JPH01236273A - Organic conductive composition - Google Patents

Organic conductive composition

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Publication number
JPH01236273A
JPH01236273A JP63064399A JP6439988A JPH01236273A JP H01236273 A JPH01236273 A JP H01236273A JP 63064399 A JP63064399 A JP 63064399A JP 6439988 A JP6439988 A JP 6439988A JP H01236273 A JPH01236273 A JP H01236273A
Authority
JP
Japan
Prior art keywords
film
polymer compound
complex salt
conductive composition
surfactant
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP63064399A
Other languages
Japanese (ja)
Other versions
JPH0725930B2 (en
Inventor
Tomio Nakamura
富雄 中村
Shigeru Shimizu
茂 清水
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nitto Chemical Industry Co Ltd
Original Assignee
Nitto Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nitto Chemical Industry Co Ltd filed Critical Nitto Chemical Industry Co Ltd
Priority to JP6439988A priority Critical patent/JPH0725930B2/en
Priority to EP89104220A priority patent/EP0340421B1/en
Priority to US07/321,284 priority patent/US5009811A/en
Priority to DE89104220T priority patent/DE68910573T2/en
Priority to KR1019890003280A priority patent/KR920002996B1/en
Publication of JPH01236273A publication Critical patent/JPH01236273A/en
Publication of JPH0725930B2 publication Critical patent/JPH0725930B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Conductive Materials (AREA)

Abstract

PURPOSE:To provide the title composition excellent in film forming property, moldability, conductivity, etc., by adding a surfactant or a silicone oil to a system comprising a polymeric compound, a 7,7,8,8-tetracyanoquinodimethane complex and an organic solvent. CONSTITUTION:A polymer compound (A) (e.g., polyacrylonitrile or polymethyl methacrylate) is mixed with a 7,7,8,8-tetracyanoquinodimethane complex (B), a surfactant (e.g., polyoxyethylene nonylphenyl ether) or a silicone oil (C) and an organic solvent (D) which can dissolve components A, B and C (e.g., dimethylformamide) to produce an organic conductive composition. When this conductive composition is made into a conductor, the use of component C makes it possible to inhibit the crystal growth of component B in component A and to exhibit high conductivity in spite of being in a substantially dissolved state.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、有機電導性組成物に関するものであり、詳し
くは、高分子化合物、7,7,8.8−テトラシアノキ
ノジメタン(以下TCNQと略す)錯塩及び有機溶剤か
らなる系に、界面活性剤を添加することを特徴とする成
膜性、成形性の優れた電導性組成物に関する。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to an organic conductive composition, and specifically relates to a polymer compound, 7,7,8.8-tetracyanoquinodimethane The present invention relates to a conductive composition with excellent film-forming properties and moldability, which is characterized by adding a surfactant to a system consisting of a complex salt (abbreviated as TCNQ) and an organic solvent.

本組成物は、導電ペースト、電子回路、コンデンサー、
感熱素子、電磁波シールド用塗料、帯電防止フィルム、
導電紙、導電性コーティング剤等の用途に適用可能であ
る。
This composition can be used in conductive pastes, electronic circuits, capacitors,
Heat-sensitive elements, electromagnetic shielding paints, antistatic films,
It can be applied to applications such as conductive paper and conductive coating agents.

〔従来技術〕[Prior art]

導電性組成物としては、カチオンポリマーを主組成物と
したもの、金属又はカーボンを高分子中に分散させたも
のが広く知られている。ところが前者は導電レベルが低
い、吸湿性が大きい等の欠点を有し、又後者は、フィル
ムとした場合に平滑性、透明性に問題点を有している。
As conductive compositions, those containing a cationic polymer as a main composition and those containing metal or carbon dispersed in a polymer are widely known. However, the former has drawbacks such as a low conductivity level and high hygroscopicity, and the latter has problems with smoothness and transparency when made into a film.

一方、TCNQを用いる電導性組成物としては、■第4
級窒素カチオン性基を有する高分子とT C,N Qと
からなるもの、■高分子化合物とTGNQの有機低分子
錯塩とからなる組成物が知られている。
On the other hand, as a conductive composition using TCNQ,
Compositions consisting of a polymer having a nitrogen cationic group and T C and N Q, and (2) a composition consisting of a polymer compound and an organic low-molecular complex salt of TGNQ are known.

