JPH01251785A - Aftertreatment for printed wiring board - Google Patents

Aftertreatment for printed wiring board

Info

Publication number
JPH01251785A
JPH01251785A JP7842488A JP7842488A JPH01251785A JP H01251785 A JPH01251785 A JP H01251785A JP 7842488 A JP7842488 A JP 7842488A JP 7842488 A JP7842488 A JP 7842488A JP H01251785 A JPH01251785 A JP H01251785A
Authority
JP
Japan
Prior art keywords
compounds
printed wiring
wiring board
solution
processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7842488A
Other languages
Japanese (ja)
Inventor
Shin Takanezawa
伸 高根沢
Toshiro Okamura
岡村 寿郎
Hiroshi Takahashi
宏 高橋
Masao Kanno
管野 雅雄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP7842488A priority Critical patent/JPH01251785A/en
Publication of JPH01251785A publication Critical patent/JPH01251785A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F11/00Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent
    • C23F11/08Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids
    • C23F11/10Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids using organic inhibitors
    • C23F11/14Nitrogen-containing compounds
    • C23F11/149Heterocyclic compounds containing nitrogen as hetero atom

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)

Abstract

PURPOSE:To reduce copper migration greatly by immersing a printed wiring board in a hot pressurized solution containing metal deactivators or copper- hazard preventives after formation of a circuit pattern. CONSTITUTION:As processing chemicals, a solution is use in which one or more kinds selected from triazole compounds, imidazole compounds, tetrazole compounds, aromatic secondary amine compounds, aromatic hydrazine compounds and oxine compounds are dissolved or suspended in water or an organic solvent. To process, a wiring board is immersed in the solution, after which it is pressurized or heated under pressure. The processing temperature ranges from room temperature - 180 deg.C, preferably 80-140 deg.C. The pressure ranges from 1-100 atmospheric pressure, preferably 1-20 atmospheric pressure. The concentration of the processing solution ranges from 0.1-30% (wt.%), preferably 1-10%.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は耐電食性に優れる印刷配線板を得るための印刷
配線板の後処理方法に関する。
DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention relates to a method for post-processing a printed wiring board to obtain a printed wiring board with excellent electrolytic corrosion resistance.

(従来の技術) 印刷配線板は従来から電子回路に多用されている。銅張
り積層板からエツチングにより回路を形成するサブトラ
クト法、無電解めっきにより回路形成を行うアディティ
ブ法、あるいはフレシキブル印刷配線板等、種類や形態
も多岐に亘るが、銅箔回路は、通常、接着剤を介して基
板に固定されている。接着剤としては一般に、銅との接
着性に優れるゴム系接着剤が使用されている。
(Prior Art) Printed wiring boards have been widely used in electronic circuits. There are a wide variety of types and forms, such as the subtract method in which circuits are formed by etching from copper-clad laminates, the additive method in which circuits are formed by electroless plating, and flexible printed wiring boards, but copper foil circuits are usually made using adhesives. It is fixed to the board via. Generally, a rubber adhesive is used as the adhesive because it has excellent adhesion to copper.

(発明が解決しようとする課題) 印刷配線板の高密度化に伴い回路パターン間隔が狭小に
なってきており、電界下でのパターン間に銅マイグレー
ションによるプントラントの発生が問題視されるように
なった。特に回路間に露出する接着剤層がゴム系組成物
の場合には、高温下、あるいは高湿下でマイグレーショ
ンしやすいためか、パターン間のレジスト界面、接着剤
、レジストバルクにプントラントを発生しやすく、これ
がブリッジとなり、短絡、焼損に至ることがある。
(Problem to be solved by the invention) As the density of printed wiring boards increases, the spacing between circuit patterns is becoming narrower, and the occurrence of puntlants due to copper migration between patterns under an electric field has become a problem. Ta. In particular, when the adhesive layer exposed between circuits is made of a rubber composition, it is easy to migrate under high temperature or high humidity, and Puntlant is likely to occur at the resist interface between patterns, the adhesive, and the resist bulk. , this may form a bridge, resulting in short circuit or burnout.

