JPH01240685A - Etching method - Google Patents
Etching methodInfo
- Publication number
- JPH01240685A JPH01240685A JP6760988A JP6760988A JPH01240685A JP H01240685 A JPH01240685 A JP H01240685A JP 6760988 A JP6760988 A JP 6760988A JP 6760988 A JP6760988 A JP 6760988A JP H01240685 A JPH01240685 A JP H01240685A
- Authority
- JP
- Japan
- Prior art keywords
- etchant
- air
- spray
- etching
- ferric chloride
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims abstract description 20
- 238000005530 etching Methods 0.000 title claims abstract description 18
- 230000003647 oxidation Effects 0.000 claims abstract description 10
- 238000007254 oxidation reaction Methods 0.000 claims abstract description 10
- 229910021578 Iron(III) chloride Inorganic materials 0.000 claims abstract description 6
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 claims abstract description 6
- 230000001172 regenerating effect Effects 0.000 claims abstract description 4
- 239000000126 substance Substances 0.000 abstract description 11
- 239000007921 spray Substances 0.000 abstract description 7
- 239000003595 mist Substances 0.000 abstract description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 abstract description 4
- 239000002253 acid Substances 0.000 abstract description 3
- 238000005259 measurement Methods 0.000 abstract description 3
- 230000005484 gravity Effects 0.000 abstract description 2
- 239000000463 material Substances 0.000 abstract description 2
- 230000033116 oxidation-reduction process Effects 0.000 abstract description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 2
- 239000000203 mixture Substances 0.000 abstract 1
- 238000012856 packing Methods 0.000 abstract 1
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 6
- 230000008929 regeneration Effects 0.000 description 5
- 238000011069 regeneration method Methods 0.000 description 5
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 4
- 229910052742 iron Inorganic materials 0.000 description 3
- 239000007800 oxidant agent Substances 0.000 description 3
- XTEGARKTQYYJKE-UHFFFAOYSA-M Chlorate Chemical compound [O-]Cl(=O)=O XTEGARKTQYYJKE-UHFFFAOYSA-M 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000005708 Sodium hypochlorite Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 description 2
- BZSXEZOLBIJVQK-UHFFFAOYSA-N 2-methylsulfonylbenzoic acid Chemical compound CS(=O)(=O)C1=CC=CC=C1C(O)=O BZSXEZOLBIJVQK-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 150000001447 alkali salts Chemical class 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 229920001903 high density polyethylene Polymers 0.000 description 1
- 239000004700 high-density polyethylene Substances 0.000 description 1
- 239000012774 insulation material Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 230000009897 systematic effect Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/46—Regeneration of etching compositions
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- ing And Chemical Polishing (AREA)
Abstract
Description
【発明の詳細な説明】 、 〔発明の対象] 本発明は、エツチング方法に関するものである。[Detailed description of the invention] , [Subject of the invention] The present invention relates to an etching method.
[従来技術]
泡化した塩化第二鉄エッチャントを再生する方法として
は、過酸化水素や次亜塩素酸ナトリウム等の酸化剤を添
加する方法、塩素ガスと接触させる方法、および電解に
よる方法等がある。[Prior art] Methods for regenerating foamed ferric chloride etchant include adding an oxidizing agent such as hydrogen peroxide or sodium hypochlorite, contacting it with chlorine gas, and electrolysis. be.
過酸化水素を添加する方法は、反応効率か悪く、目的と
する再生を行うためには、多値に添加しなけれはならな
い、従ってエッチャントは、かなり希釈されることにな
り、エツチング装置に影響を及ぼすので好ましくない、
コスト的にも負担の大きい方法である。The method of adding hydrogen peroxide has poor reaction efficiency, and in order to achieve the desired regeneration, it must be added at multiple levels; therefore, the etchant is considerably diluted, which may affect the etching equipment. It is undesirable because it affects
This method is also costly.
次亜塩素酸ナトリウムを用いる方法は、濃厚溶液で添加
すると塩素ガスを発生するので危険である。従って希釈
した状態で添加しなければならず過酸化水素と同様にエ
ッチャントを希釈するという問題かある。又食塩が蓄積
するので繰返して再生利用する方法としては不都合であ
る。同様に塩素酸ナトリウム等の塩素酸塩を用いる方法
もアルカリ塩類の蓄積の点で好ましくない。The method of using sodium hypochlorite is dangerous because it generates chlorine gas when added as a concentrated solution. Therefore, it must be added in a diluted state, which poses the problem of diluting the etchant like hydrogen peroxide. In addition, salt accumulates, making it inconvenient for repeated recycling. Similarly, a method using a chlorate such as sodium chlorate is also unfavorable in terms of accumulation of alkali salts.
以上の通り、薬品を用いて酸化再生する方法は本発明か
目的とする再生装置とエッチンク装aとを接続し連続的
にエッチャントを再生利用する方法としては不向きであ
る。As mentioned above, the method of oxidation regeneration using chemicals is not suitable as a method of connecting the regeneration device and the etching apparatus a and continuously reusing the etchant, which is the object of the present invention.
