JPH01269100A - Radiograph converting panel - Google Patents

Radiograph converting panel

Info

Publication number
JPH01269100A
JPH01269100A JP9795688A JP9795688A JPH01269100A JP H01269100 A JPH01269100 A JP H01269100A JP 9795688 A JP9795688 A JP 9795688A JP 9795688 A JP9795688 A JP 9795688A JP H01269100 A JPH01269100 A JP H01269100A
Authority
JP
Japan
Prior art keywords
stimulable phosphor
phosphor layer
layer
peripheral edge
image conversion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9795688A
Other languages
Japanese (ja)
Other versions
JP2741209B2 (en
Inventor
Kuniaki Nakano
邦昭 中野
Katsuichi Kawabata
勝一 川端
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP63097956A priority Critical patent/JP2741209B2/en
Publication of JPH01269100A publication Critical patent/JPH01269100A/en
Application granted granted Critical
Publication of JP2741209B2 publication Critical patent/JP2741209B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Abstract

PURPOSE:To hold the characteristic of a stimulable phosphor layer which has been formed by a vapor accumulating method and to improve the durability by providing an insulating member which has decreased continuously film thickness of the peripheral edge part of the stimulable phosphor layer, or has decreased continuously thickness of the peripheral edge part. CONSTITUTION:As for a stimulable phosphor layer 12, film thickness of a peripheral edge part 12' decreases continuously, and a form of this decrease is, for instance, like a straight face inclination or a concave face inclination. As for a method for forming this peripheral edge part 12', for instance, the phosphor layer 12 is formed on a supporting body 11, and thereafter, brought to chamfering. Also, as a method for forming in a formed layer, a supporting body holder 13 is provided with a projecting piece 16 for controlling partially a vapor flow 15 from an evaporation source, on the lower side of a shelf part 14 for placing the peripheral edge of the supporting body 11, and in a part of a shadow of this projection piece 16, the vapor flow 15 which has turned in from an opening end 16' is accumulated. Accordingly, the accumulation quantity of an inner wall 16'' side becomes small against the opening end 16', and layer thickness decreases continuously. In such a way, while holding the characteristic of the stimulable phosphor layer which has been formed by a vapor accumulating method, the durability can be improved.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 この発明は輝尽性蛍光体を用いた放射線画像変換パネル
、さらに詳しくは耐久性にすぐれ、かつ高画質の放射線
画像を与えることのできる放射線画像変換パネルに関す
るものである。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a radiation image conversion panel using a stimulable phosphor, and more specifically to a radiation image conversion panel that is highly durable and capable of providing high-quality radiation images. This relates to an image conversion panel.

〔従来の技術〕[Conventional technology]

X線画像のような放射線画像は病気診断用などに多く用
いられている。このxNfA画像を得るためには被写体
を透過したX線を、蛍光体層(蛍光スクリーン)に照射
して可視光を生じさせ、該可視光を通常の写真を逼ると
きと同様に、銀塩を使用したフィルムに照射して現像し
た、いわゆる放射線写真が利用されている。
Radiographic images such as X-ray images are often used for disease diagnosis. In order to obtain this xNfA image, X-rays that have passed through the subject are irradiated onto a phosphor layer (phosphor screen) to generate visible light. A so-called radiographic photograph is used, which is a film made by irradiating and developing the film.

一方、近年、銀塩を塗布したフィルムを使用しないで蛍
光体層から直接画像を取出す方法が工夫された。この方
法としては被写体を透過した放射線を蛍光体に吸収せし
め、しかる後、この蛍光体を例えば光又は熱エネルギー
で励起することによりこの蛍光体が上記吸収により蓄積
している放射線エネルギーを蛍光として放射せしめ、こ
の蛍光を検出して画像化する方法である。
On the other hand, in recent years, a method has been devised to take out images directly from the phosphor layer without using a film coated with silver salt. In this method, the radiation transmitted through the subject is absorbed by a phosphor, and then this phosphor is excited with light or thermal energy, and the phosphor emits the radiation energy accumulated through the absorption as fluorescence. This is a method of detecting this fluorescence and creating an image.

具体的には、例えば米国特許3,859,527号及び
特開昭55−12144号には輝尽性蛍光体を用い可視
光線又は赤外線を輝尽励起光とした放射線画像変換方法
が示されている。これらの方法は支持体上に輝尽性蛍光
体層を形成した放射線画像変換パネルを使用するもので
、この放射線画像変換パネルの輝尽性蛍光体層に被写体
を透過した放射線を当てて被写体各部の放射線透過度に
対応する放射線エネルギーを蓄積させて潜像(蓄積像)
を形成し、しかる後、この輝尽性蛍光体層を輝尽励起光
で走査することによって各部の蓄積された放射線エネル
ギーを放射させて光に変換し、この光の強弱による光信
号により画像を得るものである。この最終的な画像はハ
ードコピーとして再生しても良いし、CRT上に再生し
ても良い。
Specifically, for example, U.S. Pat. No. 3,859,527 and Japanese Patent Application Laid-open No. 55-12144 disclose a radiation image conversion method using a stimulable phosphor and using visible light or infrared rays as stimulable excitation light. There is. These methods use a radiation image conversion panel in which a stimulable phosphor layer is formed on a support, and radiation that has passed through the object is applied to the stimulable phosphor layer of this radiation image conversion panel to image each part of the object. A latent image (accumulated image) is created by accumulating radiation energy corresponding to the radiation transparency of
After that, by scanning this stimulable phosphor layer with stimulable excitation light, the radiation energy accumulated in each part is emitted and converted into light, and an image is created using optical signals depending on the strength of this light. It's something you get. This final image may be reproduced as a hard copy or on a CRT.

この放射線画像変換方法に用いられる輝尽性蛍光体層を
有する放射線画像変換パネルは、前述の蛍光スクリーン
を用いる放射線写真の場合と同様に放射線吸収率及び光
変換率(以下、両者を含めて「放射線感度」という)が
高いことは言うに及ばず、画像の粒状性が良く、しかも
、高鮮鋭性であることが要求される。
The radiation image conversion panel having a stimulable phosphor layer used in this radiation image conversion method has a radiation absorption rate and a light conversion rate (hereinafter, both are referred to as " It goes without saying that the image must have a high radiation sensitivity (referred to as "radiation sensitivity"), and the image must have good graininess and high sharpness.

