JPH01314782A - Modification of silk - Google Patents
Modification of silkInfo
- Publication number
- JPH01314782A JPH01314782A JP14091888A JP14091888A JPH01314782A JP H01314782 A JPH01314782 A JP H01314782A JP 14091888 A JP14091888 A JP 14091888A JP 14091888 A JP14091888 A JP 14091888A JP H01314782 A JPH01314782 A JP H01314782A
- Authority
- JP
- Japan
- Prior art keywords
- silk
- chitin
- hydrophilic
- acid
- resistance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000012986 modification Methods 0.000 title claims 2
- 230000004048 modification Effects 0.000 title claims 2
- 229920002101 Chitin Polymers 0.000 claims abstract description 54
- 239000000178 monomer Substances 0.000 claims abstract description 18
- HJIAMFHSAAEUKR-UHFFFAOYSA-N ortho-hydroxybenzophenone Natural products OC1=CC=CC=C1C(=O)C1=CC=CC=C1 HJIAMFHSAAEUKR-UHFFFAOYSA-N 0.000 claims abstract description 13
- 238000000034 method Methods 0.000 claims description 17
- 239000003999 initiator Substances 0.000 claims description 8
- 239000000203 mixture Substances 0.000 claims description 7
- 230000000379 polymerizing effect Effects 0.000 claims description 4
- 238000012545 processing Methods 0.000 claims description 3
- -1 2-hydroxybenzophenone compound Chemical class 0.000 abstract description 5
- 239000000835 fiber Substances 0.000 abstract description 5
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 abstract description 4
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 abstract description 4
- 238000006116 polymerization reaction Methods 0.000 abstract description 4
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 abstract description 2
- 230000002542 deteriorative effect Effects 0.000 abstract 1
- 239000004744 fabric Substances 0.000 description 22
- 230000037303 wrinkles Effects 0.000 description 20
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 16
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 12
- 239000000243 solution Substances 0.000 description 8
- 230000006196 deacetylation Effects 0.000 description 7
- 238000003381 deacetylation reaction Methods 0.000 description 7
- 239000007788 liquid Substances 0.000 description 7
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- 239000007864 aqueous solution Substances 0.000 description 6
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 6
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 6
- 238000003672 processing method Methods 0.000 description 6
- 229920005989 resin Polymers 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- 238000004383 yellowing Methods 0.000 description 5
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 4
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 4
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 4
- 235000011054 acetic acid Nutrition 0.000 description 4
- 230000002378 acidificating effect Effects 0.000 description 4
- 125000002057 carboxymethyl group Chemical group [H]OC(=O)C([H])([H])[*] 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000002474 experimental method Methods 0.000 description 4
- CXVGEDCSTKKODG-UHFFFAOYSA-N sulisobenzone Chemical compound C1=C(S(O)(=O)=O)C(OC)=CC(O)=C1C(=O)C1=CC=CC=C1 CXVGEDCSTKKODG-UHFFFAOYSA-N 0.000 description 4
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 3
- 102100026735 Coagulation factor VIII Human genes 0.000 description 3
- 239000004593 Epoxy Substances 0.000 description 3
- 101000911390 Homo sapiens Coagulation factor VIII Proteins 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 3
- 125000003368 amide group Chemical group 0.000 description 3
- 150000002170 ethers Chemical class 0.000 description 3
- 235000019253 formic acid Nutrition 0.000 description 3
- 230000007935 neutral effect Effects 0.000 description 3
- 238000010526 radical polymerization reaction Methods 0.000 description 3
- 229920002818 (Hydroxyethyl)methacrylate Polymers 0.000 description 2
- TUSDEZXZIZRFGC-UHFFFAOYSA-N 1-O-galloyl-3,6-(R)-HHDP-beta-D-glucose Natural products OC1C(O2)COC(=O)C3=CC(O)=C(O)C(O)=C3C3=C(O)C(O)=C(O)C=C3C(=O)OC1C(O)C2OC(=O)C1=CC(O)=C(O)C(O)=C1 TUSDEZXZIZRFGC-UHFFFAOYSA-N 0.000 description 2
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 2
- QZPSOSOOLFHYRR-UHFFFAOYSA-N 3-hydroxypropyl prop-2-enoate Chemical compound OCCCOC(=O)C=C QZPSOSOOLFHYRR-UHFFFAOYSA-N 0.000 description 2
- DBCAQXHNJOFNGC-UHFFFAOYSA-N 4-bromo-1,1,1-trifluorobutane Chemical compound FC(F)(F)CCCBr DBCAQXHNJOFNGC-UHFFFAOYSA-N 0.000 description 2
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 2
- 239000001263 FEMA 3042 Substances 0.000 description 2
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 2
- LRBQNJMCXXYXIU-PPKXGCFTSA-N Penta-digallate-beta-D-glucose Natural products OC1=C(O)C(O)=CC(C(=O)OC=2C(=C(O)C=C(C=2)C(=O)OC[C@@H]2[C@H]([C@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)O2)OC(=O)C=2C=C(OC(=O)C=3C=C(O)C(O)=C(O)C=3)C(O)=C(O)C=2)O)=C1 LRBQNJMCXXYXIU-PPKXGCFTSA-N 0.000 description 2
- LCTONWCANYUPML-UHFFFAOYSA-N Pyruvic acid Chemical compound CC(=O)C(O)=O LCTONWCANYUPML-UHFFFAOYSA-N 0.000 description 2
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- 239000012736 aqueous medium Substances 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- IQIJRJNHZYUQSD-UHFFFAOYSA-N ethenyl(phenyl)diazene Chemical compound C=CN=NC1=CC=CC=C1 IQIJRJNHZYUQSD-UHFFFAOYSA-N 0.000 description 2
