JPH01302119A - Semiconductor acceleration sensor - Google Patents
Semiconductor acceleration sensorInfo
- Publication number
- JPH01302119A JPH01302119A JP13309688A JP13309688A JPH01302119A JP H01302119 A JPH01302119 A JP H01302119A JP 13309688 A JP13309688 A JP 13309688A JP 13309688 A JP13309688 A JP 13309688A JP H01302119 A JPH01302119 A JP H01302119A
- Authority
- JP
- Japan
- Prior art keywords
- groove
- movable end
- semiconductor
- weight
- support beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 20
- 230000001133 acceleration Effects 0.000 title claims description 12
- 239000000853 adhesive Substances 0.000 abstract description 4
- 230000001070 adhesive effect Effects 0.000 abstract description 4
- 230000035882 stress Effects 0.000 abstract description 4
- 229910000679 solder Inorganic materials 0.000 abstract description 2
- 230000008642 heat stress Effects 0.000 abstract 1
- 230000008646 thermal stress Effects 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 230000035945 sensitivity Effects 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 238000001514 detection method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 2
- 229910001369 Brass Inorganic materials 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 229910000833 kovar Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
Landscapes
- Pressure Sensors (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分舒〕
この発明は、半導体支持ばりを用いたピエゾ抵抗による
半導体加速度センサに関し、特に可動端部の重りの付着
手段にかかわる。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application] The present invention relates to a piezoresistive semiconductor acceleration sensor using a semiconductor support beam, and particularly to a means for attaching a weight to a movable end.
第4図及び第5図は例えば、特開昭62−221184
号公報に示された半導体加速度センサを示す要部平面図
及び正面図である。図において、1はシリコンからなる
片持ばりで、固定端部近くの裏面部に溝部1龜が設けら
れ、上部が局部的に薄肉部1bにされ、センサ感度を高
めている。乙の薄肉部1b表面部には拡散による複数(
図では4個)のピエゾ抵抗2が形成されていて、ブリッ
ジ回路に構成されている。片持ば外1の可動端部には重
り3が接着されている。支持ばり1は固定端が固定部の
台座4に接合され固定されている。4 and 5 are, for example, Japanese Patent Application Laid-Open No. 62-221184.
FIG. 1 is a plan view and a front view of main parts of a semiconductor acceleration sensor disclosed in the publication. In the figure, reference numeral 1 denotes a cantilever beam made of silicon, and a groove 1 is provided on the back surface near the fixed end, and the upper portion is locally made into a thin wall 1b to enhance sensor sensitivity. A plurality of (
In the figure, four piezoresistors 2) are formed, and are configured into a bridge circuit. A weight 3 is glued to the movable end of the cantilever 1. The fixed end of the support beam 1 is joined and fixed to a pedestal 4, which is a fixed part.
上記のように片持ばり1の可動端部に重り3を付加し、
加速度によるたわみを大きくし感度を高めている。Add the weight 3 to the movable end of the cantilever beam 1 as described above,
Sensitivity is increased by increasing deflection due to acceleration.
上記のような従来の半導体加速度センサでは、片持ば9
1に接着された重りが、接着が完了した時点で正常な位
置からずれ、このため検出精度が低下したり、また、接
着の結果、温度変化により熱応力が発生し、拡散ピエゾ
抵抗がこの影響を受け、センサ出力の温度オフセットド
リフトが生じるなどの問題点があった。In the conventional semiconductor acceleration sensor as described above, the cantilever 9
The weight bonded to 1 may shift from its normal position when bonding is completed, resulting in a decrease in detection accuracy.Also, as a result of bonding, thermal stress is generated due to temperature changes, and the diffused piezoresistance is affected by this. As a result, there were problems such as a temperature offset drift in the sensor output.
この発明は、このような問題点を解決するためになされ
たもので、支持ぼりに重りが正確な位置に容易に接着さ
れ、接着による熱応力を原因とするセンサ出力の温度オ
フセットドリフトを低減することを目的としている。This invention was made to solve these problems, and allows the weight to be easily adhered to the support beam at an accurate position, thereby reducing temperature offset drift in the sensor output caused by thermal stress caused by adhesion. The purpose is to
この発明にかかる半導体加速度センサは、半導体支持ば
りの可動端部の表面と裏面とのうち少なくとも表面に幅
方向の切込み溝を設け、重9の接合面に上記切込み溝に
係合する突部を設け、重りの突部を上記切欠き溝に係合
させ、重りを支持ば〜の可動端部上に接着剤により接合
したものである。In the semiconductor acceleration sensor according to the present invention, cut grooves in the width direction are provided on at least the front and back surfaces of the movable end portion of the semiconductor support beam, and a protrusion that engages with the cut groove is provided on the joint surface of the weight 9. The protrusion of the weight is engaged with the notched groove, and the weight is bonded to the movable end of the support rod using an adhesive.
