JPH01268078A - Excimer laser oscillating apparatus - Google Patents

Excimer laser oscillating apparatus

Info

Publication number
JPH01268078A
JPH01268078A JP9549688A JP9549688A JPH01268078A JP H01268078 A JPH01268078 A JP H01268078A JP 9549688 A JP9549688 A JP 9549688A JP 9549688 A JP9549688 A JP 9549688A JP H01268078 A JPH01268078 A JP H01268078A
Authority
JP
Japan
Prior art keywords
gas flow
bases
members
excimer laser
charging
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9549688A
Other languages
Japanese (ja)
Other versions
JP2668699B2 (en
Inventor
Yasuo Itakura
板倉 康夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Komatsu Ltd
Original Assignee
Komatsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Komatsu Ltd filed Critical Komatsu Ltd
Priority to JP63095496A priority Critical patent/JP2668699B2/en
Publication of JPH01268078A publication Critical patent/JPH01268078A/en
Application granted granted Critical
Publication of JP2668699B2 publication Critical patent/JP2668699B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02Constructional details
    • H01S3/03Constructional details of gas laser discharge tubes
    • H01S3/038Electrodes, e.g. special shape, configuration or composition
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02Constructional details
    • H01S3/03Constructional details of gas laser discharge tubes
    • H01S3/036Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube

Abstract

PURPOSE:To make a gas flow between electrodes uniform and make discharge uniform, by forming planar supporting members with which both bases for supporting facing electrodes are linked, making the members parallel with the gas flow between both bases, and arranging a plurality of the members in the perpendicular direction with respect to the direction of the gas flow in a separated pattern. CONSTITUTION:In an excimer laser oscillating apparatus, supporting members 19 with which two bases 3 and 4 for supporting facing electrodes ER are linked are formed with electric conductors, and the supporting members 19 serve the role of a charging and discharging wiring part A. In this apparatus, said supporting members 19 are made to be planar shapes and are made parallel with the direction of gas flow between both bases 3 and 4. A plurality of the members are arranged in the perpendicular direction with respect to the direction of the gas flow in a separated pattern. In this constitution, the planar supporting members 19 which serve the role of the charging and discharging wiring A do not hinder the gas flow through a main discharging part 1. Conversely, the gas flow can be straightened. Therefore, the gas flow from a fan 6 which is disturbed with a heat exchanger 7 is corrected with the supporting members 19. The gas flow between the electrodes is made uniform, and the discharge can be made uniform.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、UV予予電電離方式放電励起型エキシマレー
ザ発振装置に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a UV pre-ionization discharge excited excimer laser oscillation device.

〔従来の技術〕[Conventional technology]

上記エキシマレーザ発振装置の主回路は第2図に示すよ
うになっており、図中01はメイン(充電)コナデンサ
、Swはサイラトロン、C2はピーキング(放電)コン
デンサ、ERは一対の主放電電極、Gは予(ii1電離
ギャップであり、上記ピーキングコンデンサC2、主放
電電極ERN予備電離ギャップGにて主放電部1が構成
されている。そしてこの主放電部1内に、充放電中にメ
インコンデンサC1からピーキングコンデンサC2へ充
電を行なう際に電流が経由する充放電配線部Aを有して
いる。
The main circuit of the above excimer laser oscillation device is shown in Figure 2, where 01 is a main (charging) conadenser, Sw is a thyratron, C2 is a peaking (discharging) capacitor, ER is a pair of main discharge electrodes, G is a pre-(ii1 ionization gap), and a main discharge section 1 is constituted by the peaking capacitor C2 and the main discharge electrode ERN pre-ionization gap G.In this main discharge section 1, a main capacitor is connected during charging and discharging. It has a charge/discharge wiring section A through which current passes when charging the peaking capacitor C2 from C1.

レーザ発振装置における上記主放電部1は第3図に示す
ようになっていて、チャンバ2に固着されたベース3と
これに対向してチャンバ2内に位置する対向ベース4に
一対の主放電電極ERと、ピーキングコンデンサC2,
C2及び予(ii電離ギャップG、Gがそれぞれ設けて
あり、上記両ベース3.4に電気回路が接続しである。
The main discharge section 1 in the laser oscillation device is constructed as shown in FIG. 3, and includes a base 3 fixed to a chamber 2 and a pair of main discharge electrodes on an opposing base 4 located in the chamber 2. ER and peaking capacitor C2,
C2 and pre(ii) ionization gaps G, G are provided, respectively, and an electric circuit is connected to both bases 3.4.

そして上記両ベース3.4は上記充放電配線部Aにて接
続されているが、この充放電配線部Aは剛性を有する支
支部材5にて構成されていて、対向ベース4はこの充放
電配線部Aを兼ねる支持部材5にて支持されている。
The two bases 3.4 are connected by the charging/discharging wiring section A, and the charging/discharging wiring section A is composed of a rigid support member 5, and the opposing base 4 is connected to the charging/discharging wiring section A. It is supported by a support member 5 that also serves as a wiring section A.

