JPH01302844A - Manufacture of package cover - Google Patents

Manufacture of package cover

Info

Publication number
JPH01302844A
JPH01302844A JP13155988A JP13155988A JPH01302844A JP H01302844 A JPH01302844 A JP H01302844A JP 13155988 A JP13155988 A JP 13155988A JP 13155988 A JP13155988 A JP 13155988A JP H01302844 A JPH01302844 A JP H01302844A
Authority
JP
Japan
Prior art keywords
bath
plated
nickel
gold
alloy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13155988A
Other languages
Japanese (ja)
Inventor
Hiroshi Hirayama
平山 浩士
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Metal Mining Co Ltd
Original Assignee
Sumitomo Metal Mining Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Metal Mining Co Ltd filed Critical Sumitomo Metal Mining Co Ltd
Priority to JP13155988A priority Critical patent/JPH01302844A/en
Publication of JPH01302844A publication Critical patent/JPH01302844A/en
Pending legal-status Critical Current

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  • Electroplating Methods And Accessories (AREA)

Abstract

PURPOSE:To obtain a package cover whose resistance to a salt-spray test is large, whose corrosion resistance is good and whose thermal resistance and solderability are excellent by a method wherein the surface of a cover made of a metal such as an Fe-Ni alloy or the like is plated with nickel firstly in a sulfamic acid bath and then in a Watts bath and gold is plated on it in an acid bath and then in a neutral bath. CONSTITUTION:The surface of a cover made of a metal such as an Fe-Ni alloy, an Fe-Ni-Co alloy or the like is plated with nickel firstly in a sulfamic acid bath and then in a Watt bath; then, gold is plated on a nickel-plated film in an acid bath and then in a neutral bath. For example, a Kovar sheet whose thickness is 0.25mm and whose outer size is 13mm square is degreased and chemically polished; it is plated with nickel to be 3mum thick by using a sulfamic acid bath; then, it is plated with nickel to be 3mum thick by using a Watts bath. Then, gold is plated to be 0.5mum thick on a nickel-plated film by using an acid bath; in addition, gold is plated to be 1.5mum thick by using a neutral bath. Said plating operations are executed by using a barrel-type plating apparatus.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は半感体集積回路(IC)素子を収容するパンケ
ージに用いられるハーメチックシールカバーの製造方法
の改善に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an improvement in a method of manufacturing a hermetic seal cover used in a pan cage housing a semi-sensitive integrated circuit (IC) device.

〔従来の技術〕[Conventional technology]

IC素子のパフケージの一種に多層セラミック基板を用
いるものがある。この基板は所定の導電回路を印刷した
グリーンシートを複数枚重ね合わせて焼成し、ICパッ
ケージ用に成型したものであり、IC搭載用の窪みと、
該窪みの周囲にIC素子上の電極とワイヤボンディング
される内部リードが露出して設けられており、外部リー
ドをろう付けした後露出金属部分に金メッキして使用に
供される。
One type of puff cage for IC devices uses a multilayer ceramic substrate. This board is made by stacking and firing multiple green sheets printed with a predetermined conductive circuit and molding them into an IC package.
An internal lead wire-bonded to an electrode on the IC element is exposed around the recess, and after the external lead is brazed, the exposed metal portion is plated with gold for use.

このような多層セラミック基板を用いるパッケージの場
合、IC素子収容部を覆うカバーが必要で、通常Fe−
Ni合金、Fe  Ni −Co合金等の金属板にニッ
ケルを下地メッキし、その上に金メッキを施したものを
用いている。
In the case of a package using such a multilayer ceramic substrate, a cover is required to cover the IC element accommodating part, and it is usually made of Fe-
A metal plate made of Ni alloy, Fe Ni -Co alloy, etc. is plated with nickel as a base plate, and then gold plated thereon.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

ところが、従来のこの種のパッケージカバーは塩水噴霧
試験に対して極めて弱いのが通常である。
However, conventional package covers of this type are usually extremely susceptible to salt spray tests.

そこで本発明の目的は塩水噴霧試験に対する抵抗が大で
、耐食性が良好でしかも耐熱性、ソルダビリティ−にも
優れたパッケージカバーを得ることにある。
SUMMARY OF THE INVENTION Accordingly, an object of the present invention is to obtain a package cover that has high resistance to salt spray tests, good corrosion resistance, and excellent heat resistance and solderability.

〔課題を解決するための手段〕[Means to solve the problem]

上記目的を達成するため本発明の方法は、Fe −Ni
合金、Fe−Ni−Co合金等の金属製カバーの表面に
先ずスルファミン酸浴、次いでワット浴でニッケルをメ
ッキし、次に該ニッケルメッキ膜上に酸性浴次いで中性
浴にて金メッキを施す点に特徴がある。
In order to achieve the above object, the method of the present invention provides Fe-Ni
The surface of a metal cover made of alloy, Fe-Ni-Co alloy, etc. is first plated with nickel in a sulfamic acid bath, then in a Watts bath, and then gold plating is applied on the nickel plating film in an acid bath and then a neutral bath. There are characteristics.