■については、有機溶剤に対する溶解性が非常に悪く、
ジメチルホルムアミド等の極性の大きな溶剤にのみ溶解
可能な為、使用用途が非常に限られ実用的とは言い難い
Regarding ■, its solubility in organic solvents is very poor;
Since it can only be dissolved in highly polar solvents such as dimethylformamide, its uses are extremely limited and it cannot be said to be practical.

■については、特公昭44−16499号、特開昭50
−12375号、特開昭54−130651号等に提案
されているが、50μm以下とくに10μm以下のよう
な極く薄い膜にした時の成膜性、成形性に於てあるいは
使用可能溶剤の制約等において十分満足できるものとは
言えない。すなわち、これらの組成物は、膜厚を厚くす
ると5応フィルムにはなるが、表面の均一性に問題が残
る。このフィルムは表面がザラザラであったり、斑模様
が生じたりして、実用性に乏しいものである。
Regarding ■, please refer to JP-B No. 44-16499,
-12375, JP-A No. 54-130651, etc., but there are limitations on film formability and formability when forming extremely thin films of 50 μm or less, especially 10 μm or less, or on usable solvents. etc. cannot be said to be fully satisfactory. That is, when these compositions are made thicker, they become a 5-layer film, but there remains a problem with the uniformity of the surface. This film has a rough surface and a mottled pattern, making it impractical.

従来、高電導性を付与するためには、電導性の有機成分
(本発明ではTCNQの錯塩)と高分子化合物は完全に
溶解状態に近い状態で混合することは好ましくないとさ
れていた(特開昭54−130650号)、特開昭58
−34841号では、高電導性をもったフィルムを成形
するためには、高分子化合物中にT CN Q錯塩を3
次元網状に細い針状形又は繊維様の結晶として形成させ
るべきだと提案している。
Conventionally, in order to impart high conductivity, it was considered undesirable to mix a conductive organic component (in the present invention, the complex salt of TCNQ) and a polymer compound in a state close to a completely dissolved state (especially 1973-130650), JP-A-58
-34841, in order to form a film with high conductivity, three TCNQ complex salts are added to a polymer compound.
It is proposed that the crystals should be formed as thin needle-like or fiber-like crystals in a dimensional network.

即ち従来は、高分子化合物中にTCNQ錯塩の結晶が生
長し、それらが重なり合うほど、電導性が向上すると考
えられていた。しかし、このようなものはフィルムにし
た場合、高分子化合物とTCNQ錯塩の相溶性が悪く、
表面の透明性、平滑性が十分でなく、特に膜厚50μm
以下の薄膜にした場合フィルムの形成していない部分が
生じるなど成膜性に問題があり、又、微細加工を要する
用途には適用しうるとは言い難い。さらにフィルム中に
TCNQ錯塩の結晶が存在している状態では、その結晶
の大きさより膜厚を薄くすることは不可能であるのみな
らず、高分子化合物の屈折率とTCNQ錯塩結晶の屈折
率が異るから当然透明性が不充分にならざるを得ない。
That is, conventionally, it was thought that TCNQ complex salt crystals grow in a polymer compound, and the more they overlap, the more the conductivity improves. However, when such a material is made into a film, the compatibility between the polymer compound and the TCNQ complex salt is poor;
The surface transparency and smoothness are insufficient, especially when the film thickness is 50 μm.
When the following thin films are formed, there are problems in film formability, such as the formation of portions where no film is formed, and it is difficult to say that they can be applied to applications that require microfabrication. Furthermore, when TCNQ complex crystals exist in the film, it is not only impossible to make the film thinner than the size of the crystals, but also the refractive index of the polymer compound and the refractive index of the TCNQ complex crystals are different. Because they are different, transparency inevitably becomes insufficient.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

本発明は、高分子化合物とTCNQ錯塩との相溶性を改
善し、成膜性、成形性に優れ、得られたフィルムは透明
性、柔軟性に富み、しかも高電導性を示す有機電導体組
成物を提供することを目的とするものである。
The present invention is an organic conductor composition that improves the compatibility between a polymer compound and a TCNQ complex salt, has excellent film formability and formability, and the obtained film is highly transparent and flexible, and also exhibits high conductivity. The purpose is to provide something.