本発明は、このような印刷配線板の銅マイグレーション
を抑制するための処理法を提供するものである。
The present invention provides a treatment method for suppressing such copper migration in printed wiring boards.

(課題を解決するための手段) 本発明は、回路パターンを形成したのち金属不活性化剤
あるいは銅害防止剤を含む溶液で、印刷配線板を加熱加
圧溶液中に浸漬処理することにより、銅マイグレーショ
ンを大巾に軽減しうるようにしたものである。
(Means for Solving the Problems) The present invention involves forming a circuit pattern and then immersing a printed wiring board in a heated and pressurized solution containing a metal deactivator or a copper damage inhibitor. This makes it possible to significantly reduce copper migration.

処理剤としては、トリアゾール化合物、イミダゾール化
合物、テトラゾール化合物、芳香族第二アミン化合物、
芳香族ヒドラジン化合物、及びオキシン誘導体から選ば
れる1種以上を水または有機溶媒に溶解あるいは懸濁さ
せた溶液を使用する。
As processing agents, triazole compounds, imidazole compounds, tetrazole compounds, aromatic secondary amine compounds,
A solution in which one or more selected from aromatic hydrazine compounds and oxine derivatives is dissolved or suspended in water or an organic solvent is used.

処理方法は、配線板を溶液中に浸漬後、加圧あるいは加
熱加圧する。処理温度は室温〜180℃、望ましくは8
0〜140℃、圧力は、1〜100気圧、望ましくは1
〜20気圧である。
The processing method is to immerse the wiring board in a solution and then apply pressure or heat and pressure. The processing temperature is room temperature to 180°C, preferably 8°C.
0 to 140°C, pressure 1 to 100 atm, preferably 1
~20 atmospheres.

処理温度が室温以下では、処理剤パターン間のレジスト
界面、接着剤まで入りにくく、180℃以上では配線板
自体を劣化させるおそれが生じるためである。
This is because if the processing temperature is below room temperature, it is difficult for the processing agent to penetrate into the resist interface between the patterns and into the adhesive, and if it is above 180° C., there is a risk of deteriorating the wiring board itself.

圧力が1気圧未満では、処理剤がパターン間のレジスト
界面、接着剤への拡散、浸入が不充分になり、一方10
0気圧を越すと設備上の制約が生ずる。
If the pressure is less than 1 atm, the processing agent will not diffuse or penetrate into the resist interface between patterns or the adhesive sufficiently;
If the pressure exceeds 0 atmospheric pressure, equipment restrictions will occur.

処理液の濃度は、0.1〜30%(重量%以下同じ)、
望ましくは1%〜10%程度が良い。
The concentration of the treatment liquid is 0.1 to 30% (same below weight%),
Desirably, it is about 1% to 10%.

0.1%未満ではマイグレーション防止の効果が少なく
、30%を越すと処理面が不均一化しやすくなり、後工
程上問題となる。溶液は1種以上の処理剤を含浸させて
もよく、また、1種以上の溶液を使用して複数回使用し
ても良い。
If it is less than 0.1%, the effect of preventing migration will be small, and if it exceeds 30%, the treated surface will tend to become non-uniform, which will cause problems in post-processing. The solution may be impregnated with one or more treatment agents, and one or more solutions may be used multiple times.

本発明に使用できるトリアゾール化合物としては、1,
2.3)リアゾール、1,2.41−リアゾール及びこ
れらの誘導体例えば1フェニル−1゜2.3トリアゾー
ル、2フェニル−1,2,3トリアゾール、1フェニル
−1,2,4)リアゾール、3−(Nサリチロイル)ア
ミノ−1,2,4トリアゾール、ベンゾトリアゾール、
トリルトリアゾール、トリルトリアゾールに塩、ベンゾ
トリアゾール−2−メチルイミダゾールアダクトなどが
ある。
Triazole compounds that can be used in the present invention include 1,
2.3) Riazole, 1,2,41-riazole and their derivatives such as 1 phenyl-1°2.3 triazole, 2 phenyl-1,2,3 triazole, 1 phenyl-1,2,4) riazole, 3 -(N salicyloyl)amino-1,2,4 triazole, benzotriazole,
Tolyltriazole, salts of tolyltriazole, benzotriazole-2-methylimidazole adducts, etc.