上記チャンバ2内にはファン6及び熱交換器7が設けて
あり、ファン6の駆動によりチャンバ2内のガスが、両
ベース3,4の対向部を横切り、熱交換器7を経て戻る
経路を循環してチャンバ2内のガスフローの均一化を図
るようになっている。
A fan 6 and a heat exchanger 7 are provided in the chamber 2, and when the fan 6 is driven, the gas in the chamber 2 crosses the opposing parts of the bases 3 and 4 and returns via the heat exchanger 7. The gas is circulated to equalize the gas flow within the chamber 2.

そして従来の上記支持部材5は横断面形状が円形あるい
は四角形の柱状となっていた。
The conventional supporting member 5 has a columnar shape with a circular or square cross section.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

従来の上記支持部材5は両ベース3.4間でファン6に
よるガスフローを横切る方向に配置されているが、この
支持部材5の横断面形状が円形あるいは四角形になって
いるため、この支持部材5に衝突したガスは乱流となり
、両ベース3,4間でのガスフローが乱れてしまい、ガ
スフローを均一にして放電を均一化しようとする点での
障害となっていた。
The conventional supporting member 5 is disposed between both bases 3.4 in a direction transverse to the gas flow caused by the fan 6, but since the cross-sectional shape of the supporting member 5 is circular or square, this supporting member The gas that collided with the base 5 became a turbulent flow, and the gas flow between the bases 3 and 4 was disturbed, which was an obstacle in trying to make the gas flow uniform and the discharge uniform.

本発明は上記のことにかんがみなされたもので、充放電
配線部を兼ねる支持部材がガスフローの妨げとならず、
逆にこれによりガスフローを整流できるようにしたエキ
シマレーザ発振装置を提供することを目的とするもので
ある。
The present invention has been made in view of the above, and the support member that also serves as the charging/discharging wiring section does not impede the gas flow.
On the contrary, it is an object of the present invention to provide an excimer laser oscillation device that can rectify the gas flow.

〔課題を解決するための手段〕[Means to solve the problem]

上記目的を達成するためには、本考案に係るエキシマレ
ーザ発振装置は、対向する電極を支持する両ベースを連
結する支持部材を電気伝導性材料を構成し、この支持部
材にて充放電配線部を兼ねるエキシマレーザ発振装置に
おいて、上記支持部材を板状にすると共に、両ベース間
を通るガスフローの流れ方向と平行にし、かつガスフロ
ーの流れ方向と直角方向に複数個離間して配設した構成
となっている。
In order to achieve the above object, the excimer laser oscillation device according to the present invention comprises an electrically conductive material as a support member that connects both bases that support opposing electrodes, and uses this support member to connect the charging/discharging wiring. In an excimer laser oscillation device that also serves as The structure is as follows.

〔作 用〕[For production]

両ベース間を通るガスフローは板状の充放電配線部を兼
ねる支持部材にて整流され、両ベース間を通るガスフロ
ーが均一化される。
The gas flow passing between both bases is rectified by a support member that also serves as a plate-shaped charging/discharging wiring section, so that the gas flow passing between both bases is made uniform.

〔実 施 例〕〔Example〕

本発明の実施例を第1図に基づいて説明する。 An embodiment of the present invention will be described based on FIG.

なおこの実施例において、第2図、第3図に示す部材と
同一部材は同一の符号をつけて説明を省略する。
In this embodiment, the same members as those shown in FIGS. 2 and 3 are designated by the same reference numerals, and the description thereof will be omitted.

第1図はチャンバ2内に配置される主放電部1を示すも
ので、ベース3と対向ベース4とはこれの両側部にて支
柱8にて対向離間する状態に結合しである。そしてこの
両ベース3.4間には、ガスフロ一方向の上、下流側に
ガスフロ 4一方向と直角方向に複数個の位置に、電気
伝導性の板9を、ガスフロ一方向と平行にして設け、こ
の各板9にて充放電配線部Aを兼用させである。
FIG. 1 shows a main discharge section 1 disposed within a chamber 2, in which a base 3 and a counter base 4 are connected on both sides of the base 3 by pillars 8 so as to be spaced apart from each other. Between the two bases 3 and 4, electrically conductive plates 9 are installed parallel to the one direction of gas flow at a plurality of positions in a direction perpendicular to one direction of gas flow 4, on the upper side of one direction of gas flow and on the downstream side. , each plate 9 also serves as a charging/discharging wiring section A.

上記構成において、主放電部1の両ベース3゜4の間を
通るガスは複数個の板9にて整流される。
In the above configuration, the gas passing between the bases 3 and 4 of the main discharge section 1 is rectified by the plurality of plates 9.

上記各板9は薄い程上記整流効果が期待できるが、ガス
フロ一方向の両端部を流線形にすることによっても一層
の整流効果を得ることができる。
The thinner each plate 9 is, the more the above-mentioned rectification effect can be expected, but a further rectification effect can also be obtained by making both ends of the gas flow in one direction streamlined.