〔課題を解決するための手段〕[Means to solve the problem]

上記目的を達成するために、本発明の有機電導体組成物
においては、高分子化合物、TCNQ錯塩及び有機溶剤
からなる系に更に界面活性剤を存在せしめた。これによ
りTCNQ錯塩は高分子化合物中に極微小の結晶が事実
上溶解した状態で分散することができ、表面の平滑な電
導性極薄膜や微細加工を要する電導体の形成が可能な有
機電導体組成物とすることができた。
In order to achieve the above object, in the organic conductor composition of the present invention, a surfactant is further present in the system consisting of a polymer compound, a TCNQ complex salt, and an organic solvent. As a result, TCNQ complex salt can be dispersed in a polymer compound with extremely small crystals virtually dissolved, making it an organic conductor that can form ultra-thin conductive films with smooth surfaces and conductors that require microfabrication. It was possible to make a composition.

本発明はこのような知見に基づいて達成されたものであ
る。
The present invention has been achieved based on this knowledge.

すなわち、本発明による有機電導体組成物は、(a)高
分子化合物、(b) 7 、7 、8 、8−テトラシ
アノキノジメタン錯塩、(c)界面活性剤又はシリコー
ン油及び(d)前記(a) 、 (b) 、 (C)の
三者を溶解することのできる有機溶剤からなることを特
徴とするものである。
That is, the organic conductor composition according to the present invention comprises (a) a polymer compound, (b) 7,7,8,8-tetracyanoquinodimethane complex salt, (c) a surfactant or silicone oil, and (d) It is characterized by being made of an organic solvent that can dissolve the three substances (a), (b), and (C) above.

以下、具体的に説明する。This will be explained in detail below.

高分子化合物としては特に制限はないが、ポリメタクリ
ル酸エステル、ポリアクリル酸エステル、ポリアクリロ
ニトリル、ポリアクリロニトリル、ポリスチレン、ポリ
塩化ビニル、ポリ酢酸ビニル、ポリビニルアセタール、
ポリフッ化ビニリデン、ポリエチレンオキサイド、ポリ
エステル、ポリカーボネート、ポリビニルカルバゾール
、ポリビニルピロリドン、ポリスルホン、ポリフェニレ
ンサルファイド、ポリイミド系樹脂、ポリパラバン酸、
ポリウレタン、フェノール樹脂、ケイ素樹脂等が単独又
は混合物として用いられる。また前記ビニル系高分子化
合物の共重合体を用いることも可能である。とくに好ま
しい高分子化合物としてはフィルム形成性、塗膜形成性
の高分子化合物である。
There are no particular restrictions on the polymer compound, but polymethacrylate, polyacrylate, polyacrylonitrile, polyacrylonitrile, polystyrene, polyvinyl chloride, polyvinyl acetate, polyvinyl acetal,
Polyvinylidene fluoride, polyethylene oxide, polyester, polycarbonate, polyvinyl carbazole, polyvinylpyrrolidone, polysulfone, polyphenylene sulfide, polyimide resin, polyparabanic acid,
Polyurethane, phenolic resin, silicone resin, etc. can be used alone or as a mixture. It is also possible to use a copolymer of the vinyl polymer compound. Particularly preferred polymer compounds are film-forming and coating film-forming polymer compounds.

高分子化合物の有機溶剤に対する割合は、高分子化合物
と有機溶剤の種類の組合せ、あるいは用途場面により異
なるが、一般には有機溶剤100重量部に対して高分子
化合物は0.1〜90重量部、好ましくは0.5〜70
重量部の範囲で用いられる。
The ratio of the polymer compound to the organic solvent varies depending on the type of combination of the polymer compound and the organic solvent, or the usage situation, but in general, the ratio of the polymer compound to 100 parts by weight of the organic solvent is 0.1 to 90 parts by weight. Preferably 0.5-70
Used in parts by weight.

TCNQ錯塩に関しては、J、 Am、 、Chem、
 Soc。
Regarding TCNQ complex salts, see J. Am., Chem.
Soc.

