JPH01253449A - Relief-patterned material and its manufacture - Google Patents
Relief-patterned material and its manufactureInfo
- Publication number
- JPH01253449A JPH01253449A JP6300088A JP6300088A JPH01253449A JP H01253449 A JPH01253449 A JP H01253449A JP 6300088 A JP6300088 A JP 6300088A JP 6300088 A JP6300088 A JP 6300088A JP H01253449 A JPH01253449 A JP H01253449A
- Authority
- JP
- Japan
- Prior art keywords
- base material
- pattern
- uneven pattern
- ionizing radiation
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000463 material Substances 0.000 title claims abstract description 110
- 238000004519 manufacturing process Methods 0.000 title claims description 18
- 239000011347 resin Substances 0.000 claims abstract description 51
- 229920005989 resin Polymers 0.000 claims abstract description 51
- 239000010410 layer Substances 0.000 claims description 71
- 230000005865 ionizing radiation Effects 0.000 claims description 63
- 238000000034 method Methods 0.000 claims description 17
- 239000000758 substrate Substances 0.000 claims description 14
- 239000011241 protective layer Substances 0.000 claims description 12
- 230000001678 irradiating effect Effects 0.000 claims description 4
- 239000003973 paint Substances 0.000 abstract description 15
- 230000000694 effects Effects 0.000 abstract description 13
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 abstract description 2
- 229920006267 polyester film Polymers 0.000 abstract description 2
- 238000000926 separation method Methods 0.000 abstract 4
- 239000000976 ink Substances 0.000 description 24
- 238000000576 coating method Methods 0.000 description 8
- 239000011248 coating agent Substances 0.000 description 7
- -1 polypropylene Polymers 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 239000000123 paper Substances 0.000 description 5
- 230000005855 radiation Effects 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- 238000010894 electron beam technology Methods 0.000 description 4
- 239000000049 pigment Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- 238000007639 printing Methods 0.000 description 3
- 238000002834 transmittance Methods 0.000 description 3
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- 239000004568 cement Substances 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 239000010440 gypsum Substances 0.000 description 2
- 229910052602 gypsum Inorganic materials 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 239000004800 polyvinyl chloride Substances 0.000 description 2
- 229920000915 polyvinyl chloride Polymers 0.000 description 2
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229920000742 Cotton Polymers 0.000 description 1
- 239000004641 Diallyl-phthalate Substances 0.000 description 1
- 229920000219 Ethylene vinyl alcohol Polymers 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000004840 adhesive resin Substances 0.000 description 1
- 229920006223 adhesive resin Polymers 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 239000010425 asbestos Substances 0.000 description 1
- QUDWYFHPNIMBFC-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,2-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=CC=C1C(=O)OCC=C QUDWYFHPNIMBFC-UHFFFAOYSA-N 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 229910052918 calcium silicate Inorganic materials 0.000 description 1
- 239000000378 calcium silicate Substances 0.000 description 1
- OYACROKNLOSFPA-UHFFFAOYSA-N calcium;dioxido(oxo)silane Chemical compound [Ca+2].[O-][Si]([O-])=O OYACROKNLOSFPA-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000012792 core layer Substances 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 239000005038 ethylene vinyl acetate Substances 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 238000007756 gravure coating Methods 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 229920000554 ionomer Polymers 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000002655 kraft paper Substances 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000004579 marble Substances 0.000 description 1
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 210000003739 neck Anatomy 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 229920006284 nylon film Polymers 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 239000011087 paperboard Substances 0.000 description 1
- 239000001042 pigment based ink Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 239000011120 plywood Substances 0.000 description 1
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920006289 polycarbonate film Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- OTYBMLCTZGSZBG-UHFFFAOYSA-L potassium sulfate Chemical compound [K+].[K+].[O-]S([O-])(=O)=O OTYBMLCTZGSZBG-UHFFFAOYSA-L 0.000 description 1
- 229910052939 potassium sulfate Inorganic materials 0.000 description 1
- 235000011151 potassium sulphates Nutrition 0.000 description 1
- 229910052895 riebeckite Inorganic materials 0.000 description 1
- YGSDEFSMJLZEOE-UHFFFAOYSA-M salicylate Chemical compound OC1=CC=CC=C1C([O-])=O YGSDEFSMJLZEOE-UHFFFAOYSA-M 0.000 description 1
- 229960001860 salicylate Drugs 0.000 description 1
- 238000007790 scraping Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000001993 wax Substances 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
Landscapes
- Printing Methods (AREA)
Abstract
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、凹凸模様形成体及びその製造方法に関する。[Detailed description of the invention] [Industrial application field] The present invention relates to an uneven pattern forming body and a method for manufacturing the same.
従来、例えば平滑な表面に設けた絵柄に立体感を持たせ
るために、模様自体に厚みを持たせることが行われてい
るが、模様に厚みを持たせるためには特殊な印刷方法を
必要とする一部、シャープな盛り上がりを形成すること
が困難であり、美麗な立体模様を容易に形成できないと
いう問題があった。また、当然のことながら得られる立
体模様の形成物は、特に立体模様自体がシャープさや立
体感に欠けるものであった。Conventionally, for example, in order to give a three-dimensional effect to a pattern on a smooth surface, the pattern itself has been made thicker, but in order to give the pattern thickness, a special printing method is required. In some cases, it is difficult to form sharp bulges, and beautiful three-dimensional patterns cannot be easily formed. Further, as a matter of course, the resulting three-dimensional patterned product lacked sharpness and three-dimensional effect, especially in the three-dimensional pattern itself.
本発明は上記の点に鑑みなされたもので、シャープで美
麗な立体感が発現される凹凸模様形成体を提供するとと
もに、その凹凸模様形成体を容易に製造することができ
る凹凸模様の製造方法を提供することを目的とする。The present invention has been made in view of the above points, and provides a concavo-convex pattern forming body that exhibits a sharp and beautiful three-dimensional effect, and a method for manufacturing a concave-convex pattern that allows the concavo-convex pattern forming body to be easily manufactured. The purpose is to provide
本発明は、
[(1)凹凸模様形成用基材上に電離放射線硬化性樹脂
からなる凹凸模様が設けられたことを特形成する凹凸模
様形成体。The present invention provides: [(1) An uneven pattern forming body in which an uneven pattern made of an ionizing radiation curable resin is specially formed on a substrate for forming an uneven pattern.
(2)凹凸模様形成用基材上に電離放射線硬化性樹脂か
らなる凹凸模様が設けられたことを特形成する化粧材。(2) A decorative material in which a concavo-convex pattern made of an ionizing radiation-curable resin is formed on a base material for forming a concavo-convex pattern.
