JPH01267179A - Heat-generating material for microwave oven - Google Patents
Heat-generating material for microwave ovenInfo
- Publication number
- JPH01267179A JPH01267179A JP63084677A JP8467788A JPH01267179A JP H01267179 A JPH01267179 A JP H01267179A JP 63084677 A JP63084677 A JP 63084677A JP 8467788 A JP8467788 A JP 8467788A JP H01267179 A JPH01267179 A JP H01267179A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- thin film
- conductive material
- heat
- electric
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000463 material Substances 0.000 title claims abstract description 48
- 239000004020 conductor Substances 0.000 claims abstract description 30
- 238000010438 heat treatment Methods 0.000 claims description 41
- 239000010409 thin film Substances 0.000 claims description 41
- 239000010408 film Substances 0.000 claims description 40
- 239000011810 insulating material Substances 0.000 claims description 17
- 239000010410 layer Substances 0.000 abstract description 75
- 229910052782 aluminium Inorganic materials 0.000 abstract description 11
- 239000012790 adhesive layer Substances 0.000 abstract description 10
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract description 6
- 238000004519 manufacturing process Methods 0.000 abstract description 5
- 229910052751 metal Inorganic materials 0.000 abstract description 5
- 239000002184 metal Substances 0.000 abstract description 5
- 239000000919 ceramic Substances 0.000 abstract description 2
- 229910001092 metal group alloy Inorganic materials 0.000 abstract description 2
- 229910044991 metal oxide Inorganic materials 0.000 abstract description 2
- 150000004706 metal oxides Chemical class 0.000 abstract description 2
- 239000003989 dielectric material Substances 0.000 abstract 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 abstract 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 abstract 2
- 229910052802 copper Inorganic materials 0.000 abstract 1
- 229910052593 corundum Inorganic materials 0.000 abstract 1
- 238000009413 insulation Methods 0.000 abstract 1
- 230000005389 magnetism Effects 0.000 abstract 1
- 229910001845 yogo sapphire Inorganic materials 0.000 abstract 1
- 238000004544 sputter deposition Methods 0.000 description 12
- 238000007740 vapor deposition Methods 0.000 description 11
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 10
- 238000000034 method Methods 0.000 description 8
- -1 polyethylene Polymers 0.000 description 8
- 229920000139 polyethylene terephthalate Polymers 0.000 description 5
- 239000005020 polyethylene terephthalate Substances 0.000 description 5
- 239000004698 Polyethylene Substances 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 229920000573 polyethylene Polymers 0.000 description 4
- 238000004804 winding Methods 0.000 description 4
- 239000005022 packaging material Substances 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 238000005422 blasting Methods 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 238000010411 cooking Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000002985 plastic film Substances 0.000 description 2
- 238000005477 sputtering target Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000007738 vacuum evaporation Methods 0.000 description 2
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000009820 dry lamination Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 210000004709 eyebrow Anatomy 0.000 description 1
- 230000005294 ferromagnetic effect Effects 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 238000001552 radio frequency sputter deposition Methods 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
Landscapes
- Laminated Bodies (AREA)
- Package Specialized In Special Use (AREA)
Abstract
Description
【発明の詳細な説明】
〈産業上の利用分野〉
本発明は、家庭用電子レンジ等によるマイクロ波照射に
より食品を加熱することができる電子レンジ、発熱材料
に関する。DETAILED DESCRIPTION OF THE INVENTION <Industrial Application Field> The present invention relates to a microwave oven and a heat-generating material that can heat food by microwave irradiation from a household microwave oven or the like.
〈従来技術〉
食品を電子レンジ等により加熱調理することが電子レン
ジの普及と共に家庭で行われるようになってきている。<Prior Art> With the spread of microwave ovens, cooking of food using microwave ovens and the like has become commonplace at home.