旦3374 (1962)に詳しく報告されているが、
本発明ではDo・TCNQ−・TCNQ’と表わすコン
プレックス塩を用いることが好ましい。
It is reported in detail in Dan 3374 (1962),
In the present invention, it is preferable to use a complex salt represented as Do.TCNQ-.TCNQ'.

D+については下式に示す有機カチオンを用いることが
できる。
As for D+, an organic cation shown in the following formula can be used.

(以下余白) 舒 Phe −P”−Phe 込he (R1,R,、R,はH又はC数が1〜12のアルキル
基、R2はH又はC数が1〜30のアルキル基、ベンジ
ル基、フェニルエチル基を示す) また、第4級窒素カチオン性基を有するオリゴマーのT
CNQ塩を用いることもできる。
(Left below) 舒Phe -P"-Phe (R1, R,, R, is H or an alkyl group having 1 to 12 carbon atoms, R2 is H or an alkyl group having 1 to 30 carbon atoms, benzyl group , phenylethyl group) In addition, T of the oligomer having a quaternary nitrogen cationic group
CNQ salts can also be used.

TCNQ錯塩は高分子化合物100重量部に対して1〜
90重量部、好ましくは5〜50重量部用いられる。
The amount of TCNQ complex salt is 1 to 100 parts by weight of the polymer compound.
It is used in an amount of 90 parts by weight, preferably 5 to 50 parts by weight.

界面活性剤等の(c)成分としては、陰イオン界面活性
剤、陽イオン界面活性剤、両性界面活性剤、非イオン界
面活性剤、フッ素系界面活性剤、シリコーン等が用いら
れるが、特に非イオン界面活性剤、ノニオンタイプのフ
ッ素系界面活性剤及びメチルシリコーン、ジメチルシリ
コーン、メチルフェニルシリコーンのようなシリコーン
が好ましい。
As component (c) such as a surfactant, anionic surfactants, cationic surfactants, amphoteric surfactants, nonionic surfactants, fluorinated surfactants, silicones, etc. are used, but especially non-ionic surfactants are used. Preferred are ionic surfactants, nonionic fluorosurfactants, and silicones such as methyl silicone, dimethyl silicone, and methyl phenyl silicone.

界面活性剤等の(C)成分の添加量は、高分子化合物1
00重量部に対して0.001〜20重量部、好ましく
はフッ素系界面活性剤に於てo、oos〜5重量部、他
の界面活性剤では0.05〜10重量部用いられる。
The amount of component (C) such as surfactant added is 1
0.001 to 20 parts by weight, preferably o, oos to 5 parts by weight for fluorosurfactants, and 0.05 to 10 parts by weight for other surfactants.

有機溶剤としては、ジメチルホルムアミド等のアミド類
、アセトニトリル等のニトリル類及びメタノール、エタ
ノール、ブタノール等のアルコール類、シクロヘキサノ
ン、メチルエチルケトン等のケトン類、メトキシエチル
アセテート、メトキシエタノール等のセロソルブ類、酢
酸ブチル、酢酸アミル等のエステル類、エチレングリコ
ールジメチルエーテル等のエーテル類、トルエン、キシ
レン等の芳香族炭化水素類、ジグロルメタン、トリクレ
ン等のハロゲン化炭化水素類が用いられる。
Examples of organic solvents include amides such as dimethylformamide, nitriles such as acetonitrile, alcohols such as methanol, ethanol, butanol, ketones such as cyclohexanone and methyl ethyl ketone, cellosolves such as methoxyethyl acetate and methoxyethanol, butyl acetate, Esters such as amyl acetate, ethers such as ethylene glycol dimethyl ether, aromatic hydrocarbons such as toluene and xylene, and halogenated hydrocarbons such as diglormethane and trichlene are used.

これらの有機溶剤は単独もしくは混合して用いられる。These organic solvents may be used alone or in combination.

組成物は、有機溶剤に高分子化合物、TCNQ錯塩、界
面活性剤を添加し、室温下で、又は加熱撹拌して完全に
溶解して調製する。室温で固形分が析出する場合はる別
して用いる。
The composition is prepared by adding the polymer compound, TCNQ complex salt, and surfactant to an organic solvent and completely dissolving the mixture at room temperature or by heating and stirring. If solid content precipitates at room temperature, use it separately.