(3)凹凸模様の凸部上に模様層を設けた請求41又は
2記載の凹凸模様形成体。(3) The uneven pattern formed body according to claim 41 or 2, wherein a pattern layer is provided on the convex portions of the uneven pattern.
(4)凹凸模様の凹部にワイピングインギ層を設けた請
求項1〜3のいずれかに記載の凹凸模様形成体。(4) The concavo-convex pattern formed body according to any one of claims 1 to 3, wherein a wiping layer is provided in the concave portions of the concavo-convex pattern.
(5)凹凸模様の全面若しくは凸部上のみに保護層を設
けた請求項1〜4のいずれかに記載の凹凸模様形成体。(5) The uneven pattern formed body according to any one of claims 1 to 4, wherein a protective layer is provided on the entire surface of the uneven pattern or only on the convex portions.
(6)凹凸模様形成用基材が着色模様層を設けた凹凸模
様形成用基材である請求項1〜5のいす、n。(6) The chair according to any one of claims 1 to 5, wherein the base material for forming a concavo-convex pattern is a base material for forming a concavo-convex pattern provided with a colored pattern layer.
かに記載の凹凸模様形成体。An uneven pattern forming body described in Crab.
(7)凹凸模様形成用基材が凹凸表面を有−・1−る凹
凸模様形成用基+4である請求項1〜6のいずれかに記
載の凹凸模様形成体。(7) The uneven pattern forming body according to any one of claims 1 to 6, wherein the uneven pattern forming substrate is an uneven pattern forming base material having an uneven surface.
(8)下記各工程を順に行うことを特形成する凹凸模様
形成体の製造方法。(8) A method for manufacturing a concavo-convex pattern formed body, which is specially formed by performing each of the following steps in order.
(a) 表面がrlI離性を有する電熱放射線透過性
剥離基材の表裏いずれかの面に電離放射線遮gi、t1
i−模様を設ける工程、
(b) 凹凸模様形成用基材と剥離基材とを、電離放
射線硬化性樹脂層を介して重ね合わせる工程、(c)
剥離基材側より電離放射線を照射して電離放射線遮蔽
性模様のない部分に相当する電Hih々射線硬化性樹脂
層を硬化さ一部る工程、(d) 剥離基材を剥がして
電離放射線硬化性樹脂層の未硬化部の樹脂の一部を剥離
基材に付着させて除去する工程。(a) Ionizing radiation shielding gi, t1 on either the front or back side of the electrothermal radiation transparent release base material whose surface has rlI releasability.
a step of providing an i-pattern, (b) a step of overlapping a base material for forming an uneven pattern and a release base material via an ionizing radiation curable resin layer, (c)
irradiating ionizing radiation from the release base material side to cure the high radiation curable resin layer corresponding to the portion without the ionizing radiation shielding pattern; (d) peeling off the release base material and curing with ionizing radiation; A step in which a part of the uncured resin of the adhesive resin layer is attached to a release base material and removed.
(9)剥a基材上に模様層を設け、剥離基材の剥離によ
り凹凸模様の凸部上に該模様層を特形成する請求項8記
載の凹凸模様形成体の製造方法。(9) The method for manufacturing an uneven pattern formed body according to claim 8, wherein a pattern layer is provided on a peelable base material, and the pattern layer is specially formed on the convex portions of the uneven pattern by peeling off the peelable base material.
00) 剥離基材を剥離した後、凹凸模様形成用基材
上に残った未硬化の電離放射線硬化性樹脂を′:ば離放
射線を照射して硬化させる請求項8ヌは9記載の凹凸模
様形成体の製造方法。00) After the release base material is peeled off, the uncured ionizing radiation curable resin remaining on the base material for forming a concavo-convex pattern is cured by irradiating with release radiation. Method for manufacturing a formed body.
(11)剥離基材を剥離した後、凹凸模様形成用基材上
に残った未硬化の電離放射線硬化性樹脂を除去する請求
項8又は9記載の凹凸模様形成体の製造方法。(11) The method for producing an uneven pattern forming body according to claim 8 or 9, wherein after peeling off the release base material, uncured ionizing radiation-curable resin remaining on the uneven pattern forming base material is removed.
θり 剥離基材を剥離した後、凹凸模様の全面若しくは
凸部上のみに保護層を特形成する請求項8〜11のいず
れかに記載の凹凸模様形成体の製造方法。」
を要旨とするものである。The method for producing an uneven pattern formed body according to any one of claims 8 to 11, wherein after peeling off the release base material, a protective layer is specially formed on the entire surface of the uneven pattern or only on the convex portions. ” is the gist.
本発明によれば、電離放射線遮蔽性模様のある部分では
凹凸模様形成用基打上の電離放射線硬化性樹脂が硬化せ
ずに′1.l+ !基材の剥離によって除去され、電離
放射線遮蔽性模様のない部分では電離放射線硬化性樹脂
が硬化して残ることから凹凸模様が形成され、その結果
、凹凸模様形成用基村上に立体感に優れシャープな凹凸
模様を有する凹凸模様形成体が得られる。According to the present invention, the ionizing radiation-curable resin on the base for forming the concavo-convex pattern does not harden in the portion with the ionizing radiation-shielding pattern. l+! It is removed by peeling off the base material, and in areas where there is no ionizing radiation shielding pattern, the ionizing radiation curable resin hardens and remains, forming an uneven pattern. A concavo-convex pattern formed body having a concavo-convex pattern is obtained.
以下、本発明の実施例を図面に基き説明する。 Embodiments of the present invention will be described below with reference to the drawings.
第1図は本発明の凹凸模様形成体を示すもので、本発明
凹凸模様形成体1は凹凸模様形成用基材2上に電離放射
線硬化性樹脂からなる凹凸模様3が設られた構成からな
る。又、凹凸模様形成体1は第2図に示すように凹凸模
様の凸部4に転写による模様層5が設けられ、この模様
層5を設けることにより凸部模様に同調した意匠効果が
得られる。FIG. 1 shows an uneven pattern forming body of the present invention. The uneven pattern forming body 1 of the present invention has a structure in which an uneven pattern 3 made of an ionizing radiation curable resin is provided on a base material 2 for forming an uneven pattern. . Further, as shown in FIG. 2, the uneven pattern forming body 1 is provided with a pattern layer 5 by transfer on the convex portions 4 of the concavo-convex pattern, and by providing this pattern layer 5, a design effect that is in tune with the convex pattern can be obtained. .
