JPH01267444A - Pattern detection - Google Patents

Pattern detection

Info

Publication number
JPH01267444A
JPH01267444A JP9659788A JP9659788A JPH01267444A JP H01267444 A JPH01267444 A JP H01267444A JP 9659788 A JP9659788 A JP 9659788A JP 9659788 A JP9659788 A JP 9659788A JP H01267444 A JPH01267444 A JP H01267444A
Authority
JP
Japan
Prior art keywords
light
sample
pattern
detection
shielding pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9659788A
Other languages
Japanese (ja)
Inventor
Kazuo Watanabe
一生 渡辺
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP9659788A priority Critical patent/JPH01267444A/en
Publication of JPH01267444A publication Critical patent/JPH01267444A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To detect a light shielding pattern of a sample with a high performance, by a method wherein a reflecting member is provided on the back side of a sample having a light shielding pattern formed on a transparent substrate and irradiated with light through the sample from a power source to detect the reflected light thereof. CONSTITUTION:A reflecting plate 20 comprising a transparent plate or the like 21 wherein a reflection layer 22 for light is provided on the back thereof is placed on the back side of the sample 10. Light of light sources 1A and 1B arranged on both upper sides of the sample 10 is made to irradiate the sample 10 as irradiation beams of light SK1 and SK2 through optical systems 2A and 2B. Consequently, the irradiation lights SK1 and SK2 penetrate a transparent substrate 12, reaches a reflecting layer 22 of the reflecting plate 20 to be reflected and penetrate the transparent substrate 12 of the sample 10 again as reflected light FK so that a light shielding pattern 11 is lighted from the back side of the transparent substrate 12. When a detector 3 such as image sensor having an optical system is arranged above the sample 10, the light shielding pattern 11 can be detected as clear image.

Description

【発明の詳細な説明】 発明の目的; (産業上の利用分野) この発明は、例えばシャドウマスク、リードフレーム、
液晶表示パネル、プラズマデイスプレィパネル、集積回
路等に用いるフォトマスクの遮光性パターンを透過方式
により高性能に検出するパターン検出方法に関する。
[Detailed Description of the Invention] Object of the Invention; (Industrial Application Field) This invention is applicable to shadow masks, lead frames,
The present invention relates to a pattern detection method for detecting light-shielding patterns of photomasks used in liquid crystal display panels, plasma display panels, integrated circuits, etc. with high performance using a transmission method.

(従来の技術) 従来、第3図のようにガラス等の透明基板12上に形成
されたエマルジョンや、金属薄膜(クロームなど)等の
遮光性パターン11を有した試241Oを検査するには
、支持部材6A、6Bで試料lOを固定して、その上方
に光電素子等の検出装置3を、下方にランプ等の照明装
置7をそれぞれ設け、照明装置7より光Sにを照射し、
試料10の透過光Tにを検出装置3で受光して、遮光性
パターン11を検出するようにしている。
(Prior Art) Conventionally, in order to inspect a sample 241O having a light-shielding pattern 11 such as an emulsion formed on a transparent substrate 12 such as glass or a thin metal film (such as chrome) as shown in FIG. The sample IO is fixed with support members 6A and 6B, a detection device 3 such as a photoelectric element is provided above it, and an illumination device 7 such as a lamp is provided below, and light S is irradiated from the illumination device 7,
The light-shielding pattern 11 is detected by receiving the transmitted light T of the sample 10 by the detection device 3.

(発明が解決しようとする課題) しかし、上記検出方法は試料10に光を透過させる方法
であるので、試料10の検出すべき領域にはスペース等
の問題で駆動機構や基板支持機構を取付けることができ
ない。このため、従来は試料lOのパターン11の無い
外周部のみを支持部材6A、6Bで支持していた。この
ような方法では、大型又は薄く曲折し易い試料lOの部
分に破線で示すようなベンディングを生じ、試料10の
読取精度を高く維持できない欠点がある。
(Problem to be Solved by the Invention) However, since the above detection method is a method of transmitting light through the sample 10, it is necessary to attach a drive mechanism or a substrate support mechanism to the area of the sample 10 to be detected due to space issues. I can't. For this reason, conventionally, only the outer peripheral portion of the sample IO without the pattern 11 was supported by the supporting members 6A and 6B. Such a method has the drawback that bending as shown by the broken line occurs in a portion of the sample 10 that is large or thin and easy to bend, making it impossible to maintain high reading accuracy of the sample 10.