〔発明の効果〕〔Effect of the invention〕

本発明の方法による組成物を用いて電導体を作製した場
合、TCNQ錯塩の高分子化合物中での結晶成長が抑え
られ、事実上溶解した状態であるにもかかわらず、高電
導性を発現する。
When a conductor is produced using the composition according to the method of the present invention, crystal growth of TCNQ complex salt in a polymer compound is suppressed, and high conductivity is exhibited even though the TCNQ complex salt is in a virtually dissolved state. .

したがって、本発明の組成物を用いると成膜性、成形性
に優れた高電導体が得られるので平滑、透明な膜厚50
μm以下特に10μm以下の極薄膜の作製及び微細加工
を要する電導体の作製には特に好都合である。
Therefore, when the composition of the present invention is used, a highly conductive material with excellent film formability and moldability can be obtained, resulting in a smooth, transparent film with a thickness of 50 mm.
It is particularly advantageous for the production of ultra-thin films of micrometers or less, especially 10 micrometers or less, and the production of electrical conductors that require microfabrication.

実施例I N−ブチルイソキノリニウム・TCNQコンプレックス
塩1.0g、ポリアクリロニトリル5.0g、ジメチル
ホルムアミド45g及びポリオキシエチレンノニルフェ
ニルエーテル(花王社製エマルゲン903) 0.25
gを混合し、室温で撹拌溶解した。得られた緑色のワニ
スをガラス板上に流延し、100℃で乾燥させた。膜厚
5μmの表面の平滑な表面抵抗値3.OX 103Ω/
口のフィルムが得られた。なお、フィルムを顕微鏡でi
祭したところ結晶の生成は認められなかった(結晶の大
きさ5μm以下)。
Example I 1.0 g of N-butylisoquinolinium TCNQ complex salt, 5.0 g of polyacrylonitrile, 45 g of dimethylformamide, and polyoxyethylene nonylphenyl ether (Emulgen 903 manufactured by Kao Corporation) 0.25
g and stirred and dissolved at room temperature. The obtained green varnish was cast onto a glass plate and dried at 100°C. Smooth surface resistance value of the surface with a film thickness of 5 μm3. OX 103Ω/
Oral films were obtained. In addition, the film was examined under a microscope.
When enshrined, no crystal formation was observed (crystal size 5 μm or less).

実施例2 N−デシルキノリニウム・TCNQコンプレックス塩0
.6 g、メチルメタクリレートとn−ブチルアクリレ
ートの(1:1)共重合体2.0g、エタノール40g
、アセトニトリル20g、シクロへキサノン30g及び
フッ素系界面活性剤FC−431(3M社製)0.05
gを室温下撹拌溶解した。−部不溶の固体をろ別後、ろ
液をガラス板上に流延し、100°Cで乾燥させた。膜
厚1μmの表面の平滑な表面抵抗値1.5 X 10’
Ω/口の透明フィルムが得られた。なお、フィルムを顕
微鏡で観察したところ結晶の生成は認められなかった(
結晶の大きさ5μm以下)。
Example 2 N-decylquinolinium TCNQ complex salt 0
.. 6 g, 2.0 g (1:1) copolymer of methyl methacrylate and n-butyl acrylate, 40 g ethanol
, 20 g of acetonitrile, 30 g of cyclohexanone, and 0.05 fluorine surfactant FC-431 (manufactured by 3M)
g was dissolved under stirring at room temperature. After filtering off insoluble solids, the filtrate was cast onto a glass plate and dried at 100°C. Smooth surface resistance value of 1 μm film thickness: 1.5 x 10'
A transparent film of Ω/mouth was obtained. Furthermore, when the film was observed under a microscope, no crystal formation was observed (
(crystal size 5 μm or less).