又、凹凸模様形成体1は第3図に示すように凹凸模様の
凹部6にワイピングインキ層7が設けられ、このインキ
層7を設けることにより凹部模様に同調した意匠効果が
得られる。更に、凹凸模様形成体1は凹凸模様3等の表
面保護を図るために保護層8が設けられ、保護層8は凹
凸模様の凸部4上のみに形成しても(第2図)、凹凸模
様3の全面に形成してもよい(第3図)、またワイピン
グインキN7を設ける場合には、更に保護層8を形成し
てもよい。Further, as shown in FIG. 3, in the uneven pattern forming body 1, a wiping ink layer 7 is provided in the recessed portions 6 of the uneven pattern, and by providing this ink layer 7, a design effect that is in tune with the recessed portion pattern can be obtained. Furthermore, the uneven pattern forming body 1 is provided with a protective layer 8 in order to protect the surface of the uneven pattern 3, etc., and even if the protective layer 8 is formed only on the convex portions 4 of the uneven pattern (FIG. 2), It may be formed on the entire surface of the pattern 3 (FIG. 3), and when the wiping ink N7 is provided, a protective layer 8 may be further formed.
また、凹凸81様形成体1は必要に応じて第2図又は第
3図に示すように着色模様層9を設けた凹凸模様形成用
基材2や、凹凸表面を有する凹凸模様形成用基材2にて
構成される。着色模様層9は着色層又は模様層か、或い
は両層を組み合わせたものであり、基材2の全面に設け
ても一部に設けてもよい、凹凸表面を有する凹凸模様形
成用基材2により構成した場合、凹凸模様3はその凹凸
表面に追従した形態となり、凹凸表面自体は基材2の一
部に存在するものであってもよい。In addition, the uneven pattern 81-formed body 1 may be a substrate 2 for forming an uneven pattern provided with a colored pattern layer 9 as shown in FIG. 2 or 3 as needed, or a substrate for forming an uneven pattern having an uneven surface. Consists of 2. The colored pattern layer 9 is a colored layer or a pattern layer, or a combination of both layers, and may be provided on the entire surface or a part of the base material 2. The base material 2 for forming an uneven pattern has an uneven surface. In this case, the uneven pattern 3 follows the uneven surface, and the uneven surface itself may be present in a part of the base material 2.
以上のように構成される本発明の凹凸模様形成体lはい
かなる用途に対しても適用可能であるが、化粧材として
用いることが最も好ましい。Although the concavo-convex pattern forming body 1 of the present invention constructed as described above can be applied to any purpose, it is most preferably used as a decorative material.
次に、上記の如き構成からなる凹凸模様形成体の製造方
法について説明する。Next, a method for manufacturing the uneven pattern forming body having the above structure will be explained.
まず、本発明製造方法では第4図に示すように表裏いず
れかの面に電離放射線遮蔽性模様11を設けた剥離基材
12を準備する。また凹凸模様の凸部4に転写による模
様層5を形成する場合、この段階において7、り離基材
12上に模様層5を設けておく。First, in the manufacturing method of the present invention, as shown in FIG. 4, a release base material 12 having an ionizing radiation shielding pattern 11 provided on either the front or back surface is prepared. Further, when forming the pattern layer 5 by transfer on the convex portions 4 having an uneven pattern, the pattern layer 5 is provided on the release base material 12 at this stage 7.
剥離基材12は電離放射線透過性を有するシート又はフ
ィルムよりなり、電離放射線が紫外線の場合には、例え
ばポリエステル、ポリアミド(ナイロン等)、ポリプロ
ピレン、フッ素系樹脂のシート又はフィルム等が挙げら
れるが、紫外線透過性に影響のある顔料等を含まないも
のが好ましい。電離放射線が電子線の場合には、電子線
の透過性が高いのであまり制約がなく、上記した紫外線
を透過する性質のあるシート又はフィルムは原則的に使
用でき、更に紙等も使用できる。The release base material 12 is made of a sheet or film that is transparent to ionizing radiation, and when the ionizing radiation is ultraviolet rays, examples include sheets or films of polyester, polyamide (such as nylon), polypropylene, and fluororesin. Preferably, it does not contain pigments that affect ultraviolet transmittance. When the ionizing radiation is an electron beam, there are no restrictions because the electron beam has high transparency, and in principle, the above-mentioned sheets or films that transmit ultraviolet rays can be used, and paper and the like can also be used.
剥離基材12の少なくとも電離放射線硬化性樹脂層13
(第6図)と接する側の表面は剥離性である必要があり
、素材自体が剥離性を有さない場合には剥離性の樹脂も
しくは組成物を塗布する等して表面剥離性として使用す
る。基材12の厚みは5〜200μm1特に25〜10
0μmが好ましい。At least the ionizing radiation curable resin layer 13 of the release base material 12
(Figure 6) The surface in contact with the material must be releasable, and if the material itself does not have releasability, use a releasable surface by applying a releasable resin or composition. . The thickness of the base material 12 is 5 to 200 μm, especially 25 to 10 μm.
0 μm is preferable.
電離放射線遮蔽性模様11は、剥離基材上面側から電離
放射線を照射した際に電離放射線を遮蔽するためのもの
であり、該模様11を設ける位置は、第4回に示すよう
に211離基材12の下面側でも、また特に図示しない
が剥離基材12の上面側でもよく、剥離基材12に必要
に応じて模様層5等を設けた場合には該層5の上に設け
てもよい。The ionizing radiation shielding pattern 11 is for shielding ionizing radiation when ionizing radiation is irradiated from the upper surface side of the release base material, and the position where the pattern 11 is provided is as shown in the fourth article. It may be on the lower surface side of the material 12, or on the upper surface side of the release base material 12, although not particularly shown, or if the pattern layer 5 etc. is provided on the release base material 12 as necessary, it may be provided on the layer 5. good.
電離放射線遮蔽性模様11を形成する材料としては、電
離放射線が紫外線であるときは、紫外線を反射して遮蔽
する物質、例えば酸化チタン、硫酸カリウム、炭酸カル
シウム等の充填剤、または粒径が0.3〜10μm程度
で隠蔽力の大きい顔料を含有するインキ、紫外線を吸収
する物質、例えばベンゾフェノール系、サリチレート系
、ヘンシトリアゾール系、アクリロニトリル系等の紫外
線吸収剤、光吸収性の顔料、カーボンブランクまたは無
機物とともにクエンチャ−(例えば金属錯塩系もしくは
ヒンダードアミン系等)を含有するインキ等が挙げられ
る。また電離放射線が電子線であるときは、上記したイ
ンキや他の顔料系のものを含有するインキが挙げられる
。電離放射線遮蔽性模様11はこれらのインキを用いて
通常の印刷法により形成することができる。When the ionizing radiation is ultraviolet rays, the material forming the ionizing radiation shielding pattern 11 may be a substance that reflects and shields ultraviolet rays, such as a filler such as titanium oxide, potassium sulfate, or calcium carbonate, or a particle size of 0. .Ink containing a pigment with a large hiding power of about 3 to 10 μm, substances that absorb ultraviolet rays, such as ultraviolet absorbers such as benzophenol, salicylate, henctriazole, and acrylonitrile, light-absorbing pigments, and carbon blanks. Alternatively, an ink containing a quencher (for example, a metal complex salt type or a hindered amine type) together with an inorganic substance may be mentioned. When the ionizing radiation is an electron beam, examples include the above-mentioned inks and inks containing other pigment-based inks. The ionizing radiation shielding pattern 11 can be formed using these inks by a normal printing method.
