JPH01298009A - Production of metal multiple chalcogenides - Google Patents
Production of metal multiple chalcogenidesInfo
- Publication number
- JPH01298009A JPH01298009A JP12694588A JP12694588A JPH01298009A JP H01298009 A JPH01298009 A JP H01298009A JP 12694588 A JP12694588 A JP 12694588A JP 12694588 A JP12694588 A JP 12694588A JP H01298009 A JPH01298009 A JP H01298009A
- Authority
- JP
- Japan
- Prior art keywords
- metal
- chalcogenides
- composition
- org
- solvent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 41
- 239000002184 metal Substances 0.000 title claims abstract description 39
- 150000004770 chalcogenides Chemical class 0.000 title claims abstract description 23
- 238000004519 manufacturing process Methods 0.000 title claims description 10
- 229910052717 sulfur Inorganic materials 0.000 claims abstract description 5
- 229910052711 selenium Inorganic materials 0.000 claims abstract description 4
- 229910052714 tellurium Inorganic materials 0.000 claims abstract description 3
- 125000004432 carbon atom Chemical group C* 0.000 claims description 7
- 239000002131 composite material Substances 0.000 claims description 6
- 239000002905 metal composite material Substances 0.000 claims description 5
- 125000000962 organic group Chemical group 0.000 claims description 4
- 239000000203 mixture Substances 0.000 abstract description 14
- 239000010409 thin film Substances 0.000 abstract description 11
- 239000000843 powder Substances 0.000 abstract description 9
- 229910052798 chalcogen Inorganic materials 0.000 abstract description 8
- 150000001787 chalcogens Chemical class 0.000 abstract description 8
- 239000002904 solvent Substances 0.000 abstract description 8
- 150000002739 metals Chemical class 0.000 abstract description 7
- 239000000758 substrate Substances 0.000 abstract description 7
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 abstract description 4
- 238000005118 spray pyrolysis Methods 0.000 abstract description 4
- 239000011261 inert gas Substances 0.000 abstract description 3
- 239000010408 film Substances 0.000 description 11
- 239000010949 copper Substances 0.000 description 10
- 239000011701 zinc Substances 0.000 description 10
- 238000000576 coating method Methods 0.000 description 9
- 239000011248 coating agent Substances 0.000 description 8
- 150000001875 compounds Chemical class 0.000 description 8
- 238000000034 method Methods 0.000 description 8
- 239000000243 solution Substances 0.000 description 8
- 229910052757 nitrogen Inorganic materials 0.000 description 7
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 6
- 229910052793 cadmium Inorganic materials 0.000 description 6
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 6
- 229910052738 indium Inorganic materials 0.000 description 6
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 5
- 238000001035 drying Methods 0.000 description 5
- 150000002902 organometallic compounds Chemical class 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 4
- 238000010304 firing Methods 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 238000005507 spraying Methods 0.000 description 4
- 229910052725 zinc Inorganic materials 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- QGJOPFRUJISHPQ-UHFFFAOYSA-N Carbon disulfide Chemical compound S=C=S QGJOPFRUJISHPQ-UHFFFAOYSA-N 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- -1 e with a metal salt Chemical class 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- SPVXKVOXSXTJOY-UHFFFAOYSA-N selane Chemical compound [SeH2] SPVXKVOXSXTJOY-UHFFFAOYSA-N 0.000 description 3
- 229910000058 selane Inorganic materials 0.000 description 3
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 2
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 229910052787 antimony Inorganic materials 0.000 description 2
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 2
- LMBWSYZSUOEYSN-UHFFFAOYSA-N diethyldithiocarbamic acid Chemical compound CCN(CC)C(S)=S LMBWSYZSUOEYSN-UHFFFAOYSA-N 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 229950004394 ditiocarb Drugs 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 239000005297 pyrex Substances 0.000 description 2
- 239000010948 rhodium Substances 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 238000007650 screen-printing Methods 0.000 description 2
- 229910052979 sodium sulfide Inorganic materials 0.000 description 2