これを解決する方法として、厚いガラス板などの剛性の
高い透明部材の上に被検試料を載置する方法も考えられ
るが、これによればベンディングは生じないが、駆動機
構を配置することができないという設計上の制約は解決
できない。又、他の方法として金属顕微鏡等で使用され
る落射照明により上記パターンを検出することも行なわ
れている。しかし、この方法ではステージ等には制約が
ないものの、エマルジョンパターンの検出が困難であっ
たり、クロームパターン等の反射光で検出し易い試料の
場合でも、パターン以外の光透過部の傷や遮光性パター
ン上の異物等の余分な検出を行なフたり、反射特性が不
安定な場合に検出が不安定になってしまうという問題が
あった。
One possible solution to this problem is to place the test sample on a highly rigid transparent member such as a thick glass plate, but this method does not cause bending, but it does require the placement of a drive mechanism. Design constraints that say it is not possible cannot be resolved. Another method is to detect the pattern using epi-illumination used in a metallurgical microscope or the like. However, although this method does not have any restrictions on the stage, etc., it is difficult to detect emulsion patterns, or even in the case of samples that are easy to detect with reflected light such as chrome patterns, scratches on light-transmitting parts other than the patterns and light-blocking There is a problem in that redundant detection of foreign matter on the pattern is performed, and detection becomes unstable when the reflection characteristics are unstable.

この発明は上述のような事情からなされたものであり、
この発明の目的は、ステージ等の配置上の制約を取除く
と共に、遮光性パターンを常に高性能に検出できるパタ
ーン検出方法を提供するこ1 とにある。
This invention was made from the above-mentioned circumstances,
An object of the present invention is to provide a pattern detection method that eliminates constraints on the arrangement of stages and the like and that can always detect light-shielding patterns with high performance.

発明の構成; (課題を解決するための手段) この発明は、透明基板上に形成された遮光性パターンに
光を照射して、検出手段により透過方式で前記遮光性パ
ターンを検出するパターン検出方法に関し、この発明の
上記目的は、前記透明基板に対する前記検出手段の反対
側に反射体を設け、前記遮光性パターンの検出側から光
を照射し、前記反射体での反射光が前記透明基板を透過
してから前記検出手段で検出することにより達成される
Structure of the Invention; (Means for Solving the Problems) The present invention provides a pattern detection method in which a light-shielding pattern formed on a transparent substrate is irradiated with light and the light-shielding pattern is detected by a detection means in a transmission manner. Regarding the object of the present invention, a reflector is provided on the opposite side of the detection means with respect to the transparent substrate, light is irradiated from the detection side of the light-shielding pattern, and the light reflected by the reflector illuminates the transparent substrate. This is achieved by detecting it with the detection means after passing through it.

(作用) この発明のパターン検出方法は、透明基板上に形成され
た遮光性パターンを有する試料の裏面側に反射体を設け
、光源より試料を介して反射体に光を照射し、試料の遮
光性パターンを、前記透明基板の裏面より通過してきた
反射光を検出手段で検出することにより高性能に検出す
るようにしている。
(Function) In the pattern detection method of the present invention, a reflector is provided on the back side of a sample having a light-shielding pattern formed on a transparent substrate, and light is irradiated from a light source to the reflector through the sample, thereby shielding the sample from light. The pattern is detected with high performance by using a detection means to detect the reflected light that has passed through the back surface of the transparent substrate.

