JPH01307487A - Terminal sterilizing device for ultra pure water - Google Patents
Terminal sterilizing device for ultra pure waterInfo
- Publication number
- JPH01307487A JPH01307487A JP13658788A JP13658788A JPH01307487A JP H01307487 A JPH01307487 A JP H01307487A JP 13658788 A JP13658788 A JP 13658788A JP 13658788 A JP13658788 A JP 13658788A JP H01307487 A JPH01307487 A JP H01307487A
- Authority
- JP
- Japan
- Prior art keywords
- hot water
- ultrapure water
- line
- tank
- cleaning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910021642 ultra pure water Inorganic materials 0.000 title claims abstract description 53
- 239000012498 ultrapure water Substances 0.000 title claims abstract description 53
- 230000001954 sterilising effect Effects 0.000 title claims abstract description 22
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 59
- 238000004659 sterilization and disinfection Methods 0.000 claims abstract description 18
- 238000004140 cleaning Methods 0.000 claims description 45
- 238000004519 manufacturing process Methods 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 7
- 238000011144 upstream manufacturing Methods 0.000 claims description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract description 5
- 238000005406 washing Methods 0.000 abstract 5
- 239000000463 material Substances 0.000 abstract 1
- 229910052757 nitrogen Inorganic materials 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 description 7
- 235000012431 wafers Nutrition 0.000 description 6
- 241000894006 Bacteria Species 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 239000012528 membrane Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 229910001873 dinitrogen Inorganic materials 0.000 description 3
- 238000000108 ultra-filtration Methods 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- 230000001580 bacterial effect Effects 0.000 description 2
- 238000005342 ion exchange Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000001223 reverse osmosis Methods 0.000 description 2
- 238000004506 ultrasonic cleaning Methods 0.000 description 2
- 210000001015 abdomen Anatomy 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000000701 coagulant Substances 0.000 description 1
- 230000015271 coagulation Effects 0.000 description 1
- 238000005345 coagulation Methods 0.000 description 1
- 238000012258 culturing Methods 0.000 description 1
- 238000010612 desalination reaction Methods 0.000 description 1
- 238000005189 flocculation Methods 0.000 description 1
- 230000016615 flocculation Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000005416 organic matter Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000000967 suction filtration Methods 0.000 description 1
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明は超純水供給端末の殺菌洗浄に関し、特にリバー
スリターン方式の超純水供給端末殺菌装置に関する。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to sterilization and cleaning of ultrapure water supply terminals, and more particularly to a reverse return type ultrapure water supply terminal sterilizer.
（従来の技術）
近年、ＬＳＩやｆｌＬｓｌ等の半導体製造プロセスでは
洗浄水として理論純水に近い、いわゆる超純水が用いら
れている。(Prior Art) In recent years, so-called ultrapure water, which is close to theoretically pure water, has been used as cleaning water in semiconductor manufacturing processes such as LSI and flLsl.
この超純水製造システムとしては、第３図に示すものが
知られている。すなわち、超純水製造システムＡは前処
理システムａ、−次純水システムｂおよびサブシステム
Ｃから構成されており、このうち前処理システムａでは
、原水は凝集反応槽１に導かれ、ここで凝集剤および凝
集助剤の存在下に混合撹拌されて濁質がフロック化され
、このフロックを含む原水は二層決過器２によりか過処
理される。As this ultrapure water production system, the one shown in FIG. 3 is known. That is, the ultrapure water production system A is composed of a pretreatment system a, a sub-pure water system b, and a subsystem C. In the pretreatment system a, raw water is guided to the flocculation reaction tank 1, where it is The suspended solids are mixed and stirred in the presence of a coagulant and a coagulation aid to form flocs, and the raw water containing the flocs is subjected to overtreatment by a two-layer filter 2.
前処理システムａで濁質成分の除去された原水は、次の
一次純水システムｂに供給される。ここでは逆浸透膜を
内蔵した逆浸透膜装置（ＲＯ装置）により脱塩処理され
た後、脱気器４で炭酸ガス等の溶存ガスが脱気され、さ
らにイオン交換塔５でイオン交換されて純水が得られる
。The raw water from which turbidity components have been removed in the pretreatment system a is supplied to the next primary pure water system b. Here, after desalination is performed using a reverse osmosis membrane device (RO device) that has a built-in reverse osmosis membrane, dissolved gases such as carbon dioxide are degassed in a deaerator 4, and ions are exchanged in an ion exchange column 5. Pure water can be obtained.