- GRVFOGOEDUUMBP-UHFFFAOYSA-N sodium sulfide (anhydrous) Chemical compound [Na+].[Na+].[S-2] GRVFOGOEDUUMBP-UHFFFAOYSA-N 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- VTLHPSMQDDEFRU-UHFFFAOYSA-N tellane Chemical compound [TeH2] VTLHPSMQDDEFRU-UHFFFAOYSA-N 0.000 description 2
- 229910000059 tellane Inorganic materials 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- RRQYJINTUHWNHW-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethoxy)ethane Chemical compound CCOCCOCCOCC RRQYJINTUHWNHW-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910004613 CdTe Inorganic materials 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 240000001980 Cucurbita pepo Species 0.000 description 1
- 235000009852 Cucurbita pepo Nutrition 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- 239000001856 Ethyl cellulose Substances 0.000 description 1
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- SUAKHGWARZSWIH-UHFFFAOYSA-N N,N‐diethylformamide Chemical compound CCN(CC)C=O SUAKHGWARZSWIH-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 229910052777 Praseodymium Inorganic materials 0.000 description 1
- 229910018110 Se—Te Inorganic materials 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910007709 ZnTe Inorganic materials 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- UHYPYGJEEGLRJD-UHFFFAOYSA-N cadmium(2+);selenium(2-) Chemical compound [Se-2].[Cd+2] UHYPYGJEEGLRJD-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 235000010980 cellulose Nutrition 0.000 description 1
- 239000003610 charcoal Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 150000004292 cyclic ethers Chemical class 0.000 description 1
- 229940019778 diethylene glycol diethyl ether Drugs 0.000 description 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000004210 ether based solvent Substances 0.000 description 1
- 235000010944 ethyl methyl cellulose Nutrition 0.000 description 1
- 150000003948 formamides Chemical class 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910000037 hydrogen sulfide Inorganic materials 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229910052976 metal sulfide Inorganic materials 0.000 description 1
- 229920000609 methyl cellulose Polymers 0.000 description 1
- 239000001923 methylcellulose Substances 0.000 description 1
- 235000010981 methylcellulose Nutrition 0.000 description 1
- 229920003087 methylethyl cellulose Polymers 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 238000000053 physical method Methods 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- PUDIUYLPXJFUGB-UHFFFAOYSA-N praseodymium atom Chemical compound [Pr] PUDIUYLPXJFUGB-UHFFFAOYSA-N 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- VPQBLCVGUWPDHV-UHFFFAOYSA-N sodium selenide Chemical compound [Na+].[Na+].[Se-2] VPQBLCVGUWPDHV-UHFFFAOYSA-N 0.000 description 1
- MQRWPMGRGIILKQ-UHFFFAOYSA-N sodium telluride Chemical compound [Na][Te][Na] MQRWPMGRGIILKQ-UHFFFAOYSA-N 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 229910052716 thallium Inorganic materials 0.000 description 1
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 description 1
- 238000003852 thin film production method Methods 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- BOXSVZNGTQTENJ-UHFFFAOYSA-L zinc dibutyldithiocarbamate Chemical compound [Zn+2].CCCCN(C([S-])=S)CCCC.CCCCN(C([S-])=S)CCCC BOXSVZNGTQTENJ-UHFFFAOYSA-L 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は分子中の有機構造部分にカルコゲン元素を含む
2種以上の有機金属化合物と有機溶媒とからなる組成物
を熱分解して金、17j1’eM合カルコゲナイド類を
製造する方法に関する。Detailed Description of the Invention [Industrial Application Field] The present invention produces gold, The present invention relates to a method for producing 17j1'eM chalcogenides.
金属カルコゲナイド類は、その色彩を生かした顔料、ま
たその半導体特性、先導伝体特性を生かした太陽電池、
受光素子、映像記録装置、ケイ光体特性を利用したEl
、素子等に広く用いられており。Metal chalcogenides are used as pigments that take advantage of their colors, as well as solar cells that take advantage of their semiconductor and conductor properties.
El that utilizes light receiving elements, video recording devices, and phosphor characteristics
It is widely used in devices, etc.
カルコゲン元素の複合化、金属の複合化により色彩の調
整、半導体としてのバンドギャップのコントロールが可
能となり更に高度な対応が可能となる。例えば、 Cd
5−CdSe系においてS、Seの組成比を変えること
により膜の色調を黄色から赤色の間で調整することがで
きろ。By combining chalcogen elements and metals, it is possible to adjust the color and control the band gap as a semiconductor, making it possible to handle even more advanced applications. For example, Cd
In the 5-CdSe system, the color tone of the film can be adjusted from yellow to red by changing the composition ratio of S and Se.