ところが、一般に輝尽性蛍光体層を有する放射線画像変
換パネルは、粒径1μm〜30μm程度の粒状の輝尽性
蛍光体と有機結着材とを含む分散液を支持体(成るいは
保護層)上に塗布、乾燥して作製されるので、輝尽性蛍
光体の充填密度が低く (充填率50%)、放射線感度
を充分に高くするには輝尽性蛍光体層の層厚を厚くする
必要があった。
However, in general, a radiation image conversion panel having a stimulable phosphor layer uses a dispersion containing a stimulable phosphor in particles with a particle size of about 1 μm to 30 μm and an organic binder as a support (or a protective layer). ), the packing density of the stimulable phosphor is low (filling rate 50%), and the layer thickness of the stimulable phosphor layer must be thick to achieve sufficiently high radiation sensitivity. I needed to.

一方、これに対し前記放射線画像変換方法における画像
の鮮鋭性は、放射線画像変換パネルの輝尽性蛍光体層の
層厚が薄ければ薄いほど高い傾向にあり、鮮鋭性の向上
のためには、輝尽性蛍光体層の薄層化が必要であった。
On the other hand, in the radiation image conversion method, the image sharpness tends to be higher as the thickness of the stimulable phosphor layer of the radiation image conversion panel becomes thinner. , it was necessary to make the stimulable phosphor layer thinner.

また、前記放射線画像変換方法における画像の粒状性は
放射線量子数の場所的ゆらぎ(量子モトル)或いは放射
線画像変換パネルの輝尽性蛍光体層の構造的乱れ(構造
上トル)等によって決定されるので、輝尽性蛍光体層の
層厚が薄くなると、輝尽性蛍光体層に吸収される放射線
量子数が減少して量子モトルが増加したり、構造的乱れ
が顕在化して構造モトルが増加したりして画質の低下を
生ずる。よって画像の粒状性を向上させるためには輝尽
性蛍光体層の層厚は厚い必要があった。
Furthermore, the graininess of the image in the radiation image conversion method is determined by local fluctuations in the number of radiation quanta (quantum mottle) or structural disturbances in the stimulable phosphor layer of the radiation image conversion panel (structural mottle). Therefore, when the thickness of the stimulable phosphor layer becomes thinner, the number of radiation quanta absorbed by the stimulable phosphor layer decreases, resulting in an increase in quantum mottles, or structural disorder becomes apparent, resulting in an increase in structural mottles. This may cause a decrease in image quality. Therefore, in order to improve the graininess of images, the stimulable phosphor layer needs to be thick.

即ち、前述のように、従来の放射線画像変換パネルは放
射線に対する感度及び画像の粒状性と、画像の鮮鋭性と
が輝尽性蛍光体層の層厚に対して全く逆の傾向を示すの
で、前記放射線画像変換パネルは放射線に対する感度と
粒状性と鮮鋭性間のある程度の相互犠牲によって作製さ
れてきた。
That is, as mentioned above, in the conventional radiation image conversion panel, the sensitivity to radiation, the graininess of the image, and the sharpness of the image exhibit completely opposite trends with respect to the layer thickness of the stimulable phosphor layer. The radiation image conversion panels have been made with some trade-off between sensitivity to radiation, graininess, and sharpness.

本出願人は、このような特性間の相反性に鑑みて、特願
昭61−73100号において輝尽性蛍光体層に結着剤
を含有しない放射線画像変換パネル及びその製造方法を
提案している。
In view of the conflict between these characteristics, the present applicant proposed a radiation image conversion panel that does not contain a binder in the stimulable phosphor layer and a method for manufacturing the same in Japanese Patent Application No. 73100/1982. There is.

これによれば、前記放射線画像変換パネルの輝尽性蛍光
体層は気相堆積などの方法を用いて形成し、結着剤を含
有しないので、輝尽性蛍光体層の充填率が著しく向上す
るとともに、輝尽性蛍光体層中での輝尽励起光及び輝尽
発光の指向性が向上し、放射線画像変換パネルの放射線
に対する感度と画像の粒状性が改善されると同時に画像
の鮮鋭性も改善される。
According to this, the stimulable phosphor layer of the radiation image conversion panel is formed using a method such as vapor deposition and does not contain a binder, so the filling rate of the stimulable phosphor layer is significantly improved. At the same time, the directivity of stimulated excitation light and stimulated luminescence in the stimulable phosphor layer is improved, and the sensitivity of the radiation image conversion panel to radiation and image granularity are improved, as well as image sharpness. will also be improved.

ここに共用される放射線画像変換パネルは、放射線画像
情報を蓄積した後、励起光の走査によって蓄積エネルギ
ーを放出するので走査後再度放射線画像の蓄積を行うこ
とができ、繰返し使用が可能である。そこで、前記放射
線画像変換パネルにおいて、得られる画像の高画質化が
望まれるのは当然のことであるが、さらに長時間の使用
に耐える性能が要求される。
The radiation image conversion panel used here stores radiation image information and then releases the stored energy by scanning with excitation light, so it can store radiation images again after scanning and can be used repeatedly. Therefore, it is natural that the radiation image conversion panel is desired to have high quality images, but it is also required to have performance that can withstand long-term use.

そのためには前記放射線画像変換パネル中の輝尽層が外
部からの物理的或いは化学的刺激から充分に保護される
必要がある。
For this purpose, the stimulable layer in the radiation image conversion panel needs to be sufficiently protected from external physical or chemical stimulation.

従来の放射線画像変換パネルにおいては、上記の問題の
解決を図るため、放射線画像変換パネルの支持体上の輝
尽性蛍光体層面を被覆する保護層を設ける方法がとられ
てきた。この保護層は例えば、特開昭59−42500
号の記載の如く、保護層用塗布液を輝尽性蛍光体層上に
直接塗布して形成されるか、或いは、予め別途形成した
保護層を輝尽性蛍光体層上に接着する方法等により形成
されている。
In order to solve the above problems in conventional radiation image conversion panels, a method has been adopted in which a protective layer is provided to cover the surface of the stimulable phosphor layer on the support of the radiation image conversion panel. This protective layer is, for example, disclosed in Japanese Patent Application Laid-Open No. 59-42500.
As described in the above issue, a protective layer coating solution is directly applied onto the stimulable phosphor layer, or a protective layer formed separately in advance is adhered onto the stimulable phosphor layer. It is formed by

一般的には有機高分子からなる薄い保護層が用いられて
いる、この薄い保護層は放射線画像変換パネルの鮮鋭性
を殆ど低下させないという利点がある。輝尽性蛍光体層
を有する放射線画像変換パネルの鮮鋭性と、保護層の厚
みとの関係を空間周波数14ip/龍及び2Jp/龍の
MTF(変調伝達関数)を用いて第1表に示す。
Generally, a thin protective layer made of an organic polymer is used, and this thin protective layer has the advantage that it hardly reduces the sharpness of the radiation image conversion panel. The relationship between the sharpness of a radiation image conversion panel having a stimulable phosphor layer and the thickness of the protective layer is shown in Table 1 using MTFs (modulation transfer functions) of spatial frequencies of 14ip/Yu and 2Jp/Yu.