(実施例) 第1図は、この発明のパターン検出方法を実現するパタ
ーン検出装置の一例を示している。
(Example) FIG. 1 shows an example of a pattern detection device that implements the pattern detection method of the present invention.

この装置では、試料10の背面側に、裏面に光の反射層
22が層設された透明板等21から成る反射板20をs
i置しておく。そして、試料1(lの両側上方に配置さ
れている光源IA、IBの光を光学系2A、2Bを介し
て、それぞれ照射光SKI、Sに2として試料lOに照
射する。照射光SKI 、SK2は試料10の透明基板
12を透過し、反射板20の反射層22に到達して反射
され、反射光PKとして試料10の透明基板12を再び
透過して、遮光性パターン11を透明基板12の裏面側
より照らす。そこで、試料lOの上方に光学系を有シタ
イメージセンサ等の検出装置3を配設しておけば、遮光
性パターン11を鮮明な画像として検出することができ
る。
In this device, a reflection plate 20 consisting of a transparent plate or the like 21 having a light reflection layer 22 on the back side is placed on the back side of the sample 10.
I leave it there. Then, the light from the light sources IA and IB arranged above both sides of the sample 1 (l) is irradiated onto the sample lO through the optical systems 2A and 2B as irradiation lights SKI and S2, respectively.Irradiation lights SKI and SK2 The light passes through the transparent substrate 12 of the sample 10, reaches the reflective layer 22 of the reflector plate 20, is reflected, and passes through the transparent substrate 12 of the sample 10 again as reflected light PK, causing the light-shielding pattern 11 to pass through the transparent substrate 12. It is illuminated from the back side. Therefore, if a detection device 3 such as an image sensor with an optical system is disposed above the sample 10, the light-shielding pattern 11 can be detected as a clear image.

すなわち、反射層22での散乱光は試料1oに対して透
過照明として作用するため、遮光性パターン11の検出
を良好に行なうことができる。また、透明板等21の厚
さを大きくすると、照射光束にかかるパターンの影や反
射面の凹凸の影響を減少することができる。検出領域に
照射光が当ると、その部分での反射光が検出に影響を与
えるため、検出領域の外を通っ″て検出領域の直下の反
射層22に照明光が当るように照明すると、検出系から
は拡散板を用いた透過光照明と同等な効果が得られ、よ
り良好なパターン検出ができる。
That is, since the light scattered by the reflective layer 22 acts as transmitted illumination for the sample 1o, the light-shielding pattern 11 can be detected satisfactorily. Further, by increasing the thickness of the transparent plate 21, etc., it is possible to reduce the influence of pattern shadows and unevenness of the reflecting surface on the irradiated light beam. When the irradiation light hits the detection area, the reflected light at that part affects the detection, so if the illumination light passes through the outside of the detection area and hits the reflective layer 22 directly under the detection area, the detection The system provides an effect equivalent to that of transmitted light illumination using a diffuser plate, and enables better pattern detection.

第2図は、この発明のパターン検出装置の他の例を示し
ている。
FIG. 2 shows another example of the pattern detection device of the present invention.

このパターン検出装置では、反射板30の反射層31に
図示の様な鋸歯状断面の反射面を有するものを使用し、
光源1.光学系2からの照射光Sに3を垂直方向に指向
性をもった反射光Fに1として反射すると共に、反射光
FKIを光学系4を介しライセンサ5で読取るようにし
ている。そこで、この装置では照射光の効率が第1図の
装置よりも高く、遮光性パターン11の高速度な検出が
可能である。
In this pattern detection device, the reflective layer 31 of the reflective plate 30 has a reflective surface with a sawtooth cross section as shown in the figure.
Light source 1. The irradiated light S from the optical system 2 is reflected as 3 and the reflected light F having vertical directionality as 1, and the reflected light FKI is read by the licensor 5 via the optical system 4. Therefore, in this device, the efficiency of irradiation light is higher than that in the device shown in FIG. 1, and the light-shielding pattern 11 can be detected at high speed.