塩素ガスを用いて再生する方法は、最も効率かよく化学
反応的には理想的な方法であるか塩素ガスは非常に有害
であり作業環境や公害上問題かある。The method of regeneration using chlorine gas is the most efficient and ideal method in terms of chemical reactions, but chlorine gas is extremely harmful and poses problems in terms of the working environment and pollution.
これらに対し、電解法は上述のような問題もなくしかも
エツチングで溶解させた金属を析出1分離でき再生とい
う点からは理想的な方法であるか安定性に欠けるため保
守管理か難しく実用化されていないのか現状である。In contrast, the electrolytic method does not have the above-mentioned problems, and the metal dissolved by etching can be precipitated and separated, making it an ideal method from the point of view of regeneration. The current situation is that it is not.
[発明の目的]
本発明の目的は、前記した従来技術の欠点を解消し、安
価にしかも安全にエッチャントを再生し、これを利用す
るエツチング方法を提供することにある。[Object of the Invention] An object of the present invention is to provide an etching method that eliminates the drawbacks of the prior art described above, regenerates an etchant at low cost and safely, and utilizes the same.
[発明の要点]
本発明の要旨は、エッチャントを再生する方法として空
気酸化を利用することにある。これにより安全か確保さ
れ品質か良好な性状のエッチャントを再生し、循環使用
をoTfll=にさせるものである。[Summary of the Invention] The gist of the present invention is to utilize air oxidation as a method for regenerating etchant. This ensures safety and regenerates the etchant with good quality and properties, allowing for cyclic use.
空気酸化は、75〜80℃位か効率かよく、望ましい数
値であるか循環経路の配管或はポンプ等の耐熱性で制限
を受ける。一般的には、中、高密度ポリエチレンや硬質
塩化ビニルの耐熱温度50〜70℃位に限定される。Air oxidation is efficient at about 75 to 80°C, but is limited by the desired value or the heat resistance of the circulation path piping, pumps, etc. Generally, the heat resistance temperature is limited to about 50 to 70°C for medium- to high-density polyethylene or hard vinyl chloride.
[発明の実施例]
第1図は、本発明のエツチング方法の系統図を示すもの
であり、lは空気酸化装置本体、1aはミスト除去装置
、lbはスプレー、lcは充填物、ldは送風機、1e
は送風管、Ifは保温材、2は薬品添加槽本体、2aは
攪拌器、2bは酸化還元電位計、2cは比in定センサ
ー。[Embodiments of the Invention] Fig. 1 shows a system diagram of the etching method of the present invention, where l is the main body of the air oxidizer, 1a is the mist removal device, lb is the spray, lc is the filler, and ld is the blower. , 1e
is a blower pipe, If is a heat insulator, 2 is a chemical addition tank body, 2a is a stirrer, 2b is an oxidation-reduction potentiometer, and 2c is a ratio sensor.
2dは酸濃度測定電位計、2eは薬品供給管、3は工・
ンチング装置、4はポンプ、5は輸送管である。2d is an electrometer for measuring acid concentration, 2e is a chemical supply pipe, and 3 is a mechanical
4 is a pump, and 5 is a transport pipe.
第1図において、空気酸化装置本体lは、スプレー1b
および充填物1c、それに送風機1d、送風管1e、ミ
スト除去装置1aおよびポンプ4等より構成される。ポ
ンプ4は、10Kgf/Cm”の圧力で5001 /s
inの輸送能力を持ち、エッチャントをスプレー1bか
ら霧状に雲霧する。エッチャントの温度は、60℃で行
う。In FIG. 1, the air oxidizer main body l includes a sprayer 1b.
It is composed of a filling material 1c, a blower 1d, a blower pipe 1e, a mist removing device 1a, a pump 4, and the like. Pump 4 is 5001/s at a pressure of 10Kgf/Cm"
The etchant is atomized in the form of a mist from the spray 1b. The temperature of the etchant is 60°C.
次ぎに送風411dかis/ ■tnの割合で空気を送
り込みエッチャントを酸化させる。酸化させたエッチャ
ントを薬品添加槽2へ移し、酸化還元電位計2d、比重
測定センサー2c、酸濃度測定電位計2d等により測定
される値を基に薬品供給管2eから自動的に適切な塩酸
、水を加える。Next, air is blown at a rate of 411d or is/*tn to oxidize the etchant. The oxidized etchant is transferred to the chemical addition tank 2, and appropriate hydrochloric acid, Add water.
薬品添加槽2内を撹拌@ 2 aで掻き混ぜ、薬品を添
加後のエッチャントを輸送管5により工・ンチンク装置
3に流入させ、ポンプ4により再び空気酸化装置本体l
のスプレー1bへと循環させる。The inside of the chemical addition tank 2 is stirred with agitation@2a, and the etchant after adding the chemicals is flowed into the oxidation device 3 through the transport pipe 5, and then transferred to the air oxidation device main body l again by the pump 4.
of spray 1b.