剥離基材12上に設けられる模様層5は、凹凸模様の凸
部上に転写形成されるものであり、用途に応じて種々の
塗料若しくはインキを使用して形成される。模様層5は
電離放射線を透過させて、後述の電離放射線硬化性樹脂
層を硬化させる必要上、電離放射線透過性である。電離
放射線が紫外線であるときは紫外線透過性を確保するた
めに、紫外線透過性を妨げる顔料、充填剤の多用は避け
た方がよく、染料により着色するか、粒子径の極めて小
さい顔料を使用するとよい。模様層5は均一な層(いわ
ゆるヘタ層)として形成しても、或いは模様状に設けて
もよい。模様層は1色の印刷層であっても2色以上の印
刷層であってもよい。The pattern layer 5 provided on the release base material 12 is transferred onto the convex portions of the uneven pattern, and is formed using various paints or inks depending on the purpose. The pattern layer 5 is transparent to ionizing radiation because it is necessary to transmit ionizing radiation to cure the ionizing radiation-curable resin layer described below. When the ionizing radiation is ultraviolet rays, in order to ensure ultraviolet transmittance, it is better to avoid using too many pigments and fillers that interfere with ultraviolet transmittance. good. The pattern layer 5 may be formed as a uniform layer (a so-called flat layer) or may be provided in a pattern. The pattern layer may be a printed layer of one color or a printed layer of two or more colors.
次いで、電離放射線透過性模様11を設けたヱリ離基材
12を、第5図に示すように別に($備した電離放射線
硬化性樹脂層13を塗布して設けた凹凸模様形成用基材
2の樹脂層13側に重ね合わせて密着させる(第6図)
が、剥離基材12を枠に張って用いると、剥離基材12
の繰り返し使用が可能となり好ましい。電離放射線硬化
性樹脂層13は凹凸模様形成用基材2に塗布して設ける
場合の他、剥離基材12に塗布して設けても、凹凸模様
形成用基材2と剥離基材12の両方に塗布して設けても
よい。Next, as shown in FIG. 5, the relief base material 12 provided with the ionizing radiation-transparent pattern 11 was separately coated with an ionizing radiation-curable resin layer 13, which was then applied to a base material for forming an uneven pattern. Lay it on the resin layer 13 side of No. 2 and bring it into close contact (Fig. 6)
However, when the release base material 12 is stretched on a frame and used, the release base material 12
It is preferable because it enables repeated use. The ionizing radiation curable resin layer 13 may be provided by coating it on the base material 2 for forming an uneven pattern, or may be provided by coating it on the release base material 12. It may also be provided by applying it to the surface.
凹凸模様形成用基材2としては、どのようなものでもよ
いが、例えば■ステンレス鋼、鋼、アルミニウム、もし
くは銅等の金属の仮または成形品、■ガラス、大理石、
陶磁器、石膏ボード、石綿セメント板、珪酸カルシウム
板、GRC(ガラス繊維強化セメント)等の無機質の板
または成形品、■ポリエステル、メラミン、ポリ塩化ビ
ニル、ジアリルフタレート等の有機ポリマーの板、成形
品、あるいはこれらのシート、フィルム、■木、合板、
パーチクルボード等の木質の板または成形品、■薄葉紙
、晒クラフト紙、チタン紙、リンター祇、板紙、石こう
ボード紙等の祇;ポリエチレンフィルム、ポリプロピレ
ンフィルム、ポリ塩化ビニルフィルム、ポリ塩化ビニリ
デンフィルム、ポリビニルアルコールフィルム、ポリエ
チレンテレフタレートフィルム、ポリカーボネートフィ
ルム、ナイロンフィルム、ポリスチレンフィルム、エチ
レン酢酸ビニル共重合体フィルム、エチレンビニルアル
コール共重合体フィルム、アイオノマー等のプラスチン
クフィルム;鉄、アルミニウム、銅等の金属箔若しくは
シート;並びに以上の各素材の複合体、等が例示される
。これら凹凸模様形成用基材2には、目止め処理やプラ
イマー処理等の下地処理や接着性向上のための処理等を
行ってもよい。The base material 2 for forming the uneven pattern may be of any material, but for example, ■ Temporary or molded products of metal such as stainless steel, steel, aluminum, or copper, ■ Glass, marble, etc.
Inorganic boards or molded products such as ceramics, gypsum board, asbestos cement board, calcium silicate board, GRC (glass fiber reinforced cement), ■Organic polymer boards and molded products such as polyester, melamine, polyvinyl chloride, diallyl phthalate, etc. Or these sheets, films, wood, plywood,
Wooden boards or molded products such as particle board, tissue paper, bleached kraft paper, titanium paper, linter paper, paperboard, gypsum board paper, etc.; polyethylene film, polypropylene film, polyvinyl chloride film, polyvinylidene chloride film, polyvinyl alcohol plastic film such as film, polyethylene terephthalate film, polycarbonate film, nylon film, polystyrene film, ethylene vinyl acetate copolymer film, ethylene vinyl alcohol copolymer film, ionomer; metal foil or sheet of iron, aluminum, copper, etc.; Examples include composites of each of the above materials. These base materials 2 for forming an uneven pattern may be subjected to surface treatment such as sealing treatment or primer treatment, treatment for improving adhesiveness, and the like.