トリアジン化合物としては、1,2.2トリアジン、1
,2.4)リアジン、1,3.5)リアジンおよびせこ
れらの誘導体例えば2ジブチルアミノ4.6ジメチルカ
ブト1,3.5)リアジン、2ビニル−4,6ジアミノ
ー1.3.5)リアジン・イソシアヌル酸付加物などが
ある。
As triazine compounds, 1,2.2 triazine, 1
, 2.4) Lyazine, 1,3.5) Lyazine and their derivatives such as 2-dibutylamino-4,6-dimethyl-1,3.5) Lyazine, 2-vinyl-4,6-diamino-1.3.5) Lyazine - Contains isocyanuric acid adducts.

イミダゾール化合物としては、2メチルイミダゾール、
2エチル4メチルイミダゾール、1ベンジン2メチルイ
ミダゾール、2フエニンイミダゾール、2フエニル4メ
チルイミダゾール、ウンデシルイミダゾールなど、及び
これらの誘導体、例えば2メルカプトベンツイミダゾー
ル、2メルカプトメチルベンツイミダゾールなどがある
Examples of imidazole compounds include 2-methylimidazole,
Examples include 2-ethyl-4-methylimidazole, 1-benzine-2-methylimidazole, 2-phenymidazole, 2-phenyl-4-methylimidazole, undecylimidazole, and derivatives thereof, such as 2-mercaptobenzimidazole and 2-mercaptomethylbenzimidazole.

芳香族アミン化合物としては、オクチル化ジフェニルア
ミン、P−(P)ルエンスルホニルアミド)ジフェニル
アミン、NN’ ジ2ナフチルP−フェニレンジアミン
、NフェニルN゛ イソプロピルPフェニレンジアミン
、NN” ジフェニルP−フェニレンジアミン、などが
ある。
Examples of aromatic amine compounds include octylated diphenylamine, P-(P)luenesulfonylamide) diphenylamine, NN' di2naphthyl P-phenylenediamine, Nphenyl N' isopropyl P-phenylenediamine, NN'' diphenyl P-phenylenediamine, etc. There is.

オキシ化合物としては、オキシン(8オキシキノリン)
、7ビス(2エチルヘキシル)アミノメチレン8ヒドロ
キノリン、7ビス(nブチル)アミノメチレン8ヒドロ
キシキノリン、7ビス(nヘキシル)アミノメチレン8
ヒドロキシキノリン、などがある。
As an oxy compound, oxine (8oxyquinoline)
, 7 bis (2 ethylhexyl) amino methylene 8 hydroquinoline, 7 bis (n butyl) amino methylene 8 hydroxyquinoline, 7 bis (n hexyl) amino methylene 8
Hydroxyquinoline, etc.

テトラゾール化合物としては、テトラゾール及びその誘
導体例えばフェニルテトラゾール、メルカプトテトラゾ
ール〔ビス(2エチルヘキシル)アミノメチレン)l、
2,3.4テトラゾール、〔ビス(nブチル)アミノメ
チレン)1,2,3゜4テトラゾール、〔ビス(nヘキ
シル)アミノメチレン)1.2,3.4テトラゾール、
〔ビス(nオクチル)アミノメチレン)  1. 2.
 3. 4テトラゾールなどがある。
Tetrazole compounds include tetrazole and its derivatives such as phenyltetrazole, mercaptotetrazole [bis(2ethylhexyl)aminomethylene],
2,3.4tetrazole, [bis(n-butyl)aminomethylene)1,2,3゜4tetrazole, [bis(nhexyl)aminomethylene)1.2,3.4tetrazole,
[Bis(n-octyl)amiminethylene) 1. 2.
3. 4-tetrazole, etc.

処理後の溶媒は水、あるいは有機溶媒、例えばメチルエ
チルケトン、トルエン、キシレン、メチノール、エタノ
ール、イソプロパツール、セロソルブ、酢酸セロソルブ
、トメチルホルムアミド、ジメチルスルフオキシド等が
使用でき、処理後を溶解かるいは懸濁させる。
The solvent after treatment can be water or organic solvents such as methyl ethyl ketone, toluene, xylene, methanol, ethanol, isopropanol, cellosolve, cellosolve acetate, tomethylformamide, dimethyl sulfoxide, etc. Suspend.