- STVZJERGLQHEKB-UHFFFAOYSA-N ethylene glycol dimethacrylate Substances CC(=C)C(=O)OCCOC(=O)C(C)=C STVZJERGLQHEKB-UHFFFAOYSA-N 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- IVJISJACKSSFGE-UHFFFAOYSA-N formaldehyde;1,3,5-triazine-2,4,6-triamine Chemical compound O=C.NC1=NC(N)=NC(N)=N1 IVJISJACKSSFGE-UHFFFAOYSA-N 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 230000000977 initiatory effect Effects 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 150000005846 sugar alcohols Polymers 0.000 description 2
- 229920002258 tannic acid Polymers 0.000 description 2
- LRBQNJMCXXYXIU-NRMVVENXSA-N tannic acid Chemical compound OC1=C(O)C(O)=CC(C(=O)OC=2C(=C(O)C=C(C=2)C(=O)OC[C@@H]2[C@H]([C@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)O2)OC(=O)C=2C=C(OC(=O)C=3C=C(O)C(O)=C(O)C=3)C(O)=C(O)C=2)O)=C1 LRBQNJMCXXYXIU-NRMVVENXSA-N 0.000 description 2
- 235000015523 tannic acid Nutrition 0.000 description 2
- 229940033123 tannic acid Drugs 0.000 description 2
- TXUICONDJPYNPY-UHFFFAOYSA-N (1,10,13-trimethyl-3-oxo-4,5,6,7,8,9,11,12,14,15,16,17-dodecahydrocyclopenta[a]phenanthren-17-yl) heptanoate Chemical compound C1CC2CC(=O)C=C(C)C2(C)C2C1C1CCC(OC(=O)CCCCCC)C1(C)CC2 TXUICONDJPYNPY-UHFFFAOYSA-N 0.000 description 1
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 1
- ZXDDPOHVAMWLBH-UHFFFAOYSA-N 2,4-Dihydroxybenzophenone Chemical compound OC1=CC(O)=CC=C1C(=O)C1=CC=CC=C1 ZXDDPOHVAMWLBH-UHFFFAOYSA-N 0.000 description 1
- ARKDCHXUGNPHJU-UHFFFAOYSA-N 2,7-dimethylocta-2,6-dienediamide Chemical compound NC(=O)C(C)=CCCC=C(C)C(N)=O ARKDCHXUGNPHJU-UHFFFAOYSA-N 0.000 description 1
- GNSFRPWPOGYVLO-UHFFFAOYSA-N 3-hydroxypropyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCO GNSFRPWPOGYVLO-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- YXCGQNYTCLWIIL-UHFFFAOYSA-N CCC(CO)(CO)CO.Cl.Cl.Cl Chemical compound CCC(CO)(CO)CO.Cl.Cl.Cl YXCGQNYTCLWIIL-UHFFFAOYSA-N 0.000 description 1
- 150000000703 Cerium Chemical class 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- 108010022355 Fibroins Proteins 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- FQYUMYWMJTYZTK-UHFFFAOYSA-N Phenyl glycidyl ether Chemical compound C1OC1COC1=CC=CC=C1 FQYUMYWMJTYZTK-UHFFFAOYSA-N 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- 229910021626 Tin(II) chloride Inorganic materials 0.000 description 1
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000005011 alkyl ether group Chemical group 0.000 description 1
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 1
- 150000001413 amino acids Chemical class 0.000 description 1
- 235000011114 ammonium hydroxide Nutrition 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 150000008366 benzophenones Chemical class 0.000 description 1
- 229920001222 biopolymer Polymers 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 125000003262 carboxylic acid ester group Chemical group [H]C([H])([*:2])OC(=O)C([H])([H])[*:1] 0.000 description 1
- 125000002843 carboxylic acid group Chemical group 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- FOCAUTSVDIKZOP-UHFFFAOYSA-N chloroacetic acid Chemical compound OC(=O)CCl FOCAUTSVDIKZOP-UHFFFAOYSA-N 0.000 description 1
- 229940106681 chloroacetic acid Drugs 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 229920000578 graft copolymer Polymers 0.000 description 1
- 238000010559 graft polymerization reaction Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-M hydrosulfide Chemical compound [SH-] RWSOTUBLDIXVET-UHFFFAOYSA-M 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 159000000014 iron salts Chemical class 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- 229940046892 lead acetate Drugs 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 1
- 235000019341 magnesium sulphate Nutrition 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 239000001630 malic acid Substances 0.000 description 1
- 235000011090 malic acid Nutrition 0.000 description 1
- CXHHBNMLPJOKQD-UHFFFAOYSA-N methyl hydrogen carbonate Chemical class COC(O)=O CXHHBNMLPJOKQD-UHFFFAOYSA-N 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- DXGLGDHPHMLXJC-UHFFFAOYSA-N oxybenzone Chemical compound OC1=CC(OC)=CC=C1C(=O)C1=CC=CC=C1 DXGLGDHPHMLXJC-UHFFFAOYSA-N 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- JRKICGRDRMAZLK-UHFFFAOYSA-L persulfate group Chemical group S(=O)(=O)([O-])OOS(=O)(=O)[O-] JRKICGRDRMAZLK-UHFFFAOYSA-L 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920001184 polypeptide Polymers 0.000 description 1
- 102000004196 processed proteins & peptides Human genes 0.000 description 1
- 108090000765 processed proteins & peptides Proteins 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- 108090000623 proteins and genes Proteins 0.000 description 1
- 102000004169 proteins and genes Human genes 0.000 description 1
- 229940107700 pyruvic acid Drugs 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 230000001953 sensory effect Effects 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000001119 stannous chloride Substances 0.000 description 1
- 235000011150 stannous chloride Nutrition 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000002604 ultrasonography Methods 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Treatments For Attaching Organic Compounds To Fibrous Goods (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は優れた風合い、防しわ性、耐光性などを絹に付
与することのできる絹の改質加工法に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a method for modifying silk that can impart excellent texture, wrinkle resistance, light resistance, etc. to silk.