また、凹凸模様形成用基材2に着色模様層9を設ける場
合、核層9のパターンは電離放射線遮蔽性模様11のパ
ターンと同調するパターンに設けてもよいが、必ずしも
両者が同調するように形成する必要はない。着色模様層
9は通常のインキ、塗料等を用いて公知の印刷法によっ
て形成することができるが、その他に着色模様自体を基
材2に転写したり或いは着色模様を設けたシートをラミ
ネートしたりして形成することもできる。この着色模様
層9は通常、凹凸模様形成用基材2の電離放射線硬化性
樹脂[13が設ける側(上面側)に設けるが、凹凸模様
形成用基材2が透明な材質よりなる場合には、該基材2
の下面側に設けることもできる。Further, when the colored pattern layer 9 is provided on the base material 2 for forming an uneven pattern, the pattern of the core layer 9 may be provided in a pattern that is synchronized with the pattern of the ionizing radiation shielding pattern 11; No need to form. The colored pattern layer 9 can be formed by a known printing method using ordinary ink, paint, etc., but it can also be formed by transferring the colored pattern itself onto the base material 2, or by laminating sheets provided with the colored pattern. It can also be formed by This colored pattern layer 9 is usually provided on the side where the ionizing radiation curable resin [13 is provided (top side)] of the base material 2 for forming a concavo-convex pattern, but when the base material 2 for forming a concavo-convex pattern is made of a transparent material, , the base material 2
It can also be provided on the lower surface side.
電離放射線硬化性樹脂層13は、構造中にラジカル重合
性の二重結合を有するポリマー、オリゴマー、七ツマー
等を主成分とし、光重合開始剤や増感剤、そのほか必要
に応じて非反応性のポリマー、有機溶剤、ワックスその
他の添加剤を含有するもので、種々のグレードのものが
市場から容易に入手でき、本発明に使用できる。また、
電離放射線硬化性樹脂層13に難燃剤、導電性材料等を
混入して難燃化、導電化等の機能を付与することもでき
る。更に、該樹脂層13は透明又は半透明な層であるこ
とが好ましい。電離放射線硬化性樹脂層13はグラビア
コート、ロールコート、フローコートもしくはスプレー
コート等の公知の方法により形成することができる。樹
脂層13の厚さは3μm〜1mm、特に30〜200μ
mが好ましい。The ionizing radiation curable resin layer 13 is mainly composed of polymers, oligomers, hexamers, etc. that have radically polymerizable double bonds in their structure, and contains a photopolymerization initiator, a sensitizer, and other non-reactive substances as necessary. Polymers, organic solvents, waxes, and other additives are readily available in various grades on the market and can be used in the present invention. Also,
It is also possible to add a flame retardant, a conductive material, etc. to the ionizing radiation-curable resin layer 13 to impart functions such as flame retardancy and conductivity. Further, the resin layer 13 is preferably a transparent or semitransparent layer. The ionizing radiation-curable resin layer 13 can be formed by a known method such as gravure coating, roll coating, flow coating, or spray coating. The thickness of the resin layer 13 is 3 μm to 1 mm, particularly 30 to 200 μm.
m is preferred.
次いで、剥離基材12と凹凸模様形成用基材2とを電離
放射線硬化性樹脂層13を介して重ね合わせて両者を密
着した後、ff1ll離基材12側より電離放射線14
を照射する(第6図)。電離放射線14の代表的なもの
は紫外線と電子線であるが、その他のものも利用できる
。電離放射vil14の照射により、電離放射線遮蔽性
模様11のない部分では電離放射線硬化性樹脂層13は
硬化し、また電離放射線遮蔽性模様11のある部分では
電離放射線硬化性樹脂層13が未硬化のままに置かれる
。Next, the release base material 12 and the uneven pattern forming base material 2 are overlapped with each other through the ionizing radiation curable resin layer 13 and are brought into close contact, and then ionizing radiation 14 is applied from the release base material 12 side.
(Figure 6). Typical examples of ionizing radiation 14 are ultraviolet light and electron beams, but other radiation can also be used. By irradiation with the ionizing radiation vil 14, the ionizing radiation curable resin layer 13 is cured in areas where there is no ionizing radiation shielding pattern 11, and the ionizing radiation curable resin layer 13 remains uncured in areas where the ionizing radiation shielding pattern 11 is present. left alone.
電離放射線14の照射後に′J、ll離基材12を剥離
すると、電離放射線硬化性樹脂層13の未硬化部分では
、未硬化の電離放射線硬化性樹脂が剥離基材12に付着
して基材12の剥離とともに付着した分が除去され、結
果として、少量の未硬化の電離放射線硬化性樹脂が残留
した凹部6と、硬化した電離放射線硬化性樹脂よりなる
凸部4とが形成される。これにより、凹凸模様3を有す
る凹凸模様形成体1が得られる。また基材12に模様層
5を設けておいた場合、基材12の剥離によって第2図
に示す如く凸部4上に模様層5が転写形成される。When the release base material 12 is peeled off after irradiation with the ionizing radiation 14, the uncured ionizing radiation-curable resin adheres to the release base material 12 in the uncured portion of the ionizing radiation-curable resin layer 13, and the base material As the resin 12 is peeled off, the adhered portion is removed, and as a result, a recess 6 in which a small amount of uncured ionizing radiation curable resin remains and a convex portion 4 made of the cured ionizing radiation curable resin are formed. As a result, an uneven pattern forming body 1 having an uneven pattern 3 is obtained. Further, when the pattern layer 5 is provided on the base material 12, the pattern layer 5 is transferred and formed on the convex portion 4 by peeling off the base material 12, as shown in FIG.
又、本発明製造方法では剥離基材12を剥離後、更に電
離放射線を照射して凹部6に残った未硬化の電離放射線
硬化性樹脂を硬化せしめてもよいが、第8図に示すよう
に凹部6に残った未硬化の電離放射線硬化性樹脂5aを
除去した凹部を形成してもよい。凹部6に残存する未硬
化の電離放射線硬化性樹脂を除去するには、種々の物理
的除去方法、化学式除去方法があるが、残留した未硬化
の部分の溶剤に対する溶解性が高いことを利用し、適宜
な溶剤を使用して、未硬化の電離放射線硬化性樹脂を溶
解除去する化学的除去方法を採用することが好ましい。Further, in the manufacturing method of the present invention, after peeling off the release base material 12, ionizing radiation may be further irradiated to harden the uncured ionizing radiation-curable resin remaining in the recesses 6, but as shown in FIG. A recess may be formed by removing the uncured ionizing radiation curable resin 5a remaining in the recess 6. There are various physical removal methods and chemical removal methods to remove the uncured ionizing radiation curable resin remaining in the recess 6, but one method is to take advantage of the high solubility of the remaining uncured portion in a solvent. It is preferable to employ a chemical removal method in which the uncured ionizing radiation-curable resin is dissolved and removed using an appropriate solvent.
