 0.000 description 1
- SOCTUWSJJQCPFX-UHFFFAOYSA-N dichromate(2-) Chemical compound [O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O SOCTUWSJJQCPFX-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 239000003350 kerosene Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 238000007645 offset printing Methods 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- OIPPWFOQEKKFEE-UHFFFAOYSA-N orcinol Chemical compound CC1=CC(O)=CC(O)=C1 OIPPWFOQEKKFEE-UHFFFAOYSA-N 0.000 description 1
- QCDYQQDYXPDABM-UHFFFAOYSA-N phloroglucinol Chemical compound OC1=CC(O)=CC(O)=C1 QCDYQQDYXPDABM-UHFFFAOYSA-N 0.000 description 1
- 229960001553 phloroglucinol Drugs 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000010186 staining Methods 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Description
本発明は、アルミニウム板またはアルミニウム
合金板からなる平版印刷版用支持体の製造法に関
するものである。詳しくは、親水性、保水性に優
れた表面を有し、しかも該アルミニウム板または
アルミニウム合金板上に設けられる感光層との接
着性が良好で、耐刷力に優れた平版印刷版用支持
体の製造法に関するものである。
従来、平版印刷版用支持体として使用されてい
るアルミニウム版は、印刷時における湿し水に対
する親水性、保水性や、その上に設けられる感光
層との接着性を改良するため、多くの場合機械的
研摩法、化学的エツチング法、電解エツチング法
等により粗面化(砂目立て)され使用されてい
る。
砂目立てされたアルミニウム板の表面形状(砂
目形状)は、印刷版としての製版性能、印刷性能
への寄与が大きく、その形状をコントロールする
ことは極めて重要である。
例えば、良好な画像再現性、解像力が要求され
る校正機用の印刷版支持体としては、比較的細か
く浅い凹み(ピツト)が緻密に存在する砂目形状
が適している。一方、優れた保水性や、高耐刷力
が要求される本機用印刷板支持体としては、ピツ
トの径が均一に揃つていて(ミクロ的に均一で)
しかも深い砂目形状が適している。
砂目立て法として、特に電解エツチング法は機
械的研摩法(ボール研摩、ブラシ研摩など)や化
学的エツチング法に比べて、比較的細かく浅い砂
目形状から、深くて均一な砂目形状まで作ること
が可能なため、近年、注目されている。
一般に、電解エツチング法では、適当な電解質
溶液にアルミニウム板を浸漬し、交流または直流
で電解することにより砂目立てを行なう。
電解質としては、塩酸が最もよく知られてい
る。しかし、塩酸を電解質として用いて電解エツ
チングすると、深い砂目で、しかも、ミクロ的形
状(例えば、顕微鏡等で100〜1200倍程度拡大し
て観察したときの形状。)の均一な砂目は得られ
難いため、特に本機用印刷版支持体として用いた
ときに、保水性や、現像時の非画像部となるべき
部分の感光層の抜け性は優れているが、画像部の
感光層の接着性や耐刷力の点では必ずしも満足す
るものは得られない。
本発明者らは、かかる点に留意して鋭意研究を
行なつた結果、電解液として塩酸とフエノール類
を含む水溶液を用いることにより、ビツト径が揃
いかつ、深いために保水性や耐刷力に優れた砂目
が得られることを見出し、本発明を完成するに到
つた。
すなわち、本発明の要旨とするところは、アル
ミニウム板またはアルミニウム合金板を、塩酸及
びフエノール類を含む電解溶液中で電解エツチン
グすることを特徴とする平版印刷版用支持体の製
造法に存する。
以下、本発明を詳細に説明するに、本発明方法
に適用されるアルミニウム板としては、純アルミ
ニウム板または、アルミニウムを主成分とする合
金板例えば、ケイ素、マグネシウム、鉄、銅、亜
鉛、マンガン、クロム等を含むアルミニウム合金
板が用いられる。
アルミニウム板またはアルミニウム合金板(以
下、単にアルミニウム板という。)の表面は、油
脂、サビ、ゴミなどにより汚染されているので、
電解エツチングに先立ちアルミニウム板を常法に
従つて、脱脂、洗浄を行なつておくのが望まし
い。例えば、トリクレン、シンナーなどによる溶
剤脱脂、ケロシンとトリエタノールアミンなどに
よるエマルジヨン脱脂、濃度1〜10%の苛性ソー
ダ水溶液に20〜70℃で5秒〜10分浸漬し、脱脂の
みでは除去できない汚れ、自然酸化皮膜を除去
し、次いで濃度10〜20%の硝酸または硫酸水溶液
に10〜50℃で5秒〜5分浸漬し、アルカリエツチ
ング後の中和およびスマツトの除去を行なう方法
等が挙げられる。
本発明において、アルミニウム板の電解エツチ
ングは塩酸及びフエノール類を含む電解溶液中で
行なわれる。
フエノール類を添加することにより、ピツトの
径が、均一に揃つた砂目が得られるが、かかるフ
エノール類としては、フエノール、クレゾール等
の1価フエノール類、カテコール、レゾルシン、
ヒドロキノン、オルシン等の2価フエノール、ピ
ロガロール、フロログルシン、ヒドロキシヒドロ
キノン等の3価フエノール等が挙げられる。特
に、カテコール、レゾルシン、ピロガロール等の
2価および3価のフエノールが好ましい。
本発明の電解溶液は、通常、塩酸3.5〜35g/
、好ましくは、7〜20g/及びフエノール類
0.01〜20g/、好ましくは、0.1〜15g/を
含有している。
塩酸濃度があまり高いと、スマツトが生成し易
く、マクロ的形状(肉眼観察したときの形状)が