[従来の技術]
絹は本来優れた柔軟性やドレープ性を有しているが、防
しわ性のほか、耐光性、風合いに劣ることが知られてい
る。[Prior Art] Although silk inherently has excellent flexibility and drapability, it is known to be inferior in wrinkle resistance, light fastness, and texture.
防しわ性、耐光性を改善するために従来よりつぎのよう
な加工法が採用されている。Conventionally, the following processing methods have been employed to improve wrinkle resistance and light resistance.
(1)メラミンホルマリン樹脂、尿素ホルマリン樹脂、
エポキシ樹脂などにより樹脂加工する方法。(1) Melamine formalin resin, urea formalin resin,
A method of resin processing using epoxy resin, etc.
(2)塩化第2スズ、タンニン酸、硫酸マグネシウム、
塩基性酢酸鉛などで処理する方法。(2) stannous chloride, tannic acid, magnesium sulfate,
A method of treatment with basic lead acetate, etc.
また、風合いを改善するための加工法としては、
(3)アクリロニトリル、メタクリル酸メチル、スチレ
ンなどの非親水性ビニルモノマーをグラフト重合する加
工法、
(4)ヒドロキシエチルアクリレートまたはメタクリレ
ート、あるいはヒドロキシプロピルアクリレートまたは
メタクリレート、アクリルアミド、メタクリルアミドな
どの親水性アクリル系ラジカル重合性モノマーを使用し
、ラジカル開始剤でこれらのモノマーを絹にグラフト重
合する加工法(特公昭4[1−28684号公報)など
が提案されている。In addition, processing methods for improving the texture include (3) a processing method of graft polymerizing non-hydrophilic vinyl monomers such as acrylonitrile, methyl methacrylate, and styrene; (4) hydroxyethyl acrylate, methacrylate, or hydroxypropyl acrylate. Alternatively, a processing method has been proposed in which hydrophilic acrylic radically polymerizable monomers such as methacrylate, acrylamide, and methacrylamide are used and these monomers are graft-polymerized onto silk using a radical initiator (Japanese Patent Publication No. 4 [1-28684]). has been done.
特に親水性アクリル系ラジカル重合性モノマーの単独ま
たは混合物、あるいはエチレングリコールジメタクリレ
ートやエチレンビスアクリルアミドなとの多官能性ラジ
カル重合性モノマーを絹にラジカルグラフト重合させる
と絹の風合いか著しく改善されることも知られている。In particular, when silk is subjected to radical graft polymerization of hydrophilic acrylic radically polymerizable monomers alone or in combination, or polyfunctional radically polymerizable monomers such as ethylene glycol dimethacrylate and ethylene bisacrylamide, the texture of silk is significantly improved. is also known.
[発明が解決しようとする課!]
しかし、(1)または(2)の加工法で防しわ性や耐光
性を改善しようとすると風合いが悪化し、(3)〜(4
)の加工法で風合いを高めようとすると防しわ性や耐光
性か改善できない。[The problem that the invention tries to solve! ] However, when trying to improve wrinkle resistance and light resistance using processing methods (1) or (2), the texture deteriorates, and (3) to (4)
) If you try to improve the texture using the processing method mentioned above, you will not be able to improve the wrinkle resistance or light fastness.
本発明は防しわ性や耐光性と同時に風合いをも改善でき
る絹の改質加工法を提供することを目的とするものであ
る。The object of the present invention is to provide a method for modifying silk that can improve wrinkle resistance and light resistance as well as texture.
[課題を解決するための手段]
すなわち本発明は、絹を親水性キチン質で処理すること
を特徴とする絹の改質加工法に関する。[Means for Solving the Problems] That is, the present invention relates to a method for modifying silk, which is characterized by treating silk with hydrophilic chitin.
[作 用]
本発明の方法によって絹の防しわ性、耐光性と風合いと
が同時に改善される理由は未だ明らかではないが、親水
性キチン質は生体高分子であって、タンパク質繊維であ
る絹分子中の各種アミノ酸のポリペプチド結合体に対す
る吸着力が強いため、絹のフィブロイン中に取り込まれ
、親水性キチン質分子中の数多くの多価アルコール基の
水素結合によって生じた形体固定性が風合いや防しわ性
などを改善しているものと推察される。[Function] Although it is not yet clear why the method of the present invention improves the wrinkle resistance, light resistance, and texture of silk at the same time, hydrophilic chitin is a biopolymer and protein fibers such as silk Due to the strong adsorption power of various amino acids in the molecule to the polypeptide conjugate, it is incorporated into the silk fibroin, and the shape fixation caused by the hydrogen bonds of the numerous polyhydric alcohol groups in the hydrophilic chitinous molecules improves the texture and texture. It is presumed that it improves wrinkle resistance.