〔考案の効果〕[Effect of idea]

本発明によれば、充放電配線Aを兼ねる板状の支持部材
が主放電部1を通るガスフローの妨げとなることがなく
、逆に上記ガスフローを整流することができる。従って
ファン6や熱交換器7にて乱れたガスフローが上記支持
部材にて矯正され、電極間のガスフローが均一されて放
電の均一化を図ることができる。
According to the present invention, the plate-shaped support member that also serves as the charging/discharging wiring A does not obstruct the gas flow passing through the main discharge section 1, and on the contrary, the gas flow can be rectified. Therefore, the gas flow disturbed by the fan 6 and the heat exchanger 7 is corrected by the supporting member, and the gas flow between the electrodes is made uniform, thereby making it possible to make the discharge uniform.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案の要部を示す斜視図、第2図はエキシマ
レーザ発振装置の主回路図、第3図は主放電部を示す概
略的な構成説明図である。 1は主放電部、2はチャンバ、3はベース、4は対向ベ
ース、Aは充放電配線部。 出願人  株式会社 小 松 製 作 所代理人  弁
理士  米 原 正 章
FIG. 1 is a perspective view showing the main parts of the present invention, FIG. 2 is a main circuit diagram of an excimer laser oscillation device, and FIG. 3 is a schematic structural explanatory diagram showing a main discharge section. 1 is the main discharge part, 2 is the chamber, 3 is the base, 4 is the opposing base, and A is the charging/discharging wiring part. Applicant Komatsu Manufacturing Co., Ltd. Representative Patent Attorney Masaaki Yonehara

Claims (1)

【特許請求の範囲】[Claims]  対向する電極を支持する2つのベース3,4を連結す
る支持部材を電気伝導体にて構成し、この支持部材にて
充放電配線部Aを兼ねるエキシマレーザ発振装置におい
て、上記支持部材を板状にすると共に、両ベース3,4
間を通るガスフローの流れ方向と平行にし、かつガスフ
ローの流れ方向と直角方向に複数個離間して配設したこ
とを特徴とするエキシマレーザ発振装置。
In an excimer laser oscillation device in which a support member connecting two bases 3 and 4 that support opposing electrodes is made of an electrical conductor, and this support member also serves as a charging/discharging wiring section A, the support member is shaped like a plate. and both bases 3 and 4
1. An excimer laser oscillation device characterized in that a plurality of excimer laser oscillation devices are arranged parallel to the flow direction of a gas flow passing through the space and spaced apart in a direction perpendicular to the flow direction of the gas flow.
JP63095496A 1988-04-20 1988-04-20 Excimer laser oscillation device Expired - Lifetime JP2668699B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63095496A JP2668699B2 (en) 1988-04-20 1988-04-20 Excimer laser oscillation device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63095496A JP2668699B2 (en) 1988-04-20 1988-04-20 Excimer laser oscillation device

Publications (2)

Publication Number Publication Date
JPH01268078A true JPH01268078A (en) 1989-10-25
JP2668699B2 JP2668699B2 (en) 1997-10-27

Family

ID=14139208

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63095496A Expired - Lifetime JP2668699B2 (en) 1988-04-20 1988-04-20 Excimer laser oscillation device

Country Status (1)

Country Link
JP (1) JP2668699B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6490310B1 (en) 2000-09-11 2002-12-03 Komatsu Ltd. Laser discharge electrodes with current return plate structure
US6771685B1 (en) 2000-08-28 2004-08-03 Komatsu, Ltd. Discharge electrodes connecting structure for laser apparatus and laser apparatus therewith

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62181482A (en) * 1986-02-05 1987-08-08 Nippon Kogaku Kk <Nikon> Excimer laser equipment
JPS639179A (en) * 1986-06-30 1988-01-14 Komatsu Ltd Gas laser device
JPS6453588A (en) * 1987-08-25 1989-03-01 Hamamatsu Photonics Kk Gas laser oscillator
JPH01214184A (en) * 1988-02-23 1989-08-28 Toshiba Corp Pulse laser oscillation device

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62181482A (en) * 1986-02-05 1987-08-08 Nippon Kogaku Kk <Nikon> Excimer laser equipment
JPS639179A (en) * 1986-06-30 1988-01-14 Komatsu Ltd Gas laser device
JPS6453588A (en) * 1987-08-25 1989-03-01 Hamamatsu Photonics Kk Gas laser oscillator
JPH01214184A (en) * 1988-02-23 1989-08-28 Toshiba Corp Pulse laser oscillation device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6771685B1 (en) 2000-08-28 2004-08-03 Komatsu, Ltd. Discharge electrodes connecting structure for laser apparatus and laser apparatus therewith
US6490310B1 (en) 2000-09-11 2002-12-03 Komatsu Ltd. Laser discharge electrodes with current return plate structure

Also Published As

Publication number Publication date
JP2668699B2 (en) 1997-10-27

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