不均一な砂目が出来易いことから、塩酸濃度は35
g/以下が好ましい。
一方塩酸濃度があまり低くなると、電解エツチ
ングにより生成するピツトがミクロ的に不均一と
なるので3.5g/以上が好ましい。
また、フエノール類の濃度があまり高いと、電
解時のエツジ効果が大きくなり、処理アルミニウ
ム板の中央部とエツジ部での砂目形状が不均一に
なり、更に、スマツトが多く発生するので、フエ
ノール類の濃度は20g/以下が好ましい。
一方、フエノール類の濃度があまり低すぎる
と、添加効果が十分得られないので、フエノール
類の濃度は0.01g/以上が好ましい。
電解液の温度は、通常10℃〜40℃程度である。
電流密度は所望する砂目深さにより適宜選択さ
れるが、通常20〜200A/dm2好ましくは50〜
150A/dm2程度である。
かかる条件下にアルミニウム板を電解エツチン
グすればピツトの径が、均一に揃つていて、か
つ、ピツトとピツトが互に十分接近していて平ら
な台地状の部分が、極めて少ない印刷板として良
好な砂目が得られる。
本発明法による電解エツチング法は、回分法、
連続法いずれでも実施することが出来る。連続法
は、例えばアルミニウム条を電解槽中に連続的に
通過させることにより行なわれる。
この様に電解エツチングしたアルミニウム板
は、必要に応じ常法に従つて、室温〜80℃のアル
カリまたは酸の水溶液に1〜5分浸漬することに
よつてデスマツトし次いで中和したのち、印刷版
用支持体に供される。印刷版用支持体に供するに
当り、常法に従つてアルミニウム板に陽極酸化を
施してもよいことは言うまでもない。具体的に
は、硫酸またはリン酸等の濃度10〜50%、の水溶
液で電流密度1〜10A/dm2で、電解することに
より行なわれる。陽極酸化後には、更に必要に応
じて熱水、ケイ酸塩、重クロム酸塩、酢酸塩、親
水性高分子化合物等で封孔または親水化処理を施
してもよい。
上述の如く処理して得られる本発明のアルミニ
ウム板に適用される感光性物質は特に限定される
ものではなく、公知の種々のものを使用すること
ができる。例えば、親水性ポリマーとジアゾニウ
ム塩からなる組成物、ジアゾジフエニルアミン等
のジアゾ化合物、キノンジアジド化合物とアルカ
リ可溶性樹脂との組成物、活性光線の照射により
二量化を起す不飽和カルボン酸、例えば、桂皮
酸、フエニレンジアクリル酸をその構成々分とす
るポリマー、活性光線の照射により重合反応を起
す化合物とバインダーポリマーとの組成物、アジ
ド化合物等が挙げられる。
上記感光性物質を種々の公知の添加剤と共に適
当な溶媒に溶解し、本発明のアルミニウム板に塗
布し、乾燥すれば感光性平版印刷版を製造するこ
とができる。この感光性平版印刷版用に被複写物
を重ねて、常法に従つて露光、現像すれば、親水
性および保水性に優れ、しかも、感光性物質から
なる画像部とアルミニウム板との接着性が極めて
強固で耐刷力に優れた印刷版を得ることができ
る。
次に、本発明を実施例により更に具体的に説明
するが、本発明は、その要旨を超えない限り以下
の実施例に限定されるものではない。
実施例1〜8および比較例1
厚さ0.3mmのアルミニウム板(材質1050、調質
H16)を3%苛性ソーダ水溶液中で、50℃1分間
浸漬し、アルカリ・エツチングを行なつたのち、
水洗した。さらに10%硝酸中に25℃1分間浸漬
し、中和、デスマツトを行なつたのち水洗した。
このアルミニウム板を表―1に示す条件で、電
解エツチングしたところ、比較例に比し、いずれ
も、ピツト径が均一に揃つた砂目板が得られた。
The present invention relates to a method for producing a lithographic printing plate support made of an aluminum plate or an aluminum alloy plate. Specifically, a support for a lithographic printing plate that has a surface with excellent hydrophilicity and water retention, has good adhesion to the photosensitive layer provided on the aluminum plate or aluminum alloy plate, and has excellent printing durability. This relates to a manufacturing method. Conventionally, aluminum plates, which have been used as supports for lithographic printing plates, are often used to improve their hydrophilicity and water retention for dampening water during printing, as well as their adhesion to the photosensitive layer provided thereon. It is used after being roughened (grained) by mechanical polishing, chemical etching, electrolytic etching, etc. The surface shape (grain shape) of a grained aluminum plate greatly contributes to the plate-making performance and printing performance of a printing plate, and it is extremely important to control the shape. For example, as a printing plate support for a proofing machine that requires good image reproducibility and resolution, a grained support in which relatively fine and shallow pits are densely present is suitable. On the other hand, the printing plate support for this machine, which requires excellent water retention and high printing durability, has pits with uniform diameters (microscopically uniform).