−次純水システムｂからの純水は次のサブシステムＣに
供給される。サブシステムＣでは、まず紫外線殺菌装置
６において純水中の細菌が殺菌されるとともに、有機物
が酸化分解され、次いで温床式イオン交換装置７でイオ
ン交換された後、限外ｉ濾過膜の内蔵された限外濾過装
置（ＵＦ装置）で最終的に不純物が除去されて超純水が
生成される。- Pure water from the next subsystem b is supplied to the next subsystem C. In subsystem C, bacteria in the pure water are first sterilized in the ultraviolet sterilizer 6, and organic matter is oxidized and decomposed, and then ion exchange is performed in the hot bed type ion exchanger 7. Finally, impurities are removed in an ultrafiltration device (UF device) to produce ultrapure water.
サブシステムＣから得られた超純水は、終端が再びサブ
システムＣの入口側、すなわち紫外線殺菌装置６へ連絡
されている超純水供給ラインへ供給される。この超純水
供給ライン９からはユースポイントＢの超純水の使用箇
所である洗浄槽１０゜１０・・・へ超純水を供給するた
めの複数の端末ライン１１．１１・・・が分岐されてい
る。The ultrapure water obtained from the subsystem C is supplied to an ultrapure water supply line whose end is again connected to the inlet side of the subsystem C, that is, to the ultraviolet sterilizer 6. From this ultrapure water supply line 9, a plurality of terminal lines 11, 11... branch off for supplying ultrapure water to the cleaning tank 10゜10..., which is the point of use of ultrapure water at use point B. has been done.
超純水供給ライン９は前述のようにサブシステムＣの入
口に連絡されていて超純水が常時循環され、いわゆるリ
バースリターンされていて超純水の滞留に伴う細菌増殖
が抑制されている。As mentioned above, the ultrapure water supply line 9 is connected to the inlet of the subsystem C, and the ultrapure water is constantly circulated, so-called reverse return is performed, and bacterial growth due to the accumulation of ultrapure water is suppressed.
（発明が解決しようとする課題）
しかしながら、上記従来の超純水製造システムにおいて
は、超純水供給ラインにリバースリターン方式で超純水
の供給を行ない５、ここがら各使用箇所へ端末ラインを
介して行なうように構成されているため、端末ラインに
細菌が増殖しやすいという問題点があった。(Problem to be Solved by the Invention) However, in the conventional ultrapure water production system described above, ultrapure water is supplied to the ultrapure water supply line by a reverse return method5, and the terminal line is connected to each point of use. Since the terminal line is configured to conduct the process through the terminal line, there is a problem in that bacteria are likely to grow on the terminal line.
例えば、使用箇所である端末に洗浄槽が設けられ、ここ
で半導体ウェハが２４時間洗浄されるように稼動されて
いる場合には、端末ラインにも常時超純水が流下してい
るため細菌の増殖が極力抑制されるが、その洗浄槽の設
置されている場所が研究所等の施設であって、２４時間
稼動されない場合には、その停止中にその端末ライン中
での細菌の増殖が著しかった。For example, if a cleaning tank is installed at the terminal where semiconductor wafers are used and is operated in such a way that semiconductor wafers are cleaned 24 hours a day, ultrapure water is constantly flowing down to the terminal line, which can prevent bacteria. Bacteria growth is suppressed to the utmost, but if the cleaning tank is installed in a facility such as a research institute and is not operated 24 hours a day, bacterial growth may be significant in the terminal line while the cleaning tank is stopped. Ta.
細菌が所定以上に増殖した場合は、殺菌洗浄が行なわれ
るが、その方法として超純水供給ラインおよび端末ライ
ンに温水を通過させて殺菌する温水洗浄方法あるいは過
酸化水素等の薬品による薬品洗浄方法が知られている。If bacteria have grown beyond a certain level, sterilization cleaning is performed, which can be done by hot water cleaning method in which hot water is passed through the ultrapure water supply line and terminal line to sterilize it, or chemical cleaning method using chemicals such as hydrogen peroxide. It has been known.