液晶投影露光装置ではR(赤)、G(緑)、B(青)な
どの着色層の塗布と、露光、現像を繰り返してRGBの
各パターンを形成するが、第2色目以降はそれより前に
形成されたパターンを検出しアライメントした後に露光
する必要がある。液晶基板は大型で薄いため、透過照明
できる構造のステージは困難であるため、)Ie−Ne
レーザなどを走査して反射光を検出してアライメントを
行なっている。しかし、塗布層が着色しであるため、例
えばBの場合には赤色のレーザ光が透過せず、反射光の
下層のパターンによる変化は微少であり、検出が困難に
なるという問題がある。本発明で照明光を白色光(感光
波長は遮断)とすれば必ず透過波長帯があり、しかも透
過光照明と同等な光学像が得られ、安定、正確な検出と
アライメントができる。
In a liquid crystal projection exposure system, each RGB pattern is formed by repeating the application of colored layers such as R (red), G (green), and B (blue), exposure, and development. It is necessary to detect and align the pattern formed on the image before exposing it to light. Since the liquid crystal substrate is large and thin, it is difficult to create a stage with a structure that allows for transmitted illumination.
Alignment is performed by scanning with a laser or the like and detecting the reflected light. However, since the coating layer is colored, for example, in the case of B, red laser light does not pass through, and changes in the reflected light due to the pattern of the lower layer are minute, making detection difficult. In the present invention, if the illumination light is white light (the sensitive wavelength is blocked), there is always a transmitted wavelength band, and an optical image equivalent to transmitted light illumination can be obtained, allowing stable and accurate detection and alignment.

なお、上述の実施例において、試料10に対する光源1
.IA、IB及び光学系2.2A、2Bからの照射光5
KI−5K3の入射角は任意でよい。又、照射光SKI
〜5に3は遮光パターン11と重なるように照射しても
よいし、反射光FK、FKIと重なるようにしてもよい
。さらに、第1図及び第2図の検出装置の上記光源及び
光学系の数は任意である。
Note that in the above embodiment, the light source 1 for the sample 10
.. Irradiation light 5 from IA, IB and optical system 2.2A, 2B
The incident angle of KI-5K3 may be arbitrary. Also, the irradiation light SKI
5 to 3 may be irradiated so as to overlap with the light shielding pattern 11, or may be made to overlap with the reflected lights FK and FKI. Furthermore, the number of light sources and optical systems in the detection apparatus of FIGS. 1 and 2 is arbitrary.

発明の効果; この発明のパターン検出方法によれば、特にシャドウマ
スク用のフォトマスクパターン等のように遮光部の比率
の少ないパターンに対しても、検出系側からの照明だけ
で透過光によるパターンを検出することができ、各種パ
ターンの座標幅検出や形状、欠陥検査等の広範囲な用途
に使用できる利点がある。又、この発明の方法を使用し
た装置は、光学系およびステージ等の配置の制約を増除
くこと力yでき、高性能な画像を得ることができる。さ
、らに、装置構成が簡単でコストが安価な利点がある。
Effects of the Invention: According to the pattern detection method of the present invention, even for patterns with a small proportion of light-shielding parts, such as photomask patterns for shadow masks, patterns using transmitted light can be detected using only illumination from the detection system. It has the advantage that it can be used for a wide range of applications such as coordinate width detection of various patterns, shape, and defect inspection. Further, an apparatus using the method of the present invention can increase or eliminate restrictions on the arrangement of optical systems, stages, etc., and can obtain high-performance images. Furthermore, the device has the advantage of a simple configuration and low cost.