[好ましい実施態様コ
本発明で用いる親水性キチン質とは、キチンを化学処理
して親水性を付与したものであって、キチンのアセチル
基をアルカリで処理してえられる脱アセチル化度が60
%以上、特に80〜100%の脱アセチル化物(脱アセ
チル化キチン)、あるいはキチンまたは脱アセチル化度
の異なる各種脱アセチル化キチンをアルカリ共存下でク
ロル酢酸、クロル酢酸エステルなどで処理してえられる
カルボキシメチルキチンエーテル塩、カルボキシメチル
アルキルエステルキチンエーテル、カルボキシメチル脱
アセチル化キチンエーテル塩、カルボキシメチルアルキ
ルエステル脱アセチル化キチンエーテル、あるいはキチ
ンまたは脱アセチル化キチンのカルボキシルメチルアル
キルエステルを加水分解してえられるキチンまたは脱ア
セチル化キチンのカルボキシメチルエーテル類、脱アセ
チル化キチンの有機酸塩などの1種または2種以上があ
げられる。分子量は1〜50万程度か適当であり、小さ
すぎると効果が少なく、大きすぎると絹本来の性質を損
なう。[Preferred Embodiment] The hydrophilic chitin used in the present invention is chitin that has been chemically treated to impart hydrophilicity, and the degree of deacetylation obtained by treating the acetyl groups of chitin with an alkali is 60.
% or more, especially 80 to 100% deacetylated products (deacetylated chitin), or chitin or various deacetylated chitins with different degrees of deacetylation are treated with chloroacetic acid, chloroacetic ester, etc. in the coexistence of an alkali. hydrolyzed carboxymethyl chitin ether salt, carboxymethyl alkyl ester chitin ether, carboxymethyl deacetylated chitin ether salt, carboxymethyl alkyl ester deacetylated chitin ether, or carboxymethyl alkyl ester of chitin or deacetylated chitin. Examples include one or more carboxymethyl ethers of chitin or deacetylated chitin that can be obtained, organic acid salts of deacetylated chitin, and the like. The molecular weight is approximately 10,000 to 500,000, which is appropriate; if it is too small, the effect will be low, and if it is too large, the inherent properties of silk will be impaired.
親水性キチン質による絹の処理は、親水性キチン質の水
性液に浸漬させるか、噴霧あるいは塗装などの方法によ
って行なえばよい。親水性キチン質の水性液の調製は親
水性キチン質を水または水性液に溶解すればよい。親水
性キチン質のなかには中性水に溶解しにくいものもある
が、そのばあい、水性液に酸を添加して酸性にしてやれ
ばよい。たとえばカルボキシメチルキチンエーテル塩は
中性水に溶け、脱アセチル化度が80%以上の脱アセチ
ル化キチンは酸性水に溶ける。また、カルボキシメチル
脱アセチル化キチンエーテルは中性水に溶けて酸性にな
るので、他の脱アセチル化キチンはこの水溶液に溶解す
る。水性液としては水とアルコール類、エステル類、ケ
トン類、N−メチルピロリドンなどとの混合液があげら
れる。親水性キチン質を水性液に溶解させるばあいに必
要に応じて添加される酸としては種々のものが使用でき
るが、たとえばギ酸、酢酸、プロピオン酸、乳酸、リン
ゴ酸、マロン酸、ピルビン酸、アジピン酸、コハク酸、
ンユウ酸、クエン酸、酒石酸などの各種有機酸または塩
酸や硝酸などの無機酸などがあげられる。酸性度は通常
pH6〜3程度である。Silk may be treated with hydrophilic chitin by immersion in an aqueous solution of hydrophilic chitin, spraying, painting, or the like. An aqueous liquid of hydrophilic chitin can be prepared by dissolving hydrophilic chitin in water or an aqueous liquid. Some hydrophilic chitin substances are difficult to dissolve in neutral water, but in that case, acid can be added to the aqueous liquid to make it acidic. For example, carboxymethyl chitin ether salt is soluble in neutral water, and deacetylated chitin with a degree of deacetylation of 80% or more is soluble in acidic water. Furthermore, since carboxymethyl deacetylated chitin ether dissolves in neutral water and becomes acidic, other deacetylated chitins dissolve in this aqueous solution. Examples of the aqueous liquid include liquid mixtures of water and alcohols, esters, ketones, N-methylpyrrolidone, and the like. When dissolving hydrophilic chitin in an aqueous liquid, a variety of acids can be used as needed, including formic acid, acetic acid, propionic acid, lactic acid, malic acid, malonic acid, pyruvic acid, Adipic acid, succinic acid,
Examples include various organic acids such as citric acid, citric acid, and tartaric acid, and inorganic acids such as hydrochloric acid and nitric acid. Acidity is usually about pH 6 to 3.
処理温度は室温でよく、浸漬処理のばあいは通常10〜
200分間浸漬すればよい。The treatment temperature may be room temperature, and in the case of immersion treatment, it is usually 10~
It may be immersed for 200 minutes.
対象とする絹は、未加工絹でもメラミンホルマリン樹脂
、尿素ホルマリン樹脂、エポキシ樹脂などで加工した絹
、−タンニン酸や各種塩で処理した絹、非親水性または
親水性の単重合性あるいは多重合性モノマーをグラフト
重合させた絹でもよい。The target silks are unprocessed silk, silk processed with melamine-formalin resin, urea-formalin resin, epoxy resin, etc., silk treated with tannic acid or various salts, and non-hydrophilic or hydrophilic monopolymerized or multipolymerized silk. It may also be silk that has been graft-polymerized with a monomer.
親水性キチン質は絹1gに対して0.005〜0.5g
1特に 0.02〜0.1gとするのが好ましい。Hydrophilic chitin is 0.005-0.5g per 1g of silk.
1, particularly preferably from 0.02 to 0.1 g.