一般に、食品をマイクロ波調理するのに用いられる発熱
材料は、基材上にマイクロ波照射により発熱する発熱層
を設ける構成であり、この発熱層はマイクロ波照射によ
って、特に加熱を受ける用に設計されている。これらの
発熱層は、一般に導電性元素金属からなる。（例えば特
公昭６０−１５５４８号公報）。Generally, heat-generating materials used for microwave cooking of food have a structure in which a heat-generating layer that generates heat by microwave irradiation is provided on a base material, and this heat-generating layer is specifically designed to be heated by microwave irradiation. has been done. These heating layers generally consist of conductive elemental metals. (For example, Japanese Patent Publication No. 60-15548).
また、より発熱効果を高めるためにシート自身の形状を
維持できるような適度の剛性を有する基材物質の片面の
内側に金属蒸着薄膜層を有する発熱体フィルムを二重に
貼着するか、この基材物質の両面に各々この発熱体フィ
ルムを貼着したマイクロ波吸収シートが電子レンジ発熱
包材として使用されている。In addition, in order to further enhance the heat generation effect, a heat generating film having a metal vapor-deposited thin film layer may be double attached to the inside of one side of the base material, which has an appropriate rigidity that allows the sheet to maintain its own shape. A microwave absorbing sheet, in which the heat generating film is adhered to both sides of a base material, is used as a microwave heat generating packaging material.
〈発明が解決しようとする課題〉
従来の電子レンジ発熱材料は、基材物質の片面に金属蒸
着薄膜層を有する発熱体フィルムを二重に貼着するか、
その基材物質の両面に各々その発熱体フィルムを貼着し
た構造であるが、一つの発熱体フィルムを作成後、発熱
体フィルム同志でラミネートを行って、二重の発熱体フ
ィルムを得るため、製造工程が複雑である。また、発熱
材料に加工するには、さらに紙とラミネートするため、
加工時間が長いうえ、ブロッキング、剥離などの問題も
おこりやすく、後の成形などの加工適性も良いものでは
ない。<Problems to be Solved by the Invention> Conventional microwave oven heating materials are made by attaching a heating element film having a metal vapor-deposited thin film layer on one side of a base material, or
The structure is such that the heating element films are attached to both sides of the base material, but after creating one heating element film, the heating element films are laminated together to obtain a double heating element film. The manufacturing process is complicated. In addition, in order to process it into a heat-generating material, it is further laminated with paper.
In addition to the long processing time, problems such as blocking and peeling are likely to occur, and the suitability for subsequent processing such as molding is not good.
本発明の目的は、発熱効率のよい発熱材料を簡単な製造
工程で製造可能な電子レンジ発熱材料を提供することで
ある。An object of the present invention is to provide a microwave oven heat generating material that can be produced with a simple manufacturing process and has good heat generating efficiency.
く課題を解決するための手段〉
本発明は、基体フィルム上に導電性物質薄膜層、絶縁物
１ｒ薄膜層順に設け、更に前記絶縁物質薄膜層上に導電
性物質薄膜層を設けた電子レンジ発熱材料である。Means for Solving the Problems> The present invention provides a microwave heating system in which a conductive material thin film layer and an insulating material thin film layer are provided in this order on a base film, and a conductive material thin film layer is further provided on the insulating material thin film layer. It is the material.
また、本発明は、導電性薄膜層、絶縁物質薄膜層を複数
設け、多層状態とした電子レンジ発熱材料である。Further, the present invention is a microwave heating material in which a plurality of conductive thin film layers and insulating material thin film layers are provided in a multilayered state.
次に図面により詳細に説明する。Next, it will be explained in detail with reference to the drawings.
第１図は、本発明の電子レンジ発熱材料の積層状態の一
例を示し、この場合、導電性物質層が２層である時の状
態を示す断面図である。FIG. 1 is a sectional view showing an example of the stacked state of the microwave heating material of the present invention, in which there are two conductive material layers.
第２図は、本発明の電子レンジ発熱材料の積層状態の他
の例を示し、この場合、導電性物質層が３層である時の
状態を示す断面図である。FIG. 2 is a cross-sectional view showing another example of the stacked state of the microwave heating material of the present invention, in which there are three conductive material layers.