Moreover, a deep grain shape is suitable. As a graining method, the electrolytic etching method in particular is more effective than mechanical polishing methods (ball polishing, brush polishing, etc.) or chemical etching methods, in that it can produce anything from a relatively fine and shallow grain shape to a deep and uniform grain shape. It has attracted attention in recent years because it is possible. Generally, in the electrolytic etching method, an aluminum plate is immersed in a suitable electrolyte solution and subjected to electrolysis with alternating current or direct current to perform graining. Hydrochloric acid is the most well-known electrolyte. However, when electrolytically etching is performed using hydrochloric acid as an electrolyte, it is possible to obtain deep grains and uniform microscopic grains (for example, the shape when observed with a microscope, etc., at a magnification of 100 to 1200 times). Therefore, when used as a printing plate support for this machine, it has excellent water retention and release properties of the photosensitive layer in areas that should be non-image areas during development, but it is difficult to remove the photosensitive layer in image areas. It is not always possible to obtain satisfactory adhesiveness and printing durability. The inventors of the present invention have carried out extensive research with these points in mind, and have found that by using an aqueous solution containing hydrochloric acid and phenols as the electrolyte, the bit diameter is uniform and deep, which improves water retention and printing durability. The present inventors have discovered that excellent grain can be obtained, and have completed the present invention. That is, the gist of the present invention resides in a method for producing a support for a lithographic printing plate, which comprises electrolytically etching an aluminum plate or an aluminum alloy plate in an electrolytic solution containing hydrochloric acid and phenols. Hereinafter, the present invention will be described in detail. As the aluminum plate applied to the method of the present invention, a pure aluminum plate or an alloy plate mainly composed of aluminum, such as silicon, magnesium, iron, copper, zinc, manganese, An aluminum alloy plate containing chromium or the like is used. The surface of aluminum plates or aluminum alloy plates (hereinafter simply referred to as aluminum plates) is contaminated with oil, rust, dirt, etc.