少なすぎれば効果がなく、多すぎれば絹本来の性質を低
下させる。水性媒体の量は絹1gに対して1〜10g稈
度が適当である。Too little will have no effect, and too much will reduce the original properties of silk. The appropriate amount of the aqueous medium is 1 to 10 g of culm per 1 g of silk.
本発明は、さらに親水性キチン質に加えて親水性基で核
置換された2−ヒドロキシベンゾフェノン類で絹を処理
する方法にも関する。The present invention further relates to a method for treating silk with 2-hydroxybenzophenones which are nuclear-substituted with hydrophilic groups in addition to hydrophilic chitin.
本発明者らは絹の黄変についても研究を重ね、絹の黄変
を促進する光は波長が290〜40Or+mの紫外線で
あることを見出し、その波長の紫外線を吸収することが
知られている酸化防止剤の2−ヒドロキシベンゾフェノ
ン類に着目し、さらに親水性キチン質水溶液に適合させ
るために2−ヒドロキシベンゾフェノン類を親水性基で
核置換させた。The present inventors have also conducted extensive research on the yellowing of silk, and have discovered that the light that promotes the yellowing of silk is ultraviolet rays with a wavelength of 290 to 40 Or+m, and it is known that ultraviolet rays of that wavelength are absorbed. Focusing on 2-hydroxybenzophenones, which are antioxidants, we carried out nuclear substitution of 2-hydroxybenzophenones with hydrophilic groups in order to make them compatible with hydrophilic chitinous aqueous solutions.
本発明で用いる親水性基で核置換した2−ヒドロキシベ
ンゾフェノン類とは、2−ヒドロキシベンゾフェノンの
芳香環の1個以上の水素原子を水酸基、カルボン酸基、
アミド基、アルコキシ基、アミノ基、スルホン酸基など
の1種または2種以上で置換したものであり、その結果
、水性液に溶解可能になる。具体例としては、たとえば
2−ヒドロキシ−4−メトキシベンゾフェノン−5−ス
ルホン酸、2,2°4,4°−テトラヒドロキシベンゾ
フェノン、2.4−ジヒドロキシベンゾフェノン、2−
ヒドロキシ−4−メトキシベンゾフェノンなどがあげら
れる。2-Hydroxybenzophenones whose nucleus is substituted with a hydrophilic group used in the present invention refer to 2-hydroxybenzophenones in which one or more hydrogen atoms of the aromatic ring of 2-hydroxybenzophenone are substituted with a hydroxyl group, a carboxylic acid group,
It is substituted with one or more of an amide group, an alkoxy group, an amino group, a sulfonic acid group, etc., and as a result, it becomes soluble in an aqueous liquid. Specific examples include 2-hydroxy-4-methoxybenzophenone-5-sulfonic acid, 2,2°4,4°-tetrahydroxybenzophenone, 2,4-dihydroxybenzophenone, 2-
Examples include hydroxy-4-methoxybenzophenone.
この2−ヒドロキシベンゾフェノン類は絹1gあたり1
〜100mg、好ましくは5〜50mg程度用いる。処
理法は親水性キチン質水溶液に添加して混合水溶液とし
てもよいし、親水性キチン質で処理する前または後で別
途行なってもよい。その他の処理条件は親水性キチン質
単独使用のばあいと同様でよい。This 2-hydroxybenzophenone is 1 g per 1 g of silk.
~100 mg, preferably about 5 to 50 mg is used. The treatment may be performed by adding it to an aqueous solution of hydrophilic chitin to form a mixed aqueous solution, or separately before or after the treatment with hydrophilic chitin. Other treatment conditions may be the same as in the case of using hydrophilic chitin alone.
本発明はさらに、前記親水性キチン質と親水性ラジカル
重合性モノマー、さらに要すれば前記親水性基核置換2
−ヒドロキシベンゾフェノン類との混合液中でラジカル
開始剤の存在下に重合処理する絹の改質加工法に関する
。The present invention further provides the hydrophilic chitin and the hydrophilic radically polymerizable monomer, and if necessary, the hydrophilic group-substituted 2
This invention relates to a method for modifying silk by polymerizing it in a mixture with -hydroxybenzophenones in the presence of a radical initiator.
親水性ラジカル重合性モノマーは絹に優れた風合いを与
えることが知られており、ラジカル重合性モノマー分子
中に水酸基、アルキルエーテル基、カルボキシル基、カ
ルボン酸エステル基、アミノ基、アミド基、N−置換ア
ミド基などの親水性基を含むものである。具体例として
は、たとえばアクリル酸、アクリル酸メチル、メタクリ
ル酸、メタクリル酸メチル、ヒドロキシエチルアクリレ
ート、ヒドロキシエチルメタクリレート、ヒドロキシプ
ロピルアクリレート、ヒドロキシプロピルメタクリレー
ト、アクリルアミド、メタクリルアミド、エチレングリ
コールジメタクリレート、トリメチロールプロパントリ
メタクリレート、エチレンビスアクリルアミド、エチレ
ンビスメタクリルアミドなどがあげられる。Hydrophilic radically polymerizable monomers are known to give excellent texture to silk, and the radically polymerizable monomer molecules include hydroxyl groups, alkyl ether groups, carboxyl groups, carboxylic acid ester groups, amino groups, amide groups, and N- It contains a hydrophilic group such as a substituted amide group. Specific examples include acrylic acid, methyl acrylate, methacrylic acid, methyl methacrylate, hydroxyethyl acrylate, hydroxyethyl methacrylate, hydroxypropyl acrylate, hydroxypropyl methacrylate, acrylamide, methacrylamide, ethylene glycol dimethacrylate, trimethylolpropane trichloride. Examples include methacrylate, ethylenebisacrylamide, and ethylenebismethacrylamide.