１は本発明の電子レンジ発熱材料である。２は、基材フ
ィルムであり、この基材フィルムとして適する物質はポ
リエステル、ポリエチレン、ナイロン及びその他比較的
耐熱性を有するプラスチックフィルムからなり、高温に
おいて充分に安定であるポリエステルフィルムが特に適
している。３ａ。1 is a microwave heating material of the present invention. 2 is a base film, and materials suitable for this base film include polyester, polyethylene, nylon, and other relatively heat-resistant plastic films, and polyester films are particularly suitable as they are sufficiently stable at high temperatures. 3a.
３ｂ、３ｃは導電性物質薄膜層であり、この導電性物質
薄膜層を形成すべき導電性物質としては、ＡＩ、Ｃｕ、
ＳｕＳ 、 Ｃｒ、 Ｎ１．、Ｆｅ、 Ｔｉ、 Ｐｄ
、 Ｓｎ、Ｉｎなどの各種金属、ＩＴＯ、ＳｎＯ，、Ｆ
ｅＯ□などの各種金属酸化物、及び金属合金などの導電
性を有するもので、特に、抵抗が大きく、強磁性なもの
が好ましい。3b and 3c are conductive material thin film layers, and the conductive materials to form these conductive material thin film layers include AI, Cu,
SuS, Cr, N1. , Fe, Ti, Pd
, various metals such as Sn, In, ITO, SnO,, F
A material having electrical conductivity such as various metal oxides such as eO□ and a metal alloy, and in particular, a material having high resistance and being ferromagnetic is preferable.
また、薄膜形成手段としては、真空゛蒸着、スパッタリ
ング、イオンブレーティングのいずれかの方法で形成す
る。Further, as a means for forming a thin film, any one of vacuum evaporation, sputtering, and ion blasting is used.
ここで形成される導電性物質薄膜の膜厚は、マイクロ波
を反射せず、効率よ（発熱する膜厚とすればよい０例え
ば、アルミニウムの場合は、５０人〜７０人の範囲が好
適である。The thickness of the conductive thin film formed here should be such that it does not reflect microwaves and is efficient (generating heat). For example, in the case of aluminum, a range of 50 to 70 is suitable. be.
４ａ、４ｂは、絶縁物質薄膜層であり、この絶縁物質薄
膜層を形成すべき絶縁性物質としては、ＡｌｔＯｉ、Ｂ
ｅＯ、ＭｇＯ，５ｉＪｓ 、ＢＮ、 ３ＡｌｚＯｓ ・
２ＳｉＯｚ 、ＭｇＯ・５ｔｏｔ、 ２Ｍｇ０−５ｉｆ
ｔ、Ｚｒ０ｚ ・５ｉｆｔ、 ２Ｍｇ０ ・２Ａ１ｚＯ
１・５Ｓ１０２ 、ＳｉＬ、ＳｉＯ□・Ａ１□０３、ｉ
ｏ！などの電気絶縁性セラミックが用いられる。4a and 4b are insulating material thin film layers, and the insulating materials to form these insulating material thin film layers include AltOi and B.
eO, MgO, 5iJs, BN, 3AlzOs・
2SiOz, MgO・5tot, 2Mg0-5if
t, Zr0z ・5ift, 2Mg0 ・2A1zO
1・5S102, SiL, SiO□・A1□03, i
o! Electrically insulating ceramics such as
また、薄膜形成方法としては、真空蒸着、スパッタリン
グ、イオンブレーティングのいずれかの方法で形成する
。Further, as a thin film forming method, any one of vacuum evaporation, sputtering, and ion blasting is used.
そして、導電性物質薄膜層と絶縁物質薄膜層は、第１図
および第２図に示すように交互に多層とする。 ７ａ、
７ｂは発熱体フィルムであり、７ａは導電性物質薄膜
層が２層、７ｂは導電性物質薄膜層が３ｊ脅である発熱
体フィルムである。The conductive material thin film layer and the insulating material thin film layer are alternately formed into multiple layers as shown in FIGS. 1 and 2. 7a,
7b is a heating element film, 7a is a heating element film having two conductive material thin film layers, and 7b is a heating element film having three conductive material thin film layers.
５は接着剤層を示し、基材Ｎ６と前記発熱体フィルム７
ａ、 ７ｂと貼り合わせる。5 indicates an adhesive layer, which includes the base material N6 and the heating element film 7.