第  1  表 上表に示す如(、保護層が厚いほど鮮鋭性が低下する。Table 1 As shown in the table above, the thicker the protective layer, the lower the sharpness.

この原因としては、入射した輝尽励起光の輝尽性蛍光体
層表面での反射散乱が、保護層−空気界面で反射され、
輝尽性蛍光体層へ再入射することが挙げられる。
The reason for this is that the reflected and scattered incident stimulable excitation light on the surface of the stimulable phosphor layer is reflected at the protective layer-air interface.
One example is that the light enters the stimulable phosphor layer again.

保gt層が厚いほど反射散乱光はより遠くまで到達し、
対象画素外の画素の情報を混入させる。
The thicker the gt layer, the farther the reflected and scattered light will reach.
Information about pixels other than the target pixel is mixed in.

X線撮影に用いる一般型の増惑祇−フィルム系において
、l/!p/amの場合のMTFは約65%、’1ll
p/amの場合は約35%を示すので、放射線画像変換
パネルにおいても前記増感紙−フィルム系の数値より劣
ることは好ましくなく、従って、保護層の厚さは10μ
m以下が望ましい。
In the general-type multilayer film system used for X-ray photography, l/! MTF for p/am is about 65%, '1ll
In the case of p/am, it is about 35%, so it is not preferable for the radiation image conversion panel to be inferior to the value of the intensifying screen-film system. Therefore, the thickness of the protective layer should be 10 μm.
m or less is desirable.

〔発明の解決しようとする問題点〕[Problem to be solved by the invention]

しかしながら、気相堆積法で支持体上に形成された輝尽
性蛍光体層は、前述の如く、数々の優れた特徴を持つに
もかかわらず、輝尽性蛍光体層は支持体に対してほぼ垂
直方向に伸びた柱状構造を有するため、輝尽性蛍光体層
の周縁部は切り立っている。従って、気相堆積法で得た
放射線画像変換パネルは保護層の周縁部に亀裂が入り易
く、劣化を著しく早めた。また、輝尽性蛍光体層に柔軟
性がないことから応力に対して脆<、特に、周縁部が支
持体から@離し易くなった。
However, although the stimulable phosphor layer formed on the support by the vapor deposition method has many excellent features as mentioned above, the stimulable phosphor layer is Since the stimulable phosphor layer has a columnar structure extending in a substantially vertical direction, the peripheral edge of the stimulable phosphor layer is steep. Therefore, in the radiation image conversion panel obtained by the vapor deposition method, cracks are likely to occur at the peripheral edge of the protective layer, resulting in significantly accelerated deterioration. In addition, since the stimulable phosphor layer had no flexibility, it became brittle against stress, and in particular, the peripheral edge part became easily separated from the support.

この発明は上記の問題点を解消するためのもので、気相
堆積法で形成された輝尽性蛍光体層における画質上の優
れた特性を保有させながら気相堆積法に起因する耐久性
の面での欠点を除去した放射線画像変換パネルを提供す
ることを目的としている。また、他の目的は剥離等によ
る輝尽性蛍光体層の破損のない放射線画像変換パネルを
提供することにある。
This invention is intended to solve the above-mentioned problems, and while maintaining the excellent image quality characteristics of the stimulable phosphor layer formed by the vapor deposition method, it is possible to reduce the durability caused by the vapor deposition method. The object of the present invention is to provide a radiation image conversion panel that eliminates surface defects. Another object of the present invention is to provide a radiation image conversion panel in which the stimulable phosphor layer is not damaged due to peeling or the like.

C問題点を解決するための手段〕 上記目的を達成するため、この発明は気相堆積法で輝尽
性蛍光体層を支持体上に形成した放射線画像変換パネル
において、該輝尽性蛍光体層の周縁部の膜厚を連続的に
減少させるか、該輝尽性蛍光体層の周縁部に、厚さを連
続的に減少させた縁部材を設けることにより、耐久性を
向上させ得るように構成したものである。
Means for Solving Problem C] In order to achieve the above object, the present invention provides a radiation image conversion panel in which a stimulable phosphor layer is formed on a support by a vapor phase deposition method. The durability can be improved by continuously decreasing the thickness of the peripheral edge of the layer or by providing an edge member with a continuously decreasing thickness at the peripheral edge of the stimulable phosphor layer. It is composed of

次に、この発明を具体的に説明する。Next, this invention will be specifically explained.

第1図はこの発明の放射線画像変換パネル(単に変換パ
ネルと略称することもある)の周縁部の厚み方向の一部
分を示した断面図である。図において、11は支持体、
12は支持体11上に形成した輝尽性蛍光体層である。
FIG. 1 is a sectional view showing a portion of the peripheral edge of the radiation image conversion panel (sometimes simply referred to as conversion panel) of the present invention in the thickness direction. In the figure, 11 is a support;
12 is a stimulable phosphor layer formed on the support 11.

この輝尽性蛍光体層12は周縁部12′の膜厚が連続的
に減少(外方に向かって漸次薄肉=傾斜)している。こ
の減少形態は第1図(a)の如く直面傾斜状でも、同図
(b)の如く凹面傾斜状でも、同図(C)の如(凸面傾
斜状でも、同図(d)の如く波面傾斜状でもよい。勿論
、この(a)〜(dlは周縁部12’の減少形態の代表
例を示したもので、これに限定されるものではない。
This stimulable phosphor layer 12 has a peripheral edge 12' whose thickness is continuously decreased (gradually thinner/sloped toward the outside). This decreasing form can be seen in the face-sloping form as shown in Fig. 1 (a), the concave-sloping form as shown in Fig. 1 (b), the convex-sloping form as shown in Fig. 1 (C), and the wave surface as shown in Fig. 1 (d). It may be inclined.Of course, (a) to (dl) show typical examples of the reduction form of the peripheral edge portion 12', and the present invention is not limited to this.