親水性キチン質の存在下に親水性ラジカル重合性モノマ
ーを絹にグラフト重合させると、親水性キチン質分子の
多価アルコール基が親水性ラジカル重合性モノマーの親
水性基と相互作用して親水性キチン質を分子レベルで均
一に含んだ、いわゆるハイブリッド化グラフト重合体か
えられるものと考えられ、そのため防しわ性および風合
い、さらには耐光性のいずれにも優れたものかえられる
と推察される。When a hydrophilic radically polymerizable monomer is graft-polymerized onto silk in the presence of hydrophilic chitin, the polyhydric alcohol groups of the hydrophilic chitin molecules interact with the hydrophilic groups of the hydrophilic radically polymerizable monomer, resulting in hydrophilic properties. It is thought that a so-called hybridized graft polymer containing chitin uniformly at the molecular level can be used, and therefore it is presumed that it can be replaced with a product that has excellent wrinkle resistance, texture, and light resistance.
ラジカル重合法としては放射線、光、超音波などをラジ
カル開始剤として用いることもできるが、アゾ型または
ペルオキシ型のラジカル開始剤、過硫酸塩またはセリウ
ム塩を用いるレドックス型ラジカル開始剤、過酸化水素
を酸性条件下で加熱するかあるいは前記電磁波もしくは
鉄塩などを組み合わせたラジカル開始系などの一般的な
ラジカル重合法が採用される。重合条件はラジカル開始
法によって異なるが、通常室温で1〜5時間、80〜9
5°Cの温度では0.5〜1.0時間程度反応させれば
よい。In the radical polymerization method, radiation, light, ultrasound, etc. can be used as a radical initiator, but azo-type or peroxy-type radical initiators, redox-type radical initiators using persulfates or cerium salts, and hydrogen peroxide can also be used. General radical polymerization methods such as a radical initiation system in which the polymer is heated under acidic conditions or in combination with the electromagnetic waves or iron salts are employed. Polymerization conditions vary depending on the radical initiation method, but are usually 1 to 5 hours at room temperature, 80 to 9
At a temperature of 5°C, the reaction may be carried out for about 0.5 to 1.0 hours.
絹1gに対する親水性ラジカル重合性モノマーの量は、
モノマーの種類によって異なるが通常0.05〜5.0
g程度、好ましくは0.1〜2.0gであり、また水性
媒体の量は絹1gに対して10〜100g程度が適当で
ある。The amount of hydrophilic radically polymerizable monomer per gram of silk is
It varies depending on the type of monomer, but usually 0.05 to 5.0
g, preferably 0.1 to 2.0 g, and the appropriate amount of the aqueous medium is about 10 to 100 g per 1 g of silk.
ラジカル開始剤の量は親水性ラジカル重合性モノマーの
種類および量などによって適宜選定すればよいが、通常
モノマーの0.1〜10モル%程度である。The amount of the radical initiator may be appropriately selected depending on the type and amount of the hydrophilic radically polymerizable monomer, but is usually about 0.1 to 10 mol% of the monomer.
つぎに本発明の絹の改質加工法を実施例に基づいて説明
するが、本発明はかかる実施例のみに限定されるもので
はない。Next, the method for modifying silk according to the present invention will be explained based on Examples, but the present invention is not limited to these Examples.
実施例1
内容積100m1の三角フラスコに水50m1、酢酸0
、1 mlおよび第1表に示す分子量を有する脱アセ
チル化キチン(脱アセチル化度80%) 50mgを加
え、室温で120分間ゆっくり攪拌して処理液を調製し
た。Example 1 In an Erlenmeyer flask with an internal volume of 100 m1, 50 m1 of water and 0 acetic acid were added.
, 1 ml and 50 mg of deacetylated chitin (degree of deacetylation: 80%) having the molecular weight shown in Table 1 were added, and the mixture was slowly stirred at room temperature for 120 minutes to prepare a treatment solution.
この処理液に第1表に示すように未加工絹布、II E
M A加工絹布(ヒドロキシエチルメタクリレート(
IIEMA)を20重量%グラフトさせたもの)および
フェニルグリシジルエーテルで処理したエポキシ加工(
10重量%)絹1gを浸漬し、室温で120分間放置後
、水洗乾燥した。In this treatment solution, as shown in Table 1, raw silk cloth, II E
M A processed silk cloth (hydroxyethyl methacrylate (
IIEMA) grafted with 20% by weight) and epoxy treated with phenyl glycidyl ether (
1 g of silk (10% by weight) was soaked in the solution, left to stand at room temperature for 120 minutes, and then washed with water and dried.
えられた処理絹布の防しわ性をJIS−1059−19
85A法(針金法)によって評価した。なお、防しわ性
は縦方向と横方向の開角度を測定し、両者の和を防しわ
度(単位:度)とした。The wrinkle resistance of the resulting treated silk fabric was evaluated according to JIS-1059-19.
Evaluation was made by the 85A method (wire method). In addition, the wrinkle resistance was measured by measuring the opening angle in the vertical direction and the horizontal direction, and the sum of both was defined as the wrinkle resistance (unit: degree).
結果を第1表に示す。The results are shown in Table 1.