従来、金属カルコゲナイドの合成方法としては、■)硫
化水素H2S、セレン化水素H2Se、テルル化水素I
t2Teに金属、金属塩、有機金属化合物等と反応させ
る方法、2)水溶液中硫化ナトリウムNa2S、セレン
化ナトリウムNa25e、テルル化ナトリウムNa2T
e等の化合物と金属塩との反応により合成する方法、3
)単体のイオウと金属との直接反応による方法等が知ら
れている。しかしこれらの方法は近来用途が拡大して来
た薄膜状の金属カルコゲナイドを得るには必ずしも適当
な製造法とはいい難い。例えば太陽電池、受光素子、映
像記録装置等のデバイス、装置への応用にはZnS、Z
n5e、 ZnTe、CdS、 CdSe、CdTe、
CuInSe2、CuInTe3等の金属力ルコゲナ
イ1−の薄膜作成が重要な技術となっている。薄膜作成
の方法としては、金属力ルコゲナイ1〜の微粉末を有機
バインダーとペースト化し基体に印刷後焼成する方法、
金属カルコゲナイドを真空蒸着、スパッタリング等によ
り薄膜化する物理的方法等があるが、これらは何れも金
属カルコゲナイドを製造した後の薄膜化処理に可成りな
手数と工夫を要する。また粉末の焼結により膜が形成さ
れるため膜の均一性が金属カルコゲナイドの粒径や粒度
分布に左右される。さらに数100〜数l、O″OOA
OOA程度のよい金属カルコゲナイド粉末が得難いため
ミクロンオーダー以下の薄膜の形成が困難である。また
H2S、 H2Se、 H2Teと有機金属化合物のガ
スを基体表面で反応させ薄膜化させるCVD法等は装置
が複雑で製造コス1〜の低減が難しくまた大きな面積の
被膜を作るのが困難であり生産性に劣る。さらに被膜を
形成する基体の形状も限られる。Conventionally, methods for synthesizing metal chalcogenides include: ■) Hydrogen sulfide H2S, hydrogen selenide H2Se, hydrogen telluride I
Method of reacting t2Te with metals, metal salts, organometallic compounds, etc., 2) Sodium sulfide Na2S, sodium selenide Na25e, sodium telluride Na2T in aqueous solution
Method of synthesis by reaction of a compound such as e with a metal salt, 3
) A method based on a direct reaction between simple sulfur and a metal is known. However, these methods cannot necessarily be said to be suitable production methods for obtaining thin film-like metal chalcogenides, whose applications have recently expanded. For example, ZnS, Z
n5e, ZnTe, CdS, CdSe, CdTe,
The production of thin films of metallic lucogenes such as CuInSe2 and CuInTe3 has become an important technology. The thin film production method includes a method in which a fine powder of Metallic Lucogenia 1 is made into a paste with an organic binder, printed on a substrate, and then fired;
There are physical methods for thinning metal chalcogenide by vacuum evaporation, sputtering, etc., but all of these methods require considerable effort and effort in the thinning treatment after producing metal chalcogenide. Furthermore, since the film is formed by sintering the powder, the uniformity of the film depends on the particle size and particle size distribution of the metal chalcogenide. Furthermore, several hundred to several liters, O″OOA
Since it is difficult to obtain metal chalcogenide powder with a good OOA level, it is difficult to form a thin film on the order of microns or less. In addition, CVD methods, which make thin films by reacting H2S, H2Se, H2Te, and organometallic compound gases on the surface of a substrate, require complicated equipment, making it difficult to reduce production costs by 1 or more, and making it difficult to create films with large areas, making production difficult. inferior to sex. Furthermore, the shape of the substrate on which the coating is formed is also limited.
本発明者らは、薄膜化が容易であり、かつペーストとし
て塗布、焼結する場合でも均一な薄膜とすることができ
る金属カルコゲナイドの製造法につき研究を進めた結果
、カルコゲン元素(S、Sc、Te)が異なる複数の金
属カルコゲナイドを適当な溶媒に溶解した組成物を不活
性雰囲気下で熱分解すれば容易に金属複合カルコゲナイ
ドを製造できることを見出した。また更に、上記組成物
基板にディッピング、スピンコーティング、スプレィ等
の方法により塗布した後に乾燥、不活性雰囲気上焼成す
ることにより非常に均一性の良い金属複合カルコゲナイ
ドの被膜が得られること、またこの組成物をスプレーパ
イロリシス法により分解することにより粒系0.2〜0
.8μ程度の微粉末を得ることも可能であることを見い
だした。さらに、異なる金属の組合せにより複合金属の
複合カルコゲナイドの製造も可能であることを知見した
。The present inventors have conducted research on a method for producing metal chalcogenide, which is easy to form into a thin film and can be made into a uniform thin film even when applied as a paste and sintered. It has been found that a metal composite chalcogenide can be easily produced by thermally decomposing a composition in which a plurality of metal chalcogenides having different Te) are dissolved in an appropriate solvent in an inert atmosphere. Furthermore, it is possible to obtain a highly uniform metal composite chalcogenide coating by applying the above composition to a substrate by dipping, spin coating, spraying, etc., followed by drying and baking in an inert atmosphere. By decomposing the material by spray pyrolysis method, the particle size is 0.2 to 0.
.. It has been found that it is also possible to obtain a fine powder of about 8μ. Furthermore, we found that it is possible to produce composite chalcogenides made of composite metals by combining different metals.