溶解除去させるための溶剤としては、酢酸エチル、酢酸
n−ブチル等のエステル頚;メチルエチルケトン、メチ
ルイソブチルケトン、シクロヘキサノン等のケトン類;
エタノール、イソプロパツール、n−ブタノール等のア
ルコール類等があり、使用した電離放射線硬化性樹脂の
種類に合わせて選択し、使用する。これら溶剤による溶
解除去は、かけ流しや浸漬のみによっても行えるが、よ
り好ましい方法として、形成された凹凸模様−ヒに溶剤
を塗布した後、ブラシ或いは綿のハフィングローラーを
使用してハフ研磨する方法がある。Examples of solvents for dissolving and removing include ester necks such as ethyl acetate and n-butyl acetate; ketones such as methyl ethyl ketone, methyl isobutyl ketone, and cyclohexanone;
There are alcohols such as ethanol, isopropanol, and n-butanol, which are selected and used depending on the type of ionizing radiation-curable resin used. Removal by dissolving with these solvents can be carried out by simply pouring water or dipping, but a more preferable method is to apply the solvent to the formed uneven pattern and then huff polish it using a brush or cotton huffing roller. There is a way.
又、本発明では凹部6にワイピングインキ層7を設ける
場合、剥離基材12を剥離後にインキ層7の塗布形成を
行う。その塗布形成は通常のワイピングインキを凹凸模
様3の全表面に塗布し、その直後に、凹凸模様の凸部」
二に存在するインキのみをドクターブレードにてかき取
ることによって行われる。Further, in the present invention, when the wiping ink layer 7 is provided in the recess 6, the ink layer 7 is applied and formed after the release base material 12 is peeled off. The coating is formed by applying ordinary wiping ink to the entire surface of the uneven pattern 3, and immediately after that, apply the wiping ink to the entire surface of the uneven pattern 3.
This is done by scraping off only the ink present on the second layer with a doctor blade.
更に、本発明では?、り離基材12を剥離後、凹凸模様
(3上の所定箇所に保護層E(を塗布形成する。保護層
8は前記と同様の電離放射線硬化性樹脂により形成する
こともできるが、熱硬化性樹脂により形成してもよい。Furthermore, in the present invention? After peeling off the release base material 12, a protective layer E (protective layer E) is applied to predetermined locations on the uneven pattern (3). It may also be formed from a curable resin.
尚、上記実施例では剥離基材側に電離放射線遮蔽性模様
を設けて電離放射線を剥離基材側より照射する場合につ
いて説明したが、凹凸模様形成用基材が電離放射線透過
性の場合、凹凸模様形成用基材に電離放射線遮蔽性模様
を設け、凹凸模様形成用基材側より電離放射線を照射す
ることもできる。また電離放射線遮蔽性模様は剥離基材
とは別のシートに形成して剥離基材と重ね合わせて用い
ることもできる。In the above example, an ionizing radiation shielding pattern is provided on the release base material side and ionizing radiation is irradiated from the release base material side. However, when the base material for forming the uneven pattern is transparent to ionizing radiation, It is also possible to provide a pattern-forming substrate with an ionizing radiation-shielding pattern and irradiate the ionizing radiation from the uneven pattern-forming substrate side. The ionizing radiation shielding pattern can also be formed on a sheet separate from the release base material and used by overlapping the release base material.
以下、具体的な実施例を挙げて本発明を更に詳細に説明
する。Hereinafter, the present invention will be explained in more detail by giving specific examples.
実施例1
ポリエステルフィルム(東し■製)を剥離基材とし、こ
の表面に紫外線遮蔽性の白色インキ(諸星インキ■製)
により、版深60μmのグラビア版を用いて抽象柄を印
刷した。Example 1 A polyester film (manufactured by Toshiki ■) is used as a release base material, and a UV-shielding white ink (manufactured by Moroboshi Ink ■) is applied to the surface of this release base material.
An abstract pattern was printed using a gravure plate with a plate depth of 60 μm.
一方、塩化ビニル板(J¥さ5om)の片面に透明着色
した紫外線硬化性塗料(日本ペイント■製)を厚みが1
00μmとなるようにフローコ−1−した。On the other hand, a transparent colored ultraviolet curable paint (manufactured by Nippon Paint ■) was applied to one side of a vinyl chloride board (J ¥ 50m) to a thickness of 1.
Flow coating was carried out so that the thickness was 00 μm.
次いで、紫外線硬化性塗料を塗布した面に前記剥離基材
の非印刷面が接するように重ね合わせ、剥離基材側より
出力80w/cmのオゾンレス型紫外線ランプを5灯設
置した照射装置中を20m/分の速度で通過させながら
照射し、照射後、剥離基材を剥離した。Next, the non-printed surface of the release substrate was placed in contact with the surface coated with the ultraviolet curable paint, and the light was heated for 20 m from the release substrate side into an irradiation device equipped with five ozone-less ultraviolet lamps with an output of 80 W/cm. Irradiation was carried out while passing at a speed of 1/min, and after the irradiation, the release base material was peeled off.
この剥離基材の剥離により、剥離基材に設けた白色イン
キによる模様部のない部分に相当する紫外線硬化性塗料
が硬化して紫外線硬化性塗料による凸部が形成され、白
色インキによる模様のある部分に相当する部分では未硬
化の紫外線硬化性塗料の一部が剥離基材に付着して剥離
基材の剥離の際に除去されて凹部が形成された。Due to this peeling of the release base material, the UV-curable paint corresponding to the part without the white ink pattern provided on the release base material is cured, forming convex parts with the UV-curable paint, and the part with the white ink pattern is cured. In the corresponding portion, a portion of the uncured ultraviolet curable paint adhered to the release base material and was removed when the release base material was peeled off, forming a recessed portion.
剥離基材剥A!後、凹凸面に前記と同様の条件で更に紫
外線を照射して凹部に一部残留した未硬化の紫外線硬化
性塗料を硬化させた。Peeling base material peeling A! Thereafter, the uneven surface was further irradiated with ultraviolet rays under the same conditions as above to cure the uncured ultraviolet curable paint partially remaining in the recesses.
次いで、凹凸面に着色インキ(昭和インク製:W−14
1)を用いてワイピング塗装を行い、更に全面に紫外線
硬化性塗料(日本ペイント製)を厚みが50μmとなる
ようにフローコート法にて塗布し、硬化させた。Next, colored ink (manufactured by Showa Ink: W-14) was applied to the uneven surface.
1) was used for wiping painting, and then an ultraviolet curable paint (manufactured by Nippon Paint) was applied to the entire surface using a flow coating method to a thickness of 50 μm and cured.
得られた凹凸模様形成体は、凹凸模様がシャープであり
、凹部に着色インキが充填されているため凹凸感が強調
されている。またこの形成体を化粧材として使用したと
ころ、塗装感(深み)に富むものであった。The resulting concavo-convex pattern formed body has a sharp concave-convex pattern, and the concavities and convexities are filled with colored ink, so that the concavo-convex texture is emphasized. When this formed product was used as a decorative material, it had a rich coating feel (depth).