Prior to electrolytic etching, it is desirable to degrease and wash the aluminum plate in a conventional manner. For example, solvent degreasing with Triclean, thinner, etc., emulsion degreasing with kerosene and triethanolamine, etc., immersion in a caustic soda aqueous solution with a concentration of 1 to 10% at 20 to 70°C for 5 seconds to 10 minutes, and stains that cannot be removed by degreasing alone. Examples include a method in which the oxide film is removed, and then immersed in an aqueous solution of nitric acid or sulfuric acid with a concentration of 10 to 20% at 10 to 50°C for 5 seconds to 5 minutes to neutralize and remove smut after alkali etching. In the present invention, electrolytic etching of an aluminum plate is carried out in an electrolytic solution containing hydrochloric acid and phenols. By adding phenols, grains with uniform pit diameters can be obtained. Examples of such phenols include phenol, monovalent phenols such as cresol, catechol, resorcinol,
Examples include divalent phenols such as hydroquinone and orcine, and trivalent phenols such as pyrogallol, phloroglucin, and hydroxyhydroquinone. Particularly preferred are divalent and trivalent phenols such as catechol, resorcinol, and pyrogallol. The electrolytic solution of the present invention usually contains 3.5 to 35 g of hydrochloric acid/
, preferably 7 to 20 g/and phenols
It contains 0.01-20g/, preferably 0.1-15g/. If the hydrochloric acid concentration is too high, smuts are likely to form and grains with an uneven macroscopic shape (shape when observed with the naked eye) are likely to be formed.
g/or less is preferable. On the other hand, if the hydrochloric acid concentration is too low, the pits formed by electrolytic etching will become microscopically non-uniform, so it is preferably 3.5 g/or more. In addition, if the concentration of phenols is too high, the edge effect during electrolysis will become large, and the shape of grains in the center and edges of the treated aluminum plate will become uneven, and moreover, a lot of smut will occur, so phenols The concentration of these substances is preferably 20g/or less. On the other hand, if the concentration of phenols is too low, the effect of addition cannot be obtained sufficiently, so the concentration of phenols is preferably 0.01 g/or more. The temperature of the electrolytic solution is usually about 10°C to 40°C. The current density is appropriately selected depending on the desired grain depth, but is usually 20 to 200 A/dm2, preferably 50 to 200 A/ dm2 .
It is about 150A/dm2. If an aluminum plate is electrolytically etched under such conditions, the diameter of the pits will be uniform, the pits will be close enough to each other, and there will be very few flat plateau-like parts, making it a good printing plate. A grain of sand is obtained. The electrolytic etching method according to the present invention is a batch method,
Any continuous method can be used. A continuous method is carried out, for example, by passing an aluminum strip continuously through an electrolytic cell. The aluminum plate electrolytically etched in this way is desmatted by immersing it in an aqueous alkali or acid solution at room temperature to 80°C for 1 to 5 minutes according to a conventional method as required, and then neutralized. Used as a support for It goes without saying that the aluminum plate may be anodized in a conventional manner when used as a support for a printing plate. Specifically, electrolysis is carried out using an aqueous solution of sulfuric acid or phosphoric acid with a concentration of 10 to 50% at a current density of 1 to 10 A/dm 2 . After the anodic oxidation, sealing or hydrophilic treatment may be performed using hot water, silicate, dichromate, acetate, hydrophilic polymer compound, etc., if necessary. The photosensitive material applied to the aluminum plate of the present invention obtained by