前記周縁部12′の形状は支持体11上に輝尽性蛍光体
層12を成層した後、後加工で形成してもよく、成層中
に形成してもよい。前者の後加工としては、面取り加工
法、また端部を局所的に加熱溶融する方法がある。加熱
方法としてはガスレーザによる加熱が好ましい。後者と
しては例えば第2図に示す支持体ホルダー13を使用す
る方法がある。即ち、この支持体ホルダー13は支持体
11の周辺を載せる棚部14の下側に、蒸発源(図示せ
ず)からの蒸気流(矢印)15を一部規制する突片16
を備えてなり、この突片16の影の部分にはその開放端
16′より回り込んだ蒸気流16が堆積する。従って、
開放端16′に対して奥壁(支持体の外方寄り)16#
側の堆積量は当然少なくなり、層厚は連続的に減少する
ようになる。この場合、突片16の突出量aと、支持体
を載せる棚部14までの距離すとを適当に選択すること
により第1図(d)に示すような輝尽性蛍光体層12の
周辺部12′の形成が可能となる。
The shape of the peripheral edge portion 12' may be formed in post-processing after the stimulable phosphor layer 12 is layered on the support 11, or may be formed during layering. Examples of the former post-processing include a chamfering method and a method of locally heating and melting the edges. As the heating method, heating using a gas laser is preferable. As the latter method, for example, there is a method using a support holder 13 shown in FIG. That is, this support holder 13 has a protrusion 16 on the underside of a shelf 14 on which the periphery of the support 11 is placed, which partially regulates the vapor flow (arrow) 15 from an evaporation source (not shown).
The steam flow 16 that has come around from the open end 16' is deposited in the shaded area of the protrusion 16. Therefore,
Back wall (outward side of support body) 16# with respect to open end 16'
Naturally, the amount of deposition on the sides decreases, and the layer thickness decreases continuously. In this case, the area around the stimulable phosphor layer 12 as shown in FIG. It becomes possible to form the portion 12'.

前記周縁部12′の減少割合は特に限定しないが、この
発明の目的から見れば、急峻過ぎるよりもなだらかな方
がよい。尤も、なだらか過ぎると画像を得る上で有効な
輝尽性蛍光体層12の面積が狭くなり好ましくないと言
える。
The rate of decrease of the peripheral edge portion 12' is not particularly limited, but from the perspective of the purpose of the present invention, it is better to have a gentle slope rather than an excessively steep slope. However, if the slope is too smooth, the effective area of the stimulable phosphor layer 12 for obtaining an image becomes narrow, which is undesirable.

このことから、輝尽性蛍光体の厚さを(1)、厚さが減
少している範囲(長さ)を(X)とした場合、x/lが
0.1〜100の如く設定することが好ましく、0.5
〜50であれば更に好ましい。
From this, if the thickness of the stimulable phosphor is (1) and the range (length) where the thickness is reduced is (X), then x/l should be set as 0.1 to 100. It is preferable that 0.5
It is more preferable if it is 50.

なお、上記の例では輝尽性蛍光体層12の面積が支持体
11より小さくなっているが、同じであっても良いこと
は勿論である。
In the above example, the area of the stimulable phosphor layer 12 is smaller than that of the support 11, but it goes without saying that the area may be the same.

また、輝尽性蛍光体層12は気相堆積法により形成され
たものであるが、支持体11と輝尽性蛍光体層12との
間に必要に応じて接着性をよくするための接着層を設け
ても、また輝尽励起光及び又は輝尽発光の反射層若しく
は吸収層を設けてもよい。前記気相堆積法により輝尽性
蛍光体を気相成長させる方法としては蒸着法、スパッタ
法及びCVD法がある。蒸着法は支持体を蒸着装置内に
設置した後装置内を排気して10−’Torr程度の真
空度とし、次いで輝尽性蛍光体を抵抗加熱法、エレクト
ロンビーム法等で加熱蒸発させて前記支持体表面に所望
の厚さに堆積させるもので、結着剤を含有しない輝尽性
蛍光体層が形成される。スパッタ法は蒸着法と同様に支
持体をスパッタ装置内に設置した後装置内を一端排気し
て10−”Torr程度の真空度とし、次いでスパッタ
用のガスとして、Ar、Ne等の不活性ガスをスパッタ
装置内に導入して10− ’Torr程度のガス圧とし
、前記輝尽性蛍光体をターゲットとして、スパッタリン
グすることにより支持体表面に堆積させる。CVD法は
目的とする輝尽性蛍光体或いは!!尽性蛍光体原料を含
有する有機金属化合物を熱、―周波電力等のエネルギー
で分解することにより、支持体上に結着剤を含有しない
輝尽性蛍光体層を得る方法である。
Further, although the stimulable phosphor layer 12 is formed by a vapor deposition method, an adhesive may be added between the support 11 and the stimulable phosphor layer 12 to improve adhesion as necessary. A reflective layer or an absorbing layer for stimulated excitation light and/or stimulated luminescence may be provided. Methods for growing the stimulable phosphor using the vapor deposition method include vapor deposition, sputtering, and CVD. In the vapor deposition method, after the support is placed in a vapor deposition apparatus, the apparatus is evacuated to a vacuum level of about 10-' Torr, and then the stimulable phosphor is heated and evaporated using a resistance heating method, an electron beam method, etc. It is deposited on the surface of the support to a desired thickness, forming a stimulable phosphor layer that does not contain a binder. In the sputtering method, like the vapor deposition method, the support is placed in a sputtering device, and then the inside of the device is evacuated to a vacuum level of about 10-” Torr, and then an inert gas such as Ar or Ne is used as the sputtering gas. is introduced into a sputtering device to a gas pressure of about 10-' Torr, and the stimulable phosphor is deposited on the surface of the support by sputtering, using the stimulable phosphor as a target. Alternatively, it is a method of obtaining a binder-free stimulable phosphor layer on a support by decomposing an organometallic compound containing a stimulable phosphor raw material with energy such as heat or frequency electric power. .