Paste a and 7b.
６は、基材層であり、発熱材料自身の形状を維持できる
適度の剛性を有する材料からなる。この基材層としては
、祇あるいはプラスチックシートが適当である。Reference numeral 6 denotes a base material layer, which is made of a material having appropriate rigidity to maintain the shape of the heat generating material itself. As this base material layer, a paper sheet or a plastic sheet is suitable.
次に３ａ、３ｂ、３Ｃ及び４ａ、４ｂの積層方法を図面
により説明する。Next, a method of laminating 3a, 3b, 3C and 4a, 4b will be explained with reference to the drawings.
第３図は巻取式連続蒸着スパッタリング装置の概略説明
図であり、８ａ、８ｂは巻取りロール、９は蒸着物を入
れたＥ／Ｂ蒸着源、１０はスパッタターゲットをセット
した。ＤＣスパッタ源、１１は真空系内を排気する排気
ポンプ、１２はクーリングロール、１３はスパッタター
ゲットをセットしたＩ？Ｆスパック源である。FIG. 3 is a schematic explanatory diagram of a winding type continuous vapor deposition sputtering apparatus, in which winding rolls 8a and 8b, an E/B vapor deposition source containing a vapor deposited material 9, and a sputtering target 10 are set. A DC sputtering source, 11 an exhaust pump for evacuating the inside of the vacuum system, 12 a cooling roll, and 13 a sputtering target I? It is a source of F spuck.
巻取りロール８ａにセントされた基材フィルム２は、他
方の巻き取りロール８ｂへ送り出され、この方向を仮に
正転とする。The base film 2 placed on the take-up roll 8a is sent out to the other take-up roll 8b, and this direction is assumed to be normal rotation.
真空系内が蒸着及びスパッタリングに十分適応できる真
空下におかれた後、基材フィルム２を正転方向へ流し、
同時に蒸着源９より導電性物質をＥ／Ｂ蒸着し、基材フ
ィルム２上へ導電性物質薄膜層３ａを形成する。この導
電性物質薄膜層３ａは上記した蒸着に限らず、ＤＣスパ
ッタリングｉｔｏまたはＲＦスパッタリング源１３より
スパッタリングしてもよい。After the inside of the vacuum system is placed under a vacuum that is sufficiently suitable for vapor deposition and sputtering, the base film 2 is flowed in the normal rotation direction,
At the same time, a conductive substance is deposited by E/B from the deposition source 9 to form a conductive substance thin film layer 3 a on the base film 2 . This conductive material thin film layer 3a is not limited to the above-mentioned vapor deposition method, but may be sputtered using DC sputtering or RF sputtering source 13.
巻き取りロール８ｂへ巻き取られた導電性物質薄膜層を
有する基材フィルムは、次に逆転方向へ流し、同時に上
記導電性物質薄膜層３ａ形成と同様な方法で絶縁物質層
４ａを、導電性物質薄膜層３ａ上に形成する。The base film having the conductive material thin film layer wound onto the winding roll 8b is then flowed in the reverse direction, and at the same time, the insulating material layer 4a is coated with the conductive material layer 4a in the same manner as in the formation of the conductive material thin film layer 3a. It is formed on the material thin film layer 3a.
次に正転方向へフィルムを流し、同時に絶縁性物質Ｆｉ
ｌ膜層４ａ上へ、第２層目の導電性物質薄膜層３ｂを上
記した同様の方向で形成し、第１図に示した発熱体フィ
ルム７ａを得る。Next, the film is flowed in the forward direction, and at the same time the insulating material Fi
A second conductive material thin film layer 3b is formed on the L film layer 4a in the same direction as described above to obtain the heating element film 7a shown in FIG.
さらに第２図に示したように、発熱体フィルム７ａ上へ
、絶縁物質薄膜層４ｂ、導電性物しつうずまく層３ｃを
上記と同様な方法で形成し多層（導電性物質薄膜層３層
以上）の発熱体フィルム７ｂを得ることができる。Furthermore, as shown in FIG. 2, an insulating material thin film layer 4b and a conductive material swirling layer 3c are formed on the heating element film 7a in the same manner as described above. ) can be obtained.