the treatment as described above is not particularly limited, and various known materials can be used. For example, compositions consisting of a hydrophilic polymer and a diazonium salt, diazo compounds such as diazodiphenylamine, compositions of a quinone diazide compound and an alkali-soluble resin, unsaturated carboxylic acids that dimerize upon irradiation with actinic rays, such as cinnamon Examples thereof include acids, polymers whose constituent components are phenylene diacrylic acid, compositions of a binder polymer and a compound that causes a polymerization reaction upon irradiation with actinic rays, and azide compounds. A photosensitive lithographic printing plate can be produced by dissolving the above photosensitive substance together with various known additives in a suitable solvent, applying the solution to the aluminum plate of the present invention, and drying it. If the photosensitive lithographic printing plate is overlaid with copies, exposed and developed according to the conventional method, it will have excellent hydrophilicity and water retention, and will also have good adhesion between the image area made of photosensitive material and the aluminum plate. It is possible to obtain a printing plate that is extremely strong and has excellent printing durability. Next, the present invention will be explained in more detail with reference to examples, but the present invention is not limited to the following examples unless it exceeds the gist thereof. Examples 1 to 8 and Comparative Example 1 0.3 mm thick aluminum plate (material 1050, tempered
H16) was immersed in a 3% caustic soda aqueous solution at 50°C for 1 minute to perform alkali etching.
Washed with water. Further, it was immersed in 10% nitric acid at 25° C. for 1 minute to neutralize and desaturate, and then washed with water. When this aluminum plate was electrolytically etched under the conditions shown in Table 1, grained plates with uniform pit diameters were obtained in all cases compared to the comparative example.
【表】【table】
【表】
実施例 9
実施例8および比較例1に従つて電解エツチン
グ砂目板を引続き5%苛性ソーダ溶液中で60℃10
秒間のデスマツト処理をしたのち、中和、水洗し
た。さらに20%硫酸溶液中で20℃3A/dm21分
間陽極酸化したのち、o―キノンジアジド系感光
液を塗布し感光性平版印刷版を作成した。この感
光性印刷版に、ポジ型フイルムを用い露光、現像
を行ない、印刷版を得、オフセツト印刷に用い
た。その結果、実施例8のアルミニウム板を使用
して作成した印刷版は、親水性、保水性に優れ汚
れにくく、15万部印刷した後も、版はまだ印刷可
能の状態であつた。一方、比較例1のアルミニウ
ム板を使用して作成した印刷版は、10万部印刷し
たところで、画像部にインキ着肉不良を生じた。
実施例9、10及び比較例2
実施例8で得られた感光性平版印刷版の製造工
程中、電解エツチングの電解液に使用したピロガ
ロール5g/の代りにピロガロール0.05モル/
、カテコール0.05モル/、及び酒石酸0.1モ
ル/をそれぞれ使用した以外は全く同様にして
得られた感光性平版印刷版の計3種を用いてポジ
型フイルムによる画像露光後、現像を行つて3種
の印刷版を得た。
これらを摩擦堅牢度試験機(大栄科学精器製作
所製)を用い、荷重200g、500回擦過にて残存感
光層の耐摩耗性(原版状態を100%とする。)を測
定した結果は表2の通りであつた。[Table] Example 9 Electrolytically etched grained plates according to Example 8 and Comparative Example 1 were subsequently heated at 60°C in a 5% caustic soda solution.
After desmatting for seconds, it was neutralized and washed with water. After further anodic oxidation in a 20% sulfuric acid solution at 20° C. and 3 A/dm 2 for 1 minute, an o-quinonediazide based photosensitive solution was applied to prepare a photosensitive lithographic printing plate. This photosensitive printing plate was exposed and developed using a positive film to obtain a printing plate, which was used for offset printing. As a result, the printing plate made using the aluminum plate of Example 8 had excellent hydrophilicity and water retention, was resistant to staining, and was still in a printable state even after printing 150,000 copies. On the other hand, the printing plate made using the aluminum plate of Comparative Example 1 showed poor ink adhesion in the image area after 100,000 copies were printed. Examples 9 and 10 and Comparative Example 2 During the manufacturing process of the photosensitive lithographic printing plate obtained in Example 8, 0.05 mole of pyrogallol was added in place of 5 g of pyrogallol used in the electrolytic solution for electrolytic etching.