実施例3 N−ヘキシルイソキノリニウム・TCNQコンプレック
ス塩1g、ポリメチルメタクリレート5.Og、n−ブ
タノールsog、アセトニトリル20g、メチルエチル
ケトン30g及びシリコーンオイル(信越シリコン社製
KP341) 0.34gを室温下撹拌溶解した。得ら
れた緑色のワニスをガラス板上に流延し、100℃で乾
燥させた。
Example 3 N-hexylisoquinolinium TCNQ complex salt 1 g, polymethyl methacrylate 5. Og, n-butanol sog, 20 g of acetonitrile, 30 g of methyl ethyl ketone, and 0.34 g of silicone oil (KP341 manufactured by Shin-Etsu Silicon Co., Ltd.) were dissolved with stirring at room temperature. The obtained green varnish was cast onto a glass plate and dried at 100°C.

膜厚3μmの表面の平滑な表面抵抗値6,0XIO’Ω
/口の透明フィルムが得られた。なお、フィルムを顕微
鏡で観察したところ結晶の生成は認められなかった(結
晶の大きさ5μm以下)。
Smooth surface resistance value of 3μm film thickness 6,0XIO'Ω
/ A transparent film of the mouth was obtained. Note that when the film was observed under a microscope, no crystal formation was observed (crystal size: 5 μm or less).

実施例4 N−ブチル−α−ピコリニウム・TCNQコンプレック
ス塩0.4g、AS樹脂(旭化成社製スタイラックAS
−967)4.0 g、シクロヘキサン86g、アセト
ニトリル10g及びソルビタンモノラウレート(花王社
製レオドールS P −LIO) 0.2gを室温下撹
拌溶解した。得られた緑色のワニスをガラス板上に流延
し、100℃で乾燥させた。
Example 4 0.4 g of N-butyl-α-picolinium TCNQ complex salt, AS resin (Stylac AS manufactured by Asahi Kasei Corporation)
-967), 86 g of cyclohexane, 10 g of acetonitrile, and 0.2 g of sorbitan monolaurate (Rheodol SP-LIO manufactured by Kao Corporation) were dissolved with stirring at room temperature. The obtained green varnish was cast onto a glass plate and dried at 100°C.

膜厚1μmの表面の平滑な表面抵抗値4.5 x 10
7Ω/口の透明フィルムが得られた。なお、フィルムを
顕微鏡でvA察したところ結晶の生成は認められなかっ
た(結晶の大きさ5μm以下)。
Smooth surface resistance value of 1 μm film thickness 4.5 x 10
A transparent film of 7 Ω/hole was obtained. In addition, when the vA of the film was observed under a microscope, no crystal formation was observed (crystal size: 5 μm or less).

実施例5 N−ベンジルピリジニウム・TCNQコンプレックス塩
3.0g、ポリカーボネートlOg、ジメチルホルムア
ミド70g、ジオキサン27g及びフッ素系界面活性剤
F C−431(3M社製)0.02gを室温下撹拌溶
解した。得られた緑色のワニスをガラス板上に流延し、
100℃で乾燥させた。
Example 5 3.0 g of N-benzylpyridinium/TCNQ complex salt, 10 g of polycarbonate, 70 g of dimethylformamide, 27 g of dioxane, and 0.02 g of fluorosurfactant FC-431 (manufactured by 3M) were dissolved with stirring at room temperature. The resulting green varnish is cast onto a glass plate,
It was dried at 100°C.

膜厚10μmの表面の平滑な表面抵抗値8.OX 10
’Ω/口のフィルムが得られた。なお、フィルムを顕微
鏡で観察したところ結晶の生成は認められなかった(結
晶の大きさ5μm以下)。
Smooth surface resistance value of 10 μm film thickness8. OX10
'Ω/mouth film was obtained. Note that when the film was observed under a microscope, no crystal formation was observed (crystal size: 5 μm or less).

実施例6 N−ドデシルキノリニウム・TCNQコンプレックス塩
0.3 g、ポリビニルブチラール1.5g、ブタノー
ル30g、アセトニトリル5g、メチルエチルケトン4
0g、エトキシエタノール20g及びポリオキシエチレ
ンラウリルエーテル(花王社製エマルゲン−104P)
 0.07gを室温下撹拌溶解した。得られた緑色のワ
ニスをガラス板上に流延し、100℃で乾燥させた。膜
厚1μm以下の表面の平滑な表面抵抗値6.5 X 1
0”Ω/口のフィルムが得られた。なお、フィルムを顕
微鏡で11NFNしたところ結晶の生成は認められなか
った。
Example 6 N-dodecylquinolinium TCNQ complex salt 0.3 g, polyvinyl butyral 1.5 g, butanol 30 g, acetonitrile 5 g, methyl ethyl ketone 4
0g, 20g of ethoxyethanol and polyoxyethylene lauryl ether (Emulgen-104P manufactured by Kao Corporation)
0.07 g was dissolved under stirring at room temperature. The obtained green varnish was cast onto a glass plate and dried at 100°C. Smooth surface resistance value of 1 μm or less film thickness 6.5 x 1
A film of 0''Ω/hole was obtained. When the film was subjected to 11NFN under a microscope, no crystal formation was observed.