第3図は輝尽性蛍光体層の周縁部に厚さを連続的に減少
させた縁部材を設けた放射線画像変換パネルを示した断
面図である。図において、31は輝尽性蛍光体層、32
は支持体、33は縁部材である。縁部材33としては、
同図(alの如く輝尽性蛍光体層31を形成後、該輝尽
性蛍光体層31の端部と支持体32の三角部に放射線硬
化型樹脂やガラス質部材を充填しても、同図偽)の如く
予め放射線硬化型樹脂やガラス質部材を用いて成形した
縁部材33を輝尽性蛍光体層31の端部と支持体32の
三角部に嵌合し固定しても、同図(C)の如く支持体3
2の一部をせり上げて縁部材33を形成したものでも、
同図+dlの如く放射線硬化型樹脂やガラス質部材或い
は有機高分子物からなる保#1M34の一部を、輝尽性
蛍光体N31の端部と支持体32の三角部に流入させて
縁部材33を形成したものでもよい。
FIG. 3 is a sectional view showing a radiation image conversion panel in which an edge member whose thickness is continuously reduced is provided at the peripheral edge of the stimulable phosphor layer. In the figure, 31 is a stimulable phosphor layer, 32
is a support body, and 33 is an edge member. As the edge member 33,
Even if after forming the stimulable phosphor layer 31 as shown in FIG. Even if an edge member 33 formed in advance using a radiation-curable resin or a glass material is fitted and fixed to the end of the stimulable phosphor layer 31 and the triangular part of the support body 32 as shown in the figure (false), Support 3 as shown in the same figure (C)
Even if the edge member 33 is formed by raising a part of 2,
As shown in FIG. 33 may be formed.

前記「輝尽性蛍光体」とは、最初の光もしくは高エネル
ギー放射線が照射された後に、先約、熱的、機械的、化
学的又は電気的等の刺激(輝尽励起)により、最初の光
若しくは高エネルギー放射線の照射量に対応した輝尽発
光を示す蛍光体を言うが、実用的な面から好ましくは5
00nm以上の輝尽励起光によって輝尽発光を示す蛍光
体である。
The above-mentioned "stimulable phosphor" refers to the first stimulable phosphor that is stimulated by a priori, thermal, mechanical, chemical, electrical, etc. (stimulable excitation) after being irradiated with the first light or high-energy radiation. It refers to a phosphor that exhibits stimulated luminescence corresponding to the irradiation amount of light or high-energy radiation, and from a practical point of view, preferably 5
It is a phosphor that exhibits stimulated luminescence by stimulated excitation light of 00 nm or more.

この発明の放射線画像変換パネルに用いられる輝尽性蛍
光体としては、例えば、特開昭48−80487号に記
載されているBa5O,、: Axで表される蛍光体、
特開昭48−80488号記載のMgSO4: Axで
表される蛍光体、特開昭48−80489号に記載され
ているSrSO4: AXで表される蛍光体、特開昭5
1−29889号に記載されているNa1SO,、、C
aSO4及びBa5O,等にMn、 Dy及びTbのう
ち少なくとも1種を添加した蛍光体、特開昭52−30
487号に記載されているBear LiF+ Mg5
Oa及びCaF、等の蛍光体、特開昭53−39277
号に記載されているLi2B4O7:Cu、 Agの蛍
光体、特開昭54−47883号に記載されているLi
zO・(B*0t)x : Cu及びLizO・(Bz
(h)x :Cu、 Ag  等の蛍光体、米l特許第
3.859.527号に記載されている5rS=Cel
S11、SrS : Eu 、 Sea、t、a、Oz
S : Eu、S11及び(Zn、Cd )S : M
n、xで表される蛍光体が挙げられる。また、特開昭5
5−12142号に記載されているZnS :Cu、 
Pb蛍光体、一般式がBaO・xAl□0. : Eu
で表されるアルミン酸バリウム蛍光体、及び、一般式が
MIO・xsioz :Aで表されるアルカリ土類金属
珪酸塩系蛍光体が挙げられる。
As the stimulable phosphor used in the radiation image conversion panel of the present invention, for example, the phosphor represented by Ba5O, Ax described in JP-A No. 48-80487,
MgSO4 described in JP-A-48-80488: Phosphor represented by Ax, SrSO4 described in JP-A-48-80489: Phosphor represented by AX, JP-A-Sho 5
Na1SO, , C described in No. 1-29889
Phosphor containing at least one of Mn, Dy and Tb added to aSO4, Ba5O, etc., JP-A-52-30
Bear LiF+ Mg5 described in No. 487
Phosphors such as Oa and CaF, JP-A-53-39277
Li2B4O7:Cu, Ag phosphor described in JP-A-54-47883;
zO・(B*0t)x: Cu and LizO・(Bz
(h) x: phosphor such as Cu, Ag, 5rS=Cel described in US Pat.
S11, SrS: Eu, Sea, t, a, Oz
S: Eu, S11 and (Zn, Cd) S: M
Examples include phosphors represented by n and x. Also, JP-A-5
ZnS described in No. 5-12142:Cu,
Pb phosphor, the general formula is BaO.xAl□0. : Eu
A barium aluminate phosphor represented by the following formula and an alkaline earth metal silicate phosphor represented by the general formula MIO.xsioz :A are mentioned.

また、特開昭55−12143号に記載されている一般
式が(Ba+−x−yMg x Cay ) FX :
  Eu”で表されるアルカリ土類弗化ハロゲン化物蛍
光体、特開昭55−12144号に記載されている一般
式がLnOX:xAで表される蛍光体、特開昭55−1
2145号に記載されている一般式が(Ba+−xMI
 x ) FX i  yAで表される蛍光体、特開昭
55−84389号に記載されている一般式がBaFX
 : xCe、 yAで表される蛍光体、特開昭55−
160078号に記載されている一般式がM” FX−
xA : yLnで表される希土類元素付活2価金属フ
ルオロハライド蛍光体、一般式がZnS :八CdS 
: A、(Zn、 Cd)S : A、X及びCds;
 A、X テ表される蛍光体、特開昭59−38278
号に記載されている下記いずれかの一般式 %式% : で表される蛍光体、特開昭59−155487号に記載
されている下記いずれかの一般式 %式% で表される蛍光体、特開昭61−72087号に記載さ
れている下記一般式 %式%: で表されるアルカリハライド蛍光体、及び特開昭61−
228400号に記載されている一般弐M’ X :x
Biで表されるビスマス賦活アルカリハライド蛍光体等
が挙げられる。
Furthermore, the general formula described in JP-A-55-12143 is (Ba+-x-yMg x Cay) FX:
Alkaline earth fluorohalide phosphor represented by "Eu", phosphor whose general formula is LnOX:xA described in JP-A-55-12144, JP-A-55-1
The general formula described in No. 2145 is (Ba+-xMI
x) FX i yA phosphor, the general formula described in JP-A-55-84389 is BaFX
: Phosphor expressed by xCe, yA, Japanese Patent Application Laid-open No. 1987-
The general formula described in No. 160078 is M"FX-
xA: Rare earth element activated divalent metal fluorohalide phosphor represented by yLn, general formula is ZnS: 8CdS
: A, (Zn, Cd)S : A, X and Cds;
A, X Te expressed phosphor, JP-A-59-38278
A phosphor represented by any of the following general formulas % formula % described in the No. 1987-155487, a phosphor represented by any of the following general formulas % formula % described in JP-A-59-155487 , an alkali halide phosphor represented by the following general formula % formula % described in JP-A-61-72087, and JP-A-61-72087.
General 2 M'X described in No. 228400: x
Examples include bismuth-activated alkali halide phosphor represented by Bi.