A total of three types of photosensitive lithographic printing plates obtained in exactly the same manner except that 0.05 mol/mol of catechol and 0.1 mol/mol/tartaric acid were used, respectively, were imaged with a positive film and developed. Obtained a printed version of. Using a friction fastness tester (manufactured by Daiei Kagaku Seiki Seisakusho), the abrasion resistance of the remaining photosensitive layer was measured by rubbing 500 times at a load of 200g (the original state is 100%).The results are shown in Table 2. It was hot on the street.
【表】
この結果から本願発明は少くとも感光層と支持
体との接着性において電解液に他の添加成分を使
用する場合より、著しく優れていることがわか
る。[Table] From the results, it can be seen that the present invention is significantly superior to the case where other additive components are used in the electrolytic solution, at least in terms of adhesion between the photosensitive layer and the support.
Claims (1)
を、塩酸及びフエノール類を含む電解溶液中で電
解エツチングすることを特徴とする平版印刷版用
支持体の製造法。 2 電解溶液が、塩酸3.5〜35g/及びフエノ
ール類0.1〜15g/を含む特許請求の範囲第1
項記載の方法。 3 フエノール類が、カテコール、レゾルシンま
たはピロガロールである特許請求の範囲第1項記
載の方法。[Scope of Claims] 1. A method for producing a support for a lithographic printing plate, which comprises electrolytically etching an aluminum plate or an aluminum alloy plate in an electrolytic solution containing hydrochloric acid and phenols. 2 Claim 1 in which the electrolytic solution contains 3.5 to 35 g of hydrochloric acid and 0.1 to 15 g of phenols
The method described in section. 3. The method according to claim 1, wherein the phenol is catechol, resorcinol, or pyrogallol.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9824880A JPS5724295A (en) | 1980-07-18 | 1980-07-18 | Production of support for planographic printing plate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9824880A JPS5724295A (en) | 1980-07-18 | 1980-07-18 | Production of support for planographic printing plate |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5724295A JPS5724295A (en) | 1982-02-08 |
JPH0132795B2 true JPH0132795B2 (en) | 1989-07-10 |
Family
ID=14214647
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9824880A Granted JPS5724295A (en) | 1980-07-18 | 1980-07-18 | Production of support for planographic printing plate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5724295A (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10835373B2 (en) | 2002-12-12 | 2020-11-17 | Alcon Inc. | Accommodating intraocular lenses and methods of use |
US8968396B2 (en) | 2007-07-23 | 2015-03-03 | Powervision, Inc. | Intraocular lens delivery systems and methods of use |
WO2012006616A2 (en) | 2010-07-09 | 2012-01-12 | Powervision, Inc. | Intraocular lens delivery devices and methods of use |
WO2014145562A1 (en) | 2013-03-15 | 2014-09-18 | Powervision, Inc. | Intraocular lens storage and loading devices and methods of use |
EP4041131A4 (en) | 2019-10-04 | 2023-11-15 | Alcon Inc. | Adjustable intraocular lenses and methods of post-operatively adjusting intraocular lenses |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52133840A (en) * | 1976-05-04 | 1977-11-09 | Sumitomo Light Metal Ind | Method of producing aluminum plates for offset printing |
JPS5370053A (en) * | 1976-12-02 | 1978-06-22 | Polychrome Corp | Electrolytic graining method of aluminium sheet |
-
1980
- 1980-07-18 JP JP9824880A patent/JPS5724295A/en active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52133840A (en) * | 1976-05-04 | 1977-11-09 | Sumitomo Light Metal Ind | Method of producing aluminum plates for offset printing |
JPS5370053A (en) * | 1976-12-02 | 1978-06-22 | Polychrome Corp | Electrolytic graining method of aluminium sheet |
Also Published As
Publication number | Publication date |
---|---|
JPS5724295A (en) | 1982-02-08 |
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