しかし、このような洗浄は工場あるいは研究所等のユー
スポイントが稼動を停止中に行なわなければならず、し
たがって洗浄が必要なときにいつでも行なえるものでは
なかった。However, such cleaning must be performed while the point of use, such as a factory or research institute, is not in operation, and therefore cleaning cannot be performed whenever necessary.
特に薬品洗浄方法にあっては、薬品を全て流出させて水
質が立ち上がるまでには長時間要するため、ユースポイ
ントの停止時間がある程度長くとれる場合しか洗浄がで
きず、殺菌洗浄のタイミングがなかなか得られない実情
にあった。In particular, with chemical cleaning methods, it takes a long time for all the chemicals to flow out and the water quality to rise, so cleaning can only be done if the point of use can be stopped for a certain amount of time, making it difficult to find the right timing for sterilizing cleaning. The reality was that there was no such thing.
上述のように、充分な殺菌洗浄が行なわれない状態での
洗浄槽で半導体ウェハあるいはＬＳＩデバイス等を洗浄
しても超精密洗浄ができないという問題点が生じていた
。As mentioned above, even if semiconductor wafers, LSI devices, etc. are cleaned in a cleaning bath without sufficient sterilization cleaning, ultra-precision cleaning cannot be performed.
（課題を解決するための手段）
本発明は上記課題解決のためになされたものであって、
その構成は超純水製造システムと、前記超純水製造シス
テムから得られる超純水をユースポイントへ供給すると
ともに、超純水の一部を再び前記超純水製造システムへ
循環させる超純水供給ラインと、
前記超純水供給ラインから分岐され、かつユースポイン
トの使用箇所へ超純水を供給する端末ラインと、
前記端末ラインの使用箇所の上流側で、かつそのバイパ
スラインに設けられた温水槽と、前記温水槽と前記使用
箇所との端末ラインに設けられたン濾過器とからなり、
前記温水槽の温水を殺菌洗浄工程時に使用箇所へ供給し
て殺菌洗浄を行なうことを特徴とするものである。(Means for Solving the Problems) The present invention has been made to solve the above problems, and includes:
Its configuration includes an ultrapure water production system, ultrapure water obtained from the ultrapure water production system is supplied to the point of use, and a portion of the ultrapure water is circulated back to the ultrapure water production system. a supply line; a terminal line that is branched from the ultrapure water supply line and supplies ultrapure water to the point of use; and a terminal line provided upstream of the point of use of the terminal line and on its bypass line. It is characterized by comprising a hot water tank and a filter installed in a terminal line between the hot water tank and the point of use, and the hot water of the hot water tank is supplied to the point of use during the sterilization cleaning process to perform sterilization and cleaning. It is something to do.
（作用）
本発明では端末ラインの使用箇所の手前に設けられた温
水槽で温水が生成され、その？ム水は濾過器を介して使
用箇所へ供給され滅菌洗浄が行なわれる。(Function) In the present invention, hot water is generated in a hot water tank provided in front of the point where the terminal line is used. The water is supplied to the point of use through a filter and sterilized and washed.
（実施例） 以下、本発明装置を図示の実施例に基いて説明する。(Example) Hereinafter, the apparatus of the present invention will be explained based on the illustrated embodiments.
第１図は本発明装置の一実施例を示すブロック図である
。なお、従来と同一構成要素には同一符号を用い、これ
ら構成要素については説明が重複するため新規な部分の
みについて異なる符号を付して説明する。FIG. 1 is a block diagram showing an embodiment of the apparatus of the present invention. Note that the same reference numerals are used for the same components as in the prior art, and since the explanations for these components will overlap, only new parts will be explained using different reference numerals.
超純水供給ライン９から分岐して設けられた各端末ライ
ン１１．１１・・・には、使用箇所に当たる洗浄槽１０
の手前（上流側）に温水槽１２および濾過器１３が設け
られている。Each terminal line 11, 11 branched from the ultrapure water supply line 9 has a cleaning tank 10 corresponding to the point of use.
A hot water tank 12 and a filter 13 are provided in front of (upstream side).
