JPH01233713A - Substrate material for magnetic head - Google Patents
Substrate material for magnetic headInfo
- Publication number
- JPH01233713A JPH01233713A JP63060994A JP6099488A JPH01233713A JP H01233713 A JPH01233713 A JP H01233713A JP 63060994 A JP63060994 A JP 63060994A JP 6099488 A JP6099488 A JP 6099488A JP H01233713 A JPH01233713 A JP H01233713A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic head
- materials
- magnetic
- substrate material
- nio
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000463 material Substances 0.000 title claims abstract description 28
- 239000000758 substrate Substances 0.000 title claims abstract description 25
- 229910052751 metal Inorganic materials 0.000 claims abstract description 17
- 239000002184 metal Substances 0.000 claims abstract description 16
- 239000013078 crystal Substances 0.000 claims abstract description 5
- 229910052732 germanium Inorganic materials 0.000 claims abstract description 4
- 229910052735 hafnium Inorganic materials 0.000 claims abstract description 4
- 229910052745 lead Inorganic materials 0.000 claims abstract description 4
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 4
- 229910052718 tin Inorganic materials 0.000 claims abstract description 4
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 4
- 229910052726 zirconium Inorganic materials 0.000 claims abstract description 4
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 claims description 3
- 239000011029 spinel Substances 0.000 claims description 2
- 229910052596 spinel Inorganic materials 0.000 claims description 2
- 239000011780 sodium chloride Substances 0.000 claims 1
- 239000010408 film Substances 0.000 abstract description 10
- 238000004519 manufacturing process Methods 0.000 abstract description 5
- 239000010409 thin film Substances 0.000 abstract description 2
- 229910052566 spinel group Inorganic materials 0.000 abstract 1
- 239000011521 glass Substances 0.000 description 12
- 238000005520 cutting process Methods 0.000 description 6
- 239000000696 magnetic material Substances 0.000 description 6
- 239000000956 alloy Substances 0.000 description 5
- 229910000808 amorphous metal alloy Inorganic materials 0.000 description 5
- 238000004544 sputter deposition Methods 0.000 description 5
- 229910000859 α-Fe Inorganic materials 0.000 description 5
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000011162 core material Substances 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 2
- 229910002113 barium titanate Inorganic materials 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 239000010432 diamond Substances 0.000 description 2
- 229910003460 diamond Inorganic materials 0.000 description 2
- YBMRDBCBODYGJE-UHFFFAOYSA-N germanium dioxide Chemical compound O=[Ge]=O YBMRDBCBODYGJE-UHFFFAOYSA-N 0.000 description 2
- 230000001771 impaired effect Effects 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 229910020018 Nb Zr Inorganic materials 0.000 description 1
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- AOWKSNWVBZGMTJ-UHFFFAOYSA-N calcium titanate Chemical compound [Ca+2].[O-][Ti]([O-])=O AOWKSNWVBZGMTJ-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 230000002706 hydrostatic effect Effects 0.000 description 1
- YADSGOSSYOOKMP-UHFFFAOYSA-N lead dioxide Inorganic materials O=[Pb]=O YADSGOSSYOOKMP-UHFFFAOYSA-N 0.000 description 1
- 229910052752 metalloid Inorganic materials 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 229910000702 sendust Inorganic materials 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Compositions Of Oxide Ceramics (AREA)
- Magnetic Heads (AREA)
- Hard Magnetic Materials (AREA)
- Thin Magnetic Films (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
この発明は軟磁性金属膜を蒸着するための非磁性の磁気
ヘッド用基板材料に関するものである。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application This invention relates to a nonmagnetic magnetic head substrate material on which a soft magnetic metal film is deposited.
従来の技術
従来より磁気ヘッド用コア材として、加工性、耐磨耗性
が良いという特長からフェライトが広（使用されている
が、飽和磁束密度Ｂ８が合金材料に比べて３０〜５０％
低い。従って、近年登場してきた高抗磁力の高密度記録
媒体に使用した場合、ヘッドコア材料の磁気飽和が問題
となり、このような観点から、高密度記録媒体の対応ヘ
ッドとして、センダストや非晶質の合金材料がヘッド用
コア材料に供されている。この様な合金材料用基板材料
としてチタン酸バリウムＢａＴｉＯ３、やチタン酸カル
シウムＣａＴｉＯｓ等のセラミック材料が提案されてい
た。Conventional technology Ferrite has been widely used as a core material for magnetic heads due to its good workability and wear resistance (although it has a saturation magnetic flux density B8 of 30 to 50% compared to alloy materials).
low. Therefore, when used in high-density recording media with high coercive force that have appeared in recent years, magnetic saturation of the head core material becomes a problem. A material is provided as a core material for the head. Ceramic materials such as barium titanate BaTiO3 and calcium titanate CaTiOs have been proposed as substrate materials for such alloy materials.