得られた発熱体フィルム７ａ、 ７ｂは基材層６と接着
剤層５を介して貼着され、電子レンジ発熱材料を得る。The obtained heating element films 7a and 7b are attached to the base layer 6 via the adhesive layer 5 to obtain a microwave heating material.
〈作用〉
電子レンジ発熱材料において、発熱体フィルム製造にお
いて、導電性物質薄膜層と絶縁物質薄膜層とを同じ工程
中で交互に設けることが可能で、加工時における工程を
簡略化することができ、任意に多層積層が可能である。<Function> In the production of a heating element film for microwave heating materials, conductive material thin film layers and insulating material thin film layers can be provided alternately in the same process, simplifying the processing steps. , arbitrary multilayer lamination is possible.
また、発熱体フィルム内の眉間の密着性が向上し、後工
程において印刷層等の加工を行っても接着剤層の剥離、
ブロッキング現象等の問題がなくなり、さらに発熱体フ
ィルム自体の膜厚も薄くなったことから、より加工適性
の優れたものが得られる。In addition, the adhesion between the eyebrows in the heating element film is improved, and even if the printing layer etc. are processed in the post-process, the adhesive layer will not peel off.
Problems such as blocking phenomena are eliminated, and the thickness of the heating element film itself is also reduced, so a product with better processability can be obtained.
〈実施例１〉
基材フィルムをポリエチレンテレフタレートフィルム（
１２μ）（東洋紡績部Ｅ５１００）、導電性物質薄膜層
として、アルミニウム蒸着層（７０人）（２層）、絶縁
物質薄膜層として、アルミナ（９９，５％純度）スパッ
タリング層（１０００人）をそれぞれ形成した発熱体フ
ィルムをウレタン系接着剤（東洋モートン類ＡＤ１０５
０Ｅ／ＡＤＲＴ−１０）からなる接着剤層を介して、ド
ライラミネーション法により、紙（４０ｇ／ボ）からな
る基材層を積層し、下記構成の電子レンジ発熱材料を得
た。<Example 1> The base film was a polyethylene terephthalate film (
12μ) (Toyobo E5100), an aluminum vapor deposition layer (70 people) (2 layers) as a conductive material thin film layer, and an alumina (99.5% purity) sputtering layer (1000 people) as an insulating material thin film layer. The formed heating element film was glued with urethane adhesive (Toyo Morton AD105).
A base material layer made of paper (40 g/board) was laminated by a dry lamination method via an adhesive layer made of 0E/ADRT-10) to obtain a microwave heating material having the following structure.
ポリエチレンテレタフレート（１２μ）／アルミニウム
蒸着層（７０人）／アルミナスパッタ層（１０００人）
／アルミニウム蒸着層（７０人）／接着剤層／祇（４０
ｇ／ｒｄ）
得られた電子レンジ発熱包材の性能評価として次の試験
を行なった。Polyethylene terephrate (12μ) / Aluminum evaporated layer (70 people) / Alumina sputtered layer (1000 people)
/ Aluminum vapor deposition layer (70 people) / Adhesive layer / Mizuki (40 people)
g/rd) The following test was conducted to evaluate the performance of the obtained microwave heating packaging material.
８００ μポリプロピレン成形トレー（１００ｍ＋ｍ
Ｘ １２０Ｉ×２５１１ＩＩ）に、上記電子レンジ発熱
材料（８０ｍｍＸ１００ ａｍ）を付け、サラダ油（初
期部２１〜２２’Ｃ） ５０ｇを入れ、電子レンジ（三
洋電気■製ＥＭＯ−Ａ５２、出力５００ｗ ）を用いて
ネマイクロ波照射時間を変えて油ま昇温値を測定した。800μ polypropylene molded tray (100m+m
Attach the above microwave heating material (80 mm x 100 am) to a microwave oven (80 mm The temperature rise value of the oil bath was measured by changing the microwave irradiation time.
結果は第４図のグラフに示す。The results are shown in the graph of FIG.