[以下余白]
第 1 表
=13−
= 12 −
第1表から明らかなように、脱アセチル化キチン処理に
より未加工絹布、HEMA加工絹布、エポキシ加工絹布
のいずれにおいても防しわ性が大きく向」ニすることが
わかる。[Left below] Table 1 = 13 - = 12 - As is clear from Table 1, deacetylated chitin treatment significantly improves the wrinkle resistance of unprocessed silk fabric, HEMA-treated silk fabric, and epoxy-treated silk fabric. I understand that
なお、成人女子3名による風合いの官能テストをしたが
、エポキシ加工絹布を加工改質したばあい(実験番号1
1〜13)がもっともよく、ついで11 HM A加工
絹布(実験番号6〜8)、未加工絹布(実験番号2〜4
)の順であった。In addition, we conducted a sensory test on the texture with three adult women, and found that when the epoxy-treated silk cloth was processed and modified (experiment number 1),
1 to 13) are the best, followed by 11 HM A processed silk fabric (experiment numbers 6 to 8), unprocessed silk fabric (experiment numbers 2 to 4).
).
実施例2
内容積100 mlの三角フラスコに水50m1.酢酸
0.1mlを加え、さらにギ酸を添加してplを2.5
とした酸性水性媒体に、HEMA 0.2gと第2表に
示す量の脱アセチル化キチン(脱アセチル化度80%、
分子量15万)および33%の過酸化水素水0.5ml
を加えて室温で攪拌して均一な処理液をえた。この処理
液に未加工絹布1gを浸漬して加温し、80℃で1時間
保って重合を行ない、水洗後乾燥してHEMAグラフト
脱アセチル化キチン処理絹布をえた。Example 2 50 ml of water was added to an Erlenmeyer flask with an internal volume of 100 ml. Add 0.1 ml of acetic acid and then add formic acid to bring the pl to 2.5.
0.2 g of HEMA and the amount of deacetylated chitin shown in Table 2 (degree of deacetylation 80%,
molecular weight 150,000) and 33% hydrogen peroxide solution 0.5ml
was added and stirred at room temperature to obtain a uniform treatment solution. 1 g of unprocessed silk cloth was immersed in this treatment solution and heated, kept at 80° C. for 1 hour to effect polymerization, washed with water and dried to obtain a HEMA-grafted deacetylated chitin-treated silk cloth.
えられた加工絹布の重量を測定してグラフト率を調べた
。また実施例1と同様にして防しわ度および風合いも調
べた。The weight of the processed silk fabric obtained was measured to determine the grafting rate. In addition, the wrinkle resistance and texture were also examined in the same manner as in Example 1.
結果を第2表に示す。The results are shown in Table 2.
[以下余白]
第2表から、+1 E M Aのみをグラフトさせると
防し4つ性が低下するか、親水性キチン質を共存させる
と風合いを損わずに防しわ性が改善されることがわかる
。[Left below] From Table 2, it can be seen that grafting only +1 E M A reduces the wrinkle resistance, or coexisting hydrophilic chitin improves the wrinkle resistance without impairing the texture. I understand.
実施例3
内容積100m1の三角フラスコに水50m1、酢酸0
.075m1および脱アセチル化キチン(脱アセチル化
度、80%、分子量、15万) 50mgを加え、つい
で第3表に示す量の2−ヒドロキシ−4−メトキシベン
ゾフェノン−5−スルホン酸を加えて室温で攪拌し、処
理液を調製した。Example 3 In an Erlenmeyer flask with an internal volume of 100 m1, 50 m1 of water and 0 acetic acid were added.
.. 075ml and 50 mg of deacetylated chitin (degree of deacetylation, 80%, molecular weight, 150,000) were added, followed by addition of 2-hydroxy-4-methoxybenzophenone-5-sulfonic acid in the amount shown in Table 3, and the mixture was heated at room temperature. The mixture was stirred to prepare a treatment solution.
この処理液に第3表に示す絹布1gを浸漬し、室温で、
60分間放置後、水洗乾燥した。1 g of silk cloth shown in Table 3 was immersed in this treatment solution, and at room temperature,
After being left for 60 minutes, it was washed with water and dried.
えられた処理絹布の耐黄変性をつぎの要領で調べた。The yellowing resistance of the treated silk fabric obtained was examined in the following manner.
処理絹布を光源(500Wのキセノンランプ)から 4
.0cmの距離におき、光を20時間あてたのち、分光
光度計により 455nmおよび557nmの反射率(
RおよびR5,7)を測定する。評価は、標準白板(酸
化マグネシウム板)を 100とし、次式によって算出
した黄変指数(Y、1.)により行なった。Treated silk cloth from a light source (500W xenon lamp) 4
.. After exposing it to light for 20 hours at a distance of 0 cm, the reflectance at 455 nm and 557 nm (
R and R5,7) are measured. The evaluation was performed using a yellowing index (Y, 1.) calculated using the following formula, with a standard white board (magnesium oxide board) set as 100.
Y、!、=70/(1−R45,/ R5,)なお、第
3表中、)IEMA加工酸化ソーピング絹布とはHE
M A加工(グラフト率38重量%)絹を80℃で20
分間ハイドロサルファイド5%、非イオン界面活性剤5
%を含むアンモニア水溶液(濃アンモニア水2ml/、
Q)に浸漬抜水性乾燥した絹布であり、HE M A加
工還元ソーピング絹布とは上記HE M A加工絹を室
温で1時間、過酸化水素5ml/、Ill、非イオン界
面活性剤0.5g /ρを含む水に浸漬後水洗乾燥処理
した絹布のことである。Y,! ,=70/(1-R45,/R5,) In Table 3, ) IEMA processed oxidized soaping silk fabric is HE
M A processing (grafting rate 38% by weight) silk was heated at 80℃ for 20 minutes.
min hydrosulfide 5%, nonionic surfactant 5%
% ammonia aqueous solution (concentrated ammonia water 2ml/,
Q) is a silk cloth that has been immersed in water and has been drained and dried, and is a HEMA processed reduced soaping silk cloth. This refers to silk cloth that has been soaked in water containing ρ, then washed and dried.