比較例1 フッ素系界面活性剤を用いず、実施例2と同様にして調
製したワニスを用いてフィルムを形成させたところ、表
面抵抗値1.lX10’Ω/口のフィルムが得られたが
、表面状態は細かな凹凸がみられ、顕微鏡の観県では、
20μm程度の結晶の生成が認められた。またフィルム
の形成していない部分が認められた。
Comparative Example 1 A film was formed using a varnish prepared in the same manner as in Example 2 without using a fluorosurfactant, and the surface resistance value was 1. A film of 1×10'Ω/portion was obtained, but the surface had fine irregularities, and when viewed under a microscope,
The formation of crystals of about 20 μm was observed. In addition, some areas where no film was formed were observed.

比較例2 シリコンオイルを用いず、実施例3と同様にして調製し
たワニスを用いてフィルムを形成させたところ、表面抵
抗値3.4 X 10’Ω/口のフィルムが得られたが
、表面状態は細かな凹凸がみられ、顕微鏡の観察では、
50μm程度の結晶の生成が認められた。またフィルム
の形成していない部分が認められた。
Comparative Example 2 When a film was formed using a varnish prepared in the same manner as in Example 3 without using silicone oil, a film with a surface resistance value of 3.4 x 10'Ω/hole was obtained, but the surface The condition shows fine irregularities, and when observed under a microscope,
The formation of crystals of about 50 μm was observed. In addition, some areas where no film was formed were observed.

Claims (1)

【特許請求の範囲】 1、(a)高分子化合物 (b)7,7,8,8−テトラシアノキノジメタン錯塩 (c)(i)界面活性剤 又は (ii)シリコーン油 (d)前記(a)、(b)、(c)の三者を溶解するこ
とのできる有機溶剤 よりなることを特徴とする有機電導性組成物。
[Claims] 1. (a) a polymer compound (b) a 7,7,8,8-tetracyanoquinodimethane complex salt (c) (i) a surfactant or (ii) a silicone oil (d) the above-mentioned An organic conductive composition comprising an organic solvent capable of dissolving three of (a), (b), and (c).
JP6439988A 1988-03-16 1988-03-16 Organic conductive composition Expired - Lifetime JPH0725930B2 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP6439988A JPH0725930B2 (en) 1988-03-16 1988-03-16 Organic conductive composition
EP89104220A EP0340421B1 (en) 1988-03-16 1989-03-09 Conducting varnish composition
US07/321,284 US5009811A (en) 1988-03-16 1989-03-09 Conducting varnish composition
DE89104220T DE68910573T2 (en) 1988-03-16 1989-03-09 Electrically conductive paint composition.
KR1019890003280A KR920002996B1 (en) 1988-03-16 1989-03-16 Conducting varnish composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6439988A JPH0725930B2 (en) 1988-03-16 1988-03-16 Organic conductive composition

Publications (2)

Publication Number Publication Date
JPH01236273A true JPH01236273A (en) 1989-09-21
JPH0725930B2 JPH0725930B2 (en) 1995-03-22

Family

ID=13257201

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6439988A Expired - Lifetime JPH0725930B2 (en) 1988-03-16 1988-03-16 Organic conductive composition

Country Status (1)

Country Link
JP (1) JPH0725930B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5091285A (en) * 1989-04-28 1992-02-25 Fujitsu Limited Method of forming pattern by using an electroconductive composition

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5091285A (en) * 1989-04-28 1992-02-25 Fujitsu Limited Method of forming pattern by using an electroconductive composition

Also Published As

Publication number Publication date
JPH0725930B2 (en) 1995-03-22

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