〔作用〕[Effect]

スルファミン酸ニッケル浴はFe  N1合金、Fe−
N1−Go金合金の密着性が良く、表面の凹凸に対して
空洞を形成することなく均質なメッキ膜ができ、メッキ
膜の内部応力が小さく高速メッキが可能という長所があ
る。反面スルファミン酸浴によると浴成分中の硫黄が化
合物となってメッキ膜の結晶粒界に析出し易く、これが
耐食性を低下する一因となっている。このためスルファ
ミン酸浴は下地の第1層目に適している。この第1層目
のニッケルメッキ膜上には更にワット浴によりニッケル
メッキする。ワット浴はニッケルメッキ浴としては最も
一般的で安価であるが、内部応力が高く厚メッキには適
しない。しかし反面緻密なニッケルメッキ膜が得られる
ので、第2N目に適用すれば第1層目の耐食性の弱点を
補うことができる。
Nickel sulfamate bath is FeN1 alloy, Fe-
The adhesion of the N1-Go gold alloy is good, a homogeneous plating film can be formed without forming cavities in response to surface irregularities, and the internal stress of the plating film is small, making high-speed plating possible. On the other hand, in the case of a sulfamic acid bath, the sulfur in the bath components becomes a compound and tends to precipitate at the grain boundaries of the plating film, which is a factor in reducing the corrosion resistance. For this reason, the sulfamic acid bath is suitable for the first layer of the base. This first layer of nickel plating film is further plated with nickel using a Watt bath. Watt bath is the most common and inexpensive nickel plating bath, but it has high internal stress and is not suitable for thick plating. However, since a dense nickel plating film can be obtained, if it is applied to the 2Nth layer, it can compensate for the weakness in the corrosion resistance of the first layer.

このようにして、ニッケルを2層メッキした後、更に金
を2層にメンキする。第2層のニッケルメッキ膜上には
先ず酸性浴で金メッキする。この浴は下地ニッケルメッ
キ層とのなじみが良く緻密で密着性の良好な金メッキ膜
が得られるからである。
After plating two layers of nickel in this way, two more layers of gold are plated. The second layer of nickel plating film is first plated with gold in an acid bath. This is because this bath has good compatibility with the base nickel plating layer, and a dense gold plating film with good adhesion can be obtained.

しかしながらこの酸性浴による金メッキ膜のみでは45
0℃程度の加熱で変色が生じる欠点がある。
However, with only the gold plating film formed by this acidic bath, 45
It has the disadvantage that discoloration occurs when heated to about 0°C.

この欠点は更に第4Nとして中性浴による金メッキを施
すことにより解消できる。ニッケルメッキ膜上に直接中
性浴で金メッキする方法はニッケル膜との密着性を損う
上、中性メッキ浴中に下地ニッケルメッキから不純物が
混入し易く、再現性の良い金メッキ作業がしにくい。
This drawback can be overcome by further applying gold plating in a neutral bath as the fourth N. The method of directly plating gold on a nickel plating film in a neutral bath impairs the adhesion with the nickel film, and impurities from the base nickel plating tend to get mixed into the neutral plating bath, making it difficult to perform gold plating with good reproducibility. .

〔実施例〕〔Example〕

厚さ0.25mm、外形寸法13m角のコバール板に脱
脂処理、化学研磨を施し、スルファミン酸浴を用いて厚
さ3μmのニッケルメッキを施し、次いでワット浴を用
いて3μmのニッケルメッキを施した0次にこのニッケ
ルメッキ膜上に酸性浴を用いて0.5μmの金メッキを
、更に中性浴により1.5μm厚の金メッキを施した。
A Kovar plate with a thickness of 0.25 mm and an external dimension of 13 m square was subjected to degreasing treatment, chemical polishing, nickel plating to a thickness of 3 μm using a sulfamic acid bath, and then nickel plating to a thickness of 3 μm using a Watt bath. Next, on this nickel plating film, gold plating was applied to a thickness of 0.5 μm using an acidic bath, and then gold plating was applied to a thickness of 1.5 μm using a neutral bath.

メッキは何れもバレル型メッキ装置を用いた。用いたメ
ッキ浴の組成及びメッキ条件は次の通りである。
A barrel-type plating device was used for all plating. The composition of the plating bath used and the plating conditions are as follows.

(イ)スルファミン酸ニッケルメッキ浴スルファミン酸
ニッケル600 g/j!、塩化ニッケル10g/j!
、硼酸40g/l、pH4、浴温50℃、電流密度0.
5 A/dm”。
(a) Nickel sulfamate plating bath Nickel sulfamate 600 g/j! , nickel chloride 10g/j!
, boric acid 40g/l, pH 4, bath temperature 50°C, current density 0.
5 A/dm”.