特に、アルカリハライド蛍光体は、蒸着、スパッタリン
グ等の方法で輝尽性蛍光体層を形成させ易く好ましい。
In particular, alkali halide phosphors are preferred because they facilitate the formation of a stimulable phosphor layer by methods such as vapor deposition and sputtering.

しかし、この発明の放射線画像変換パネルに用いられる
。輝尽性蛍光体は、前述の蛍光体に限られるものではな
く、放射線を照射した後、輝尽励起光を照射した場合に
輝尽発光を示す蛍光体であればいかなる蛍光体であって
もよい。
However, it is used in the radiation image conversion panel of this invention. The stimulable phosphor is not limited to the above-mentioned phosphors, but can be any phosphor that exhibits stimulated luminescence when irradiated with radiation and then irradiated with stimulable excitation light. good.

この発明に係るパネルの蛍光体の層厚は、目的とする変
換パネルの放射線に対する感度、輝尽性蛍光体の種類等
によって異なるが、1μm−1000μmの範囲、さら
に好ましくは20μm〜800μmから選ばれるのが好
ましい。
The layer thickness of the phosphor in the panel according to the present invention varies depending on the radiation sensitivity of the intended conversion panel, the type of stimulable phosphor, etc., but is selected from the range of 1 μm to 1000 μm, more preferably from 20 μm to 800 μm. is preferable.

前記支持体としては例えばアルミナ等のセラミックス板
、化学的強化ガラス、結晶化ガラス等のガラス板、アル
ミニウム、鉄、銅、クロム等の金属板或いは該金属酸化
物の被覆層を有する金属板が好ましいが、ポリエステル
フィルム、ポリエチレンテレフタレートフィルム、ポリ
カーボネートフィルムなどのプラスチックフィルムであ
ってもよい。支持体は一層とは限らず、二層以上の多層
構造であってもよい。
The support is preferably a ceramic plate such as alumina, a glass plate such as chemically strengthened glass or crystallized glass, a metal plate such as aluminum, iron, copper, or chromium, or a metal plate having a coating layer of the metal oxide. However, it may also be a plastic film such as a polyester film, a polyethylene terephthalate film, or a polycarbonate film. The support is not limited to one layer, and may have a multilayer structure of two or more layers.

また、これらの支持体の層厚は用いる支持体の材質等に
よって異なるが、一般的には80μm〜3000μmで
あり、取り扱い上の点から、さらに好ましくは80μm
〜1000μmである。これら支持体の表面は滑面であ
ってもよいし、輝尽性蛍光体層との接着性を向上させる
目的でマット面としてもよい、また、支持体の表面は凹
凸面としてもよいし、個々に独立した微小タイル状板を
密に配置した表面構造としてもよい。
The layer thickness of these supports varies depending on the material of the support used, but is generally 80 μm to 3000 μm, and more preferably 80 μm from the viewpoint of handling.
~1000 μm. The surface of these supports may be a smooth surface, or may be a matte surface for the purpose of improving adhesion with the stimulable phosphor layer, or the surface of the support may be an uneven surface. It may also be a surface structure in which individual micro tile-like plates are closely arranged.

前記輝尽性蛍光体層12を覆う保護層34或いは輝尽性
蛍光体層12の周縁部の縁部材33として用いるガラス
質としては輝尽性蛍光体層の水分吸収による特性の低下
を防ぐために耐湿性の優れた物質が好ましい。この要求
に沿うガラス質としては酸化物ガラス系素材が挙げられ
る。即ち、珪酸塩ガラス、燐酸塩ガラス更に硼酸塩ガラ
ス等が挙げられ、特に、珪酸塩ガラスが好ましい。具体
的には、石英ガラス(SiOl)、鉛珪酸ガラス(Pb
O・5iOt)、鉛硼酸ガラス(PbO−8!03・S
iOり、亜鉛硼酸ガラス(ZnO・Bt03・5iO2
)、アルミノ珪酸ガラス(A i gos  ・Sta
g) 、アルミノ石灰珪酸ガラス(CaO・AJ zo
s  ・Stow) 、カルシウム珪酸ガラス(CaO
・Btus  ・Stow)等が挙げられる。また、ガ
ラス質保護層の防湿性、耐酸性等の化学耐久性或いは透
明安定性を損なわない範囲で、CaO組成の増量、Na
 zOの添加を行って溶融点を下げてもよい。また、ガ
ラス粉末の粒径は1−100μmが好ましい。
The vitreous material used as the protective layer 34 covering the stimulable phosphor layer 12 or the edge member 33 at the periphery of the stimulable phosphor layer 12 is selected from the following: Materials with excellent moisture resistance are preferred. Examples of glass materials that meet this requirement include oxide glass materials. That is, examples include silicate glass, phosphate glass, and borate glass, with silicate glass being particularly preferred. Specifically, quartz glass (SiOl), lead silicate glass (Pb
O・5iOt), lead borate glass (PbO-8!03・S
iO, zinc borate glass (ZnO・Bt03・5iO2
), aluminosilicate glass (A i gos Sta
g), alumino-lime silicate glass (CaO・AJ zo
s・Stow), calcium silicate glass (CaO
・Btus ・Stow), etc. In addition, the amount of CaO composition, Na
Addition of zO may be performed to lower the melting point. Moreover, the particle size of the glass powder is preferably 1-100 μm.