本発明によれば金属N、N−ジアルキル力ルコゲノ力ル
バメ−1・類、および
CM (XxO2−xCN R,)、、〕金属アルコキ
シカルコゲノカルボナート類CM(XxO,、COR)
n)
(M=金属元素、R=炭’Jal 〜10(7)有機u
; X=S、Se、Te; n=1〜5 ; x=1
,2)から選ばれる。カルコゲン元素が異なる複数の化
合物と有機溶媒とから成る組成物を不活性雰囲気下で熱
分解することにより単一金属複合力ルコゲナイドまたは
複合金属複合カルコゲナイドを製造する方法が提供され
る。According to the present invention, metal N, N-dialkyl chalcogenocarbonates, and CM (XxO2-xCNR,),] metal alkoxychalcogenocarbonates CM (XxO,,COR)
n) (M=metal element, R=charcoal ~10(7) organic u
; X=S, Se, Te; n=1-5; x=1
, 2). Provided is a method for producing a single metal complex chalcogenide or a multimetal complex chalcogenide by thermally decomposing a composition comprising a plurality of compounds containing different chalcogen elements and an organic solvent in an inert atmosphere.
本発明においては、 構造式 (式中Mは金属元素、Rは炭素数1〜]0の有機基。In the present invention, Structural formula (In the formula, M is a metal element, and R is an organic group having 1 to 0 carbon atoms.
Xはカルコゲン元素、nは1〜5の整数)で表わされる
金属N、N−ジアルキルジ力ルコゲノ力ルバメート、
構造式
(式中Mは金属元素、Rは炭素数1〜10の有機基、X
はカルコゲン元素、nは1〜5の整数)で表わされる金
属アルコキシジ力ルコゲノカルボナート、
構造式
(式中Mは金属元素、Rは炭素数1〜10の有機基、又
はカルコゲン元素、nは1〜5の整数)で表わされる金
ricN 、 N−ジアルキルモノカルコゲノカルバメ
ート、
溝造式
(式中Mは金属元素、Rは炭素数1〜10の有機基、X
はカルコゲン元素、nは1〜5の整数)で表わされる金
属アルコキシモノカルコゲノカルボナート、からなる群
から選ばれる有機金属化合物が用いられる。X is a chalcogen element, n is an integer of 1 to 5) metal N, N-dialkyl dihydrucogeno Rubamate, structural formula (wherein M is a metal element, R is an organic group having 1 to 10 carbon atoms,
is a chalcogen element; is an integer of 1 to 5), N-dialkylmonochalcogenocarbamate, Mizozo formula (where M is a metal element, R is an organic group having 1 to 10 carbon atoms,
An organometallic compound selected from the group consisting of a metal alkoxymonochalcogenocarbonate represented by a chalcogen element and n an integer of 1 to 5 is used.
金属元素は例えば亜鉛Zn、 銅Cu、タリウムTQ
、ニッケルNi、パラジウムPd、プラセオジムPr、
カドミウムcd、インジウムIn、アンチモンsb、ニ
オブ怜、タンタルTa、モリブデンMO、タングステン
W、クロムCr、ロジウムRh、 コバルトCO1鉄F
e、等である。Examples of metal elements include zinc Zn, copper Cu, and thallium TQ.
, nickel Ni, palladium Pd, praseodymium Pr,
Cadmium CD, Indium In, Antimony SB, Niobium Rei, Tantalum Ta, Molybdenum MO, Tungsten W, Chromium Cr, Rhodium Rh, Cobalt CO1 Iron F
e, etc.
置換基Rは特に制限はないが高濃度溶液の調整の為とは
炭素数が大きい置換基の方が有利であるが、ただし炭素
数があまり大きくなると熱分解した場合にカーボンが残
り易くなるため炭素数が10を越えないことが望ましい
。There are no particular restrictions on the substituent R, but for the purpose of preparing a highly concentrated solution, a substituent with a large number of carbon atoms is more advantageous; however, if the number of carbon atoms is too large, carbon tends to remain when thermally decomposed. It is desirable that the number of carbon atoms does not exceed 10.
本発明で用いる上記有機金属化合物の具体例を以下に示
す。尚、上記有機金属化合物はこれらに限定されない。Specific examples of the organometallic compounds used in the present invention are shown below. Note that the above-mentioned organometallic compounds are not limited to these.
壮狂堕し几
銅(II )N、N−ジエチルジ力ルコゲノ力ルバメー
ト Cu (X2CNEt2)。Sokyo Fallen Copper (II) N,N-diethyl dirucogenolbamate Cu (X2CNEt2).
銅(I[)N、N−ジブチルジカルコゲノ力ルバメート
Cu (X2 CxBuz )z亜鉛(n)N、N−
ジブチルジカルコゲノ力ルバメート Zn (X2Cλ
BI42)。Copper (I[)N,N-dibutyldichalcogenolbamate Cu (X2 CxBuz)zzinc (n)N,N-
Dibutyl dichalcogenolbamate Zn (X2Cλ
BI42).