(ロ)ワット浴 硫酸ニッケル240g/l、塩化ニッケル45g/l、
硼酸30 g/l、 pH4゜5、浴温50℃、電流密
度2A/dm”。
(b) Watt bath nickel sulfate 240g/l, nickel chloride 45g/l,
Boric acid 30 g/l, pH 4°5, bath temperature 50°C, current density 2A/dm".

(ハ)酸性金メッキ浴 シアン化合カリウム10g/l、リン酸二水素カリウム
96g/If、クエン酸24g/l % Co添加剤0
.2g/lSp+目、浴温40℃、電流密度1.5A/
+1m”。
(c) Acidic gold plating bath Potassium cyanide 10g/l, Potassium dihydrogen phosphate 96g/If, Citric acid 24g/l % Co additive 0
.. 2g/lSp+ eyes, bath temperature 40℃, current density 1.5A/
+1m”.

(ニ)中性メッキ浴 シアン化金カリウム5g/l、クエン酸カリウム150
g/l、リン酸二水素ナトリウム15 g/l、ptl
?、浴温70℃、電流密度LA/dm”。
(d) Neutral plating bath Potassium gold cyanide 5g/l, Potassium citrate 150
g/l, sodium dihydrogen phosphate 15 g/l, ptl
? , bath temperature 70°C, current density LA/dm”.

上記のようにメンキしたパッケージカバー5個を塩水噴
霧試験槽に入れ、24時間試験に供した。
Five package covers that had been torn as described above were placed in a salt spray test tank and subjected to a 24 hour test.

試験後テストサンプルを清浄にし、乾燥後10倍の実体
顕微鏡下でメッキ面の観察を行ない腐食状況を測定した
。又、市販のパッケージカバー5個についても比較のた
め同様の試験を行ない、腐食状況を測定した。測定結果
を第1表に示す。腐食状況は腐食発生面積率(%)で示
した。
After the test, the test sample was cleaned, dried, and the plated surface was observed under a stereoscopic microscope with a magnification of 10 times to measure the state of corrosion. Further, similar tests were conducted on five commercially available package covers for comparison, and the corrosion status was measured. The measurement results are shown in Table 1. The corrosion status was expressed as the corrosion occurrence area ratio (%).

第1表 第1表から本発明法によるパッケージカバーが塩水噴霧
試験に対して強い抵抗力を持つことが良(分る。
Table 1 From Table 1, it can be seen that the package cover made by the method of the present invention has good resistance to the salt spray test.

〔発明の効果〕〔Effect of the invention〕

本発明により耐食性が格段に優れたパッケージカバーを
得ることができた。このカバーは耐熱性、ソルダビリテ
ィ−にも優れ、極めて信頼性の高いICパッケージを構
成することができる。
According to the present invention, it was possible to obtain a package cover with significantly excellent corrosion resistance. This cover has excellent heat resistance and solderability, and can constitute an extremely reliable IC package.

特許出願人 住友金属鉱山株式会社Patent applicant: Sumitomo Metal Mining Co., Ltd.

Claims (1)

【特許請求の範囲】[Claims] (1)Fe−Ni合金、Fe−Ni−Co合金等の金属
製カバーの表面に先ずスルファミン酸浴、次いでワット
浴でニッケルをメッキし、次に該ニッケルメッキ膜上に
酸性浴次いで中性浴にて金メッキを施すことを特徴とす
るパッケージカバーの製造方法。
(1) The surface of a metal cover made of Fe-Ni alloy, Fe-Ni-Co alloy, etc. is first plated with nickel in a sulfamic acid bath and then in a Watts bath, and then the nickel plating film is plated in an acid bath and then in a neutral bath. A method for manufacturing a package cover, characterized in that the package cover is plated with gold.
JP13155988A 1988-05-31 1988-05-31 Manufacture of package cover Pending JPH01302844A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13155988A JPH01302844A (en) 1988-05-31 1988-05-31 Manufacture of package cover

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13155988A JPH01302844A (en) 1988-05-31 1988-05-31 Manufacture of package cover

Publications (1)

Publication Number Publication Date
JPH01302844A true JPH01302844A (en) 1989-12-06

Family

ID=15060901

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13155988A Pending JPH01302844A (en) 1988-05-31 1988-05-31 Manufacture of package cover

Country Status (1)

Country Link
JP (1) JPH01302844A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5583379A (en) * 1993-09-03 1996-12-10 Ngk Spark Plug Co., Ltd. Outer lead for a semiconductor IC package having individually annealed plated layers

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5583379A (en) * 1993-09-03 1996-12-10 Ngk Spark Plug Co., Ltd. Outer lead for a semiconductor IC package having individually annealed plated layers
US5668060A (en) * 1993-09-03 1997-09-16 Ngk Spark Plug Co., Ltd. Outer lead for a semiconductor IC package and a method of fabricating the same

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