この発明においては、支持ばりの可動端部に重りの突部
が切込み溝に係合されており、位置ずれすることなく正
確に位置合わせされる。また、支持ぼりに発生する、重
り接着を原因とした残留応力はこの切欠き溝に集中され
、固定端部近くの薄肉部への影響がなくされる。このた
め、環境温度変化によって変動する残留応力を原因とし
た、センサのオフセット出力のドリフト量は軽減される
。In this invention, the protrusion of the weight is engaged with the cut groove at the movable end of the support beam, so that the support beam can be accurately aligned without being displaced. In addition, residual stress generated in the support beam due to weight adhesion is concentrated in this notch groove, and does not affect the thin wall portion near the fixed end. Therefore, the amount of drift in the offset output of the sensor caused by residual stress that varies due to environmental temperature changes is reduced.
第1図及び第2図はこの発明による半導体加速度センサ
の一実施例の片持ば^部及び重りを示す。FIGS. 1 and 2 show a cantilever portion and a weight of an embodiment of a semiconductor acceleration sensor according to the present invention.
第1図において、シリコンからなる半導体片持ばりIf
には、固定端部近くに溝部11mがエツチングにより設
けられ、局所的に薄肉部11hが形成されていて、セン
サ感度を高めている。片持ばり11の可動端部の上部及
び下部には、応力集中用の切込み溝11e及びlidが
幅方向に形成されている。これらの溝11c、 lld
はエツチングにより、又は切削加工により形成する。片
持ばす11の薄肉部11bの表面部には、上記第4図と
同様に拡散により複数のピエゾ抵抗12が形成されブリ
ッジ回路に構成されている。片持ばす11の固定端は台
座4に接合固定されろ。In FIG. 1, a semiconductor cantilever beam If made of silicon
A groove portion 11m is provided by etching near the fixed end portion, and thin portions 11h are locally formed to enhance sensor sensitivity. At the upper and lower portions of the movable ends of the cantilever beams 11, cut grooves 11e and lids for stress concentration are formed in the width direction. These grooves 11c, lld
is formed by etching or cutting. On the surface of the thin portion 11b of the cantilever 11, a plurality of piezoresistors 12 are formed by diffusion as in FIG. 4, forming a bridge circuit. The fixed end of the cantilever 11 is joined and fixed to the pedestal 4.
第2図において、シリコン、はんだ、黄銅、コバール合
金などからなる重り13には、挾み溝13mが形成され
、この挾み溝13mには支持ばり11の可動端部上面に
接する接合面に、上記切込み溝lieに係合する突起1
3bが形成されている。In FIG. 2, a clamping groove 13m is formed in the weight 13 made of silicon, solder, brass, Kovar alloy, etc., and in this clamping groove 13m, a joint surface in contact with the upper surface of the movable end of the support beam 11 has a clamping groove 13m. Projection 1 that engages with the cut groove lie
3b is formed.
この重り13を第3図に示すように、片持ばり11の可
動端部に接着剤により接着する。挾み溝13gで支持ば
り11にまたがってはまり、突起13bが切込み溝11
cに係合し、ずれることなく正確に位置決めされて接合
される。This weight 13 is bonded to the movable end of the cantilever beam 11 with an adhesive, as shown in FIG. It fits across the support beam 11 in the pinch groove 13g, and the protrusion 13b fits into the cut groove 11.
c, and are accurately positioned and joined without shifting.
上記一実施例の加速度センサにおいて、片持ばり11へ
の重す13の接着の結果、温度変化により発生する熱応
力、すなわち、双方の線膨張率の差異による熱応力が、
切込み溝11c、 lldの介在により逃され、薄肉部
11bへの影響が低減され、これによる検出誤差がなく
される。In the acceleration sensor of the above embodiment, the thermal stress generated due to temperature change as a result of adhering the weight 13 to the cantilever beam 11, that is, the thermal stress due to the difference in the coefficient of linear expansion between the two, is
The cut grooves 11c and lld are provided to reduce the influence on the thin portion 11b, thereby eliminating detection errors.
なお、上記実施例では半導体支持ばりとして、半導体片
持ばり11を用いたが、両端固定で中間部を可動部とし
重りを付着した半導体両持ばりの場合にも適用できろも
のである。In the above embodiment, the semiconductor cantilever beam 11 was used as the semiconductor support beam, but the present invention can also be applied to a semiconductor double-sided beam in which both ends are fixed, the middle part is a movable part, and a weight is attached.
また、上記実施例では、片持ばす11の可動端部の裏面
に切込み溝lidを設けたが、場合によっては省いても
よい。Further, in the above embodiment, the cut groove lid was provided on the back surface of the movable end of the cantilever 11, but it may be omitted depending on the case.