以上説明したように、本発明の凹凸模様形成体はシャー
プで立体感に優れた凹凸模様を有するものであり、凹凸
模様の凸部上に模様層を設けたり、或いは凹凸模様の凹
部にワイピングインキ層を設けることにより凸模様又は
凹部模様に同調した意匠効果に優れたものとなり、また
保護層を設けることにより凹凸模様等の耐久性に優れた
ものとなり、しかも着色模様層を設けた凹凸模様形成用
基材や凹凸表面を有する凹凸模様形成用基材にて構成す
ることにより多様な意匠効果が発現可能なものとなる。As explained above, the uneven pattern forming body of the present invention has an uneven pattern that is sharp and has an excellent three-dimensional effect. By providing a layer, an excellent design effect that matches the convex pattern or concave pattern can be obtained, and by providing a protective layer, the concavo-convex pattern can be made to have excellent durability, and moreover, by providing a colored pattern layer, the concavo-convex pattern can be formed. By using a base material for forming an uneven pattern or a base material for forming an uneven pattern having an uneven surface, various design effects can be expressed.
このように良好な凹凸模様を有し意匠性、耐久性等に優
れた凹凸模様形成体は、化粧+Aとして用いた場合、特
に実益大である。A concavo-convex pattern-formed body having such a good concavo-convex pattern and excellent in design, durability, etc. is particularly useful when used as makeup +A.
また本発明の製造方法は、凹凸模様形成用基材と、電離
放射線遮蔽性模様を有する剥離基材を電離放射線硬化性
樹脂層を介して重ね合わせて電離放射線を照射し、次い
で剥離基材を剥離して未硬化の電離放射線硬化性樹脂を
剥離基材に付着せしめて除去して凹部を形成し、該凹部
と硬化した電離放射線硬化性樹脂よりなる凸部とからな
る凹凸模様を形成して凹凸模様形成体を製造するもので
あるため、シャープで立体感に優れた凹凸模様形成体を
容易に製造することができる。しかも、凹部に残った未
硬化の電離放射線硬化性樹脂を除去せずに硬化させて残
す場合、剥離基材に付着して除去される未硬化の電離放
射線硬化性樹脂の量は常に一定ではないために深さに変
化のある凹部を形成することができ、例λ”よ凹凸模様
形成用基材の電離放射線硬化性樹脂層塗布面に着色層を
設けたりした場合、凹部の深さに応じ、しかも凹凸模様
と完全に同調した変化のある色の4淡模様を形成するこ
とができる効果もある。Further, in the manufacturing method of the present invention, a base material for forming an uneven pattern and a release base material having an ionizing radiation shielding pattern are stacked together via an ionizing radiation curable resin layer, and ionizing radiation is irradiated, and then the release base material is The peeled and uncured ionizing radiation curable resin is adhered to a peeling base material and removed to form a recessed part, and an uneven pattern consisting of the recessed part and a convex part made of the cured ionizing radiation curable resin is formed. Since a concavo-convex pattern forming body is manufactured, a concavo-convex pattern forming body that is sharp and has an excellent three-dimensional effect can be easily manufactured. Moreover, if the uncured ionizing radiation curable resin remaining in the recesses is left after being cured without being removed, the amount of uncured ionizing radiation curable resin that adheres to the release base material and is removed is not always constant. For example, if a colored layer is provided on the ionizing radiation-curable resin layer coated surface of the base material for forming an uneven pattern, it is possible to form recesses with varying depths. Moreover, it has the effect of being able to form a four-tone pattern with varying colors that are completely in sync with the uneven pattern.
第1図〜第3図は本発明凹凸模様形成体の実施例を示す
継断面図、第4図〜第8図は本発明製造方法の各工程を
示す継断面図である。
1・・凹凸模様形成体
2・・凹凸模様形成用基材
3・・凹凸模様
4・・凸部 5・・模様層 6・・凸部7・・ワイ
ピングインキ層
8・・保護層 9・・着色模様層11・・電離
放射線遮蔽性模様
12・・剥離基材
13・・電離放射線硬化性樹脂層
14・・電離放射線
第 1 し1
1−凹凸模様形成体
2 凹凸模様形成用J、%材
3 凹凸模様
第 2 図
4 ・凸部 8・・・保護層
5・模様層 9 ・it色模様層
6 凹部
第 3 図
7 ワイピ/ダインキ層
第 4 図
12γり蛸り基材
第 5 図
第6図
141E離放射線
第 7 図FIGS. 1 to 3 are joint cross-sectional views showing examples of the uneven pattern forming body of the present invention, and FIGS. 4 to 8 are joint cross-sectional views showing each step of the manufacturing method of the present invention. 1. Uneven pattern forming body 2. Base material for forming an uneven pattern 3. Uneven pattern 4. Convex portion 5. Pattern layer 6. Convex portion 7. Wiping ink layer 8. Protective layer 9. Colored pattern layer 11...Ionizing radiation shielding pattern 12...Peelable base material 13...Ionizing radiation curable resin layer 14...Ionizing radiation first 1 1-Uneven pattern forming body 2 Uneven pattern forming J, % material 3 Concave and convex pattern 2nd Fig. 4 ・Protrusions 8... Protective layer 5 ・Pattern layer 9 ・It color pattern layer 6 Concave portion 3rd Fig. 7 Wipe/dye ink layer 4 Fig. 12 γ-rippling base material 5 Fig. 6 Figure 141E Radiation Figure 7
Claims (12)
らなる凹凸模様が設けられたことを特徴とする凹凸模様
形成体。(1) An uneven pattern forming body, characterized in that an uneven pattern made of an ionizing radiation curable resin is provided on a substrate for forming an uneven pattern.
らなる凹凸模様が設けられたことを特徴とする化粧材。(2) A decorative material characterized in that a concavo-convex pattern made of an ionizing radiation-curable resin is provided on a base material for forming a concavo-convex pattern.
2記載の凹凸模様形成体。(3) The uneven pattern formed body according to claim 1 or 2, wherein a pattern layer is provided on the convex portions of the uneven pattern.
求項1〜3のいずれかに記載の凹凸模様形成体。(4) The concavo-convex pattern formed body according to any one of claims 1 to 3, wherein a wiping ink layer is provided in the concave portions of the concavo-convex pattern.
けた請求項1〜4のいずれかに記載の凹凸模様形成体。(5) The uneven pattern formed body according to any one of claims 1 to 4, wherein a protective layer is provided on the entire surface of the uneven pattern or only on the convex portions.