また、保護層34或いは輝尽性蛍光体層12の周縁部1
2の縁部材33として用いる有機高分子物としては、例
えば、酢酸セルロース、ニトロセルロース、エチルセル
ロース等のセルロース誘導体、或いはポリメチルメタク
リレート、ポリビニルブチラール、ポリビニルホルマー
ル、ポリカーボネート、ポリ酢酸ビニル、ポリアクリロ
ニトリル、ポリメチルアリルアルコール、ポリメチルビ
ニルケトン、セルロースジアセテート、セルローストリ
アセテート、ポリビニルアルコール、ポリアクリル酸、
ポリメタクリル酸、ポリグリシン、ポリアクリルアミド
、ポリビニルピロリドン、ポリビニルアミン、ポリエチ
レンテレフタレート、ポリエチレン、ポリ塩化ビニリデ
ン、ポリ塩化ビニル、ポリアミド(ナイロン)、ポリ四
弗化エチレン、ポリ三弗化−塩化エチレン、ポリプロピ
レン、四弗化エチレン−六弗化プロピレン共重合体、ポ
リビニルイソブチルエーテル、ポリスチレンなどが挙げ
られる。
Furthermore, the peripheral portion 1 of the protective layer 34 or the stimulable phosphor layer 12
Examples of the organic polymer used as the edge member 33 of 2 include cellulose derivatives such as cellulose acetate, nitrocellulose, and ethylcellulose, or polymethyl methacrylate, polyvinyl butyral, polyvinyl formal, polycarbonate, polyvinyl acetate, polyacrylonitrile, and polymethyl. Allyl alcohol, polymethyl vinyl ketone, cellulose diacetate, cellulose triacetate, polyvinyl alcohol, polyacrylic acid,
Polymethacrylic acid, polyglycine, polyacrylamide, polyvinylpyrrolidone, polyvinylamine, polyethylene terephthalate, polyethylene, polyvinylidene chloride, polyvinyl chloride, polyamide (nylon), polytetrafluoroethylene, polytrifluoroethylene chloride, polypropylene, Examples include tetrafluoroethylene-hexafluoropropylene copolymer, polyvinyl isobutyl ether, and polystyrene.

また、保護層34或いは輝尽性蛍光体層12の周縁部1
2の縁部材33として用いる放射線硬化型樹脂としては
、不飽和二重結合を有する化合物又はこれを含む組成物
であればよく、このような化合物は好ましくは不飽和二
重結合を2個以上有するプレポリマ及び/又はオリゴマ
であり、さらに、これらに不飽和二重結合を有する単量
体(ビニルモノマ)を反応性希釈剤として含有させるこ
とができる。
Furthermore, the peripheral portion 1 of the protective layer 34 or the stimulable phosphor layer 12
The radiation-curable resin used as the edge member 33 of No. 2 may be any compound having an unsaturated double bond or a composition containing the same, and such a compound preferably has two or more unsaturated double bonds. These are prepolymers and/or oligomers, and can further contain a monomer (vinyl monomer) having an unsaturated double bond as a reactive diluent.

〔実施例〕〔Example〕

次に、実施例によりこの発明を説明する。 Next, the present invention will be explained by examples.

◎実施例(1) 1fl厚の結晶化ガラス支持体を第2図に示すようなホ
ルダーに載置し、これを蒸着装置内にセットする。
◎Example (1) A crystallized glass support having a thickness of 1 fl is placed on a holder as shown in FIG. 2, and this is set in a vapor deposition apparatus.

次に、抵抗加熱用のタングステンボート中にアルカリハ
ライド輝尽性蛍光体(RbBr;0.0O06T l 
)を入れて抵抗加熱用電極にセットした後、蒸着装置を
排気して2 X 10−’Torrの真空度とする。
Next, alkali halide stimulable phosphor (RbBr; 0.0O06Tl) was placed in a tungsten boat for resistance heating.
) and set it on the resistance heating electrode, the vapor deposition apparatus is evacuated to a vacuum degree of 2 x 10-'Torr.

次いでタングステンボートに電流を流し、抵抗加熱法に
よって輝尽性蛍光体を蒸発させ、前記結晶化ガラス板上
に輝尽性蛍光体層を300μmの厚さに堆積させた。
Next, a current was applied to the tungsten boat to evaporate the stimulable phosphor by a resistance heating method, and a stimulable phosphor layer was deposited on the crystallized glass plate to a thickness of 300 μm.

これにより周縁部の肉厚が、第1図fd)の如く波形状
に漸次減少したパネル原体が得られ、該パネル原体を厚
さ15μmの延伸ポリプロピレン保護袋に収納して特開
昭61−220492号に述べられている方法を用いて
真空密封し、保護層を形成して本願パネルAを製造した
As a result, a panel material in which the wall thickness of the peripheral portion gradually decreased in a wavy shape as shown in FIG. Panel A of the present application was manufactured by vacuum sealing and forming a protective layer using the method described in Japanese Patent No. 220492.

◎実施例(2) 1龍厚の結晶化ガラス支持体を蒸着装置内にセットし、
実施例(1)と同様に、抵抗加熱用のタングステンボー
ト中に、アルカリハライド輝尽性蛍光体(RbBr;0
.0006T l)を入れて抵抗加熱用電極にセットし
た後、蒸着装置を排気して2X10−’Torrの真空
度とし、タングステンボートに電流を流して抵抗加熱法
によって輝尽性蛍光体を蒸発させ、前記結晶化ガラス板
上に輝尽性蛍光体層を300μmの厚さに堆積させた。
◎Example (2) A crystallized glass support with a thickness of one dragon was set in a vapor deposition apparatus,
Similarly to Example (1), an alkali halide stimulable phosphor (RbBr; 0
.. 0006T l) and set it on the resistance heating electrode, the evaporation apparatus was evacuated to a vacuum of 2 x 10-'Torr, a current was passed through the tungsten boat, and the stimulable phosphor was evaporated by the resistance heating method. A stimulable phosphor layer was deposited on the crystallized glass plate to a thickness of 300 μm.

次に、この輝尽性蛍光体層の周縁に鉛硼酸ガラス(Pb
O・B20.・SiO□)のロンドを設置し、この部分
を600℃で60m1n加熱処理することにより第3図
(alに示すように輝尽性蛍光体層の端部と支持体の三
角部に鉛硼酸ガラスを充填させてパネル原体を得、この
パネル原体に実施例(1)と同様に保護層を形成して本
願パネルBを得た。
Next, lead borate glass (Pb
O・B20.・SiO□) was installed and this part was heat-treated for 60ml at 600°C to form lead borate glass at the end of the stimulable phosphor layer and the triangular part of the support, as shown in Figure 3 (al). A protective layer was formed on this panel base material in the same manner as in Example (1) to obtain Panel B of the present invention.

このようにして得られた本願パネルA、Bは輝尽性蛍光
体層の周縁部の膜厚が連続して減少しているため、保護
層の形成やその後の取扱において輝尽性蛍光体層の周縁
部が切り立っている従来パネルのように保護層の周縁部
に亀裂等の破損が生じたり、蛍光体層の破壊されるとい
ったことがなく、長期間に亘って劣化の少ないパネルで
あることが判明した。
In the panels A and B of the present invention obtained in this way, the thickness of the stimulable phosphor layer at the peripheral edge of the stimulable phosphor layer is continuously reduced, so that the stimulable phosphor layer is Unlike conventional panels that have steep edges, there will be no damage such as cracks on the edges of the protective layer or destruction of the phosphor layer, and the panel will not deteriorate over a long period of time. There was found.