第２図には１つの端末ライン１１の詳細が示されていて
、端末ライン１１のバイパスライン１１−に設けられて
いるバルブ■、の下流側に温水槽１２が設けられている
。温水槽１２にはヒータ１３が内蔵されているとともに
、除菌フィルタ（図示せず）で処理された加圧チッ素ガ
スがバルブ■２を介して供給されるように形成されてい
る。FIG. 2 shows details of one terminal line 11, in which a hot water tank 12 is provided downstream of the valve (2) provided on the bypass line 11- of the terminal line 11. The hot water tank 12 has a built-in heater 13 and is configured so that pressurized nitrogen gas treated with a sterilization filter (not shown) is supplied through a valve 2.
温水槽１２の流出側はバルブ■３を介在させたバイパス
ライン１１−に接続され、バルブ■４の下流側の端末ラ
イン１１と合流している。合流後の端末ライン１１には
か過器１３が設けられているが、このン濾過器１３は耐
熱性の限外ン濾過膜を内蔵した限外ｉ濾過器から形成さ
れている。The outflow side of the hot water tank 12 is connected to a bypass line 11- with a valve 3 interposed therebetween, and merges with the terminal line 11 on the downstream side of the valve 4. A filter 13 is provided in the terminal line 11 after the merging, and this filter 13 is formed from an ultrafilter containing a heat-resistant ultrafiltration membrane.
ｉ濾過器１３のｉ戸液側の端末ライン１１は周知の超音
波式の洗浄槽１０の底部に接続されている。The terminal line 11 on the i-liquid side of the i-filter 13 is connected to the bottom of a well-known ultrasonic cleaning tank 10.
この洗浄槽１０は半導体ウェハ等の被洗浄物１４を収容
し、洗浄槽１０内の超純水に超音波を付加する超音波発
振器１５が設けられている。したがって超純水は洗浄槽
１０内を上向流して溢流トラフ１０″から排出され、こ
の間被洗浄物１４は超音波洗浄を受けるように構成され
ている。The cleaning tank 10 accommodates objects 14 to be cleaned, such as semiconductor wafers, and is provided with an ultrasonic oscillator 15 that applies ultrasonic waves to ultrapure water in the cleaning tank 10 . Therefore, the ultrapure water flows upward in the cleaning tank 10 and is discharged from the overflow trough 10'', and during this time the object to be cleaned 14 is configured to undergo ultrasonic cleaning.
上述の構成からなる実施例において被洗浄物１４を洗浄
するには、バイパスライン１１−中のバルブＶｌ 、Ｖ
３を閉にするとともに、端末ライン１１のバルブ■４を
開にすると、超純水供給ライン９からの超純水は端末ラ
イン１１を介して濾過器１３に導入されて濾過処理され
、このン濾過処理された超純水が洗浄槽１０に供給され
て被洗浄物１４の洗浄が行なわれる。In the embodiment configured as described above, in order to clean the object 14 to be cleaned, the valves Vl and V in the bypass line 11-
3 is closed and the valve 4 of the terminal line 11 is opened, the ultrapure water from the ultrapure water supply line 9 is introduced into the filter 13 via the terminal line 11 and is filtered. The filtered ultrapure water is supplied to the cleaning tank 10 and the object to be cleaned 14 is cleaned.
また洗浄槽１０の殺菌洗浄を行なうには、端末ライン１
１に設けられているバルブ■、を閉にするとともに、洗
浄槽１０の底部に設けられているドレンバイブ１６に設
けられたバルブｖ５を開にして洗浄槽１０内を空にし、
次いでバイパスライン１１−のバルブ■、を開にして温
水槽１２に超純水を所定量供給した後バルブＶ、を閉に
しヒータ１３を作動させる。In addition, in order to perform sterilization cleaning of the cleaning tank 10, the terminal line 1
1, and open the valve v5 provided on the drain vibe 16 provided at the bottom of the cleaning tank 10 to empty the inside of the cleaning tank 10.
Next, the valve (1) of the bypass line 11- is opened to supply a predetermined amount of ultrapure water to the hot water tank 12, and then the valve V is closed to operate the heater 13.