様形成用基材である請求項1〜5のいずれかに記載の凹
凸模様形成体。(6) The uneven pattern forming body according to any one of claims 1 to 5, wherein the uneven pattern forming substrate is a substrate for forming an uneven pattern provided with a colored pattern layer.
形成用基材である請求項1〜6のいずれかに記載の凹凸
模様形成体。(7) The uneven pattern forming body according to any one of claims 1 to 6, wherein the uneven pattern forming substrate is a substrate for forming an uneven pattern having an uneven surface.
形成体の製造方法。 (a)表面が剥離性を有する電離放射線透過性剥離基材
の表裏いずれかの面に電離放射線遮蔽性模様を設ける工
程、 (b)凹凸模様形成用基材と剥離基材とを、電離放射線
硬化性樹脂層を介して重ね合わせる工程、 (c)剥離基材側より電離放射線を照射して電離放射線
遮蔽性模様のない部分に相当する電離放射線硬化性樹脂
層を硬化させる工程、 (d)剥離基材を剥がして電離放射線硬化性樹脂層の未
硬化部の樹脂の一部を剥離基材に付着させて除去する工
程。(8) A method for manufacturing an uneven pattern formed body, characterized by performing each of the following steps in order. (a) providing an ionizing radiation-shielding pattern on either the front or back surface of an ionizing radiation-transparent release base material whose surface is releasable; (c) a step of curing the ionizing radiation-curable resin layer corresponding to the portion without the ionizing radiation-shielding pattern by irradiating ionizing radiation from the release base material side; (d) A step of peeling off the release base material and removing a portion of the uncured resin of the ionizing radiation curable resin layer by adhering to the release base material.
り凹凸模様の凸部上に該模様層を転写形成する請求項8
記載の凹凸模様形成体の製造方法。(9) A pattern layer is provided on a release base material, and the pattern layer is transferred and formed on the convex portion of the uneven pattern by peeling the release base material.
The method for manufacturing the uneven pattern formed body described above.
に残った未硬化の電離放射線硬化性樹脂を電離放射線を
照射して硬化させる請求項8又は9記載の凹凸模様形成
体の製造方法。(10) The uneven pattern forming body according to claim 8 or 9, wherein the uncured ionizing radiation curable resin remaining on the uneven pattern forming substrate is cured by irradiating ionizing radiation after the release base material is peeled off. Production method.
に残った未硬化の電離放射線硬化性樹脂を除去する請求
項8又は9記載の凹凸模様形成体の製造方法。(11) The method for producing an uneven pattern forming body according to claim 8 or 9, wherein after peeling off the release base material, uncured ionizing radiation-curable resin remaining on the uneven pattern forming base material is removed.
は凸部上のみに保護層を塗布形成する請求項8〜11の
いずれかに記載の凹凸模様形成体の製造方法。(12) The method for producing an uneven pattern formed body according to any one of claims 8 to 11, wherein after peeling off the release base material, a protective layer is coated on the entire surface of the uneven pattern or only on the convex portions.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62-325740 | 1987-12-23 | ||
JP32574087 | 1987-12-23 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH01253449A true JPH01253449A (en) | 1989-10-09 |
JPH0588677B2 JPH0588677B2 (en) | 1993-12-24 |
Family
ID=18180129
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6300088A Granted JPH01253449A (en) | 1987-12-23 | 1988-03-16 | Relief-patterned material and its manufacture |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01253449A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06344439A (en) * | 1993-06-04 | 1994-12-20 | Dainippon Printing Co Ltd | Sheet for simultaneous molding and forming |
JP2007245727A (en) * | 2007-04-27 | 2007-09-27 | Dainippon Printing Co Ltd | Manufacturing method of decorative sheet |
JP2010162787A (en) * | 2009-01-16 | 2010-07-29 | Dainippon Printing Co Ltd | Printed matter and container |
-
1988
- 1988-03-16 JP JP6300088A patent/JPH01253449A/en active Granted
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06344439A (en) * | 1993-06-04 | 1994-12-20 | Dainippon Printing Co Ltd | Sheet for simultaneous molding and forming |
JP2007245727A (en) * | 2007-04-27 | 2007-09-27 | Dainippon Printing Co Ltd | Manufacturing method of decorative sheet |
JP2010162787A (en) * | 2009-01-16 | 2010-07-29 | Dainippon Printing Co Ltd | Printed matter and container |
Also Published As
Publication number | Publication date |
---|---|
JPH0588677B2 (en) | 1993-12-24 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2006068947A (en) | Decorative material and its manufacturing method | |
JPH01253449A (en) | Relief-patterned material and its manufacture | |
JP3923609B2 (en) | Decorative plate and method for producing the same | |
JP3634191B2 (en) | Decorative coating foil and method for producing the same | |
JP2709719B2 (en) | Decorative plate and manufacturing method thereof | |
JP3076355B2 (en) | Method of forming uneven pattern | |
JP2950599B2 (en) | Transfer sheet | |
JP2764130B2 (en) | Method for transferring uneven pattern and transfer sheet used for the method | |
JP2835725B2 (en) | Manufacturing method of decorative board | |
JPH02573A (en) | Transferring method for colored uneven pattern and transfer sheet used for the method | |
JP3135319B2 (en) | Cosmetic material having high-grade paint feeling and method for producing the same | |
JP3275414B2 (en) | Method for producing uneven decorative sheet having scratch resistance | |
JPH0661525B2 (en) | Method for manufacturing decorative material having uneven pattern | |
JP2660260B2 (en) | How to transfer colored uneven patterns | |
JP2764129B2 (en) | Concavo-convex pattern forming article, method for forming the same, and sheet for forming a concavo-convex pattern used in the method | |
JPH05115833A (en) | Production of sheet having rugged pattern | |
JP2764128B2 (en) | Method for forming uneven pattern and sheet for forming uneven pattern used in the method | |
JP2888344B2 (en) | Method for forming three-dimensional pattern and three-dimensional pattern forming body | |
JPH01171998A (en) | Forming method of irregular pattern and transfer sheet used for said method | |
JPH06270372A (en) | Decorative laminate with uneven pattern | |
JPH05162433A (en) | Decorative material with indented pattern and its manufacture | |
JP2612186B2 (en) | Manufacturing method of decorative panel | |
JPH04163126A (en) | Preparation of decorative material having embossed pattern | |
JPH01166997A (en) | Method of transferring irregular pattern and transfer sheet used for said method | |
JPH01166998A (en) | Method of transferring irregular pattern and transfer sheet used for said method |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20081224 Year of fee payment: 15 |
|
EXPY | Cancellation because of completion of term | ||
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20081224 Year of fee payment: 15 |