〈実施例２〉
導電製物質薄膜層として、アルミニウム蒸着層７０人を
３Ｎ、絶縁物質薄膜層として、アルミナ（９９，５純度
）スパッタリングＮ１０００人を２層とした以外、実施
例１と同様の条件で下記構成の電子レンジ発熱材料を得
、同様の評価した。その結果は、第４図のグラフに示す
。<Example 2> The same conditions as in Example 1 were used, except that the conductive material thin film layer was an aluminum evaporated layer of 70 N 3N, and the insulating material thin film layer was alumina (99.5 purity) sputtered N1000 N 2 layers. A microwave heating material having the following configuration was obtained and evaluated in the same manner. The results are shown in the graph of FIG.
ポリエチレンテレタフレート（１２μ）／アルミニウム
蒸着層（７０人）／アルミナスパッタ層（１０００人）
／アルミニウム蒸着層（７０人）／アルミナスパッタリ
ング層（１０００人）／アルミニウム蒸着層（７０人）
／接着剤層／紙（４０ｇ／ｒｒｒ）〈実施例３〉
導電製物質薄膜層として、５ＩＩＳ３０４スパツタリン
グ（４０人）を２層、絶縁物質薄膜層としてＭｇＯ蒸着
層（１０００人）にした以外、実施例１と同様条件で下
記構成の電子レンジ発熱材料を得手、同様の評価した。Polyethylene terephrate (12μ) / Aluminum evaporated layer (70 people) / Alumina sputtered layer (1000 people)
/ Aluminum vapor deposition layer (70 people) / Alumina sputtering layer (1000 people) / Aluminum vapor deposition layer (70 people)
/Adhesive layer/Paper (40g/rrr) <Example 3> Other than using 2 layers of 5IIS304 sputtering (40 people) as the conductive material thin film layer and a MgO vapor deposition layer (1000 people) as the insulating material thin film layer. A microwave heating material having the following structure was obtained under the same conditions as in Example 1 and evaluated in the same manner.
その結果は第４図のグラフに示す。The results are shown in the graph of FIG.
ポリエチレンテレタフレート（１２μ） ／５ｕｓ３０
４スパッタリング層（４０人）／ＭｇＯ蒸着層（１００
０人） ／５ｕｓ３０４スパッタリング層（４０人）／
接着剤層／祇（４０ｇ／ボ）
〈比較例１〉
発熱体フィルムとして、従来品を用いた以外、実施例１
と同様条件で下記構成の電子れんし発熱材料を得て評価
した。Polyethylene terephrate (12μ) /5us30
4 sputtering layers (40 people)/MgO vapor deposition layer (100
0 people) /5us304 sputtering layer (40 people)/
Adhesive layer/Gi (40g/Bo) <Comparative Example 1> Example 1 except that a conventional product was used as the heating element film
Under the same conditions as above, an electronic wire heat generating material having the following configuration was obtained and evaluated.
その結果を第４図のグラフに示す。The results are shown in the graph of FIG.
ＰＥＴ （１２μ）／アルミ蒸着層（７０人）／接着
剤層／ＰＥＴ（１２μ）／アルミ蒸着層（７０人）／接
着剤層／祇（４０ｇ／ｒｒｆ）
ＰＥＴ ：ポリエチレンテレフタレート〈比較例２〉
電子レンジ発熱材料を設けないトレーを用いた以外、実
施例１と同様条件で評価した。その結果を第４図のグラ
フに示す。PET (12 μ) / Aluminum vapor deposited layer (70 people) / Adhesive layer / PET (12 μ) / Aluminum vapor deposited layer (70 people) / Adhesive layer / Gion (40 g/rrf) PET: Polyethylene terephthalate <Comparative example 2> Electronic Evaluation was made under the same conditions as in Example 1, except that a tray without microwave heating material was used. The results are shown in the graph of FIG.
〈効果〉
本発明は上記の如き構成であり、従来の発熱体フィルム
が二重構造である電子レンジ発熱材料に比べて、発熱体
フィルムを同じ装置内で形成することができ、加工時に
おける工程が簡略化されており、しかも、加工通性が優
れていると共に、従来品と同程度の性能を持つ電子レン
ジ発熱包材を堤（共することができる。<Effects> The present invention has the above-mentioned configuration, and compared to conventional microwave heating materials in which the heating element film has a double structure, the heating element film can be formed in the same apparatus, and the process at the time of processing is reduced. It is simplified, has excellent processability, and can be used with microwave heating packaging materials that have the same performance as conventional products.