(作用) 遷移金属またはその金属塩がポリマの酸化劣化に特異的
な触媒作用を有することは昔から知られており、これら
を抑制するためにポリマに添加して使用されていわゆる
銅害防止剤、または金属不活性化剤は公知である。
(Function) It has been known for a long time that transition metals or their metal salts have a specific catalytic effect on the oxidative deterioration of polymers, and in order to suppress these effects, they are added to polymers and used as so-called copper damage inhibitors. , or metal deactivators are known.

(大沢他:工化70 (12)2364、゛ 67、R
,HSHANSENetal:J、Polym。
(Osawa et al.: Koka 70 (12) 2364, ゛ 67, R
, HSHANSE Netal: J, Polym.

5u(A)、  587−609’  64など)上記
の作用と多湿電界下における銅マイグレーションの現象
とは基本的に異なる。
5u(A), 587-609' 64, etc.) The above action is fundamentally different from the phenomenon of copper migration under a humid electric field.

銅マイグレーションは、回路電極(陽極)銅の溶解、対
極側へのイオン移動析出現象であり、本発明の処理剤は
加圧条件下で材料バルク、各界面に拡散浸入して回路の
銅表界面に作用し、銅の溶解、溶出の抑制または溶出イ
オンを捕捉して不活性化するものと推定される。
Copper migration is a phenomenon in which copper in the circuit electrode (anode) dissolves and ions migrate to the opposite electrode and precipitate. It is presumed that copper acts on copper to dissolve it, suppress its elution, or capture and inactivate eluted ions.

実施例1 ガラス基材エポキシ樹脂積層板に、アクリロニトリルブ
タジェンゴムを主成分とし、アルキルフェノール、及び
エポキシ樹脂を配合した接着剤溶液を塗布し、加熱硬化
させてなるアディティブ配線板用基板を使用して、無電
解めっきにより回路中/スペース=0.2510.25
mのクシ型パターン作成した。
Example 1 An additive wiring board substrate was prepared by coating a glass-based epoxy resin laminate with an adhesive solution containing acrylonitrile butadiene rubber as a main component, alkylphenol, and an epoxy resin, and heating and curing the adhesive solution. , in circuit/space = 0.2510.25 by electroless plating
A comb-shaped pattern of m was created.

この試験用配線板を、ベンゾトリアゾール5%濃度のメ
チルエチルケトン溶液に浸漬し、120℃、2気圧で約
1時間加熱加圧したのち、風乾及び120℃で10分間
乾燥した。
This test wiring board was immersed in a methyl ethyl ketone solution containing 5% benzotriazole, heated and pressurized at 120° C. and 2 atm for about 1 hour, and then air-dried and dried at 120° C. for 10 minutes.

電食性の試験は促進して行うため、65℃で90%RH
の高湿下で電極回路間にDClooVの電圧を印加して
連続通電し、電極間に銅マイグレーションによるプント
ラントの生成を監視した。
Electrolytic corrosion tests are conducted at 65°C and 90% RH.
Under high humidity conditions, a voltage of DClooV was applied between the electrode circuits and current was continuously applied, and the formation of puntlant due to copper migration between the electrodes was monitored.

なお、上記試験環境下で回路表面が直接水滴付着の影響
を受けないように試験前に予めはんだレジスト防水膜と
して全面にスクリーン印刷して成膜保護した。デンドラ
イト発生状況を表1に示す。
In order to prevent the circuit surface from being directly affected by the adhesion of water droplets under the above test environment, a solder resist waterproof film was screen printed on the entire surface before the test to protect the circuit surface. Table 1 shows the occurrence of dendrites.

尚短絡するまでの時間は300時間以上であった。Further, the time until short circuit occurred was more than 300 hours.