温水槽１２内の水温が約８０℃になったらバルブＶ２を
開にして加圧チッ素ガスを温水槽１２に供給するととも
に、バイパスライン１１゛のバルブ■３を開にすると温
水槽１２内の温水をチッ素ガスの圧力でｉ濾過器１３お
よび洗浄槽１０内に供給される。洗浄槽１０内が温水で
満たされた後バルブ■２を閉にして２０〜３０分間その
ままに維持して殺菌を行なう。その後再びバルブ■２を
開にして新たな温水を温水槽１２から洗浄槽１０に送出
した後バルブＶ２を閉にし再び殺菌を行なう。When the water temperature in the hot water tank 12 reaches approximately 80°C, open the valve V2 to supply pressurized nitrogen gas to the hot water tank 12, and open the valve 3 of the bypass line 11' to reduce the temperature in the hot water tank 12. Hot water is supplied into the i-filter 13 and the cleaning tank 10 under the pressure of nitrogen gas. After the inside of the cleaning tank 10 is filled with warm water, the valve 2 is closed and kept as it is for 20 to 30 minutes to perform sterilization. Thereafter, the valve V2 is opened again to send new hot water from the hot water tank 12 to the cleaning tank 10, and then the valve V2 is closed to perform sterilization again.
このような間欠温水供給を１〜２回繰り返した後、濾過
器１３のブローライン１７に設けられているバルブ■６
を開にするとともに、端末ライン１１のバルブ■４を開
にしてブローを行ない、これをブローライン１７の水質
が所定の値に立ち上がるまで継続する。ブローライン１
７の水質が所定値に立ち上がった後バルブ■４を閉にす
ると、超純水が洗浄槽１０へ供給され再び洗浄工程が開
始される。After repeating such intermittent hot water supply once or twice, the valve ■6 installed in the blow line 17 of the filter 13
At the same time, the valve 4 of the terminal line 11 is opened to perform blowing, and this is continued until the water quality in the blow line 17 rises to a predetermined value. blow line 1
After the water quality in step 7 rises to a predetermined value, when valve 4 is closed, ultrapure water is supplied to the cleaning tank 10 and the cleaning process is started again.
なお、温水槽１２内の温度は８０℃としたが、ｉ濾過器
１３内の限外濾過膜および洗浄槽が耐熱性でないときは
６０℃程度にし、炉腹に悪影響を与えない範囲で加温さ
れる。また、温水槽の容量は間欠的に供給される温水量
に見合う量を製造できるようにし、通常５０〜７０１！
で充分である。Note that the temperature in the hot water tank 12 was set at 80°C, but if the ultrafiltration membrane and cleaning tank in the i-filter 13 are not heat resistant, the temperature should be set at around 60°C and heated within a range that does not adversely affect the furnace belly. be done. In addition, the capacity of the hot water tank is set so that it can produce an amount corresponding to the amount of hot water that is intermittently supplied, and is usually 50 to 70 cm.
is sufficient.
以上のように、本実施例においては各端末ライン１１．
１１・・・に温水槽およびン濾過器を設けて各端末ライ
ン毎に殺菌洗浄ができるように構成したので、ユースポ
イント全体を停止することなく殺菌洗浄の必要な使用箇
所を任意に殺菌洗浄することができる。As described above, in this embodiment, each terminal line 11.
11... is equipped with a hot water tank and a filter so that each terminal line can be sterilized and cleaned, so any points that require sterilization and cleaning can be sterilized and cleaned without stopping the entire point of use. be able to.
このため使用箇所を常に無菌状態に維持することができ
、半導体ウェハ等の被洗浄物を超精密洗浄できる効果が
ある。Therefore, it is possible to always maintain the area where it is used in a sterile state, and there is an effect that objects to be cleaned such as semiconductor wafers can be cleaned with ultra-precision.
加えて、温水による殺菌洗浄のためその後の水質立ち上
がりが早く、超純水をその分だけ節約できる効果がある
。In addition, since sterilization is performed using hot water, the quality of the water improves quickly afterward, which has the effect of saving ultrapure water.
下表は上述の実施例装置で洗浄槽１０を７日間後間停止
状態にした後、上述の殺菌洗浄を行なう前と行なった後
の洗浄槽１０内の超純水を０．４５μｍのフィルタで吸
引ン濾過し、３０℃で７日間培養した後のコロニー数を
示したものである。The table below shows that after the cleaning tank 10 was stopped for 7 days using the above-mentioned example device, the ultrapure water in the cleaning tank 10 was filtered through a 0.45 μm filter before and after the above-mentioned sterilization cleaning. The number of colonies after suction filtration and culturing at 30°C for 7 days is shown.