亜鉛(1’l)N、N−ジプロピルレジ力ルコゲノ力ル
バメート Zn(X2Cλ’Pr、)。Zinc (1'l)N,N-dipropyl lucogenorubamate Zn (X2Cλ'Pr,).
鉄(n)N、N−ジブチルジカルコゲノ力ルバメート
Fe(X2CNBu、)28!(II)−ジブチルジカ
ルコゲノ力ルバメーh Sn (X、0NBu、 )
。Iron(n)N,N-dibutyldichalcogenolbamate
Fe(X2CNBu,)28! (II)-dibutyl dichalcogenolbame h Sn (X, 0NBu, )
.
ニッケルN、N−ジエチルジ力ルコゲノ力ルバメート
N1(X2C\F!j2)jニッケルへ、N−ジプロピ
ルジ力ルコゲノ力ルバメート Nj (X2CNPr2
)。Nickel N, N-diethyl dilucogenolbamate
N1(X2C\F!j2)j to nickel, N-dipropyl dihydrocogenolubamate Nj (X2CNPr2
).
インジウムN、N−ジエチルジ力ルコゲノ力ルバメート
In(X2CNEt)。Indium N,N-diethyldihydrucogenolbamate In (X2CNEt).
インジウムNlN−ジブチルジカルコゲノカルバメート
In(X2Cλ“I3u□)3インジウムN、N−ジ
エチルモカルコゲノカルバメート In(X2CNPe
nt、)3カドミウムN、N−ジプロピルジカルコゲノ
カルバメート Cd (X2CNPr2)zコバルトN
、N−ジブロピルジカルコゲノカルバメ−1−co(X
2C入Prz)rアンチモンN、N−ジブチルジカルコ
ゲノ力ルバメート Sb (Xz CNBuz )3ゲ
ルマニウムN、N−ジプロピルジカルコゲノ力ルバメー
ト □□□(X2CNPr2)。Indium NlN-dibutyldichalcogenocarbamate In(X2Cλ"I3u□)3Indium N,N-diethylmochalcogenocarbamate In(X2CNPe
nt, )3 Cadmium N, N-dipropyl dichalcogenocarbamate Cd (X2CNPr2)z Cobalt N
, N-dibropyrudichalcogenocarbame-1-co(X
2C-containing Prz) r antimony N, N-dibutyl dichalcogenol rubamate Sb (Xz CNBuz) 3 germanium N, N-dipropyl dichalcogen rubamate □□□ (X2CNPr2).
チタニウムN、N−ジエチルジ力ルコゲノ力ルバメート
Ti(X2CNEt、)4!瓢
銅(n)−ペンチルジカルコゲノカルボナート Cu(
X2COPent)2鉄(U)−ペンチルジカルコゲノ
カルボナート Fe(X2COPent)2釦−エチル
ジカルコゲノカルボナート Pb (X2COEt)3
カトミウムーブチルジ力ルコゲノ力ルボナート ω(X
2cOB、)2力1−ミウムープロピルジ力ルコゲノカ
ルボナー+” cd(X2COPr)2アンチモン−
プロビルジカルコゲノカルボナート 5b(X、C0P
r)。Titanium N,N-diethyldilucogenolubamate Ti(X2CNEt,)4! Gourd copper(n)-pentyl dichalcogenocarbonate Cu(
X2COPent)2Iron(U)-pentyldichalcogenocarbonate Fe(X2COPent)2button-ethyldichalcogenocarbonate Pb (X2COEt)3
Catomium move butyl dilucogenolubonate ω(X
2cOB,) 2-1-mium-propyl di-lucogenocarboner+” cd(X2COPr)2-antimony-
Probil dichalcogenocarbonate 5b (X, C0P
r).
町メ袴■。Town hakama■.
亜鉛(U)N、N−ジブチルモノカルコゲノカルバメー
トM4(II)x,x−ジエチルモノカルコゲノカルバ
メート Cu (X2CNEt2)2インジウムNバー
ジエチルモノカルコゲノカルバメート1炊ν勲。Zinc (U) N, N-dibutyl monochalcogenocarbamate M4 (II) x, x-diethyl monochalcogenocarbamate Cu (X2CNEt2)2 Indium N-dibutyl monochalcogenocarbamate 1.
カドミウム−プロピルモノカルコゲノカルボナート溶媒
としては、次のものを用いることができる。As the cadmium-propyl monochalcogenocarbonate solvent, the following can be used.