実施例2 処理剤として2ビニル4.6ジアミノ1,3゜5トリア
ジンを水に約1%溶解懸濁させた溶液を使用して、実施
例1同様に処理した。デンドライト発生状況を表1に示
す。尚短絡するまでの時間は300時間以上であった。
Example 2 A treatment was carried out in the same manner as in Example 1, using as a treatment agent a solution prepared by dissolving and suspending about 1% of 2-vinyl-4.6-diamino-1,3.5-triazine in water. Table 1 shows the occurrence of dendrites. Furthermore, the time until short circuit occurred was over 300 hours.

実施例3 2メチルイミダゾールの2%酢酸セロソルブ溶液で配線
板を130℃、3気圧で加熱加圧し、風乾後130℃で
30分乾燥したのち、さらにトリルトリアゾールの2%
メタノール溶液で加熱加圧し、風乾後100℃で10分
乾燥したほかは、実施例1と同様にした。デンドライト
発生状況を表1に示す。尚短絡するまでの時間は300
時間以上であった。
Example 3 A wiring board was heated and pressurized at 130° C. and 3 atm with a 2% cellosolve acetate solution of 2-methylimidazole, air-dried, and then dried at 130° C. for 30 minutes.
The procedure was the same as in Example 1, except that the sample was heated and pressurized with a methanol solution, air-dried, and then dried at 100° C. for 10 minutes. Table 1 shows the occurrence of dendrites. Furthermore, the time until short circuit is 300
It was more than an hour.

実施例4 〔ビス(2nへキシルノアミノメチレン〕 1゜2.3
.4テトラゾール及び3−(Nサリチロイル)アミノ−
1,2,4トリアゾールを同様の濃度1%の懸、濁液と
し、これを処理剤として実施例1)と同様に処理した。
Example 4 [Bis(2nhexylnoaminomethylene] 1°2.3
.. 4-tetrazole and 3-(N-salicyloyl)amino-
A suspension of 1,2,4 triazole at a concentration of 1% was made into a suspension, and this was treated as a treatment agent in the same manner as in Example 1).

デンドライト発生状況を表1に示す。向短絡するまでの
時間は300時間以上であった。
Table 1 shows the occurrence of dendrites. The time until short circuit occurred was over 300 hours.

比較例 実施例xにおいて、ベンゾトリアゾール溶液の加熱加圧
処理は行わず、レジスト印刷のみで試験した。デンドラ
イト発生状況を表1に示す。尚短絡するまでの時間は1
50時間であった。
Comparative Example In Example x, the heating and pressure treatment of the benzotriazole solution was not performed, and only resist printing was tested. Table 1 shows the occurrence of dendrites. The time until short circuit is 1
It was 50 hours.

○:デンドラントなし、 Δ:デンドラント僅かに有り ×:プントラントの発生が著しい。○: No dendrant, Δ: Slight dendrant ×: Significant occurrence of puntlant.

(発明の効果)(Effect of the invention)

Claims (2)

【特許請求の範囲】[Claims] 1.回路パターンが形成された印刷配線板をトリアゾー
ル化合物、トリアジン化合物、イミダゾール化合物、テ
トラゾール化合物、芳香第二アミン化合物、芳香族ヒド
ラジン化合物、及びオキシン化合物から選ばれる1種以
上を水または有機溶媒に溶解あるいは懸濁させた溶液中
に浸漬処理することを特徴とする印刷配線板の後処理方
法。
1. The printed wiring board on which the circuit pattern has been formed is prepared by dissolving one or more selected from triazole compounds, triazine compounds, imidazole compounds, tetrazole compounds, aromatic secondary amine compounds, aromatic hydrazine compounds, and oxine compounds in water or an organic solvent. A method for post-processing printed wiring boards, which comprises immersing them in a suspended solution.
2.浸漬処理の温度を室温〜180℃、圧力を1〜10
0気圧で加圧あるいは加圧加熱する特許請求の範囲第1
項記載の印刷配線板の後処理方法。
2. The temperature of the immersion treatment is room temperature to 180℃, and the pressure is 1 to 10℃.
Claim 1: Pressurizing or pressurizing and heating at 0 atmospheric pressure
Post-processing method for printed wiring boards as described in Section 3.
JP7842488A 1988-03-31 1988-03-31 Aftertreatment for printed wiring board Pending JPH01251785A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7842488A JPH01251785A (en) 1988-03-31 1988-03-31 Aftertreatment for printed wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7842488A JPH01251785A (en) 1988-03-31 1988-03-31 Aftertreatment for printed wiring board