表
この表からも明らかなように、殺菌洗浄後は極めて高水
質の値が長時間維持され、特に８０℃の温水による殺菌
洗浄ではその効果が著しいことがわかる。Table As is clear from this table, extremely high water quality values are maintained for a long time after sterilizing cleaning, and the effect is particularly remarkable in sterilizing cleaning with 80°C hot water.
（効果）
本発明は上述のように各端末ラインに温水槽および濾過
器を設は各端末ライン毎に殺菌洗浄ができるように構成
したので、ユースポイント全体を停止することなく殺菌
洗浄の必要な使用箇所を任意に殺菌洗浄することができ
る。このため使用箇所を常に無菌状態に維持することが
でき、半導体ウェハ等の被洗浄物を超精密洗浄できる効
果がある。(Effects) As described above, the present invention is configured such that each terminal line is equipped with a hot water tank and a filter so that sterilization and cleaning can be carried out for each terminal line. The area of use can be sterilized and cleaned as desired. Therefore, it is possible to always maintain the area where it is used in a sterile state, and there is an effect that objects to be cleaned such as semiconductor wafers can be cleaned with ultra-precision.
加えて、温水による殺菌洗浄のためその後の水質立ち上
がりが早く、超純水をその分だけ節約することができる
等の効果を有している。In addition, because of the sterilization and cleaning using hot water, the quality of the water improves quickly afterward, and the amount of ultrapure water can be saved accordingly.
【図面の簡単な説明】
第１図は本発明装置の一実施例を示すブロック図、第２
図は端末ラインの詳細図および第３図は従来装置のブロ
ック図である。
９・・・超純水供給ライン
１０・・・洗浄槽（使用箇所）
１１・・・端末ライン
１２・・・温水槽
１３・・・濾過器
１３・・・ヒータ
ａ・・・・・・前処理システム
ｂ・・・・・・−次純水システム
Ｃ・・・・・・サブシステム
Ａ・・・・・・超純水製造システム
Ｂ・・・・・・ユースポイント[Brief Description of the Drawings] Fig. 1 is a block diagram showing one embodiment of the device of the present invention, Fig. 2 is a block diagram showing an embodiment of the device of the present invention;
The figure is a detailed view of the terminal line, and FIG. 3 is a block diagram of the conventional device. 9... Ultrapure water supply line 10... Cleaning tank (point of use) 11... Terminal line 12... Hot water tank 13... Filter 13... Heater a... Front Treatment system b...-Next pure water system C...subsystem A...ultra pure water production system B...point of use
Claims (1)
イントへ供給するとともに、超純水の一部を再び前記超
純水製造システムへ循環させる超純水供給ラインと、 前記超純水供給ラインから分岐され、かつユースポイン
トの使用箇所へ超純水を供給する端末ラインと、 前記端末ラインの使用箇所の上流側で、かつそのバイパ
スラインに設けられた温水槽と、前記温水槽と前記使用
箇所との端末ラインに設けられたろ過器とからなり、 前記温水槽の温水を殺菌洗浄工程時に使用箇所へ供給し
て殺菌洗浄を行なうことを特徴とする超純水供給端末殺
菌装置。[Claims] 1. An ultrapure water production system; supplying the ultrapure water obtained from the ultrapure water production system to a point of use, and supplying a portion of the ultrapure water to the ultrapure water production system again; An ultrapure water supply line to be circulated; a terminal line that is branched from the ultrapure water supply line and supplies ultrapure water to a point of use; and a bypass line upstream of the point of use of the terminal line and a bypass thereof. It consists of a hot water tank installed in the line and a filter installed in the terminal line between the hot water tank and the point of use, and hot water from the hot water tank is supplied to the point of use during the sterilization cleaning process to perform sterilization and cleaning. An ultrapure water supply terminal sterilizer characterized by:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13658788A JPH01307487A (en) | 1988-06-02 | 1988-06-02 | Terminal sterilizing device for ultra pure water |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13658788A JPH01307487A (en) | 1988-06-02 | 1988-06-02 | Terminal sterilizing device for ultra pure water |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01307487A true JPH01307487A (en) | 1989-12-12 |
Family
ID=15178772
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13658788A Pending JPH01307487A (en) | 1988-06-02 | 1988-06-02 | Terminal sterilizing device for ultra pure water |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01307487A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05329470A (en) * | 1992-05-28 | 1993-12-14 | Ebara Corp | Clean water producing device |