発明が解決しようとする課題
ところが、このような材料で構成されたセラミック基板
では、金属磁性材料であるセンダストや非晶質の合金膜
を蒸着もしくはスパッタリング等の膜形成時に、熱膨張
係数の違いにより金属膜が剥離するという難点があった
。Problems to be Solved by the Invention However, in ceramic substrates made of such materials, when forming sendust, which is a metal magnetic material, or an amorphous alloy film by vapor deposition or sputtering, due to the difference in thermal expansion coefficient, There was a problem that the metal film peeled off.
この様な基板材料に対して、熱膨張係数がほぼ、合金膜
と等しくかつ、非磁性の基板材料として露光により結晶
化するＬｉ０１ＳｉＯ２を主成分とする感光性結晶化ガ
ラスが用いられている。For such a substrate material, a photosensitive crystallized glass whose thermal expansion coefficient is approximately equal to that of the alloy film and whose main component is Li01SiO2, which crystallizes when exposed to light, is used as a nonmagnetic substrate material.
しかしながら結晶化ガラスは機械加工性が悪く、例えば
ダイヤモンドカッターによる切断速さは、フェライト材
料の１１５〜１／１０と悪く量産性に向いていない。他
方結晶化ガラスを基板材料として磁気ヘッドを作製し、
市販の塗布型メタルテープによる各種環境下におけるテ
ープ走行試験をした所、特に低湿環境（例えば２０℃、
１０％ＲＨ）でヘッド出力の大きな低下がみられた。出
力が°低下したヘッドのテープしゅう動面を観察したと
ころ、ガラス基板部に選択的に付着物があり、その程度
を段差計により測定した所、最大５００〜６００Ａであ
っ−た。この付着物をオージェ分析によりしたところ、
付着成分はテープ媒体中の磁性材料であり、段差計によ
る値とオージェ分析による深さが一致した。 ゛
以上の結果より、塗布型メタルテープを低湿環境下で走
行すると、ガラス基板部に選択的にメタルテープ中の磁
性材料が付着し、その付着物の盛り上がりのために、ヘ
ッドとテープ間のスペーシングロスにより、ヘッド出力
が低下する事がわかった。他方熱膨張係数がほぼ金属磁
性材料と等しく非磁性の基板材料としてＮｉＭｎ０ｐが
提案されている。（特開昭５８−２０８９２４号公報他
）しかしながらこの材料もテープ媒体よりの付着はない
が、機械加工性が悪かった。However, crystallized glass has poor machinability, and the cutting speed with a diamond cutter, for example, is 115 to 1/10 that of ferrite materials, making it unsuitable for mass production. On the other hand, a magnetic head was manufactured using crystallized glass as a substrate material,
When we conducted tape running tests under various environments using commercially available coated metal tapes, we found that especially in low-humidity environments (e.g., 20°C,
10% RH), a large decrease in head output was observed. When the tape sliding surface of the head whose output had decreased was observed, it was found that deposits were selectively deposited on the glass substrate, and the extent of the deposit was measured using a level difference meter, and the maximum was 500 to 600 A. When this deposit was subjected to Auger analysis, it was found that
The adhered component was a magnetic material in the tape medium, and the depth measured by the step meter and the depth measured by Auger analysis matched. From the above results, when a coated metal tape is run in a low-humidity environment, the magnetic material in the metal tape selectively adheres to the glass substrate, and due to the buildup of the adhered material, the gap between the head and the tape is reduced. It was found that head output decreased due to pacing loss. On the other hand, NiMn0p has been proposed as a non-magnetic substrate material having a coefficient of thermal expansion approximately equal to that of the metal magnetic material. (Japanese Unexamined Patent Publication No. 58-208924, etc.) However, although this material did not adhere to the tape medium, it had poor machinability.