Publications (1)

Publication Number Publication Date
JPH01251785A true JPH01251785A (en) 1989-10-06

Family

ID=13661664

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7842488A Pending JPH01251785A (en) 1988-03-31 1988-03-31 Aftertreatment for printed wiring board

Country Status (1)

Country Link
JP (1) JPH01251785A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1717350A1 (en) * 2004-02-16 2006-11-02 Otsuka Chemical Co., Ltd. Antirust composition
JP2008098646A (en) * 2007-10-17 2008-04-24 Sharp Corp Semiconductor device
JP2011119758A (en) * 2011-02-16 2011-06-16 Sharp Corp Semiconductor device
JP2012216759A (en) * 2010-11-05 2012-11-08 Fujifilm Corp Printed wiring board manufacturing method and printed wiring board
JP2012231033A (en) * 2011-04-26 2012-11-22 Fujifilm Corp Printed wiring board with surface coated wiring and manufacturing method thereof
JP2013067066A (en) * 2011-09-22 2013-04-18 Fujifilm Corp Inkjet head and method for producing the same

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1717350A1 (en) * 2004-02-16 2006-11-02 Otsuka Chemical Co., Ltd. Antirust composition
EP1717350A4 (en) * 2004-02-16 2008-03-26 Otsuka Chemical Co Ltd Antirust composition
JP2008098646A (en) * 2007-10-17 2008-04-24 Sharp Corp Semiconductor device
JP2012216759A (en) * 2010-11-05 2012-11-08 Fujifilm Corp Printed wiring board manufacturing method and printed wiring board
KR20130132424A (en) * 2010-11-05 2013-12-04 후지필름 가부시키가이샤 Method for manufacturing printed wiring board, and printed wiring board
JP2011119758A (en) * 2011-02-16 2011-06-16 Sharp Corp Semiconductor device
JP2012231033A (en) * 2011-04-26 2012-11-22 Fujifilm Corp Printed wiring board with surface coated wiring and manufacturing method thereof
JP2013067066A (en) * 2011-09-22 2013-04-18 Fujifilm Corp Inkjet head and method for producing the same

Similar Documents

Publication Publication Date Title
CA2123183C (en) Agent for treating surfaces of copper and copper alloys
US5733599A (en) Method for enhancing the solderability of a surface
EP1613440B1 (en) Improved coating for silver plated circuits
EP0717418A2 (en) Composition containing a polymer and conductive filler and use thereof
KR19990022285A (en) Organometallic Composite Coating for Copper Surface Protection
WO1996017975A1 (en) Printed circuit board manufacture
US4846929A (en) Wet etching of thermally or chemically cured polyimide
CN107971655B (en) High-heat-resistance organic solder flux and application thereof
JPH01251785A (en) Aftertreatment for printed wiring board
US20070134406A1 (en) Method of using ultrasonics to plate silver
JP3316078B2 (en) Resist stripper
US5925174A (en) Composition and process for treating the surface of copper-containing metals
WO2002029135A1 (en) Method for enhancing the solderability of a surface
JP2005068530A (en) Surface-treating agent, printed circuit board, and method for surface-treating metal on printed circuit board
JPS63160296A (en) Post-treatment of printed wiring board
JP2834885B2 (en) Copper and copper alloy surface treatment method
JP3367743B2 (en) Copper and copper alloy surface treatment agent
Carano The evolution of organic solderability preservatives (OSP) from a temporary protectant to a leadership position in surface finishing chemistry
JPH01246894A (en) Electroless plating method
US5218022A (en) Protective coating for an electrical or electronic circuit
US5077136A (en) Diffusion barrier for solvents and inorganic cations on polyimide surfaces by ammonia treatment
KR101494618B1 (en) Conversion coating composition for flexible print circuit board and surface treating method using the same
JPH07330738A (en) Protecting agent for metal surface and production using the same
JPH04183874A (en) Surface treatment of copper and copper alloy
JP2640676B2 (en) Printed wiring board and method for manufacturing printed wiring board