ペンタン、n−ヘキサン、シクロヘキサン等の脂肪属炭
化水素類、ソルベントナブサ等の硬油類、ベンゼシ、ト
ルエン、キシレン、等の芳香族炭化水素、塩化メチレン
、クロロホルム等のハロゲン化炭化水素、テトラヒドロ
フラン、ジオキサン等の環状エーテル、ジエチレングリ
コールジエチルエーテル、ジエチレングリコールジメチ
ルエーテル等のエーテル系溶媒、メチルセルロソルブ、
エチルセルロソルブ等のセルロソルブ類、ジメチルホル
ムアミド、ジエチルホルムアミド等のホルムアミド類,
ジエチルアミン、エチレンジアミン、1〜リエタノール
アミン等のアミン類、アセトン、メチルエチルケトン等
のケトン類二硫化炭素等である。溶媒は、単独でも数種
類を組み合わせてもよい。また塗布性能の向上、スクリ
ーン印刷への適用のためメチルセルロース、エチルセル
ロース等のセルロース類、その他ポリエチレンオキシド
、ポリビニルブチラール等の高分子物質を添加すること
も可能である。aliphatic hydrocarbons such as pentane, n-hexane, and cyclohexane; hard oils such as Solvent Nabtha; aromatic hydrocarbons such as benzene, toluene, and xylene; halogenated hydrocarbons such as methylene chloride and chloroform; tetrahydrofuran; Cyclic ethers such as dioxane, ether solvents such as diethylene glycol diethyl ether, diethylene glycol dimethyl ether, methylcellulosolve,
Cellulosolves such as ethylcellulosolve, formamides such as dimethylformamide and diethylformamide,
These include amines such as diethylamine, ethylenediamine, and 1-liethanolamine, ketones such as acetone and methyl ethyl ketone, and carbon disulfide. The solvents may be used alone or in combination. In addition, celluloses such as methyl cellulose and ethyl cellulose, and other polymeric substances such as polyethylene oxide and polyvinyl butyral may be added to improve coating performance and apply to screen printing.
単一金属の複合カルコゲナイドを得るためには、上記の
化合物の中から目的金属のカルコゲン元素の異なる複数
の化合物および溶媒を選び混合した組成物を加熱分解す
れば良く、薄膜化する為には基体上にスピンコード、デ
ィッピング、スプレィ、刷毛塗り等の通常の塗布法によ
り塗布し室温または加熱上乾燥した後、不活性気体下2
50〜600°Cで焼成すればよい。スクリーン印刷用
に粘度を上げろ為には、上記のような高分子物質を添加
すれば良く膜の焼成温度以下で十分分解するものを選ぶ
のが良い。微粉末の製造には、上記の組成物を通常のス
プレィパイロリシス法により加熱不活性雰囲気下にスプ
レィし熱分解すれば良く、通常0.3〜0.8μ程度の
金属複合カルコゲナイドの球状微粉末が得られる。さら
に全屈組成を複合化するためには上記の化合物の中から
目的組成の複数の金属の異なる化合物および溶媒を選び
混合した組成物を用い、塗布−乾燥−焼成による薄膜、
スプレィパイロリシスによる球状微粉末を得ることがで
きる。In order to obtain a composite chalcogenide of a single metal, it is sufficient to thermally decompose a composition in which a plurality of compounds with different chalcogen elements of the target metal and a solvent are selected from among the above compounds, and the mixture is thermally decomposed to form a thin film. It is coated on top using a conventional coating method such as spin cord, dipping, spraying, or brush coating, and after drying at room temperature or by heating, it is coated under an inert gas atmosphere for 2
What is necessary is just to bake at 50-600 degreeC. In order to increase the viscosity for screen printing, it is sufficient to add a polymeric substance such as the one mentioned above, and it is best to choose one that decomposes sufficiently below the film firing temperature. The fine powder can be produced by spraying the above composition in a heated inert atmosphere using a conventional spray pyrolysis method and thermally decomposing it, which usually produces a spherical fine powder of metal composite chalcogenide with a size of about 0.3 to 0.8μ. is obtained. Furthermore, in order to compound the total bending composition, a composition obtained by selecting and mixing different compounds and solvents of a plurality of metals with the desired composition from among the above compounds is used, and a thin film is formed by coating, drying, and baking.
A spherical fine powder can be obtained by spray pyrolysis.
本発明の複数の異種金属、異種カルコゲン元素の化合物
を溶液中均一に混合した組成物を用いる方法により複合
金属複合カルコゲナイドを得ることがセき、この金属の
複合化、カルコゲン元素の複合化により色形の調整、半
導体としてのバンドギャップ幅のコントロール等が可能
となった。さらに焼成時の雰囲気を酸化性にコントロー
ルすることにより金属カルコゲン酸塩、金属酸化物を生
成させる事も可能である。また同焼成時還元雰囲気下そ
の温度をより高温にすることにより金属まで還元するこ
とも可能である。A composite metal composite chalcogenide can be obtained by the method of the present invention using a composition in which compounds of a plurality of different metals and different chalcogen elements are uniformly mixed in a solution. It has become possible to adjust the shape and control the bandgap width as a semiconductor. Furthermore, by controlling the atmosphere during firing to be oxidizing, it is also possible to generate metal chalcogenates and metal oxides. Further, it is also possible to reduce the metal to a metal by raising the temperature to a higher temperature in a reducing atmosphere during the same firing.