| JP2012200640A (en) * | 2011-03-24 | 2012-10-22 | Hitachi Plant Technologies Ltd | Drinking water supply system |
| JP2015128767A (en) * | 2006-01-27 | 2015-07-16 | イー・エム・デイー・ミリポア・コーポレイシヨン | Polishing cartridge for final purification of water for being distributed to use point |
| JP2018020272A (en) * | 2016-08-02 | 2018-02-08 | オルガノ株式会社 | Ultrapure water production device and ultrapure water production method |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60110390A (en) * | 1983-11-21 | 1985-06-15 | Kuraray Co Ltd | Aseptic water preparing apparatus |
| JPS62234507A (en) * | 1986-04-02 | 1987-10-14 | Japan Organo Co Ltd | Sterilizing method for ultrafilter membrane device |
-
1988
- 1988-06-02 JP JP13658788A patent/JPH01307487A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60110390A (en) * | 1983-11-21 | 1985-06-15 | Kuraray Co Ltd | Aseptic water preparing apparatus |
| JPS62234507A (en) * | 1986-04-02 | 1987-10-14 | Japan Organo Co Ltd | Sterilizing method for ultrafilter membrane device |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05329470A (en) * | 1992-05-28 | 1993-12-14 | Ebara Corp | Clean water producing device |
| JP2015128767A (en) * | 2006-01-27 | 2015-07-16 | イー・エム・デイー・ミリポア・コーポレイシヨン | Polishing cartridge for final purification of water for being distributed to use point |
| JP2012200640A (en) * | 2011-03-24 | 2012-10-22 | Hitachi Plant Technologies Ltd | Drinking water supply system |
| JP2018020272A (en) * | 2016-08-02 | 2018-02-08 | オルガノ株式会社 | Ultrapure water production device and ultrapure water production method |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP3570304B2 (en) | Sterilization method of deionized water production apparatus and method of producing deionized water | |
| JP2000126767A (en) | Method and apparatus for producing purified water | |
| TW200938491A (en) | Hydrogen peroxide removal method and device thereof, ozone water production method and device thereof, and washing method and device thereof | |
| JPH01307487A (en) | Terminal sterilizing device for ultra pure water | |
| JPH05293469A (en) | Production of sterilized and purified water and equipment thereof | |
| JP3228053B2 (en) | Pure water production equipment | |
| KR101967799B1 (en) | Water treatment apparatus and water treatment method | |
| CN213327120U (en) | Reverse osmosis concentrated water sterile recycling circulating device | |
| JPH0815596B2 (en) | Ultrapure water production method | |
| JP3998997B2 (en) | Disinfection method of ultrapure water supply pipe | |
| JPH0818022B2 (en) | Heat sterilization method of final filter for ultrapure water | |
| JP2020110653A (en) | Purified water supply system and method for operating the same | |
| KR101826622B1 (en) | Water treatment apparatus | |
| JP2003145135A (en) | Membrane-type deaeration apparatus and potable drinking water producing apparatus | |
| JPH10192850A (en) | Washing device of membrane separation apparatus | |
| JPS62176507A (en) | Regenerating treatment of super filter membrane | |
| JP4552483B2 (en) | Hot water flow treatment method for water treatment unit and assembly method for pure water production apparatus | |
| JP4361984B2 (en) | Water purification system and method for cleaning water purification system | |
| JPH1043758A (en) | Method for purifying apparatus for producing water for dialysis | |
| JPS62266193A (en) | Treatment of terminal filter membrane apparatus | |
| JPS62234507A (en) | Sterilizing method for ultrafilter membrane device | |
| JPS62204803A (en) | Method for sterilizing ultrafilter membrane equipment | |
| JPS59216687A (en) | Pasturization of pure water apparatus | |
| JP2000042533A (en) | Disinfection method of activated carbon | |
| JP3081632U (en) | Medical infectious wastewater treatment equipment |