さらにまた、反射体の上に試料を載置して検査するので
、試料が可撓性を有するものであっても試料のベンディ
ングがなく、精度のよい画像が得られるという利点もあ
る。
Furthermore, since the sample is placed on the reflector and inspected, there is no bending of the sample even if the sample is flexible, and there is an advantage that a highly accurate image can be obtained.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はこの発明の方法を実現するパターン検出装置の
構成の一例を示す図、第2図は他のパターン検出装置の
構成図、第3図は従来の検出方法を説明するための図で
ある。 1、IA、1B・・・光源、2.2A、2B・・・光学
系、3・・・検出器、10・・・試料、20.30・・
・反射板。 出願人代理人   安 形 雄 三 第f凪 蔓2図
FIG. 1 is a diagram showing an example of the configuration of a pattern detection device that implements the method of the present invention, FIG. 2 is a configuration diagram of another pattern detection device, and FIG. 3 is a diagram for explaining a conventional detection method. be. 1, IA, 1B... light source, 2.2A, 2B... optical system, 3... detector, 10... sample, 20.30...
·a reflector. Applicant's agent Yu Yasugata No. 3 F. Nagitsuru 2

Claims (1)

【特許請求の範囲】 1、透明基板上に形成された遮光性パターンに光を照射
して、検出手段により透過方式で前記遮光性パターンを
検出するパターン検出方法において、前記透明基板に対
する前記検出手段の反対側に反射体を設け、前記遮光性
パターンの検出側から光を照射し、前記反射体での反射
光が前記透明基板を透過してから前記検出手段で検出す
るようにしたことを特徴とするパターン検出方法。 2、前記遮光性パターンの検出領域に前記光が直接当た
らないように照射する請求項1に記載のパターン検出方
法。 3、前記遮光性パターンの検出領域を包含する前記反射
体の領域に前記光を照射する請求項1に記載のパターン
検出方法。 4、前記反射体が、前記検出手段に向かう反射光の強度
が入力側よりも大きくなるような指向性を有している請
求項1に記載のパターン検出方法。
[Scope of Claims] 1. In a pattern detection method in which a light-shielding pattern formed on a transparent substrate is irradiated with light and a detection means detects the light-shielding pattern in a transmission manner, the detection means for the transparent substrate A reflector is provided on the opposite side of the light-shielding pattern, and light is irradiated from the detection side of the light-shielding pattern, and the light reflected by the reflector is transmitted through the transparent substrate and then detected by the detection means. A pattern detection method that uses 2. The pattern detection method according to claim 1, wherein the light is irradiated so as not to directly hit the detection area of the light-shielding pattern. 3. The pattern detection method according to claim 1, wherein the light is irradiated to a region of the reflector that includes a detection region of the light-shielding pattern. 4. The pattern detection method according to claim 1, wherein the reflector has a directivity such that the intensity of the reflected light directed toward the detection means is greater than that toward the input side.
JP9659788A 1988-04-19 1988-04-19 Pattern detection Pending JPH01267444A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9659788A JPH01267444A (en) 1988-04-19 1988-04-19 Pattern detection

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9659788A JPH01267444A (en) 1988-04-19 1988-04-19 Pattern detection

Publications (1)

Publication Number Publication Date
JPH01267444A true JPH01267444A (en) 1989-10-25

Family

ID=14169296

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9659788A Pending JPH01267444A (en) 1988-04-19 1988-04-19 Pattern detection

Country Status (1)

Country Link
JP (1) JPH01267444A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006038825A (en) * 2004-01-22 2006-02-09 Ntn Corp Micropattern observation device and micropattern correction device using it
JP2011141579A (en) * 2010-01-05 2011-07-21 Toray Eng Co Ltd Device and method for reading identification code inside transparent substrate
JP2018074091A (en) * 2016-11-04 2018-05-10 パナソニックIpマネジメント株式会社 Component mounting device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006038825A (en) * 2004-01-22 2006-02-09 Ntn Corp Micropattern observation device and micropattern correction device using it
JP2011141579A (en) * 2010-01-05 2011-07-21 Toray Eng Co Ltd Device and method for reading identification code inside transparent substrate
JP2018074091A (en) * 2016-11-04 2018-05-10 パナソニックIpマネジメント株式会社 Component mounting device

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