以上の条件てエッチャントへの溶解量が200g/hO
nrの速度で鉄58駕ニッケル421の合金を連続して
エツチングするとき、エッチャントの老化度(エッチャ
ント中の全鉄で2価の鉄を除した数)か0.18〜0.
19の範囲以内に保持出来十分な実用性か保障可能であ
る。Under the above conditions, the amount dissolved in the etchant was 200g/hO.
When etching an alloy of 58 iron and 421 nickel continuously at a rate of nr, the degree of aging of the etchant (the number obtained by dividing the divalent iron by the total iron in the etchant) is 0.18 to 0.
It is possible to maintain sufficient practicality within the range of 19.
本実施例において、薬品添加槽2をエツチング装置3の
前に図示したかエツチング装置?i3の後でも差しつか
えない。In this embodiment, is the chemical addition tank 2 shown before the etching device 3? It's okay even after i3.
[発明の効果]
本発明を実施することにより、アルカリ金属のようにエ
ツチングの障害となるような物質を存在させることなく
、安価で且つ安全に塩化第二鉄の濃度を一定の条件下で
のエツチング方法の確立か可能となりエツチング技術の
向上に大きく貢献する。[Effects of the Invention] By carrying out the present invention, the concentration of ferric chloride can be controlled at a low cost and safely under certain conditions without the presence of substances such as alkali metals that impede etching. This makes it possible to establish an etching method and greatly contributes to the improvement of etching technology.
第1図は1本発明のエツチング方法の系統図を示すもの
である。
l・・空気酸化装置本 2a・攪拌器
体 2b−酸化還元電位計la・ミスト除
去装置12c・比重測定センサーlb・スプレー
2d・酸濃度測定電位計lc・充填物 2e
・薬品供給管ld・送風41!3・・エツチング装置i
s・送風管 4・・ポンプ
if・保温材 5・・輸送管
2・・薬品添加槽本体FIG. 1 shows a systematic diagram of the etching method of the present invention. l... Air oxidation device book 2a - Stirrer body 2b - Redox potential meter la - Mist removal device 12c - Specific gravity measurement sensor lb - Spray
2d・Acid concentration measuring electrometer LC・Filling 2e
・Chemical supply pipe ld・Air blower 41!3・・Etching device i
s・Air pipe 4・・Pump IF・Heat insulation material 5・・Transport pipe 2・・Chemical addition tank body
Claims (1)
置と、エッチング装置とを接続し、エッチャントを連続
的に再生利用することを特徴とするエッチング方法。An etching method characterized by connecting a device for regenerating ferric chloride etchant by air oxidation and an etching device to continuously recycle the etchant.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6760988A JPH01240685A (en) | 1988-03-22 | 1988-03-22 | Etching method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6760988A JPH01240685A (en) | 1988-03-22 | 1988-03-22 | Etching method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01240685A true JPH01240685A (en) | 1989-09-26 |
Family
ID=13349850
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6760988A Pending JPH01240685A (en) | 1988-03-22 | 1988-03-22 | Etching method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01240685A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20020073126A (en) * | 2002-09-05 | 2002-09-19 | 서보창 | The reductor and remover of waste iron chloride's water solution |
KR100451052B1 (en) * | 2002-10-22 | 2004-10-13 | 엘지마이크론 주식회사 | Method of recycling etching solution for manufacturing shadow mask and apparatus therefor |
KR100758596B1 (en) * | 2006-04-17 | 2007-09-13 | 박인수 | Method for recycling the used ferric chloride etching solution |
JP2008511746A (en) * | 2004-06-25 | 2008-04-17 | ゲブリューダー シュミット ゲゼルシャフト ミット ベシュレンクテル ハフツング ウント コンパニー | Recyclable etching solution by electrolysis |
-
1988
- 1988-03-22 JP JP6760988A patent/JPH01240685A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20020073126A (en) * | 2002-09-05 | 2002-09-19 | 서보창 | The reductor and remover of waste iron chloride's water solution |
KR100451052B1 (en) * | 2002-10-22 | 2004-10-13 | 엘지마이크론 주식회사 | Method of recycling etching solution for manufacturing shadow mask and apparatus therefor |
JP2008511746A (en) * | 2004-06-25 | 2008-04-17 | ゲブリューダー シュミット ゲゼルシャフト ミット ベシュレンクテル ハフツング ウント コンパニー | Recyclable etching solution by electrolysis |
JP4673368B2 (en) * | 2004-06-25 | 2011-04-20 | ゲブリューダー シュミット ゲゼルシャフト ミット ベシュレンクテル ハフツング ウント コンパニー | Etching solution |
KR100758596B1 (en) * | 2006-04-17 | 2007-09-13 | 박인수 | Method for recycling the used ferric chloride etching solution |
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