以上のように、この発明によれば、半導体支持ばりの可
動端部の表面と裏面のうち、少なくとも表面に幅方向の
切込み溝を設け、重りの接合面に上記切込み溝に係合す
る突部を設け、突部を切込み溝に係合させ、重りを接着
剤により支持ばりの可動端部に接着したので、重りが支
持ぼりに位置ずれすることなく正確な位置に接合され、
また、接着が原因で発生する重りとはり材料の熱膨張差
によった熱応力が上記切込み溝部に集中され、支持ばり
の固定端部近(の薄肉部への影響が防止される。このた
め、この熱応力を原因とした、センサオフセット出力の
変動は軽減される。As described above, according to the present invention, a cut groove in the width direction is provided on at least the front surface and the back surface of the movable end portion of the semiconductor support beam, and a protrusion that engages with the cut groove is provided on the joint surface of the weight. , the protrusion is engaged with the cut groove, and the weight is bonded to the movable end of the support beam with adhesive, so the weight can be joined to the support beam in an accurate position without shifting.
In addition, the thermal stress caused by the difference in thermal expansion between the weight and the beam material caused by adhesion is concentrated in the cut groove, and is prevented from affecting the thin wall part near the fixed end of the support beam. , fluctuations in the sensor offset output caused by this thermal stress are reduced.
第1図ないし第3図はこの発明による半導体加速度セン
サの一実施例を示し、第1図ば片持ばりの斜視図、第2
図(a)及び(b)は重9の一部断面した正面図及び側
面図、第3図は第1図の片持ばりに第2図の重りを付加
した加速度センサの斜視図、第4図及び第5図は従来の
半導体加速度センサの平面図及び正面図である。
図中、11は半導体支持ぼり(片持ばり)、l1mは溝
部、llbは薄肉部、lie、lidは切込み溝、12
はピエゾ抵抗、13は重り、13aは挾み溝、13bは
突起である。
尚、図中同一符号は同−又は相当部分を示す。1 to 3 show an embodiment of a semiconductor acceleration sensor according to the present invention, in which FIG. 1 is a perspective view of a cantilever beam, and FIG. 2 is a perspective view of a cantilever beam;
Figures (a) and (b) are a partially sectional front view and side view of the weight 9, Figure 3 is a perspective view of an acceleration sensor with the weight shown in Figure 2 added to the cantilever beam of Figure 1, and Figure 4. 5 are a plan view and a front view of a conventional semiconductor acceleration sensor. In the figure, 11 is a semiconductor support beam (cantilever beam), l1m is a groove part, llb is a thin wall part, lie and lid are cut grooves, 12
13 is a piezoresistor, 13 is a weight, 13a is a clamping groove, and 13b is a protrusion. Note that the same reference numerals in the figures indicate the same or corresponding parts.
Claims (1)
にされ、可動端部には表面と裏面のうち、少なくとも表
面に応力集中の切込み溝が幅方向に形成された半導体支
持ばり、上記薄肉部の表面部に形成されブリッジ回路に
構成された複数のピエゾ抵抗、上記支持ばりの可動端部
の表面に接する接合面に上記切込み溝にはまる係合突起
が形成されており、この係合突起が切込み溝に係合され
、支持ばりの可動端部上に接着付加された重りを備えた
半導体加速度センサ。A semiconductor supporting burr having a groove portion formed on the back surface near the fixed end and a thin-walled upper portion, and a semiconductor support burr having a cut groove for stress concentration formed in the width direction on at least the front surface and the back surface of the movable end portion; A plurality of piezoresistors are formed on the surface of the thin wall part and configured into a bridge circuit, and an engagement protrusion that fits into the cut groove is formed on the joint surface that contacts the surface of the movable end of the support beam. A semiconductor acceleration sensor having a protrusion engaged in a notch and a weight adhesively attached onto a movable end of a support beam.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13309688A JPH01302119A (en) | 1988-05-30 | 1988-05-30 | Semiconductor acceleration sensor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13309688A JPH01302119A (en) | 1988-05-30 | 1988-05-30 | Semiconductor acceleration sensor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01302119A true JPH01302119A (en) | 1989-12-06 |
Family
ID=15096741
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13309688A Pending JPH01302119A (en) | 1988-05-30 | 1988-05-30 | Semiconductor acceleration sensor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01302119A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7692365B2 (en) * | 2005-11-23 | 2010-04-06 | Microstrain, Inc. | Slotted beam piezoelectric composite |
-
1988
- 1988-05-30 JP JP13309688A patent/JPH01302119A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7692365B2 (en) * | 2005-11-23 | 2010-04-06 | Microstrain, Inc. | Slotted beam piezoelectric composite |
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