以上を総合して、磁気ヘッド用基板材料として以下の点
が望まれる。Taking all the above into consideration, the following points are desirable for a magnetic head substrate material.
（１）金属磁性材料と熱膨張係数が等しいか近い事。(1) The coefficient of thermal expansion is equal to or close to that of the metal magnetic material.
（２）機械加工性結性が良い事。(2) Good machinability and concretion.
（３）非磁性であること。(3) Be non-magnetic.
（４）テープ媒体よりの付着がない事。(4) No adhesion from tape media.
（５）熱的安定性が良い事゛。(5) Good thermal stability.
以上全項目を満足する材料が望まれている。A material that satisfies all of the above items is desired.
課題を解決するための手段
Ｍ Ｏ２を５〜２０モル％と、ＭｎＯを２０〜７０モル
％と、ＮｉＯを１５〜７０モル％とからなる事を特徴と
する磁気ヘッド用基板材料とする。Means for Solving the Problems A substrate material for a magnetic head is provided which is characterized by comprising 5 to 20 mol% of M02, 20 to 70 mol% of MnO, and 15 to 70 mol% of NiO.
（但しＭ＝４価金属、半金属（Ｔｉ、Ｚｒ、Ｈｆ、Ｓｎ
、Ｓｉ、Ｇｅ、Ｐｂ）材の少なくとも一種）
作用
基板が金属磁性材料と熱膨張係数が一致しているので、
薄膜作製装置を用いて磁性膜が作製でき、また、Ｍｎ−
Ｚｎフェライトに近い機械加工が可能であり、これを基
板とした磁気へッドハチーブ媒体より゛の付着がないの
で安定したヘッド出力が得られる。(However, M = tetravalent metal, semimetal (Ti, Zr, Hf, Sn
, Si, Ge, Pb)) Since the working substrate has the same coefficient of thermal expansion as the metal magnetic material,
A magnetic film can be produced using a thin film production device, and Mn-
It can be machined in a manner similar to that of Zn ferrite, and as compared to magnetic head hive media using Zn ferrite as a substrate, there is no adhesion, so stable head output can be obtained.
実施例
実施例１
第１表に示した組成になる様にＭ ｎ ＣＯｓ、Ｎｉ０
．ＴｉＯ２をひょう量し、ボールミルで１６時間混合し
た後乾燥後水をバインダーとして加え、静水圧プレスで
２７ ｏ ｎ ／ ｃ ｍ ２で成形した後、窒素ガス
雰囲気中で１３００℃４時間保持し炉冷した。この焼結
体を熱間静水圧プレスで１１５０℃２時間、１０００
Ｋ ｇ ／ ｃ ｍ ２の圧力を施した後炉冷した。Examples Example 1 M n COs, Ni0 so as to have the composition shown in Table 1
．． Weighed TiO2, mixed it in a ball mill for 16 hours, dried it, added water as a binder, and molded it with a hydrostatic press at 27 on/cm2, then kept it at 1300℃ for 4 hours in a nitrogen gas atmosphere and cooled it in a furnace. did. This sintered body was heated in a hot isostatic press at 1150℃ for 2 hours at 1000℃.
After applying a pressure of K g/cm 2 , it was cooled in the furnace.