図面は、本発明の実施例を示すもので、第１図は、電子
レンジ発熱材料の一例を示す断面図、第２図は他の例を
示す断面図、第３図は本発明の電子レンジ発熱材料に用
いられる発熱体フィルムを加工する連続巻取り式蒸着ス
パッタリング機を示す概略説明図、第４図は、実施例１
〜３および比較例１．２の発熱材料を評価した結果を示
すグラフである。
１・・・電子レンジ発熱材料 ２・・・基材フィルム３
ａ、３ｂ、３ｃｍ導電性物質薄ＪＩＩ ７１４ａ、４ｂ
・・・・・・・・・絶縁物質薄膜層５・・・接着剤ｊｉ
６・・・基材層７８．７ｂ・・・・・・
・・・発熱体フィルム特 許 出 願 人
凸版印刷株式会社
代表者 鈴木和夫
第２図
＠３団
第４図The drawings show embodiments of the present invention; FIG. 1 is a sectional view showing an example of a microwave oven heat generating material, FIG. 2 is a sectional view showing another example, and FIG. 3 is a sectional view showing an example of a microwave oven of the present invention. FIG. 4 is a schematic explanatory diagram showing a continuous winding type vapor deposition sputtering machine for processing a heat generating film used as a heat generating material, and FIG.
3 is a graph showing the results of evaluating the heat generating materials of Comparative Example 1.2 and Comparative Example 1.2. 1...Microwave heat generating material 2...Base film 3
a, 3b, 3cm conductive material thin JII 714a, 4b
......Insulating material thin film layer 5...Adhesive ji
6...Base material layer 78.7b...
... Heating element film patent application Hito Toppan Printing Co., Ltd. Representative Kazuo Suzuki Figure 2 @ Group 3 Figure 4
Claims (2)
膜層を順に設け、さらに導電性物質薄膜層を設けた発熱
体フィルムを基材層と積層してなる電子レンジ発熱材料
。(1) A microwave heating material comprising a base film, a conductive material thin film layer and an insulating material thin film layer sequentially provided on the base film, and a heating element film further provided with the conductive material thin film layer laminated on the base material layer.
膜層をそれぞれ順に複数設け、さらに導電性物質薄膜層
を設けた発熱体フィルムを基材層と積層してなる電子レ
ンジ発熱材料。(2) A microwave oven heating material comprising a plurality of conductive material thin film layers and an insulating material thin film layer each sequentially provided on a base film, and a heating element film provided with a conductive material thin film layer further laminated on the base material layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63084677A JPH0786030B2 (en) | 1988-04-06 | 1988-04-06 | Microwave heating material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63084677A JPH0786030B2 (en) | 1988-04-06 | 1988-04-06 | Microwave heating material |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01267179A true JPH01267179A (en) | 1989-10-25 |
| JPH0786030B2 JPH0786030B2 (en) | 1995-09-20 |
Family
ID=13837333
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63084677A Expired - Fee Related JPH0786030B2 (en) | 1988-04-06 | 1988-04-06 | Microwave heating material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0786030B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6070021B2 (en) * | 2012-09-28 | 2017-02-01 | 凸版印刷株式会社 | Heating sheet for microwave oven and paper container with heating sheet for microwave oven |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6325421A (en) * | 1986-06-25 | 1988-02-02 | インタ−ナシヨナル ペ−パ− コンパニ− | Package for microwave cooking, thermal effect of which is controlled |
-
1988
- 1988-04-06 JP JP63084677A patent/JPH0786030B2/en not_active Expired - Fee Related
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6325421A (en) * | 1986-06-25 | 1988-02-02 | インタ−ナシヨナル ペ−パ− コンパニ− | Package for microwave cooking, thermal effect of which is controlled |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0786030B2 (en) | 1995-09-20 |
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