[以下余白]
第3表に示すとおり、ベンゾフェノン誘導体を加えるこ
とにより、紫外線による黄変を大きく抑制することかで
きる。[Margin below] As shown in Table 3, yellowing caused by ultraviolet rays can be greatly suppressed by adding a benzophenone derivative.
なお、実験番号3−2.3−4.3−6のものは防しわ
性、風合についても良好なものであった。In addition, those of Experiment No. 3-2.3-4.3-6 had good wrinkle resistance and texture.
実施例4
内容積100m1の三角フラスコに水50m1. HE
MAO,3g 、分子ft17万の脱アセチル化キチン
(脱アセチル化度80%) 0.05gおよび2−ヒ
ドロキシ−4−メトキシベンゾフェノン−5−スルホン
酸の0.03gを入れ、33%過酸化水素水0 、5
mlを加え、ギ酸によりpHを2.5に調整した。この
溶液に未加工絹布1.0gを入れて加温し、80℃で1
時間保って重合を行ない、水洗乾燥して処理絹布をえた
。Example 4 50 ml of water was added to an Erlenmeyer flask with an internal volume of 100 ml. H.E.
Add 3 g of MAO, 0.05 g of deacetylated chitin (deacetylation degree 80%) with a molecular weight of 170,000 ft, and 0.03 g of 2-hydroxy-4-methoxybenzophenone-5-sulfonic acid, and add 33% hydrogen peroxide solution. 0, 5
ml and the pH was adjusted to 2.5 with formic acid. Add 1.0 g of unprocessed silk cloth to this solution and warm it to 80°C for 1.0 g.
Polymerization was carried out for a certain period of time, washed with water and dried to obtain a treated silk cloth.
この処理絹布につき、グラフト率、防しわ度および耐光
性(ΔY、1.)を調べた。結果を第4表に示す。The graft ratio, wrinkle resistance, and light resistance (ΔY, 1.) of this treated silk fabric were examined. The results are shown in Table 4.
一 21 〜
第4表に示すとおり、2−ヒドロキシ−4−メトキシベ
ンゾフェノン−5−スルホン酸と親水性キチン質をHE
14 Aに加えて配合した混合液でラジカル重合処理
することにより、防しわ性と耐光性の両者に優れたもの
かえられる。なお、風合いも良好であった。- As shown in Table 4, 2-hydroxy-4-methoxybenzophenone-5-sulfonic acid and hydrophilic chitin were combined with HE.
By performing a radical polymerization treatment with a mixed solution blended in addition to 14 A, a product with excellent wrinkle resistance and light resistance can be obtained. In addition, the texture was also good.
[発明の効果]
本発明によれば、絹本来の特徴を損うことなく、絹の弱
点といわれる風合い、防しわ性、耐光性などが同時に改
善される。[Effects of the Invention] According to the present invention, silk's weak points such as texture, wrinkle resistance, and light resistance are simultaneously improved without impairing the original characteristics of silk.
Claims (1)
の改質加工法。 2 絹を親水性キチン質および親水性基核置換2−ヒド
ロキシベンゾフェノン類で処理することを特徴とする絹
の改質加工法。 3 絹を親水性キチン質と親水性ラジカル重合性モノマ
ーとの混合液中でラジカル開始剤の存在下に重合処理す
ることを特徴とする絹の改質加工法。 4 絹を親水性キチン質、親水性基核置換2−ヒドロキ
シベンゾフェノン類、親水性ラジカル重合性モノマーの
混合液中でラジカル開始剤の存在下に重合処理すること
を特徴とする絹の改質加工法。[Claims] 1. A method for modifying silk, which comprises treating silk with hydrophilic chitin. 2. A method for modifying silk, which comprises treating silk with hydrophilic chitin and hydrophilic group-substituted 2-hydroxybenzophenones. 3. A method for modifying silk, which comprises polymerizing silk in a mixture of hydrophilic chitin and a hydrophilic radically polymerizable monomer in the presence of a radical initiator. 4 Silk modification processing characterized by polymerizing silk in a mixture of hydrophilic chitin, hydrophilic group-substituted 2-hydroxybenzophenones, and hydrophilic radically polymerizable monomers in the presence of a radical initiator. Law.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14091888A JPH01314782A (en) | 1988-06-08 | 1988-06-08 | Modification of silk |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14091888A JPH01314782A (en) | 1988-06-08 | 1988-06-08 | Modification of silk |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01314782A true JPH01314782A (en) | 1989-12-19 |
Family
ID=15279846
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14091888A Pending JPH01314782A (en) | 1988-06-08 | 1988-06-08 | Modification of silk |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01314782A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2366568A (en) * | 2000-09-01 | 2002-03-13 | Unilever Plc | Method of treating fabric |
CN111441144A (en) * | 2020-05-06 | 2020-07-24 | 湖州鸿艺丝绸科技有限公司 | Quick soaking method for raw silk modification |
-
1988
- 1988-06-08 JP JP14091888A patent/JPH01314782A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2366568A (en) * | 2000-09-01 | 2002-03-13 | Unilever Plc | Method of treating fabric |
CN111441144A (en) * | 2020-05-06 | 2020-07-24 | 湖州鸿艺丝绸科技有限公司 | Quick soaking method for raw silk modification |
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