こうして得られた焼結体の熱膨張係数および同一寸法の
焼結体をダイヤモンドカッターで切断した時のスピンド
ルモータの負荷電流値を同一寸法のＭ ｎ −Ｚ ｎフ
ェライト切断時を１に規格化した値を切断負荷として示
す。またこれら基板材料に各々スパッターで非晶質合金
（Ｃｏ−Ｎｂ−Ｚｒ）をスパッター装置により形成した
後、ヘッドを作製しこれらのヘッドをビデオテープレコ
ーダに取り付け、市販の塗布型メタルテープを用いて、
２３℃、７０％相対湿度下でのヘッド出力をＯｄＢとし
た時の２３℃、１０％相対湿度下のヘッド出力も合わせ
てしめした。また、比較例として結晶化ガラスについて
も示した。第１表より明らかなように、Ｔ ｉ Ｏ２を
含まないものは熱膨張係数が太きく Ｔ ｉ Ｏ２が２
０モル％を越えると逆に小さ（なっている。切断負荷に
ついてはＴｉＯ２の含量が増えると小さ（なる傾向があ
るが、いずれの材料も結晶化ガラスよりも小さく、切断
が容易であり、フェライトに近い加工性をしめす。また
、ヘッド出力も結晶化ガラス基板ヘッド以外はヘッド出
力の低下はない。The coefficient of thermal expansion of the sintered body thus obtained and the load current value of the spindle motor when cutting the sintered body of the same size with a diamond cutter were normalized to 1 when cutting M n -Z n ferrite of the same size. The value is shown as cutting load. In addition, after sputtering an amorphous alloy (Co-Nb-Zr) onto each of these substrate materials using a sputtering device, heads were manufactured and these heads were attached to a videotape recorder using a commercially available coated metal tape. ,
The head output at 23°C and 10% relative humidity is also shown, where the head output at 23°C and 70% relative humidity is expressed as OdB. Moreover, crystallized glass is also shown as a comparative example. As is clear from Table 1, those that do not contain T i O2 have a large coefficient of thermal expansion.
On the other hand, when the content exceeds 0 mol%, the cutting load tends to decrease as the content of TiO2 increases, but both materials are smaller than crystallized glass and easier to cut. In addition, there is no decrease in head output except for the crystallized glass substrate head.
実施例２
組成をＭｎ０５５、Ｎｉ０３５、ＭＯ２１０各モル％と
し、Ｍとして第２表に示した元素を用い実施例１と同様
に作製し評価した。Example 2 The composition was made to be Mn055, Ni035, and MO210 each in mol %, and the elements shown in Table 2 were used as M, and they were produced and evaluated in the same manner as in Example 1.
なお表には示さなかったが、熱膨張係数はすべて１０５
〜１２０Ｘ １０−７／’Ｃの範囲にあり、実施例１と
ほぼ同様にＭ Ｏ２の量とＴ ｉ Ｏ２量は等価であっ
た。また、実施例１と同様に比較例として結晶化ガラス
についても示した。Although not shown in the table, all thermal expansion coefficients are 105.
~120X 10-7/'C, and as in Example 1, the amount of M O2 and the amount of T i O2 were equivalent. Further, as in Example 1, crystallized glass was also shown as a comparative example.
第２表より明らかなように、切断負荷はいずれら小さく
結晶化ガラスの半分以下である。また、ヘッド出力の低
下ら少なくＰｂＯ２、ＧｅＯ２，５１０２の入った。も
ので若干ヘッド出力の低下が見られたがそれでも結晶化
ガラスの半分であった。As is clear from Table 2, the cutting load is small and less than half that of crystallized glass. In addition, there was little decrease in head output due to the inclusion of PbO2, GeO2, and 5102. Although there was a slight decrease in head output, it was still half that of crystallized glass.
Ｍ Ｏ２を５〜２０モル％と限定したのは５以下もしく
は２０以上では、熱膨張係数が１２５以上もしくは１０
０以下となり非晶質合金をスパッター装置等により蒸着
すると合金膜が剥離する恐れがある為である。Ｍｎ０１
ＮｉＯについては含量が８０〜９５モル％であり、かつ
ＭｎＯが２０〜７０モル％、ＮｉＯが１５〜７０モル％
の範囲であれば特に焼結性を損なうことはなく問題とは
ならない。又本願ではＭＯ２ＭｎＯＮｉＯを主成分とし
く但しＭ＝４価金属、半金属（Ｔｉ、Ｚｒ、Ｈｆ、Ｓｎ
、Ｓ ｉ、Ｇｅ、Ｐｂ）材の少な（とも一種）数％内の
レベルでの他の元素の混入は熱膨張係数及び機械加工性
が損なわなければ許されるものである。なお本願発明の
基板材料の結晶構造はＮａＣｌ型の岩塩構造とスピネル
の混在した構造である。The reason why M O2 is limited to 5 to 20 mol% is that if it is 5 or less or 20 or more, the thermal expansion coefficient is 125 or more or 10
This is because the alloy film may be peeled off if the amorphous alloy is vapor-deposited using a sputtering device or the like. Mn01
The content of NiO is 80 to 95 mol%, MnO is 20 to 70 mol%, and NiO is 15 to 70 mol%.