このように焼成時の条件をうまくコントロールすること
により微妙な色調、半導体特性等の微妙なコントロール
も可能である。In this way, by skillfully controlling the firing conditions, it is possible to finely control the color tone, semiconductor characteristics, etc.
膜厚は薄膜化する際の塗布条件および塗布−焼成の繰り
返しによる重ね塗り等により、最小数1OAから最大1
0〜20μ程度まで調整可能である。The film thickness varies from a minimum of 1 OA to a maximum of 1 OA, depending on the coating conditions when thinning the film and overcoating by repeating coating and baking.
It is adjustable from about 0 to 20μ.
本発明の金属カルコゲナイドの製造方法を用いれば常温
、常圧下での通常の塗布法により、塗布、乾燥、焼成を
行うことにより容易に、大面積、複雑な形状の基体上に
Zn(S−5e)、Cd (S−5e)、CuIn(S
e−Te) 、シ゛ビ消−金属硫化物の薄膜が形成可能
となりそれらの半導体としての特性を生かした高性能太
陽電池の低コスト量産化が可能となる。If the metal chalcogenide manufacturing method of the present invention is used, Zn(S-5e ), Cd (S-5e), CuIn(S
It becomes possible to form thin films of diluted metal sulfides (e-Te), and it becomes possible to mass-produce high-performance solar cells at low cost by taking advantage of their semiconductor properties.
(実施例) 次に本発明の実施例を示す。(Example) Next, examples of the present invention will be shown.
実施例1
亜鉛(II)N、N−ジブチルジチオカルバメート:(
211(N2 (、NBu2)2 )4−5g、亜鉛(
■)N、N−ジブチジセレノ力ルバメート: (Zn(
Se2CNBu2)2) 5.0gをジブチルアミン2
00gに溶解後30分還流した溶液をパイレックス基板
に回転数300Orpmでスピンコードし、室温で10
分乾燥、Ar気流下500℃、30分焼成することによ
り膜厚280OA、淡黄色の均一なZn (S−5e)
被膜をえた。Example 1 Zinc (II) N,N-dibutyldithiocarbamate: (
211 (N2 (, NBu2)2) 4-5 g, zinc (
■) N,N-dibutydiselenolbamate: (Zn(
Se2CNBu2)2) 5.0g of dibutylamine2
After dissolving the solution in 00 g and refluxing for 30 minutes, the solution was spin-coded onto a Pyrex substrate at a rotation speed of 300 rpm, and the solution was refluxed for 30 minutes at room temperature.
After drying for 30 minutes and baking at 500°C for 30 minutes under an Ar flow, a uniform Zn (S-5e) film with a thickness of 280 OA and pale yellow color was obtained.
Got a coating.
実施例2
カドミウム0−イソプロピルジチオカルボナート:(C
d (Sz COP r’ )2 )5g、カドミウム
O−イソプロビルジセレノカルボナート: [Cd(S
e2COPr”)2) 5gをエチルセルロソルブ50
0gに溶解した溶液をタイル表面に刷毛塗りし、室温で
30分乾燥し、N2気流下600°C125分焼成する
事により膜厚5000A、燈色のCd(S’Se)薄膜
を得た。Example 2 Cadmium 0-isopropyldithiocarbonate: (C
d(SzCOPr')2)5g, cadmium O-isoprobyl diselenocarbonate: [Cd(S
e2COPr”)2) 5g of ethyl cellulosolve 50
A solution dissolved in 0 g was brushed onto the tile surface, dried at room temperature for 30 minutes, and baked at 600° C. for 125 minutes under a N2 stream to obtain a light-colored Cd(S'Se) thin film with a film thickness of 5000 A.
実施例3
カドミウム0−イソプロピルチオカルボナート:(Cd
(SOCOPrl)z )5g 、カドミウムローイ
ソプロピルセレノカルボナート: (Cd(Se2CO
Pr”)2) 5gをエチルセルロソルブ500gに溶
解した溶液をタイル表面に刷毛塗りし、室温で30分乾
燥し、N2気流下600℃525分焼成する事により膜
厚3000A、燈色のCd(S−5e)薄膜を得た。Example 3 Cadmium 0-isopropylthiocarbonate: (Cd
(SOCOPrl)z )5g, cadmium loisopropyl selenocarbonate: (Cd(Se2CO
Pr'')2) 5g of ethyl cellulosolve dissolved in 500g of ethyl cellulosolve was applied to the surface of the tile with a brush, dried at room temperature for 30 minutes, and baked at 600℃ for 525 minutes under a N2 stream to form a film with a thickness of 3000A and a light-colored Cd ( S-5e) A thin film was obtained.