〔発明の効果〕〔Effect of the invention〕

以上の如く、この発明は気相堆積法で輝尽性蛍光体層を
支持体上に形成した放射線画像変換パネルにおいて、該
輝尽性蛍光体層の周縁部の膜厚を連続的に減少させるか
、輝尽性蛍光体層の周縁部に、厚さを連続的に減少させ
た縁部材を設けたことを特徴としているから、気相堆積
法で形成された輝尽性蛍光体層の特性を保有しつつ、耐
久性を向上させることができ、従って、長期間に亘って
使用可能なパネルを提供できるという優れた効果を奏す
るものである。
As described above, the present invention provides a radiation image conversion panel in which a stimulable phosphor layer is formed on a support by a vapor deposition method, in which the thickness of the stimulable phosphor layer at the peripheral portion is continuously reduced. Moreover, since the stimulable phosphor layer is characterized by having an edge member whose thickness is continuously reduced at the periphery, the characteristics of the stimulable phosphor layer formed by the vapor deposition method are improved. This has the excellent effect of improving durability while retaining the same properties, and thus providing a panel that can be used for a long period of time.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図(a)〜fdlはこの発明の放射線画像変換パネ
ルの断面図、第2図は成形装置の断面図、第3図はこの
発明の他の例の断面図である。 11、 22. 32−支持体 12、 24. 31−一輝尽性蛍光体層12′・−周
縁部 13−・−支持体ホルダー 14・−棚部 15−・蒸気流 16・−突片 第1図 第2図 第3 (C) (b)
1(a) to fdl are sectional views of a radiation image conversion panel of the present invention, FIG. 2 is a sectional view of a molding device, and FIG. 3 is a sectional view of another example of the present invention. 11, 22. 32-Support 12, 24. 31 - Stimulable phosphor layer 12' - Peripheral part 13 - Support holder 14 - Shelf part 15 - Vapor flow 16 - Projection Figure 1 Figure 2 Figure 3 (C) (b)

Claims (2)

【特許請求の範囲】[Claims] (1)気相堆積法で輝尽性蛍光体層を支持体上に形成し
た放射線画像変換パネルにおいて、該輝尽性蛍光体層の
周縁部の膜厚を連続的に減少させたことを特徴とする放
射線画像変換パネル。
(1) A radiation image conversion panel in which a stimulable phosphor layer is formed on a support by a vapor deposition method, characterized in that the film thickness of the periphery of the stimulable phosphor layer is continuously reduced. A radiographic image conversion panel.
(2)気相堆積法で輝尽性蛍光体層を支持体上に形成し
た放射線画像変換パネルにおいて、該輝尽性蛍光体層の
周縁部に、厚さを連続的に減少させた縁部材を設けたこ
とを特徴とする放射線画像変換パネル。
(2) In a radiation image conversion panel in which a stimulable phosphor layer is formed on a support by a vapor deposition method, an edge member whose thickness is continuously reduced at the periphery of the stimulable phosphor layer. A radiation image conversion panel characterized by being provided with.
JP63097956A 1988-04-20 1988-04-20 Radiation image conversion panel Expired - Lifetime JP2741209B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63097956A JP2741209B2 (en) 1988-04-20 1988-04-20 Radiation image conversion panel

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63097956A JP2741209B2 (en) 1988-04-20 1988-04-20 Radiation image conversion panel

Publications (2)

Publication Number Publication Date
JPH01269100A true JPH01269100A (en) 1989-10-26
JP2741209B2 JP2741209B2 (en) 1998-04-15

Family

ID=14206119

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63097956A Expired - Lifetime JP2741209B2 (en) 1988-04-20 1988-04-20 Radiation image conversion panel

Country Status (1)

Country Link
JP (1) JP2741209B2 (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5083031A (en) * 1986-08-19 1992-01-21 International Sensor Technology, Inc. Radiation dosimeters
JP2003066147A (en) * 2001-08-27 2003-03-05 Canon Inc Radiation detector, detecting system and scintillator panel to be provided therein
JP2006058171A (en) * 2004-08-20 2006-03-02 Fuji Photo Film Co Ltd Radiographic image conversion panel for mammography, and manufacturing method therefor
JP2006234773A (en) * 2005-02-28 2006-09-07 Japan Atomic Energy Agency Vitrified imaging plate
JP2008139291A (en) * 2006-11-07 2008-06-19 Konica Minolta Medical & Graphic Inc Radiation image conversion panel, method of making the same, and cassette
JP2011128034A (en) * 2009-12-18 2011-06-30 Toshiba Corp Radiation detector and scintillator panel

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5674254A (en) * 1979-11-22 1981-06-19 Fuji Electric Co Ltd Vapor deposition mask for manufacture of photoreceptor for electrophotography
JPS60133478U (en) * 1984-02-14 1985-09-05 三洋電機株式会社 photoreceptor drum
JPS60211398A (en) * 1984-04-06 1985-10-23 富士写真フイルム株式会社 Accumulating phosphor sheet and carrying method thereof

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5674254A (en) * 1979-11-22 1981-06-19 Fuji Electric Co Ltd Vapor deposition mask for manufacture of photoreceptor for electrophotography
JPS60133478U (en) * 1984-02-14 1985-09-05 三洋電機株式会社 photoreceptor drum
JPS60211398A (en) * 1984-04-06 1985-10-23 富士写真フイルム株式会社 Accumulating phosphor sheet and carrying method thereof

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5083031A (en) * 1986-08-19 1992-01-21 International Sensor Technology, Inc. Radiation dosimeters
JP2003066147A (en) * 2001-08-27 2003-03-05 Canon Inc Radiation detector, detecting system and scintillator panel to be provided therein
JP2006058171A (en) * 2004-08-20 2006-03-02 Fuji Photo Film Co Ltd Radiographic image conversion panel for mammography, and manufacturing method therefor
JP2006234773A (en) * 2005-02-28 2006-09-07 Japan Atomic Energy Agency Vitrified imaging plate
JP4587843B2 (en) * 2005-02-28 2010-11-24 独立行政法人 日本原子力研究開発機構 Vitrified imaging plate
JP2008139291A (en) * 2006-11-07 2008-06-19 Konica Minolta Medical & Graphic Inc Radiation image conversion panel, method of making the same, and cassette
JP2011128034A (en) * 2009-12-18 2011-06-30 Toshiba Corp Radiation detector and scintillator panel

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