If it is within this range, the sinterability will not be particularly impaired and there will be no problem. In addition, in this application, MO2MnONiO is used as the main component, but M = tetravalent metal, semimetal (Ti, Zr, Hf, Sn
, Si, Ge, Pb) at a level of a few percent (both of them) is permissible as long as the coefficient of thermal expansion and machinability are not impaired. Note that the crystal structure of the substrate material of the present invention is a structure in which a NaCl-type rock salt structure and spinel are mixed.
又、非晶質合金膜としてはメタル−メタル系であるＣｏ
−Ｍ（ＭはＮ ｂ ＊ Ｔ ｒ ＊ Ｔ ａ 、Ｚ ｒ
ｒ Ｗ等の金属元素）やＣｏ Ｍｘ Ｍ２（Ｍｌ
、Ｍ２は上記Ｍで示された金属元素）はもとよりＳｉ。In addition, as an amorphous alloy film, Co, which is a metal-metal system, is used.
-M (M is N b * T r * T a , Z r
r Metallic elements such as W) and Co Mx M2 (Ml
, M2 is the metal element shown by M above) as well as Si.
Ｂ、Ｃ，Ｐを含むメタル−メタロイド系等についても特
に不都合はない。There is no particular disadvantage in metal-metalloid systems containing B, C, and P.
発明の効果
本発明による基板材料は、従来の結晶化ガラスに比べて
機械加工性が良（これを磁気ヘッドに用いた場合、熱膨
張係数が非晶質合金とほぼ同じであるのでスパッター装
置等により蒸着しても合金膜が剥離する心配がない。ま
た、これを基板にした磁気ヘッドは機械加工性が良いの
で加工し易（低湿環境下でもテープ媒体よりの付着がな
いのでヘッド出力が安定して得られる。Effects of the Invention The substrate material according to the present invention has better machinability than conventional crystallized glass (when used in a magnetic head, the coefficient of thermal expansion is almost the same as that of an amorphous alloy, so it can be used in sputtering equipment, etc.). There is no need to worry about the alloy film peeling off even if it is vapor-deposited.Also, a magnetic head using this substrate has good machinability, so it is easy to process (even in a low humidity environment, there is no adhesion from the tape medium, so the head output is stable) It can be obtained by
Claims (3)
０モル％と、ＮｉＯを１５〜７０モル％とからなる事を
特徴とする磁気ヘッド用基板材料。 （但しＭ＝４価金属、半金属（Ｔｉ、Ｚｒ、Ｈｆ、Ｓｎ
、Ｓｉ、Ｇｅ、Ｐｂ）材の少なくとも一種）(1) 5 to 20 mol% of MO_2 and 20 to 7% of MnO
A substrate material for a magnetic head, characterized by comprising 0 mol% of NiO and 15 to 70 mol% of NiO. (However, M = tetravalent metal, semimetal (Ti, Zr, Hf, Sn
, Si, Ge, Pb)
からなる特許請求の範囲第１項記載の磁気ヘッド用基板
材料。(2) Mixed crystal with cubic crystal structure (NaCl, spinel)
A substrate material for a magnetic head according to claim 1, comprising:
であることを特徴とする特許請求の範囲第１項記載の磁
気ヘッド用基板材料。(3) Thermal expansion coefficient is 100 to 125 x 10^-^7/℃
A substrate material for a magnetic head according to claim 1, characterized in that:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63060994A JPH0775207B2 (en) | 1988-03-15 | 1988-03-15 | Substrate material for magnetic head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63060994A JPH0775207B2 (en) | 1988-03-15 | 1988-03-15 | Substrate material for magnetic head |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01233713A true JPH01233713A (en) | 1989-09-19 |
| JPH0775207B2 JPH0775207B2 (en) | 1995-08-09 |
Family
ID=13158495
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63060994A Expired - Lifetime JPH0775207B2 (en) | 1988-03-15 | 1988-03-15 | Substrate material for magnetic head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0775207B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5347412A (en) * | 1992-04-06 | 1994-09-13 | Hitachi Metals, Ltd. | Floating magnetic head |
-
1988
- 1988-03-15 JP JP63060994A patent/JPH0775207B2/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5347412A (en) * | 1992-04-06 | 1994-09-13 | Hitachi Metals, Ltd. | Floating magnetic head |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0775207B2 (en) | 1995-08-09 |
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