実施例4
銅(II )N、N−ジブチルジテルロ力ルバメート:
(Cu(Te2CNBu2)2) 5.0g、インジウ
ム(III)N、N−ジエチルジチオカルバメート:
(In(Se2CNBu2)335.9gをジエチルア
ミン500gに溶解後30分還流した溶液をパイレック
ス基板に回転数300Orpmでスピンコードし、室温
で10分乾燥、 Ar気流下550℃、45分焼成す
る事により膜厚3800Aの黒色の均一なCuIn (
Se−Te)の3暎を得た。Example 4 Copper(II) N,N-dibutyl ditellururbamate:
(Cu(Te2CNBu2)2) 5.0g, indium(III)N,N-diethyldithiocarbamate: 335.9g of (In(Se2CNBu2) was dissolved in 500g of diethylamine and refluxed for 30 minutes. The solution was placed on a Pyrex substrate at a rotation speed of 300 rpm. A uniform black CuIn film with a thickness of 3800A was obtained by spin-coding, drying at room temperature for 10 minutes, and baking at 550℃ for 45 minutes under an Ar flow.
Three samples of Se-Te) were obtained.
実施例5
fi (II )N、N−ジエチルジチオカルバメート
;(Cu(S2CNEt2)2)3.9H、インジウム
(III)N、N−ジエチルジセレノカルバメート:
(In (Se2CNEtz ):+ )9.1gをT
HF500gに溶解後30分還流した溶液をSOO℃に
加熱した環状炉にキャリアーガスに流量500m1/m
inのArを用いスプレィノズルより噴霧することによ
り粒径0.6〜0.8 μのCuIn (S−3e)球
状微粉末を得た。Example 5 fi(II)N,N-diethyldithiocarbamate; (Cu(S2CNEt2)2)3.9H, indium(III)N,N-diethyldithelenocarbamate:
(In (Se2CNEtz):+)9.1g to T
After dissolving in 500 g of HF, the solution was refluxed for 30 minutes and placed in an annular furnace heated to SOO℃ with a carrier gas flow rate of 500 m1/m.
A spherical fine powder of CuIn (S-3e) having a particle size of 0.6 to 0.8 μm was obtained by spraying with Ar from a spray nozzle.
Claims (1)
よび 〔M(X_xO_2_−_xCNR_2)_n〕金属ア
ルコキシカルコゲノカルボナート類 〔M(X_xO_2_−_xCOR)_n〕 (M=金属元素、R=炭素数1〜10の有機基;X=S
、Se、Te;n=1〜5;x=1、2) から選ばれる、カルコゲン元素が異なる複数の化合物と
有機溶媒とから成る組成物を不活性雰囲気下で熱分解す
ることにより単一金属複合カルコゲナイドまたは複合金
属複合カルコゲナイドを製造する方法。[Scope of Claims] Metal N,N-dialkyl chalcogenocarbamates and [M(X_xO_2_-_xCNR_2)_n] metal alkoxychalcogenocarbonates [M(X_xO_2_-_xCOR)_n] (M=metal element, R = organic group having 1 to 10 carbon atoms; X=S
, Se, Te; n = 1 to 5; A method for producing a composite chalcogenide or a composite metal composite chalcogenide.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63126945A JP2569723B2 (en) | 1988-05-26 | 1988-05-26 | Method for producing metal composite chalcogenide |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63126945A JP2569723B2 (en) | 1988-05-26 | 1988-05-26 | Method for producing metal composite chalcogenide |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH01298009A true JPH01298009A (en) | 1989-12-01 |
JP2569723B2 JP2569723B2 (en) | 1997-01-08 |
Family
ID=14947783
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63126945A Expired - Lifetime JP2569723B2 (en) | 1988-05-26 | 1988-05-26 | Method for producing metal composite chalcogenide |
Country Status (1)
Country | Link |
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JP (1) | JP2569723B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011016707A (en) * | 2009-06-12 | 2011-01-27 | Dowa Holdings Co Ltd | Chalcogen compound powder, chalcogen compound paste, and methods for manufacturing them |
-
1988
- 1988-05-26 JP JP63126945A patent/JP2569723B2/en not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011016707A (en) * | 2009-06-12 | 2011-01-27 | Dowa Holdings Co Ltd | Chalcogen compound powder, chalcogen compound paste, and methods for manufacturing them |
Also Published As
Publication number | Publication date |
---|---|
JP2569723B2 (en) | 1997-01-08 |
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